CN203768443U - Nano multilayer composite membrane - Google Patents
Nano multilayer composite membrane Download PDFInfo
- Publication number
- CN203768443U CN203768443U CN201320865529.0U CN201320865529U CN203768443U CN 203768443 U CN203768443 U CN 203768443U CN 201320865529 U CN201320865529 U CN 201320865529U CN 203768443 U CN203768443 U CN 203768443U
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- CN
- China
- Prior art keywords
- layer
- tin
- compound film
- nanometer multilayer
- multilayer compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002131 composite material Substances 0.000 title claims abstract description 25
- 239000012528 membrane Substances 0.000 title abstract description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 46
- 150000001875 compounds Chemical class 0.000 claims description 36
- 238000000151 deposition Methods 0.000 abstract description 14
- 238000002360 preparation method Methods 0.000 abstract description 11
- 239000010410 layer Substances 0.000 abstract 12
- 239000000758 substrate Substances 0.000 abstract 2
- 239000002344 surface layer Substances 0.000 abstract 2
- 239000010936 titanium Substances 0.000 description 44
- 239000011159 matrix material Substances 0.000 description 20
- 239000007789 gas Substances 0.000 description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 238000007733 ion plating Methods 0.000 description 10
- 238000000576 coating method Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 229910010037 TiAlN Inorganic materials 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 208000037656 Respiratory Sounds Diseases 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 238000010009 beating Methods 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002114 nanocomposite Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The utility model provides a nano multilayer composite membrane which comprises a Ti layer, a composite layer and a TiN surface layer arranged in sequence, wherein the composite layer comprises staggered Ti2N+TiN layer and TiN layer. The utility model also discloses a preparation method of the nano multilayer composite membrane, which comprises the following steps of firstly depositing a Ti layer on the surface of a substrate; then depositing a composite layer on the side of the Ti layer away from the substrate; finally, depositing the TiN surface layer on the composite layer, wherein the composite layer is prepared by alternately depositing the Ti2N+TiN layer and the TiN layer. The nano multilayer composite membrane provided by the utility model has the advantages of high hardness and low preparation cost.
Description
Technical field
The utility model relates to vacuum coating technology, relates in particular to a kind of nanometer multilayer compound film.
Background technology
The coating of Chinese modal speedy steel cutting-tool on the market and press tool mainly contains two kinds at present, and a kind of is the most general TiN rete, and another is the TiAlN rete with superior performance.Conventionally, TiN coating cost is lower, and plated film rear surface hardness reaches HV2300 left and right conventionally.TiAlN coating cost is higher, and plated film rear surface hardness can reach HV3000～3500.For a long time, a kind of new coating technique is all being found by a lot of vacuum plating producer, obtains can the match in excellence or beauty new coating technique of TiAlN plated film of hardness under cost and the approaching prerequisite of TiN plated film.
Utility model content
The purpose of this utility model is, the problem that cannot simultaneously have concurrently for coating high rigidity and the low cost of above-mentioned existing speedy steel cutting-tool and press tool, proposes a kind of nanometer multilayer compound film, to realize hardness advantage high, cheap for manufacturing cost.
For achieving the above object, the technical solution adopted in the utility model is: a kind of nanometer multilayer compound film, comprise in turn the Ti layer, composite bed and the TiN top layer that arrange, and described composite bed comprises and is arranged alternately Ti
2n+TiN layer and TiN layer.Ti
2n+TiN layer be by Ti target and nitrogen respectively ionization be prepared from.Further, described Ti layer thickness is 50-70nm.
Further, described Ti
2n+TiN layer thickness is 28-60nm, is preferably 30-40nm; Described TiN layer thickness is 35-70nm.
Further, the thickness on described TiN top layer is 0.8-1.5 μ m.
Further, described nanometer multilayer compound film thickness is 2-5 μ m.
The preparation method of described nanometer multilayer compound film, comprises the following steps: first at matrix surface depositing Ti layer; Then deviate from a side deposition composite bed of matrix at Ti layer; Finally depositing TiN top layer on composite bed.
Wherein, described composite bed is by alternating deposit Ti
2n+TiN layer and TiN layer are prepared from.
Further, described deposition adopts multi sphere ion plating technology to complete.
Further, described Ti
2the preparation of N+TiN layer comprises, the ionization respectively of Ti target and nitrogen, adopt multi sphere ion plating technology on Ti layer by pulse Ar gas by Ti
2n and TiN mixed deposit,, under the condition of Ar pulse, the Ti target of ionization and nitrogen form Ti respectively
2n.
Further, the preparation of described nanometer multilayer compound film is by pressure instrument control gas pressure intensity processed, and gas dividing potential drop is 6-8 × 10
-1pa.Gas dividing potential drop is the gas pressure intensity in vacuum chamber.Described Ar gas pulse time and flow are respectively: the Ar gas pulses time is 15-25s, and be 20-33s interval time, and the each pulsed quantity of Ar gas is 9SCCM.
Further, described matrix is metallic matrix, and the temperature of described matrix is 340-380 DEG C, is preferably 350 DEG C.
The utility model nanometer multilayer compound film is rational in infrastructure, compact, has the following advantages compared with prior art:
(1), the utility model overcome the shortcoming that existing individual layer titanium nitride film bonding force is poor, fracture toughness property is poor and easily crack, the utility model nanometer multilayer compound film fully combines Ti layer, Ti
2n layer and TiN layer feature separately, using Ti as matrix with the transition layer of rete, can allow rete and matrix have extraordinary bonding force, draws Ti
2n has the feature that hardness is high, improves rete integral hardness and wear resistance; Draw TiN frictional coefficient low, play lubricated effect on top layer, reduce the generation of crackle.
(2), the preparation of the utility model nanometer multilayer compound film adopts multi-arc ion plating film, obtains the nano composite membrane with heterogeneity and structure by pulse argon gas, the thickness of every layer and composition are controlled by the T/A of pulse argon gas.
(3), the utility model nanometer multilayer compound film has the advantage of TiAlN plated film and TiN plated film concurrently, the surface hardness of the utility model nanometer multilayer compound film and TiAlN plated film approach, and can reach HV2800 left and right; Preparation technology is simple, and manufacturing cost and TiN plated film are very nearly the same.
Above-mentioned advantage makes the utility model nanometer multilayer compound film in following space, Zhong You large market, plated film market, especially has very high using value in the coatings art of speedy steel cutting-tool and press tool etc.
Brief description of the drawings
Fig. 1 is the structural representation of embodiment 1 nanometer multilayer compound film;
Fig. 2 is the metaloscope schematic diagram of reference examples 1TiN lamination trace, and magnification is 1000 times;
Fig. 3 is the metaloscope schematic diagram of embodiment 1 nanometer multilayer compound film impression, and magnification is 1000 times.
Embodiment
Below in conjunction with embodiment, the utility model is further illustrated:
Reference examples 1
The disclosed film of reference examples be deposited on metallic matrix, thickness is the TiN layer of 0.8 μ m.
Embodiment 1
The present embodiment discloses a kind of nanometer multilayer compound film, as shown in Figure 1, comprises in turn the Ti layer 2, composite bed 3 and the TiN top layer 4 that arrange, and composite bed 3 comprises and is arranged alternately Ti
2n+TiN layer and TiN layer, Ti described in the present embodiment
2totally 30 layers, N+TiN layer and TiN layer.Ti layer 2 thickness are 60nm.Ti
2n+TiN layer thickness is 32nm; TiN layer thickness is 43nm.The thickness on TiN top layer 4 is 0.8 μ m.This nanometer multilayer compound film thickness is 3 μ m.This nanometer multilayer compound film hardness is 2700HV after testing.
The preparation method of the present embodiment nanometer multilayer compound film is as follows: first metallic matrix 1 cleaned up, and heating of metal matrix 1, the temperature that makes metallic matrix 1 is 350 DEG C; Adopt PVD multi-arc ion plating film method depositing Ti layer 2 on metallic matrix 1, a side that then deviates from matrix at Ti layer 2 adopts PVD multi-arc ion plating film method to carry out alternating deposit Ti by pulse Ar gas
2n+TiN layer and TiN layer (composite bed 3); Finally depositing TiN top layer 4 on composite bed 3.Wherein deposition material (Ti, Ti
2n+TiN, TiN) provide by multi sphere target.Described multi-arc ion plating film nitrogen partial pressure is 6.5 × 10
-1pa, the Ar gas pulses time is 16s, and be 24s interval time, and the each pulsed quantity of Ar gas is 9SCCM.
Described PVD multi-arc ion plating film, its argon gas and nitrogen are respectively by mass flowmeter and the control of pressure controller.
The disclosed nanometer multilayer compound film of embodiment has higher consistency and elasticity modulus compared with reference examples 1 individual layer TiN.Impression is an important indicator passing judgment on membranous layer binding force, the testing method of impression is as follows: test specimens piece is beaten hardness with 150KG Rockwell Hardness meter, around beating the pitting that hardness stays, just have tiny crack, judge the bonding force of rete and matrix from the situation of peeling off of number, thickness and the rete of crackle.Because impression exists projection, not in one plane, the impression photo both sides image of taking with metaloscope (1000 times) can be apprehensive.As shown in Figures 2 and 3, in reference examples 1, individual layer TiN crackle is thick and have small rete to peel off, in embodiment 1, nanometer multilayer compound film only has trickle especially crackle and does not peel off, and nanometer multilayer compound film prepared by the present embodiment is described in bonding force and to stop crackle to produce how good than individual layer TiN.
The utility model nanometer multilayer compound film is by controlling every layer thickness, by means of high-bond, the Ti of Ti and matrix
2the high rigidity of N and the high tenacity of TiN, the nano-multilayer film of this constitutional features presents the hardness higher than individual layer TiN, Young's modulus, bonding force, compares Ti
2the better toughness of N.The disclosed nanometer multilayer compound film hardness of the present embodiment can reach HV2700 left and right, approach TiAlN plated film, and technique is simple, and manufacturing cost and TiN plated film are very nearly the same, can be widely used in speedy steel cutting-tool and press tool, have very high using value.
Embodiment 2
The present embodiment discloses a kind of nanometer multilayer compound film, comprises in turn the Ti layer, composite bed and the TiN top layer that arrange, and composite bed comprises and is arranged alternately Ti
2n+TiN layer and TiN layer.Ti
2n+TiN layer is by Ti
2n and TiN mixing material form as preparation of target materials.Ti layer thickness is 70nm.Ti
2n+TiN layer thickness is 35nm; TiN layer thickness is 45nm.The thickness on TiN top layer is 0.8 μ m.Described nanometer multilayer compound film thickness is 5 μ m.This nanometer multilayer compound film hardness is 2800HV after testing.
The preparation method of the present embodiment nanometer multilayer compound film is as follows: first metallic matrix cleaned up, and heating of metal matrix, the temperature that makes metallic matrix is 350 DEG C; Adopt PVD multi-arc ion plating film method depositing Ti layer on metallic matrix, a side that then deviates from matrix at Ti layer adopts PVD multi-arc ion plating film method to carry out alternating deposit Ti by pulse Ar gas
2n+TiN layer and TiN layer (composite bed); Finally depositing TiN top layer on composite bed.Wherein deposition material (Ti, Ti
2n+TiN, TiN) provide by multi sphere target.Described multi-arc ion plating film nitrogen partial pressure is 9 × 10
-1pa, the Ar gas pulses time is 20s, and be 30s interval time, and the each pulsed quantity of Ar gas is 9SCCM.
The utility model is not limited to the nanometer multilayer compound film that above-described embodiment is recorded, wherein Ti in composite bed
2the change of the number of plies of N+TiN layer and TiN layer, the change of each layer thickness and nanometer multilayer compound film preparation method's change is all within protection domain of the present utility model.
Finally it should be noted that: above each embodiment, only in order to the technical solution of the utility model to be described, is not intended to limit; Although the utility model is had been described in detail with reference to aforementioned each embodiment, those of ordinary skill in the art is to be understood that: its technical scheme that still can record aforementioned each embodiment is modified, or some or all of technical characterictic is wherein equal to replacement; And these amendments or replacement do not make the essence of appropriate technical solution depart from the scope of the each embodiment technical scheme of the utility model.
Claims (5)
1. a nanometer multilayer compound film, is characterized in that, comprises in turn the Ti layer, composite bed and the TiN top layer that arrange, and described composite bed comprises and is arranged alternately Ti
2n+TiN layer and TiN layer.
2. nanometer multilayer compound film according to claim 1, is characterized in that, described Ti layer thickness is 50-70nm.
3. nanometer multilayer compound film according to claim 1, is characterized in that described Ti
2n+TiN layer thickness is 28-60nm; Described TiN layer thickness is 35-70nm.
4. nanometer multilayer compound film according to claim 1, is characterized in that, the thickness on described TiN top layer is 0.8-1.5 μ m.
5. nanometer multilayer compound film according to claim 1, is characterized in that, described nanometer multilayer compound film thickness is 2-5 μ m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320865529.0U CN203768443U (en) | 2013-12-25 | 2013-12-25 | Nano multilayer composite membrane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320865529.0U CN203768443U (en) | 2013-12-25 | 2013-12-25 | Nano multilayer composite membrane |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203768443U true CN203768443U (en) | 2014-08-13 |
Family
ID=51285654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320865529.0U Expired - Lifetime CN203768443U (en) | 2013-12-25 | 2013-12-25 | Nano multilayer composite membrane |
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| Country | Link |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103668062A (en) * | 2013-12-25 | 2014-03-26 | 大连远东工具有限公司 | Nanometer multilayer composite film and preparation method thereof |
| CN109576662A (en) * | 2019-01-25 | 2019-04-05 | 广东工业大学 | A kind of two-way nanometer gradient material of bulk metal ceramic/metal/cermet and preparation method thereof based on PVD technique |
-
2013
- 2013-12-25 CN CN201320865529.0U patent/CN203768443U/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103668062A (en) * | 2013-12-25 | 2014-03-26 | 大连远东工具有限公司 | Nanometer multilayer composite film and preparation method thereof |
| CN103668062B (en) * | 2013-12-25 | 2016-08-17 | 大连远东工具有限公司 | Nanometer multilayer compound film and preparation method thereof |
| CN109576662A (en) * | 2019-01-25 | 2019-04-05 | 广东工业大学 | A kind of two-way nanometer gradient material of bulk metal ceramic/metal/cermet and preparation method thereof based on PVD technique |
| CN109576662B (en) * | 2019-01-25 | 2020-10-23 | 广东工业大学 | PVD (physical vapor deposition) technology-based bulk cermet/metal/cermet bidirectional nano gradient material and preparation method thereof |
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