CN206614394U - A kind of burnishing device with profiling abrasive particle group - Google Patents

A kind of burnishing device with profiling abrasive particle group Download PDF

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Publication number
CN206614394U
CN206614394U CN201720254168.4U CN201720254168U CN206614394U CN 206614394 U CN206614394 U CN 206614394U CN 201720254168 U CN201720254168 U CN 201720254168U CN 206614394 U CN206614394 U CN 206614394U
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CN
China
Prior art keywords
polishing
burnishing device
abrasive particle
disk body
oval section
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Expired - Fee Related
Application number
CN201720254168.4U
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Chinese (zh)
Inventor
曾晰
潘烨
计时鸣
苏勇
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Zhejiang University of Technology ZJUT
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Zhejiang University of Technology ZJUT
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Priority to CN201720254168.4U priority Critical patent/CN206614394U/en
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Expired - Fee Related legal-status Critical Current
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Abstract

A kind of burnishing device with profiling abrasive particle group, including for providing industrial robot, work holder, burnishing device and the polishing fluid adding set of six-freedom motion to workpiece, the motion end of Industrial Robot Manipulator installs work holder;The filling opening of the polishing fluid adding set is always positioned at the surface of the burnishing device;The work holder includes being used to provide the servomotor of rotary driving force, fixture and installing plate for clamping workpiece;The burnishing device includes polishing disk body, the oval section volute spring array for buffering, the elastic layer for supporting abrasive particle.The beneficial effects of the utility model are:The mode of overall polishing disposably polishes completions, and the operation of equipment is more convenient, reduces production cost, and polish estimate a little and integral face shape and design requirement control errors it is smaller, solve the unmanageable problem of irregular surface.

Description

A kind of burnishing device with profiling abrasive particle group
Technical field
The present invention relates to a kind of burnishing device with profiling abrasive particle group.
Background technology
Cobalt-base alloys is a kind of high rigidity difficult-to-machine material, is often used for laser melting coating in mould as self-fluxing nature material Surface.Existing traditional processing method is difficult to try out, in addition to traditional mechanical means, also ultrasonic polishing, chemical polishing, electricity Chemical polishing and Electrochemical- mechanical- finishing etc..At present, the polishing method for being directed to surface body is mainly applied to plane, and It is for using fluid hybrid process method the complicated workpiece of configuration of surface, i.e., right using abrasive material is added in air-flow or liquid more Work surface is polished.This method processing cost is higher, complex operation, and is dfficult to apply to high-hardness, wearable Surface.
The content of the invention
It is an object of the present invention to provide one kind estimates a precision height, surface figure accuracy is high, the low tool of simple to operate and cost There is the burnishing device of profiling abrasive particle group.
A kind of burnishing device with profiling abrasive particle group of the present invention, it is characterised in that:Including for being carried to workpiece For the industrial robot of six-freedom motion, work holder, burnishing device and polishing fluid adding set, industrial robot The motion end of manipulator installs work holder;The filling opening of the polishing fluid adding set is always positioned at the burnishing device Surface;
The work holder include be used for provide rotary driving force servomotor, for clamp the fixture of workpiece with And installing plate, the drive shaft of the servomotor is erected on the installing plate by shaft coupling, and rotationally connected;It is described The shaft end of drive shaft and the fixture are affixed;The bottom of the installing plate and the motion end of the Industrial Robot Manipulator are consolidated Connect;
The burnishing device includes polishing disk body, the oval section volute spring array for buffering, for supporting abrasive particle Elastic layer, the top of the polishing disk body is provided with polishing chamber, the polishing disk body bottom portion and by motor-driven rotation work Make platform affixed, realize that polishing disk body rotates in a circumferential direction around central shaft;The polishing intracavitary bottom surface is equipped with oval section volute spring battle array Row;The oval section volute spring array upper surface is followed successively by elastic layer and abrasive grain layer, abrasive grain layer from top to bottom fills for moistening Sliding and radiating polishing fluid;The oval section volute spring array includes some separate oval section volute springs, the taper The inner bottom surface of the small-caliber end of helical spring and the polishing disk body is affixed, and the heavy caliber end of the oval section volute spring is connected with One hemispherical support, the arc curve of the hemispherical support is contacted with the lower surface of elastic layer;The edge of the elastic layer With the polishing cavity wall palette of the polishing disk body.
The drive shaft outer, coaxial socket tracheae that gap coordinates therewith of the servomotor;The two ends of tracheae respectively with phase The shaft coupling outer wall sealing answered is connected, wherein the air inlet of the tracheae is connected with external world's source of the gas, and gas outlet and fixture enter Gas port is connected.
The polishing chamber of the polishing disk body is provided with uviol lamp, and the uviol lamp is fixed on rotary table center, it is ensured that Uviol lamp is radiated in work pieces process area, corresponding polishing fluid rich in the photochemical catalyst that can promote to chemically react all the time.
The longitudinal direction of the oval section volute spring is highly consistent, and the oval section volute spring is along its axial phase from top to bottom Decrescence, adjoining spiral lift angle is decrescence for adjacent pitch.
The oval section volute spring is evenly distributed on the inner bottom surface of polishing disk body.
There is the space for being used for accommodating elastic layer redundancy section between the two neighboring hemispherical support arc-shaped curved surface.
The elastic layer is laminated film, and laminated film is made up of polymerization organosilicon and inorganic polymer, and thickness is 0.5mm~2mm.
Abrasive grain layer configuration of surface changes with the configuration of surface of workpiece to be processed, and elastic layer provides recuperability;The polishing Liquid is added on abrasive grain layer, and liquid level is higher than abrasive grain layer.Polishing fluid is immersed in inside abrasive grain layer and elastic layer, works as abrasive particle Layer is extruded by workpiece, and polishing liquid energy is passively released to be moistened to workpiece work surface body.Added in the polishing fluid TiO2And basic yellow 40.The adding set of the polishing fluid is positioned over the upside of whole polishing disk, by Action of Gravity Field plus Enter in processing district, according to polishing fluid due to processing, volatilization decrement, polishing fluid adds supplement automatically.The ultraviolet light is placed In the middle position of polishing disk, and be fixed on rotary table center, not with turntable rotational motion, always pair plus Work area domain is irradiated.Punch-pin workpiece is arranged on fixture, and the anglec of rotation of punch-pin is provided by servomotor to be finely adjusted.It is described Mounting plate is arranged on the motion end on the head of industrial robot.
The driving force of the elastic layer is alternatively spring or gas, liquid are provided.
The design of elastic layer can carry out small segmentation according to the form of work surface and polish.
The addition filter pump of polishing fluid enters action edge.
The beneficial effects of the invention are as follows:Because abrasive grain layer can be completely covered with convex mould surface form, therefore it can use The mode of overall polishing disposably polishes completion, without single-point polishing, and the operation of equipment is more convenient, reduces and is produced into This, and polishing estimate a little and integral face shape and design requirement control errors it is smaller, solve that irregular surface is unmanageable to ask Topic.In addition, using TiO2And basic yellow 40, the cobalt element in cobalt-base alloys is changed into soluble cobalt salt from slightly solubility material Material, and by way of ultraviolet catalytic, this process is accelerated, so as to improve processing efficiency.
Brief description of the drawings
Fig. 1 is the overall schematic of the present invention.
Fig. 2 is control machinery arm schematic diagram of the present invention.
Fig. 3 is the machining sketch chart of the present invention.
Fig. 4 is variation rigidity volute spring structure diagram of the present invention.
Fig. 5 is variation rigidity volute spring stress sketch of the present invention.
Fig. 6 is spring array polishing disk of the present invention (filled arrows are the rotation direction of polishing disk).
Embodiment
The present invention is further illustrated below in conjunction with the accompanying drawings
Referring to the drawings:
A kind of burnishing device with profiling abrasive particle group of the present invention of embodiment 1, including for providing six to workpiece Industrial robot 1, work holder 2, burnishing device 3 and the polishing fluid adding set 4 of free degree motion, industrial robot The motion end of 1 manipulator installs work holder 2;The filling opening of the polishing fluid adding set 4 is always positioned at the polishing The surface of device 3;
The work holder 2 includes being used to provide the servomotor 201 of rotary driving force, the folder for clamping workpiece Tool 203 and installing plate 205, the drive shaft of the servomotor 201 are erected on the installing plate 205 by shaft coupling, and It is rotationally connected;The shaft end of the drive shaft and the fixture 203 are affixed;The bottom of the installing plate 205 and the industry The motion end of the manipulator of robot 1 is affixed;
The burnishing device 3 includes polishing disk body 306, the oval section volute spring array 304 for buffering, for supporting The elastic layer 305 of abrasive particle, the top of the polishing disk body 306 is provided with polishing chamber, the bottom of polishing disk body 306 and by electricity The rotary table of machine driving is affixed, realizes that polishing disk body 306 rotates in a circumferential direction around central shaft;Polishing intracavitary bottom surface dress There is oval section volute spring array 304;The upper surface of oval section volute spring array 304 is followed successively by the He of elastic layer 305 from top to bottom The polishing fluid 301 for lubricating and radiating is filled on abrasive grain layer 303, abrasive grain layer 303;The oval section volute spring array 304 is wrapped Include some separate oval section volute springs, the small-caliber end of the oval section volute spring and the polishing disk body 306 Inner bottom surface is affixed, and the heavy caliber end of the oval section volute spring is connected with a hemispherical support, the arc of the hemispherical support Curve is contacted with the lower surface of elastic layer 305;The polishing intracavitary at the edge of the elastic layer 305 and the polishing disk body 306 Wall palette.
The drive shaft outer, coaxial socket tracheae that gap coordinates therewith of the servomotor;The two ends of tracheae respectively with phase The shaft coupling outer wall sealing answered is connected, wherein the air inlet of the tracheae is connected with extraneous source of the gas, gas outlet and fixture 203 Air inlet is connected;By the buffering of gas, the vibrations and collision in the process of workpiece 204 are reduced, shock-absorbing can be carried out.
The polishing chamber of the polishing disk body 306 is provided with uviol lamp 302, and the uviol lamp 302 is fixed on rotary table Center, it is ensured that uviol lamp 302, which is radiated to be rich in the processing district of workpiece 204, corresponding polishing fluid 301 all the time, can promote chemical reaction Photochemical catalyst.
The longitudinal direction of the oval section volute spring is highly consistent, and the oval section volute spring is along its axial phase from top to bottom Decrescence, adjoining spiral lift angle is decrescence for adjacent pitch.
The oval section volute spring is evenly distributed on the inner bottom surface of polishing disk body 306.
There is the sky for being used for accommodating the redundancy section of elastic layer 305 between the two neighboring hemispherical support arc-shaped curved surface Between.
The elastic layer 305 is laminated film, and laminated film is made up of polymerization organosilicon and inorganic polymer, and thickness is 0.5mm~2mm.
The configuration of surface of abrasive grain layer 303 changes with the configuration of surface of workpiece to be processed 204, and elastic layer 305 provides recuperability; The polishing fluid 301 is added on abrasive grain layer 303, and liquid level is higher than abrasive grain layer 303.Polishing fluid 301 is immersed in abrasive grain layer 303 and the inside of elastic layer 305, when extruding of the abrasive grain layer 303 by workpiece 204, polishing fluid 301 can be released passively to workpiece 204 work surface bodies are moistened.TiO is added in the polishing fluid 3012And basic yellow 40.The polishing fluid 301 Adding set is positioned over the upside of whole polishing disk, is added by Action of Gravity Field in processing district, according to polishing fluid 301 due to adding Work, volatilization decrement, addition is supplemented polishing fluid 301 automatically.The light of uviol lamp 302 is positioned over the middle position of polishing disk, and And rotary table center is fixed on, not with turntable rotational motion, machining area is irradiated always.Punch-pin work Part 204 is arranged on fixture 203, and the anglec of rotation of punch-pin is provided by servomotor to be finely adjusted.The mounting plate is installed Motion end on the head of industrial robot.
The driving force of the elastic layer 305 is alternatively spring or gas, liquid are provided.
The design of elastic layer 305 can carry out small segmentation according to the form of work surface and polish.
The addition filter pump of polishing fluid 301 enters action edge.
Fig. 4, the oval section volute spring shown in 5 are defined under oval section volute spring small-caliber end is, greatly by taking two-stage screw as an example Bore end is upper, i.e., the taper where the outline of oval section volute spring is inverted cone-shaped, is named as the first order successively from top to bottom Spiral, second level spiral, and the pitch Z of first order spiral1More than the pitch Z of second level spiral2;Corresponding first order spiral Corresponding lead angle θ1Lead angle θ corresponding more than second level spiral2;D1 is that oval section volute spring heavy caliber end place is cut The diameter of the corresponding inverted cone-shaped in face;D2 is the diameter of the corresponding inverted cone-shaped of tangent plane where oval section volute spring small-caliber end.
Shown in Fig. 5:Fa、FbThe external force at oval section volute spring heavy caliber end is respectively applied to, α is oval section volute spring Finely tune angle.
Content described in this specification embodiment is only enumerating to the way of realization of inventive concept, protection of the invention Scope is not construed as being only limitted to the concrete form that embodiment is stated, protection scope of the present invention also includes art technology Personnel according to present inventive concept it is conceivable that equivalent technologies mean.

Claims (7)

1. a kind of burnishing device with profiling abrasive particle group, it is characterised in that:Including for providing six-freedom motion to workpiece Industrial robot, work holder, burnishing device and polishing fluid adding set, the motion end of Industrial Robot Manipulator Work holder is installed;The filling opening of the polishing fluid adding set is always positioned at the surface of the burnishing device;
The work holder includes being used to provide the servomotor of rotary driving force, the fixture for clamping workpiece and peace Plate is filled, the drive shaft of the servomotor is erected on the installing plate by shaft coupling, and rotationally connected;The driving The shaft end of axle and the fixture are affixed;The bottom of the installing plate and the motion end of the Industrial Robot Manipulator are affixed;
The burnishing device includes polishing disk body, the oval section volute spring array for buffering and the elasticity for supporting abrasive particle Layer, the top of the polishing disk body is provided with polishing chamber, the polishing disk body bottom portion and by motor-driven rotary table It is affixed, realize that polishing disk body rotates in a circumferential direction around central shaft;The polishing intracavitary bottom surface is equipped with oval section volute spring array;Institute Stating oval section volute spring array upper surface and being followed successively by elastic layer and abrasive grain layer, abrasive grain layer to fill from top to bottom is used to lubricate and dissipate The polishing fluid of heat;The oval section volute spring array includes some separate oval section volute springs, the cone-type spiral bullet The inner bottom surface of the small-caliber end of spring and the polishing disk body is affixed, and the heavy caliber end of the oval section volute spring is connected with one and half Beaded support, the arc curve of the hemispherical support is contacted with the lower surface of elastic layer;The edge of the elastic layer with it is described The polishing cavity wall palette of polishing disk body.
2. a kind of burnishing device with profiling abrasive particle group as claimed in claim 1, it is characterised in that:The servomotor The drive shaft outer, coaxial socket tracheae that gap coordinates therewith;The two ends of tracheae seal phase with corresponding shaft coupling outer wall respectively Even, wherein the air inlet of the tracheae is connected with extraneous source of the gas, gas outlet is connected with the air inlet of fixture.
3. a kind of burnishing device with profiling abrasive particle group as claimed in claim 1, it is characterised in that:The polishing disk body Polishing chamber be provided with uviol lamp, the uviol lamp is fixed on rotary table center, it is ensured that uviol lamp is radiated at workpiece and added all the time Rich in the photochemical catalyst that can promote to chemically react in work area, corresponding polishing fluid.
4. a kind of burnishing device with profiling abrasive particle group as claimed in claim 1, it is characterised in that:The cone-type spiral bullet The longitudinal direction of spring is highly consistent, and axially adjacent segments are away from decrescence from top to bottom along it for the oval section volute spring, adjoining spiral liter Angle is decrescence.
5. a kind of burnishing device with profiling abrasive particle group as claimed in claim 4, it is characterised in that:The cone-type spiral bullet Spring is evenly distributed on the inner bottom surface of polishing disk body.
6. a kind of burnishing device with profiling abrasive particle group as claimed in claim 1, it is characterised in that:Two neighboring described half There is the space for being used for accommodating elastic layer redundancy section between beaded support arc-shaped curved surface.
7. a kind of burnishing device with profiling abrasive particle group as claimed in claim 6, it is characterised in that:The elastic layer is multiple Film is closed, laminated film is made up of polymerization organosilicon and inorganic polymer, thickness is 0.5mm~2mm.
CN201720254168.4U 2017-03-16 2017-03-16 A kind of burnishing device with profiling abrasive particle group Expired - Fee Related CN206614394U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201720254168.4U CN206614394U (en) 2017-03-16 2017-03-16 A kind of burnishing device with profiling abrasive particle group

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201720254168.4U CN206614394U (en) 2017-03-16 2017-03-16 A kind of burnishing device with profiling abrasive particle group

Publications (1)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106881659A (en) * 2017-03-16 2017-06-23 浙江工业大学 A kind of burnishing device with profiling abrasive particle group
CN108857600A (en) * 2018-07-25 2018-11-23 浙江工业大学 One kind being based on light-catalysed cobalt-base alloys processing method and processing platform

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106881659A (en) * 2017-03-16 2017-06-23 浙江工业大学 A kind of burnishing device with profiling abrasive particle group
CN108857600A (en) * 2018-07-25 2018-11-23 浙江工业大学 One kind being based on light-catalysed cobalt-base alloys processing method and processing platform

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20171107

Termination date: 20200316

CF01 Termination of patent right due to non-payment of annual fee