CN205263773U - Touch -sensitive component - Google Patents
Touch -sensitive component Download PDFInfo
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- CN205263773U CN205263773U CN201520965388.9U CN201520965388U CN205263773U CN 205263773 U CN205263773 U CN 205263773U CN 201520965388 U CN201520965388 U CN 201520965388U CN 205263773 U CN205263773 U CN 205263773U
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- Prior art keywords
- sensitization
- wire
- lead
- insulating barrier
- touch
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- Expired - Fee Related
Links
- 206010070834 Sensitisation Diseases 0.000 claims abstract description 84
- 230000008313 sensitization Effects 0.000 claims abstract description 84
- 230000004888 barrier function Effects 0.000 claims description 59
- 239000000758 substrate Substances 0.000 claims description 30
- 230000006870 function Effects 0.000 claims description 22
- 239000011248 coating agent Substances 0.000 claims description 20
- 238000000576 coating method Methods 0.000 claims description 20
- 238000002834 transmittance Methods 0.000 claims description 4
- 239000003595 mist Substances 0.000 claims description 3
- 238000002310 reflectometry Methods 0.000 claims description 3
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 abstract 2
- 230000005611 electricity Effects 0.000 abstract 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 12
- 229910052709 silver Inorganic materials 0.000 description 12
- 239000004332 silver Substances 0.000 description 12
- 238000011161 development Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 7
- 239000002002 slurry Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 229920005644 polyethylene terephthalate glycol copolymer Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
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Abstract
The utility model relates to a touch -sensitive component. This touch -sensitive component includes: the basement, including the visible area at middle part and be located the marginal zone in the visible area outside, the basement has relative first surface and second surface, transparent conducting film locates on the first surface to be located the visible area, be used for confirming the touch point coordinates, the lead wire is located on the first surface to be located the marginal zone, and be connected with the transparent conducting film electricity, the sensitization insulating layer is located on the first surface to be located the marginal zone, and cover on the lead wire. Touch -sensitive component can effectively avoid the wire to switch on.
Description
Technical field
The utility model relates to touch technology field, particularly relates to a kind of touch sensible element.
Background technology
In the time forming the touch sensible element of touch-screen, conventionally first form ITO conductive layer on a surface of the substrate providing, wherein, substrate comprises the visible area at middle part and is positioned at the marginal zone of visible area outer periphery. Again ITO conductive layer is processed, formed the nesa coating with default conductive pattern at the visible area of substrate. Then form at the non-visible area of substrate the silver slurry wire being electrically connected with nesa coating. In test process, find the easy conducting of adjacent two silver slurry wires separately, cause insulation to decline and even short circuit, and then affect the performance of product.
Utility model content
Based on this, be necessary to provide a kind of touch sensible element that can effectively avoid wire conducting.
A kind of touch sensible element, comprising:
Substrate, comprises the visible area at middle part and is positioned at the marginal zone in described visible area outside, described substrate has relative first surface and second surface;
Nesa coating, is located on described first surface, and is positioned on described visible area, for determining touch point coordinate;
Lead-in wire, is located on described first surface, and is positioned on described marginal zone, and be electrically connected with described nesa coating; And
Sensitization insulating barrier, is located on described first surface, and is positioned on described marginal zone, and is covered on described lead-in wire.
In above-mentioned touch sensible element; by setting up sensitization insulating barrier to cover lead-in wire on first surface, thereby can avoid steam to infiltrate in lead-in wire, and then can protect preferably lead-in wire; thereby avoid the conducting of adjacent two lead-in wires, and then improved the production yield of touch-screen. And the material that forms sensitization insulating barrier has photosensitive property, thus can be by using mask plate and photoresistance that certain figure is transferred on photosensitive layer, more logical exposure and development treatment, can obtain sensitization insulating barrier. Whole making technology is simple, is applicable to volume production equalization.
In an embodiment, described sensitization insulating barrier is sensitization heat-insulating layer therein.
In an embodiment, described sensitization insulating barrier is transparent sensitization heat-insulating layer therein.
In an embodiment, described sensitization insulating barrier is alkaline transparent sensitization heat-insulating layer therein.
In an embodiment, the light transmittance of described sensitization insulating barrier is greater than 91% therein, and mist degree is less than 5%, and reflectivity is less than 5%.
In an embodiment, described lead-in wire is photosensitive silver slurry line therein.
In an embodiment, the thickness of described sensitization insulating barrier is greater than the thickness of described lead-in wire therein, and the thickness of described lead-in wire is 0.003～0.005 millimeter, and the thickness of described sensitization insulating barrier is 0.005～0.015 millimeter.
In an embodiment, the thickness of described sensitization insulating barrier is 0.008 millimeter therein.
In an embodiment, described first surface has binding portion and function part therein, and described binding portion and described function part are all positioned on described marginal zone;
Described nesa coating comprises many touch-control electrodes that are intervally arranged, and the number of described lead-in wire is identical with the number of described touch-control electrode, and one end of each lead-in wire is electrically connected with a touch-control electrode, and the other end is collected to described binding portion;
Described sensitization insulating barrier is located on described function part, and the shape of described sensitization insulating barrier and many described lead-in wires to be positioned at the shape of the definite figure of part on described function part similar.
Brief description of the drawings
Fig. 1 is the structural representation of the touch sensible element of an embodiment;
Fig. 2 is touch sensible element in Fig. 1 structural representation during without sensitization insulating barrier;
Fig. 3 is the profile of setting up on Fig. 2 after sensitization dielectric substrate;
Fig. 4 is the profile of Fig. 1.
Detailed description of the invention
Below in conjunction with drawings and the specific embodiments, touch sensible element is further described.
As shown in Figures 1 and 2, the touch sensible element 10 of an embodiment. This touch sensible element 10 comprises substrate 100, nesa coating 200, lead-in wire 300 and sensitization insulating barrier 400.
Substrate 100 comprises the visible area 110 at middle part and is positioned at the marginal zone 120 in visible area 110 outsides. Substrate 100 has relative first surface 130 and second surface (not shown). Wherein, first surface 130 has binding portion 132 and function part 134, and binding portion 132 and function part 134 are all positioned on marginal zone 120. Concrete, in the present embodiment, substrate 100 is PETG (polyethyleneterephthalate, PET) film. In other embodiments, substrate 100 can be glass plate.
Nesa coating 200 is for determining the coordinate of touch point. Nesa coating 200 is located on first surface 130, and is positioned on visible area 110. Concrete, in the present embodiment, nesa coating 200 comprises many touch-control electrodes 210 that are intervally arranged. Nesa coating 200 is tin indium oxide (Indiumtinoxide, ITO) film.
Lead-in wire 300 is located on first surface 130, and is positioned on marginal zone 120, and is electrically connected with nesa coating 200. Concrete, in the present embodiment, the number of lead-in wire 300 is many, and identical with the number of touch-control electrode 210, a plurality of leads 300 spaces. One end of each lead-in wire 300 is electrically connected with a touch-control electrode 210, and the other end is collected to binding portion 132. Thereby can be communicated with external circuit by flexible PCB at 132 places of binding portion.
Sensitization insulating barrier 400 is located on first surface 130, and is positioned on marginal zone 120, and is covered on lead-in wire 300. It should be noted that, sensitization insulating barrier 400 refers to that its material with insulating properties and formation sensitization insulating barrier 400 has photosensitive property.
Concrete, in the present embodiment, sensitization insulating barrier 400 is located on function part 134, and the shape of sensitization insulating barrier 400 and a plurality of leads 300 to be positioned at the shape of the definite figure of part on function part 134 similar. Also be that 400 coverings of sensitization insulating barrier are positioned at the lead-in wire 300 on function part 134, and do not cover nesa coating 200, be positioned at the lead-in wire 300 in binding portion 132 and 300 the function part 134 of not going between.
It is similar that the shape of sensitization insulating barrier 400 and a plurality of leads 300 are positioned at the shape of the definite figure of part on function part 134, instead of make sensitization insulating barrier 400 cover whole function part 134, also be the area that the area of sensitization insulating barrier 400 is less than function part 134, thereby guarantee sensitization insulating barrier 400 can cover lead-in wire 300 in the as far as possible little sensitization insulating barrier 400 of usable floor area, thereby can reduce the impact of the optical effect of the sensitization insulating barrier 400 being positioned on marginal zone 120 on whole touch sensible element 10. Be appreciated that in other embodiments, sensitization insulating barrier 400 also can cover whole function part 134.
When every test before traditional touch-screen is dispatched from the factory, find the easy conducting of adjacent two silver slurry wires separately, causing insulation to decline and even short circuit. The discovery of tracing it to its cause, lead-in wire 300 is generally silver slurry line, and there is silver-colored transport phenomena in it. Wherein, silver transport phenomena refers to existing in the wet environment of DC voltage gradient, hydrone infiltrates argentiferous conductive surface, cause hydrone electrolysis to form hydrogen ion and hydroxide ion, silver dissociation under the effect of electric field and hydroxide ion produces silver ion, and producing a series of reversible reactions, the migration of silver ion can cause between the conductor without electrical connection and form bypass, causes insulation to decline and even short circuit.
In above-mentioned touch sensible element 10; by setting up sensitization insulating barrier 400 to cover lead-in wire 300 on first surface 130; thereby can avoid steam to infiltrate in lead-in wire 300; and then can protect preferably lead-in wire 300; thereby avoid 300 conductings of adjacent two lead-in wires, and then improved the production yield of touch-screen. And the material that forms sensitization insulating barrier 400 has photosensitive property, thereby can be by using mask plate and photoresistance by certain figure (in the present embodiment, this figure is similar to lead-in wire 300 definite figures) be transferred on photosensitive layer, logical exposure and development treatment, can obtain sensitization insulating barrier 400 again. Whole making technology is simple, is applicable to volume production equalization.
Further, in the present embodiment, sensitization insulating barrier 400 is sensitization heat-insulating layer. It should be noted that, sensitization heat-insulating layer refers to that it has heat-proof quality (its heat-proof quality guarantees that touch sensible element 10 is by the burn-in test before dispatching from the factory), insulating properties, and the material of formation sensitization insulating barrier 400 has photosensitive property. Sensitization insulating barrier 400 has heat-insulating property, thereby can avoid in degradation, the problem of sensitization insulating barrier 400 because being heated for a long time and losing efficacy, thus there is longer service life.
Further, in the present embodiment, sensitization insulating barrier 400 is transparent sensitization heat-insulating layer. It should be noted that, transparent sensitization heat-insulating layer refers to that it has light transmission. With respect to the ink layer (light tight) being formed on lead-in wire 300, it can further reduce the impact of the optical effect of the sensitization insulating barrier 400 being positioned on marginal zone 120 on whole touch sensible element 10.
Further, in the present embodiment, sensitization insulating barrier 400 is alkaline transparent sensitization heat-insulating layer. It should be noted that, transparent sensitization heat-insulating layer refers to that the material that forms sensitization insulating barrier 400 is alkalescence. Thereby in the time that the mode that adopts exposure imaging forms sensitization insulating barrier 400, can adopt alkaline-based developer.
The light transmittance of sensitization insulating barrier 400 is greater than 91%, and mist degree is less than 5%, and reflectivity is less than 5%. Also be that sensitization insulating barrier 400 has the advantages such as high light transmittance, low haze and low reflection, thereby make above-mentioned touch sensible element 10 there is better optical effect.
Concrete, in the present embodiment, sensitization insulating barrier 400 is alkaline machinable transparent feel ray film (TransparentPhotosensitiveFilm, TPF). The supplier of TPF changes into (HitachiChemicalCo., Ltd.) for Hitachi, and article No. is RaycastMS-5532series.
Further, as shown in Figures 3 and 4, in the present embodiment, the thickness d of sensitization insulating barrier 400 is greater than the thickness of lead-in wire 300. The thickness of lead-in wire 300 is 0.003～0.005 millimeter, and the thickness d of sensitization insulating barrier 400 is 0.005～0.015 millimeter. Preferably, the thickness d of sensitization insulating barrier 400 is 0.008 millimeter. It should be noted that, in the present embodiment, the thickness d of sensitization insulating barrier 400 refers to that first surface 130 and sensitization insulating barrier 400 are away from the thickness between a side of first surface 130.
Owing to there is gap between adjacent two lead-in wires 300, part sensitization insulating barrier 400 directly contacts with first surface 130, thereby is sandwiched between adjacent two lead-in wires 300. Also be that sensitization insulating barrier 400 coordinates lead-in wire 300 is wrapped up with substrate 100.
Further, in the present embodiment, lead-in wire 300 is photosensitive silver slurry line. It should be noted that, the material that forms lead-in wire 300 has photosensitive property. Thereby can certain figure be transferred on photosensitive silver lumps by use mask plate and photoresistance, more successively by exposure and development treatment, can obtain going between 300. Whole making technology is simple, is applicable to volume production equalization. Be appreciated that in other embodiments, form lead-in wire 300 material and also can not there is photonasty, now can form lead-in wire 300 by other the mode such as serigraphy.
In the present embodiment, also provide a kind of preparation method of touch sensible element, comprise the steps:
Step S510, the substrate providing, substrate comprises the visible area at middle part and is positioned at the marginal zone in visible area outside, and substrate has relative first surface and second surface, and first surface has the binding portion and the function part that are positioned on marginal zone.
Step S520, forms transparency conducting layer at the first surface of substrate, and transparency conducting layer is carried out to patterned process, forms the nesa coating with default conductive pattern at visible area.
In the present embodiment, adopt the mode of magnetron sputtering in substrate, to form ITO layer, will preset conductive pattern by mask plate and photoresistance and be transferred on ITO layer, then by passing through successively exposure and development treatment, obtain having the nesa coating of default conductive pattern.
Concrete, on ITO layer, apply minus photoresistance; Light is seen through and there is the mask plate identical with default conductive pattern and minus photoresistance is carried out to illumination (part that minus photoresistance is irradiated by light can not be developed liquid and remove, and the part not being irradiated by light can be dissolved in developer solution); Adopt weakly alkaline developer solution (as solution of potassium carbonate) to carry out development treatment to minus photoresistance, remove the part that minus photoresistance is not irradiated by light; Adopt acidic etching liquid (example hydrochloric acid solution) to carry out etching to ITO layer, remove the ITO not covered by minus photoresistance; Adopt again alkaline stripper (as potassium hydroxide solution) to remove the part that minus photoresistance is irradiated by light, thereby obtain having the nesa coating of default conductive pattern.
When apply eurymeric photoresistance on ITO layer time, light seen through have with the mask plate of default conductive pattern complementation and eurymeric photoresistance carried out to illumination (part that eurymeric photoresistance is irradiated by light can be developed liquid and remove, the part not being irradiated by light can not be dissolved in developer solution), then adopt successively that developer solution, etching solution and stripper develop, etching and lift-off processing.
Step S530, forms lead-in wire at the function part of the first surface of substrate, and lead-in wire one end is electrically connected with nesa coating, and the other end is collected to binding portion.
Concrete, in the present embodiment, form sensitization silver bullion in the marginal zone of the first surface of substrate, more successively by exposing and developing, obtain photosensitive silver and starch line. In other embodiments, can adopt the mode of serigraphy to form silver slurry line. Exposure in step S530 and development treatment principle are identical with exposure and development treatment principle in step S520, no longer introduce here.
After completing steps S510, step S520 and step S530, obtain to be processed, be also product shown in Fig. 2. Also in the present embodiment, produce to be processed. Be appreciated that in other embodiments, can directly buy to be processed, now step S510, step S520 and step S530 can omit.
Step S540, one side in substrate with nesa coating and lead-in wire forms sensitization dielectric substrate, sensitization dielectric substrate covers first surface, and sensitization dielectric substrate is exposed and development treatment successively, obtain sensitization insulating barrier, wherein, sensitization insulating barrier is positioned on function part, and the shape of sensitization insulating barrier is similar to the shape that lead-in wire is positioned at the definite figure of part on function part.
It should be noted that, sensitization dielectric substrate covers whole first surface, is also that sensitization dielectric substrate covers visible area and marginal zone.
Concrete, in the present embodiment, adopt the mode of impression that the sensitization dielectric substrate of film-form is located on first surface. In other embodiments, also can adopt the mode of coating on first surface, to form sensitization dielectric substrate. Exposure in step S540 and development treatment principle are identical with exposure and development treatment principle in step S520, no longer introduce here.
Each technical characterictic of the above embodiment can combine arbitrarily, for making to describe succinctly, the all possible combination of each technical characterictic in above-described embodiment is not all described, but, as long as the combination of these technical characterictics does not exist contradiction, be all considered to be the scope that this description is recorded.
The above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to utility model patent scope. It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model. Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (9)
1. a touch sensible element, is characterized in that, comprising:
Substrate, comprises the visible area at middle part and is positioned at the marginal zone in described visible area outside, described substrate toolThere are relative first surface and second surface;
Nesa coating, is located on described first surface, and is positioned on described visible area, touches for determiningPoint coordinates;
Lead-in wire, be located on described first surface, and be positioned on described marginal zone, and with described nesa coatingElectrical connection; And
Sensitization insulating barrier, is located on described first surface, and is positioned on described marginal zone, and described in being covered inOn lead-in wire.
2. touch sensible element according to claim 1, is characterized in that, described sensitization insulating barrier isSensitization heat-insulating layer.
3. touch sensible element according to claim 2, is characterized in that, described sensitization insulating barrier isTransparent sensitization heat-insulating layer.
4. touch sensible element according to claim 3, is characterized in that, described sensitization insulating barrier isThe transparent sensitization heat-insulating layer of alkalescence.
5. touch sensible element according to claim 4, is characterized in that, described sensitization insulating barrierLight transmittance is greater than 91%, and mist degree is less than 5%, and reflectivity is less than 5%.
6. touch sensible element according to claim 1, is characterized in that, described lead-in wire is photosensitive silverSlurry line.
7. touch sensible element according to claim 1, is characterized in that, described sensitization insulating barrierThickness is greater than the thickness of described lead-in wire, and the thickness of described lead-in wire is 0.003～0.005 millimeter, described sensitization insulationThe thickness of layer is 0.005～0.015 millimeter.
8. touch sensible element according to claim 1, is characterized in that, described sensitization insulating barrierThickness is 0.008 millimeter.
9. touch sensible element according to claim 1, is characterized in that, described first surface hasBinding portion and function part, described binding portion and described function part are all positioned on described marginal zone;
Described nesa coating comprises many touch-control electrodes that are intervally arranged, the number of described lead-in wire and described touchingThe number of control electrode is identical, and one end of each lead-in wire is electrically connected with a touch-control electrode, and the other end is collected to instituteState binding portion;
Described sensitization insulating barrier is located on described function part, and described in the shape of described sensitization insulating barrier and manyIt is similar that lead-in wire is positioned at the shape of the definite figure of part on described function part.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520965388.9U CN205263773U (en) | 2015-11-26 | 2015-11-26 | Touch -sensitive component |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520965388.9U CN205263773U (en) | 2015-11-26 | 2015-11-26 | Touch -sensitive component |
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| CN205263773U true CN205263773U (en) | 2016-05-25 |
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| CN201520965388.9U Expired - Fee Related CN205263773U (en) | 2015-11-26 | 2015-11-26 | Touch -sensitive component |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106802734A (en) * | 2015-11-26 | 2017-06-06 | 南昌欧菲光科技有限公司 | Touch sensible element and preparation method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106802734A (en) * | 2015-11-26 | 2017-06-06 | 南昌欧菲光科技有限公司 | Touch sensible element and preparation method thereof |
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