CN205774780U - Stacking-type Sputting film-plating apparatus - Google Patents
Stacking-type Sputting film-plating apparatus Download PDFInfo
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- CN205774780U CN205774780U CN201620673701.6U CN201620673701U CN205774780U CN 205774780 U CN205774780 U CN 205774780U CN 201620673701 U CN201620673701 U CN 201620673701U CN 205774780 U CN205774780 U CN 205774780U
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- room
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- carrying room
- film
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Abstract
This utility model relates to optical film technology field, especially a kind of stacking-type Sputting film-plating apparatus, it is characterized in that: the side of described vacuum film coating chamber is provided with carrying room, the inner chamber of described carrying room and the intracavity inter-connection of described vacuum film coating chamber, connectivity part between both inner chambers is conveyance mouth, described enter, slice room is connected with described carrying room respectively, the inner chamber of described carrying room with described enter, the intracavity inter-connection of slice room, described carrying room with described enter, connectivity part between chamber, slice indoor is respectively CD feeding port and piece mouth, by carrying room with enter, the cooperation of slice room, realize the handling of described substrate.The utility model has the advantages that: improve substrate handler efficiency；Be conducive in vacuum film coating chamber, arrange multiple sputtering source, improve plated film efficiency；Compact conformation, floor space are little, operation cost is low.
Description
Technical field
This utility model relates to optical film technology field, especially a kind of stacking-type Sputting film-plating apparatus.
Background technology
Improve plated film efficiency and coating quality, the expansion plated film scope of application are the targets that technical field of vacuum plating is pursued.
In recent years, the electronics market such as smart mobile phone, panel computer is flourish；Correspondingly, the quality-improving of these intelligent terminal
Also the coating technique of touch screen needed for this series products is proposed requirements at the higher level.Among these, how to realize large area (such as,
17 inches) high speed of substrate, uniform coated be one of coating technique developing focus.
At present, the application of automatization's continuous way magnetron sputtering coater is the most increasingly extensive.For large-area substrates plated film, two
Individual main technical specification is film thickness uniformity and production capacity.In order to promote coating film thickness uniformity, can be at vacuum film coating chamber
Rotary work frame is installed in central area, and substrate is vertically placed with the side-wall outer side at cylindrical workpiece frame, is revolved by substrate
The mode turned promotes film thickness uniformity.Sputtering target material is then arranged on the sidewall of vacuum film coating chamber.For planar substrates, above-mentioned
In work rest rotary course, on substrate, the radius of turn of each point is different, may result in sputtering target material to planar substrates not
The distance of co-located, thus cause the inconsistent of thicknesses of layers；It is apparent from, for the substrate of specific dimensions, work rest interior
Film thickness uniformity on the least then planar substrates in footpath is the poorest.Therefore, for the vacuum film coating chamber of aforementioned installation rotary work frame,
Increase further its internal diameter, the radius of curvature of work rest periphery shared by each substrate can be made bigger, be more beneficial for realizing good
Uniformity.
Increase along with vacuum coating cavity, it is necessary to be pointed to the sputtering target material on the sidewall of cavity surrounding, ion source
Etc. carrying out rational deployment.In general, sputtering target material quantity should be many to meet the requirement of plated film speed as far as possible, improve plated film effect
Rate.Meanwhile, the sidewall in cavity surrounding also needs to configure ion source, evaporation source, upper slice (entering sheet) passage, bottom sheet (slice) passage
Deng functional part, to meet specific film-forming process demand and the needs of automated handling substrate.The handling of film plating substrate are impacts
One key factor of plated film efficiency.In vacuum sputtering film plating machine, a carrying room can be set, upper slice and bottom sheet all remove from this
Room is sent to pass through.Detailed process is, in the case of rotatable workpiece frame shelfful, work rest is rotated by self, and by machinery
Hands, can take off the substrate having plated film from work rest successively；Thereafter, the substrate taken off is carried to plated film by carrying room
Outside cavity；Then, non-film plating substrate is carried in plated film cavity by carrying room, and work rest rotates again by self, and
By mechanical hand, non-film plating substrate is placed sequentially in work rest corresponding plated film station.In this substrate conveyance mode, although
By the help of mechanical hand, upper and lower process can be carried out under vacuum conditions, vacuum film coating chamber need not vacuum breaker again, but by
Being completely separate operation in upper and lower process, in a handling substrate flow process, rotatable workpiece frame needs to rotate two weeks, with complete
Become the exchange of substrate on all stations, the longest.Another kind of upper and lower sheet mode is both-end pattern, i.e. at vacuum film coating chamber
On two conveyance mouths are set: arrival end and the port of export, corresponding two ports, a carrying room is respectively set.So, work rest is passed through
Rotation and the cooperation of mechanical hand, upper and lower can carry out simultaneously, save handling time.But for large area substrates, two
Carrying room region shared by the internal diameter of vacuum coating cavity is relatively big, have impact on putting of the functional parts such as sputtering target material, because of
This, have impact on plated film improved efficiency.
Summary of the invention
The purpose of this utility model is according to above-mentioned the deficiencies in the prior art, it is provided that stacking-type Sputting film-plating apparatus,
On the basis of vacuum film coating chamber only arranges a carrying room, arrange into sheet room and slice room, in conjunction with film-coating workpiece frame rotation and
The manipulation of mechanical hand, completes the handling of substrate, improves substrate handler efficiency.
This utility model purpose realizes being completed by techniques below scheme:
A kind of stacking-type Sputting film-plating apparatus, for substrate is carried out plated film, described coating apparatus at least includes Vacuum Deposition
Film room, entering sheet room and slice room, the inner chamber of described vacuum film coating chamber is the plated film space of described substrate, described divides into and out of sheet room
Yong Yu be into and out of sheet, it is characterised in that:
The side of described vacuum film coating chamber is provided with carrying room, and the inner chamber of described carrying room is interior with described vacuum film coating chamber
Chamber is connected, and the connectivity part between both inner chambers is conveyance mouth, is provided with transport mechanism, described transporter in described carrying room
Structure realizes the described conveyance cause for gossip that is transported through in described carrying room of the described substrate and shows described carrying room and described Vacuum Deposition
Substrate exchange between film room；
Described be connected with described carrying room respectively into and out of sheet room, the inner chamber of described carrying room with described into and out of sheet room
Intracavity inter-connection, described carrying room and described connectivity part between chamber, sheet indoor are respectively CD feeding port and piece mouth, in institute
State and be respectively arranged with Jin Pian mechanism and slice mechanism into and out of sheet indoor, described realize described substrate respectively in institute into and out of sheet mechanism
State into and out of being transported through in sheet room described existing described into and out of the substrate between sheet room and described carrying room into and out of sheet cause for gossip
Exchange.
Described vacuum coating indoor are provided with rotatable substrate frame, and described substrate frame has the described substrate of some carryings
Station, described transport mechanism coordinates described rotatable substrate frame to realize the handling of substrate.
The transport mechanism of described carrying room includes mechanical hand and screw mandrel module, wherein said mechanical hand be used for realizing described in remove
Sending the substrate between room and described vacuum film coating chamber to exchange, described screw mandrel module is used for realizing described substrate in described carrying room
Conveying.
It is divided into described described Jin Pian mechanism, slice mechanism into and out of sheet room and all includes mechanical hand and belt conveyor,
Wherein said mechanical hand is described into and out of the substrate exchange between sheet room and described carrying room, described belt conveyor for realizing
Structure should with realize described substrate in described conveying in sheet room.
The utility model has the advantages that: improve substrate handler efficiency；Be conducive in vacuum film coating chamber, arrange multiple spattering
Penetrate source, improve plated film efficiency；Compact conformation, floor space are little, operation cost is low.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
Detailed description of the invention
This utility model feature and other correlated characteristic are described in further detail by embodiment below in conjunction with accompanying drawing,
So that the understanding of technical staff of the same trade:
As it is shown in figure 1, labelling 1-28 is expressed as in figure: vacuum film coating chamber 1, substrate frame 2, substrate 3, rotating mechanism
4, coating source 5, ion source 6, evaporation source 7, vacuum pump 8, carrying room 9, conveyance mouth 10, carrying room mechanical hand 11, leading screw mould
Group 12, enter sheet room 13, slice room 14, CD feeding port 15, piece mouth 16, enter sheet room mechanical hand 17, enter sheet room belt conveyor
18, slice room mechanical hand 19, slice room belt conveyor 20, substrate position 21, substrate position 22, substrate position 23, substrate position 24,
Enter sheet room valve 25, slice room valve 26, substrate position 27, substrate position 28.
Embodiment: as it is shown in figure 1, stacking-type Sputting film-plating apparatus includes vacuum film coating chamber 1, vacuum coating in the present embodiment
The inner chamber of room 1 is as the plated film space of substrate 3.The center of vacuum film coating chamber 1 is provided with substrate frame 2, in substrate frame 2
It is provided with substrate position 27 and the substrate position 28 of some carrying substrates 3.Rotating mechanism 4 it is provided with, rotation in the center of substrate frame 2
Rotation mechanism 4 external connection power so that substrate frame 2 can rotate under the driving of rotating mechanism 4, thus ensure to be carried in substrate frame 3
The plated film homogeneity of substrate.The inwall of vacuum film coating chamber 1 is respectively arranged with some coating sources 5, ion source 6, evaporation source 7
With vacuum pump 8, wherein coating source 5 and evaporation source 7 are sputtering source, and ion source 6 is used for exciting coating source 5 and evaporation source 7, vacuum
Pump 8 is for by the inner chamber evacuation of vacuum film coating chamber 1.
As it is shown in figure 1, be provided with carrying room 9, the inner chamber of carrying room 9 and vacuum film coating chamber 1 in the side of vacuum film coating chamber 1
Intracavity inter-connection, connectivity part between the two for conveyance mouth 10.At conveyance mouth 10, valve can be set, by the keying of valve
Control the connected state between vacuum film coating chamber 1 and carrying room 9, it is ensured that the vacuum film coating chamber 1 vacuum when plated film.In conveyance
It is provided with in room 9 and there is the carrying room mechanical hand 11 pushed with clamping function and there is the leading screw module 12 of conveying function, wherein
Leading screw module 12 is used for substrate 3 from closing on the position being transported to close on conveyance mouth 10 into and out of the position of sheet room, carrying room machinery
In substrate 3 is transported to vacuum film coating chamber 1 by hands 11 and be installed among the station in substrate frame 2.So, in vacuum coating
Room 1 is only provided with a conveyance mouth 10, it is to avoid multiple conveyance mouth occupy-places, is conducive in vacuum film coating chamber 1, arrange multiple spattering
Penetrate source, improve plated film efficiency.
As it is shown in figure 1, be respectively arranged with into sheet room 13 and slice room 14 in the both sides of carrying room 9, enter sheet room 13, slice room
The inner chamber of 14 connects with the inner chamber composition of carrying room 9 respectively, and carrying room 9 and the connectivity part entered between sheet room 13 are CD feeding port 15,
Connectivity part between carrying room 9 and slice room 14 is piece mouth 16.Uncoated substrate 3 enters via CD feeding port 15 from entering sheet room 13
Enter carrying room 9 and be installed in substrate frame 2 via conveyance mouth 10 by the carrying room mechanical hand 11 in carrying room 9, completing
The substrate 3 of plated film is then unloaded from substrate frame 2 by carrying room mechanical hand 11, returns carrying room 9 via conveyance mouth 10 internal, so
After return to slice room 14 via piece mouth 16 again.Enter sheet room 13, carrying room 9, slice room 14 may be contained within the same of vacuum film coating chamber 1
Side, has compact conformation, floor space is little, operation cost is a low advantage.
As it is shown in figure 1, be provided with into sheet room mechanical hand 17 in entering sheet room 13, enter sheet room belt conveyor 18, enter sheet
It is provided with the substrate position of some carrying substrates 3 on room belt conveyor 18, enters sheet room belt conveyor 18 and can will not plate
The substrate 3 of film is delivered to substrate position 21 from its substrate position 22, and substrate position 21 is close in into sheet room mechanical hand 17 so that enter sheet room machine
Tool hands 17 can capture the non-film plating substrate 3 being positioned on substrate position 21 and be transported to the leading screw module of carrying room 9 via CD feeding port 15
On 12.It is provided with into sheet room valve 25 at the end entering sheet room 13, enters sheet room valve 25 for isolating ambient atmosphere, by opening and closing
Enter sheet room valve 25 to control into sheet room 13 and extraneous connected state；When substrate 3 needs to be externally routed to entering into sheet room 13
During the belt conveyor 18 of sheet room, enter sheet room valve 25 and open, and when substrate 3 needs to be transported among carrying room 9 and by removing
When sending room mechanical hand 11 to be transported in vacuum film coating chamber 1, enter sheet room valve 25 and close, enter the internal evacuation in sheet room 13 simultaneously, protect
Demonstrate,prove its internal vacuum identical with the vacuum in vacuum film coating chamber 1, it is to avoid vacuum film coating chamber 1 loses vacuum state and needs weight
New evacuation.
As it is shown in figure 1, the internal structure of slice room 14 is identical with the internal structure entering sheet room 13, including slice room mechanical hand
19, slice room belt conveyor 20, slice room belt conveyor 20 is provided with the substrate position of some carrying substrates 3, goes out
The substrate 3 of plated film can be delivered to substrate position 24 from its substrate position 23 by sheet room belt conveyor 20, and substrate position 23 is close in
Slice room mechanical hand 19, slice room mechanical hand 19 can capture the film plating substrate 3 being positioned on leading screw module 12 and be placed into
On slice room belt conveyor 20, export to outward via slice room belt conveyor 20.The effect of slice room valve 26 and
The effect of slice room valve 25 is identical, therefore repeats no more.
The present embodiment has a following film plating process:
1, enter sheet room 13 and enter sheet: non-film plating substrate 3 from enter enter at sheet room valve 25 internal into sheet room 13 and be carried on into
On sheet room belt conveyor 18.Along entering the sheet room belt conveyor 18 conveying direction from 22 to substrate position, substrate position 21,
Non-film plating substrate 3 is transported on substrate position 21 one by one, now enters sheet room mechanical hand 17 and captures one by one and be positioned on substrate position 21
Non-film plating substrate 3 is also passed through CD feeding port 15 and is placed on the substrate position on the leading screw module 12 of carrying room 9, and this substrate position refers to
Be the substrate position being close in CD feeding port 15.
2, carrying room 9 load: while entering the conveyance of sheet room mechanical hand 17, leading screw module 12 rotates forward, non-film plating substrate 3 with
The rotation leading screw module is transported to be close in the substrate position of carrying room mechanical hand 11 from the substrate position being close in CD feeding port 15,
Carrying room mechanical hand 11 is captured non-film plating substrate 3 and is attached it in substrate frame 2 by conveyance mouth 10.Now, utilization has
It is two in substrate frame 2 that the substrate frame 2 of rotating mechanism 4 completes the installation of non-film plating substrate 3, i.e. substrate position 27 and substrate position 28
Adjacent stations, when substrate 3 is already installed on time on the position of substrate position 27, drives substrate frame 2 to revolve counterclockwise by rotating mechanism 4
Turning, make substrate position 28 alignment conveyance mouth 10, carrying room mechanical hand 11 just can carry out the installation of the non-film plating substrate of next block 3.
3, carrying room 9 unloading piece: after substrate 3 plated film completes, carrying room mechanical hand 11 is by transporting mouth 10 by plated film
Substrate 3 takes off from substrate frame 2 and is placed on leading screw module 12, and now leading screw module 12 inverts, and makes film plating substrate 3 from silk
The substrate position closing on carrying room mechanical hand 11 on thick stick module 12 is delivered to close on the substrate position of piece mouth 16.
4, slice room 14 slice: slice room mechanical hand 19 captures the film plating substrate on leading screw module 12 by piece mouth 16
3 and be placed on slice room belt conveyor 20.Along slice room belt conveyor 20 from 23 to substrate position, substrate position 24
Conveying direction, film plating substrate 3 is transported on substrate position 24 one by one, is exported to outward by slice room valve 26 afterwards.
On the basis of vacuum film coating chamber 1 only arranges a carrying room 9, arrange into sheet room 13 and slice room 14, in conjunction with base
Rotating and the manipulation of each mechanical hand of horse 2, completes the handling of substrate 3, improves the handling efficiency of substrate 3.
The present embodiment is in the specific implementation: because ensureing that the conveyance flow process of carrying room 9 is uninterruptedly impact entirety carrying effect
The key condition of rate, the motion of other mechanisms can be carried out, such as under the conditions of meeting this parallel: enters sheet room 13 and slice room 14
Flow process can carry out simultaneously.
Although design and the embodiment of this utility model purpose is elaborated by above example referring to the drawings,
But those skilled in the art will realize that under the precondition limiting scope without departing from claim, still may be used
This utility model is made various modifications and variations, such as: the concrete structure of each parts, relative position etc., therefore at this most one by one
Repeat.
Claims (4)
1. a stacking-type Sputting film-plating apparatus, for substrate is carried out plated film, described coating apparatus at least includes vacuum coating
Room, entering sheet room and slice room, the inner chamber of described vacuum film coating chamber is the plated film space of described substrate, described into and out of sheet room respectively
For into and out of sheet, it is characterised in that:
The side of described vacuum film coating chamber is provided with carrying room, the inner chamber phase of the inner chamber of described carrying room and described vacuum film coating chamber
Connection, the connectivity part between both inner chambers is conveyance mouth, is provided with transport mechanism in described carrying room, and described transport mechanism is real
Show the described conveyance cause for gossip that is transported through in described carrying room of the described substrate and show described carrying room and described vacuum film coating chamber
Between substrate exchange；
Described it is connected with described carrying room respectively into and out of sheet room, the inner chamber of described carrying room and the described inner chamber into and out of sheet room
Being connected, described carrying room and described connectivity part between chamber, sheet indoor are respectively CD feeding port and piece mouth, described
It is respectively arranged with Jin Pian mechanism and slice mechanism into and out of sheet indoor, described realizes described substrate respectively described into and out of sheet mechanism
Described hand over into and out of the substrate between sheet room and described carrying room into and out of being transported through in sheet room is described into and out of sheet cause for gossip is existing
Change.
A kind of stacking-type Sputting film-plating apparatus the most according to claim 1, it is characterised in that: described vacuum coating indoor set
Being equipped with rotatable substrate frame, described substrate frame has the station of the described substrate of some carryings, described transport mechanism coordinates institute
State rotatable substrate frame and realize the handling of substrate.
A kind of stacking-type Sputting film-plating apparatus the most according to claim 1, it is characterised in that: the transporter of described carrying room
Structure includes mechanical hand and screw mandrel module, and wherein said mechanical hand is for realizing between described carrying room and described vacuum film coating chamber
Substrate exchanges, and described screw mandrel module is for realizing the conveying in described carrying room of the described substrate.
A kind of stacking-type Sputting film-plating apparatus the most according to claim 1, it is characterised in that: it is divided into described into and out of sheet
The described Jin Pian mechanism of room, slice mechanism all include that mechanical hand and belt conveyor, wherein said mechanical hand are used for realizing institute
State into and out of between sheet room and described carrying room substrate exchange, described belt conveyor should with realize described substrate described
Conveying in sheet room.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620673701.6U CN205774780U (en) | 2016-06-30 | 2016-06-30 | Stacking-type Sputting film-plating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620673701.6U CN205774780U (en) | 2016-06-30 | 2016-06-30 | Stacking-type Sputting film-plating apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205774780U true CN205774780U (en) | 2016-12-07 |
Family
ID=58129054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620673701.6U Withdrawn - After Issue CN205774780U (en) | 2016-06-30 | 2016-06-30 | Stacking-type Sputting film-plating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205774780U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105887030A (en) * | 2016-06-30 | 2016-08-24 | 光驰科技(上海)有限公司 | Stack type sputter coating device and coating method thereof |
| CN107663625A (en) * | 2017-10-20 | 2018-02-06 | 爱发科豪威光电薄膜科技(深圳)有限公司 | Lacing film feed device and optical coating apparatus |
-
2016
- 2016-06-30 CN CN201620673701.6U patent/CN205774780U/en not_active Withdrawn - After Issue
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105887030A (en) * | 2016-06-30 | 2016-08-24 | 光驰科技(上海)有限公司 | Stack type sputter coating device and coating method thereof |
| CN105887030B (en) * | 2016-06-30 | 2018-07-31 | 光驰科技(上海)有限公司 | Stacking-type Sputting film-plating apparatus and its film plating process |
| CN107663625A (en) * | 2017-10-20 | 2018-02-06 | 爱发科豪威光电薄膜科技(深圳)有限公司 | Lacing film feed device and optical coating apparatus |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20161207 Effective date of abandoning: 20180731 |