CN203311160U - Screen exposure alignment fixture - Google Patents
Screen exposure alignment fixture Download PDFInfo
- Publication number
- CN203311160U CN203311160U CN2013201286384U CN201320128638U CN203311160U CN 203311160 U CN203311160 U CN 203311160U CN 2013201286384 U CN2013201286384 U CN 2013201286384U CN 201320128638 U CN201320128638 U CN 201320128638U CN 203311160 U CN203311160 U CN 203311160U
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- China
- Prior art keywords
- half tone
- exposed
- alignment
- exposure
- tool
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model provides a screen exposure alignment fixture. In the prior art, a manual measurement way is adopted for aligning a bottom plate with a screen to be exposed, and the problems of great difficulty in alignment and poor precision further exist. The screen exposure alignment fixture provided by the utility model comprises a base for arranging the screen to be aligned, the bottom plate and an alignment plate, a plurality of positioning pins are arranged on the base, a plurality of first positioning holes matched with the plurality of the positioning pins are arranged on a side frame of the screen to be exposed, and a plurality of alignment marks are arranged on the bottom plate; a plurality of second positioning holes and a plurality of alignment holes are arranged on the alignment plate, the plurality of the second positioning holes are used for matching and connecting with the plurality of the positioning pins, and the plurality of the alignment holes are used for aligning the bottom plate with the screen to be exposed by aligning with the plurality of the alignment marks. The screen exposure alignment fixture provided by the utility model can reduce the difficulty in alignment and improve the precision in alignment.
Description
Technical field
The utility model relates to solar cell and manufactures field, and particularly tool is aimed in a kind of half tone exposure.
Background technology
In the industrialized manufacture process of silicon solar cell, the electrode of silicon solar cell (such as main grid electrode, secondary gate electrode, back electrode etc.) substantially all forms by silk-screen printing technique, is about to metal paste and is printed on corresponding position and forms corresponding electrode by thermal treatments such as oven dry and sintering by silk-screen printing technique.The printed patterns forming quality of the half tone in silk-screen printing technique has very important impact to the quality of printing.
Making solar cell with in the process of half tone, at first printed patterns is produced on negative, on the silk screens such as woven wire of half tone to be exposed, apply photoresists afterwards, then base plate is arranged between exposure light source and half tone to be exposed, then carry out exposure technology so that printed patterns is copied on photoresists, carry out afterwards developing process to remove the photoresist of sensitization, thereby form the half tone that carries printed patterns.
Negative in above-mentioned prior art before exposure and the aligning between half tone to be exposed are undertaken by the manual measurement mode, at first detailed process for fixing half tone to be exposed, base plate is placed on half tone to be exposed afterwards, then by the manual measurement mode, determine pattern on negative and the concrete relative position of half tone to be exposed, finally by bonding mode, fix base plate and half tone to be exposed.This kind alignment so exists aims at the problem that difficulty is large and precision is difficult to guarantee, makes position and its predeterminated position of printed patterns in half tone of post-exposure gained have deviation, thereby affects the yield rate of follow-up solar cell and corresponding assembly.
Therefore, how to provide the exposure of a kind of half tone to aim at tool to overcome the existing alignment difficulties of alignment so and the poor problem of precision after manual measurement, become industry technical matters urgently to be resolved hurrily.
The utility model content
The purpose of this utility model is to provide the exposure of a kind of half tone and aims at tool, by described half tone exposure, aims at tool and can improve aligning difficulty and the precision between half tone to be exposed and base plate before exposure.
For achieving the above object, the utility model will provide a kind of half tone exposure to aim at tool, comprise: pedestal, for half tone to be exposed and negative are set, on it, be provided with a plurality of register pins, on described half tone frame to be exposed, be provided with a plurality of the first pilot holes that are complementary with a plurality of register pins, on described negative, be provided with a plurality of alignment marks; And alignment sheets, on it, be provided with a plurality of the second pilot holes and a plurality of mating holes, described a plurality of the second pilot hole is for described a plurality of register pins coupling, being connected, described a plurality of mating holes be used for by with described a plurality of alignment mark to aim at negative and half tone to be exposed.
In a preferred embodiment, the aperture of described mating holes is 0.5~3mm.
In a preferred embodiment, described alignment mark is cruciform or M shape.
In a preferred embodiment, on described pedestal, be provided with four register pins, described four register pins are arranged along a square.
In a preferred embodiment, described alignment sheets is four jiaos of stars or square, described alignment sheets comprises four the second pilot holes and four mating holes, described four the second pilot holes lay respectively on four drift angles of described alignment sheets and are respectively used to and four register pins are pegged graft, and described four mating holes are arranged along a square.
In a preferred embodiment, on described half tone to be exposed, be coated with silk screen to be exposed, on described silk screen to be exposed, be coated with photoresists, described negative is arranged between silk screen to be exposed and exposure light source.
With available technology adopting manual measurement mode, aiming at base plate compares with half tone to be exposed, half tone exposure of the present utility model is aimed at tool and is comprised pedestal and alignment sheets, on pedestal, be provided with a plurality of register pins, on described half tone frame to be exposed and alignment sheets, be respectively arranged with a plurality of the first pilot holes and the second pilot hole be complementary with a plurality of register pins, by with register pin, pegging graft and be fixed on pedestal, on alignment sheets, also be provided with a plurality of mating holes, thereby aim to realize aiming at of negative and half tone to be exposed by a plurality of alignment marks on mating holes and base plate, so can reduce the difficulty of aligning and improve the precision of aiming at.
The accompanying drawing explanation
Fig. 1 is the front view that tool is aimed in half tone exposure of the present utility model;
Fig. 2 is the schematic perspective view that tool is aimed in half tone exposure of the present utility model;
Fig. 3 is that half tone of the present utility model exposure is aimed at tool along the A-A of Fig. 1 to cut-open view.
Specific embodiments
Below in conjunction with specific embodiment and accompanying drawing, describe the purpose of this utility model and effect in detail.
Referring to Fig. 1 to Fig. 3, half tone of the present utility model exposure is aimed at tool and is comprised pedestal 1 and alignment sheets 4, and described pedestal 1 is be used to half tone 2 to be exposed and negative 3 are set, and on it, is provided with a plurality of register pins 10.In the present embodiment, on described pedestal 1, be provided with four register pins 10, described four register pins 10 are arranged along a square.
On described half tone to be exposed 2 frames, be provided with a plurality of the first pilot hole H1 that are complementary with a plurality of register pins 10, on described half tone to be exposed 2, be coated with silk screen 20 to be exposed, on described silk screen to be exposed 20, be coated with photoresists, described negative 3 is arranged between silk screen 20 to be exposed and exposure light source (not shown).
On described negative 3, be provided with a plurality of alignment marks (not shown), described alignment mark is cruciform or M shape etc.
On described alignment sheets 4, be provided with a plurality of the second pilot hole H2 and a plurality of mating holes H3, described a plurality of the second pilot hole H2 is for described a plurality of register pins 10 couplings, being connected, described a plurality of mating holes H3 be used for by with described a plurality of alignment mark to aim at negative and half tone to be exposed.In the present embodiment, the aperture of described mating holes H3 is 0.5~3mm, described alignment sheets 4 is four jiaos of stars (also can be square etc.), described alignment sheets 4 comprises four the second pilot hole H2 and four mating holes H3, described four the second pilot hole H2 lay respectively on four drift angles of described alignment sheets 4 and are respectively used to and four register pins 10 are pegged graft, and described four mating holes H3 arrange along a square.
For further illustrating principle of the present utility model and effect, the alignment mark of take describes as cruciform as example, at first four of half tone 2 to be exposed the first pilot hole H1 are enclosed within respectively on four register pins 10, thereby half tone 2 to be exposed is arranged on pedestal 1, negative 3 is arranged on half tone 2 to be exposed afterwards, then four of alignment sheets 4 the second pilot hole H2 are enclosed within respectively on four register pins 10, alignment sheets 4 namely is fixedly installed on pedestal 1 and half tone to be exposed 2, finally the position by adjusting negative 3 so that operating personnel from four mating holes H3, observing respectively four cross-shaped alignment marks on negative 3, by adhesive plaster etc., base plate 3 is pasted and fixed on half tone 2 to be exposed subsequently, opening afterwards exposure light source exposes and is copied on half tone 2 to be exposed with the pattern by base plate 3 half tone 2 to be exposed.
In sum, half tone exposure of the present utility model is aimed at tool and is comprised pedestal and alignment sheets, on pedestal, be provided with a plurality of register pins, on described half tone frame to be exposed and alignment sheets, be respectively arranged with a plurality of the first pilot holes and the second pilot hole be complementary with a plurality of register pins, by the grafting with register pin, be fixed on pedestal, on alignment sheets, also be provided with a plurality of mating holes, thereby by a plurality of alignment marks on mating holes and base plate aim at realize aiming at of negative and half tone to be exposed, so can reduce the difficulty of aligning and improve the precision of aiming at.
Claims (6)
1. tool is aimed in a half tone exposure, it is characterized in that, comprising:
Pedestal, be used to half tone to be exposed and negative are set, be provided with a plurality of register pins on it, on described half tone frame to be exposed, be provided with a plurality of the first pilot holes that are complementary with a plurality of register pins, on described negative, is provided with a plurality of alignment marks; And
Alignment sheets, be provided with a plurality of the second pilot holes and a plurality of mating holes on it, described a plurality of the second pilot holes are for described a plurality of register pins coupling, being connected, described a plurality of mating holes be used for by with described a plurality of alignment mark to aim at negative and half tone to be exposed.
2. tool is aimed in half tone exposure as claimed in claim 1, it is characterized in that, the aperture of described mating holes is 0.5~3mm.
3. tool is aimed in half tone exposure as claimed in claim 1, it is characterized in that, described alignment mark is cruciform or M shape.
4. tool is aimed in half tone exposure as claimed in claim 1, it is characterized in that, on described pedestal, be provided with four register pins, described four register pins are arranged along a square.
5. tool is aimed in half tone exposure as claimed in claim 4, it is characterized in that, described alignment sheets is four jiaos of stars or square, described alignment sheets comprises four the second pilot holes and four mating holes, described four the second pilot holes lay respectively on four drift angles of described alignment sheets and are respectively used to and four register pins are pegged graft, and described four mating holes are arranged along a square.
6. tool is aimed in half tone exposure as claimed in claim 1, it is characterized in that, is coated with silk screen to be exposed on described half tone to be exposed, is coated with photoresists on described silk screen to be exposed, and described negative is arranged between silk screen to be exposed and exposure light source.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2013201286384U CN203311160U (en) | 2013-03-18 | 2013-03-18 | Screen exposure alignment fixture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2013201286384U CN203311160U (en) | 2013-03-18 | 2013-03-18 | Screen exposure alignment fixture |
Publications (1)
Publication Number | Publication Date |
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CN203311160U true CN203311160U (en) | 2013-11-27 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2013201286384U Expired - Lifetime CN203311160U (en) | 2013-03-18 | 2013-03-18 | Screen exposure alignment fixture |
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CN (1) | CN203311160U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109532259A (en) * | 2018-12-04 | 2019-03-29 | 广东德润纺织有限公司 | The quasi- seamless printing technology of the superfinishing of elastic fabric |
-
2013
- 2013-03-18 CN CN2013201286384U patent/CN203311160U/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109532259A (en) * | 2018-12-04 | 2019-03-29 | 广东德润纺织有限公司 | The quasi- seamless printing technology of the superfinishing of elastic fabric |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CX01 | Expiry of patent term |
Granted publication date: 20131127 |
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CX01 | Expiry of patent term |