CN206069994U - The liner positive bias hose straightening device of multi-stage magnetic field arc ion plating - Google Patents
The liner positive bias hose straightening device of multi-stage magnetic field arc ion plating Download PDFInfo
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- CN206069994U CN206069994U CN201620564100.1U CN201620564100U CN206069994U CN 206069994 U CN206069994 U CN 206069994U CN 201620564100 U CN201620564100 U CN 201620564100U CN 206069994 U CN206069994 U CN 206069994U
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Abstract
The liner positive bias hose straightening device of multi-stage magnetic field arc ion plating, belongs to technical field of material surface treatment, and this utility model is to solve the problems, such as bulky grain is polluted to inside pipe wall in multi-stage magnetic field defecator cleaning and the loss during Plasma Transport.Device of the present utility model includes：Grid bias power supply, arc power, arc ion plating target source, multi-stage magnetic field device, multi-stage magnetic field power supply, liner positive bias hose straightening device, positively biased voltage source, sample stage, grid bias power supply kymographion and vacuum chamber, two, thin film deposition：Treat that the vacuum in vacuum room is less than 10‑4During Pa, it is passed through working gas and adjusts air pressure, open plated film power supply, the energy of compound plasma is adjusted by grid bias power supply simultaneously, the bulky grain defect in multi-stage magnetic field device is further eliminated by liner positive bias hose straightening device and efficiency of transmission of the arc-plasma in multi-stage magnetic field device is improved, technological parameter needed for arranging, carries out thin film deposition.
Description
Technical field
The present invention relates to the liner positive bias hose straightening device of multi-stage magnetic field arc ion plating, belongs to surface treatment technology of material
Field.
Background technology
During arc ion plating prepares thin film, due to arc speckle electric current density up to 2.5 ~ 5 × 1010A/m2, cause
Occurs the liquid metal of melting at the arc speckle position of target material surface, in the presence of local plasma pressure in droplets
Splash out, is attached to film surface or inlays formation " bulky grain " in the film（Macroparticles）Defect（Boxman
R L, Goldsmith S. Macroparticle contamination in cathodic arc coatings:
generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.）.
In arc-plasma, big is reached as the movement velocity of electronics was far longer than in the movement velocity of ion, unit interval
The electron number on grain surface is more than number of ions, makes bulky grain that elecrtonegativity is presented.It is the thin of micron or submicron relative to thickness rank
Film, size 0.1-10 microns bulky grain defect just as pollutions of the PM2.5 to air quality, the quality and property to thin film
There can be serious harm.It is increasingly extensive with thin-film material and thin film technique application, the solution of bulky grain defect problem with
It is no to become the bottleneck that arc ions electroplating method further develops, seriously constrain its answering in thin-film material of new generation preparation
With.
At present, it is also easy to produce greatly in the simple metal using low melting point or multicomponent alloy material to solve arc ions electroplating method
Grain defect problem, mainly filters out bulky grain using the method for Magnetic filter at present, and such as Chinese patent is used for material surface modifying
Plasma immersion and ion implantation device（Publication number：CN1150180, publication date：On May 21st, 1997）In adopt 90 °
Magnetic filter is filtered to the bulky grain of pulsed cathode arc, American scholar Anders et al. (Anders S, Anders A,
Dickinson M R, MacGill R A, Brown I G. S-shaped magnetic macroparticle filter
for cathodic arc deposition [J]. IEEE Trans Plasma Sci, 1997, 25(4): 670-
674.) and He'nan University Zhang Yujuan etc. (Zhang Yujuan, Wu Zhiguo, Zhang Weiwei etc. filtered cathode arc plasma prepares TiAlN thin film
Impact of the middle sedimentary condition to film texture. China YouSe Acta Metallurgica Sinica. 2004,14 (8):1264-1268.) in article
Middle " S " magnetic filter that made is filtered to the bulky grain of cathode arc, also American scholar Anders et al.（Anders
A, MacGill R A. Twist filter for the removal of macroparticles from cathodic
arc plasmas [J]. Surf Coat Tech, 2000, 133-134: 96-100.）The Twist filter's of proposition
Magnetic filter, although the efficiency of transmission that these methods have certain effect, plasma in terms of filtering and eliminating bulky grain is damaged
Lose seriously, substantially reduce ion current density.Based on can filter on the basis of bulky grain can guarantee that efficiency again, Chinese patent is true
Empty cathode arc straight filter (publication number：CN1632905, publication date：On June 29th, 2005) the middle side for proposing that straight tube is filtered
Method, but which in turn reduces filter effect.In a word, related research worker is by contrasting various Magnetic filter methods（Anders A.
Approaches to rid cathodic arc plasmas of macro- and nanoparticles: a review
[J]. Surf Coat Tech, 1999,120-121319-330. and Takikawa H, Tanoue H. Review of
cathodic arc deposition for preparing droplet-free thin films [J]. IEEE Trans
Plasma Sci, 2007, 35(4): 992-999.）It was found that arc ion plating plasma is kept after magnetic filter
High efficiency of transmission and elimination bulky grain are very difficult to take into account, and drastically influence application of the technology in high-quality thin-film deposition.
In addition using the electric field suppressing method for biasing on matrix, when back bias voltage is applied on matrix, electric field will be to electronegative big
Grain produces repulsive interaction, and then reduces the generation of film surface bulky grain defect.German scholar Olbrich et al.（Olbrich
W, Fessmann J, Kampschulte G, Ebberink J. Improved control of TiN coating
properties using cathodic arc evaporation with a pulsed bias [J]. Surf Coat
Tech, 1991, 49(1-3):258-262. and Fessmann J, Olbrich W, Kampschulte G, Ebberink
J. Cathodic arc deposition of TiN and Zr(C, N) at low substrate temperature
using a pulsed bias voltage [J]. Mat Sci Eng A, 1991, 140: 830-837.）Using pulse
Bias to replace traditional Dc bias, define a kind of new physical gas phase deposition technology --- pulsed bias arc ion plating
Technology, not only greatly reduces the oarse-grained number of film surface, also overcomes the substrate temperature mistake that Traditional DC bias causes
It is high, the problems such as stress in thin films is larger.Woods Guoqiang of Dalian University of Technology et al.（Woods Guoqiang. pulsed bias arc ion plating
Process ba- sis study [D]. and Dalian University of Technology, 2008. and Huang Meidong, woods Guoqiang, Dong Chuan, Sun Chao, hear immediately. partially
Influencing Mechanism [J] of the pressure to arc ion plating film surface appearance. Acta Metallurgica Sinica, 2003,39 (5): 510-515.）Pin
The mechanism that bulky grain defect is reduced is caused to conduct in-depth analysis to pulsed bias, by pulsed bias amplitude, frequency and arteries and veins
The adjustment of width and other processes parameter is rushed, the sheaths kinetic characteristic of arc-plasma can be improved, reduce film surface big
Grain defect counts, improve the quality of thin film, are widely used in actual production, but bulky grain can not be still completely eliminated and lack
Fall into.Domestic scholars（Wei Yongqiang, Zong Xiaoya, Jiang Zhiqiang, literary Zhenhua, Chen Liangji. multi-stage magnetic field straight tube Magnetic filter and pulse
The compound arc ions electroplating method of bias, publication number：CN103276362A, publication date：On September 4th, 2013）Propose many
The arc ions electroplating method that level magnetic field straight tube Magnetic filter is combined with pulsed bias, eliminates big by multi-stage magnetic field defecator
Grain defect simultaneously lifts the efficiency of transmission of plasma, but the pollution problem of inside pipe wall and the loss of inside pipe wall plasma do not have
It is well solved.Also scholar（Zhang Tao, Hou Junda, Liu Zhiguo, Zhang Yicong. the cathodic arc plasma of Magnetic filter
Body source and its film preparation [J]. Chinese Surface Engineering, 2002,02): 11-15+20-12.）The method for using for reference Bilek plates
（Bilek M M M, Yin Y, McKenzie D R, Milne W I A M W I. Ion transport
mechanisms in a filtered cathodic vacuum arc (FCVA) system [C]. Proceedings
of the Discharges and Electrical Insulation in Vacuum, 1996 Proceedings
ISDEIV, XVIIth International Symposium on, 1996: 962-966 vol.2）, in 90 degree of bend pipe magnetic
Apply positive bias to improve the efficiency of transmission of plasma on the bend pipe of defecator.
The content of the invention
The invention aims to be the simple metal or multicomponent alloy for solving conventional arc ion electroplating method using low melting point
Material and nonmetallic materials（Such as graphite）Bulky grain defect, flexure type Magnetic filter technology are also easy to produce as target and cause electric arc etc.
The low problem of gas ions efficiency of transmission, eliminates big contained in arc-plasma with reference to multi-stage magnetic field straight tube Magnetic filter method
Grain defect, while ensureing that arc-plasma passes through multi-stage magnetic field defecator with higher efficiency of transmission, makes surface of the work exist
Apply back bias voltage situation can continuously, it is fine and close prepare high-quality thin-film, while realize controlling constituent content addition in thin film,
The production cost using alloys target is reduced, the deposition efficiency of thin film is improved and is reduced bulky grain defect and thin film is grown and performance
Adverse effect, it is proposed that the liner positive bias hose straightening device of multi-stage magnetic field arc ion plating.
Device used in the present invention includes grid bias power supply 1, arc power 2, arc ion plating target source 3, multi-stage magnetic field device
4th, multi-stage magnetic field power supply 5, liner positive bias hose straightening device 6, positively biased voltage source 7, sample stage 8,9 and of grid bias power supply kymographion
Vacuum chamber 10；
In the device：
On the sample stage 8 that pending substrate work-piece is placed in vacuum chamber 10, workpiece and sample stage 8 connect the defeated of grid bias power supply 1
Go out end, arc ion plating target source 3 is arranged on vacuum chamber 10, connects the outfan of arc power 2, the magnetic at different levels of multi-stage magnetic field device 4
Field connects each outfan of multi-stage magnetic field power supply 5, and liner positive bias hose straightening device 6 connects the outfan of positively biased voltage source 7, and liner is just
Insulate between bias hose straightening device 6 and vacuum chamber 10 and multi-stage magnetic field device 4；
Thin film deposition：Evacuation in vacuum chamber 10, treats that the vacuum in vacuum chamber 10 is less than 10-4During Pa, work gas are passed through
Body is opened to 0.01Pa～10Pa, grid bias power supply 1 and grid bias power supply kymographion 9, the bias amplitude of the output of grid bias power supply 1,
Pulse frequency and pulse width modulation, the peak voltage of the output pulse of grid bias power supply 1 is 0～1.2kV, and pulse frequency is 0Hz
～80kHz, pulse width 1 ~ 90%；
Arc power 2 is opened, and the surface in arc ion plating target source 3 is cleaned by the spots moving of electric arc, and adjusting needs
The technological parameter wanted, the current value of the output of arc power 2 is 10 ~ 300A, adjusts multi-stage magnetic field device 4 by multi-stage magnetic field power supply 5,
Keep arc-plasma filtration elimination to be carried out in the 3 stable generation of arc ion plating target source and to bulky grain defect, make electric arc etc.
Gas ions reach matrix surface by multi-stage magnetic field device 4 with higher efficiency of transmission, carry out the fast deposition of thin film；
Positively biased voltage source 7 is opened, and liner positive bias hose straightening device 6 keeps direct current positive bias, output voltage to adjust, and liner is just
Bias hose straightening device 6 attracts to bulky grain, and depositing ions are repelled, and reduction plasma is in transmitting procedure in pipe
Loss, improve plasma efficiency of transmission and thin film deposition velocity, meanwhile, liner positive bias hose straightening device 6 can be fast
Quick-detach is installed, it is to avoid the problem of the inside pipe wall pollution cleaning of multi-stage magnetic field device 4, liner positively biased straightening under linerless board status
External diameter of the internal diameter of pipe device 6 more than arc ion plating target source 3, the external diameter of liner positive bias hose straightening device 6 are less than multi-stage magnetic field
The internal diameter of device 4, material may be selected 304 stainless steel materials of nonmagnetic, resistance to cleaning, and positively biased voltage source 7 is 0 ~+200V, directly
Stream voltage source, in deposition process can produce continual and steady attraction to bulky grain defect, greatly reduce bulky grain and pass through
The probability of multi-stage magnetic field device 4.
According to the needs of film preparation, adjusting related technological parameter carries out simple metal thin film, the change of different element ratios
It is prepared by compound ceramic membrane, function film and the high-quality thin-film with nanometer multilayer or gradient-structure.
Advantages of the present invention：A. liner positive bias hose straightening device can effectively be attracted to bulky grain, to depositing ions
Repelled, reduce loss of the plasma in transmitting procedure in pipe, further improve the efficiency of transmission of arc-plasma
With the deposition velocity of thin film；B. multi-stage magnetic field defecator can ensure the high efficiency of transmission of arc-plasma by the magnetic line of force,
Change the motion path of bulky grain defect eliminating the bulky grain defect in arc-plasma；C. the microcosmic of prepared thin film
Structure and performance can be adjusted by pulsed bias parameter, realized using the amplitude of pulsed bias, pulse width and frequency
The pinning effect that energetic ion is grown to thin film, improves the texture and stress state of thin film growth, improves bond strength；d.
Prepared thin film avoids bulky grain defect, and film crystal tissue is finer and close, can further improve the mechanical property of thin film
Energy.
The liner positive bias hose straightening device of multi-stage magnetic field arc ion plating, can with reference to using Traditional DC magnetron sputtering,
Pulsed magnetron sputtering, conventional arc ion plating and pulsed cathode arc and the compound bias of Dc bias, pulsed bias or DC pulse
Device carries out thin film deposition, prepares simple metal thin film, the compound ceramic thin film of different element ratios, function film and has
The high-quality thin-film of nanometer multilayer or gradient-structure.
Description of the drawings
Fig. 1 is the liner positive bias hose straightening device sketch of multi-stage magnetic field arc ion plating of the present invention.
Specific embodiment
Specific embodiment one：Present embodiment, present embodiment multi-stage magnetic field arc ion plating are illustrated with reference to Fig. 1
Liner positive bias hose straightening device institute use device include grid bias power supply 1, arc power 2, arc ion plating target source 3, multi-stage magnetic field
Device 4, multi-stage magnetic field power supply 5, liner positive bias hose straightening device 6, positively biased voltage source 7, sample stage 8, grid bias power supply waveform oscillography
Device 9 and vacuum chamber 10；
In the device：
On the sample stage 8 that pending substrate work-piece is placed in vacuum chamber 10, workpiece and sample stage 8 connect the defeated of grid bias power supply 1
Go out end, arc ion plating target source 3 is arranged on vacuum chamber 10, connects the outfan of arc power 2, the magnetic at different levels of multi-stage magnetic field device 4
Field connects each outfan of multi-stage magnetic field power supply 5, and liner positive bias hose straightening device 6 connects the outfan of positively biased voltage source 7, and liner is just
Insulate between bias hose straightening device 6 and vacuum chamber 10 and multi-stage magnetic field device 4；
Thin film deposition：Evacuation in vacuum chamber 10, treats that the vacuum in vacuum chamber 10 is less than 10-4During Pa, work gas are passed through
Body is opened grid bias power supply 1 and grid bias power supply kymographion 9, and adjusts the bias of the output of grid bias power supply 1 to 0.01Pa～10Pa
Amplitude, pulse frequency and pulse width, the peak voltage of the output pulse of grid bias power supply 1 is 0～1.2kV, and pulse frequency is 0Hz
～80kHz, pulse width 1 ~ 90%；
Arc power 2 is opened, and the surface in arc ion plating target source 3 is cleaned by the spots moving of electric arc, and adjusting needs
The technological parameter wanted, the current value of the output of arc power 2 is 10 ~ 300A, adjusts multi-stage magnetic field device 4 by multi-stage magnetic field power supply 5,
Keep arc-plasma arc ion plating target source 3 it is stable produce and bulky grain defect is carried out filtration elimination, electric arc etc. from
Daughter reaches matrix surface by multi-stage magnetic field device 4 with higher efficiency of transmission, carries out the fast deposition of thin film；
Positively biased voltage source 7 is opened, and liner positive bias hose straightening device 6 keeps direct current positive bias, is adjusted output voltage, is made liner
Positive bias hose straightening device 6 attracts to bulky grain, and depositing ions are repelled, and reduces plasma in the interior transmitting procedure of pipe
In loss, improve the deposition velocity of the efficiency of transmission and thin film of plasma, meanwhile, liner positive bias hose straightening device 6 can be with
Realization is quickly removed and installed, it is to avoid the problem of the inside pipe wall pollution cleaning of multi-stage magnetic field device 4 under linerless board status, liner is being just
External diameter of the internal diameter of bias hose straightening device 6 more than arc ion plating target source 3, the external diameter of liner positive bias hose straightening device 6 is less than more
The internal diameter of level magnetic field device 4, material may be selected 304 stainless steel materials of nonmagnetic, resistance to cleaning, and the parameter of positively biased voltage source 7 is 0
~+200V, is DC voltage, in deposition process can produce continual and steady attraction to bulky grain defect, is greatly reduced big
Probability of the granule by multi-stage magnetic field device 4.
The output waveform of grid bias power supply 1 is direct current, pulse, DC pulse is compound or multiple-pulse is compound.
The output direct current of arc power 2, pulse, DC pulse are compound or multiple-pulse is compound.
Arc ion plating target source 3 adopts the simple metal or multicomponent alloy material of high-melting-point or low melting point, it is possible to use single
Target, multiple targets or composition target, carry out simple metal thin film, the compound ceramic thin film of different element ratio, function film, polynary many
Layer, superlattices, the high-quality thin-film with nanometer multilayer or gradient-structure.
Working gas selects argon, or working gas from one or more in nitrogen, acetylene, methane, silane or oxygen
Mixed gas, prepare simple metal thin film, the compound ceramic thin film of different element ratio, function film, multi-component multi-layer, super
Lattice, the thin film with nanometer multilayer or gradient-structure.
The liner positive bias hose straightening device of multi-stage magnetic field arc ion plating, can utilize the positively biased of liner plate in hose straightening device
Pressure attracts to bulky grain, the bulky grain problem being prevented effectively from produced by low melting material；Depositing ions are repelled, is subtracted
Loss of few plasma in transmitting procedure in pipe, improves the deposition velocity of the efficiency of transmission and thin film of plasma；Liner
Positive bias hose straightening device can realize quickly removing and installing, it is to avoid the inside pipe wall pollution of multi-stage magnetic field device under linerless board status
The problem of cleaning；By adjusting applied back bias voltage parameter on workpiece, be conducive to improving the interval electricity of plasma between target base
Gesture is distributed, and fully attracts compound plasma to workpiece motion s, realizes the fast deposition of thin film；Arc ion plating is utilized simultaneously also
The generation of technology stably continues, the metallic plasma that ionization level is high, is conducive to high ionization level ion in the chemistry of surface of the work
Synthetic reaction, prepares the compound ceramic thin film of different element ratios, function film, multi-component multi-layer, superlattices and has gradient
The thin film or simple metal thin film of structure.
Specific embodiment two：Present embodiment is that the device is also capable of achieving another with the difference of embodiment one
Outer function：Can be with reference to Traditional DC magnetron sputtering, pulsed magnetron sputtering, conventional arc ion plating and pulsed cathode arc and direct current
The compound biasing device of bias, pulsed bias or DC pulse carries out thin film deposition, prepares simple metal thin film, different element ratios
Compound ceramic thin film, function film and the high-quality thin-film with nanometer multilayer or gradient-structure.
Specific embodiment three：Present embodiment with the difference of embodiment two is, multi-stage magnetic field arc ions
The liner positive bias hose straightening device connection of plating, arc power 2 are opened, and multi-stage magnetic field power supply 5 is opened and adjusts multi-stage magnetic field device 4, just
Grid bias power supply 7 is opened, and liner positive bias hose straightening device 6 keeps direct current positive bias, grid bias power supply 1 to open, and technical arrangement plan enters
Row foamed film is deposited, and prepares the multilayer films with different stress, microstructure and element ratio, other and reality
Apply mode two identical.
Specific embodiment four：Present embodiment with the difference of embodiment one is, multi-stage magnetic field arc ions
The liner positive bias hose straightening device connection of plating, arc power 2 are opened, and multi-stage magnetic field power supply 5 is opened and adjusts multi-stage magnetic field device 4, just
Grid bias power supply 7 is opened, and liner positive bias hose straightening device 6 keeps direct current positive bias, grid bias power supply 1 to open, and technical arrangement plan enters
Row foamed film is deposited, and combines Traditional DC magnetron sputtering, pulsed magnetron sputtering, conventional arc ion plating and pulsed cathode arc
Thin film deposition is carried out with the compound biasing device of Dc bias, pulsed bias or DC pulse, is prepared with different stress, micro-
The multilayer films of structure and element ratio are seen, other are identical with embodiment two.
Arc ion plating target source 3, multi-stage magnetic field device 4 and the liner positive bias straight tube dress of 2 sets or the above can be used
The liner positive bias hose straightening device for putting the multi-stage magnetic field arc ion plating of 6 cooperations is carried out with various simple metal elements and multicomponent alloy
Thin film deposition of the material for target, and combine Traditional DC magnetron sputtering, pulsed magnetron sputtering, conventional arc ion plating and pulse
Cathode arc carries out thin film deposition with the compound biasing device of Dc bias, pulsed bias or DC pulse, prepares with different stress
The multilayer films of state, microstructure and element ratio.
Claims (8)
1. the liner positive bias hose straightening device of multi-stage magnetic field arc ion plating, it is characterised in that the device include grid bias power supply 1,
Arc power 2, arc ion plating target source 3, multi-stage magnetic field device 4, multi-stage magnetic field power supply 5, liner positive bias hose straightening device 6, positively biased
Voltage source 7, sample stage 8, grid bias power supply kymographion 9 and vacuum chamber 10, liner positive bias hose straightening device 6 connect positively biased voltage source
7 outfan, insulate between liner positive bias hose straightening device 6 and vacuum chamber 10 and multi-stage magnetic field device 4；Pending substrate work-piece
On the sample stage 8 being placed in vacuum chamber 10, workpiece and sample stage 8 connect the outfan of grid bias power supply 1, and arc ion plating target source 3 is pacified
It is mounted on vacuum chamber 10, connects the outfan of arc power 2, the magnetic fields at different levels of multi-stage magnetic field device 4 connects each of multi-stage magnetic field power supply 5
Outfan, liner positive bias hose straightening device 6 connect the outfan of positively biased voltage source 7, liner positive bias hose straightening device 6 and vacuum chamber 10
Insulate and multi-stage magnetic field device 4 between.
2. the liner positive bias hose straightening device of multi-stage magnetic field arc ion plating according to claim 1, liner positively biased straightening
Activity insulation connection between pipe device 6 and multi-stage magnetic field device 4, liner positive bias hose straightening device 6 can be with apparent surface pollution level
In time dismounting cleaning and install, it is to avoid what under linerless board status, the inside pipe wall pollution of multi-stage magnetic field device 4 and being difficult to was cleared up asks
Topic, the internal diameter of liner positive bias hose straightening device 6 are more than the external diameter in arc ion plating target source 3, outside liner positive bias hose straightening device 6
Internal diameter of the footpath less than multi-stage magnetic field device 4, material may be selected 304 stainless steel materials of nonmagnetic, resistance to cleaning.
3. the liner positive bias hose straightening device of multi-stage magnetic field arc ion plating according to claim 1, in coating process,
Grid bias power supply 1, arc power 2, arc ion plating target source 3, multi-stage magnetic field device 4 and multi-stage magnetic field power supply 5 is coordinated to use, positive bias
Power supply 7 is opened, and liner positive bias hose straightening device 6 keeps direct current positive bias, adjusts output voltage, liner positive bias hose straightening device 6
Bulky grain is attracted, depositing ions are repelled, reduce loss of the plasma in transmitting procedure in pipe, improve etc.
The deposition velocity of the efficiency of transmission and thin film of gas ions, positively biased voltage source 7 are 0 ~+200V, and DC voltage power supply depositing
Continual and steady attraction can be produced to bulky grain defect in journey, greatly reduce bulky grain and reach thin by multi-stage magnetic field device 4
The probability on film surface.
4. the liner positive bias hose straightening device of multi-stage magnetic field arc ion plating according to claim 1, it is characterised in that institute
Use device also includes grid bias power supply kymographion 9, pulse voltage and current waveform that display grid bias power supply 1 sends, passes through
The output waveform of adjustment grid bias power supply 1, is effectively attracted to plated film ion, carries out the deposition and control deposition targets of thin film
Ratio in the film, realizes the regulation of plasma energy.
5. the liner positive bias hose straightening device of multi-stage magnetic field arc ion plating according to claim 1, it is characterised in that partially
The output pulse of voltage source 1 is pulse, DC pulse is compound or multiple-pulse is compound.
6. the liner positive bias hose straightening device of multi-stage magnetic field arc ion plating according to claim 1, it is characterised in that should
Device singly can cover or set combination more is thin to prepare simple metal thin film, the compound ceramic thin film of different element ratios, function
Film and the high-quality thin-film with nanometer multilayer or gradient-structure.
7. the liner positive bias hose straightening device of multi-stage magnetic field arc ion plating according to claim 1, it is characterised in that should
Device can with reference to using Traditional DC magnetron sputtering, pulsed magnetron sputtering, conventional arc ion plating and pulsed cathode arc with it is straight
The compound biasing device of stream bias, pulsed bias or DC pulse carries out thin film deposition, prepares simple metal thin film, different element ratios
The compound ceramic thin film of example, function film and the high-quality thin-film with nanometer multilayer or gradient-structure.
8. the liner positive bias hose straightening device of multi-stage magnetic field arc ion plating according to claim 1, it is characterised in that work
Argon, or working gas are selected from one or more in nitrogen, acetylene, methane, silane or oxygen of mixed gas as gas,
To prepare simple metal thin film, the compound ceramic thin film of different element ratios, function film and there is nanometer multilayer or gradient to tie
The high-quality thin-film of structure.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201620564100.1U CN206069994U (en) | 2016-06-12 | 2016-06-12 | The liner positive bias hose straightening device of multi-stage magnetic field arc ion plating |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620564100.1U CN206069994U (en) | 2016-06-12 | 2016-06-12 | The liner positive bias hose straightening device of multi-stage magnetic field arc ion plating |
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| CN206069994U true CN206069994U (en) | 2017-04-05 |
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| CN201620564100.1U Active CN206069994U (en) | 2016-06-12 | 2016-06-12 | The liner positive bias hose straightening device of multi-stage magnetic field arc ion plating |
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| CN109989017A (en) * | 2017-12-30 | 2019-07-09 | 魏永强 | The arc ion plating of combination field and liner bias ladder pipe composite filter |
| CN109989005A (en) * | 2017-12-30 | 2019-07-09 | 魏永强 | The arc ion plating of combination field and liner bias straight tube composite filter |
| CN109989019A (en) * | 2017-12-30 | 2019-07-09 | 魏永强 | A kind of combination field and the compound vacuum coating method of liner bias straight tube |
| CN109989014A (en) * | 2017-12-30 | 2019-07-09 | 魏永强 | A kind of combination field and the compound vacuum deposition method of liner bias straight tube |
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2016
- 2016-06-12 CN CN201620564100.1U patent/CN206069994U/en active Active
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109989017A (en) * | 2017-12-30 | 2019-07-09 | 魏永强 | The arc ion plating of combination field and liner bias ladder pipe composite filter |
| CN109989005A (en) * | 2017-12-30 | 2019-07-09 | 魏永强 | The arc ion plating of combination field and liner bias straight tube composite filter |
| CN109989019A (en) * | 2017-12-30 | 2019-07-09 | 魏永强 | A kind of combination field and the compound vacuum coating method of liner bias straight tube |
| CN109989014A (en) * | 2017-12-30 | 2019-07-09 | 魏永强 | A kind of combination field and the compound vacuum deposition method of liner bias straight tube |
| CN108569565A (en) * | 2018-05-10 | 2018-09-25 | 深圳市明远建筑科技有限公司 | A kind of sheath lubrication system, extruder head, equipment and lubricating method |
| CN108569565B (en) * | 2018-05-10 | 2024-01-23 | 佛山市砼艺智造科技有限公司 | Ionic layer lubrication structure, extrusion head, equipment and lubrication method |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20170327 Address after: 450015 Henan Province, Zhengzhou District, No. 27 University Road, No. 2 Patentee after: Zhengzhou Institute of Aeronautical Industry Management Address before: 27 University District Road 450015 Henan city of Zhengzhou province No. 2 Zhengzhou Institute of family hospital No. 26 building 4 unit 2 floor of the south door Patentee before: Wei Yongqiang |