CN201583107U - Improved substrate drying system - Google Patents
Improved substrate drying system Download PDFInfo
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- CN201583107U CN201583107U CN2009202705016U CN200920270501U CN201583107U CN 201583107 U CN201583107 U CN 201583107U CN 2009202705016 U CN2009202705016 U CN 2009202705016U CN 200920270501 U CN200920270501 U CN 200920270501U CN 201583107 U CN201583107 U CN 201583107U
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Abstract
The utility model provides an improved substrate drying system, which comprises a substrate accommodating groove, a first liquid accommodating groove, a high-frequency vibration device, a second liquid injection device, a first drainage device, a second drainage device, a gas input device, a gas flow control device, a laminar flow device and an organic gas drainage device, wherein the high-frequency vibration device can generate high-frequency vibration to convert isopropyl ketone into atomized isopropyl ketone; the atomized isopropyl ketone has larger particles which can increase the contact area with the substrate, therefore, the drying effect of the substrate surface can be enhanced.
Description
Technical field
The utility model relates to a kind of drying substrates system, particularly relate to a kind of high-frequency vibration device atomizing isopropyl acetone that utilizes, and by the use of gas flow control device and laminar flow apparatus, with the drying substrates system of a kind of improvement of the effect that promotes the dry substrate surface effectively.
Background technology
In the middle of wafer (wafer) drying process, its most normal technology of using is the Marangoni seasoning.The Marangoni seasoning is with inert gas, for example: nitrogen, mix vaporific organic solvent, for example: isopropyl acetone (Isopropyl Alcohol, IPA), when nitrogen and isopropyl acetone mixture in crystal column surface contacts, by isopropyl acetone and the deionized water that soaks wafer (Deionization Water, DIW) between capillary difference, make the hydrone that residues in crystal column surface break away from crystal column surface, and be drawn within the deionized water, to reach the effect of dry crystal column surface.
See also Fig. 1, it is existing known drying wafer system, existing known drying wafer system 3 is that utilization Marangoni seasoning assembles, and it mainly comprises: a dry slot 31, an isopropyl alcohol accumulator tank 32, a deionized water injection device 33, a drainage arrangement 34, a nitrogen input unit 35, a carrier pipe 36, reach a heater 37.And use existing known drying wafer system 3 to carry out the drying of a wafer 38, its action can be summarized as follows: at first, this wafer 38 is inserted in this dry slot 31; Then, inject deionized water in dry slot 31 by this deionized water injection device 33; Then, nitrogen is imported within this isopropyl alcohol accumulator tank 32, isopropyl acetone is transported to this heater 37 via this carrier pipe 36 to utilize nitrogen by this nitrogen input unit 35; Heater 37 can be heated as vapor state with the mixture of nitrogen and isopropyl acetone; Then, continue the nitrogen and the isopropyl acetone mixture of vapor state are sent in the dry slot 31 via carrier pipe 36, so that be covered with the nitrogen and the isopropyl acetone mixture of vapor state in the dry slot 31; Then, the wafer 38 in the dry slot 31 is slowly lifted the liquid level of the ionized water of leaving away; When nitrogen and isopropyl acetone mixture in wafer 38 surfaces contact, at this moment, because the isopropyl acetone concentration on wafer 38 surfaces is greater than the isopropyl acetone concentration of deionized water, therefore, the surface tension of utilizing isopropyl acetone is less than the capillary characteristic of deionized water of soaking wafer 38, make the hydrone that residues in wafer 38 surfaces break away from wafer 38 surfaces, and be sucked within the deionized water, reached the effect on dry wafer 38 surfaces.
Above-mentioned existing known drying wafer system is the drying wafer system that present industry is used always, though understandable because of its simple structure and application principle, and used at large, yet it still has many shortcomings:
1. use the mixture of heater heating isopropyl acetone and nitrogen, make it become vapor state, though gasifiable isopropyl acetone and promote the effect of dry wafer effectively, the equipment cost of heater is too high.
2. isopropyl acetone has the characteristic of igniting, so the heating isopropyl acetone is the doubt that has on the safety.
Therefore, the inventor of this case is because above-mentioned existing known drying wafer system still has many shortcomings, so do one's utmost to be studied invention, the drying substrates system of a kind of improvement of the present utility model is finished in research and development finally.
This shows, above-mentioned existing drying substrates system structure with use, obviously still have inconvenience and defective, and demand urgently further being improved.In order to solve the problem of above-mentioned existence, relevant manufacturer there's no one who doesn't or isn't seeks solution painstakingly, but do not see always that for a long time suitable design finished by development, and common product does not have appropriate structure to address the above problem, this obviously is the problem that the anxious desire of relevant dealer solves.Therefore how to found a kind of drying substrates system of novel improvement, real one of the current important research and development problem that belongs to, also becoming the current industry utmost point needs improved target.
Because the defective that above-mentioned existing drying substrates system exists, the inventor is based on being engaged in this type of product design manufacturing abundant for many years practical experience and professional knowledge, and the utilization of cooperation scientific principle, actively studied innovation, in the hope of founding a kind of drying substrates system of novel improvement, can improve general existing drying substrates system, make it have more practicality.Through constantly research, design, and, create the utility model that has practical value finally through after studying sample and improvement repeatedly.
Summary of the invention
Main purpose of the present utility model is, overcome the defective that existing drying substrates system exists, and provide a kind of drying substrates system of novel improvement, technical problem to be solved is to make it promote the effect of dry wafer effectively, reduce equipment cost and its operating cost simultaneously to reach, and solve the required problem of bearing on the safety of heating isopropyl acetone, be very suitable for practicality.
The purpose of this utility model and solve its technical problem and realize by the following technical solutions.Drying substrates system according to a kind of improvement that the utility model proposes can be applicable to a dry substrate, and it comprises:
One substrate storage tank can be wherein ccontaining with this substrate;
One first liquid storage tank is installed in a first side of this substrate storage tank, with ccontaining one first liquid;
One high-frequency vibration device is arranged at the inside of this first liquid storage tank, and this high-frequency vibration device can produce dither this first atomization of liquid is become an atomizing first liquid;
One second fluid infusion apparatus is installed in a second side of substrate storage tank, by this second fluid infusion apparatus can import have a proper temperature one second liquid in the substrate storage tank, to soak substrate, make substrate keep in temperature state;
One first tapping equipment is installed in one the 3rd side of substrate storage tank, and the 3rd side and first side and second side are adjacent edge, and this first tapping equipment is in order to discharge this second liquid lentamente;
One second tapping equipment is installed in the 3rd side of substrate storage tank, and this second tapping equipment is in order to discharge second liquid at full tilt;
One gas input device, be connected in the first liquid storage tank, can import one first gas in the first liquid storage tank by this gas input device, this first gas can transport into this atomizing first liquid in the substrate storage tank that is marked with second liquid, rate of discharge when control first tapping equipment and second tapping equipment, and when second liquid emitted in the substrate storage tank, be subjected to the atomizing influence of surface tension gap of first liquid and second liquid of the hydrone of substrate surface, and be drawn within second liquid, reached the effect on dry substrate surface; And
One organic gas tapping equipment is installed in the second side of substrate storage tank, and this organic gas tapping equipment can be after drying substrates be finished, and will atomize first liquid and first gas are discharged the substrate storage tank.
The purpose of this utility model and solve its technical problem and also can be applied to the following technical measures to achieve further.
The drying substrates system of aforesaid improvement, wherein said substrate storage tank more comprises: one first arrangement for detecting, be installed in the cell wall of substrate storage tank,, can detect one first accurate position of second liquid by this first arrangement for detecting when this second liquid is injected in the substrate storage tank; One second arrangement for detecting is installed in the cell wall of substrate storage tank, and is positioned at the below of first arrangement for detecting, and when discharging lentamente by this first tapping equipment in second liquid, this second arrangement for detecting can be detected one second accurate position of second liquid; And one the 3rd arrangement for detecting, be installed in the cell wall of substrate storage tank, and be positioned at the below of second arrangement for detecting, when discharging at high speed by this second tapping equipment in second liquid, the 3rd arrangement for detecting can be detected one the 3rd accurate position of second liquid.
The drying substrates system of aforesaid improvement, wherein said first liquid can be following any: isopropyl alcohol, methyl alcohol and ethanol.
The drying substrates system of aforesaid improvement, wherein said second liquid is deionized water.
The drying substrates system of aforesaid improvement, wherein said first gas is the gas of a clean dried.
The drying substrates system of aforesaid improvement, wherein said high-frequency vibration device is a ultrasonic generator.
The drying substrates system of aforesaid improvement, the scope of wherein said proper temperature are 25 °～65 ℃.
The drying substrates system of aforesaid improvement, wherein said first arrangement for detecting can be a gas backpressure formula liquid level detecting device and the reflective liquid level detector of a light.
The drying substrates system of aforesaid improvement, wherein said second arrangement for detecting can be a gas backpressure formula liquid level detecting device and the reflective liquid level detector of a light.
The drying substrates system of aforesaid improvement, wherein said the 3rd arrangement for detecting can be a gas backpressure formula liquid level detecting device and the reflective liquid level detector of a light.
The drying substrates system of aforesaid improvement, wherein more comprise: a gas flow control device, be installed in this substrate storage tank inside, and it is positioned at the junction of this first liquid storage tank and substrate storage tank, to control the flow that this first liquid that atomizes that this first gas transported enters the substrate storage tank; An and laminar flow device, be installed in the inside of substrate storage tank, in in this substrate is placed into the substrate storage tank, this laminar flow apparatus is positioned at the top of substrate, after first gas transports atomizing first liquid enters in the substrate storage tank, first liquid that atomizes can pass through laminar flow apparatus, and is distributed in the surface of substrate equably.
The drying substrates system of aforesaid improvement, wherein said substrate storage tank more comprises: one first arrangement for detecting, be installed in the cell wall of substrate storage tank, and be positioned at the below of this laminar flow apparatus, when this second liquid is injected in the substrate storage tank, can detect one first accurate position of second liquid by this first arrangement for detecting; One second arrangement for detecting is installed in the cell wall of substrate storage tank, and is positioned at the below of first arrangement for detecting, and when discharging lentamente by this first tapping equipment in second liquid, this second arrangement for detecting can be detected one second accurate position of second liquid; And one the 3rd arrangement for detecting, be installed in the cell wall of substrate storage tank, and be positioned at the below of second arrangement for detecting, when discharging at high speed by this second tapping equipment in second liquid, the 3rd arrangement for detecting can be detected one the 3rd accurate position of second liquid.
The drying substrates system of aforesaid improvement, wherein said first liquid can be isopropyl alcohol, methyl alcohol or ethanol.
The drying substrates system of aforesaid improvement, wherein said second liquid is deionized water.
The drying substrates system of aforesaid improvement, wherein said first gas is the gas of a clean dried.
The drying substrates system of aforesaid improvement, wherein said high-frequency vibration device is a ultrasonic generator.
The drying substrates system of aforesaid improvement, wherein said first arrangement for detecting can be a gas backpressure formula liquid level detecting device and the reflective liquid level detector of a light.
The drying substrates system of aforesaid improvement, wherein said second arrangement for detecting can be a gas backpressure formula liquid level detecting device and the reflective liquid level detector of a light.
The drying substrates system of aforesaid improvement, wherein said the 3rd arrangement for detecting can be a gas backpressure formula liquid level detecting device and the reflective liquid level detector of a light.
The drying substrates system of aforesaid improvement, the scope of wherein said proper temperature are 25 °～65 ℃.
The drying substrates system of aforesaid improvement, wherein said laminar flow apparatus can be following any: one has a plurality of poroid planks and a plurality of nozzle.
The drying substrates system of aforesaid improvement, wherein said volume control device can be an one-way flow control valve and an operations flows control valve.
The utility model compared with prior art has tangible advantage and beneficial effect.As known from the above, for achieving the above object, the utility model provides a kind of drying substrates system of improvement, utilize high-frequency vibration device with the atomizing isopropyl acetone, and control the atomizing isopropyl acetone effectively by gas flow control device and enter the flow of substrate storage tank, and utilize laminar flow apparatus to make to enter the atomizing isopropyl acetone in the substrate storage tank to be uniformly distributed in substrate surface, can promote the effect of dry wafer effectively, reduce equipment cost and its operating cost simultaneously to reach, and solve the required problem of bearing on the safety of heating isopropyl acetone.
Therefore, in order to reach the effect of above-mentioned main purpose, this case inventor develops a kind of drying substrates system of improvement, and it comprises a substrate storage tank; One first liquid storage tank; One high-frequency vibration device; One second fluid infusion apparatus; One first tapping equipment; One second tapping equipment; One gas input device; One gas flow control device; One laminar flow device; An and organic gas tapping equipment.
This substrate storage tank can a ccontaining substrate; This first liquid storage tank can ccontaining one first liquid; This high-frequency vibration device is arranged at the inside of the first liquid storage tank, to produce dither this first atomization of liquid is become an atomizing first liquid; This second fluid infusion apparatus is installed in the second side of substrate storage tank, see through second fluid infusion apparatus can import have a proper temperature one second liquid in the substrate storage tank, to soak substrate; This first tapping equipment is installed in the 3rd side of substrate storage tank, to be used for discharging this second liquid lentamente; This second tapping equipment is installed in the 3rd side of substrate storage tank, to be used for discharging second liquid at full tilt; This gas input device is connected in the first liquid storage tank, and to import one first gas in the first liquid storage tank, this first gas can transport into this atomizing first liquid in the substrate storage tank; This organic gas tapping equipment is installed in the second side of substrate storage tank, with after drying substrates is finished, to atomize first liquid and first gas is discharged outside the substrate storage tank, to avoid because atomizing first liquid and the excessive concentration of first gas in the substrate storage tank, and the facts of causing danger.
By technique scheme, the drying substrates system of the utility model improvement has following advantage and beneficial effect at least:
1, the utility model is to utilize high-frequency vibration device to produce dither with the atomizing isopropyl acetone, and the atomizing isopropyl acetone has bigger vaporific particle, can increase the contact area of isopropyl acetone and substrate, and can promote the effect on dry substrate surface.
2, compared to existing known drying wafer system, the utility model uses high-frequency vibration device to substitute heater, reduces cost and its operating cost of firing equipment, has also solved the risk on the safety that heats the required burden of isopropyl acetone simultaneously.
3, the utility model using gases volume control device, it can control atomizing first liquid, and it enters the interior flow of substrate storage tank, to avoid atomizing first strength of fluid in the substrate storage tank too high, and make and produce non-persistent state in the substrate storage tank, in addition, can make atomizing first liquid be distributed in the surface of substrate equably by laminar flow apparatus, promote the effect of drying substrates more.
In sum, the utility model relates to a kind of drying substrates system of improvement, and the drying substrates system of this improvement comprises: a substrate storage tank, one first liquid storage tank, a high-frequency vibration device, one second fluid infusion apparatus, one first tapping equipment, one second tapping equipment, a gas input device, a gas flow control device, a laminar flow device, an and organic gas tapping equipment.It is an atomizing isopropyl acetone so that an isopropyl acetone is changed into that this high-frequency vibration device can produce dither, and this atomizing isopropyl acetone has the contact area that bigger particle can increase itself and a substrate, so can promote the drying effect of this substrate surface.The utility model has obvious improvement technically, and has tangible good effect, really is a new and innovative, progressive, practical new design.
Above-mentioned explanation only is the general introduction of technical solutions of the utility model, for can clearer understanding technological means of the present utility model, and can be implemented according to the content of specification, and for above-mentioned and other purposes, feature and advantage of the present utility model can be become apparent, below especially exemplified by preferred embodiment, and conjunction with figs., be described in detail as follows.
Description of drawings
Fig. 1 is existing known drying wafer system.
Fig. 2 is a kind of first embodiment Organization Chart of drying substrates system of improvement.
Fig. 3 is the Organization Chart of second embodiment of the drying substrates system of improvement.
1: the drying substrates system of improvement
11: the substrate storage tank
111: laminar flow apparatus
112: gas flow control device
113: the first arrangement for detecting
114: the second arrangement for detecting
115: the three arrangement for detecting
116: the first side
117: the second side
118: the three sides
12: the first liquid storage tanks
13: high-frequency vibration device
14: the second fluid infusion apparatus
15: the first tapping equipments
16: the second tapping equipments
17: gas input device
18: the organic gas tapping equipment
2: substrate
3: existing known drying wafer system
31: dry slot
32: the isopropyl alcohol accumulator tank
33: the deionized water injection device
34: drainage arrangement
35: the nitrogen input unit
36: carrier pipe
37: heater
38: wafer
The specific embodiment
For further setting forth the utility model is to reach technological means and the effect that predetermined goal of the invention is taked, below in conjunction with accompanying drawing and preferred embodiment, to its specific embodiment of drying substrates system, structure, feature and effect thereof according to the improvement that the utility model proposes, describe in detail as after.
Relevant aforementioned and other technology contents, characteristics and effect of the present utility model can clearly present in the following detailed description that cooperates with reference to graphic preferred embodiment.For convenience of description, in following embodiment, components identical is represented with identical numbering.
Seeing also Fig. 2, is a kind of first embodiment Organization Chart of drying substrates system of improvement, and the drying substrates system of this improvement can be applicable to a dry substrate 2, and it comprises:
One substrate storage tank 11 can be wherein ccontaining with this substrate 2;
One first liquid storage tank 12 is first sides 116 that are installed in this substrate storage tank 11, with ccontaining one first liquid, this first liquid can be isopropyl alcohol (Isopropyl Alcohol, IPA), methyl alcohol or ethanol, and in first embodiment, be to use isopropyl alcohol with as first liquid;
One high-frequency vibration device 13, be arranged at the inside of this first liquid storage tank 12, this high-frequency vibration device 13 is a ultrasonic generator, so high-frequency vibration device 13 can produce the high frequency ripple that shakes in the mode of dither, utilize this high frequency ripple that shakes this first atomization of liquid can be become an atomizing first liquid, promptly become the atomizing isopropyl acetone, the atomizing isopropyl acetone has bigger isopropyl acetone particle, and can improve the area that isopropyl acetone contacts with this substrate 2 compared to the isopropyl acetone of steam;
One second fluid infusion apparatus 14, be installed in a second side 117 of this substrate storage tank 11, by this second fluid infusion apparatus 14 can import have a proper temperature one second liquid in substrate storage tank 11, to soak this substrate 2, make substrate 2 keep in temperature state; In the first embodiment frame of the drying substrates system 1 of this improvement, this second liquid be deionized water (Deionization Water, DIW), and the scope of this proper temperature that it had is 25 °～65 ℃;
One first tapping equipment 15, be installed in one the 3rd side 118 of this substrate storage tank 11, this first side 116 of the 3rd side and substrate storage tank 11, and this second side 117 be adjacent edge, this first tapping equipment 15 is in order to discharge this second liquid lentamente;
One second tapping equipment 16 is installed in the 3rd side 118 of this substrate storage tank 11, and this second tapping equipment 16 is in order to discharge this second liquid at full tilt;
One gas input device 17, be connected in this first liquid storage tank 12, can import one first gas in the first liquid storage tank 12 by this gas input device 17, this first gas is the gas of a clean dried, among first embodiment, select for use nitrogen as first gas, utilize nitrogen this atomizing first liquid can be transported in this substrate storage tank 11 that is marked with this second liquid.Because this substrate 2 is soaked in second liquid with this proper temperature, therefore, the substrate 2 of temperature state in the maintenance, itself and atomizing have a temperature difference between first liquid, this temperature difference has more increased the gap of atomize first liquid and the second liquid interfacial surface tension value, therefore, when the rate of discharge of this first tapping equipment 15 of control with this second tapping equipment 16, and when second liquid emitted in substrate storage tank 11, be subjected to the atomizing influence of the surface tension difference between first liquid and second liquid of the hydrone on substrate 2 surfaces, and be drawn within second liquid, reached the effect on dry substrate 2 surfaces; And
One organic gas tapping equipment 18, be installed in this second side 117 of this substrate storage tank 11, this organic gas tapping equipment 18 can be after these substrate 2 dryings be finished, first liquid and this first gas discharge substrate storage tank 11 should atomize, to avoid because atomizing first liquid and the excessive concentration of first gas in substrate storage tank 11, and the facts of causing danger.
In addition, this substrate storage tank 11 has more comprised: one first arrangement for detecting 113, one second arrangement for detecting 114, and one the 3rd arrangement for detecting 115.This first arrangement for detecting 113 can be a gas backpressure formula liquid level detecting device or the reflective liquid level detector of a light, if first arrangement for detecting 113 is this gas backpressure formula liquid level detecting device, then be installed in the inside cell wall of this substrate storage tank 11, if first arrangement for detecting 113 is this gas backpressure formula liquid level detecting device, then be installed in the outside cell wall of substrate storage tank 11; And among present embodiment, first arrangement for detecting 113 is a gas backpressure formula liquid level detecting device, therefore it is installed in the inside cell wall of substrate storage tank 11, when this second liquid is injected in the substrate storage tank 11, can detect one first accurate position of second liquid by first arrangement for detecting 113, to avoid injecting the second too much liquid.This second arrangement for detecting 114 also is a gas backpressure formula liquid level detecting device, therefore, second arrangement for detecting 114 is installed in the inside cell wall of substrate storage tank 11, and be positioned at the below of first arrangement for detecting 113, when discharging lentamente by this first tapping equipment 15 in second liquid, second arrangement for detecting 114 can be detected one second accurate position of second liquid, and when second liquid reaches the height of this second accurate position in substrate storage tank 11, at this moment, can stop to transport this first liquid that atomizes enters in the substrate storage tank 11.The 3rd arrangement for detecting 115 also is a gas backpressure formula liquid level detecting device, therefore, the 3rd arrangement for detecting 115 is installed in the inside cell wall of substrate storage tank 11, and be positioned at the below of second arrangement for detecting 114, when discharging at high speed by this second tapping equipment 16 in second liquid, the 3rd arrangement for detecting 115 can be detected one the 3rd accurate position of second liquid, and when second liquid reaches the height of the 3rd accurate position in substrate storage tank 11, at this moment, can close first tapping equipment 15 and this second tapping equipment 16 to stop to discharge second liquid.
First embodiment of the above-mentioned drying substrates system that should improve, utilize this ultrasonic generator to produce the high frequency ripple that shakes in the mode of dither, utilize this high frequency ripple that shakes that isopropyl acetone (IPA) is atomized, it has replaced existing known techniques utilization heating isopropyl acetone and has made isopropyl acetone become the method for steam, therefore, the drying substrates system of improvement has not only saved its operating cost of cost (RunningCost) of firing equipment, has also solved the risk of the required burden of heating isopropyl acetone simultaneously.And, the atomizing isopropyl acetone has the bigger vaporific particle of particle, therefore strengthened the contact area of isopropyl acetone and this substrate 2, moreover, because substrate 2 is soaked among have this proper temperature deionized water of (25 ℃～65 ℃), make substrate keep middle temperature state, therefore, more widened between atomizing isopropyl acetone and the deionized water, capillary gap, and can effectively utilize the surface tension difference to promote the drying effect of substrate 2.
In addition, see also Fig. 3, it is the Organization Chart of second embodiment of the drying substrates system of improvement, most of element of second embodiment of the drying substrates system 1 of this improvement is all identical with first embodiment, yet, compared to first embodiment, among second embodiment, more comprise: a gas flow control device 112 and a laminar flow device 111.This gas flow control device 112 is installed in this substrate storage tank 11 inside, and is positioned at the junction of this first liquid storage tank 12 and substrate storage tank 11.Gas flow control device 112 can be an one-way flow control valve or an operations flows control valve, to control the flow that this first liquid that atomizes that this first gas transported enters substrate storage tank 11, avoiding moment to inject too much atomizing first liquid, and cause the unstability state in the substrate storage tank 11.111 inside that are installed in substrate storage tank 11 of this laminar flow apparatus, when this substrate 2 was placed within the substrate storage tank 11, this laminar flow apparatus 111 was positioned at the top of substrate 2.Among second embodiment, laminar flow apparatus 111 is one to have a plurality of poroid planks, therefore, when this first gas transports after this first liquid that atomizes enters in the substrate storage tank 11, atomizing first liquid will be by laminar flow apparatus 111, and can be distributed in the surface of substrate 2 more equably, and make the effect of dry substrate 2 promote more.And except the design with a plurality of poroid planks, laminar flow apparatus 111 also can be configured to a device with a plurality of nozzles, and it all can make atomizing first liquid be distributed in substrate surface equably.
Therefore, by above-mentioned detailed description for first embodiment of the present utility model and second embodiment, can learn that second embodiment is better than first embodiment for the drying effect of substrate 2, and this is because second embodiment has increased gas flow control device 112 and laminar flow apparatus 111 events, yet, in enforcement the utility model, if implement the people because considering on the equipment cost, and can't implement in second embodiment of the present utility model, first embodiment still is that an equipment cost is cheap, and has the drying substrates system of well dried effect.
The above-mentioned drying substrates system that intactly discloses this improvement, therefore comprehensively above-mentioned comprising the detailed exposure of first embodiment and second embodiment, the utlity model has following advantage:
1. the utility model is to utilize high-frequency vibration device to produce dither with the atomizing isopropyl acetone, and the atomizing isopropyl acetone has bigger vaporific particle, can increase the contact area of isopropyl acetone and substrate, and can promote the effect on dry substrate surface.
2. compared to existing known drying wafer system, the utility model uses high-frequency vibration device to substitute heater, reduces cost and its operating cost of firing equipment, has also solved the risk on the safety that heats the required burden of isopropyl acetone simultaneously.
3. the utility model using gases volume control device, it can control atomizing first liquid, and it enters the interior flow of substrate storage tank, to avoid atomizing first strength of fluid in the substrate storage tank too high, and make and produce non-persistent state in the substrate storage tank, in addition, can make atomizing first liquid be distributed in the surface of substrate equably by laminar flow apparatus, promote the effect of drying substrates more.
The above, it only is preferred embodiment of the present utility model, be not that the utility model is done any pro forma restriction, though the utility model discloses as above with preferred embodiment, yet be not in order to limit the utility model, any those skilled in the art, in not breaking away from the technical solutions of the utility model scope, when the technology contents that can utilize above-mentioned announcement is made a little change or is modified to the equivalent embodiment of equivalent variations, in every case be the content that does not break away from technical solutions of the utility model, according to technical spirit of the present utility model to any simple modification that above embodiment did, equivalent variations and modification all still belong in the scope of technical solutions of the utility model.
Claims (22)
1. the drying substrates system of an improvement can be applicable to a dry substrate, it is characterized in that it comprises:
One substrate storage tank can be wherein ccontaining with this substrate;
One first liquid storage tank is installed in a first side of this substrate storage tank, with ccontaining one first liquid;
One high-frequency vibration device is arranged at the inside of this first liquid storage tank, and this high-frequency vibration device can produce dither this first atomization of liquid is become an atomizing first liquid;
One second fluid infusion apparatus is installed in a second side of substrate storage tank, by this second fluid infusion apparatus can import have a proper temperature one second liquid in the substrate storage tank, to soak substrate, make substrate keep in temperature state;
One first tapping equipment is installed in one the 3rd side of substrate storage tank, and the 3rd side and first side and second side are adjacent edge, and this first tapping equipment is in order to discharge this second liquid lentamente;
One second tapping equipment is installed in the 3rd side of substrate storage tank, and this second tapping equipment is in order to discharge second liquid at full tilt;
One gas input device, be connected in the first liquid storage tank, can import one first gas in the first liquid storage tank by this gas input device, this first gas can transport into this atomizing first liquid in the substrate storage tank that is marked with second liquid, rate of discharge when control first tapping equipment and second tapping equipment, and when second liquid emitted in the substrate storage tank, be subjected to the atomizing influence of surface tension gap of first liquid and second liquid of the hydrone of substrate surface, and be drawn within second liquid, reached the effect on dry substrate surface; And
One organic gas tapping equipment is installed in the second side of substrate storage tank, and this organic gas tapping equipment can be after drying substrates be finished, and will atomize first liquid and first gas are discharged the substrate storage tank.
2. the drying substrates system of improvement according to claim 1 is characterized in that wherein said substrate storage tank more comprises:
One first arrangement for detecting is installed in the cell wall of substrate storage tank, when this second liquid is injected in the substrate storage tank, can detect one first accurate position of second liquid by this first arrangement for detecting;
One second arrangement for detecting is installed in the cell wall of substrate storage tank, and is positioned at the below of first arrangement for detecting, and when discharging lentamente by this first tapping equipment in second liquid, this second arrangement for detecting can be detected one second accurate position of second liquid; And
One the 3rd arrangement for detecting is installed in the cell wall of substrate storage tank, and is positioned at the below of second arrangement for detecting, and when discharging at high speed by this second tapping equipment in second liquid, the 3rd arrangement for detecting can be detected one the 3rd accurate position of second liquid.
3. the drying substrates system of improvement according to claim 1, it is characterized in that wherein said first liquid be following any: isopropyl alcohol, methyl alcohol and ethanol.
4. the drying substrates system of improvement according to claim 2 is characterized in that wherein said second liquid is deionized water.
5. the drying substrates system of improvement according to claim 1 is characterized in that wherein said first gas is the gas of a clean dried.
6. the drying substrates system of improvement according to claim 1 is characterized in that wherein said high-frequency vibration device is a ultrasonic generator.
7. the drying substrates system of improvement according to claim 1, the scope that it is characterized in that wherein said proper temperature is 25 °～65 ℃.
8. the drying substrates system of improvement according to claim 2 is characterized in that wherein said first arrangement for detecting is a gas backpressure formula liquid level detecting device and the reflective liquid level detector of a light.
9. the drying substrates system of improvement according to claim 2 is characterized in that wherein said second arrangement for detecting is a gas backpressure formula liquid level detecting device and the reflective liquid level detector of a light.
10. the drying substrates system of improvement according to claim 2 is characterized in that wherein said the 3rd arrangement for detecting is a gas backpressure formula liquid level detecting device and the reflective liquid level detector of a light.
11. the drying substrates system of improvement according to claim 1 is characterized in that wherein more comprising:
One gas flow control device is installed in this substrate storage tank inside, and it is positioned at the junction of this first liquid storage tank and substrate storage tank, to control the flow that this first liquid that atomizes that this first gas transported enters the substrate storage tank; And
One laminar flow device, be installed in the inside of substrate storage tank, in in this substrate is placed into the substrate storage tank, this laminar flow apparatus is positioned at the top of substrate, after first gas transports atomizing first liquid enters in the substrate storage tank, first liquid that atomizes can pass through laminar flow apparatus, and is distributed in the surface of substrate equably.
12. the drying substrates system of improvement according to claim 11 is characterized in that wherein said substrate storage tank more comprises:
One first arrangement for detecting is installed in the cell wall of substrate storage tank, and is positioned at the below of this laminar flow apparatus, when this second liquid is injected in the substrate storage tank, can detect one first accurate position of second liquid by this first arrangement for detecting;
One second arrangement for detecting is installed in the cell wall of substrate storage tank, and is positioned at the below of first arrangement for detecting, and when discharging lentamente by this first tapping equipment in second liquid, this second arrangement for detecting can be detected one second accurate position of second liquid; And
One the 3rd arrangement for detecting is installed in the cell wall of substrate storage tank, and is positioned at the below of second arrangement for detecting, and when discharging at high speed by this second tapping equipment in second liquid, the 3rd arrangement for detecting can be detected one the 3rd accurate position of second liquid.
13. the drying substrates system of improvement according to claim 11 is characterized in that wherein said first liquid is isopropyl alcohol, methyl alcohol or ethanol.
14. the drying substrates system of improvement according to claim 11 is characterized in that wherein said second liquid is deionized water.
15. the drying substrates system of improvement according to claim 11 is characterized in that wherein said first gas is the gas of a clean dried.
16. the drying substrates system of improvement according to claim 11 is characterized in that wherein said high-frequency vibration device is a ultrasonic generator.
17. the drying substrates system of improvement according to claim 12 is characterized in that wherein said first arrangement for detecting is a gas backpressure formula liquid level detecting device and the reflective liquid level detector of a light.
18. the drying substrates system of improvement according to claim 12 is characterized in that wherein said second arrangement for detecting is a gas backpressure formula liquid level detecting device and the reflective liquid level detector of a light.
19. the drying substrates system of improvement according to claim 12 is characterized in that wherein said the 3rd arrangement for detecting is a gas backpressure formula liquid level detecting device and the reflective liquid level detector of a light.
20. the drying substrates system of improvement according to claim 11, the scope that it is characterized in that wherein said proper temperature are 25 °～65 ℃.
21. the drying substrates system of improvement according to claim 11, it is characterized in that wherein said laminar flow apparatus be following any: one has a plurality of poroid planks and a plurality of nozzle.
22. the drying substrates system of improvement according to claim 12 is characterized in that wherein said gas flow control device is an one-way flow control valve and an operations flows control valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202705016U CN201583107U (en) | 2009-11-17 | 2009-11-17 | Improved substrate drying system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202705016U CN201583107U (en) | 2009-11-17 | 2009-11-17 | Improved substrate drying system |
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| Publication Number | Publication Date |
|---|---|
| CN201583107U true CN201583107U (en) | 2010-09-15 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2009202705016U Expired - Lifetime CN201583107U (en) | 2009-11-17 | 2009-11-17 | Improved substrate drying system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102896129A (en) * | 2012-11-01 | 2013-01-30 | 常州捷佳创精密机械有限公司 | Slowly lifting air exhaust device for solar photovoltaic cleaning tank |
-
2009
- 2009-11-17 CN CN2009202705016U patent/CN201583107U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102896129A (en) * | 2012-11-01 | 2013-01-30 | 常州捷佳创精密机械有限公司 | Slowly lifting air exhaust device for solar photovoltaic cleaning tank |
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