CN206098354U - Etching device - Google Patents
Etching device Download PDFInfo
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- CN206098354U CN206098354U CN201620973587.9U CN201620973587U CN206098354U CN 206098354 U CN206098354 U CN 206098354U CN 201620973587 U CN201620973587 U CN 201620973587U CN 206098354 U CN206098354 U CN 206098354U
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- etching
- groove
- filter
- lautertuns
- pipeline
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Abstract
The utility model provides an etching device. The utility model discloses etching device includes 1 or a plurality of etching groove and filter -tank, be equipped with filter equipment in the filter -tank, the filter -tank passes through the pipeline with every etching groove respectively and links to each other, the filter -tank passes through the pipeline with circulating device and links to each other, circulating device passes through the pipeline with every etching groove respectively and links to each other. The utility model discloses etching device passes through circulating device, makes the etching liquid circulation flow, and the waste residue of only clearing up in the filter -tank can. The utility model discloses etching device has simple structure, but the cyclic utilization etching liquid can improve the advantages such as utilization efficiency of production efficiency and etching liquid. The utility model discloses etching device's application method is simple, can carry out etching process in succession, can improve the utilization efficiency of production efficiency and etching liquid.
Description
Technical field
The utility model is related to micro-electronic machining field, in particular to a kind of etching device.
Background technology
Etching technics refers to and the film layer do not sheltered by resist removed, so as to obtain on film with resist film
The technique of identical figure.In ic manufacturing process, through mask alignment, exposed and developed, on resist film
Required figure is run off, or is directly depicted on resist film with electron beam and is produced figure, then this figure accurately
It is transferred on the dielectric film below resist (such as silica, silicon nitride, polysilicon) or metallic film (such as aluminium and its alloy)
Go, produce required lamellar pattern.Etching is exactly to use chemistry, physics or while using method chemically and physically, have
It is complete with resist film so as to obtain on film selectively that a part of film layer removing do not sheltered by resist
Consistent figure.Lithographic technique is broadly divided into dry etching and wet etching.Dry etching mainly using reacting gas with wait from
Daughter is performed etching；Mainly there is chemical reaction with the material that is etched using chemical reagent and perform etching in wet etching.
Wherein wet etching is a kind of conventional lithographic method, mainly carves matte on more smooth face, so as to
Increase light path, reduce the reflection of light, hydrochloric acid of the available dilution of etching etc. as etching liquid.
Wet etching is that etachable material is immersed in the technology corroded in corrosive liquid.In simple terms, it is exactly middle school
The concept of chemical solution corrosion in class, it is a kind of pure chemistry etching, with excellent selectivity, has etched current film just
Can stop, the film without damaging following one layer of other materials.Due to all of semiconductor wet etching all have it is each to same
Property, so the either etching of oxide layer or metal level, the width of lateral etching is all close to the depth of vertical etch.So
One, will there is certain deviation in the pattern being etched out on the pattern and subsurface material of upper strata photoresist, also just cannot be high
Figure transfer and the work for replicating are completed to quality, therefore with the reduction of characteristic size, in figure transfer process substantially not
Reuse.
Wet etching needs to use etching groove equipment, as the container of splendid attire etching liquid, and carries out wet-etching technology
Reaction unit, material to be etched need to be soaked in the etching liquid in etching groove when using, with etching liquid etch away not by
The thin-film material of protection, but in the prior art, because unprotected thin-film material is etched in a large number in etching process
In etching liquid, with the carrying out of etching technics, substantial amounts of etching waste residue is will build up in etching groove, etching waste residue can be to etching technics
Impact is produced, needs sporadically to carry out shutdown cleaning, can only be discarded for waste residue accumulates excessive etching liquid, added again
Enter new etching liquid, then perform etching technique, cause existing lithographic technique cumbersome, etching liquid loss amount is big, etch efficiency
It is low.
In view of this, it is special to propose the utility model.
Utility model content
The purpose of this utility model is to provide a kind of etching device, and described etching device has simple structure, can follow
Ring utilizes etching liquid, it is possible to increase the advantages of the utilization ratio of production efficiency and etching liquid.
In order to realize above-mentioned purpose of the present utility model, spy employs the following technical solutions：
A kind of etching device, the etching device includes one or more etching grooves and lautertuns；It is provided with the lautertuns
Filter；The lautertuns is connected respectively with each etching groove by pipeline；The lautertuns passes through pipeline with EGR
It is connected, the EGR is connected respectively with each etching groove by pipeline.
The utility model etching device simple structure, constitutes closed circuit between etching groove, lautertuns and EGR, carve
Erosion liquid can be circulated between etching groove, lautertuns and EGR, and etching liquid is filtered by lautertuns, be filtered out
Due to the carrying out of etching technics, the waste residue being mixed with etching liquid, ensure that etching technics is continuously continual is carried out, Neng Gouti
The utilization ratio of high efficiency and etching liquid.
The filter is filter net device, and the filter net device includes one or more layers filter screen, and the filter net device will
Lautertuns is divided into the front groove of filter and filter pit, wherein groove is connected respectively with each etching groove by pipeline before filter, filters pit with circulation
Device is connected by pipeline.
Filter net device can be filtered effectively to the waste residue in etching liquid, it is ensured that the quality of filter liquor, it is ensured that etching work
Skill is normally carried out.Multistorey strainer mesh is set, filter efficiency is favorably improved, it is ensured that the quality of filter liquor.
Arbitrary etching groove location is higher than lautertuns tip position.
The position of etching groove is set above into lautertuns, contributes to making the etching liquid in etching groove rely on gravity, automatically
Flow out, in flowing to lautertuns, energy saving, it is ensured that etching liquid flows.
The lautertuns is connected respectively with each etching trench bottom by pipeline.
Etching liquid outlet in etching groove is arranged on into etching trench bottom, contribute to waste residue produced in etching groove and
When exclude, it is ensured that the quality of etching liquid in etching groove, it is ensured that etching technics is continuous, carry out efficiently, in high quality.
The EGR is higher than arbitrary etching groove top.
The position of EGR is set above into arbitrary etching groove, EGR can be filtered passing through in lautertuns
Etching liquid take out height, and along pipeline, by gravity, flow out automatically, in flowing to lautertuns, energy saving, it is ensured that etching liquid is circulated
Flowing.
The EGR is connected respectively with each etching groove top by pipeline.The etching liquid contributed to through filtering is suitable
Profit is flow back in etching groove, it is ensured that what etching liquid was circulated is smoothed out.
Each etching groove is connected respectively with feed tube.The feed tube be used for new etching liquid addition or supplement, it is described enter
Valve is preferably provided with liquid pipe, for controlling addition or the magnitude of recruitment of new etching liquid.
Cover plate is respectively provided with each etching groove.Contribute to preventing etching liquid to be contaminated.
Arrange on lautertuns and filter tank cover plate.Contribute to preventing etching liquid to be contaminated.
On every pipeline that the EGR is connected with each etching groove, valve is preferably respectively provided with, in certain etching
In the case that groove does not perform etching technique, valve closing can will be corresponded to, then etching liquid after filtering is no longer flow into the etching
In groove.
The EGR is preferably pump.
Preferably be respectively provided with spray equipment on each etching groove, spray equipment can to sticking in etching groove, pipeline go out/
The waste residue of porch carries out cleaning removing.
Functional electrode layer or silicon substrate surface in glass substrate can be etched into required shape by the utility model etching device
Shape.
Etching liquid can using acid etching liquid, by taking the ITO layer etching in glass substrate as an example, etching liquid can using HCL,
HNO3、H2The mixed solution of O, preferred volume ratio is HCL：HNO3：H2O=9:1:6, H in etching liquid+Concentration be preferably 6.5 ±
0.5mol/L。
A kind of using method of above-mentioned etching device, comprises the steps：
Etching liquid is added in etching groove, EGR is opened, makes etching liquid successively along etching groove, lautertuns, circulation dress
Put, the direction of etching groove is circulated flowing, and technique is performed etching in etching groove, according to actual conditions, in lautertuns
Waste residue is cleared up.
The using method process is simple of the utility model etching device, etching liquid reuse during to circulate, and
And filtered in time, it is ensured that the quality of etching liquid, can be entered according to actually used situation, the waste residue to accumulating in lautertuns
Go and clear up in time, this process is not required to shut down, and can be carried out continuously etching technics, it is possible to increase production efficiency and utilizing for etching liquid are imitated
Rate.
Compared with prior art, the beneficial effects of the utility model are：
The utility model etching device simple structure, constitutes closed circuit between etching groove, lautertuns and EGR, carve
Erosion liquid can be circulated between etching groove, lautertuns and EGR, and etching liquid is filtered by lautertuns, be filtered out
Due to the carrying out of etching technics, the waste residue being mixed with etching liquid, ensure that etching technics is continuously continual is carried out, Neng Gouti
The utilization ratio of high efficiency and etching liquid.The using method process is simple of the utility model etching device, etching liquid makes again
To circulate with during, and filtered in time, it is ensured that the quality of etching liquid, can according to actually used situation,
Waste residue to accumulating in lautertuns is cleared up in time, and this process is not required to shut down, and can be carried out continuously etching technics, it is possible to increase raw
Produce the utilization ratio of efficiency and etching liquid.
Description of the drawings
In order to be illustrated more clearly that the utility model specific embodiment or technical scheme of the prior art, below will be right
The accompanying drawing to be used needed for specific embodiment or description of the prior art is briefly described, it should be apparent that, describe below
In accompanying drawing be some embodiments of the present utility model, for those of ordinary skill in the art, do not paying creativeness
On the premise of work, can be with according to these other accompanying drawings of accompanying drawings acquisition.
Fig. 1 is a kind of structural representation of etching device that the utility model embodiment 1 is provided；
Reference：
1- etching grooves；2- lautertuns；3- filters；
4- EGRs；Groove before 5- filters；6- filters pit.
Specific embodiment
The technical solution of the utility model is clearly and completely retouched below in conjunction with the drawings and specific embodiments
State, it will be appreciated by those skilled in the art that following described embodiment is a part of embodiment of the utility model, and not
It is whole embodiments, is merely to illustrate the utility model, and is not construed as limiting scope of the present utility model.Based on this practicality
Embodiment in new, the every other reality that those of ordinary skill in the art are obtained under the premise of creative work is not made
Example is applied, the scope of the utility model protection is belonged to.Unreceipted actual conditions person in embodiment, according to normal condition or manufacturer
The condition of suggestion is carried out.Agents useful for same or the unreceipted production firm person of instrument, are the routine that can be obtained by commercially available purchase
Product.
In description of the present utility model, it should be noted that term " " center ", " on ", D score, "left", "right", " perpendicular
Directly ", the orientation or position relationship of the instruction such as " level ", " interior ", " outward " is, based on orientation shown in the drawings or position relationship, to be only
For the ease of describe the utility model and simplify description, rather than indicate or imply indication device or element must have it is specific
Orientation, with specific azimuth configuration and operation, therefore it is not intended that to restriction of the present utility model.Additionally, term " the
One ", " second ", " the 3rd " are only used for describing purpose, and it is not intended that indicating or implying relative importance.
In description of the present utility model, it should be noted that unless otherwise clearly defined and limited, term " peace
Dress ", " connected ", " connection " should be interpreted broadly, for example, it may be fixedly connected, or be detachably connected, or integratedly
Connection；Can be mechanically connected, or electrically connect；Can be joined directly together, it is also possible to be indirectly connected to by intermediary,
It can be the connection of two element internals.For the ordinary skill in the art, above-mentioned art can be understood with concrete condition
Concrete meaning of the language in the utility model.
A kind of etching device, the etching device includes one or more etching grooves 1 and lautertuns 2；In the lautertuns 2
It is provided with filter；The lautertuns 2 is connected respectively with each etching groove 1 by pipeline；The lautertuns 2 leads to EGR
Cross pipeline to be connected, the EGR is connected respectively with each etching groove 1 by pipeline.
The utility model etching device simple structure, between etching groove 1, lautertuns 2 and EGR closed circuit is constituted,
Etching liquid can be circulated between etching groove 1, lautertuns 2 and EGR, and etching liquid is filtered by lautertuns 2,
Filter out due to the carrying out of etching technics, the waste residue being mixed with etching liquid, ensure that etching technics is continuously continual is carried out,
It is capable of the utilization ratio of improve production efficiency and etching liquid.
The filter is filter net device, and the filter net device includes one or more layers filter screen of superposition, the filter screen
2 points by lautertuns of device is groove 5 before filter and filter pit 6, wherein groove 5 is connected respectively with each etching groove 1 by pipeline before filter, is filtered
Pit 6 is connected with EGR by pipeline.
Filter net device can be filtered effectively to the waste residue in etching liquid, it is ensured that the quality of filter liquor, it is ensured that etching work
Skill is normally carried out.Multistorey strainer mesh is set, filter efficiency is favorably improved, it is ensured that the quality of filter liquor.
The position of arbitrary etching groove 1 is higher than the tip position of lautertuns 2.
The position of etching groove 1 is set above into lautertuns 2, contributes to making the etching liquid in etching groove 1 rely on gravity, from
It is dynamic to flow out, in flowing to lautertuns 2, energy saving, it is ensured that etching liquid flows.
The lautertuns 2 is connected respectively with each bottom of etching groove 1 by pipeline.
Etching liquid outlet in etching groove 1 is arranged on into the bottom of etching groove 1, contributes to produced in etching groove 1 giving up
Slag is excluded in time, it is ensured that the quality of etching liquid in etching groove 1, it is ensured that etching technics is carried out continuously, efficiently, in high quality.
The EGR is higher than the top of arbitrary etching groove 1.
The position of EGR is set above into arbitrary etching groove 1, EGR will can be passed through in lautertuns 2
The etching liquid of filter takes out height, and along pipeline, by gravity, flows out automatically, in flowing to lautertuns 2, energy saving, it is ensured that etching liquid is followed
Circulation is moved.
The EGR is connected respectively with each top of etching groove 1 by pipeline.Contribute to the etching liquid through filtering
In smoothly flowing back into etching groove 1, it is ensured that what etching liquid was circulated is smoothed out.
Each etching groove 1 is connected respectively with feed tube.The feed tube be used for new etching liquid addition or supplement, it is described enter
Valve is preferably provided with liquid pipe, for controlling addition or the magnitude of recruitment of new etching liquid.
Cover plate is respectively provided with each etching groove 1.Contribute to preventing etching liquid to be contaminated.
The cover plate of lautertuns 2 is set on lautertuns 2.Contribute to preventing etching liquid to be contaminated.
On every pipeline that the EGR is connected with each etching groove 1, valve is preferably respectively provided with, in certain etching
In the case that groove 1 does not perform etching technique, valve closing can will be corresponded to, then etching liquid after filtering is no longer flow into the etching
In groove 1.
The EGR is preferably pump.
Preferably be respectively provided with spray equipment on each etching groove 1, spray equipment can to sticking in etching groove 1, pipeline
Waste residue at in/out mouth carries out cleaning removing.
Functional electrode layer or silicon substrate surface in glass substrate can be etched into required shape by the utility model etching device
Shape.
Etching liquid can using acid etching liquid, by taking the ITO layer etching in glass substrate as an example, etching liquid can using HCL,
HNO3、H2The mixed solution of O, preferred volume ratio is HCL：HNO3：H2O=9:1:6, H in etching liquid+Concentration be preferably 6.5 ±
0.5mol/L。
A kind of using method of above-mentioned etching device, comprises the steps：
Etching liquid is added in etching groove 1, EGR is opened, makes etching liquid successively along etching groove 1, lautertuns 2, circulation
Device, the direction of etching groove 1 are circulated flowing, and in etching groove 1 technique is performed etching, according to actual conditions, to lautertuns 2
In waste residue cleared up.
The using method process is simple of the utility model etching device, etching liquid reuse during to circulate, and
And filtered in time, it is ensured that the quality of etching liquid, can be according to actually used situation, to the waste residue accumulated in lautertuns 2
Cleared up in time, this process is not required to shut down, and can be carried out continuously etching technics, it is possible to increase the utilization of production efficiency and etching liquid
Efficiency.
The utility model etching device simple structure, between etching groove 1, lautertuns 2 and EGR closed circuit is constituted,
Etching liquid can be circulated between etching groove 1, lautertuns 2 and EGR, and etching liquid is filtered by lautertuns 2,
Filter out due to the carrying out of etching technics, the waste residue being mixed with etching liquid, ensure that etching technics is continuously continual is carried out,
It is capable of the utilization ratio of improve production efficiency and etching liquid.The using method process is simple of the utility model etching device, etching
Liquid is to circulate during reusing, and is filtered in time, it is ensured that the quality of etching liquid, can be according to actually used
Situation, the waste residue to accumulating in lautertuns 2 is cleared up in time, and this process is not required to shut down, and can be carried out continuously etching technics, can
The utilization ratio of improve production efficiency and etching liquid.
Embodiment 1
As shown in figure 1, the utility model embodiment 1 provides a kind of etching device, the etching device includes 2 etchings
Groove 1 and lautertuns 2；Filter is provided with the lautertuns 2；The lautertuns 2 passes through pipeline phase with each etching groove 1 respectively
Even；The lautertuns 2 is connected with EGR by pipeline, and the EGR passes through pipeline phase with each etching groove 1 respectively
Even.
The filter is filter net device, and the filter net device includes the multistorey strainer mesh structure of superposition, the filter screen dress
It is groove 5 before filter and filter pit 6 to put 2 points of lautertuns, wherein groove 5 is connected respectively with each etching groove 1 by pipeline before filter, after filter
Groove 6 is connected with EGR by pipeline.
Each position of etching groove 1 is above the tip position of lautertuns 2.Lautertuns 2 passes through respectively with each bottom of etching groove 1
Pipeline is connected.
The EGR is higher than the top of arbitrary etching groove 1 or lautertuns 2.The EGR respectively with each etching groove
1 top is connected by pipeline.
Each etching groove 1 is connected respectively with feed tube.
Cover plate is respectively provided with each etching groove 1.The cover plate of lautertuns 2 is set on lautertuns 2.
On every pipeline that the EGR is connected with each etching groove 1, valve is respectively provided with, in certain etching groove 1
In the case of not performing etching technique, valve closing can will be corresponded to, then etching liquid after filtering is no longer flow into the etching groove 1
In.
The EGR is pump.
Spray equipment is respectively provided with each etching groove 1.
The using method of above-mentioned etching device, comprises the steps：
Etching liquid is separately added into in 2 etching grooves 1 by feed tube, EGR is opened, makes etching liquid successively along quarter
Erosion groove 1, lautertuns 2, EGR, the direction of etching groove 1 are circulated flowing, and in etching groove 1 technique is performed etching, according to
Actual conditions, clear up the waste residue in lautertuns 2.
The present embodiment etching device simple structure, constitutes closed circuit between etching groove 1, lautertuns 2 and EGR, carve
Erosion liquid can be circulated between etching groove 1, lautertuns 2 and EGR, etching liquid be filtered by lautertuns 2, mistake
Leach due to the carrying out of etching technics, the waste residue being mixed with etching liquid, ensure that etching technics is continuously continual is carried out, energy
The utilization ratio of enough improve production efficiencies and etching liquid.The using method process is simple of the present embodiment etching device, etching liquid is again
To circulate during use, and filtered in time, it is ensured that the quality of etching liquid, can be according to actually used feelings
Condition, the waste residue to accumulating in lautertuns 2 is cleared up in time, and this process is not required to shut down, and can be carried out continuously etching technics, Neng Gouti
The utilization ratio of high efficiency and etching liquid.
Although illustrate and describing the utility model with specific embodiment, but will be appreciated that without departing substantially from this reality
With many other changes and modification can be made in the case of new spirit and scope.It is, therefore, intended that in appended power
Profit requires to include belonging to all such changes and modifications in the range of the utility model.
Claims (10)
1. a kind of etching device, it is characterised in that the etching device includes one or more etching grooves and lautertuns；The mistake
Filter is provided with filter pocket；The lautertuns is connected respectively with each etching groove by pipeline；The lautertuns and circulation dress
Put and be connected by pipeline, the EGR is connected respectively with each etching groove by pipeline.
2. a kind of etching device according to claim 1, it is characterised in that the filter is filter net device, described
Filter net device includes one or more layers filter screen, and lautertuns is divided into groove and filter pit before filter by the filter net device, wherein groove before filter
It is connected by pipeline with each etching groove respectively, filter pit is connected with EGR by pipeline.
3. a kind of etching device according to claim 1, it is characterised in that arbitrary etching groove location is higher than lautertuns top
Position.
4. a kind of etching device according to claim 1, it is characterised in that the lautertuns respectively with each etching groove bottom
Portion is connected by pipeline.
5. a kind of etching device according to claim 1, it is characterised in that the EGR is higher than arbitrary etching groove top
Portion.
6. a kind of etching device according to claim 1, it is characterised in that the EGR respectively with each etching groove
Top is connected by pipeline.
7. a kind of etching device according to claim 1, it is characterised in that each etching groove is connected respectively with feed tube.
8. a kind of etching device according to claim 1, it is characterised in that be respectively provided with cover plate on each etching groove.
9. a kind of etching device according to claim 1, it is characterised in that arrange on lautertuns and filter tank cover plate.
10. a kind of etching device according to claim 1, it is characterised in that the EGR and each etching groove phase
On every pipeline even, valve is respectively provided with.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620973587.9U CN206098354U (en) | 2016-08-29 | 2016-08-29 | Etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620973587.9U CN206098354U (en) | 2016-08-29 | 2016-08-29 | Etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206098354U true CN206098354U (en) | 2017-04-12 |
Family
ID=58473517
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620973587.9U Expired - Fee Related CN206098354U (en) | 2016-08-29 | 2016-08-29 | Etching device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206098354U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106328512A (en) * | 2016-08-29 | 2017-01-11 | 贵州乾萃科技有限公司 | Etching device and using method thereof |
-
2016
- 2016-08-29 CN CN201620973587.9U patent/CN206098354U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106328512A (en) * | 2016-08-29 | 2017-01-11 | 贵州乾萃科技有限公司 | Etching device and using method thereof |
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| CF01 | Termination of patent right due to non-payment of annual fee |
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