CN204725866U - A kind of have the device used in the optical thin film of sunk structure at preparation table mask - Google Patents
A kind of have the device used in the optical thin film of sunk structure at preparation table mask Download PDFInfo
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- CN204725866U CN204725866U CN201520095194.8U CN201520095194U CN204725866U CN 204725866 U CN204725866 U CN 204725866U CN 201520095194 U CN201520095194 U CN 201520095194U CN 204725866 U CN204725866 U CN 204725866U
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- thimble
- die ontology
- thin film
- optical thin
- sunk structure
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Abstract
The utility model discloses a kind ofly has the device used in the optical thin film of sunk structure at preparation table mask, comprising die ontology, being arranged on blank body, the thimble passage of array distribution in die ontology for stepping up thin-film template edge of die ontology both sides, be provided with thimble in thimble passage, thimble can be moved up and down by lifting body in the upper surface of die ontology and thimble passage; Lifting body is for controlling the height of thimble at the upper surface of die ontology; Thimble shape and distribution thereof are designed and just can obtain the optical thin film that surface has one or more shapes, altitude combination sunk structure, thus improve the corresponding function of surface character of film.In the method, thimble shape, height and distribute adjustable, adaptive faculty is strong, has simple to operate, and flexibility is strong, cost-saving, the advantages such as sample uniformity is good.
Description
Technical field
The utility model relates to optical thin film preparation facilities, and particularly relating to a kind ofly has the device used in the optical thin film of sunk structure at preparation table mask.
Background technology
Film adopts specific preparation method to grow the thin solid matter of the one deck obtained on the surface of the substrate, and it is large that it has surface energy level, and adhesiveness is strong and change the features such as optical property, is widely used in electronic apparatus, machinery, the industries such as printing.The preparation method of film can be divided into physical vaporous deposition, chemical vapour deposition technique, sol-gal process and electrodeposition process by large class.Spin-coating method wherein in sol-gal process belongs to high-quality method for manufacturing thin film, surface can be had the substrate of micro-nano structure as parent, just can obtain thickness uniform minute yardstick functional structure film under spin coating proceeding.Sometimes for meeting the Special use requirement of film, film needs to increase macro surface texture, carrys out optimizing optical performance as LED macroscopic view spherical lens increases macrostructure.But no matter be sol-gal process or additive method, the film obtained only has surface micro-nano structure and macroscopical polishing plane mostly, and macrostructure is comparatively single.At present in macroscopical polishing plane of film with micro-structural, the preparation means of the macrostructure of increase comparatively lacks.
Summary of the invention
The purpose of this utility model is the shortcoming and defect overcoming above-mentioned prior art, there is provided a kind of and have the device used in the optical thin film of sunk structure at preparation table mask, solve that prior art Optical Coatings Surface macrostructure is single, the Special use needs that cannot meet optical thin film, complicated process of preparation and the problem such as quality is not high.
The utility model is achieved through the following technical solutions:
A kind of have the device used in the optical thin film of sunk structure at preparation table mask, this device comprises die ontology 5, is arranged on the blank body 1 for clamping films template 2 edge of die ontology 5 both sides, the array distribution thimble passage 4-1 in die ontology 5, be provided with thimble 4 in thimble passage 4-1, thimble 4 can be moved up and down by lifting body in the upper surface of die ontology 5 and thimble passage 4-1; Lifting body is for controlling the height of thimble 4 at the upper surface of die ontology 5;
Described die ontology 5 also comprises an auxiliary pressing plate 6, and auxiliary pressing plate 6 for extruding from top to bottom colloid 8 in mold use process.
The upper surface of described die ontology 5 is plane or curved surface, and auxiliary pressing plate 6 underside shape is corresponding to die ontology 5 upper surface shape.
The inner side of described blank body 1 has additional the auxiliary box dam 7 for enclosing silica gel 8.
Each thimble 4 is combined and is formed thimble array, and in thimble array, each thimble 4 can independently be moved up and down by the control of lifting body or synchronously move up and down.
The end of described thimble 4 is sphere, rectangular surfaces and/or polygon facet.
Said apparatus preparation table mask is adopted to have the method for the optical thin film of sunk structure as follows:
(1) diffusion barrier 3 on die ontology 5 upper surface covers, then place thin-film template 2 at diffusion barrier 3 upper surface, and separation agent is sprayed on thin-film template 2; Use blank body 1 to compress thin-film template 2 and diffusion barrier 3 edge, make it be fixed on die ontology 5 upper surface;
(2) by controlling lifting body, make each thimble 4 rise to setting height, now, thin-film template 2 and diffusion barrier 3 by jack-up, and form bulge-structure; Thimble 4 and die ontology are preheated to 60-100 DEG C.
(3) uncured silica gel 8 is coated on (or array bulge-structure) on bulge-structure, treats its natural flow; The coating thickness of silica gel 8 is determined according to specific requirement.
(4) the auxiliary pressing plate 6 being coated with separation agent is extruded uncured silica gel 8 from top to bottom;
(5) silica gel 8 constant temperature 60-100 DEG C keeps 6-30min, make uncured colloid 8 fully flowing fill array bulge-structure, then silica gel 8 is warming up to 80-180 DEG C, and is incubated 14min, uncured silica gel 8 is solidified gradually along with the rising of temperature;
(6) cool the silica gel 8 after solidification, be separated, there is the optical thin film 9 of sunk structure on the surface just obtaining desired structure height.
The wherein one side of described step (2) thin-film template 2 has array microstructure, and array microstructure faces down or upward; Described array microstructure shape is spherical, taper, cylindric or rectangle, and microstructure size is 0.5-100um;
Described thin-film template 2 is different from step (3) described silica gel 8 material, and surface spraying has separation agent, when thin-film template 2 surface is without micro-nano structure, after silica gel solidification, obtains step (6) optical thin film 9 sunk structure through the demoulding; When thin-film template 2 surface has micro-nano structure, the micro-nano structure of thin-film template 2 is transferred on silica gel 8, after silica gel solidification, obtain step (6) optical thin film 9 sunk structure, and inner wall surface thereof has the micro-nano structure of corresponding thin-film template through the demoulding.
The utility model, relative to prior art, has following advantage and effect:
The utility model thimble or array thimble, in conjunction with in the preparation method of optical thin film, can according to the specific requirement of optical thin film sunk structure, realize graphical distribution, thimble shape and distribution thereof are designed and just can obtain the optical thin film that surface has one or more shapes, altitude combination sunk structure, thus improve the corresponding function of surface character of optical thin film.Thimble shape, height and distribution are all adjustable by lifting body, and adaptive faculty is strong, has simple to operate, and flexibility is strong, cost-saving, the advantages such as sample uniformity is good.
Adopt the utility model for the preparation of surface there is the optical thin film of sunk structure, not only be suitable for the preparation of the optical thin film that special construction needs, and being applicable to the versatility preparation of ordinary optical film, the means that possess skills are easy, with low cost, product quality advantages of higher.
Accompanying drawing explanation
Fig. 1 is that the utility model has the device result schematic diagram used in the optical thin film of sunk structure at preparation table mask.
A kind of malformation that Fig. 2 is mould shown in Fig. 1, namely when die ontology upper surface is curved surface, now auxiliary pressing plate underside shape is also corresponding.
Fig. 3 is the method flow diagram one adopting said apparatus preparation table mask to have the optical thin film of sunk structure;
Fig. 4 is the method flow diagram two adopting said apparatus preparation table mask to have the optical thin film of sunk structure;
Fig. 5 is the method flow diagram three adopting said apparatus preparation table mask to have the optical thin film of sunk structure;
Fig. 6 is the method flow diagram four adopting said apparatus preparation table mask to have the optical thin film of sunk structure;
Fig. 7 shows the preparation table mask when pitch of enters is different, different the schematic diagram of the optical thin film of sunk structure.
Fig. 8 shows the schematic diagram adopting the thin-film template preparation table mask with array microstructure to have the optical thin film of sunk structure.
Detailed description of the invention
Below in conjunction with specific embodiment, the utility model is more specifically described in detail.
Embodiment
As shown in Figure 1.The utility model is a kind of the device used in the optical thin film of sunk structure at preparation table mask, this device comprises die ontology 5, is arranged on the blank body 1 for clamping films template 2 edge of die ontology 5 both sides, the array distribution thimble passage 4-1 in die ontology 5, be provided with thimble 4 in thimble passage 4-1, thimble 4 can be moved up and down by lifting body (employing hydraulic pressure) in the upper surface of die ontology 5 and thimble passage 4-1; Lifting body is for controlling the height of thimble 4 at the upper surface of die ontology 5;
As described in Figure 5.Die ontology 5 also comprises an auxiliary pressing plate 6, and auxiliary pressing plate 6 for extruding from top to bottom silica gel 8 in mold use process.The inner side of described blank body 1 has additional the auxiliary box dam 7 for enclosing colloid 8.
As shown in Figure 1.Described die ontology 5 upper surface is plane, but also can be arranged to curved surface as shown in Figure 2, and the lower surface of auxiliary pressing plate 6 is corresponding to it.
Each thimble 4 is combined and is formed thimble array, and in thimble array, each thimble 4 can independently be moved up and down by the control of lifting body or synchronously move up and down.
The end of described thimble 4 is sphere, rectangular surfaces and/or polygon facet.
As shown in Figures 3 to 8.Said apparatus preparation table mask is adopted to have the method for the optical thin film of sunk structure as follows:
(1) diffusion barrier 3 on die ontology 5 upper surface covers, then place thin-film template 2 at diffusion barrier 3 upper surface, and separation agent is sprayed on thin-film template 2; Use blank body 1 to compress thin-film template 2 and diffusion barrier 3 edge, make it be fixed on die ontology 5 upper surface;
(2) by controlling lifting body, make each thimble 4 rise to setting height, now, thin-film template 2 and diffusion barrier 3 by jack-up, and form bulge-structure; Thimble 4 and die ontology are preheated to 60-100 DEG C.
(3) uncured silica gel 8 is coated on (or array bulge-structure) on bulge-structure, treats its natural flow; The coating thickness of silica gel 8 is determined according to specific requirement.
(4) the auxiliary pressing plate 6 being coated with separation agent is extruded uncured silica gel 8 from top to bottom;
(5) silica gel 8 constant temperature 60-100 DEG C keeps 6-30min, make uncured silica gel 8 fully flowing fill array bulge-structure, then silica gel 8 is warming up to 80-180 DEG C, and is incubated 14min, uncured silica gel 8 is solidified gradually along with the rising of temperature;
(6) cool the silica gel 8 after solidification, be separated, there is the optical thin film 9 of sunk structure on the surface just obtaining desired structure height.
The wherein one side of described step (2) thin-film template 2 has array microstructure, and array microstructure faces down or upward; Described array microstructure shape is spherical, taper, cylindric or rectangle, and microstructure size is 0.5-100um;
Described thin-film template 2 is different from step (3) described silica gel 8 material, and surface spraying has separation agent, when thin-film template 2 surface is without micro-nano structure, after silica gel solidification, obtains step (6) optical thin film 9 sunk structure through the demoulding; When thin-film template 2 surface has micro-nano structure, the micro-nano structure of thin-film template 2 is transferred on silica gel 8, after silica gel solidification, obtain step (6) optical thin film 9 sunk structure, and inner wall surface thereof has the micro-nano structure of corresponding thin-film template through the demoulding.
The preparation of uncured silica gel 8: to take mass percent be the model of 1:1 is 7040A and 7040B commercial silica gel, and through mix and blend, vacuum defoamation, the vacuum defoamation time is that 5-10min obtains.
As mentioned above, just the utility model can be realized preferably.
Embodiment of the present utility model is not restricted to the described embodiments; other are any do not deviate from Spirit Essence of the present utility model and principle under do change, modification, substitute, combine, simplify; all should be the substitute mode of equivalence, be included within protection domain of the present utility model.
Claims (5)
1. one kind has the device used in the optical thin film of sunk structure at preparation table mask, it is characterized in that: this device comprises die ontology (5), is arranged on the blank body (1) for clamping films template (2) edge of die ontology (5) both sides, the thimble passage (4-1) of array distribution in die ontology (5), be provided with thimble (4) in thimble passage (4-1), thimble (4) can be moved up and down by lifting body in the upper surface of die ontology (5) and thimble passage (4-1); Lifting body is for controlling the height of thimble (4) at the upper surface of die ontology (5);
Described die ontology (5) also comprises an auxiliary pressing plate (6), and auxiliary pressing plate (6) for extruding from top to bottom silica gel (8) in mold use process.
2. have at preparation table mask the device used in the optical thin film of sunk structure according to claim 1, it is characterized in that: the upper surface of described die ontology (5) is plane or curved surface, auxiliary pressing plate (6) underside shape is corresponding to die ontology (5) upper surface shape.
3. have at preparation table mask the device used in the optical thin film of sunk structure according to claim 1, it is characterized in that: the inner side of described blank body (1) has additional the auxiliary box dam (7) for enclosing auxiliary pressing plate (6).
4. according to any one of claims 1 to 3, have at preparation table mask the device used in the optical thin film of sunk structure, it is characterized in that: each thimble (4) is combined and formed thimble array, in thimble array, each thimble (4) can independently be moved up and down by the control of lifting body or synchronously move up and down.
5. according to any one of claims 1 to 3, have at preparation table mask the device used in the optical thin film of sunk structure, it is characterized in that: the end of described thimble (4) is sphere, rectangular surfaces and/or polygon facet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520095194.8U CN204725866U (en) | 2015-02-10 | 2015-02-10 | A kind of have the device used in the optical thin film of sunk structure at preparation table mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520095194.8U CN204725866U (en) | 2015-02-10 | 2015-02-10 | A kind of have the device used in the optical thin film of sunk structure at preparation table mask |
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| CN204725866U true CN204725866U (en) | 2015-10-28 |
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| CN201520095194.8U Expired - Fee Related CN204725866U (en) | 2015-02-10 | 2015-02-10 | A kind of have the device used in the optical thin film of sunk structure at preparation table mask |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104647770A (en) * | 2015-02-10 | 2015-05-27 | 华南理工大学 | Method and device for manufacturing optical thin film having concave structures on surface |
| CN106926442A (en) * | 2017-05-03 | 2017-07-07 | 清华大学 | Curve mold mechanized production system |
| CN113272115A (en) * | 2019-01-08 | 2021-08-17 | 阿迪达斯股份公司 | Curing method and apparatus |
| CN115144937A (en) * | 2022-07-19 | 2022-10-04 | 上海慧希电子科技有限公司 | Optical device manufacturing method, film coating method and film-coated discontinuous structure device |
-
2015
- 2015-02-10 CN CN201520095194.8U patent/CN204725866U/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104647770A (en) * | 2015-02-10 | 2015-05-27 | 华南理工大学 | Method and device for manufacturing optical thin film having concave structures on surface |
| CN106926442A (en) * | 2017-05-03 | 2017-07-07 | 清华大学 | Curve mold mechanized production system |
| CN113272115A (en) * | 2019-01-08 | 2021-08-17 | 阿迪达斯股份公司 | Curing method and apparatus |
| CN113272115B (en) * | 2019-01-08 | 2023-08-04 | 阿迪达斯股份公司 | Curing method and apparatus |
| CN115144937A (en) * | 2022-07-19 | 2022-10-04 | 上海慧希电子科技有限公司 | Optical device manufacturing method, film coating method and film-coated discontinuous structure device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151028 Termination date: 20180210 |