CN202404554U - Touch screen with multilayer reflection structure - Google Patents

Touch screen with multilayer reflection structure Download PDF

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Publication number
CN202404554U
CN202404554U CN2012200755224U CN201220075522U CN202404554U CN 202404554 U CN202404554 U CN 202404554U CN 2012200755224 U CN2012200755224 U CN 2012200755224U CN 201220075522 U CN201220075522 U CN 201220075522U CN 202404554 U CN202404554 U CN 202404554U
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CN
China
Prior art keywords
layer
shielding layer
refractive index
connecting line
touch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN2012200755224U
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Chinese (zh)
Inventor
陈猷仁
邱建泰
苏毓勋
彭思翔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
XIANGDA OPTICAL (XIAMEN) Co Ltd
Original Assignee
XIANGDA OPTICAL (XIAMEN) Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Priority to CN2012200755224U priority Critical patent/CN202404554U/en
Application granted granted Critical
Publication of CN202404554U publication Critical patent/CN202404554U/en
Anticipated expiration legal-status Critical
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Abstract

The utility model discloses a touch screen with a multilayer reflection structure, which comprises a glass substrate, a metal connecting line and a conductive inducing layer. The touch screen is characterized in that a shielding layer is arranged on the surface of the glass substrate; a highly-reflective layer is plated on the surface of the shielding layer; and the metal connecting line is arranged on the highly-reflective layer. The touch screen has the advantages that the light reflectivity is improved, the metal connecting line positioned behind the shielding layer can be completely shielded under the conditions of high light reflectivity and low light transmittance, moreover, as a thin-film sputtering mode is adopted, the total thickness of high-refractivity films and low-refractivity films, which are stacked, can not exceed 2 micrometers, the conductive inducing layer has low probability of breakage during bridging, and the problem of breakage of the conductive inducing layer is further solved.

Description

Touch-screen with multilayer film reflection configuration
Technical field
The utility model relates to the touch art, refers in particular to a kind of touch-screen with multilayer film reflection configuration.
Background technology
As shown in Figure 1, conventional touch screen comprise glass substrate 10 ', white shielding layer 20 ', grey shielding layer 30 ', metal connecting line 40 ' and the conduction inductive layer 50 '.This multilayer film reflection configuration can face problems such as optical density (OD) (OD) is not enough, whiteness is white inadequately using 20 ' time of white shielding layer.If white shielding layer 20 ' thickness of raising or repetition multilayer coated white shielding layer 20 ' to reach suitable obscurity and whiteness; Then can face follow-up conduction inductive layer 50 ' processing procedure and cross over 20 ' time of high thickness white shielding layer, be prone to take place the problem of conduction inductive layer 50 ' fracture.
The utility model content
In view of this; The utility model is to the disappearance of prior art existence; Its fundamental purpose provides a kind of touch-screen with multilayer film reflection configuration, and the problem that it solves the fracture of conduction inductive layer makes the multilayer decoration materials be not limited to black; White even other color material can design production, thereby overcome the deficiency of prior art.
For realizing above-mentioned purpose, the utility model adopts following technical scheme:
A kind of touch-screen with multilayer film reflection configuration; Comprise glass substrate, metal connecting line and conduction inductive layer; It is characterized in that: the surface of this glass substrate is provided with shielding layer, and is coated with a high reflection layer on this shielding layer surface, and this metal connecting line is located on this high reflection layer.
Preferably, said high reflection layer is to adopt multilayer high refractive index film and multilayer low refractive index film to pile up the stacked structure of formation at interval.
Preferably, the thickness of said stacked structure is 1um~2um.
Preferably, said high refractive index film is a niobium pentaoxide membrane, and said low refractive index film is a silica membrane.
Preferably, said shielding layer is coloured or colourless photopolymer layer, photoresist layer or ink lay.
Preferably, the thickness of said shielding layer is 5um.
The utility model compared with prior art has tangible advantage and beneficial effect, particularly, can be known by technique scheme; It mainly is to plate high reflection layer with sputtering way; Make light see through the shielding layer back reflection and go out bright white, under the situation of high reflectance low-transmittance, can completely cover the metal connecting line at rear; Thereby the material of shielding layer is not limited to black, and white even other color material can design production.
In addition, because of using the thin film sputtering mode, high refractive index film and low refractive index film form piles up gross thickness and will be no more than 2um, makes the conduction inductive layer when cross-over connection, is difficult for producing broken string, further solves the problem that the conduction inductive layer ruptures.
Be architectural feature and the effect of more clearly setting forth the utility model, come the utility model is elaborated below in conjunction with accompanying drawing and specific embodiment.
Description of drawings
Fig. 1 is the conventional touch screen structural representation of tradition;
Fig. 2 is the touch screen structure synoptic diagram with multilayer film reflection configuration of the utility model.
The accompanying drawing identifier declaration:
10 ', glass substrate 20 ', white shielding layer
30 ', grey shielding layer 40 ', the metal connecting line
50 ', the conduction inductive layer
10, glass substrate 20, shielding layer
30, metal connecting line 40, conduction inductive layer
50, high reflection layer 51, high refractive index film
52, low refractive index film.
Embodiment
Please with reference to shown in Figure 2; It has demonstrated the concrete structure of the preferred embodiment of the utility model; Include glass substrate 10, shielding layer 20, metal connecting line 30, conduction inductive layer 40 and high reflection layer 50; This glass substrate 10 is positioned at the bottom of product, and this shielding layer 20 is arranged on the upper surface of glass substrate 10, and this high reflection layer 50 is to be plated on the surface of shielding layer 20 with sputtering way; Metal connecting line 30 is arranged on the high reflection layer 50, is connected across between glass substrate 10, shielding layer 20, metal connecting line 30 and the high reflection layer 50 to conduction inductive layer 40 steps.
Wherein, this shielding layer 20 is coloured or colourless photopolymer layer, photoresist layer or ink lay, and the thickness of shielding layer 20 is 5um.The visible wavelength reflectivity of this high reflection layer 50 makes light see through shielding layer 20 back reflections and goes out bright white greater than 97%, under the situation of high reflectance low-transmittance, can completely cover rear metal connecting line 30.
The thin film-forming method of high reflection layer 50 is to use multilayer high refractive index film 51 and low refractive index film 52 to do to pile up to spatter to cross, and in the present embodiment, high refractive index film 51 adopts niobium pentaoxide (Nb2O5), and low refractive index film 52 adopts silicon dioxide (SiO2).In order to express the stacked structure of high refractive index film 51 and low refractive index film 52 vividerly; The code name that can suppose high refractive index film 51 is H; The code name of low refractive index film 52 is L; Be the mode of HLHLHLH....LH,, design different film forming thickness and make the visible light all-wave grow (400nm~700nm) descend reflectivity near 99% according to the basic optical principle of nd=1/4 λ.
Because of using the thin film sputtering mode, high refractive index film 51 and low refractive index film 52 form piles up gross thickness and will be no more than 2um, piles up gross thickness generally speaking at 1um~2um, makes conduction inductive layer 40 when cross-over connection, is difficult for producing the problem of fracture.
In sum; The design focal point of the utility model is that it mainly is to plate high reflection layer with sputtering way, improves light reflectance; Under the situation of high reflectance low-transmittance; Can completely cover the metal connecting line that connects the conduction inductive layer, thereby the material of realizing shielding layer is not limited to black, white even other color material can design production.
In addition, because of using the thin film sputtering mode, high refractive index film and low refractive index film form piles up gross thickness and will be no more than 2um, makes the conduction inductive layer when cross-over connection, is difficult for producing fracture, further solves the problem that ruptures.
The above; It only is the preferred embodiment of the utility model; Be not that the technical scope of the utility model is done any restriction; So every technical spirit according to the utility model all still belongs in the scope of the utility model technical scheme any trickle modification, equivalent variations and modification that above embodiment did.

Claims (6)

1. touch-screen with multilayer film reflection configuration; Comprise glass substrate, metal connecting line and conduction inductive layer; It is characterized in that: the surface of this glass substrate is provided with shielding layer, and is coated with a high reflection layer on this shielding layer surface, and this metal connecting line is located on this high reflection layer.
2. the touch-screen with multilayer film reflection configuration according to claim 1 is characterized in that: said high reflection layer is to adopt multilayer high refractive index film and multilayer low refractive index film to pile up the stacked structure of formation at interval.
3. the touch-screen with multilayer film reflection configuration according to claim 2 is characterized in that: the thickness of said stacked structure is 1um~2um.
4. the touch-screen with multilayer film reflection configuration according to claim 2 is characterized in that: said high refractive index film is a niobium pentaoxide membrane, and said low refractive index film is a silica membrane.
5. the touch-screen with multilayer film reflection configuration according to claim 1 is characterized in that: said shielding layer is coloured or colourless photopolymer layer, photoresist layer or ink lay.
6. the touch-screen with multilayer film reflection configuration according to claim 5 is characterized in that: the thickness of said shielding layer is 5um.
CN2012200755224U 2012-03-01 2012-03-01 Touch screen with multilayer reflection structure Expired - Lifetime CN202404554U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2012200755224U CN202404554U (en) 2012-03-01 2012-03-01 Touch screen with multilayer reflection structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2012200755224U CN202404554U (en) 2012-03-01 2012-03-01 Touch screen with multilayer reflection structure

Publications (1)

Publication Number Publication Date
CN202404554U true CN202404554U (en) 2012-08-29

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103777806A (en) * 2011-09-30 2014-05-07 胜华科技股份有限公司 Touch-sensitive device and touch-sensitive display device
CN103792599A (en) * 2014-02-28 2014-05-14 伯恩光学(惠州)有限公司 Lens
US20140153100A1 (en) * 2012-12-03 2014-06-05 Samsung Display Co., Ltd. Display device and method of manufacturing the same
CN103941901A (en) * 2013-01-18 2014-07-23 胜华科技股份有限公司 Touch panel
CN104461102A (en) * 2013-09-25 2015-03-25 宸鸿科技(厦门)有限公司 Touch panel and manufacturing method thereof
CN104731432A (en) * 2015-02-03 2015-06-24 深圳南玻伟光导电膜有限公司 White capacitive touch screen and manufacturing method thereof
CN105278158A (en) * 2014-07-21 2016-01-27 三星显示有限公司 Liquid crystal display and manufacturing method thereof
US20160066456A1 (en) * 2014-09-03 2016-03-03 Samsung Display Co., Ltd. Cover window, method of manufacturing the cover window, and display device including the cover window
WO2019137279A1 (en) * 2018-01-11 2019-07-18 Oppo广东移动通信有限公司 Sheet material and preparation method, shell and electronic device

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103777806B (en) * 2011-09-30 2017-04-12 胜华科技股份有限公司 Touch-sensitive device and touch-sensitive display device
CN103777806A (en) * 2011-09-30 2014-05-07 胜华科技股份有限公司 Touch-sensitive device and touch-sensitive display device
US20140153100A1 (en) * 2012-12-03 2014-06-05 Samsung Display Co., Ltd. Display device and method of manufacturing the same
TWI621110B (en) * 2012-12-03 2018-04-11 三星顯示器有限公司 Display device and method of manufacturing the same
US9857510B2 (en) * 2012-12-03 2018-01-02 Samsung Display Co., Ltd. Display device and method of manufacturing the same
CN103941901A (en) * 2013-01-18 2014-07-23 胜华科技股份有限公司 Touch panel
CN104461102A (en) * 2013-09-25 2015-03-25 宸鸿科技(厦门)有限公司 Touch panel and manufacturing method thereof
CN103792599A (en) * 2014-02-28 2014-05-14 伯恩光学(惠州)有限公司 Lens
CN105278158A (en) * 2014-07-21 2016-01-27 三星显示有限公司 Liquid crystal display and manufacturing method thereof
US9832890B2 (en) * 2014-09-03 2017-11-28 Samsung Display Co., Ltd. Cover window, method of manufacturing the cover window, and display device including the cover window
US20160066456A1 (en) * 2014-09-03 2016-03-03 Samsung Display Co., Ltd. Cover window, method of manufacturing the cover window, and display device including the cover window
CN104731432B (en) * 2015-02-03 2018-01-12 宜昌南玻显示器件有限公司 white capacitive touch screen and preparation method thereof
CN104731432A (en) * 2015-02-03 2015-06-24 深圳南玻伟光导电膜有限公司 White capacitive touch screen and manufacturing method thereof
WO2019137279A1 (en) * 2018-01-11 2019-07-18 Oppo广东移动通信有限公司 Sheet material and preparation method, shell and electronic device

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CX01 Expiry of patent term

Granted publication date: 20120829

CX01 Expiry of patent term