CN203204269U - Filter and display device - Google Patents
Filter and display device Download PDFInfo
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- CN203204269U CN203204269U CN 201320170334 CN201320170334U CN203204269U CN 203204269 U CN203204269 U CN 203204269U CN 201320170334 CN201320170334 CN 201320170334 CN 201320170334 U CN201320170334 U CN 201320170334U CN 203204269 U CN203204269 U CN 203204269U
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- chock insulator
- insulator matter
- black matrix
- layer
- optical filter
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Abstract
The utility model provides a filter and a display device. The filter comprises a substrate, a film group and spacers, wherein the film group is arranged above the substrate; the bottoms of the spacers are embedded in the film group; and the tops of the spacers are higher than the upper surface of the film group. According to the filter, the contact areas of the spacers and the film group are increased by embedding the bottoms of the spacers in the film group, so that the spacers and the film group are kept in firm adhesion, thereby preventing the spacers from easy displacement or deformation and guaranteeing the display effect of the display screen.
Description
Technical field
The utility model belongs to the display technique field, particularly, relates to a kind of optical filter and display device.
Background technology
Liquid crystal display (LCD:Liquid Crystal Display) has become main product in the present flat-panel monitor because of characteristics such as its volume are little, low in energy consumption, radiationless.Optical filter (Filer) and array base palte (Array) are the important component parts of LCDs, also are the key components that affects display effect.
Generally, optical filter comprises substrate and is formed on black matrix (BM), color filter layer (being pixel layer), flatness layer (OC) (being protective seam) on the substrate.In LCDs, in order to keep box thick (Cell gap), prevent the LCDs extrusion and can't normally show, some chock insulator matters need to distribute between array base palte and optical filter.Early stage LCDs adopts a kind of chock insulator matter (Ball Spacer) of sphere, before to box, spherical chock insulator matter is spread between array base palte and the optical filter, this chock insulator matter is easy to mobile and can't the fixed position, might be in long use procedure, because skewness causes assembling at a certain regional area, can't play the thick effect of stable box of keeping, therefore, affect the display effect of LCDs.
Chock insulator matter often is convex chock insulator matter (Post Spacer) (such as columnar projections or other shape projection) at present, is about to the surface (such as the surface of flatness layer) that chock insulator matter is formed on optical filter.The main stream approach of preparation convex chock insulator matter is photoetching process at present.Detailed process is the photosensitive resin material to be coated the flatness layer surface of optical filter, prepares chock insulator matter through overexposure, developing process, as shown in Figure 1.But, because chock insulator matter 105 is formed at the flatness layer surface, only have the bottom surface to contact with flatness layer, be subject to resin surface state and preparation technology's impact, be difficult to guarantee that all chock insulator matters 105 can both keep very securely bonding with flatness layer, cause part chock insulator matter 105 that displacement or distortion are easily occuring to box technique or when LCDs is squeezed, thereby affect the display effect of display screen.
The utility model content
The utility model is for the above-mentioned technical matters that exists in the prior art, a kind of optical filter is provided, described optical filter is embedded in the film layer group by the bottom with chock insulator matter, thereby so that chock insulator matter and film layer group keep secure bond, and then so that chock insulator matter is not easy displacement or sex change occur, guaranteed the display effect of display screen.
A kind of optical filter comprises substrate, film layer group and chock insulator matter, and film layer group is arranged on the substrate top, and the bottom of chock insulator matter is embedded in the film layer group, and the top of chock insulator matter is higher than the upper surface of film layer group.
Preferably, described film layer group comprises black matrix layer, and black matrix layer is arranged on the upper surface of substrate, and the bottom of chock insulator matter is embedded in the black matrix layer, and the top of chock insulator matter is higher than the upper surface of black matrix layer.
Preferably, the difference in height scope of the top of chock insulator matter and black matrix layer upper surface is 1-5 μ m.
Preferably, described film layer group comprises black matrix layer and pixel layer, and black matrix layer and pixel layer are disposed on the upper surface of substrate, and the bottom of chock insulator matter is embedded in black matrix layer or the pixel layer, and the top of chock insulator matter is higher than the upper surface of black matrix layer or pixel layer.
Preferably, the difference in height scope of the upper surface of the top of chock insulator matter and black matrix layer or pixel layer is 1-5 μ m.
Preferably, described film layer group comprises black matrix layer, pixel layer and protective seam, black matrix layer and pixel layer are disposed on the upper surface of substrate, and protective seam is arranged on the top of black matrix layer and pixel layer, and the bottom of chock insulator matter is arranged on the upper surface of pixel layer or is embedded in the pixel layer; Perhaps, the bottom of chock insulator matter is arranged on the upper surface of black matrix layer or is embedded in the black matrix layer; Perhaps, the bottom of chock insulator matter is embedded in the protective seam, and the top of chock insulator matter is higher than the upper surface of protective seam.
Preferably, the difference in height scope of the upper surface of the top of chock insulator matter and protective seam is 1-5 μ m.
Preferably, chock insulator matter is cylindric or the truncated cones shape.
Preferably, the cross-sectional diameter scope of the bottom of chock insulator matter is 12-30 μ m, and the cross-sectional diameter scope at the top of chock insulator matter is 8-25 μ m.
Preferably, the altitude range of chock insulator matter is 2-8 μ m, and the thickness range of black matrix layer, pixel layer, protective seam is 1-5 μ m.
Preferably, black matrix layer adopts the black resin material to make, and pixel layer adopts red resin material, green resin material or blue resins material to make, and protective seam adopts transparent resin material to make, and chock insulator matter adopts transparent resin material to make.
The utility model also provides a kind of display device, comprises above-mentioned optical filter, also comprises and the array base palte of described optical filter to box.
The beneficial effects of the utility model: described optical filter is embedded in the film layer group by the bottom with chock insulator matter, greatly increased the contact area of chock insulator matter and film layer group, so that chock insulator matter and film layer group can keep secure bond, thereby so that chock insulator matter is when being subject to ambient pressure, be not easy to break away from film layer group, and then so that chock insulator matter is not easy to occur displacement or distortion, therefore guaranteed the display effect of display screen.
Description of drawings
Fig. 1 is the structural representation of optical filter in the prior art;
Fig. 2 is the structural representation of optical filter among the utility model embodiment 1;
Wherein:
Fig. 2 a is the structural representation of the optical filter of the bottom of the chock insulator matter upper surface that is arranged on pixel layer;
Fig. 2 b is the structural representation that the bottom of chock insulator matter is embedded in the optical filter in the pixel layer;
Fig. 2 c is the structural representation that the bottom of chock insulator matter is embedded in the optical filter in the black matrix layer;
Fig. 2 d is the structural representation that the bottom of chock insulator matter is embedded in the optical filter in the protective seam;
Fig. 3 is the structural representation of optical filter among the utility model embodiment 2;
Wherein:
Fig. 3 a is the structural representation that the bottom of chock insulator matter is embedded in the optical filter in the pixel layer;
Fig. 3 b is the structural representation that the bottom of chock insulator matter is embedded in the optical filter in the black matrix layer;
Fig. 4 is the structural representation of optical filter among the utility model embodiment 3;
Description of reference numerals wherein:
101. substrate; 102. black matrix layer; 103. pixel layer; 104. protective seam; 105. chock insulator matter.
Embodiment
For making those skilled in the art understand better the technical solution of the utility model, below in conjunction with the drawings and specific embodiments the utility model optical filter and display device are described in further detail.
Embodiment 1:
The present embodiment provides a kind of optical filter, comprises substrate, film layer group and chock insulator matter, and film layer group is arranged on the substrate top, and the bottom of chock insulator matter is embedded in the film layer group, and the top of chock insulator matter is higher than the upper surface of film layer group.
The optical filter that the present embodiment provides is colored filter, and is provided with protective seam in the colored filter.
As shown in Figure 2; described film layer group comprises black matrix layer 102, pixel layer 103 and protective seam 104; black matrix layer 102 and pixel layer 103 are disposed on the upper surface of substrate 101; protective seam 104 is arranged on the top of black matrix layer 102 and pixel layer 103; the bottom of chock insulator matter 105 is arranged on the upper surface of pixel layer 103, and (such as Fig. 2 a), the top of chock insulator matter 105 is higher than the upper surface of protective seam 104.
Wherein, the difference in height scope of the upper surface of the top of chock insulator matter 105 and protective seam 104 is 1-5 μ m.The altitude range of chock insulator matter 105 is 2-8 μ m, and the thickness range of black matrix layer 102, pixel layer 103, protective seam 104 is 1-5 μ m.Black matrix layer 102 adopts the black resin material to make, and pixel layer 103 adopts red resin material, green resin material or blue resins material to make, and protective seam 104 adopts transparent resin material to make, and chock insulator matter 105 adopts transparent resin material to make.
Preferably, chock insulator matter 105 is the truncated cones shape.The cross-sectional diameter scope of the bottom of chock insulator matter 105 is 12-30 μ m, and the cross-sectional diameter scope at the top of chock insulator matter 105 is 8-25 μ m.The chock insulator matter of this truncated cones shape since its base area greater than top surface area, meeting is so that the setting of chock insulator matter is more firm, so that it is thick to keep stable box.
The optical filter of said structure can prepare as follows:
Step S1. forms black matrix layer 102 at substrate 101.
At first apply one deck black resin materials (namely black matrix with photoresist) at substrate 101, then have the mask plate of figure that this photoresist is exposed by portrayal, then develop and solidifies, obtain deceiving matrix layer 102.
Step S2. forms pixel layer 103 at the substrate 101 of completing steps S1.
Wherein, pixel layer 103 comprises red pixel layer, green pixel layer and blue pixel layer, makes (be several different colours pixels with photoresist) by red resin material, green resin material and blue resins material respectively.
In preparation process, the coated red pixel has the mask plate of figure that this photoresist is exposed, develops and solidifies with photoresist by portrayal on the substrate 101 of completing steps S1, obtains the red pixel layer; Correspondingly repeat above-mentioned steps to obtain green pixel layer and blue pixel layer.
Certainly, the color of pixel layer 103 also can comprise other color except red, green or blue.
Step S3. forms chock insulator matter 105 at the substrate 101 of completing steps S2.
Namely the substrate 101 at completing steps S2 applies chock insulator matter with photoresist (a kind of transparent resin material), has the mask plate of figure that this photoresist is exposed, develops and solidifies by portrayal, obtains truncated cones shape chock insulator matter 105.The bottom of chock insulator matter is formed on the upper surface of pixel layer 103.
Step S4. forms protective seam 104 at the substrate 101 of completing steps S3.
I.e. on the substrate 101 of completing steps S3 armor coated with photoresist (a kind of transparent resin material), this moment, protective layer used photoresist covered chock insulator matter 105 fully, had the gray mask plate of chock insulator matter figure or half-tone mask plate that the protective seam photoresist is exposed, develops and solidify to form protective seam 104 by portrayal; Perhaps, the protective seam photoresist not exclusively covers chock insulator matter 105, and just is coated in the zone that substrate 101 tops do not have chock insulator matter, then by protective layer used photoresist being exposed, develops and solidifying to form protective seam 104.
By above-mentioned technique, this protective seam 104 runs through truncated cones shape chock insulator matter 105, the side close contact of the bottom of protective seam 104 and truncated cones shape chock insulator matter 105, and the top of truncated cones shape chock insulator matter 105 is higher than the upper surface of protective seam 104.
Need to prove, the shape of chock insulator matter 105 also can be for cylindric, and perhaps other shape is not done restriction here.
Simultaneously; the bottom of chock insulator matter 105 can also be embedded in (such as Fig. 2 b) in the pixel layer 103; perhaps; be arranged on the upper surface of black matrix layer 102 or be embedded in and deceive in the matrix layer 102 (such as Fig. 2 c); perhaps; be embedded in (such as Fig. 2 d) in the protective seam 104, all can reach the effect that makes chock insulator matter 105 and film layer group secure bond.
Wherein, when chock insulator matter 105 is embedded in the black matrix layer 102 or is embedded in the pixel layer 103, its concrete preparation method can by in step S1 or step S2, adopt portrayal have the gray mask plate of chock insulator matter figure or half-tone mask plate to black matrix layer 102 with photoresist or pixel layer 103 expose with photoresist, develop and solidify and realize.
Simultaneously, when chock insulator matter 105 is embedded in the black matrix layer 102, answer the preparation order of corresponding adjustment pixel layer 103 and chock insulator matter 105.In addition, when chock insulator matter 105 is embedded in the protective seam 104, answer the preparation order of corresponding adjustment protective seam 104 and chock insulator matter 105.
Embodiment 2:
The present embodiment provides a kind of optical filter, comprises substrate, film layer group and chock insulator matter, and film layer group is arranged on the substrate top, and the bottom of chock insulator matter is embedded in the film layer group, and the top of chock insulator matter is higher than the upper surface of film layer group.With embodiment 1 difference be in this colored filter protective seam not to be set.
As shown in Figure 3, described film layer group comprises black matrix layer 102 and pixel layer 103, black matrix layer 102 and pixel layer 103 are disposed on the upper surface of substrate 101, and the bottom of chock insulator matter 105 is embedded in that (such as Fig. 3 a), the top of chock insulator matter 105 is higher than the upper surface of pixel layer 103 in the pixel layer 103.
Wherein, the difference in height scope of the upper surface of the top of chock insulator matter 105 and pixel layer 103 is 1-5 μ m.
Need to prove, in the present embodiment, the bottom of chock insulator matter 105 also can be embedded in the black matrix layer 102 (such as Fig. 3 b), and corresponding, the top of chock insulator matter 105 is higher than the upper surface of black matrix layer 102.
Compare with embodiment 1, the optical filter of the present embodiment is not owing to arranging protective seam, so the preparation technology of this optical filter can correspondingly save step S4; And, according to the concrete setting position in film layer group of chock insulator matter 105, answer the preparation order of corresponding adjustment pixel layer 103 and chock insulator matter 105.After preparation is finished, the part of described pixel layer 103 runs through truncated cones shape chock insulator matter 105, or the part of described black matrix layer 102 runs through truncated cones shape chock insulator matter 105, the side close contact of the bottom of described pixel layer 103 or described black matrix layer 102 and truncated cones shape chock insulator matter 105, the top of truncated cones shape chock insulator matter 105 is higher than the upper surface of pixel layer 103 or black matrix layer 102.
In the present embodiment, the relative dimensions of optical filter, material are identical with embodiment 1, repeat no more herein.
Embodiment 3:
The present embodiment provides a kind of optical filter, comprises substrate, film layer group and chock insulator matter, and film layer group is arranged on the substrate top, and the bottom of chock insulator matter is embedded in the film layer group, and the top of chock insulator matter is higher than the upper surface of film layer group.With embodiment 1 and embodiment 2 differences be that this optical filter does not arrange pixel layer and protective seam.
As shown in Figure 4, described film layer group comprises black matrix layer 102, and black matrix layer 102 is arranged on the upper surface of substrate 101, and the bottom of chock insulator matter 105 is embedded in the black matrix layer 102, and the top of chock insulator matter 105 is higher than the upper surface of black matrix layer 105.
Wherein, the difference in height scope of the top of chock insulator matter 105 and black matrix layer 102 upper surfaces is 1-5 μ m.
Compare with embodiment 1, the optical filter of the present embodiment is not owing to arranging pixel layer and protective seam, therefore the preparation technology of this optical filter can correspondingly save step S2 and S4, in step S1, when substrate 101 forms black matrix layer 102, there is the mask plate of chock insulator matter figure that black matrix is exposed with photoresist, develops and solidifies by portrayal, obtains black matrix layer 102; Then, directly chock insulator matter 105 is formed on the black matrix layer and gets final product, identical among the concrete preparation method of chock insulator matter and the embodiment 1.After preparation was finished, the part of described black matrix layer 102 ran through truncated cones shape chock insulator matter 105, and with the side close contact of the bottom of truncated cones shape chock insulator matter 105, the top of truncated cones shape chock insulator matter 105 is higher than the upper surface of black matrix layer 102.
In the present embodiment, the relative dimensions of optical filter, material are identical with embodiment 1, repeat no more herein.
Need to prove, the described optical filter of the present embodiment is not owing to arranging red pixel layer, green pixel layer or blue pixel layer, so the light after this optical filter of process filters is black and white light, is not colored light, namely the optical filter in the present embodiment is the black and white optical filter.
The beneficial effects of the utility model: the optical filter that embodiment 1-3 provides is embedded in the film layer group by the bottom with chock insulator matter, greatly increased the contact area of chock insulator matter and film layer group, so that chock insulator matter and film layer group can keep secure bond, thereby so that chock insulator matter is when being subject to ambient pressure (such as optical filter in to box technique or when being squeezed), be not easy to break away from film layer group, and then so that chock insulator matter is not easy to occur displacement or distortion, therefore guaranteed the display effect of display screen.
Embodiment 4:
The present embodiment provides a kind of display device, comprises the optical filter that above-mentioned any one embodiment provides, and also comprises and the array base palte of optical filter to box.
In the described display device owing to having adopted the optical filter described in above-described embodiment, so that display device is when being subject to ambient pressure in to box technique or in long-term use procedure, can both avoid displacement or the distortion of chock insulator matter, thereby avoided the light leak of the display device that causes thus or shown the phenomenons such as bad, and then guaranteed the quality of display device.
Need to prove, the display device that the colored filter among the embodiment 1 or 2 and array base palte form after to box is colour display device, and the display device that the black and white optical filter among the embodiment 3 and array base palte form after to box is the white and black displays device.
Be understandable that, above embodiment only is the illustrative embodiments that adopts for principle of the present utility model is described, yet the utility model is not limited to this.For those skilled in the art, in the situation that do not break away from spirit of the present utility model and essence, can make various modification and improvement, these modification and improvement also are considered as protection domain of the present utility model.
Claims (12)
1. an optical filter comprises substrate, film layer group and chock insulator matter, and described film layer group is arranged on described substrate top, it is characterized in that, the bottom of described chock insulator matter is embedded in the described film layer group, and the top of described chock insulator matter is higher than the upper surface of described film layer group.
2. optical filter according to claim 1, it is characterized in that, described film layer group comprises black matrix layer, and described black matrix layer is arranged on the upper surface of described substrate, the bottom of described chock insulator matter is embedded in the described black matrix layer, and the top of described chock insulator matter is higher than the upper surface of described black matrix layer.
3. optical filter according to claim 2 is characterized in that, the difference in height scope of the top of described chock insulator matter and described black matrix layer upper surface is 1-5 μ m.
4. optical filter according to claim 1, it is characterized in that, described film layer group comprises black matrix layer and pixel layer, described black matrix layer and described pixel layer are disposed on the upper surface of described substrate, the bottom of described chock insulator matter is embedded in described black matrix layer or the described pixel layer, and the top of described chock insulator matter is higher than the upper surface of described black matrix layer or described pixel layer.
5. optical filter according to claim 4 is characterized in that, the difference in height scope of the upper surface of the top of described chock insulator matter and described black matrix layer or described pixel layer is 1-5 μ m.
6. optical filter according to claim 1, it is characterized in that, described film layer group comprises black matrix layer, pixel layer and protective seam, described black matrix layer and described pixel layer are disposed on the upper surface of described substrate, described protective seam is arranged on the top of described black matrix layer and described pixel layer, and the bottom of described chock insulator matter is arranged on the upper surface of described pixel layer or is embedded in the described pixel layer;
Perhaps, the bottom of described chock insulator matter is arranged on the upper surface of described black matrix layer or is embedded in the described black matrix layer;
Perhaps, the bottom of described chock insulator matter is embedded in the described protective seam, and the top of described chock insulator matter is higher than the upper surface of described protective seam.
7. optical filter according to claim 6 is characterized in that, the difference in height scope of the top of described chock insulator matter and the upper surface of described protective seam is 1-5 μ m.
8. the described optical filter of any one is characterized in that according to claim 2-7, and described chock insulator matter is cylindric or the truncated cones shape.
9. optical filter according to claim 8 is characterized in that, the cross-sectional diameter scope of the bottom of described chock insulator matter is 12-30 μ m, and the cross-sectional diameter scope at the top of described chock insulator matter is 8-25 μ m.
10. optical filter according to claim 9 is characterized in that, the altitude range of described chock insulator matter is 2-8 μ m, and the thickness range of described black matrix layer, described pixel layer, described protective seam is 1-5 μ m.
11. optical filter according to claim 10; it is characterized in that; described black matrix layer adopts the black resin material to make; described pixel layer adopts red resin material, green resin material or blue resins material to make; described protective seam adopts transparent resin material to make, and described chock insulator matter adopts transparent resin material to make.
12. a display device is characterized in that, comprises the described optical filter of claim 1-11 any one, also comprises and the array base palte of described optical filter to box.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320170334 CN203204269U (en) | 2013-04-08 | 2013-04-08 | Filter and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320170334 CN203204269U (en) | 2013-04-08 | 2013-04-08 | Filter and display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203204269U true CN203204269U (en) | 2013-09-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320170334 Expired - Lifetime CN203204269U (en) | 2013-04-08 | 2013-04-08 | Filter and display device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203204269U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105759520A (en) * | 2016-04-21 | 2016-07-13 | 深圳市华星光电技术有限公司 | Liquid crystal display panel |
| CN108121117A (en) * | 2016-11-30 | 2018-06-05 | 乐金显示有限公司 | Display panel |
| WO2020062491A1 (en) * | 2018-09-30 | 2020-04-02 | 惠科股份有限公司 | Color filter and display panel |
| CN111176007A (en) * | 2020-01-10 | 2020-05-19 | 南京中电熊猫平板显示科技有限公司 | Display panel and manufacturing method thereof |
-
2013
- 2013-04-08 CN CN 201320170334 patent/CN203204269U/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105759520A (en) * | 2016-04-21 | 2016-07-13 | 深圳市华星光电技术有限公司 | Liquid crystal display panel |
| CN108121117A (en) * | 2016-11-30 | 2018-06-05 | 乐金显示有限公司 | Display panel |
| WO2020062491A1 (en) * | 2018-09-30 | 2020-04-02 | 惠科股份有限公司 | Color filter and display panel |
| CN111176007A (en) * | 2020-01-10 | 2020-05-19 | 南京中电熊猫平板显示科技有限公司 | Display panel and manufacturing method thereof |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130918 |