CN204086812U - A kind of novel photolithography plate fixture for exposing - Google Patents
A kind of novel photolithography plate fixture for exposing Download PDFInfo
- Publication number
- CN204086812U CN204086812U CN201420537941.4U CN201420537941U CN204086812U CN 204086812 U CN204086812 U CN 204086812U CN 201420537941 U CN201420537941 U CN 201420537941U CN 204086812 U CN204086812 U CN 204086812U
- Authority
- CN
- China
- Prior art keywords
- metal framework
- glass plate
- passage
- hollow tube
- press strip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model relates to a kind of novel photolithography plate fixture for exposing, it includes metal framework, hollow tube, glass plate, press strip, gib screw, the passage around framework is provided with in the body of described metal framework, the bottom rail of metal framework is provided with the connector for installing hollow tube, connector and passage through, the dorsal part end face of the body of metal framework is provided with the groove corresponding with described passage, bottom portion of groove is provided with some apertures and is connected with passage, the dorsal part end face inside casing of metal framework is provided with the step for mounting glass plate, the top rail of metal framework is provided with the screw for installing press strip, described hollow tube is fixed on the bottom rail of metal framework, glass plate is embedded on the step of metal framework, the dorsal part end face of glass plate and metal framework, press strip is fixed by screws on metal framework top rail.The utility model advantage: this product had both avoided the time that automatic exposure machine is wasted into and out of sheet, in turn simplify production equipment, provides help for producing in enormous quantities.
Description
Technical field:
The utility model relates to a kind of photomechanical production of semiconductor devices, more specifically to a kind of novel photolithography plate fixture for exposing.
Background technology:
Semi-conductor silicon chip has many procedures in its process, and " photoetching " is exactly wherein one important operation.A kind of product may contain twice, three roads, and the even photo-mask process of multiple tracks, photo-mask process is in occupation of the most production time.In other words, the efficiency that improve photoetching just equals the production cycle shortening product, improves output.At present, in industry the exposure process of semi-conductor silicon chip nearly all exposes with " automatic exposure machine ".Its feature is exactly: silicon chip can from advancing sheet, slice, exposure on guide rail.Its whole time shutter be " enter sheet time+time shutter+the slice time " summation.If exposure is 10 seconds, turnover sheet is respectively 10 seconds, and so the monolithic exposure used time is exactly 30 seconds, the time seeming " very short " like this reaches up to ten thousand in monthly output, on after 100,000, will become very considerable.
Utility model content:
The purpose of this utility model provides a kind of repeatability, the efficient novel photolithography plate fixture for exposing for prior art weak point.
The purpose of this utility model is realized by following measures: a kind of novel photolithography plate fixture for exposing, it is characterized in that, it includes metal framework, hollow tube, glass plate, press strip, gib screw, the passage around framework is provided with in the body of described metal framework, the bottom rail of metal framework is provided with the connector for installing hollow tube, connector and passage through, the dorsal part end face of the body of metal framework is provided with the groove corresponding with described passage, bottom portion of groove is provided with some apertures and is connected with passage, the dorsal part end face inside casing of metal framework is provided with the step for mounting glass plate, the top rail of metal framework is provided with the screw for installing press strip, described hollow tube is fixed on the bottom rail of metal framework, glass plate is embedded on the step of metal framework, the dorsal part end face of glass plate and metal framework, press strip is fixed by screws on metal framework top rail.
Compared with prior art, a kind of novel photolithography plate fixture for exposing that the utility model proposes, tool has the following advantages: this product had both avoided the time that automatic exposure machine is wasted into and out of sheet, in turn simplify production equipment, improve efficiency, providing help for producing in enormous quantities.
Accompanying drawing illustrates:
Fig. 1 is the schematic diagram of the embodiment that the utility model proposes.
Embodiment:
Below in conjunction with accompanying drawing, embodiment is elaborated: shown in Fig. 1, give embodiment of the present utility model.In figure, a kind of novel photolithography plate fixture for exposing, it includes: metal framework 2, hollow tube 1, glass plate 3, press strip 5, gib screw 4, the passage 21 around framework is provided with in the body of described metal framework 2, the bottom rail of metal framework 2 is provided with the connector for installing hollow tube 1, connector and passage 21 through, the dorsal part end face of the body of metal framework 2 is provided with the groove 22 corresponding with described passage, be provided with some apertures 23 bottom groove 22 to be connected with passage, the dorsal part end face inside casing of metal framework 2 is provided with the step for mounting glass plate 3, the top rail of metal framework 2 is provided with the screw for installing press strip 5, described hollow tube 1 is fixed on the bottom rail of metal framework 2, glass plate 3 is embedded on the step of metal framework 2, the dorsal part end face of glass plate 3 and metal framework 2, press strip 5 is fixed on metal framework 2 top rail by screw 4.
The utility model is work like this: by the photolithography plate with shadow pattern, also namely film plate stacks on a glass, note the aligning framework central authorities making visuals, then silicon chip is put between film plate and glass plate, film plate and glass plate are fit together by screw by press strip, open vacuum after vacuum tube is connected with hollow tube, and silicon chip is held can not be moved, then fixture is pushed exposure tower can expose, this fixture saves the time of 2/3 than automatic exposure.
Describe embodiment of the present utility model by reference to the accompanying drawings above; the structure that embodiment provides does not form restriction of the present utility model, and in this area, those skilled in the art make various distortion within the scope of the appended claims or revise all in protection domain.
Claims (1)
1. the novel photolithography plate fixture for exposing, it is characterized in that, it includes metal framework, hollow tube, glass plate, press strip, gib screw, the passage around framework is provided with in the body of described metal framework, the bottom rail of metal framework is provided with the connector for installing hollow tube, connector and passage through, the dorsal part end face of the body of metal framework is provided with the groove corresponding with described passage, bottom portion of groove is provided with some apertures and is connected with passage, the dorsal part end face inside casing of metal framework is provided with the step for mounting glass plate, the top rail of metal framework is provided with the screw for installing press strip, described hollow tube is fixed on the bottom rail of metal framework, glass plate is embedded on the step of metal framework, the dorsal part end face of glass plate and metal framework, press strip is fixed by screws on metal framework top rail.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420537941.4U CN204086812U (en) | 2014-09-18 | 2014-09-18 | A kind of novel photolithography plate fixture for exposing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420537941.4U CN204086812U (en) | 2014-09-18 | 2014-09-18 | A kind of novel photolithography plate fixture for exposing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204086812U true CN204086812U (en) | 2015-01-07 |
Family
ID=52179509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420537941.4U Expired - Fee Related CN204086812U (en) | 2014-09-18 | 2014-09-18 | A kind of novel photolithography plate fixture for exposing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204086812U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114924469A (en) * | 2022-05-30 | 2022-08-19 | 中国电子科技集团公司第二十九研究所 | Exposure alignment device and alignment method for solder mask layer of multilayer co-fired ceramic circuit substrate |
-
2014
- 2014-09-18 CN CN201420537941.4U patent/CN204086812U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114924469A (en) * | 2022-05-30 | 2022-08-19 | 中国电子科技集团公司第二十九研究所 | Exposure alignment device and alignment method for solder mask layer of multilayer co-fired ceramic circuit substrate |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150107 Termination date: 20180918 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |