CN201611423U - Masking device - Google Patents
Masking device Download PDFInfo
- Publication number
- CN201611423U CN201611423U CN2010201067364U CN201020106736U CN201611423U CN 201611423 U CN201611423 U CN 201611423U CN 2010201067364 U CN2010201067364 U CN 2010201067364U CN 201020106736 U CN201020106736 U CN 201020106736U CN 201611423 U CN201611423 U CN 201611423U
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- China
- Prior art keywords
- mask
- mask device
- protective seam
- substrate
- mask pattern
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- Expired - Fee Related
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Abstract
The utility model relates to the technical field of flat-panel display, in particular to a masking device. The masking device comprises a baseplate, masking patterns formed on the baseplate and a protective layer, wherein the masking patterns divide the baseplate into a photic zone and a shade zone; and the protective layer is arranged on the baseplate and covers the masking patterns, so as to protect the masking patterns from being damaged in the cleaning process and prolong the service life of the masking device. As the masking patterns need not to be taken into consideration, the masking device achieves more convenient cleaning and high efficiency, and the cleaning period of the masking device is shorted.
Description
Technical field
The utility model relates to the flat display technology field, relates in particular to the mask device that a kind of photoetching process is used.
Background technology
LCD generally includes display panel and backlight.Display panel comprise colored filter, array base palte and be arranged at colored filter and array base palte between liquid crystal layer.And colored filter comprises substrate, is formed at black matrix and colored rete, protective seam and common electrode layer on the substrate.The black matrix of colored filter and colored rete adopt photoetching process to form usually, below form example with black matrix" and describe photoetching process in detail.
The formation of black matrix" at first needs evenly to be coated with one deck black resin photoresist on substrate, and carries out prebake conditions, and the black resin photoresist is solidified.Then, utilize a mask blank that has optical design that the substrate that has been coated with the black resin photoresist is exposed and development treatment, form black matrix".Hence one can see that, and mask blank is a requisite instrument in the photoetching process.In carrying out the exposure-processed process, mask blank is closely near the panel that is coated with photoresist, and this mask blank easily is infected with photoresist or photoresist particle near the part of photoresist.Because black matrix" has higher accuracy requirement,, will influence the precision of black matrix", even substandard products occur if particle and block the pollution are arranged on the mask blank.Therefore, after speckling with photoresist or photoresist particle on the mask blank, need to clean this mask blank.
The cleaning of mask blank usually need through washing, medicine wash, drain, operation such as air knife drying, also need check, verify for the mask blank that has cleaned, be eliminated totally with definite pollutant or particle.Yet so complicated cleaning need expend a large amount of time and efforts, influences the efficient of production, is unfavorable for improving the output of product.In addition, in cleaning process, cleaning means easy damaged mask blank, the serviceable life of reducing mask blank.
The utility model content
In view of this, be necessary to provide a kind of mask set that is used for photoetching process and can increases the service life and conveniently clean.
The mask device comprises substrate, is formed at mask pattern and protective seam on the substrate.Mask pattern is divided into transmission region and lightproof area with substrate.Protective seam is arranged on the substrate, and the mask film covering pattern.
In the mask device that the utility model provides,, prevent that mask pattern is damaged in cleaning process, prolong the serviceable life of mask device by in the mask device, setting up the protective seam that is used to protect mask pattern.Owing to need not take mask pattern into account, clean more convenient and efficient is higher, be beneficial to the time that reduces cleaning mask device.
Description of drawings
The utility model is described in further detail below in conjunction with drawings and Examples, in the accompanying drawing:
The structural representation of the mask device that Fig. 1 provides for the utility model.
Fig. 2 A-2C makes the synoptic diagram of black matrix" for using mask device shown in Figure 1.
Embodiment
In use easily contaminated and clean problem such as easy damaged in order to overcome traditional mask device; the utility model is by setting up the protective seam of the mask pattern that is used for protecting the mask device on the mask device; prevent that mask pattern is damaged in cleaning process, prolong the serviceable life of mask device.Owing to need not take mask pattern into account, clean more convenient and efficient is higher, be beneficial to the time that reduces cleaning mask device.
Below in conjunction with Figure of description the mask device that the utility model provides is elaborated.
See also Fig. 1, mask device 100 comprises substrate 110, mask pattern 120 and protective seam 130.Substrate 110 is made by transparent material such as glass or resin.Mask pattern 120 by metal or/and metal oxide as chromium, chromium oxide, iron oxide, molybdena etc., be formed at through sputter deposition craft on the side surface of substrate 110.Mask pattern 120 is divided into transmission region 111 and lightproof area 113 with substrate 110, and transmission region 111 can be seen through by ultraviolet light, and lightproof area 113 is coated with mask pattern 120, can stop ultraviolet light to see through.The thickness of mask pattern 120 is much smaller than the thickness of substrate 110.
In the photoetching process of using mask device 100, mask device 100 is positioned on the panel that needs photoetching, and protective seam 130 and need the distance between the panel of photoetching to remain between 50 to 300 microns.Because the property difference that protective seam 130 and mask pattern are 120, making needs the panel of photoetching that the pollution of protective seam 130 is reduced; Simultaneously, in the process of cleaning mask device 100, protective seam 130 protection mask patterns 120 are not damaged, and can effectively prolong the serviceable life of mask device 100.
See also Fig. 2 A to 2C, it makes the synoptic diagram of the black matrix" on the colored filter for using above-mentioned mask device 100.Colored filter 200 comprises glass substrate 210.At first at the even painting black photoresist layer 220 of a side surface of glass substrate 210 (consulting Figure of description 2A).Again the glass substrate 210 that has been coated with black photoresist layer 220 is carried out prebake conditions, make 220 precuring of black photoresist layer.Mask device 100 is positioned on the glass substrate 210, the distance between protective seam 130 and the black photoresist layer 220 is remained between 50 to 300 microns.Then, mask device 100 and glass substrate 210 are positioned in the ultraviolet light environment in the lump, make on the black photoresist layer 220 the part exposure corresponding with transmission region 111.After treating exposure fully, mask device 100 and glass substrate 210 are withdrawn from described ultraviolet light environment in the lump, finish exposure process (consulting Figure of description 2B).
To be positioned over through the glass substrate 210 of exposure process and carry out development treatment in the medicament, to divest the black photoresist layer 220 with lightproof area 113 counterparts (being unexposed area).The making (consulting Figure of description 2C) of black matrix" is finished in the air-dry or oven dry of the glass substrate that development is finished then.
More than the better embodiment of the mask device that provides for the utility model, can not be interpreted as restriction to the utility model rights protection scope.Those skilled in the art should know; under the prerequisite that does not break away from the utility model design; also can do multiple improvement or replacement, these all improvement or replacement all should be in rights protection scopes of the present utility model, and rights protection scope promptly of the present utility model should be as the criterion with claim.
Claims (8)
1. mask device; be used for photoetching process; it comprises substrate and the mask pattern that is formed on the substrate; described mask pattern is divided into transmission region and lightproof area with described substrate; it is characterized in that: the mask device at least also comprises protective seam; described protective seam is arranged on the described substrate, and covers described mask pattern.
2. mask device as claimed in claim 1 is characterized in that: described mask device is positioned on the panel surface that needs photoetching, and this protective seam is over against this panel surface, and the distance of this protective seam and this panel surface is between 50 to 300 microns.
3. mask device as claimed in claim 1 is characterized in that: described mask pattern is formed by depositing operation by non-ferrous metal or metal oxide.
4. mask device as claimed in claim 1 is characterized in that: this substrate is that transparent material is made.
5. mask device as claimed in claim 1 is characterized in that: the thickness of described mask pattern is much smaller than the thickness of described substrate.
6. mask device as claimed in claim 1 is characterized in that: described protective seam is formed by thin film deposition processes by silicon dioxide.
7. mask device as claimed in claim 1 is characterized in that: described protective seam is formed by coating process by organic film material.
8. mask device as claimed in claim 1 is characterized in that: the thickness of described protective seam is more than or equal to the thickness of described mask pattern.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201067364U CN201611423U (en) | 2010-01-28 | 2010-01-28 | Masking device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201067364U CN201611423U (en) | 2010-01-28 | 2010-01-28 | Masking device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201611423U true CN201611423U (en) | 2010-10-20 |
Family
ID=42962055
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010201067364U Expired - Fee Related CN201611423U (en) | 2010-01-28 | 2010-01-28 | Masking device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201611423U (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013174044A1 (en) * | 2012-05-23 | 2013-11-28 | 深圳市华星光电技术有限公司 | Photomask and method for manufacturing same |
| CN103969944A (en) * | 2014-05-21 | 2014-08-06 | 深圳市华星光电技术有限公司 | Ultraviolet mask and manufacturing method thereof |
| CN106977988A (en) * | 2017-05-11 | 2017-07-25 | 京东方科技集团股份有限公司 | A kind of protective coating and preparation method, mask plate |
| CN108182006A (en) * | 2016-12-08 | 2018-06-19 | 佛山市顺德区美的电热电器制造有限公司 | A kind of anti-microbial touch panel and preparation method thereof and equipment of cooking |
| CN108598293A (en) * | 2018-04-24 | 2018-09-28 | 京东方科技集团股份有限公司 | A kind of mask plate and preparation method thereof |
| CN110928137A (en) * | 2019-12-06 | 2020-03-27 | 深圳市龙图光电有限公司 | Mask and manufacturing method thereof |
| WO2021227910A1 (en) * | 2020-05-15 | 2021-11-18 | 长鑫存储技术有限公司 | Photomask and manufacturing method therefor |
-
2010
- 2010-01-28 CN CN2010201067364U patent/CN201611423U/en not_active Expired - Fee Related
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013174044A1 (en) * | 2012-05-23 | 2013-11-28 | 深圳市华星光电技术有限公司 | Photomask and method for manufacturing same |
| CN103969944A (en) * | 2014-05-21 | 2014-08-06 | 深圳市华星光电技术有限公司 | Ultraviolet mask and manufacturing method thereof |
| WO2015176310A1 (en) * | 2014-05-21 | 2015-11-26 | 深圳市华星光电技术有限公司 | Ultraviolet mask and manufacturing method therefor |
| CN103969944B (en) * | 2014-05-21 | 2016-03-09 | 深圳市华星光电技术有限公司 | UV mask and preparation method thereof |
| CN108182006A (en) * | 2016-12-08 | 2018-06-19 | 佛山市顺德区美的电热电器制造有限公司 | A kind of anti-microbial touch panel and preparation method thereof and equipment of cooking |
| CN106977988B (en) * | 2017-05-11 | 2020-02-18 | 京东方科技集团股份有限公司 | Protective coating, preparation method and mask plate |
| CN106977988A (en) * | 2017-05-11 | 2017-07-25 | 京东方科技集团股份有限公司 | A kind of protective coating and preparation method, mask plate |
| CN108598293A (en) * | 2018-04-24 | 2018-09-28 | 京东方科技集团股份有限公司 | A kind of mask plate and preparation method thereof |
| CN110928137A (en) * | 2019-12-06 | 2020-03-27 | 深圳市龙图光电有限公司 | Mask and manufacturing method thereof |
| WO2021227910A1 (en) * | 2020-05-15 | 2021-11-18 | 长鑫存储技术有限公司 | Photomask and manufacturing method therefor |
| CN113671788A (en) * | 2020-05-15 | 2021-11-19 | 长鑫存储技术有限公司 | Photomask and manufacturing method thereof |
| CN113671788B (en) * | 2020-05-15 | 2023-09-12 | 长鑫存储技术有限公司 | Photomask and manufacturing method thereof |
| US11977325B2 (en) | 2020-05-15 | 2024-05-07 | Changxin Memory Technologies, Inc. | Photomask and its manufacturing method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20101020 Termination date: 20190128 |