CN203870283U - 一种低损耗大有效面积单模光纤 - Google Patents
一种低损耗大有效面积单模光纤 Download PDFInfo
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- CN203870283U CN203870283U CN201420189414.9U CN201420189414U CN203870283U CN 203870283 U CN203870283 U CN 203870283U CN 201420189414 U CN201420189414 U CN 201420189414U CN 203870283 U CN203870283 U CN 203870283U
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- refractive index
- optical fiber
- fiber
- radius
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- 239000000835 fiber Substances 0.000 title claims abstract description 92
- 230000003287 optical effect Effects 0.000 claims abstract description 9
- 239000013307 optical fiber Substances 0.000 claims description 94
- 230000002262 irrigation Effects 0.000 claims description 49
- 238000003973 irrigation Methods 0.000 claims description 49
- 238000013461 design Methods 0.000 claims description 41
- 238000004519 manufacturing process Methods 0.000 claims description 31
- 238000012946 outsourcing Methods 0.000 claims description 16
- 238000009826 distribution Methods 0.000 claims description 9
- 238000005253 cladding Methods 0.000 claims description 7
- 230000007547 defect Effects 0.000 claims description 4
- 238000012360 testing method Methods 0.000 claims description 3
- 230000000994 depressogenic effect Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 67
- 230000008021 deposition Effects 0.000 abstract description 15
- 238000004891 communication Methods 0.000 abstract description 7
- 238000011031 large-scale manufacturing process Methods 0.000 abstract description 7
- 230000008901 benefit Effects 0.000 abstract description 2
- 238000002955 isolation Methods 0.000 abstract 1
- 239000002994 raw material Substances 0.000 description 38
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 35
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 35
- 229910052731 fluorine Inorganic materials 0.000 description 35
- 239000011737 fluorine Substances 0.000 description 35
- 229910003902 SiCl 4 Inorganic materials 0.000 description 20
- 235000012239 silicon dioxide Nutrition 0.000 description 20
- 239000010453 quartz Substances 0.000 description 18
- 229910052732 germanium Inorganic materials 0.000 description 17
- 238000000151 deposition Methods 0.000 description 16
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 16
- 239000000203 mixture Substances 0.000 description 12
- 230000008569 process Effects 0.000 description 12
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- 238000005245 sintering Methods 0.000 description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- 229910052801 chlorine Inorganic materials 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 238000004062 sedimentation Methods 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 229910005793 GeO 2 Inorganic materials 0.000 description 6
- 229910018194 SF 6 Inorganic materials 0.000 description 6
- 238000005137 deposition process Methods 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 238000005491 wire drawing Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000003708 ampul Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 239000001307 helium Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 230000009022 nonlinear effect Effects 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 208000002925 dental caries Diseases 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000003913 materials processing Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- Manufacture, Treatment Of Glass Fibers (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201420189414.9U CN203870283U (zh) | 2014-04-17 | 2014-04-17 | 一种低损耗大有效面积单模光纤 |
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CN201420189414.9U CN203870283U (zh) | 2014-04-17 | 2014-04-17 | 一种低损耗大有效面积单模光纤 |
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Publication Number | Publication Date |
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CN203870283U true CN203870283U (zh) | 2014-10-08 |
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CN201420189414.9U Expired - Lifetime CN203870283U (zh) | 2014-04-17 | 2014-04-17 | 一种低损耗大有效面积单模光纤 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103955020A (zh) * | 2014-04-17 | 2014-07-30 | 中天科技精密材料有限公司 | 一种低损耗大有效面积单模光纤及其制造方法 |
-
2014
- 2014-04-17 CN CN201420189414.9U patent/CN203870283U/zh not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103955020A (zh) * | 2014-04-17 | 2014-07-30 | 中天科技精密材料有限公司 | 一种低损耗大有效面积单模光纤及其制造方法 |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: ZHONGTIAN SCIENCE AND TECHNOLOGY CO LTD, JIANGSU Z Effective date: 20150420 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20150420 Address after: 226009 Nantong economic and Technological Development Zone, Jiangsu Zhongtian Road, No. 3 Patentee after: Jiangsu Zhongtian Technology Precision Material Co., Ltd. Patentee after: Zhongtian Science and Technology Co., Ltd., Jiangsu Patentee after: Zhongtian Technologies Fiber Optics Co., Ltd. Address before: 226009 Nantong economic and Technological Development Zone, Jiangsu Zhongtian Road, No. 3 Patentee before: Jiangsu Zhongtian Technology Precision Material Co., Ltd. |