CN201357287Y - Novel picosecond laser processing device - Google Patents

Novel picosecond laser processing device Download PDF

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Publication number
CN201357287Y
CN201357287Y CN 200920036010 CN200920036010U CN201357287Y CN 201357287 Y CN201357287 Y CN 201357287Y CN 200920036010 CN200920036010 CN 200920036010 CN 200920036010 U CN200920036010 U CN 200920036010U CN 201357287 Y CN201357287 Y CN 201357287Y
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CN
China
Prior art keywords
processing
picosecond laser
speculum
spraying orifice
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN 200920036010
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Chinese (zh)
Inventor
赵裕兴
郭良
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Suzhou Delphi Laser Co Ltd
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Suzhou Delphi Laser Co Ltd
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Priority to CN 200920036010 priority Critical patent/CN201357287Y/en
Application granted granted Critical
Publication of CN201357287Y publication Critical patent/CN201357287Y/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

The utility model provides a picosecond laser processing device. The picosecond laser processing device comprises a picosecond laser, a calibration system and a spiral optical processing system; wherein a first reflecting mirror connected with a second reflecting mirror is arranged at the output end of the picosecond laser; an optical shutter is arranged at the output end of the second reflecting mirror; a beam expanding mirror is connected with the output end of the optical shutter; a third reflecting mirror is connected with the output end of the beam expanding mirror; and the third reflecting mirror is connected with the spiral optical processing system through the calibration system. The device is suitable for processing oil atomizer nozzle micropores, and has the advantages that thermal effect produced by processing is small; the edge of each spraying orifice is smooth; the inner wall of the spraying orifice is burr-free; the processing efficiency and the precision are high; the size of the diameter of the spraying orifice is adjustable; the processing efficiency and precise is high; the diameter of the spraying orifice is adjustable, and the minimum diameter of the spraying orifice can be 60 micrometer; the cylindrical shape of the spraying orifice is ensured; the depth-diameter ratio of the spraying orifice can be 1:20; and the machining precision and the quality of the spraying orifice are greatly improved.

Description

Novel picosecond laser processing unit (plant)
Technical field
The utility model relates to a kind of novel picosecond laser processing unit (plant), is used to process the micropore on the atomizer.
Background technology
Fuel injector is contained in cylinder and covers, and effect is that fuel spray is changed into thinner particle, and is injected in the combustion chamber and air forms good flammable mixed steam, thereby improves efficiency of combustion.Fuel injector is made up of the oil injector body on top and the atomizer of bottom, high pressure fuel forms atomizing particle through oil injector body aperture outgoing from the atomizer, granular size is by fuel pressure and hole diameter decision, thereby the quality of aperture has crucial effects to final efficiency of combustion.According to the difference of atomizer kind, the shape of its aperture is also different.Hole diameter is between 0.15~1mm, and generally between 0.15~0.55mm, little hole depth is less than 1mm for the hole diameter on the atomizer commonly used at present, and little hole number is less than 15.
At present, the existing mechanical process technology is beaten miniature aperture on material generally can only process the aperture of aperture greater than 0.25mm, though utilize the hole of high-end mechanical drilling machine about can hole diameter 0.1mm, but its shortcoming is to cost an arm and a leg, the life-span is shorter, be difficult to the processing rigid alloy, shortcoming such as the aperture inwall after the processing is jagged.Spark erosion technique also is commonly used to process aperture.Spark technology can be processed the following micropore of diameter 0.1mm, and its machining accuracy is higher.Shortcoming is that speed is slow, and electrode life is short and more little cost is high more.Laser has been used in the capillary processing field at present.Utilize optical system laser can be focused on luminous point less than 0.01mm, the power density at luminous point place can reach 10 9W/cm 2, add the man-hour material and be melted, vaporize, thereby form aperture.Than machinery and spark machined mode, laser processing technology has significant advantage: its process velocity is fast, and can process thousands of holes each second, and the hole uniformity is better; Cost is lower, no tool loss; Life-span is long, working stability.What present industrial laser brill micropore generally used is that light impulse length is nanosecond (10 -9S) laser instrument.Because light impulse length that nanosecond laser produced is a nanosecond, fuel factor is obvious when interacting with material, and phenomenons such as that bore edges occurs is rough, burn, chipping, fire check cause the machining accuracy reduction.In addition, though normally used vibration mirror scanning type optical system can be processed the micropore about 0.1mm, its shortcoming is that working (machining) efficiency is low, and the small-bore that can process can't process darker aperture deeply than limited.
Summary of the invention
The purpose of this utility model is to overcome the deficiency that prior art exists, and a kind of picosecond laser processing unit (plant) that is used for the atomizer capillary processing is provided, and is intended to effectively improve working (machining) efficiency, increase the spray orifice footpath deeply than, improve spray orifice machining accuracy and quality.
The purpose of this utility model is achieved through the following technical solutions:
Novel picosecond laser processing unit (plant), comprise picosecond laser, calibration system and spiral optics system of processing, characteristics are: the output of described picosecond laser is furnished with first speculum, first speculum is connected second speculum, the output of second speculum is provided with optical gate, the output of optical gate is connected with beam expanding lens, and the output of beam expanding lens is connected the 3rd speculum, and the 3rd speculum is connected with spiral optics system of processing mutually by calibration system.
Further, above-mentioned novel picosecond laser processing unit (plant), the laser of described picosecond laser output is the picosecond green laser, wavelength is 532nm.
Further, above-mentioned novel picosecond laser processing unit (plant), the enlargement ratio of described beam expanding lens be 3~10 times adjustable.
Substantive distinguishing features and obvious improvement that technical solutions of the utility model are outstanding are mainly reflected in:
It is that 532nm, light impulse length are the laser instrument of the picosecond composition processing unit (plant) that combines with spiral optics system of processing that the utility model adopts wavelength, be used to process the atomizer micropore, the fuel factor that processing is produced is little, and the spray orifice edge is smooth, inwall does not have burr, working (machining) efficiency and precision height.The injection diameter adjustable size, I reaches 60um; Shape can guarantee that to cylindrical its footpath is dark in reaching 1: 20.Significantly reduce the fuel factor in the process, improved working (machining) efficiency, improved spray orifice machining accuracy and quality greatly.
Description of drawings
Below in conjunction with accompanying drawing technical solutions of the utility model are described further:
Fig. 1: the schematic diagram of the utility model light channel structure;
Fig. 2: the structural representation of the utility model device.
The implication of each Reference numeral sees the following form among the figure:
Reference numeral Implication Reference numeral Implication Reference numeral Implication
1 Picosecond laser 2 First speculum 3 Second speculum
4 Optical gate 5 Beam expanding lens 6 The 3rd speculum
7 Calibration system 8 Spiral optics system of processing 9 Workbench
The specific embodiment
The utility model designs a kind of laser micropore processor, utilize the picosecond laser micropore of processing on the atomizer that combine with spiral optics system of processing, picosecond laser enters spiral optics system of processing after optical delivery and calibration system, carry out capillary processing after by software control spiral optical system light beam being focused on.
As shown in Figure 1 and Figure 2, novel picosecond laser processing unit (plant), comprise picosecond laser 1, calibration system 7 and spiral optics system of processing 8, the output of picosecond laser 1 is furnished with first speculum 2, the output that first speculum 2 is connected second speculum, 3, the second speculums 3 is provided with optical gate 4, and the output of optical gate 4 is connected with beam expanding lens 5, the output of beam expanding lens 5 is connected has the 3rd speculum 6, the three speculums 6 to be connected mutually with spiral optics system of processing 8 by calibration system 7.
The optical maser wavelength of picosecond laser 1 output is the 532nm green laser, and metallics has higher absorptivity for this band light beam, thereby focal beam spot place energy is fully used, and can reduce the fuel factor that adds man-hour.The pulse width of laser is a picosecond, and its pulse power is 1000 times of nanosecond pulse power, and material is directly gasified and without molten state, can effectively reduce the generation of fuel factor.Thereby make little bore edges smooth, it is residual that inwall does not have burr etc.
Optical gate 4 plays the external control of laser break-make in the optic path, can stop laser when not being in machining state, also plays the certain protection effect, prevents that operating personnel are subjected to unexpected injury.
The enlargement ratio of beam expanding lens 5 from 3~10 times adjustable, its effect is with the enlarged-diameter of laser beam and collimates, and makes the depth of parallelism of outgoing beam better, helps light beam is focused in follow-up system.The multiplying power of beam expanding lens 5 and the diameter of focal beam spot are inversely proportional to, so adjustable diameter and the energy size that can effectively control focal beam spot of multiplying power.
Light path calibration system 7 is used for the light path calibration of double light path, and its principle is to make laser by being in two apertures separated by a distance on the same axis determining its transmission path, thereby guarantees that light beam enters spiral optics system of processing 8 with optimal path.
Around the axis rotation of self, the spray orifice circularity of having avoided like this causing because of the circularity of light beam own is not good descends the light of spiral optics system of processing 8 outgoing at a high speed.Outgoing beam carries out the high speed trepan along a taper seat to rapidoprint after the light beam line focus, makes the processing footpath of spray orifice dark in reaching 1: 20.In this process, the speed of rotation can be regulated in real time by software control.The trepan diameter of a circle is the diameter of required processing spray orifice, can its size be set by software, and the minimum diameter that can process spray orifice is 60um.With tapered the comparing in hole that common mirror-vibrating laser boring is got out, the light beam of spiral optics system of processing outgoing and the angle of finished surface also can be controlled by software, thereby guarantee that the spray orifice that processes is a cylindrical hole.
Speculum mainly plays the effect of optical path-deflecting, distance between speculum and speculum and speculum and the beam expanding lens does not have specific restriction, the maintenance level consistent or vertical consistent (the light path corner is the right angle among the figure) but try one's best in the center of its position eyeglass when Machine Design is to make things convenient for the adjusting of light path.
During concrete the application, as Fig. 1, by picosecond laser 1 output pulse width is the green 532nm wavelength laser bundle of picosecond, behind first speculum 2, second speculum 3, enter beam expanding lens 5 by optical gate 4, after expanding bundle, enter calibration system 7 by the 3rd speculum 6, make the light velocity through determining that the path enters spiral optics system of processing 8, after the atomizer that spiral optics system of processing 8 focuses on the workbench 9, the material direct gasification of focal spot is divested, thereby process spray orifice.
In sum, select for use 532nm, light impulse length to reach picosecond, power density reaches 10 12W/cm 2Laser, the fuel factor that produces in the time of can effectively reducing the Laser Processing metal.Spiral optics system of processing not only makes the efficient of processing spray orifice be significantly improved, and the working depth of precision, spray orifice shape and the spray orifice of injection diameter also can both obtain well satisfying simultaneously, and its application prospect is very good.
What need understand is: above-mentioned explanation is not to be to restriction of the present utility model, and in the utility model design scope, the interpolation of being carried out, conversion, replacement etc. also should belong to protection domain of the present utility model.

Claims (3)

1. novel picosecond laser processing unit (plant), comprise picosecond laser, calibration system and spiral optics system of processing, it is characterized in that: the output of described picosecond laser is furnished with first speculum, first speculum is connected second speculum, the output of second speculum is provided with optical gate, the output of optical gate is connected with beam expanding lens, and the output of beam expanding lens is connected the 3rd speculum, and the 3rd speculum is connected with spiral optics system of processing mutually by calibration system.
2. novel picosecond laser processing unit (plant) according to claim 1 is characterized in that: the laser of described picosecond laser output is the picosecond green laser, and wavelength is 532nm.
3. novel picosecond laser processing unit (plant) according to claim 1 is characterized in that: the enlargement ratio of described beam expanding lens be 3~10 times adjustable.
CN 200920036010 2009-03-06 2009-03-06 Novel picosecond laser processing device Expired - Fee Related CN201357287Y (en)

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Cited By (40)

* Cited by examiner, † Cited by third party
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CN102310264A (en) * 2010-06-30 2012-01-11 深圳市大族激光科技股份有限公司 Ultraviolet laser applied optics system
CN102319960A (en) * 2011-07-27 2012-01-18 苏州德龙激光有限公司 Device and method for making metal film group holes by using ultra-short pulse laser
CN105598593A (en) * 2016-02-29 2016-05-25 深圳英诺激光科技有限公司 Laser processing system and method used for hard and brittle material drilling
US9676167B2 (en) 2013-12-17 2017-06-13 Corning Incorporated Laser processing of sapphire substrate and related applications
US9701563B2 (en) 2013-12-17 2017-07-11 Corning Incorporated Laser cut composite glass article and method of cutting
US9815144B2 (en) 2014-07-08 2017-11-14 Corning Incorporated Methods and apparatuses for laser processing materials
US9815730B2 (en) 2013-12-17 2017-11-14 Corning Incorporated Processing 3D shaped transparent brittle substrate
US9850159B2 (en) 2012-11-20 2017-12-26 Corning Incorporated High speed laser processing of transparent materials
US9850160B2 (en) 2013-12-17 2017-12-26 Corning Incorporated Laser cutting of display glass compositions
US10047001B2 (en) 2014-12-04 2018-08-14 Corning Incorporated Glass cutting systems and methods using non-diffracting laser beams
US10144093B2 (en) 2013-12-17 2018-12-04 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
CN109158774A (en) * 2018-09-10 2019-01-08 西安成立航空制造有限公司 A kind of spout processing method of fuel nozzle
US10173916B2 (en) 2013-12-17 2019-01-08 Corning Incorporated Edge chamfering by mechanically processing laser cut glass
US10233112B2 (en) 2013-12-17 2019-03-19 Corning Incorporated Laser processing of slots and holes
US10252931B2 (en) 2015-01-12 2019-04-09 Corning Incorporated Laser cutting of thermally tempered substrates
CN109604828A (en) * 2018-12-26 2019-04-12 苏州镭扬激光科技有限公司 A kind of picosecond pulse laser bonding machine
US10280108B2 (en) 2013-03-21 2019-05-07 Corning Laser Technologies GmbH Device and method for cutting out contours from planar substrates by means of laser
US10335902B2 (en) 2014-07-14 2019-07-02 Corning Incorporated Method and system for arresting crack propagation
US10377658B2 (en) 2016-07-29 2019-08-13 Corning Incorporated Apparatuses and methods for laser processing
US10421683B2 (en) 2013-01-15 2019-09-24 Corning Laser Technologies GmbH Method and device for the laser-based machining of sheet-like substrates
US10522963B2 (en) 2016-08-30 2019-12-31 Corning Incorporated Laser cutting of materials with intensity mapping optical system
US10525657B2 (en) 2015-03-27 2020-01-07 Corning Incorporated Gas permeable window and method of fabricating the same
US10526234B2 (en) 2014-07-14 2020-01-07 Corning Incorporated Interface block; system for and method of cutting a substrate being transparent within a range of wavelengths using such interface block
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US10611667B2 (en) 2014-07-14 2020-04-07 Corning Incorporated Method and system for forming perforations
US10626040B2 (en) 2017-06-15 2020-04-21 Corning Incorporated Articles capable of individual singulation
US10688599B2 (en) 2017-02-09 2020-06-23 Corning Incorporated Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines
US10730783B2 (en) 2016-09-30 2020-08-04 Corning Incorporated Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots
US10752534B2 (en) 2016-11-01 2020-08-25 Corning Incorporated Apparatuses and methods for laser processing laminate workpiece stacks
US11062986B2 (en) 2017-05-25 2021-07-13 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US11114309B2 (en) 2016-06-01 2021-09-07 Corning Incorporated Articles and methods of forming vias in substrates
US11111170B2 (en) 2016-05-06 2021-09-07 Corning Incorporated Laser cutting and removal of contoured shapes from transparent substrates
US11186060B2 (en) 2015-07-10 2021-11-30 Corning Incorporated Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same
US11542190B2 (en) 2016-10-24 2023-01-03 Corning Incorporated Substrate processing station for laser-based machining of sheet-like glass substrates
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
US11648623B2 (en) 2014-07-14 2023-05-16 Corning Incorporated Systems and methods for processing transparent materials using adjustable laser beam focal lines
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CN102310264B (en) * 2010-06-30 2014-09-10 深圳市大族激光科技股份有限公司 Ultraviolet laser applied optics system
CN102310264A (en) * 2010-06-30 2012-01-11 深圳市大族激光科技股份有限公司 Ultraviolet laser applied optics system
CN102319960A (en) * 2011-07-27 2012-01-18 苏州德龙激光有限公司 Device and method for making metal film group holes by using ultra-short pulse laser
US9850159B2 (en) 2012-11-20 2017-12-26 Corning Incorporated High speed laser processing of transparent materials
US11028003B2 (en) 2013-01-15 2021-06-08 Corning Laser Technologies GmbH Method and device for laser-based machining of flat substrates
US11345625B2 (en) 2013-01-15 2022-05-31 Corning Laser Technologies GmbH Method and device for the laser-based machining of sheet-like substrates
US10421683B2 (en) 2013-01-15 2019-09-24 Corning Laser Technologies GmbH Method and device for the laser-based machining of sheet-like substrates
US11713271B2 (en) 2013-03-21 2023-08-01 Corning Laser Technologies GmbH Device and method for cutting out contours from planar substrates by means of laser
US10280108B2 (en) 2013-03-21 2019-05-07 Corning Laser Technologies GmbH Device and method for cutting out contours from planar substrates by means of laser
US10183885B2 (en) 2013-12-17 2019-01-22 Corning Incorporated Laser cut composite glass article and method of cutting
US11148225B2 (en) 2013-12-17 2021-10-19 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US10611668B2 (en) 2013-12-17 2020-04-07 Corning Incorporated Laser cut composite glass article and method of cutting
US10144093B2 (en) 2013-12-17 2018-12-04 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US10442719B2 (en) 2013-12-17 2019-10-15 Corning Incorporated Edge chamfering methods
US10173916B2 (en) 2013-12-17 2019-01-08 Corning Incorporated Edge chamfering by mechanically processing laser cut glass
US10179748B2 (en) 2013-12-17 2019-01-15 Corning Incorporated Laser processing of sapphire substrate and related applications
US10597321B2 (en) 2013-12-17 2020-03-24 Corning Incorporated Edge chamfering methods
US10233112B2 (en) 2013-12-17 2019-03-19 Corning Incorporated Laser processing of slots and holes
US9701563B2 (en) 2013-12-17 2017-07-11 Corning Incorporated Laser cut composite glass article and method of cutting
US9676167B2 (en) 2013-12-17 2017-06-13 Corning Incorporated Laser processing of sapphire substrate and related applications
US9815730B2 (en) 2013-12-17 2017-11-14 Corning Incorporated Processing 3D shaped transparent brittle substrate
US10293436B2 (en) 2013-12-17 2019-05-21 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US9850160B2 (en) 2013-12-17 2017-12-26 Corning Incorporated Laser cutting of display glass compositions
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
US10392290B2 (en) 2013-12-17 2019-08-27 Corning Incorporated Processing 3D shaped transparent brittle substrate
US9815144B2 (en) 2014-07-08 2017-11-14 Corning Incorporated Methods and apparatuses for laser processing materials
US11697178B2 (en) 2014-07-08 2023-07-11 Corning Incorporated Methods and apparatuses for laser processing materials
US10335902B2 (en) 2014-07-14 2019-07-02 Corning Incorporated Method and system for arresting crack propagation
US11648623B2 (en) 2014-07-14 2023-05-16 Corning Incorporated Systems and methods for processing transparent materials using adjustable laser beam focal lines
US10526234B2 (en) 2014-07-14 2020-01-07 Corning Incorporated Interface block; system for and method of cutting a substrate being transparent within a range of wavelengths using such interface block
US10611667B2 (en) 2014-07-14 2020-04-07 Corning Incorporated Method and system for forming perforations
US11014845B2 (en) 2014-12-04 2021-05-25 Corning Incorporated Method of laser cutting glass using non-diffracting laser beams
US10047001B2 (en) 2014-12-04 2018-08-14 Corning Incorporated Glass cutting systems and methods using non-diffracting laser beams
US10252931B2 (en) 2015-01-12 2019-04-09 Corning Incorporated Laser cutting of thermally tempered substrates
US11773004B2 (en) 2015-03-24 2023-10-03 Corning Incorporated Laser cutting and processing of display glass compositions
US10525657B2 (en) 2015-03-27 2020-01-07 Corning Incorporated Gas permeable window and method of fabricating the same
US11186060B2 (en) 2015-07-10 2021-11-30 Corning Incorporated Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same
CN105598593A (en) * 2016-02-29 2016-05-25 深圳英诺激光科技有限公司 Laser processing system and method used for hard and brittle material drilling
CN105598593B (en) * 2016-02-29 2018-05-22 英诺激光科技股份有限公司 For the laser-processing system and method for hard brittle material drilling
US11111170B2 (en) 2016-05-06 2021-09-07 Corning Incorporated Laser cutting and removal of contoured shapes from transparent substrates
US11114309B2 (en) 2016-06-01 2021-09-07 Corning Incorporated Articles and methods of forming vias in substrates
US11774233B2 (en) 2016-06-29 2023-10-03 Corning Incorporated Method and system for measuring geometric parameters of through holes
US10377658B2 (en) 2016-07-29 2019-08-13 Corning Incorporated Apparatuses and methods for laser processing
US10522963B2 (en) 2016-08-30 2019-12-31 Corning Incorporated Laser cutting of materials with intensity mapping optical system
US10730783B2 (en) 2016-09-30 2020-08-04 Corning Incorporated Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots
US11130701B2 (en) 2016-09-30 2021-09-28 Corning Incorporated Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots
US11542190B2 (en) 2016-10-24 2023-01-03 Corning Incorporated Substrate processing station for laser-based machining of sheet-like glass substrates
US10752534B2 (en) 2016-11-01 2020-08-25 Corning Incorporated Apparatuses and methods for laser processing laminate workpiece stacks
US10688599B2 (en) 2017-02-09 2020-06-23 Corning Incorporated Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US11062986B2 (en) 2017-05-25 2021-07-13 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11972993B2 (en) 2017-05-25 2024-04-30 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10626040B2 (en) 2017-06-15 2020-04-21 Corning Incorporated Articles capable of individual singulation
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
CN109158774A (en) * 2018-09-10 2019-01-08 西安成立航空制造有限公司 A kind of spout processing method of fuel nozzle
CN109604828A (en) * 2018-12-26 2019-04-12 苏州镭扬激光科技有限公司 A kind of picosecond pulse laser bonding machine
CN110732840A (en) * 2019-10-18 2020-01-31 鹤山市精工制版有限公司 Plate roller manufacturing process and laser plate roller

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C56 Change in the name or address of the patentee
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Address after: 215021 Suzhou Industrial Park, Jiangsu, Hong Zhong Road, No. 77

Patentee after: Suzhou Delphi Laser Co., Ltd.

Address before: 215021 Suzhou Industrial Park, Jiangsu, Hong Zhong Road, No. 77

Patentee before: Suzhou Delphi Laser Co., Ltd.

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20091209

Termination date: 20160306