CN202881369U - Plasma cleaning electrode - Google Patents

Plasma cleaning electrode Download PDF

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Publication number
CN202881369U
CN202881369U CN 201220545350 CN201220545350U CN202881369U CN 202881369 U CN202881369 U CN 202881369U CN 201220545350 CN201220545350 CN 201220545350 CN 201220545350 U CN201220545350 U CN 201220545350U CN 202881369 U CN202881369 U CN 202881369U
Authority
CN
China
Prior art keywords
vacuum chamber
electrode bar
electrode
fixed
supports
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN 201220545350
Other languages
Chinese (zh)
Inventor
张果
王伟
姜玉伦
晋照春
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Orient Chengdu Co Ltd
Original Assignee
Ulvac Orient Chengdu Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Orient Chengdu Co Ltd filed Critical Ulvac Orient Chengdu Co Ltd
Priority to CN 201220545350 priority Critical patent/CN202881369U/en
Application granted granted Critical
Publication of CN202881369U publication Critical patent/CN202881369U/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

The utility model relates to a plasma cleaning electrode and solves the problems of the existing cleaning electrode that the mounting and the maintaining are inconvenient and parts and plastic films are easily damaged. Each of two ends of an electrode bar (6) is connected with a vacuum chamber (4), wherein one end of the electrode bar (6) is mounted on a fixed seat (11) connected with the vacuum chamber (4), an insulating ring (10) is arranged between the end of the electrode bar (6) and the vacuum chamber, an insulating sleeve (8) is arranged between the other end the electrode bar (6) and the vacuum chamber and fixed in the vacuum chamber (4) by a nut (9), and a water inlet pipe (15) and a water outlet pipe (14) are arranged at the end of the electrode bar; an outer cover is mounted outside the electrode bar (6) and comprises supports (1), fixed covers (2) and a movable cover (3); the supports (1) are located at two ends of the electrode bar, the fixed covers (2) are connected with the supports (1), the movable cover (3) is connected with the fixed covers, an air tube (12) is fixed on the vacuum chamber (4) and penetrates through the supports (1), and film guiding blocks (13) are mounted on the fixed covers (2).

Description

The plasma cleaning electrode
Technical field:
The utility model is relevant with the plasma cleaning electrode of vacuum winding coating equipment.
Background technology:
The plasma cleaning electrode of vacuum winding coating equipment is used for plastics film is cleaned, and the vacuum winding coating equipment is evaporation layer of metal film on plastics film, will clean plastics film before the deposited metal film, to improve the sticking power of metallic membrane.
Under the subatmospheric, be filled with specific gas, between two arrays of electrodes, apply certain voltage, gas is ionized, and the plasma body after the ionization clashes into film in moving process, removes the impurity of film surface, and make film charged, improve the sticking power of metallic membrane on film of evaporation.Existing plasma cleaning electrode structure is complicated, installation and maintenance inconvenience, and the overheated meeting of electrode bar causes the damage of part deformation and sealing-ring, the fragile plastics film of electrode outer cover.
The utility model content:
The purpose of this utility model provides a kind of simple in structure, and installation and maintenance is convenient, and part can be overheated not impaired because of electrode bar, can not damage the plasma cleaning electrode of plastics film.
The utility model is achieved in that
The utility model plasma cleaning electrode, each is connected electrode bar 6 two ends with a vacuum chamber 4, wherein an end is installed on the permanent seat 11 that is connected with vacuum chamber 4, dead ring 10 is arranged between this end and the vacuum chamber, insulating sleeve 8 is wherein arranged between the other end and the vacuum chamber and be fixed in vacuum chamber 4 by nut 9, this end of electrode bar has water inlet pipe 15 and rising pipe 14, the described electrode bar 6 outer outer covers that are equipped with, outer cover comprises the support 1 that is positioned at the electrode bar two ends, support 1 fixed cover that is connected 2 with two, the movable guard 3 that is connected with fixed cover, tracheae 12 are fixed on the vacuum chamber 4, and pass and support 1, film orienting lug 13 is housed on the fixed cover 2.
The utility model is simple in structure, and installation and maintenance is convenient, when electrode bar is carried out maintaining, only need pull down movable guard.Electrode bar is by water cooling, and it is overheated to prevent.The exterior film orienting lug of fixed cover can avoid damaging plastics film.
Description of drawings:
Fig. 1 is the utility model structure iron.
Fig. 2 is movable guard dismounting figure of the present utility model.
Fig. 3 is the electrode bar structure iron.
Fig. 4 is electrode bar one end and vacuum chamber interface chart.
Fig. 5 is the electrode bar the other end and vacuum chamber interface chart.
Embodiment:
The direct supply that between electrode bar 6 and vacuum chamber 4, adds high pressure, electrode bar 6 is anode, carries out within the specific limits for making electrical discharge zone, and electrode bar 6 is outer to be equipped with the electrode outer cover, and the electrode outer cover is connected with vacuum chamber 4 usefulness screws, is the negative electrode of power supply.
The electrode outer cover is formed, and is connected with screw by electrode outer cover support 1, electrode fixed cover 2, electrode movable guard 3; When electrode bar is carried out maintaining, only need dismounting electrode movable guard 3.
In the electrode bar 6 magnetic pole is arranged, an end is welded with cooling water inlet pipe 15 and rising pipe 14, and magnetic pole can make the ionization of gas around the electrode bar more abundant, improves cleansing power; The long-time cleaning, electrode bar can generate heat, and passes into water coolant and can prevent that electrode bar is overheated, avoids the damage of part deformation and sealing-ring.
The two ends of electrode bar are separately fixed in the vacuum chamber 4, one end is fixing with locknut 9, and the other end is installed on the permanent seat 11, is screwed on vacuum chamber 4 by permanent seat 11, for preventing negative electrode and anode conducting, installing insulating sleeve 8 and dead ring 10 between electrode and vacuum chamber.
Tracheae 12 is housed on the electrode outer cover, to pass into specific gas, is produced plasma body after electrode bar 6 ionization, the bombardment film surface removes impurity, and makes film charged, improves the sticking power of metallic membrane on film of evaporation.
Film orienting lug 13 is housed on the electrode outer cover, and film passes between two orienting lugs 13, prevents that film from running into electrode fixed cover 2, avoids film to decrease ring.

Claims (1)

1. plasma cleaning electrode, each is connected with a vacuum chamber (4) to it is characterized in that electrode bar (6) two ends, wherein an end is installed on the permanent seat (11) that is connected with vacuum chamber (4), dead ring (10) is arranged between this end and the vacuum chamber, insulating sleeve (8) is wherein arranged between the other end and the vacuum chamber and be fixed in vacuum chamber (4) by nut (9), this end of electrode bar has water inlet pipe (15) and rising pipe (14), the outer outer cover that is equipped with of described electrode bar (6), outer cover comprises the support (1) that is positioned at the electrode bar two ends, support the fixed cover (2) that (1) is connected with two, the movable guard that is connected with fixed cover (3), tracheae (12) is fixed on the vacuum chamber (4), and pass support (1), film orienting lug (13) is housed on the fixed cover (2).
CN 201220545350 2012-10-24 2012-10-24 Plasma cleaning electrode Expired - Lifetime CN202881369U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201220545350 CN202881369U (en) 2012-10-24 2012-10-24 Plasma cleaning electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201220545350 CN202881369U (en) 2012-10-24 2012-10-24 Plasma cleaning electrode

Publications (1)

Publication Number Publication Date
CN202881369U true CN202881369U (en) 2013-04-17

Family

ID=48072815

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201220545350 Expired - Lifetime CN202881369U (en) 2012-10-24 2012-10-24 Plasma cleaning electrode

Country Status (1)

Country Link
CN (1) CN202881369U (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103805955A (en) * 2014-01-20 2014-05-21 深圳市金凯新瑞光电有限公司 Coating device and coating method for winding type sputtering three-layer dielectric film
CN104437017A (en) * 2013-09-18 2015-03-25 北京达特集成技术有限责任公司 Plasma waste-gas treatment device with self-flushing function
CN107460446A (en) * 2017-10-11 2017-12-12 肇庆兆达光电科技有限公司 A kind of flexible copper-clad plate winding film plating system of carrying magnetic electrode device
CN108411270A (en) * 2018-05-11 2018-08-17 湖南菲尔姆真空设备有限公司 A kind of vertical silicon chip magnetron sputtering coater
CN108411269A (en) * 2018-05-11 2018-08-17 湖南菲尔姆真空设备有限公司 A kind of ion-clearing electrodes applied to vertical silicon chip magnetron sputtering coater

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104437017A (en) * 2013-09-18 2015-03-25 北京达特集成技术有限责任公司 Plasma waste-gas treatment device with self-flushing function
CN103805955A (en) * 2014-01-20 2014-05-21 深圳市金凯新瑞光电有限公司 Coating device and coating method for winding type sputtering three-layer dielectric film
CN103805955B (en) * 2014-01-20 2016-03-02 深圳市金凯新瑞光电股份有限公司 A kind of film coating method sputtering three layer dielectrics for spirally wound
CN107460446A (en) * 2017-10-11 2017-12-12 肇庆兆达光电科技有限公司 A kind of flexible copper-clad plate winding film plating system of carrying magnetic electrode device
CN107460446B (en) * 2017-10-11 2019-06-04 肇庆兆达光电科技有限公司 A kind of flexible copper-clad plate winding film plating system of carrying magnetic electrode device
CN108411270A (en) * 2018-05-11 2018-08-17 湖南菲尔姆真空设备有限公司 A kind of vertical silicon chip magnetron sputtering coater
CN108411269A (en) * 2018-05-11 2018-08-17 湖南菲尔姆真空设备有限公司 A kind of ion-clearing electrodes applied to vertical silicon chip magnetron sputtering coater
CN108411270B (en) * 2018-05-11 2023-03-07 湖南众源科技有限公司 Vertical silicon wafer magnetron sputtering coating machine
CN108411269B (en) * 2018-05-11 2023-08-22 湖南众源科技有限公司 Ion cleaning electrode applied to vertical silicon wafer magnetron sputtering coating machine

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C14 Grant of patent or utility model
GR01 Patent grant
CX01 Expiry of patent term

Granted publication date: 20130417

CX01 Expiry of patent term