CN205944024U - Cold cathode penning ion source - Google Patents
Cold cathode penning ion source Download PDFInfo
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- CN205944024U CN205944024U CN201620870605.0U CN201620870605U CN205944024U CN 205944024 U CN205944024 U CN 205944024U CN 201620870605 U CN201620870605 U CN 201620870605U CN 205944024 U CN205944024 U CN 205944024U
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- ion source
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- negative electrode
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Abstract
The utility model discloses a cold cathode penning ion source, this cold cathode penning ion source positive pole adopt hidden fixed knot to construct, and the target is close to the surface of arc chamber and adopts concave structures, conical structure about the negative pole is drawn forth and is adopted, voltage on the positive pole passes through the feed -in of anode connection post, negative plate, target overcoat, flange, the equal ground connection of target weld flange to keep insulating with the anodal through ceramic flange and insulating flange. The utility model provides when beam intensity is drawn to the height, lengthen the life of ion source greatly, reduced use cost. Can draw forth 1~5 mA's D line, life is greater than 500 hours, but all parts all adopt detachable structure, when can conveniently change damageable parts, have stayed very big space for the optimization of its parameter, have improved holistic economic benefits.
Description
Technical field
The utility model belongs to accelerator facility field, more particularly, to a kind of cold-cathode Penning ion source.
Background technology
Deuterium deuterium（D-D）With deuterium tritium（D-T）Fusion reaction accelerator neutron generator is important monoenergetic neutrons（Abbreviation neutron is sent out
Raw device）, can be widely applied to Nuclear Data measurement, nuclear fusion stack basic research, military project basic research, fast neutron application technology etc. each
Individual aspect.The feature of D-D and D-T fusion reaction is that, under relatively low D beam energy, have larger reaction cross-section, you can with low
D ion beam can be accelerated by accelerator, bombard deuterium titanium（TiD）Target or tritium titanium（TiT）There is deuterium deuterium in target（D-D）Or deuterium tritium（D-T）Fusion
Reaction produces strong fast neutron, and the D beam intensity on target is directly proportional the yield of fast neutron to bombardment.In order to ensure 100-120
KV/D-D accelerator for neutron production neutron yield is more than 1 × 108The technical indicator of n/s, on target, D line have to be larger than 1 mA, therefore proposes
Minimize the index that ionogenic educt beaming flow must reach about 2 mA.
With regard to current technology of ion source, double plasma sources, radio frequency ion source, ecr ion source etc. all can be readily available stronger
D ion beam.Wherein, radio frequency ion source, ecr ion source need using high frequency electric source and microwave source, there is high frequency and microwave spoke
Penetrate problem, interference can be produced to the measurement electronic system of correlation analysis instrument and accelerator for neutron production control system.Double plasmas
The power supply in source is dc source, noiseless, and line is easy to reach 2 mA, and in Lanzhou University, large-scale high current neutron is sent out
Successful Application on raw device, its shortcoming is that burn-out life is shorter.A class is also had to be Penning ion source, its structure and power-supply system ratio
Double plasma sources are also simple, and the life-span is up to thousands of hours, and extensively applies on sealing neutron tube.
Content of the invention
The purpose of the utility model embodiment is to provide a kind of cold-cathode Penning ion source it is intended to solve existing cold cathode
The problem that Penning ion source educt beaming flow intensity is not high, service life is shorter.
The utility model embodiment provides a kind of cold-cathode Penning ion source, and the anode of described cold-cathode Penning ion source is adopted
Use concealed fastening structure, near the surface of arc chamber, concave structure is adopted to negative electrode, the fairlead on negative electrode is using double up and down
Conical structure.
The utility model beneficial effect includes：
The scheme that the utility model embodiment provides：
1）The concealed fastening structure of anode solves substantially because sputtering particle is in negative electrode and anode, to negative electrode and anode
Between deposition lead to its short-circuit problem；
2）Near electric discharge chamber surface, concave structure is adopted to negative electrode, reduces the born cation to negative electrode unit area and bang
The power density hit, has delayed significantly due to the problem that lead to Penning ion source cisco unity malfunction impaired to cathode surface；With
When, because same ion bombards same material with identical energy, the secondary electron yield of oblique incidence enters than vertically
The secondary electron yield penetrated is bigger, also can increase the anticathode secondary electricity of positive ion bombardment to the concave structure of cathode surface
Sub- emission ratio, which improves the indoor plasma density of electric discharge, and then improves educt beaming flow intensity；
3）On negative electrode, one of effect of upper conical structure of fairlead is to carry out mechanical compress to the ion drawn, and increases
The ion concentration of educt beaming flow, this achieves highly desirable effect on double plasma sources；The effect of this structure another one is to increase
The big secondary electron yield of positive ion bombardment negative electrode, improves the indoor plasma density of electric discharge.This two effects
Educt beaming flow intensity can be improved.
4）On negative electrode, the effect of the lower conical structure of fairlead is to draw formation one under acceleration electrode effect
More preferable meniscus.
Therefore, the scheme being provided using the utility model embodiment, compared to prior art, can greatly prolong cold cathode Pan
Rather ionogenic service life, improves educt beaming flow intensity, reduces use cost.The D line of 1 ~ 5 mA can be drawn, using the longevity
Life is more than 500 hours；All parts all using Demountable, while conveniently replaced easily worn part, to its parameter
Optimize and leave very big space, improve overall economic benefit.
Brief description
Fig. 1 is the structural representation of the cold-cathode Penning ion source that the utility model embodiment provides.
Fig. 2 is the cold-cathode Penning ion source internal electric field equipotential mapping that the utility model embodiment provides.
Fig. 3 is distribution diagram of magnetic line of force in the cold-cathode Penning ion source that the utility model embodiment provides.
Fig. 4 is the magnetic field distribution at the central axis of cold-cathode Penning ion source that the utility model embodiment provides
Figure.
Fig. 5 is that the line of the cold-cathode Penning ion source that the utility model embodiment provides draws ichnography.
In figure：1st, minus plate；2nd, negative electrode；3rd, cathode flange；4th, target overcoat；5th, anode；6th, excitation wire bag；7th, right
Cathode support flange；8th, to negative electrode；9th, copper coil frame flange；10th, ceramic flange；11st, insulating flange；12nd, adpting flange；
13rd, to cathode weld flange；14th, bar assembly is adjusted to negative electrode；15th, suction nozzle；16th, anode terminal；17th, first true group of empty envelope
Dress O-ring seal；18th, second group of Vacuum Package O-ring seal.
Specific embodiment
In order that the purpose of this utility model, technical scheme and advantage become more apparent, with reference to embodiments, to this
The utility model is further elaborated.It should be appreciated that specific embodiment described herein is only in order to explain book
Utility model, is not used to limit the utility model.
Below in conjunction with the accompanying drawings structure of the present utility model is explained in detail.
Refer to Fig. 1 to Fig. 5：
Pass through negative electrode 2 from negative electrode 2 or to the electronics of negative electrode 8 transmitting or added during to electric field between negative electrode 8 and anode 5
Speed, reaches and is decelerated and reversely accelerates again to before negative electrode 8 or negative electrode 2, that is, electronics is between negative electrode 2 anode 5 is to negative electrode 8
Electric field action under vibrate back and forth in axial direction, and excitation wire bag 6 produce axial magnetic field effect under for the helical movement.
Negative electrode 2, anode 5 and the space that negative electrode 8 is surrounded are referred to as arc chamber.D gas is injected by suction nozzle 15, via right
Negative electrode adjusts thick stick assembly 14 and enters arc chamber to the aperture opened on negative electrode 8.Axially vibrate back and forth and electronics for the helical movement
Ionization enters the indoor D gas of electric discharge, is allowed to dissociate, ionizes and produce plasma.The plasma of the indoor generation of electric discharge exists
Drawn by the fairlead on negative electrode 2 in the presence of drawing electric field and form D ion beam current.
Voltage on anode 5 passes through anode terminal 16 feed-in.Whole ion gun external flanges are all grounded, including minus plate
3rd, target overcoat 4, adpting flange 12, to cathode weld flange 13, and kept by ceramic flange 11 and insulating flange 12
With anode 5 good insulation.When anode institute making alive is 5 kV, cold-cathode Penning ion source internal electric field equipotential EDS maps are for example attached
Shown in Fig. 2, maximum field is 22.1kV/cm, and the limit value much smaller than high vacuum breakdown electric field 100kV/cm is it is ensured that stable fortune
OK.
In order to ensure the indoor axis magnetic field that discharges, anode 5 is processed by non-magnetic stainless steel, external diameter 30 mm,
Internal diameter 20 mm, long 32 mm；Copper coil frame flange 9 and cathode support flange 7 is formed by magnetic stainless steel or Copper fabrication,
Remaining flange is all processed using pure iron or magnetic stainless steel；Combined with cathode should select the big material of secondary electron yield
Material is considered with resistance to certain high temperature, and negative electrode 2 and the material to negative electrode 8 all select to be processed by molybdenum, and the cone angle of negative electrode 2 is 45 °,
Be 29 mm to the radius of a ball of negative electrode 8 spherical surface, anode 5 and negative electrode 2 and to negative electrode 8 between distance be 3.5 mm.Simulate
Magnetic field distribution at magnetic line of force distribution and central axis in negative electrode Penning ion source is respectively as in accompanying drawing 3 and accompanying drawing 4
Shown.From analog result, line bag 6 can reach 2500 Guss in the magnetic field of the indoor generation of electric discharge, fully achieves constraint
The purpose of electronics.
During in order to ensure that cold-cathode Penning ion source is used on compact D-D accelerator for neutron production, on target, beam spot diameter, is less than
20 mm, also use the conical design similar to expansion cup system effect to negative electrode 2 near the direction drawn.Defeated using PIC particle
The fortune software line that obtains of simulation draws as shown in Figure 5, and beam spot diameter, on target for the line, in 15 mm, meets and sets
Meter requires.
The utility model Examples An anode adopts concealed fastening structure, adopts spill to tie near electric discharge chamber surface on negative electrode
Structure, negative electrode is drawn and is adopted upper and lower bi-conical structure, while improving educt beaming flow intensity, greatly prolongs its service life, fall
Low use cost, can draw the D line of 1 ~ 5 mA, and service life is more than 500 hours；All parts are all using detachable knot
Structure, while conveniently replaced easily worn part, leaves very big space to the optimization of its parameter, improves overall economic effect
Benefit.
The foregoing is only preferred embodiment of the present utility model, not in order to limit the utility model, all this
Any modification, equivalent and improvement made within the spirit of utility model and principle etc., should be included in the utility model
Protection domain within.
Claims (10)
1. a kind of cold-cathode Penning ion source is it is characterised in that the anode of described cold-cathode Penning ion source is using concealed solid
Fixed structure, adopts concave structure to negative electrode near the surface of arc chamber, and the fairlead on negative electrode adopts upper and lower bi-conical structure.
2. cold-cathode Penning ion source as claimed in claim 1 is it is characterised in that by ceramic flange and insulating flange by anode
It is fixed on the upper end of copper coil frame flange, and keep the insulation with copper coil frame flange.
3. cold-cathode Penning ion source as claimed in claim 1 it is characterised in that the described section to negative electrode spill be circle,
Circular radius are 29 mm.
4. cold-cathode Penning ion source as claimed in claim 1 is it is characterised in that extraction bellmouth upper and lower side on described negative electrode
It is circle, wherein upper conical and circular radius is respectively 10 mm and 1.5 mm, inferior pyramidal and circular radius are respectively
1.5 mm and 26.5 mm, the spacing of upper inferior pyramidal is 2 mm.
5. cold-cathode Penning ion source as claimed in claim 1 is it is characterised in that it is 1.5 mm that negative electrode draws pore radius.
6. cold-cathode Penning ion source as claimed in claim 1 is it is characterised in that anode and negative electrode, anode and to cathode support
Spacing between flange is 3.5 mm.
7. cold-cathode Penning ion source as claimed in claim 1 is it is characterised in that the distance between anode and negative electrode can pass through
Negative electrode adjusting rod is adjusted in the range of 0mm-19 mm.
8. cold-cathode Penning ion source as claimed in claim 1 is it is characterised in that anode is processed by non-magnetic stainless steel,
Copper coil frame flange and cathode support flange being formed by magnetic stainless steel or Copper fabrication, minus plate, cathode flange, centre
Electrode jacket, adpting flange, cathode weld flange is all processed using pure iron or magnetic stainless steel.
9. cold-cathode Penning ion source as claimed in claim 1 is it is characterised in that the magnetic field of described cold-cathode Penning ion source
Source is electromagnet.
10. a kind of cold-cathode Penning ion source is it is characterised in that include described cold cathode penning as arbitrary in claim 1 ~ 9
Ion gun.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620870605.0U CN205944024U (en) | 2016-08-12 | 2016-08-12 | Cold cathode penning ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620870605.0U CN205944024U (en) | 2016-08-12 | 2016-08-12 | Cold cathode penning ion source |
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| Publication Number | Publication Date |
|---|---|
| CN205944024U true CN205944024U (en) | 2017-02-08 |
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| CN201620870605.0U Active CN205944024U (en) | 2016-08-12 | 2016-08-12 | Cold cathode penning ion source |
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| CN (1) | CN205944024U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106057614A (en) * | 2016-08-12 | 2016-10-26 | 兰州大学 | Cold-cathode penning ion source |
-
2016
- 2016-08-12 CN CN201620870605.0U patent/CN205944024U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106057614A (en) * | 2016-08-12 | 2016-10-26 | 兰州大学 | Cold-cathode penning ion source |
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