CN202369387U - Equipment for preparing parallel substrate nano wire arrays - Google Patents
Equipment for preparing parallel substrate nano wire arrays Download PDFInfo
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- CN202369387U CN202369387U CN2011205263626U CN201120526362U CN202369387U CN 202369387 U CN202369387 U CN 202369387U CN 2011205263626 U CN2011205263626 U CN 2011205263626U CN 201120526362 U CN201120526362 U CN 201120526362U CN 202369387 U CN202369387 U CN 202369387U
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Abstract
The utility model discloses equipment for preparing parallel substrate nano wire arrays, and belongs to the field of preparation of nano wire materials. The equipment comprises a container, an ultrasonic standing wave field generating device and a thermal treatment device; an electric heater of the thermal treatment device is arranged at the bottom of the container; and the ultrasonic standing wave field generating device is arranged in the container and arranged above the electric heater. According to the equipment, nano particles are deposited on a substrate under the action of an ultrasonic standing wave field formed by the ultrasonic standing wave field generating device by matching of the container, the ultrasonic standing wave field generating device and the thermal treatment device, so that the nano wire arrays are formed on the substrate; and the nano wire arrays are solidified on the substrate through the thermal treatment device. The equipment is simple in structure and convenient to operate, and can realize controllability; and a nano wire array material with high quality is manufactured with low cost.
Description
Technical field
The utility model relates to the apparatus field of making nano-material, relates in particular to a kind of preparation equipment of parallel substrate nano-wire array.
Background technology
Nano-material is widely used in fields such as nanoelectronics, photoelectronics, as prepare with nano-material nano laser, detector, optical modulator, molecular biosensor, field-effect transistor, etc. photoelectric device.Important basic scientific research is worth nano-material and become new research focus with exploitation and potential technological applications value because of it has.U.S.'s " science " magazine is in the science and technology news of publishing in May, 2005; Being listed in second in 5 focuses of physics research to nano wire research, to explore " " following material Changing Pattern and novel character are nano wire research having caused the great attention of various countries of problem to small scale.At present; The preparation of nano wire equipment commonly used has: making apparatus such as laser ablation, chemical vapour deposition (CVD), arc discharge, thermit powder synthesize, ion injection can obtain various types of nano wires thus, but these nano wires generally are irregular distribution; Not easily separated between line; Separate also nano wire is produced more defective, especially when making nano-device, difficulty is bigger.The preparation of the research and the application, particularly nano-wire array of this influence greatly and restriction nano wire.And the equipment for preparing nano-wire array at present has: template, defective method, electromagnetic field method, etching method etc.But all there is the bad problem of controllability in these equipment.Therefore how preparing the controlled nano-wire array of high-sequential is urgent problem.
The utility model content
The utility model embodiment provides a kind of preparation equipment of parallel substrate nano-wire array, can simple relatively mode controllable preparation nano-wire array.
The technical scheme that addresses the above problem is following:
The utility model embodiment provides a kind of preparation equipment of parallel substrate nano-wire array, and this equipment comprises:
Container, ultrasonic standing wave field generating means and annealing device; Wherein,
The electric heater of annealing device is arranged on the bottom of said container;
Ultrasonic standing wave field generating means is arranged in the container, is arranged on the top of said electric heater.
In the said equipment, said ultrasonic standing wave field generating means comprises supersonic generator and reflecting plate.
In the said equipment, said transducer and equal corresponding being arranged on the interior sidewall of said container of reflecting plate.
In the said equipment, said reflecting plate is arranged on the sidewall in the container through micrometer adjusting screw.
In the said equipment, said annealing device also comprises: attemperating unit and thermocouple;
Attemperating unit is arranged on the container outside, is electrically connected with thermocouple and said electric heater respectively.
In the said equipment, said thermocouple is two, and one is arranged on the container inside wall, and the interior said electric heater of container connects.
In the said equipment, said container head is respectively equipped with aspirating hole, injecting hole, liquid injection port and agitator; The agitator front end extend in the container.
In the said equipment, said container bottom is provided with leakage fluid dram.
Can find out from the above-mentioned technical scheme that provides; The equipment that the utility model embodiment provides; Cooperation through container and ultrasonic standing wave field generating means and annealing device; Nano particle is deposited on substrate under the ultrasonic standing wave field action that ultrasonic standing wave field generating means forms, thereby on substrate, form nano-wire array, and can nano-wire array is solidificated on the substrate through annealing device.This apparatus structure is simple, and is easy to operate, can realize controlled, the high-quality nano-wire array material of the making of lower cost.
Description of drawings
In order to be illustrated more clearly in the technical scheme of the utility model embodiment; The accompanying drawing of required use is done to introduce simply in will describing embodiment below; Obviously, the accompanying drawing in describing below only is some embodiment of the utility model, for those of ordinary skill in the art; Under the prerequisite of not paying creative work, can also obtain other accompanying drawings according to these accompanying drawings.
The making apparatus sketch map that Fig. 1 provides for the utility model embodiment;
The name that each label is corresponding among the figure is called: the 1-container; The 2-supersonic generator; The 3-transducer; The 4-nano particle; The 5-aspirating hole; The 6-injecting hole; The 7-agitator; The 8-nano-wire array; The 9-reflecting plate; The 10-substrate; The 11-attemperating unit; The 12-thermocouple; The 13-leakage fluid dram; The 14-electric heater; The 15-liquid injection hole; The 16-micrometer adjusting screw.
The specific embodiment
Below in conjunction with specific embodiment the technical scheme in the utility model is carried out clear, intactly description, obviously, described embodiment only is the utility model part embodiment, rather than whole embodiment.Based on the embodiment of the utility model, those of ordinary skills are not making the every other embodiment that is obtained under the creative work prerequisite, all belong to the protection domain of the utility model.
Do to describe in detail further in the face of the utility model embodiment down.
The utility model embodiment provides a kind of preparation equipment of parallel substrate nano-wire array, and is as shown in Figure 1, and this equipment comprises: container, ultrasonic standing wave field generating means and annealing device; Wherein, the electric heater of annealing device is arranged on the bottom of said container, on the electric heater substrate can be set; Ultrasonic standing wave field generating means is arranged in the container, is arranged on the top of said electric heater, on substrate, to form the ultrasonic standing wave field.
In the said equipment, said ultrasonic standing wave field generating means comprises supersonic generator and reflecting plate.
In the said equipment, said transducer and equal corresponding being arranged on the interior sidewall of said container of reflecting plate.
In the said equipment, said reflecting plate is arranged on the sidewall in the container through micrometer adjusting screw.
In the said equipment, said annealing device also comprises: attemperating unit and thermocouple;
Attemperating unit is arranged on the container outside, is electrically connected with thermocouple and said electric heater respectively.
In the said equipment, said thermocouple is two, and one is arranged on the container inside wall, and the interior said electric heater of container connects.
In the said equipment, said container head is respectively equipped with aspirating hole, injecting hole, liquid injection port and agitator; The agitator front end extend in the container.
In the said equipment, said container bottom is provided with leakage fluid dram.
It is following to utilize the said equipment to prepare the step of nano-wire array material, comprising:
Substrate is set in solution, the ultrasonic standing wave field is set above substrate, the standing wave node face of ultrasonic standing wave field points to said substrate;
With the material of preparation nano wire with the form of nano particle in solution in the effect lower edge of ultrasonic standing wave field the standing wave node face arrange to be deposited on and form nano-wire array on the substrate.
Said method also comprises: after forming nano-wire array on the substrate; Emit said solution, (can slowly discharge) discharged in discharging during solution earlier naturally, reaches or during near substrate surface at liquid level of solution; Adopt the thermal evaporation mode to get rid of rest solution, keep the nano-wire array that forms on the said substrate.
In the said method, backing material can be according to selection, such as can according to the product of use nano-wire array select backing material.Solution can adopt nano particle is not decomposed and chemical reaction, and easy thermal decomposition materials evaporated.
In the said method, said thermal evaporation temperature is less than 70 ℃.
Said method also comprises: through heat treatment, the nano-wire array that forms on the said substrate is solidificated on the said substrate.
In the said method, said heat treatment temperature is confirmed according to the melting temperature of preparation nano-material.
In the said method, formed nano-wire array is parallel to be distributed on the said substrate.
In the said method, adjust the distance between the nano wire of the nano-wire array that forms on the said substrate through the frequency of ultrasonic that regulate to form the ultrasonic standing wave field.
In the said method, adjust the diameter of the nano wire of the nano-wire array that forms on the said substrate through regulating the hyperacoustic power that forms the ultrasonic standing wave field.
In the said method, the size of nano particle is less than 10 nanometers.
Said method also comprises: after preparing the ground floor nano-wire array on the said substrate; Said substrate is turned an angle; Deposition second layer nano-wire array on the nano-wire array of this substrate, second layer nano wire and ground floor nano wire intersect formation nano wire grid;
Can again the nano wire grid be solidificated on the said substrate through heat treatment after forming the nano wire grid.
Supersonic generator, transducer and reflecting plate are formed ultrasonic standing wave field generating means in the above-mentioned making apparatus; Supersonic generator, transducer and reflecting plate in this ultrasonic standing wave field generating means can be many groups; Aspirating hole, air admission hole, liquid injection hole and agitator are set on the container; So that in container, add the solution that comprises nano particle, and, agitator synthesizes nano particle under stirring; Substrate is arranged on the bottom of container, and container bottom is provided with the leakage fluid dram of discharging solution.
For realizing that the substrate that forms nano-wire array is heat-treated; Can the annealing device that electric heater, thermocouple and attemperating unit constitute be set at container bottom; Substrate can be arranged on the electric heater, simultaneously thermocouple is set in container, and electric heater all is electrically connected with attemperating unit with thermocouple; Thermocouple can be provided with two, and in the solution that one is arranged on container, another is arranged on the electric heater, under the control of attemperating unit, can heat-treat the substrate that forms nano-wire array through electric heater.
The making apparatus of the utility model embodiment is realized controlled preparation nano-material with better simply mode.Realized preparing at lower cost the nano-material of nano wire lattice controllable shapes.
The prepared nano-wire array of this equipment can be made the nano wire grid.Can prepare the nanoscale display, can be used for flexible electronic device through artificial assembling; Organic Light Emitting Diode (OLED); Organic solar batteries; Biology sensor, and synthetic muscle, ultraviolet detector device, light emitting diode, gas sensor, solar cell, based on the flat-panel display device of field emission etc.The application this and more of nano-wire array.The preparation nano-wire array technology cheap, low-cost, that technology is simple, material compatibility is strong, the nano-wire array technology that especially reaches simple controllable is very significant.
The above; Be merely the preferable specific embodiment of the utility model; But the protection domain of the utility model is not limited thereto; Any technical staff who is familiar with the present technique field is in the technical scope that the utility model discloses, and the variation that can expect easily or replacement all should be encompassed within the protection domain of the utility model.Therefore, the protection domain of the utility model should be as the criterion with the protection domain of claims.
Claims (8)
1. the preparation equipment of a parallel substrate nano-wire array is characterized in that, this equipment comprises:
Container, ultrasonic standing wave field generating means and annealing device; Wherein,
The electric heater of annealing device is arranged on the bottom of said container;
Ultrasonic standing wave field generating means is arranged in the container, is arranged on the top of said electric heater.
2. the preparation equipment of parallel substrate nano-wire array according to claim 1 is characterized in that, said ultrasonic standing wave field generating means comprises supersonic generator, reflecting plate.
3. the preparation equipment of parallel substrate nano-wire array according to claim 2 is characterized in that, said transducer and equal corresponding being arranged on the interior sidewall of said container of reflecting plate.
4. the preparation equipment of parallel substrate nano-wire array according to claim 3 is characterized in that said reflecting plate is arranged on the sidewall in the container through micrometer adjusting screw.
5. the preparation equipment of parallel substrate nano-wire array according to claim 1 is characterized in that, said annealing device also comprises: attemperating unit and thermocouple;
Attemperating unit is arranged on the container outside, is electrically connected with thermocouple and said electric heater respectively.
6. the preparation equipment of parallel substrate nano-wire array according to claim 1 is characterized in that, said thermocouple is two, and one is arranged on the container inside wall, and the interior said electric heater of container connects.
7. the preparation equipment of parallel substrate nano-wire array according to claim 1 is characterized in that said container head is respectively equipped with aspirating hole, injecting hole, liquid injection port and agitator; The agitator front end extend in the container.
8. the preparation equipment of parallel substrate nano-wire array according to claim 1 is characterized in that said container bottom is provided with leakage fluid dram.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011205263626U CN202369387U (en) | 2011-12-15 | 2011-12-15 | Equipment for preparing parallel substrate nano wire arrays |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011205263626U CN202369387U (en) | 2011-12-15 | 2011-12-15 | Equipment for preparing parallel substrate nano wire arrays |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202369387U true CN202369387U (en) | 2012-08-08 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011205263626U Expired - Fee Related CN202369387U (en) | 2011-12-15 | 2011-12-15 | Equipment for preparing parallel substrate nano wire arrays |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109306477A (en) * | 2018-11-26 | 2019-02-05 | 南京航空航天大学 | A kind of the nanometer sensitive thin film preparation facilities and preparation method of ultrasonic wave added |
-
2011
- 2011-12-15 CN CN2011205263626U patent/CN202369387U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109306477A (en) * | 2018-11-26 | 2019-02-05 | 南京航空航天大学 | A kind of the nanometer sensitive thin film preparation facilities and preparation method of ultrasonic wave added |
| CN109306477B (en) * | 2018-11-26 | 2023-09-26 | 南京航空航天大学 | Ultrasonic-assisted nano sensitive film preparation device and preparation method |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120808 Termination date: 20141215 |
|
| EXPY | Termination of patent right or utility model |