CN1929110A - Carbon nano tube/copper composite plating membrane and method for preparing electricity interconnecting line - Google Patents
Carbon nano tube/copper composite plating membrane and method for preparing electricity interconnecting line Download PDFInfo
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- CN1929110A CN1929110A CN 200610116290 CN200610116290A CN1929110A CN 1929110 A CN1929110 A CN 1929110A CN 200610116290 CN200610116290 CN 200610116290 CN 200610116290 A CN200610116290 A CN 200610116290A CN 1929110 A CN1929110 A CN 1929110A
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- carbon nano
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- interconnecting line
- nano tube
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Abstract
This invention relates to carbon nanometer tube and copper compound coating film and connection method in electron materials and parts, which processes stable carbon nanometer tube and copper compound liquid through privation and diffusion and processes electrochemical deposition method for carbon nanometer tube and copper compound layer and then combines with micro structure coating, light etching and peeling method to form connection wire structure.
Description
Technical field
That the present invention relates to is the preparation method in a kind of electronic material and device technology field, specifically, is the preparation method of interconnected lead material of the compound electricity of a kind of carbon nano tube/copper and structure.
Background technology
Along with the integrated circuit characteristic size enters nanoscale, face huge technological challenge as the silicon CMOS of integrated circuit main flow device.Interconnection material and technology are one of main bottlenecks of following integrated circuit development.At present, the interconnecting line of sub-micron IC technology is to take to replace the critical material of aluminium as interconnection with copper.And the conductive capability of metallic copper is only high by 1/3 than metallic aluminium, and when using very thin metal interconnection line connecting circuit, electric current is by causing circuit heating, metal atoms migrate, to the performance depreciation that makes chip.
Carbon nano-tube has just caused physical chemistry and material circle scientific worker's very big interest with its excellent electric property and mechanical property since finding in 1991.Carbon nano-tube has distinctive 1-dimention nano form, and the motion of electronics in desirable carbon nano tube structure is the ballistic transport behavior, has high conductivity and current delivery ability, and Theoretical Calculation maximum current transmission density can reach 1 * 10
10A/cm
2, to compare with the copper conductive capability, carbon nano-tube can transmit big 1000 times current density.In addition, the thermal conductivity of carbon nano-tube reaches as high as 3000W/mk, is better than two times in diamond and diamond, is better than 6 times of copper products, can make interconnecting line property retention under higher temperature stable for a long time.Therefore, carbon nano-tube is considered to one of important candidate material of following very lagre scale integrated circuit (VLSIC) interconnecting lead and mems structure.Because carbon nano-tube is a kind of nanostructure of accurate one dimension form, the characteristic that has higher surface energy and very easily reunite need could combine it by special preparation method with existing material and technology, thereby realizes using effectively.
Through the literature search of prior art being found aspect carbon nano-tube and metallic film is compound, people such as S.R.Dong are (Materials Science﹠amp on " Materials Science and Engineering magazine "; Engineering, A 313 (2001) 83-87) reported by chemical plating at the coated copper coating of carbon nano tube surface, to improve the affinity of carbon nano-tube and metal matrix, strengthen interface binding power, adopt powder metallurgic method to prepare the carbon nano tube/copper composite material then.Adopt methods such as compound plating can realize the effective distribution of carbon nano-tube in metal matrix and compound, and improve the part mechanical performance, but this technology does not relate to the improvement of relevant electric property, does not find the bibliographical information about the high conducing composite material of preparation carbon nano tube/copper base aspect so far yet.
Summary of the invention
The objective of the invention is to overcome deficiency of the prior art, the preparation method of a kind of carbon nano tube/copper composite plating membrane and interconnecting line has been proposed, make it utilize the material behavior of carbon nano-tube excellence, by composite electric plating method with even carbon nanotube, be fused in the copper metal matrix reliably, obtain high electron transport ability and heat dispersion enhanced carbon nanotube/copper composite interconnection material, eliminate the influence of electromigration to device performance, existing ripe IC technical foundation be can utilize easily, interconnected lead material of high performance electricity and structure realized.
The present invention is achieved by the following technical solutions, the present invention is mixed with the carbon nano-tube after purified, the dispersion treatment carbon nano tube-copper composite plating bath of stable dispersion, form the carbon nano tube-copper composite deposite by electrochemical deposition method, further combined with micro-structural plating, chemical wet etching, lift-off technology, form the electricity interconnecting line structure of electronic device.
Carbon nano-tube used in the present invention can be respectively single single wall or multi-walled carbon nano-tubes, also can be their mixture, preferably metallic multi-walled carbon nano-tubes.
Process for dispersing of the present invention can be: the method that physics dispersion, chemical modification dispersion or high temperature disperse, wherein Zui Jia method is the high temperature dispersion method.
Composite plating bath used in the present invention can be conventional various copper or the basic plating bath of acid bronze alloy, or electronics plating plating bath.
Plated film basic parameter of the present invention is: the carbon nano-tube concentration in the composite plating bath is: 0.5-6g/L, current density is: 0.5-5A/dm
2Even dispersion of carbon pipe and chemical reaction fully carry out when adopting magnetic agitation, pneumatic stirring, ultrasonic vibration mode with the maintenance deposition during preparation, and be wherein preferable in the ultrasonic vibration mode.Basic deposition process parameters is: current density: 1-5A/dm
2, depositing temperature: 250 ℃.
The circuit interconnects pin configuration preparation method that the present invention adopts be can be compatible mutually with IC technology, MEMES technology, printed circuit board technology conventional little interconnected lead-in wire technology, as: Cu-CMP (copper plating-chemico-mechanical polishing) Damascus mosaic technology, little mask plating technology, film etching technics, stripping technology, specifically can make needs, select wherein the combination of any one or they according to little interconnected pin configuration.
The present invention utilizes carbon nano-tube to add material as function, method by carbon nano-tube and metal composite codeposition, it is compound in the metallic copper matrix with finite concentration and distribution form, constitute good conductive microstructure passage, the transmittability and the speed of electronics have been quickened, and greatly strengthened the heat-sinking capability of device, reduced the damage of electromigration material property.Because copper electroplate lead wire technology is generally used in present IC technology, technical maturity, on this basis, by adding the nanoscale material of excellent performance, not only can promote the performance of lead material itself, and can not produce remarkable influence device architecture and technology.This shows that the present invention has substantive distinguishing features and marked improvement, and simple for process, stronger compatibility is arranged, help the lifting of technology and product and apply with existing technology.
Embodiment
The invention will be described further below in conjunction with embodiment.
Embodiment 1
1. get the carbon pipe after the purification process, put into concentration and be ultrasonic 1 hour afterflush of polyacrylic acid (PAA) solution of 5%, filter the back oven dry.
2. prepare the acid copper-plating composite plating bath, concrete prescription is: the copper sulphate that contains five water: 150g/L, and sulfuric acid: 60g/L, brightener is a small amount of.Plating bath volume: 1L, carbon pipe 1g.
3. the above-mentioned plating bath for preparing, ultrasonic dispersion 60 minutes forms steady suspension.
4. plating film forming: as negative electrode, phosphorus copper plate is as anode with sheet brass, current density: 1A/dm
2, temperature: 25 ℃, magnetic agitation, electroplating time 20 minutes.
The obtainable more smooth coating of above-mentioned technology, good with combining of substrate, high resolution electron microscopy is observed down, and coating surface is distributed with uniform carbon pipe.
Embodiment 2
1. get the carbon pipe after the purification process, put into the high-temperature vacuum heating furnace, be heated to 1600 ℃, be incubated 1 hour.
2. acid copper plating solution preparation, concrete prescription: the copper sulphate that contains five water: 70g/L, sulfuric acid: 120g/L, Cl
-: 50mg/L, brightener is a small amount of.Plating bath volume: 1L, carbon pipe 4g.
3. the above-mentioned plating bath for preparing, ultrasonic dispersion 60 minutes forms steady suspension.
4. thermal oxide growth silicon oxide film on silicon chip forms the little pin configuration figure of silica with photoetching and caustic solution.
5. at little pin configuration deposited barrier layer TaN and Cu plating seed layer, with reference to step (4) method in the example 1, electroplate formation carbon nano tube/copper composite deposite at the silica patterned surface, concrete parameter is: current density: 3A/dm
2, temperature: 25 ℃, ultrasonic agitation, electroplating time 6 minutes.
6. with the composite deposite on chemico-mechanical polishing (CMP) the method removal silicon oxide layer, keep the composite membrane of inlaying in the groove, this is inlayed composite membrane and constitutes required pin configuration.
The obtainable surfacing of above-mentioned technology, the interconnecting line structure that the edge is neat, good with combining of substrate are observed and X ray energy dispersion analysis of spectrum through high resolution electron microscopy, and lead-in wire coating contains equally distributed carbon pipe.
Embodiment 3
1. get the carbon pipe after the purification process, put into the high-temperature vacuum heating furnace, be heated to 1600 ℃, be incubated 1 hour.
2. acid copper plating solution preparation, concrete prescription: the copper sulphate that contains five water: 50g/L, sulfuric acid: 100g/L, Cl
-: 50mg/L, brightener is a small amount of.Plating bath volume: 1L, carbon pipe 6g.
3. the above-mentioned plating bath for preparing, ultrasonic dispersion 60 minutes forms steady suspension.
4. on silicon chip, deposit the Cu plating seed layer.Then, spin coating photoresist on substrate copies to pin configuration on the substrate by the litho pattern transfer techniques, forms the little mask pattern of photoresist, electroplates the back and forms electrical lead configuration in the zone that does not have mask to cover.
5. with reference to step (4) method in the example 1, above-mentioned substrate is put into coating bath, apply current density: 5A/dm
2, temperature: 25 ℃, ultrasonic agitation, electroplating time 5 minutes.
6. the removal photoresist adopts chemical corrosion method to remove the Seed Layer of lead-in wire exterior domain, forms the little pin configuration of composite deposite.
The obtainable surfacing of above-mentioned technology, the interconnecting line structure that the edge is neat, good with combining of substrate, high resolution electron microscopy is observed and X ray energy dispersion analysis of spectrum, and lead-in wire coating contains equally distributed carbon pipe.
Claims (8)
1. method for preparing carbon nano tube/copper laminated film and electricity interconnecting line, it is characterized in that: the carbon nano tube-copper composite plating bath that the carbon nano-tube after purified, the dispersion treatment is mixed with stable dispersion, adopt electrochemistry and chemical method to prepare the carbon nano tube-copper composite deposite, and in conjunction with micro-structural plating, chemical wet etching, lift-off technology, form the interconnecting line structure of electronic circuit, the plated film basic parameter is: the carbon nano-tube concentration in the composite plating bath is: 0.5-6g/L, current density is: 0.5-5A/dm
2Even carbon nanotube dispersion and chemical reaction fully carry out when adopting magnetic agitation, pneumatic stirring or ultrasonic vibration mode to keep depositing during preparation, and deposition process parameters is: current density is 1-5A/dm
2, depositing temperature is 25 ℃.
2. the preparation method of carbon nano tube/copper composite plating membrane as claimed in claim 1 and electricity interconnecting line is characterized in that: described composite plating bath is that the basic electrochemistry of copper or acid bronze alloy and chemical plating fluid, electronics are electroplated and used plating bath.
3. the preparation method of carbon nano tube/copper composite plating membrane as claimed in claim 1 and electricity interconnecting line is characterized in that: described carbon nano-tube is single single wall or multi-walled carbon nano-tubes, or their mixture.
4. the preparation method of carbon nano tube/copper composite plating membrane as claimed in claim 3 and electricity interconnecting line is characterized in that: described carbon nano-tube is metallic multi-walled carbon nano-tubes.
5. the preparation method of carbon nano tube/copper composite plating membrane as claimed in claim 1 and electricity interconnecting line is characterized in that: described decentralized approach, adopt physics dispersion, chemical modification to disperse or the high temperature process for dispersing.
6. the preparation method of carbon nano tube/copper composite plating membrane as claimed in claim 5 and electricity interconnecting line is characterized in that: described decentralized approach, adopt the high temperature dispersion method.
7. the preparation method of carbon nano tube/copper composite plating membrane as claimed in claim 1 and interconnecting line is characterized in that: even carbon nanotube dispersion and chemical reaction fully carry out when adopting the ultrasonic vibration mode to keep depositing during preparation.
8. the preparation method of carbon nano tube/copper composite plating membrane as claimed in claim 1 and interconnecting line, it is characterized in that: described micro-structural plating, chemical wet etching, lift-off technology are specially in Cu-CMP Damascus mosaic technology, little mask plating technology, film etching technics, the stripping technology combination of any one or they.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006101162901A CN100466222C (en) | 2006-09-21 | 2006-09-21 | Carbon nano tube/copper composite plating membrane and method for preparing electricity interconnecting line |
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| CNB2006101162901A CN100466222C (en) | 2006-09-21 | 2006-09-21 | Carbon nano tube/copper composite plating membrane and method for preparing electricity interconnecting line |
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| CN1929110A true CN1929110A (en) | 2007-03-14 |
| CN100466222C CN100466222C (en) | 2009-03-04 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101768386B (en) * | 2009-01-07 | 2012-08-29 | 清华大学 | Ink and method adopting ink to prepare conductive line |
| CN105696059A (en) * | 2016-02-02 | 2016-06-22 | 上海大学 | Method and device for preparing high-strength and high-conductivity copper-carbon nano-tube composite material under magnetic field |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10168502A (en) * | 1996-12-10 | 1998-06-23 | Osaka Gas Co Ltd | Composite material with high thermal conductivity |
-
2006
- 2006-09-21 CN CNB2006101162901A patent/CN100466222C/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101768386B (en) * | 2009-01-07 | 2012-08-29 | 清华大学 | Ink and method adopting ink to prepare conductive line |
| CN105696059A (en) * | 2016-02-02 | 2016-06-22 | 上海大学 | Method and device for preparing high-strength and high-conductivity copper-carbon nano-tube composite material under magnetic field |
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| CN100466222C (en) | 2009-03-04 |
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