CN201305551Y - Double-sided coated glass - Google Patents

Double-sided coated glass Download PDF

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Publication number
CN201305551Y
CN201305551Y CNU2009201351917U CN200920135191U CN201305551Y CN 201305551 Y CN201305551 Y CN 201305551Y CN U2009201351917 U CNU2009201351917 U CN U2009201351917U CN 200920135191 U CN200920135191 U CN 200920135191U CN 201305551 Y CN201305551 Y CN 201305551Y
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layer
tio
sio
sio2
double
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Expired - Fee Related
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CNU2009201351917U
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Chinese (zh)
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徐日宏
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SHENZHEN SANXIN JMT GLASS CO Ltd
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SHENZHEN SANXIN JMT GLASS CO Ltd
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Abstract

The utility model relates to a double-sided coated glass with high transmission, which comprises a glass substrate, wherein, an Nb2O5 layer and a SiO2 layer are overlapped and deposited on one face of the glass substrate, and the SiO2 layer is the outer layer, or a TiO2 layer and a SiO2 layer are overlapped and deposited on one face of the glass substrate, and the SiO2 layer is the outer layer; a semi-conductor film layer is deposited outside the overlapping layer. Multiple transmission-increasing reflection-reducing layers are deposited, so that the visible light transmission rate and the reflection rate of the coated glass are improved.

Description

Double-sided coating glass
Technical field
The utility model relates to a kind of touch-screen glass, relates in particular to a kind of double-sided coating glass of high transmission.
Background technology
Nowadays coated glass has been widely used in touch-screen field and field of liquid crystal display, and the more existing coated glass visible light transmissivity that is used for touch-screen and liquid crystal display is low, the reflectivity height.Special in the stronger situation of surround lighting, the contrast of picture image can reduce greatly, is having a strong impact on visual effect.For example, present common ITO touch-screen glass visible light transmissivity is about 86%, and reflectivity 8% is under the stronger situation of surround lighting, picture contrast is low, and image does not see Chu, simultaneously, high-reflectivity causes visual effect poorer, when watching for a long time, also affects eyes.
The utility model content
The technical problem that the utility model solves is: overcome in the present technology, the coated glass transmittance that touch-screen or liquid crystal display are used is low, reflectivity is high and cause the technical problem of poor visual effect.
The technical scheme of the technical solution problem that the utility model provides is: make up a kind of double-sided coated glass, comprise glass substrate, the overlapping deposition Nb successively on the two sides of described glass substrate 2O 5Layer and SiO 2Layer is to SiO 2Layer be skin, or overlapping depositing Ti O successively 2Layer and SiO 2Layer is to SiO 2Layer be outer, deposited semiconductor rete again outside described overlapping layer simultaneously.
The further technical scheme of the utility model technical solution problem is: the sedimentary deposit of described glass substrate one side is five layers, that is: Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, semiconductor film, another side is four layers, that is: Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, Nb 2O 5Layer or TiO 2Layer, SiO 2Layer.
The further technical scheme of the utility model technical solution problem is: described sedimentary deposit one face thickness is followed successively by: Nb 2O 5Layer or TiO 2Layer is 10nm to 30nm, and the SiO2 layer is 20nm to 50nm, Nb 2O 5Layer or TiO 2Layer is 20nm to 50nm, and the SiO2 layer is 60nm to 140nm, and semiconductor film is 8 to 28nm, and described sedimentary deposit another side thickness is followed successively by: Nb 2O 5Layer or TiO 2Layer is 5nm to 30nm, and the SiO2 layer is 20nm to 50nm, Nb 2O 5Layer or TiO 2Layer is 10nm to 40nm, and the SiO2 layer is 80nm to 140nm.
The further technical scheme of the utility model technical solution problem is: the sedimentary deposit of described glass substrate one side is seven layers, that is: Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, semiconductor film, another side is six layers, that is: Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, Nb 2O 5Layer or TiO 2Layer, SiO 2Layer.
The further technical scheme of the utility model technical solution problem is: described sedimentary deposit one face thickness is followed successively by: Nb 2O 5Layer or TiO 2Layer is 5nm to 18nm, and the SiO2 layer is 20nm to 50nm, Nb 2O 5Layer or TiO 2Layer is 20nm to 60nm, and the SiO2 layer is 5nm to 20nm, Nb 2O 5Layer or TiO 2Layer is 20nm to 70nm, and the SiO2 layer is 40nm to 80nm, and semiconductor film is 8 to 28nm, and described sedimentary deposit another side thickness is followed successively by: Nb 2O 5Layer or TiO 2Layer is 10nm to 30nm, and the SiO2 layer is 20nm to 50nm, Nb 2O 5Layer or TiO 2Layer is 20nm to 50nm, and the SiO2 layer is 4nm to 40nm, Nb 2O 5Layer or TiO 2Layer is 20nm to 80nm, and the SiO2 layer is 80nm to 120nm.
The further technical scheme of the utility model technical solution problem is: described semiconductor film is the tin-doped indium oxide rete.
The further technical scheme of the utility model technical solution problem is: described plated film adopts vacuum magnetic-control sputtering mode plated film.
The further technical scheme of the utility model technical solution problem is: described glass substrate is the transparent toughened glass or the glass substrate of half tempered.
The technique effect of technical solutions of the utility model is: by making up a kind of double-sided coated glass, comprise glass substrate, the overlapping deposition Nb successively on the two sides of described glass substrate 2O 5Layer and SiO 2Layer is to SiO 2Layer be skin, or overlapping depositing Ti O successively 2Layer and SiO 2Layer is to SiO 2Layer be outer, deposited semiconductor rete again outside described overlapping layer simultaneously.Owing to deposited the anti-reflection anti-reflection rete of multilayer, improved the visible light transmissivity and the reflectivity of described coated glass.
Description of drawings
Fig. 1 is nine layers of coated glass structural representation of the utility model.
Fig. 2 is the utility model ten triple-layer coating glass structure synoptic diagram.
Embodiment
Below in conjunction with specific embodiment technical solutions of the utility model are further specified:
The utility model makes up a kind of double-sided coated glass, and the utility model adopts vacuum magnetic-control sputtering mode plated film, comprises glass substrate, the overlapping deposition Nb successively on the two sides of described glass substrate 2O 5Layer and SiO 2Layer is to SiO 2Layer be skin, or overlapping depositing Ti O successively 2Layer and SiO 2Layer is to SiO 2Layer be outer, deposited semiconductor rete again outside described overlapping layer simultaneously.
As shown in Figure 1, the sedimentary deposit of described glass substrate 1 one side is five layers, and described deposit thickness is followed successively by: Nb 2O 5Layer 2 or TiO 2Layer 2 is 10nm to 30nm, and SiO2 layer 3 is 20nm to 50nm, Nb 2O 5Layer 4 or TiO 2Layer 4 is 20nm to 50nm, and SiO2 layer 5 is 60nm to 140nm, and semiconductor film 6 is 8 to 28nm.Deposit thickness at described substrate another side is followed successively by: Nb 2O 5Layer 7 or TiO 2Layer 7 is 5nm to 30nm, and SiO2 layer 8 is 20nm to 50nm, Nb 2O 5Layer 9 or TiO 2Layer 9 is 10nm to 40nm, and SiO2 layer 10 is 80nm to 140nm.Described semiconductor film 6 is the tin-doped indium oxide rete.Described glass substrate is the transparent toughened glass or the glass substrate of half tempered.
As shown in Figure 2, the sedimentary deposit of described glass substrate 1 one side is seven layers, and described deposit thickness is followed successively by: Nb 2O 5Layer 2 or TiO 2Layer 2 is 5nm to 18nm, and SiO2 layer 3 is 20nm to 50nm, Nb 2O 5Layer 4 or TiO 2Layer 4 is 20nm to 60nm, and SiO2 layer 5 is 5nm to 20nm, Nb 2O 5Layer 6 or TiO 2Layer 6 is 20nm to 70nm, and SiO2 layer 11 is 40nm to 80nm, and semiconductor film 12 is 8 to 28nm.The lamination thickness that described substrate another side is heavy is followed successively by: Nb 2O 5Layer 7 or TiO 2Layer 7 is 10nm to 30nm, and SiO2 layer 8 is 20nm to 50nm, Nb 2O 5Layer 9 or TiO 2Layer 9 is 20nm to 50nm, and SiO2 layer 10 is 4nm to 40nm, Nb 2O 5Layer 13 or TiO 2Layer 13 is 20nm to 80nm, and SiO2 layer 14 is 80nm to 120nm.Described semiconductor film 12 is the tin-doped indium oxide rete.Described glass substrate 1 is the transparent toughened glass or the glass substrate 1 of half tempered.
Above content is in conjunction with concrete preferred embodiment further detailed description of the utility model, can not assert that implementation of the present utility model is confined to these explanations.For the utility model person of an ordinary skill in the technical field, under the prerequisite that does not break away from the utility model design, can also make some simple deduction or replace, all should be considered as belonging to protection domain of the present utility model.

Claims (8)

1. a double-sided coated glass comprises glass substrate, it is characterized in that: the overlapping deposition Nb successively on the two sides of described glass substrate 2O 5Layer and SiO 2Layer is to SiO 2Layer be skin, or overlapping depositing Ti O successively 2Layer and SiO 2Layer is to SiO 2Layer be outer, deposited semiconductor rete again outside described overlapping layer simultaneously.
2, double-sided coated glass according to claim 1 is characterized in that, the sedimentary deposit of described glass substrate one side is five layers, that is: Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, semiconductor film, another side is four layers, that is: Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, Nb 2O 5Layer or TiO 2Layer, SiO 2Layer.
3, double-sided coated glass according to claim 2 is characterized in that, described sedimentary deposit one face thickness is followed successively by: Nb 2O 5Layer or TiO 2Layer is 10nm to 30nm, and the SiO2 layer is 20nm to 50nm, Nb 2O 5Layer or TiO 2Layer is 20nm to 50nm, and the SiO2 layer is 60nm to 140nm, and semiconductor film is 8 to 28nm, and described sedimentary deposit another side thickness is followed successively by: Nb 2O 5Layer or TiO 2Layer is 5nm to 30nm, and the SiO2 layer is 20nm to 50nm, Nb 2O 5Layer or TiO 2Layer is 10nm to 40nm, and the SiO2 layer is 80nm to 140nm.
4, double-sided coated glass according to claim 1 is characterized in that, the sedimentary deposit of described glass substrate one side is seven layers, that is: Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, semiconductor film, another side is six layers, that is: Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, Nb 2O 5Layer or TiO 2Layer, SiO 2Layer, Nb 2O 5Layer or TiO 2Layer, SiO 2Layer.
5, double-sided coated glass according to claim 5 is characterized in that, described sedimentary deposit one face thickness is followed successively by: Nb 2O 5Layer or TiO 2Layer is 5nm to 18nm, and the SiO2 layer is 20nm to 50nm, Nb 2O 5Layer or TiO 2Layer is 20nm to 60nm, and the SiO2 layer is 5nm to 20nm, Nb 2O 5Layer or TiO 2Layer is 20nm to 70nm, and the SiO2 layer is 40nm to 80nm, and semiconductor film is 8 to 28nm, and described sedimentary deposit another side thickness is followed successively by: Nb 2O 5Layer or TiO 2Layer is 10nm to 30nm, and the SiO2 layer is 20nm to 50nm, Nb 2O 5Layer or TiO 2Layer is 20nm to 50nm, and the SiO2 layer is 4nm to 40nm, Nb 2O 5Layer or TiO 2Layer is 20nm to 80nm, and the SiO2 layer is 80nm to 120nm.
6, double-sided coating glass according to claim 1 is characterized in that, described semiconductor film is the tin-doped indium oxide rete.
7, double-sided coating glass according to claim 1 is characterized in that, described plated film adopts vacuum magnetic-control sputtering mode plated film.
8, double-sided coating glass according to claim 1 is characterized in that, described glass substrate is the transparent toughened glass or the glass substrate of half tempered.
CNU2009201351917U 2009-03-11 2009-03-11 Double-sided coated glass Expired - Fee Related CN201305551Y (en)

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101786803A (en) * 2010-03-02 2010-07-28 常州龙腾太阳能热电设备有限公司 Method for coating multiple compound high anti-reflection films on inner surface and outer surface of glass tube with length/aperture ratio greater than 30
CN102909918A (en) * 2012-09-29 2013-02-06 江西沃格光电科技有限公司 Two-side coated glass and preparation method thereof
CN103488346A (en) * 2013-10-10 2014-01-01 珠海市魅族科技有限公司 Protective layer for a touch display screen and mobile terminal
CN105236770A (en) * 2015-10-19 2016-01-13 洛阳康耀电子有限公司 Machining method of double-face touch screen shadow eliminating conducting glass
CN105677071A (en) * 2014-11-19 2016-06-15 南昌欧菲光学技术有限公司 Touch screen and manufacture method thereof
CN105807968A (en) * 2014-12-29 2016-07-27 南昌欧菲光学技术有限公司 Touch panel with black bezel, cover plate of touch panel and manufacturing method for cover plate
CN107663031A (en) * 2017-09-29 2018-02-06 吴江南玻华东工程玻璃有限公司 A kind of double silver-colored energy-saving glass for reducing light pollution and preparation method thereof
CN110275227A (en) * 2019-07-23 2019-09-24 北京三重镜业(大厂)有限公司 A kind of anti-reflection anti-dazzle glas and its production method
CN115505884A (en) * 2021-06-23 2022-12-23 江西华派光电科技有限公司 High-light-transmission sapphire panel and manufacturing method thereof

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101786803A (en) * 2010-03-02 2010-07-28 常州龙腾太阳能热电设备有限公司 Method for coating multiple compound high anti-reflection films on inner surface and outer surface of glass tube with length/aperture ratio greater than 30
CN101786803B (en) * 2010-03-02 2012-06-20 常州龙腾太阳能热电设备有限公司 Method for coating multiple compound high anti-reflection films on inner surface and outer surface of glass tube with length/aperture ratio greater than 30
CN102909918A (en) * 2012-09-29 2013-02-06 江西沃格光电科技有限公司 Two-side coated glass and preparation method thereof
CN102909918B (en) * 2012-09-29 2015-05-20 江西沃格光电股份有限公司 Two-side coated glass and preparation method thereof
CN103488346A (en) * 2013-10-10 2014-01-01 珠海市魅族科技有限公司 Protective layer for a touch display screen and mobile terminal
CN105677071A (en) * 2014-11-19 2016-06-15 南昌欧菲光学技术有限公司 Touch screen and manufacture method thereof
CN105677071B (en) * 2014-11-19 2019-06-28 南昌欧菲光学技术有限公司 Touch screen and preparation method thereof
CN105807968A (en) * 2014-12-29 2016-07-27 南昌欧菲光学技术有限公司 Touch panel with black bezel, cover plate of touch panel and manufacturing method for cover plate
CN105236770A (en) * 2015-10-19 2016-01-13 洛阳康耀电子有限公司 Machining method of double-face touch screen shadow eliminating conducting glass
CN107663031A (en) * 2017-09-29 2018-02-06 吴江南玻华东工程玻璃有限公司 A kind of double silver-colored energy-saving glass for reducing light pollution and preparation method thereof
CN110275227A (en) * 2019-07-23 2019-09-24 北京三重镜业(大厂)有限公司 A kind of anti-reflection anti-dazzle glas and its production method
CN110275227B (en) * 2019-07-23 2021-09-28 北京三重镜业(大厂)有限公司 Anti-reflection anti-dazzle glass and production method thereof
CN115505884A (en) * 2021-06-23 2022-12-23 江西华派光电科技有限公司 High-light-transmission sapphire panel and manufacturing method thereof

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CF01 Termination of patent right due to non-payment of annual fee
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Granted publication date: 20090909

Termination date: 20160311