CN202595253U - Ion bombardment structure used for vacuum plating - Google Patents
Ion bombardment structure used for vacuum plating Download PDFInfo
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- CN202595253U CN202595253U CN 201220130244 CN201220130244U CN202595253U CN 202595253 U CN202595253 U CN 202595253U CN 201220130244 CN201220130244 CN 201220130244 CN 201220130244 U CN201220130244 U CN 201220130244U CN 202595253 U CN202595253 U CN 202595253U
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- ion bombardment
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Abstract
The utility model relates to the technical field of vacuum plating, in particular to an ion bombardment structure used for the vacuum plating. The ion bombardment structure used for the vacuum plating comprises a bombardment bar, the rear end of the bombardment bar is connected with an electrode electrically connected with a cable, the electrode is fixedly mounted on a corresponding carrier through an insulation sleeve, the bombardment bar and the electrode are coaxially arranged and connected through threads, one end of the electrode is connected with the cable, a thread section is arranged at the end of the electrode, and a nut connected with the tread section fixes the connection of the cable and the electrode. According to the ion bombardment structure used for the vacuum plating, the bombardment bar is charged with electricity and coordinated with argon to generate discharge and obtain plasma, the plasma is used to bombard the surface of a workpiece, filth on the surface of the workpiece can be ionized, and therefore cleaning effects are achieved. The ion bombardment structure used for the vacuum plating is simple, scientific and reasonable in structure, low in investment cost, small and exquisite in size, and convenient to mount and use; cleaning efficiency and quality of the surface of the workpiece are greatly improved, and therefore effects and quality of the vacuum plating are improved.
Description
Technical field
The utility model relates to technical field of vacuum plating, especially relates to the workpiece cleaning structure that vacuum plating is used.
Background technology
Have the physical vapor deposition (PVD) technology subsequently; Mainly be under vacuum environment, to carry out surface treatment; Physical vapor deposition itself is divided into three kinds: vacuum vapor plating, vacuum sputtering plating and vacuum ion membrane plating; Develop quite soon over past ten years, become one of current state-of-the-art surface treatment mode.It is to realize rete attached to workpiece surface that vacuum plating is produced, with the workpiece surface characteristic of acquisition needs, yet; When actual production, workpiece surface all more or less accumulates has dirt, and these dirts are as can not effectively removing; Then can influence film adhesion greatly, cause deterioration in quality.Thereby need clean, but traditional mode is to adopt artificial the scouring, this has not only increased labor capacity and production cost, and productivity is low, has the halfway defective of cleaning.
For this reason, the applicant caters to the demand of market development, and the spirit of adhering to the research innovation, keeping on improving is utilized its professional eye and expertise, works out a kind of industry utilization that is suitable for, and helps to produce the ion bombardment structure that successional vacuum plating is used.
Summary of the invention
The purpose of the utility model is to overcome the defective of prior art, the ion bombardment structure that provides a kind of vacuum plating to use, and simple in structure, cost is low, and is easy to clean, quick.
For achieving the above object, the utility model adopts following technical scheme:
The ion bombardment structure that vacuum plating is used, it includes the bombardment rod, bombards excellent rear end and is connected with electrode, and electrode and cable electrically connect, and electrode is fixedly mounted on corresponding carrier through insulation covering.
Said bombardment rod and the coaxial setting of electrode bombard between rod and the electrode through being threaded.The end that electrode is connected with cable is provided with thread segment, and the nut attached cable that thread segment connects is connected with electrode.
Such scheme further improves: the position that is connected with electrode thread at the bombardment rod is provided with U type sheath.
The ion bombardment structure that the vacuum plating of the utility model design is used can realize bombarding the rod energising and cooperate argon gas generation discharge to obtain plasma, and with plasma striking work surface; Make the dirt ionization of workpiece surface, thereby reach the effect of cleaning, simple in structure; Scientific and reasonable, cost of investment is low, advantages of small volume; Installation, easy to use promotes the efficient and the quality of workpiece surface cleaning greatly, thereby promotes the effect and the quality of vacuum plating.
Description of drawings:
Accompanying drawing 1 is the preferred embodiment structural representation of the utility model.
Embodiment:
Below in conjunction with accompanying drawing the utility model is further specified:
Consult shown in Figure 1ly, the utility model is described
The ion bombardment structure that vacuum plating is used, it includes bombardment rod 1, and bombardment rod 1 is an aluminium bar; Bombard excellent 1 rear end and be connected with electrode 2, electrode 2 electrically connects with cable, and electrode 2 is fixedly mounted on corresponding carrier 3 through insulation covering 4.In the present embodiment, electrode 2 is a column, and is through being threaded, simple in structure, easy for installation between the bombardment rod 1 and electrode 2 coaxial settings, bombardment excellent 1 and electrode 2.The end that electrode 2 is connected with cable is provided with thread segment 21, and nut 5 attached cables that thread segment 21 connects are connected with electrode 2.The position that is threaded with electrode 2 at bombardment rod 1 is provided with U type sheath 6, and U type sheath 6 effectively intercepts plasma, and the connecting portion and the electrode 2 of protection bombardment rod 1 increase the service life.
The utility model is for cleaning workpiece in vacuum plating surface, increases the sticking power of rete and designs.During work, the utility model is installed on Vakuumkammer, when the vacuum tightness of Vakuumkammer reaches 0.05Pa, again in Vakuumkammer applying argon gas to 1Pa; At this moment opening power is carried in the volts DS of 5KV on the electrode 2 through 5 fixed cables of nut, and under the effect of argon gas, bombardment rod 1 produces photoglow and produces plasma; The plasma of high energy then can striking work the surface, make the dirt ionization of workpiece surface, thereby reach the effect of cleaning, simple in structure; Scientific and reasonable, cost of investment is low, advantages of small volume; Installation, easy to use promotes the efficient and the quality of workpiece surface cleaning greatly, thereby promotes the effect and the quality of vacuum plating.
Certainly, more than diagram is merely the preferred embodiment of the utility model, is not the practical range that limits the utility model with this, so every principle according to the utility model is done the equivalence variation or modified, and all should be covered by in the protection domain of the utility model.
Claims (4)
1. the ion bombardment structure used of vacuum plating; It is characterized in that: include bombardment rod (1); Bombardment rod (1) rear end is connected with electrode (2), and electrode (2) electrically connects with cable, and electrode (2) is fixedly mounted on corresponding carrier (3) through insulation covering (4).
2. the ion bombardment structure that vacuum plating according to claim 1 is used is characterized in that: between the bombardment rod (1) and the coaxial setting of electrode (2), bombardment excellent (1) and electrode (2) through being threaded.
3. the ion bombardment structure that vacuum plating according to claim 1 is used is characterized in that: the end that electrode (2) is connected with cable is provided with thread segment (21), and nut (5) attached cable that thread segment (21) connects is connected with electrode (2).
4. the ion bombardment structure that vacuum plating according to claim 2 is used is characterized in that: the position that is threaded with electrode (2) at bombardment rod (1) is provided with U type sheath (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220130244 CN202595253U (en) | 2012-03-31 | 2012-03-31 | Ion bombardment structure used for vacuum plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220130244 CN202595253U (en) | 2012-03-31 | 2012-03-31 | Ion bombardment structure used for vacuum plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202595253U true CN202595253U (en) | 2012-12-12 |
Family
ID=47312807
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220130244 Expired - Fee Related CN202595253U (en) | 2012-03-31 | 2012-03-31 | Ion bombardment structure used for vacuum plating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202595253U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103701424A (en) * | 2013-12-24 | 2014-04-02 | 珠海东精大电子科技有限公司 | Preparation method for 49S quartz crystal oscillator |
-
2012
- 2012-03-31 CN CN 201220130244 patent/CN202595253U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103701424A (en) * | 2013-12-24 | 2014-04-02 | 珠海东精大电子科技有限公司 | Preparation method for 49S quartz crystal oscillator |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20180511 Address after: 523000 fast track road in the eastern part of deep pit Industrial Zone, Dongguan, Guangdong. Patentee after: Guangdong Bao Bao Intelligent Equipment Technology Co., Ltd. Address before: 523000 fast track road in the eastern part of deep pit Industrial Zone, Dongguan, Guangdong. Patentee before: Guangdong Youtong Industry Co., Ltd. |
|
| TR01 | Transfer of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121212 Termination date: 20200331 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |