CN206139417U - Device for coating with atomization method is to diffuse source - Google Patents
Device for coating with atomization method is to diffuse source Download PDFInfo
- Publication number
- CN206139417U CN206139417U CN201621095703.8U CN201621095703U CN206139417U CN 206139417 U CN206139417 U CN 206139417U CN 201621095703 U CN201621095703 U CN 201621095703U CN 206139417 U CN206139417 U CN 206139417U
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- CN
- China
- Prior art keywords
- atomization
- nebulizer
- atomization gas
- gas
- solution
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model provides a device for coating with atomization method is to diffuse source. Its structure includes solution cup, atomizer, nebulizing gas pipe and nebulizing gas buffer, the solution cup is arranged in in the atomizer, the solution cup is used for holding diffusion source solution, the atomizer can atomize the diffusion source solution in the solution cup, nebulizing gas pipe connection the atomizer with the nebulizing gas buffer, the nebulizing gas that diffusion source solution formed after by the atomizing can follow in the nebulizing gas pipe entering nebulizing gas buffer. The nebulizing gas buffer can relax nebulizing gas's jet velocity, consequently coat the silicon chip again through the nebulizing gas behind the nebulizing gas buffer on, can guarantee the homogeneity of coating to solve the poor problem of current spraying homogeneity, still solved the problem that traditional tubular diffusion technique is complicated, the continuity is poor.
Description
Technical field
This utility model is related to diffusion source apparatus for coating, and specifically one kind is coated to diffusion source using atomization
Device.
Background technology
Common crystal silicon cell diffusion mode is spread for tubular type, and a few devices are using first in silicon chip surface preparation diffusion source
It is diffused in entering back into diffusion furnace.Have at present and diffusion source, such as Application No. are prepared in silicon chip surface using spraying coating process
200810000056.1 patent is used for coating the device in diffusion source in providing a kind of diffusion technique, and which includes a spray gun knot
Liquid state diffusion source in container is suctioned out using pressure-air and atomisation is coated on silicon chip surface by structure, but due to spray gun
Structure is excessively simple, and how much solution of ejection differs greatly, it is easy to cause coating solution uneven.Application No.
201410809882.6 patent provides a kind of boron diffusion source double-face spray painting device and method, and which passes through ejector to carrying bottom
Silicon chip on seat is sprayed, and process continuity is relatively good, and cost is also than relatively low, but spraying rate ratio in same spraying process
Comparatively fast, the amount of water smoke is not easily controlled so that the uniformity of spraying is relatively low.Have and spray equipment is applied to into crystal silicon cell flowing water
On production line, such as patent of Application No. 200820005020.8 provides a kind of fountain and spreads source conveyer device, the dress
Put including：Quartz diffusion tube and at least one quartzy air inlet pipe with least one perforate, treat that diffusion substrate is placed on quartz
In quartz boat in anemostat, the difference of quartz diffusion tube internal sources of impurities concentration distribution can be reduced using the device, it is to avoid base
Motion of the piece to air-flow produces stop.The uniformity of the more common tubular type diffusion energy improvement diffusion of the device, but device complexity
Time-consuming high, the device maintenance difficulty height of technique, process costs are caused with process complexity high.Application No. 201510105059.1
Patent provide a kind of phosphorus, perfect diffusion technique of boron liquid source, the technique it is two-sided it is thinning after silicon chip one side rotation apply
Covering liquid state boron source, is toasted, then rotary coating liquid phosphorus source again, and lamination, phosphorus source face and phosphorus source face, boron source are carried out after baking
Relative overlaying carry out on silicon boat a perfect diffusion two-by-two for face and boron source face.Process is simple, uniformity are also relatively good, but production
Efficiency is too low, it is difficult to meet the market demand.Therefore, traditional tubular type diffusion and the improvement type spread based on tubular type are respectively provided with
The shortcomings of complex process high cost；And the equal technique of diffusion way in conventional spraying diffusion source is coarse, spraying uniformity is relatively low.
Utility model content
The purpose of this utility model is just to provide the device that a kind of utilization atomization is coated to diffusion source, and the device can
By the atomization of diffusion source minimum drop to be deposited on silicon chip, process is simple and deposition uniformity is good, pollution-free energy consumption is low, can
It is applied to roll-type diffusion furnace continuously to spread.
What this utility model was realized in：The device that a kind of utilization atomization is coated to diffusion source, including solution
Cup, nebulizer, atomizing gas conduit and atomization gas buffer；The solution cup is placed in the nebulizer, the solution cup
For holding diffusion source solution, the diffusion source solution in solution cup can be atomized by the nebulizer；The atomization gas are led
Pipe connects the nebulizer and the atomization gas buffer, and spreading the atomization gas formed after source solution is atomized can be along mist
Activating QI body canal is entered in atomization gas buffer, can be coated on silicon chip by atomization gas buffer atomization gas out.
One end of the atomizing gas conduit connects the nebulizer, and the other end of the atomizing gas conduit is by being inverted
Conical hopper connection atomization gas buffer at the top of opening；It is provided with the bottom of the atomization gas buffer and can accommodates silicon
The opening of piece；Silicon chip is placed at the bottom opening of the atomization gas buffer, and the atomization gas in atomization gas buffer can
It is coated directly onto on silicon chip.
One end of the atomizing gas conduit connects the nebulizer, and the other end of the atomizing gas conduit is by being inverted
Conical hopper connection atomization gas buffer at the top of opening；In the bottom of the atomization gas buffer, one nozzle is set,
Silicon chip is placed in below the nozzle, and the atomization gas in atomization gas buffer are coated on silicon chip Jing after nozzle.
The nebulizer is ultrasound atomizer, air compression type nebulizer or net formula nebulizer.
Diffusion source solution mist formation gas, atomization gas Jing atomizing gas conduits can be entered by the nebulizer in this utility model
Enter atomization gas buffer, atomization gas buffer can relax the spouting velocity of atomization gas, therefore slow by atomization gas
The atomization gas rushed after device are repasted and are distributed on silicon chip, ensure that the uniformity of coating, so as to solve existing spraying uniformity
Poor problem, also solves conventional tubular diffusion technique complexity, the problem of poor continuity.
This utility model gives a kind of uniformity high diffusion source spraying method, and spray deposition it is simple to operate, without dirt
Dye, low cost, can have broad application prospects with roll-type diffusion furnace connected applications to production line.
Description of the drawings
Fig. 1 is structural representation of the present utility model.
In figure：1st, nebulizer, 2, solution cup, 3, atomizing gas conduit, 4, atomization gas buffer, 5, silicon chip, 6, be inverted
Conical hopper.
Specific embodiment
As shown in figure 1, utilization atomization provided by the utility model includes solution to the device that diffusion source is coated
Cup 2, nebulizer 1, atomizing gas conduit 3 and atomization gas buffer 4.Solution cup 2 is placed in nebulizer 1, and solution cup 2 is used to contain
Diffusion source solution is put, diffusion source solution can for example be the compound solution containing phosphorus or the compound solution containing boron；Diffusion
Source solution can be acid solution, or alkaline solution；Diffusion source solution can be aqueous solution, or alcoholic solution.
Nebulizer 1 is for being atomized to form atomization gas to the diffusion source solution in solution cup 2.Nebulizer 1 can be ultrasonic mist
Change device, air compression type nebulizer or net formula nebulizer etc..Ultrasound atomizer is the high-frequency resonant by ceramic atomizing piece（Frequency
Can be KHz to megahertz）, liquid molecule structure is broken up and atomization gas are produced.Air compression type nebulizer is by height
Body of calming the anger is become vaporific by the liquid that puff prot gushes out in impact solution cup.Net formula nebulizer is by the upper of ticker
Solution is extruded by lower vibrations by the hole of the net formula fog-spray nozzle of nozzle type, is sprayed using small ultrasonic activation and net formula
Head structure is spraying atomization gas.
Atomization gas buffer 4 is the free of contamination closed vessel of cleaning, is provided with and can be passed through atomization gas at the top of which
Opening.One end connection nebulizer 1 of atomizing gas conduit 3, the other end of atomizing gas conduit 3 pass through inverted conical hopper
Opening at the top of 6 connection atomization gas buffers 4.The atomization gas Jing that diffusion source solution in solution cup 2 is formed after being atomized
Atomizing gas conduit 3 is entered in atomization gas buffer 4 and is full of atomization gas buffer 4.Can be in atomization gas buffer 4
Bottom arranges a less opening, and at the opening connects nozzle, and silicon chip is placed in below nozzle, and so, atomization gas delay
The atomization gas rushed in device 4 can be sprayed and then are coated on silicon chip by nozzle.Can be with as shown in figure 1, buffering in atomization gas
The bottom of device 4 arranges one with 5 sizableness of silicon chip and can accommodate the opening of silicon chip 5, and silicon chip 5 is placed in atomization gas delays
Rush at the opening of 4 bottom of device, so, the atomization gas in atomization gas buffer 4 can adhere on silicon chip 5, form one layer
Even droplet, that is, realize spreading source solution coating on silicon chip.Can by controlling sedimentation time of the atomization gas on silicon chip
The thickness of drop on control silicon chip.
Claims (4)
1. the device that a kind of utilization atomization is coated to diffusion source, is characterized in that, including solution cup, nebulizer, atomization gas
Body canal and atomization gas buffer；The solution cup is placed in the nebulizer, and the solution cup is molten for holding diffusion source
Diffusion source solution in solution cup can be atomized by liquid, the nebulizer；The atomizing gas conduit connects the nebulizer
With the atomization gas buffer, spreading the atomization gas formed after source solution is atomized can enter mist along atomizing gas conduit
Change in gas cushion, can be coated on silicon chip by atomization gas buffer atomization gas out.
2. the device that utilization atomization according to claim 1 is coated to diffusion source, is characterized in that, the atomization gas
One end of body canal connects the nebulizer, and the other end of the atomizing gas conduit is by the connection atomization of inverted conical hopper
Opening at the top of gas cushion；The opening that can accommodate silicon chip is provided with the bottom of the atomization gas buffer；Silicon chip is placed in
At the bottom opening of the atomization gas buffer, the atomization gas in atomization gas buffer can be coated directly onto on silicon chip.
3. the device that utilization atomization according to claim 1 is coated to diffusion source, is characterized in that, the atomization gas
One end of body canal connects the nebulizer, and the other end of the atomizing gas conduit is by the connection atomization of inverted conical hopper
Opening at the top of gas cushion；One nozzle is set in the bottom of the atomization gas buffer, silicon chip is placed under the nozzle
Side, the atomization gas in atomization gas buffer are coated on silicon chip Jing after nozzle.
4. the device that utilization atomization according to claim 1 is coated to diffusion source, is characterized in that, the nebulizer
For ultrasound atomizer, air compression type nebulizer or net formula nebulizer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621095703.8U CN206139417U (en) | 2016-09-30 | 2016-09-30 | Device for coating with atomization method is to diffuse source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621095703.8U CN206139417U (en) | 2016-09-30 | 2016-09-30 | Device for coating with atomization method is to diffuse source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206139417U true CN206139417U (en) | 2017-05-03 |
Family
ID=58620358
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621095703.8U Expired - Fee Related CN206139417U (en) | 2016-09-30 | 2016-09-30 | Device for coating with atomization method is to diffuse source |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206139417U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108385089A (en) * | 2018-03-07 | 2018-08-10 | 北京环境特性研究所 | A kind of ultrasonic spray pyrolysis precipitation equipment and the method for preparing film using the device |
| CN109950347A (en) * | 2019-04-02 | 2019-06-28 | 河北大学 | A kind of preparation method of double-side cell |
| CN110465431A (en) * | 2019-08-28 | 2019-11-19 | 南方电网科学研究院有限责任公司 | A kind of adhesive coater for dry reactor |
-
2016
- 2016-09-30 CN CN201621095703.8U patent/CN206139417U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108385089A (en) * | 2018-03-07 | 2018-08-10 | 北京环境特性研究所 | A kind of ultrasonic spray pyrolysis precipitation equipment and the method for preparing film using the device |
| CN108385089B (en) * | 2018-03-07 | 2019-10-29 | 北京环境特性研究所 | A kind of ultrasonic spray pyrolysis precipitation equipment and the method for preparing film using the device |
| CN109950347A (en) * | 2019-04-02 | 2019-06-28 | 河北大学 | A kind of preparation method of double-side cell |
| CN110465431A (en) * | 2019-08-28 | 2019-11-19 | 南方电网科学研究院有限责任公司 | A kind of adhesive coater for dry reactor |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170503 Termination date: 20210930 |