CN201933152U - Deposition gas-path system applicable to large chemical vapor deposition furnace - Google Patents
Deposition gas-path system applicable to large chemical vapor deposition furnace Download PDFInfo
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- CN201933152U CN201933152U CN2010206880182U CN201020688018U CN201933152U CN 201933152 U CN201933152 U CN 201933152U CN 2010206880182 U CN2010206880182 U CN 2010206880182U CN 201020688018 U CN201020688018 U CN 201020688018U CN 201933152 U CN201933152 U CN 201933152U
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- chemical vapor
- deposition
- vapor deposition
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Abstract
The utility model discloses a deposition gas-path system which is applicable to a large chemical vapor deposition furnace and comprises multiple mixed-gas supply pipelines (11), exhaust pipelines and a deposition chamber (18), wherein a plurality of horn-shaped top gas-inlet pipes (2) connected with the gas supply pipelines are uniformly arranged at the top of the deposition chamber (18), and a plurality of horn-shaped exhaust pipes (4) connected with the exhaust pipelines are uniformly arranged at the bottom of the deposition chamber (18). The deposition gas-path system applicable to a large chemical vapor deposition furnace disclosed by the utility model can be used for ensuring the chemical vapor deposition uniformity of large materials or products, in particular to the materials or the products with quite large height dimensions.
Description
Technical field
The utility model relates to a kind of deposition air-channel system of cvd furnace, particularly relates to a kind of deposition air-channel system that is applicable to large-scale chemical vapor deposition stove.
Background technology
Chemical vapour deposition is a kind of processing method that is widely used in producing type material (as matrix materials such as C/C, C/SiC, SiC/SiC).Along with development, the development of technology of society, numerous areas such as space flight, aviation, traffic have had higher requirement to the chemical vapour deposition material, and the size of material or goods is to large scale development.Deposition uniformity is a crucial quality index of chemical vapour deposition, but owing to be not applicable to the deposition air-channel system of large-scale vacuum chemical vapor deposition stove at present, guarantee that large-scale (particularly height dimension is very big) material or goods chemical vapour deposition homogeneity are but very difficult, the exploitation that this has just hindered large-scale chemical vapor deposition stove has restricted the chemical vapour deposition of large-scale (particularly height dimension is very big) material or goods.
The utility model content
Technical problem to be solved in the utility model provides a kind of energy and guarantees very big material or the inhomogeneity deposition air-channel system that is applicable to large-scale chemical vapor deposition stove of goods chemical vapour deposition of large-scale particularly height dimension.
In order to address the above problem, a kind of deposition air-channel system that is applicable to large-scale chemical vapor deposition stove that the utility model provides, comprise mixed gas supply air line, exhaust line and sediment chamber, evenly arrange and be provided with the tubaeform top inlet pipe that a plurality of and described mixed gas supply air line is connected in the top of described sediment chamber, evenly arranging in the bottom of described sediment chamber is provided with the exhaust trumpet that a plurality of and described exhaust line is connected.
A plurality of described tubaeform tops inlet pipe adopts to rely closely evenly to arrange and is arranged on the top of described sediment chamber, and a plurality of described exhaust trumpets adopt to rely closely evenly to arrange and are arranged on the bottom of described sediment chamber.
Described tubaeform top inlet pipe is provided with little spiral slot.
The sidewall of described sediment chamber is provided with at least one tubaeform sidewall inlet pipe that is connected with described supply air line.
Be provided with little spiral slot in the described tubaeform side wall portion inlet pipe.
But described tubaeform top inlet pipe and described exhaust trumpet are provided with the variable valve of independent regulation and control respectively.
But each described tubaeform side wall portion inlet pipe is equipped with the variable valve of independent regulation and control.
Each the described exhaust line that is connected with described exhaust trumpet is provided with absolute pressure transducer and motor-driven control valve.
Adopt the deposition air-channel system that is applicable to large-scale chemical vapor deposition stove of technique scheme, the deposition gas circuit systematic comparison with at present general and common chemical vapor deposition stove the utlity model has following advantage:
1, adopt the tubaeform top inlet pipe and the exhaust trumpet of special structure form, tubaeform top inlet pipe is provided with little spiral slot, and the gas distribution area is big, and gas is the eddy flow state and enters the sediment chamber, and the airflow field in the sediment chamber is uniform and stable.
2, tubaeform top inlet pipe is arranged in the top of sediment chamber, helps gas and flows from top to bottom, guarantees deposition quality.
3, tubaeform sidewall inlet pipe (according to the size of workpiece size, all can arrange) has been arranged in increase on four sidewalls of sediment chamber on the sidewall of sediment chamber, has effectively satisfied very big material or the goods chemical vapour deposition homogeneity question of height dimension.
4, exhaust trumpet is arranged in the bottom of sediment chamber, helps the discharge of gas.
5, increase is provided with absolute pressure transducer and motor-driven control valve on the exhaust line, automatically adjusts, and guarantees that sediment chamber's internal pressure is constant, realizes the vapour deposition under the constant pressure.
6, modular organization according to the size of cvd furnace, can adopt the deposition air-channel system of whole the cvd furnace of deposition gas circuit composition of a plurality of same form.
In sum, the utility model is that a kind of energy guarantees very big material or the inhomogeneity deposition air-channel system that is applicable to large-scale chemical vapor deposition stove of goods chemical vapour deposition of large-scale particularly height dimension.
Description of drawings
Fig. 1 is the structural representation of the utility model on the cvd furnace cross section.
Fig. 2 is the structural representation of the utility model on the cvd furnace vertical section.
Fig. 3 is that top of the present utility model inlet pipe is arranged synoptic diagram.
Fig. 4 is that vapor pipe of the present utility model is arranged synoptic diagram.
Embodiment
The utility model is described in further detail below in conjunction with the drawings and specific embodiments.
Referring to Fig. 1, Fig. 2, Fig. 3 and Fig. 4, be provided with sediment chamber 18 in the cvd furnace body of heater 17, the top of sediment chamber 18 relies closely evenly to arrange and is provided with 9 tubaeform top inlet pipe 2 that are connected with mixed gas supply air line 11 respectively, be provided with little spiral slot 19 in the tubaeform top inlet pipe 2,18 bottom is adopted to rely closely evenly to arrange and is provided with 9 exhaust trumpets 4 that are connected with exhaust line 8 in the sediment chamber.The sidewall of sediment chamber 18 is provided with a tubaeform sidewall inlet pipe 3 that is connected with mixed gas supply air line 11, is provided with little spiral slot 19 in the tubaeform sidewall inlet pipe 3.Glass rotameter 14 is connected with gas mixing tank 16 by first supply air line 13 with manual modulation valve 15, the inlet end of glass rotameter 14 links to each other with the source of the gas (not shown) by first supply air line 13, the inlet end of mass flowmeter 12 is connected with gas mixing tank 16 by mixed gas supply air line 11, the exit end of mass flowmeter 12 is connected with the inlet end of magnetic valve 10 by mixed gas supply air line 11, the exit end of magnetic valve 10 by mixed gas supply air line 11 respectively be located at cvd furnace body of heater 17 on top intake interface 1 be connected with sidepiece intake interface 9, the inlet end of motor-driven control valve 6 is connected with exhaust port 5 on being located at cvd furnace body of heater 17 by exhaust line 8, the exit end of motor-driven control valve 6 captures with the tar of cvd furnace by exhaust line 8 and links to each other with the treatment unit (not shown), exhaust line 8 is provided with absolute pressure transducer 7, being located at the inlet end of the tubaeform top inlet pipe 2 on 18 tops, sediment chamber is connected with top intake interface 1 on being located at cvd furnace body of heater 17, be located at the inlet end of the tubaeform sidewall inlet pipe 3 in the sediment chamber 18 and be connected, be located at the exit end of the exhaust trumpet 4 in the sediment chamber 18 and be connected with exhaust port 5 on being located at cvd furnace body of heater 17 with sidepiece intake interface 9 on being located at cvd furnace body of heater 17.
Tubaeform top inlet pipe 2, tubaeform sidewall inlet pipe 3 and exhaust trumpet 4 all adopt the graphite material manufacturing.
But each air inlet of deposition gas circuit and exhaust loop all are independent regulation and control.
Referring to Fig. 1 and Fig. 2, the inner chamber of cvd furnace body of heater 17 is evacuated to the technological temperature that sediment chamber 18 is heated to behind the vacuum state regulation.Regulate the manual modulation valve 15 of each deposition gases gas circuit, make the blending ratio of gas reach processing requirement, configure the flow setting value of the mass flowmeter 12 of each deposition gases gas circuit by processing requirement, open the magnetic valve 10 of each deposition gases gas circuit, electric control system by cvd furnace charges into the mixed gas of stability of flow to the control of mass flowmeter 12 to sediment chamber 18.Post-depositional tail gas is collected by exhaust trumpet 4, discharge out of the furnace by motor-driven control valve 6 and exhaust line 8, the absolute pressure transducer 7 that is located on the exhaust line 8 detects exhaust pressure, and detection signal is fed to the chamber pressure setter of the electric control system of cvd furnace, setter carries out PID to motor-driven control valve 6 to be regulated, and realizes the constant voltage vapour deposition.
Claims (8)
1. deposition air-channel system that is applicable to large-scale chemical vapor deposition stove, comprise mixed gas supply air line (11), exhaust line (8) and sediment chamber (18), it is characterized in that: evenly arrange and be provided with the tubaeform top inlet pipe (2) that a plurality of and described mixed gas supply air line (11) is connected in the top of described sediment chamber (18), and evenly arranging in the bottom of described sediment chamber (18) is provided with the exhaust trumpet (4) that a plurality of and described exhaust line (8) is connected.
2. the deposition air-channel system that is applicable to large-scale chemical vapor deposition stove according to claim 1, it is characterized in that: a plurality of described tubaeform top inlet pipe (2) adopt to rely closely evenly to arrange and are arranged on the top of described sediment chamber (18), and a plurality of described exhaust trumpets (4) adopt to rely closely evenly to arrange and are arranged on the bottom of described sediment chamber (18).
3. the deposition air-channel system that is applicable to large-scale chemical vapor deposition stove according to claim 1 and 2 is characterized in that: described tubaeform top inlet pipe (2) is provided with little spiral slot (19).
4. the deposition air-channel system that is applicable to large-scale chemical vapor deposition stove according to claim 1 and 2 is characterized in that: the sidewall of described sediment chamber (18) is provided with at least one tubaeform sidewall inlet pipe (3) that is connected with described supply air line.
5. the deposition air-channel system that is applicable to large-scale chemical vapor deposition stove according to claim 4 is characterized in that: be provided with little spiral slot (19) in the described tubaeform sidewall inlet pipe (3).
6. the deposition air-channel system that is applicable to large-scale chemical vapor deposition stove according to claim 1 and 2 is characterized in that: each described tubaeform top inlet pipe (2) but all be connected with the variable valve of independent regulation and control.
7. the deposition air-channel system that is applicable to large-scale chemical vapor deposition stove according to claim 4 is characterized in that: each described tubaeform sidewall inlet pipe (3) but all be connected with the variable valve of independent regulation and control.
8. the deposition air-channel system that is applicable to large-scale chemical vapor deposition stove according to claim 1 and 2 is characterized in that: each the described exhaust line (8) that is connected with described exhaust trumpet (4) is provided with absolute pressure transducer (7) and motor-driven control valve (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206880182U CN201933152U (en) | 2010-12-29 | 2010-12-29 | Deposition gas-path system applicable to large chemical vapor deposition furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206880182U CN201933152U (en) | 2010-12-29 | 2010-12-29 | Deposition gas-path system applicable to large chemical vapor deposition furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201933152U true CN201933152U (en) | 2011-08-17 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010206880182U Expired - Lifetime CN201933152U (en) | 2010-12-29 | 2010-12-29 | Deposition gas-path system applicable to large chemical vapor deposition furnace |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201933152U (en) |
-
2010
- 2010-12-29 CN CN2010206880182U patent/CN201933152U/en not_active Expired - Lifetime
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Free format text: FORMER OWNER: YANG JIANGAO TAN XINGLONG Effective date: 20130208 Owner name: HUNAN DINGLI TECHNOLOGIES CO., LTD. Free format text: FORMER OWNER: DAI YU Effective date: 20130208 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20130208 Address after: 410118 Hunan province Changsha Zhongyi road two top technology park Muyun Industrial Zone Patentee after: Advanced Corporation for Materials & Equipments Co., Ltd. Address before: 410118 Hunan province Changsha Zhongyi road two top technology park Muyun Industrial Zone Patentee before: Dai Yu Patentee before: Yang Jiangao Patentee before: Tan Xinglong |
|
| CX01 | Expiry of patent term |
Granted publication date: 20110817 |
|
| CX01 | Expiry of patent term |