CN207116434U - A kind of oled substrate and display device - Google Patents
A kind of oled substrate and display device Download PDFInfo
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- CN207116434U CN207116434U CN201720956094.9U CN201720956094U CN207116434U CN 207116434 U CN207116434 U CN 207116434U CN 201720956094 U CN201720956094 U CN 201720956094U CN 207116434 U CN207116434 U CN 207116434U
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Abstract
The utility model discloses a kind of oled substrate and display device, is related to display technology field, for solving the problems, such as that contact conductor easily breaks, to ensure that OLED display is normally shown.The oled substrate includes array base palte, planarization layer and the pixel defining layer being cascading；The peripheral wiring area of array base palte is provided with signal wire, and the open area of pixel defining layer is provided with OLED；Planarization layer surface corresponding with peripheral wiring area is provided with the first conductive lead wire, and the first conductive lead wire is connected by the first via located at planarization layer with signal wire；Pixel defining layer surface corresponding with peripheral wiring area is provided with contact conductor, contact conductor and OLED Top electrode connection, and contact conductor is connected by the second via located at pixel defining layer with the first conductive lead wire.Oled substrate provided by the utility model is shown for OLED.
Description
Technical field
It the utility model is related to display technology field, more particularly to a kind of oled substrate and display device.
Background technology
Organic Light Emitting Diode (Organic Light Emitting Diode, referred to as OLED) because with high brightness,
Full visual angle, fast response time and can Flexible Displays the advantages that, and be widely used in display field.
At present, the OLED commonly used in oled substrate, mainly there is top-illuminating OLED, bottom illuminating OLED and lighting at two sides
Tri- kinds of OLED.Wherein, using top-illuminating OLED oled substrate structure as shown in figure 1, the oled substrate include have display
Region A and peripheral wiring area B array base palte, OLED arrays are arranged on the surface that array base palte is located at viewing area A.OLED
Anode 31 formed using indium tin oxide (Indium Tin Oxide, abbreviation ITO) material and in thin film transistor (TFT) 2 deviate from substrate
The side of substrate 1, and be connected with the drain electrode of thin film transistor (TFT) 2；OLED OLED luminescent layers 32 are formed in its anode 31 away from thin
The surface of film transistor 2；OLED negative electrode 33 forms the surface for deviating from anode 31 in OLED luminescent layers 32 using metal material, and
OLED negative electrode 33 is connected using the contact conductor 91 through via 4 with peripheral wiring area B signal wire 5.
However, due to peripheral wiring area B signal wire 5, typically by the source-drain electrode with viewing area A thin film transistor (TFT)s 2
The metal level made with layer is formed, when being laminated to form each film layer on the source-drain electrode surface of thin film transistor (TFT) 2, such as it is passivation layer 6, flat
When smooth layer 7 and pixel defining layer 8, these film layers are also formed stacking gradually on the surface of signal wire 5.Therefore, using through
When the contact conductor 91 of via 4 is to realize the connection of OLED negative electrode 33 and signal wire 5, because via 4 needs to penetrate multilayer film
Layer so that the depth of via 4 is deeper, when deposition makes contact conductor 91 in via 4, easily contact conductor 91 is occurred
The situation of broken string, cause signal wire 5 can not be realized with OLED negative electrode 33 and connect, and then the OLED where causing oled substrate shows
Showing device can not normally be shown.
Utility model content
The purpose of this utility model is to provide a kind of oled substrate and display device, easily broken for solving contact conductor
The problem of line, to ensure that OLED display is normally shown.
To achieve these goals, the utility model provides following technical scheme：
First aspect of the present utility model provides a kind of oled substrate, including the array base palte, flat being cascading
Smoothization layer and pixel defining layer；The peripheral wiring area of array base palte is provided with signal wire, and the open area of pixel defining layer is provided with
OLED；Planarization layer surface corresponding with peripheral wiring area is provided with the first conductive lead wire, and the first conductive lead wire passes through located at flat
First via of smoothization layer is connected with signal wire；Pixel defining layer surface corresponding with peripheral wiring area is provided with contact conductor,
Contact conductor and OLED Top electrode are connected, and contact conductor is drawn by the second via located at pixel defining layer with the first conduction
Line connects.
Compared with prior art, oled substrate provided by the utility model has the advantages that：
Oled substrate provided by the utility model, set between the contact conductor and signal wire that the Top electrode with OLED is connected
The first conductive lead wire is put, and the first conductive lead wire is located at planarization layer surface corresponding with peripheral wiring area so that first
Conductive lead wire is connected by the first via located at planarization layer with signal wire, and contact conductor passes through located at pixel defining layer
Second via is connected with the first conductive lead wire.In the case of there is identical film layer so between OLED Top electrodes and signal wire,
It is compared with only being connected between OLED Top electrodes and signal wire using the contact conductor through via, contact conductor and first is conductive
Lead subregion is arranged between OLED Top electrodes and signal wire, relative can reduce the layer that film layer is penetrated needed for contact conductor
Number, that is, the depth of the second via that relatively reduced contact conductor passes through, when deposition makes contact conductor in the second via
When, can avoid the occurrence of contact conductor because penetrate that the film layer number of plies is more and the situation that breaks；Moreover, worn needed for the first conductive lead wire
The number of plies of permeable membrane layer, the number of plies that contact conductor penetrates remaining film layer after film layer is removed between OLED Top electrodes and signal wire, is made
Penetrate needed for the first conductive lead wire film layer the number of plies it is also less, the depth for the first via that the first conductive lead wire passes through can be reduced
Degree, when deposition makes the first conductive lead wire in the first via, the first conductive lead wire can be avoided the occurrence of because penetrating film layer layer
The situation that number is more and breaks.
Therefore, compared with prior art, oled substrate provided by the utility model, between OLED Top electrodes and signal wire
Subregion sets contact conductor and the first conductive lead wire, is easy to so that contact conductor and the first conductive lead wire are reliably molded, and are kept away
Exempt from its broken string, it is ensured that OLED Top electrode can be reliably connected by contact conductor and the first conductive lead wire with signal wire, so as to
OLED display where ensuring oled substrate can normally be shown.
Based on the technical scheme of above-mentioned oled substrate, second aspect of the present utility model provides a kind of display device, described
Display device includes the oled substrate that above-mentioned technical proposal is provided.
Compared with prior art, the beneficial effect achieved by display device provided by the utility model, with above-mentioned technology
The beneficial effect that the oled substrate that scheme provides can reach is identical, will not be described here.
Brief description of the drawings
Accompanying drawing described herein is used for providing further understanding to of the present utility model, forms one of the present utility model
Point, schematic description and description of the present utility model is used to explain the utility model, does not form to of the present utility model
Improper restriction.In the accompanying drawings：
Fig. 1 is the schematic cross-sectional view of oled substrate of the prior art；
Fig. 2 is the schematic cross-sectional view one for the oled substrate that the utility model embodiment provides；
Fig. 3 is the schematic cross-sectional view two for the oled substrate that the utility model embodiment provides.
Reference：
1- underlay substrates, 2- thin film transistor (TFT)s,
21- active layers, 22- grids,
23- source-drain electrodes, 31- anodes,
32-OLED luminescent layers, 33- negative electrodes,
4- vias, the vias of 41- second,
The vias of 42- first, the vias of 43- the 3rd,
5- signal wires, 6- passivation layers,
7- planarization layers, 8- pixel defining layers,
91- contact conductors, the conductive lead wires of 92- first,
The conductive lead wires of 93- second, 10- gate insulation layers,
11- interlayer insulating films.
Embodiment
For ease of understanding, with reference to Figure of description, the oled substrate provided the utility model embodiment and display
Device is described in detail.
Referring to Fig. 2, the utility model embodiment provide oled substrate, including be cascading array base palte,
Planarization layer 7 and pixel defining layer 8；The peripheral wiring area B of array base palte is provided with signal wire 5, the open region of pixel defining layer 8
Domain is provided with OLED；The surface corresponding with peripheral wiring area B of planarization layer 7 is provided with the first conductive lead wire 92, the first conductive lead wire
92 are connected by the first via 42 located at planarization layer 7 with signal wire 5；Pixel defining layer 8 is corresponding with peripheral wiring area B
Surface is provided with contact conductor 91, and contact conductor 91 is connected with OLED Top electrode, and contact conductor 91 located at pixel by defining
Second via 41 of layer 8 is connected with the first conductive lead wire 92.
Above-mentioned OLED generally includes the bottom electrode being oppositely arranged and Top electrode, and between Top electrode and bottom electrode
OLED luminescent layers 32；Wherein, bottom electrode refers to the surface of planarization layer 7 being formed in the open area of pixel defining layer 8
Electrode, and Top electrode refers to be formed the electrode in OLED luminescent layers backwards to the surface of bottom electrode.Under it should be noted that, although
Electrode is formed at the surface of planarization layer 7 in the open area of pixel defining layer 8, but in order to facilitate OLED manufacture crafts
Implementation, generally before pixel defining layer 8 is made, first on the surface corresponding with the open area of pixel defining layer 8 of planarization layer 7
OLED bottom electrode is formed, then stacks gradually the Top electrode for making pixel defining layer 8, OLED luminescent layers 32 and OLED.
In above-mentioned OLED, its Top electrode can be used as negative electrode, can also be used as anode：It is right when Top electrode is as negative electrode
The bottom electrode answered then is used as anode；And when Top electrode is as anode, corresponding bottom electrode is then used as negative electrode.Such as shown in Fig. 2
Embodiment in, OLED Top electrode makes to be formed as negative electrode 33, generally use metal material；And its bottom electrode is as anode
31, generally use indium tin oxide (Indium Tin Oxide, abbreviation ITO) material makes to be formed, and certainly, bottom electrode can also
Using the laminated construction by ITO materials and metal material making, such as ITO and silver-colored (Ag) laminated construction, or ITO and magnesium (Mg)
Laminated construction etc., to cause bottom electrode that there is more excellent electric conductivity.
In addition, OLED luminescent layers 32 can be single layer structure, for example, OLED luminescent layers 32 only include being arranged on Top electrode with
Organic luminous layer between bottom electrode；OLED luminescent layers 32 can also be sandwich construction, such as OLED luminescent layers 32 are including setting
Hole transmission layer, organic luminous layer and electron transfer layer between Top electrode and bottom electrode etc..
When it is implemented, the oled substrate that the utility model embodiment provides, in the electrode that the Top electrode with OLED is connected
First conductive lead wire 92 is set between lead 91 and signal wire 5, and the first conductive lead wire 92 is located at planarization layer 7 and outer cloth
Surface corresponding to the B of line region so that the first conductive lead wire 92 is connected by the first via 42 located at planarization layer 7 with signal wire 5
Connect, and contact conductor 91 is connected by the second via 41 located at pixel defining layer 8 with the first conductive lead wire 92, so as to realize
Connection between OLED Top electrodes and signal wire 5.Signal wire 5 is used for the Top electrode transmitting telecommunication number to OLED, and signal wire 5 is used for
The one end for receiving external electric signal is generally connected with the Wiring port of oled substrate, and such signal wire 5 is being received outside oled substrate
Portion driving IC is transmitted to the electric signal of the Wiring port of oled substrate, using the first conductive lead wire 92 being connected with signal wire 5,
And the contact conductor 91 being connected with the first conductive lead wire 92, can be by the Top electrode of electric signal transmission to OLED.
By above-mentioned specific implementation process, there is identical film layer between OLED Top electrodes and signal wire 5
Under, compared with only being connected in the prior art between OLED Top electrodes and signal wire using the contact conductor through via, this practicality
New embodiment provide oled substrate, by the subregion of 91 and first conductive lead wire of contact conductor 92 be arranged on OLED Top electrodes and
Between signal wire 5, the number of plies that film layer is penetrated needed for contact conductor 91, that is, relatively reduced contact conductor 91 relative can be reduced
The depth of the second via 41 passed through, when deposition makes contact conductor 91 in the second via 41, electrode can be avoided the occurrence of
Lead 91 because penetrate that the film layer number of plies is more and the situation that breaks；Moreover, penetrating the number of plies of film layer needed for the first conductive lead wire 92, it is
The number of plies that contact conductor 91 penetrates remaining film layer after film layer is removed between OLED Top electrodes and signal wire 5 so that the first conduction is drawn
Penetrate that the number of plies of film layer is also less needed for line 92, the depth for the first via 42 that the first conductive lead wire 92 passes through can be reduced, when
When deposition makes the first conductive lead wire 92 in the first via 42, the first conductive lead wire 92 can be avoided the occurrence of because penetrating film layer layer
The situation that number is more and breaks.
Therefore, the oled substrate that the utility model embodiment provides, subregion is set between OLED Top electrodes and signal wire 5
The conductive lead wire 92 of contact conductor 91 and first is put, is easy to so that the conductive lead wire 92 of contact conductor 91 and first is reliably molded, and is kept away
Exempt from its broken string, it is ensured that OLED Top electrode can be reliably connected by the conductive lead wire 92 of contact conductor 91 and first with signal wire 5,
So that it is guaranteed that the OLED display where oled substrate can normally be shown.
It is understood that please continue to refer to Fig. 2, in above-described embodiment, the first conductive lead wire 92 be located at planarization layer 7 with
Surface corresponding to peripheral wiring area B, and to be located at planarization layer 7 corresponding with the open area of pixel defining layer 8 for OLED bottom electrode
Surface, therefore, in the case where the bottom electrode for ensuring the first conductive lead wire 92 and OLED insulate, the first conductive lead wire 92 with
OLED bottom electrode can be formed in a patterning processes, so be advantageous to simplify the OLED of the utility model embodiment offer
The manufacture craft of substrate, so as to improve the production efficiency of oled substrate.
It is noted that please continue to refer to Fig. 2, in the oled substrate that above-described embodiment provides, the first conductive lead wire
92 quantity can be at least one, and now, the first via 42 should be corresponded with the first conductive lead wire 92, and every first is led
Electrical lead 92 by corresponding first via 42, is connected with signal wire 5；And the second via 41 should also draw with the first conduction
Line 92 is corresponded, and contact conductor 91 is connected with corresponding first conductive lead wire 92 respectively by each second via 41
Connect.First conductive lead wire 92 being connected with signal wire 5 is so utilized, and is connected and is located at first conductive lead wire 92
The part of contact conductor 91 in corresponding second via 41, it just may be constructed a conductive path, the OLED that the present embodiment provides
Substrate is by setting at least one above-mentioned conductive path, it is possible to by increasing the quantity of conductive path, effectively prevents signal wire 5
With OLED Top electrodes because of certain conductive path open circuit, and there is the situation that can not be reliably connected, further such that signal wire 5 with
OLED Top electrodes are reliably connected by conductive path, so that it is guaranteed that the OLED display where oled substrate can normally show
Show.
You need to add is that the second via 41 and the first via 42 are in the specific set location of its corresponding film layer, Ke Yiyou
Those skilled in the art according to contact conductor in oled substrate 91, the first conductive lead wire 92 and signal wire 5 set location and
Sets itself.
Exemplary, in an above-mentioned conductive path, in particular to right respectively with first conductive lead wire 92
In the first via 42 and the second via 41 answered, the center line of the center line of the first via 42 and the second via 41 is not located at same
Bar straight line, that is, the first via 42 and the second via 41 are shifted to install so that for connection electrode lead 91 and signal wire 5
The first conductive lead wire 92, there are parallel to planarization layer 7 horizontal transition section and penetrate the vertical transition of planarization layer 7
Section, so as to increase total area coverage of first conductive lead wire 92 in planarization layer 7, strengthen the electric conductivity of the first conductive lead wire 92
Energy.In addition, the first conductive lead wire 92 has larger area coverage, it can be ensured that the first conductive lead wire 92 and contact conductor 91 it
Between, being capable of good contact, it is ensured that the first conductive lead wire 92 is reliably connected and between the first conductive lead wire 92 and signal wire 5
Contact conductor 91 and signal wire 5, so as to improve the use reliability of oled substrate.
It should be noted that referring to Fig. 2 and Fig. 3, signal wire 5 is used for the Top electrode transmitting telecommunication number to OLED, signal
The generally use metal material of line 5 is made to be formed, and therefore, signal wire 5 can be formed with being made in oled substrate using metal material
Other electrodes set with layer, and shaping is made in a patterning processes, such as, film is brilliant in signal wire 5 and array base palte
The source-drain electrode 23 of body pipe is set with layer, and shaping is made in a patterning processes；Or signal wire 5 with it is thin in array base palte
The grid 22 of film transistor is set with layer, and shaping is made in a patterning processes；To simplify the making work of oled substrate
Skill, be advantageous to improve the production efficiency of oled substrate.
Also Just because of this, other covering signal wires are inevitably there are between signal wire 5 and planarization layer 7
5 film layer, such as passivation layer 6, interlayer insulating film 11 etc., accordingly now, specifically connecting between contact conductor 91 and signal wire 5
The concrete structure for connecing also visual array substrate is specifically set, such as passivation layer 6 is provided between signal wire 5 and planarization layer 7
When, the first conductive lead wire 92 is located at the first via 42 of planarization layer 7 and passivation layer 6 by passing sequentially through, and is connected with signal wire 5；
For another example between signal wire 5 and planarization layer 7 be provided with compared with multiple film layer when, can also the conductive lead wire 92 of signal wire 5 and first it
Between set up the second conductive lead wire 93 so that one end of the second conductive lead wire 93 is connected with the first conductive lead wire 92, its other end with
Signal wire 5 connects；Etc..
For the connection between the above-mentioned contact conductor 91 of clearer explanation and signal wire 5, please continue to refer to Fig. 2 and Fig. 3,
Two kinds of specific embodiments are set forth below it is explained.
The first embodiment as shown in Fig. 2 the present embodiment provide oled substrate in, signal wire 5 and array base palte
The source-drain electrode 23 of middle thin film transistor (TFT) is set with layer, and signal wire 5 insulate with source-drain electrode 23；Signal wire 5 and planarization layer 7 it
Between, and between source-drain electrode 23 and planarization layer 7, it is equipped with passivation layer 6；First conductive lead wire 92 is passed sequentially through located at planarization
First via 42 of layer 7 and passivation layer 6, is connected with signal wire 5.
Specifically, in the oled substrate that the present embodiment provides, its underlay substrate 1 is provided with the active layer of thin film transistor (TFT)
21, be cascading on active layer 21 gate insulation layer 10 and grid 22, and interlayer is all covered with grid 22 and gate insulation layer 10
Insulating barrier 11；Interlayer insulating film 11 is provided with source-drain electrode 23 with 21 corresponding surface of active layer, and source-drain electrode 23 includes source electrode and drain electrode,
And source electrode and drain electrode are each passed through interlayer insulating film 11 and gate insulation layer 10, it is connected with active layer 21；Interlayer insulating film 11 with it is outer
Surface corresponding to the B of wiring area is enclosed provided with the signal wire 5 with source-drain electrode 23 with layer；Source-drain electrode 23, signal wire 5 and layer insulation
Passivation layer 6 is all covered with layer 11, passivation layer 6 is provided with planarization layer 7, and passivation layer 6 and planarization layer 7 are equipped with the first mistake
Hole 42；Planarization layer 7 is provided with the first conductive lead wire 92 with 5 corresponding surface of signal wire, and the first conductive lead wire 92 passes through the first mistake
Hole 42 is connected with signal wire 5.
Moreover, the surface of planarization layer 7 is provided with OLED anode 31, OLED anode 31 through planarization layer 7 and is passivated
Layer 6, is connected with the drain electrode of thin film transistor (TFT)；Pixel defining layer 8 is all covered with the conductive lead wire 92 of planarization layer 7 and first,
OLED anode 31 is located at the open area of pixel defining layer 8, and the OLED surface of anode 31 is provided with OLED luminescent layers 32, OLED
The surface of luminescent layer 32 is provided with OLED negative electrode 33, is total to by OLED anode 31, OLED luminescent layers 32 and OLED negative electrode 33
With composition OLED.The surface of pixel defining layer 8 is provided with the contact conductor 91 being connected with OLED negative electrode 33, and contact conductor 91 passes through
The second via 41 for being located at pixel defining layer 8 is connected with the first conductive lead wire 92.
It should be noted that in above-described embodiment, signal wire 5 is set with source-drain electrode 23 with layer, and the two can be in a structure
Shaping is made in figure technique；First conductive lead wire 92 and OLED anode 31 are each provided at the surface of planarization layer 7, and the two can be
Shaping is made in patterning processes；Contact conductor 91 is located at the surface of pixel defining layer 8, and OLED negative electrode 33 is located at pixel circle
The open area of given layer 8, the two can also make shaping in a patterning processes.The oled substrate that the present embodiment provides uses
Said structure, its manufacture craft can be simplified, be advantageous to improve its production efficiency.
Second of embodiment as shown in figure 3, the present embodiment provide oled substrate in, film crystal in array base palte
The grid 22 of pipe, between underlay substrate 1 and the source-drain electrode 23 of thin film transistor (TFT)；Signal wire 5 is set with grid 22 with layer, and
Signal wire 5 insulate with grid 22.Insulating barrier, table of the insulating barrier towards planarization layer 7 are provided between signal wire 5 and planarization layer 7
Face is provided with the second conductive lead wire 93, and the second conductive lead wire 93 is connected by the 3rd via 43 located at insulating barrier with signal wire 5；It is flat
Smoothization layer 7 is provided with passivation layer 6 towards the surface of the second conductive lead wire 93, and the first conductive lead wire 92 is passed sequentially through located at planarization layer
7 and the first via 42 of passivation layer 6, it is connected with the second conductive lead wire 93.
It should be noted that signal wire 5 is set with grid 22 with layer, it is above-mentioned to be set between signal wire 5 and planarization layer 7
Insulating barrier, can be gate insulation layer, or interlayer insulating film, it depends primarily in thin film transistor (TFT) grid 22 and had
The relative position of active layer 21.In the present embodiment, active layer 21 is located at grid 22 backwards to the side of source-drain electrode 23, therefore, active
The insulating barrier set between layer 21 and grid 22 is gate insulation layer 10, and the insulating barrier set between grid 22 and planarization layer 7,
The insulating barrier set between signal wire 5 and planarization layer 7 is interlayer insulating film 11.
Specifically, please continue to refer to Fig. 3, in the oled substrate that the present embodiment provides, its underlay substrate 1 is provided with film
The active layer 21 of transistor, be cascading on active layer 21 gate insulation layer 10 and grid 22, gate insulation layer 10 and outer cloth
Surface corresponding to the B of line region is provided with the signal wire 5 with grid 22 with layer, is covered on grid 22, gate insulation layer 10 and signal wire 5
It is stamped interlayer insulating film 11；Interlayer insulating film 11 is provided with source-drain electrode 23 with 21 corresponding surface of active layer, and source-drain electrode 23 includes source
Pole and drain electrode, and source electrode and drain electrode are each passed through interlayer insulating film 11 and gate insulation layer 10, are connected with active layer 21；Layer insulation
Layer 11 is provided with the second conductive lead wire 93 with 5 corresponding surface of signal wire, and the second conductive lead wire 93 is by being located at interlayer insulating film 10
The 3rd via 43, be connected with signal wire 5；It is all covered with source-drain electrode 23, the second conductive lead wire 93 and interlayer insulating film 11
Passivation layer 6, passivation layer 6 are provided with planarization layer 7, and passivation layer 6 and planarization layer 7 are equipped with the first via 42；Planarization layer 7 with
Surface corresponding to second conductive lead wire 93 is provided with the first conductive lead wire 92, and the first conductive lead wire 92 passes through the first via 42 and second
Conductive lead wire 93 connects.
Moreover, the surface of planarization layer 7 is provided with OLED anode 31, OLED anode 31 sequentially passes through the He of planarization layer 7
Passivation layer 6 is connected with the drain electrode of thin film transistor (TFT)；Pixel defining layer 8 is all covered with the conductive lead wire 92 of planarization layer 7 and first,
OLED anode 31 is located at the open area of pixel defining layer 8, and the OLED surface of anode 31 is provided with OLED luminescent layers 32, OLED
The surface of luminescent layer 32 is provided with OLED negative electrode 33, is total to by OLED anode 31, OLED luminescent layers 32 and OLED negative electrode 33
With composition OLED.The surface of pixel defining layer 8 is provided with the contact conductor 91 being connected with OLED negative electrode 33, and contact conductor 91 passes through
The second via 41 of pixel defining layer 8 is located at, is connected with the first conductive lead wire 92.
It should be noted that in above-described embodiment, signal wire 5 is set with grid 22 with layer, and the two can be in a composition
Shaping is made in technique；Second conductive lead wire 93 and source-drain electrode 23 are each provided at the surface of interlayer insulating film 11, and the two can be one
Shaping is made in secondary patterning processes；First conductive lead wire 92 and OLED anode 31 is each provided at the surface of planarization layer 7, and the two can
To make shaping in a patterning processes；Contact conductor 91 is located at the surface of pixel defining layer 8, and OLED negative electrode 33 is located at picture
Element defines the open area of layer 8, and the two can also make shaping in a patterning processes.The oled substrate that the present embodiment provides
Using said structure, its manufacture craft can be simplified, be advantageous to improve its production efficiency.
From the foregoing, it will be observed that when being provided between signal wire 5 and planarization layer 7 compared with multiple film layer, can be led in signal wire 5 and first
Second conductive lead wire 93 is set between electrical lead 92, the first conductive lead wire 92 and signal wire 5 are connected using the second conductive lead wire 93,
To ensure that the number of plies for penetrating film layer needed for the first conductive lead wire 92 is less, effectively prevent the first conductive lead wire 92 because penetrating film layer layer
Number is more and the situation to break occurs, it is ensured that OLED Top electrode passes through contact conductor 91, the first conductive lead wire 92 and second
It can be reliably connected after conductive lead wire 93 with signal wire 5, so that it is guaranteed that the OLED display where oled substrate can be normal
It has been shown that, improve the reliability that OLED display uses.
It is noted that please continue to refer to Fig. 3, when the oled substrate that the present embodiment provides is using above-mentioned second implementation
During structure shown in mode, the quantity of the second conductive lead wire 93 can be at least one, and every second conductive lead wire 93 is right
First conductive lead wire 92 should be connected, now, the 3rd via 43 should correspond with the second conductive lead wire 93, and every second
Conductive lead wire 93 by corresponding 3rd via 43, is connected with signal wire 5；First via 42 should also draw with the second conduction
Line 93 corresponds, and the first via 42 also corresponds with the first conductive lead wire 92, and every first conductive lead wire 92 passes through
Corresponding first via 42, connected with corresponding second conductive lead wire 93；Second via 41 and the first conductive lead wire
92 are corresponded, and contact conductor 91 is connected with corresponding first conductive lead wire 92 respectively by each second via 41.
So utilize second conductive lead wire 93 being connected with signal wire 5, one be connected with second conductive lead wire 93
The first conductive lead wire of bar 92, and the contact conductor 91 for connecting and being located in corresponding second via 41 with first conductive lead wire 92
Part, just may be constructed a conductive path, the oled substrate that the present embodiment provides, which passes through, sets at least one above-mentioned conduction
Path, it is possible to by increasing the quantity of conductive path, effectively prevent signal wire 5 and OLED Top electrodes from breaking because of certain conductive path
Road, and there is the situation that can not be reliably connected, further such that being reliably connected between signal wire 5 and OLED Top electrodes, so as to really
OLED display where protecting oled substrate can normally be shown.
You need to add is that the second via 41, the first via 42 and the 3rd via 43 are set in the specific of its corresponding film layer
Seated position, it can be drawn by those skilled in the art according to contact conductor in oled substrate 91, the first conductive lead wire 92, the second conduction
The set location of line 93 and signal wire 5 and sets itself.
Exemplary, in an above-mentioned conductive path, in particular to right respectively with second conductive lead wire 93
In the first via 42 answered and the 3rd via 43, the center line of the first via 42 and the center line of the 3rd via 43 are not located at same
Bar straight line, and in the via 42 of the second via 41 and first corresponding with the first conductive lead wire 92 difference, the second via 41
Center line and the center line of the first via 42 be not located at same straight line.So the 3rd via 43 and the first via 42 are misplaced
Set so that for connecting the second conductive lead wire 93 of the first conductive lead wire 92 and signal wire 5, there are parallel to layer insulation
The horizontal transition section of layer 11 and the vertical changeover portion for penetrating interlayer insulating film 11, it is exhausted in interlayer can to increase the second conductive lead wire 93
Total area coverage of edge layer 11, so as to strengthen the electric conductivity of the second conductive lead wire 93；Moreover, by the first via 42 and the second mistake
Hole 41 shifts to install so that for the first conductive lead wire 92 of the conductive lead wire 93 of connection electrode lead 91 and second, there are flat
Horizontal transition section and the vertical changeover portion that penetrates planarization layer 7 of the row in planarization layer 7, can increase the first conductive lead wire 92 and exist
Total area coverage of planarization layer 7, so as to strengthen the electric conductivity of the first conductive lead wire 92.Therefore, the present embodiment passes through enhancing
The electric conductivity of first conductive lead wire 92 and the second conductive lead wire 92, it can strengthen conductive between signal wire 5 and OLED Top electrodes
The electric conductivity of path.
In addition, the first conductive lead wire 92 and the second conductive lead wire 93 are respectively provided with larger area coverage, it can be ensured that first
Between conductive lead wire 92 and contact conductor 91, between the first conductive lead wire 92 and the second conductive lead wire 93, and the second conduction is drawn
, being capable of good contact, it is ensured that the first conductive lead wire 92 is reliably connected contact conductor 91 and second and led between line 93 and signal wire 5
Electrical lead 93, and the second conductive lead wire 93 is reliably connected signal wire 5, so as to improve the use reliability of oled substrate.
The utility model embodiment additionally provides a kind of display device, and the display device includes what above-described embodiment provided
Oled substrate.The oled substrate in oled substrate and above-described embodiment in the display device have the advantage that it is identical, herein
Do not repeat.
Above-described embodiment provide display device can be mobile phone, tablet personal computer, television set, display, notebook computer,
DPF or navigator etc. have the product or part of display function.
In the description of above-mentioned embodiment, specific features, structure, material or feature can be in any one or more
Combined in an appropriate manner in individual embodiment or example.
It is described above, only specific embodiment of the present utility model, but the scope of protection of the utility model is not limited to
In this, any one skilled in the art can readily occur in change in the technical scope that the utility model discloses
Or replace, it should all cover within the scope of protection of the utility model.Therefore, the scope of protection of the utility model should be with the power
The protection domain that profit requires is defined.
Claims (10)
1. a kind of oled substrate, including array base palte, planarization layer and the pixel defining layer being cascading；The array base
The peripheral wiring area of plate is provided with signal wire, and the open area of the pixel defining layer is provided with OLED；Characterized in that,
Planarization layer surface corresponding with peripheral wiring area is provided with the first conductive lead wire, and first conductive lead wire passes through
The first via located at the planarization layer is connected with the signal wire；
Pixel defining layer surface corresponding with peripheral wiring area is provided with contact conductor, the contact conductor and the OLED
Top electrode connection, and the contact conductor passes through the second via located at the pixel defining layer and first conductive lead wire
Connection.
2. oled substrate according to claim 1, it is characterised in that the OLED includes the bottom electrode that is oppositely arranged and upper
Electrode, and the OLED luminescent layers between Top electrode and bottom electrode；Wherein,
The bottom electrode is formed at the planarization layer surface in the open area of the pixel defining layer, and the bottom electrode
Insulated with first conductive lead wire；
The Top electrode is formed in the OLED luminescent layers backwards to the surface of the bottom electrode.
3. oled substrate according to claim 1, it is characterised in that
The quantity of first conductive lead wire is at least one；
First via corresponds with first conductive lead wire, and every first conductive lead wire is by corresponding
One first via, is connected with the signal wire；
Second via corresponds with first conductive lead wire, and the contact conductor passes through each second mistake
Hole, connected respectively with corresponding one first conductive lead wire.
4. oled substrate according to claim 3, it is characterised in that with one article of first conductive lead wire respectively corresponding the
In one via and the second via, it is straight that the center line of the center line of first via and second via is not located at same
Line.
5. according to the oled substrate described in claim any one of 1-4, it is characterised in that
The source-drain electrode of the signal wire and thin film transistor (TFT) in the array base palte is set with layer, and the signal wire and the source
Drain insulation；
The planarization layer is provided with passivation layer towards the surface of the signal wire, and first via penetrates the passivation layer.
6. oled substrate according to claim 1, it is characterised in that
Insulating barrier is provided between the signal wire and the planarization layer, the surface of the insulating barrier towards the planarization layer is set
There is the second conductive lead wire, second conductive lead wire is connected by the 3rd via located at the insulating barrier with the signal wire；
The planarization layer is provided with passivation layer towards the surface of second conductive lead wire, and first via penetrates the passivation
Layer；First conductive lead wire is connected by first via with second conductive lead wire.
7. oled substrate according to claim 6, it is characterised in that
The quantity of second conductive lead wire is at least one, and described in the corresponding connection one of every second conductive lead wire
First conductive lead wire；
3rd via corresponds with second conductive lead wire, and every second conductive lead wire is by corresponding
One the 3rd via, is connected with the signal wire；
First via corresponds with second conductive lead wire, and first conductive lead wire and first via are one by one
Correspondingly, and every first conductive lead wire is by corresponding one first via, with corresponding one described second
Conductive lead wire connects；
Second via corresponds with first conductive lead wire, and the contact conductor passes through each second mistake
Hole, connected respectively with corresponding one first conductive lead wire.
8. oled substrate according to claim 7, it is characterised in that
With in one article of second conductive lead wire respectively corresponding first via and the 3rd via, the center line of first via with
The center line of 3rd via is not located at same straight line；
With in first conductive lead wire respectively corresponding first via and the second via, the center line of first via with
The center line of second via is not located at same straight line.
9. according to the oled substrate described in claim any one of 6-8, it is characterised in that
The grid of thin film transistor (TFT) in the signal wire and the array base palte, is respectively provided at the insulating barrier backwards to the passivation
The surface of layer, and the signal wire and the gate insulator；
The source-drain electrode of thin film transistor (TFT) is located at the insulating barrier towards the surface of the passivation layer in the array base palte, and described
Source-drain electrode insulate with second conductive lead wire.
10. a kind of display device, it is characterised in that including the oled substrate as described in claim any one of 1-9.
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