CN1901780A - Board cleaning apparatus and board transporting apparatus - Google Patents
Board cleaning apparatus and board transporting apparatus Download PDFInfo
- Publication number
- CN1901780A CN1901780A CN200610105669.2A CN200610105669A CN1901780A CN 1901780 A CN1901780 A CN 1901780A CN 200610105669 A CN200610105669 A CN 200610105669A CN 1901780 A CN1901780 A CN 1901780A
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- China
- Prior art keywords
- circuit substrate
- shell
- base plate
- cleaning device
- board carrying
- Prior art date
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- 238000004140 cleaning Methods 0.000 title claims abstract description 80
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 24
- 239000000758 substrate Substances 0.000 claims description 175
- 238000012546 transfer Methods 0.000 claims description 32
- 230000000694 effects Effects 0.000 claims description 29
- 230000002093 peripheral effect Effects 0.000 claims description 7
- 230000003068 static effect Effects 0.000 claims description 6
- 239000004020 conductor Substances 0.000 claims description 4
- 230000009471 action Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 230000001141 propulsive effect Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 230000008676 import Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 241000255789 Bombyx mori Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000003854 Surface Print Methods 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000012636 effector Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 230000009182 swimming Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
- B08B15/04—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area from a small area, e.g. a tool
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
- H05K2203/0257—Brushing, e.g. cleaning the conductive pattern by brushing or wiping
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1509—Horizontally held PCB
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/5313—Means to assemble electrical device
- Y10T29/53174—Means to fasten electrical component to wiring board, base, or substrate
- Y10T29/53178—Chip component
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Cleaning In General (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Supply And Installment Of Electrical Components (AREA)
- Elimination Of Static Electricity (AREA)
Abstract
The present invention provides a board cleaning apparatus excellent in foreign-matter removing efficiency. Fixed brushes 13 contacting with the surface total width of a circuit board 1 are mounted in the case 11 of the board cleaner 10 at the board transporting upstream and downstream of a rotary brush 12 for scattering foreign matters away. This fills up a gap (g) between the circuit board 1 for buffer circuits and the case 11 to avoid the interference with board transport rails 2 widthwise shifted according to various sizes of the circuit board 1.
Description
Technical field
The present invention relates in the handling process of circuit substrate, remove the base plate cleaning device and the substrate transfer apparatus of the foreign matters such as dust, dust, other attachment on the surface be attached to described circuit substrate.
Background technology
In the circuit substrate, general, print electrode on single or double terminal or circuit carry out printing, the parts of bond layer thereon and install, and further make product by the electrical connection that realizes that refluxed by scolding tin.During this period, add the surface that foreign matter in man-hour or the carrying way etc. is attached to circuit substrate easily, this can become the factor that causes product generation unfavorable condition.For fear of this situation, generally the suitable stage in processing carrying way carries out removing from circuit substrate the processing of these foreign matters.
In the past, this removal foreign matter be by to circuit substrate surface blowing, promote stationary brush, promote adhesive roller or undertaken by handwork etc., but the result that may not necessarily obtain to wish with cloth.For example, in blowing, because moisture or the bonding agent that disperses etc., the foreign matter firm attachment can not be removed when circuit substrate surperficial.And, when promoting stationary brush, even can obtain to remove the effect of static, but it is insufficient that foreign matter is removed, and, when promoting adhesive roller, understand under the overlapping situation of foreign matter that some is residual to circuit substrate, and using processing such as needs to change after a certain amount of.
Technology below also disclosing in the prior art, be about in the container that hair-dryer, aspirator, rotating brush, carrying roller be received into the semicolumn build that has utilized bellows (bellows) etc., this is disposed at the two sides of circuit substrate and covers circuit substrate from both sides fully, remove foreign matter (for example, opening flat 2-50822 communique) therein with reference to the spy.But this plant bulk is bigger, is difficult for being installed to the front and back of processing unit (plant) or the limited spaces such as Handling device of circuit substrate.
In order to improve these situations, also disclose base plate cleaning device small-sized and the easy-on circuit substrate in the prior art.Fig. 5 A, and Fig. 5 B represent its summary, Fig. 5 A represents to be equipped with the stereogram of the substrate transfer apparatus of this base plate cleaning device 50, Fig. 5 B represents to cut open along the XZ plane of Fig. 5 A the profile of base plate cleaning device 50.In Fig. 5 A and Fig. 5 B, base plate cleaning device 50 comprises: shell 51; Be arranged at the rotating brush 52 in the shell 51; Rotation drives the motor 153 of rotating brush 52; With the conduit cylindraceous 54 that attracts foreign matter to base plate cleaning device 50 importing negative pressure airs.Conduit 54 is connected with the negative pressure feeding source 160 of the outside that is arranged at shell 51 via flexible pipe 156.
Circuit substrate 1 (among Fig. 5 A, 1a that represents with solid line or the 1b that is represented by dotted lines) is carried by a pair of board carrying guide rail 2 (2a, the 2b) clamping of arranged opposite.Each board carrying guide rail 2a, 2b have the approximate U word shape section that is provided with recess at middle body, take in not shown conveyer belt in the inboard of this recess.Circuit substrate 1 is inserted in the recess of U word shape section of two board carrying guide rail 2a, 2b, and is loaded on the described conveyer belt and to directions X (being board carrying direction S in Fig. 5 B) carrying of Fig. 5 A.
When the base plate cleaning device 50 that constitutes as described above moves, be opposite to circuit substrate 1 by a pair of substrate transferring guide rail 2 carryings, rotating brush 52 (with reference to Fig. 5 B) flies out the foreign matter on the surface that is attached to circuit substrate 1 to the surface that the direction shown in the arrow A rotates brush circuit substrate 1 by rotating brush 52.Acting on attraction via in flexible pipe 156 and the conduit 54 that negative pressure feeding source 160 is connected, as shown by arrow B, to fly out and the foreign matter that swims in shell 51 is attracted in the conduit 54 by rotating brush 52 by the effect of the negative pressure air in negative pressure feeding source 160, thereby remove described foreign matter.
But, have several problems in the above-mentioned base plate cleaning device 50.At first, among Fig. 5 A, board carrying guide rail 2 needs the circuit substrate of the different various width dimensions (length of Width (Y direction)) of the many specifications of carrying.With board carrying guide rail 2 from by the state of shown in the solid line of Fig. 5 A, carrying the wide circuit substrate 1a of width like that, switch to when shown in the dotted line of Fig. 5 A, carrying the state of the narrow circuit substrate 1b of width like that, the board carrying guide rail 2a of a side need carry out width to the board carrying guide rail 2b of opposed opposite side like that and transfer narrow moving shown in arrow Y.For example, board carrying guide rail 2 all will carry out width at every turn according to the width dimensions of circuit substrate 1 and transfer narrow moving for the circuit substrate 1 of the scope of the width of the scope of the width of carrying 50mm~250mm or 50mm~510mm.
The width dimensions of circuit substrate 1 by base plate cleaning device 50 during permission Breadth Maximum (the circuit substrate 1a that width is wide), shown in the solid line of Fig. 5 A, because it is circuit substrate 1 is present in the whole width (total length of Y direction) of base plate cleaning device 50, therefore no problem.But when cleaning the narrow circuit substrate 1b of width shown in the dotted line of Fig. 5 A, the board carrying guide rail 2a of a side carries out width like that and transfers narrow mobile result shown in arrow Y, the open gap that produces, the bottom of the base plate cleaning device 50 between mobile distance.Therefore, the negative pressure air in negative pressure feeding source 160 leaks in this gap, and the result can produce the inadequate problem of attraction force acts of described foreign matter.
And, among Fig. 5 B, between the surface of the bottom of the shell 51 of base plate cleaning device 50 and circuit substrate 1, produce space (gap) g.This is that shell 51 can not interfere with the upper surface 58 of the board carrying guide rail 2a that is represented by two chain-dotted lines of Fig. 5 B when carrying out the narrow action of width accent for the board carrying guide rail 2a in an above-mentioned side.Owing to there is this gap g, on the one hand, can produce the leakage of negative pressure and the attraction of foreign matter is weakened, on the other hand shown in the arrow C of Fig. 5 B, the described foreign matter that is flown out by rotating brush 52 can not be directed in the conduit 54, but the below of falling base plate cleaning device 50, existence can be stacked into the problem on the base plate.
In addition, it is own that described foreign matter also can be attached to rotating brush 52, can touch once more on the circuit substrate 1 under this state.And shown in Fig. 5 B, because the factor of the configuration of the factor of the shape of shell 51 or conduit 54 etc., described foreign matter is stacked into the bight 59 in the shell 51, and the described foreign matter that is stacked into this bight 59 falls etc., also can adhere again on the circuit substrate 1 thus.Because this factor, the base plate cleaning device 50 of the prior art shown in employing Fig. 5 A and Fig. 5 B are removed the efficient of foreign matters may not be high, becomes the key factor of the problem of the quality reduction that causes circuit substrate 1.
Summary of the invention
The object of the present invention is to provide a kind of removal efficient base plate cleaning device and substrate transfer apparatus more excellent of foreign matter than prior art.
The present invention passes through: the stationary brush in the gap between the shell of employing obstruction base plate cleaning device and the surface of circuit substrate; Employing can be got rid of the conduit and the rotating brush of foreign matter effectively from circuit substrate; And/or be provided with and transfer narrowly when mobile when the board carrying guide rail carries out width, be blocked in the covering in the gap of the below of base plate cleaning device vacating, solve above-mentioned problem, specifically comprise following content.
Promptly, a mode that the present invention relates to is at a kind of base plate cleaning device, it comprises: the shell of case shape, this shell and surperficial opposed one side open circuit substrate, and this shell extends along the Width perpendicular to the described circuit substrate of described carrying direction, and described circuit substrate is handled upside down to the board carrying direction by the mutual opposed a pair of board carrying guide rail clamping of substrate transfer apparatus; Rotating brush, it is arranged in the described shell, and the axle that can extend with the described Width that is configured at described circuit substrate is that the center is rotated; Motor, its rotation drives described rotating brush; Conduit, it is connected with described shell is interior, can attract the air in the described shell; And stationary brush, it is disposed at the upstream side and the downstream of the described board carrying direction of described shell respectively with respect to described rotating brush, the whole width that can stride across the described surface of described circuit substrate contacts, wherein, under the described surperficial state of contact of any one and described circuit substrate of the described stationary brush that is disposed at described upstream side and described downstream, by attract the air in the described shell by described conduit, make described rotating brush rotation by described motor simultaneously, thereby can remove foreign matter in the described surface attachment of the described circuit substrate that is handled upside down to described board carrying direction.
Be disposed at the described stationary brush of described upstream side, tilt according to the mode of its end (bottom) towards the downstream of described board carrying direction.And described stationary brush is formed by electric conducting material, thereby can remove the static of described circuit substrate by described stationary brush.
Described rotating brush is formed by near two rifle brushes of the mutually reciprocal volume of combination (connection) central authorities of described Width, and, described conduit is formed, the funnel-form that is connected near position of the open end of the side central authorities of the described shell of the described Width of described circuit substrate and the described shell.
And then, also comprising covering, it is according to the width dimensions of described circuit substrate, covers to carry out width by described a pair of board carrying guide rail and transfer the described by the gap of open face of narrow mobile generation, described shell.
Described covering, one end is fixed in the incorporating section that any one party side in described base plate cleaning device and described substrate transfer apparatus is installed, can be made of the parts that block that can be accommodated in described incorporating section, the described other end that blocks parts is installed on the side of the opposing party arbitrarily in described base plate cleaning device and the described substrate transfer apparatus.
In any above-mentioned base plate cleaning device, also comprise the effect plate, the one end is installed on described shell or described conduit, can contact with the described peripheral part of described rotating brush as the free-ended other end.
Described effect plate strokes the described foreign matter that falls to being attached to described rotating brush, and form will fly out by described rotating brush described foreign matter guiding to described conduit.
The mode of other that the present invention relates to comprises about a kind of substrate transfer apparatus: a pair of board carrying guide rail, and it is opposed mutually, can be from the Width of sandwich circuit substrate; A pair of conveyer belt, it lays respectively in the described a pair of board carrying guide rail, can carry described circuit substrate to the board carrying direction along described a pair of board carrying guide rail; With any one above-mentioned base plate cleaning device, it can remove the foreign matter in the surface attachment of the described circuit substrate that is handled upside down to described board carrying direction.
According to the present invention, because with respect to described rotating brush, respectively in the upstream side and the downstream of the described board carrying direction of described shell, be provided with the stationary brush that the whole width on the described surface that can stride across described circuit substrate contacts, therefore can stop up gap between the surface of described shell and described circuit substrate by described stationary brush.Thereby can reduce the leakage of the negative pressure air of described suction device significantly, the efficient of foreign matter of therefore removing circuit substrate is higher than prior art.And its result can improve the quality of circuit substrate, and then can improve the quality of the electronic equipment that uses this circuit substrate.
Description of drawings
These and other purpose of the present invention and feature can be clear and definite from the relevant record to preferred implementation below in conjunction with accompanying drawing.In these accompanying drawings,
Fig. 1 is the side cut away view of the base plate cleaning device of the execution mode that the present invention relates to of expression;
Fig. 2 is the vertical view of substrate transfer apparatus that expression is equipped with the base plate cleaning device of other execution mode that the present invention relates to;
Fig. 3 is the side view of the rotating brush of expression base plate cleaning device shown in Figure 2;
Fig. 4 A is illustrated in the substrate transfer apparatus of the base plate cleaning device that the another execution mode that the present invention relates to is installed, from the side view of the state of the surface removal foreign matter of the wide circuit substrate of width;
Fig. 4 B is illustrated in the substrate transfer apparatus of the base plate cleaning device that the another execution mode that the present invention relates to is installed, from the state side view of the surface removal foreign matter of the narrow circuit substrate of width;
Fig. 5 A is the stereogram that the summary of the base plate cleaning device of prior art and substrate transfer apparatus is adopted in expression;
Fig. 5 B is the side cut away view of the summary of the expression base plate cleaning device that adopts prior art.
Embodiment
With reference to accompanying drawing, the base plate cleaning device that the 1st execution mode of the present invention is related to describes.Fig. 1 represents to cut off along the board carrying direction S (XZ plane) of circuit substrate 1 profile of the base plate cleaning device 10 that the 1st execution mode relates to.Among Fig. 1, base plate cleaning device 10 comprises: shell 11; Be arranged at the rotating brush 12 in the shell 11; The motor 53 of rotatable driving rotating brush 12; Be arranged at the upstream side of shell 11 of board carrying direction S and a pair of stationary brush 13 (13a, 13b) in downstream respectively; Be connected, in shell 11, import negative pressure air attracts the foreign matter that swims in shell 11 conduit 14 with negative pressure feeding source 60.Describe in detail in the 2nd execution mode of back about conduit 14.Here, " importing negative pressure air " be meant, the air that attracts in the shells 11 by conduit 14 reduces pressure in the shell 11 with this.
When the base plate cleaning device 10 that constitutes as described above moves, with respect to quilt is to the surperficial 1t of the circuit substrate 1 of board carrying direction S carrying by a pair of board carrying guide rail 2a, 2b (with reference to Fig. 2 or Fig. 5 A), rotating brush 12 is to the surperficial 1t of the rotation of the direction shown in arrow A brush circuit substrate 1.By this brush, the foreign matter of surperficial 1t that is attached to circuit substrate 1 is from the fly out attraction mouth 14a side (right side of Fig. 1) of conduit 14 of the surperficial 1t of circuit substrate 1.With conduit 14 that negative pressure feeding source 60 is connected in act on attraction, fly out and the foreign matter in shell 11 of swimming from the surperficial 1t of circuit substrate 1 by rotating brush 12, effect by negative pressure air attracted in the conduit 14 as shown by arrow B like that, removes in shell 11 thus.
Be arranged at a pair of stationary brush 13a, the 13b of the base plate cleaning device 10 that the 1st execution mode relates to, outside the action effect of removing above-mentioned described foreign matter, the performance action effect that appends as described below also.
At first, can be clear and definite from Fig. 1, two stationary brush 13a, 13b stop up the gap g of shell 11 and the surperficial 1t of circuit substrate 1, by surrounding the leakage that shell 11 prevents negative pressure air with circuit substrate 1, thus the reduction of the cleaning efficiency of preventing (removing the efficient of foreign matter).
And then, make the foreign matter that flies out from the surperficial 1t of circuit substrate 1 by rotating brush 12 not fall into gap (gap g) between shell 11 and the circuit substrate 1 at the stationary brush 13a of the upstream side of board carrying direction S, but stay the inside of shell 11, thereby import to as shown by arrow B, the inside of conduit 14.Therefore, two stationary brush 13a, 13b are preferably use the material of structure closely as far as possible.
Then, when cleaning the narrow circuit substrate 1b (with reference to Fig. 5 A) of (removal foreign matter) width, because two stationary brush 13a, 13b have flexibility, therefore, also can not interfere the width of board carrying guide rail 2 to transfer narrow moving even the board carrying guide rail 2a of any side carries out width to the Y direction and transfers narrow moving.Thus, even have two stationary brush 13a, 13b, size according to the width dimensions (length of Width) of circuit substrate 1, the board carrying guide rail 2a of one side also is movable to any position of Width (Y direction), and no matter the width dimensions of circuit substrate 1 how, two stationary brush 13a, 13b contact with the whole width (total length of Width) of the surperficial 1t of circuit substrate 1, thereby stop up the gap g between shell 11 and the circuit substrate 1 all the time effectively.
In addition, the width of in this case a pair of board carrying guide rail 2a, 2b is transferred in narrow the moving, except the situation that any one party moves with respect to the opposing party, and the situation that also exists both sides relatively to move.Each stationary brush 13a, 13b of the 1st execution mode can not hinder the motion of a pair of board carrying guide rail 2a, 2b under these any situations.
And then, be installed on the stationary brush 13a of upstream side with respect to the board carrying direction S of circuit substrate 1, shown in the angle θ of Fig. 1, preferably to install along the angle that board carrying direction S tilts from direction (Z direction) perpendicular to the surperficial 1t of circuit substrate 1.In other words, the stationary brush 13a of upstream side is according to tilting in the mode near the surperficial 1t of circuit substrate 1 towards the downstream of board carrying direction S, is installed on the bottom of face of upstream side of the board carrying direction S of shell 11.Thus, can obtain two effects.
An effect is: because this inclination is the rolling tangential direction along rotating brush 12, therefore the foreign matter that flies out from the surperficial 1t of circuit substrate 1 by rotating brush 12 is attracted in the conduit 14 swimmingly along negative pressure air stream easily, thereby described foreign matter can not be stacked into the corner portion in the shell 11 etc.And, by described inclination, can be with negative pressure air stream by rotating brush 12 guiding catheter 14 successfully, thus described foreign matter can not leak and fall from gap g.
Other effect that tilts to obtain by the stationary brush 13a that makes upstream side is that the carrying of circuit substrate 1 is carried out smoothly.Circuit substrate 1 is loaded on a pair of conveyer belt 71a, the 71b (with reference to Fig. 2) of the configuration of the inboard of each board carrying guide rail 2a, 2b, is carried along substrate transferring direction S by driving the motor 72 that is connected with a pair of conveyer belt 71a, 71b.And, when the circuit substrate 1 that substrate transferring direction S advances is moved in the shell 11, abut to stationary brush 13a by the carrying of a pair of conveyer belt 71a, 71b.At this moment, if the resistance of stationary brush 13a strong (flexibility is weak), the danger that then exists the carrying meeting of circuit substrate 1 to stop in the front of stationary brush 13a (upstream side of substrate transferring direction S).Under this situation, be used for the propulsive force of circuit substrate 1 to substrate transferring direction S carrying, depend on circuit substrate 1 self weight and the corresponding frictional force of coefficient of friction between circuit substrate 1 and a pair of conveyer belt 71a, the 71b.
As shown in Figure 1, by the stationary brush 13a of upstream side is tilted according to the mode of bottom towards the downstream of board carrying direction S of the stationary brush 13a of upstream side, circuit substrate 1 enters into the downside of the stationary brush 13a of upstream side easily thus.And, if in case circuit substrate 1 is positioned at the stationary brush 13a downside of upstream side, then pass through the downward propulsive force effect of stationary brush 13a towards the Z direction, thereby be pressed against below the circuit substrate 1 on a pair of conveyer belt 71a, the 71b, that the result can guarantee is stronger (between circuit substrate 1 and a pair of conveyer belt 71a, the 71b) frictional force, can guarantee to carry propulsive force.Thus, can produce the effect of avoiding the unfavorable condition that circuit substrate 1 stops in the front of stationary brush 13a, and can realize carrying circuit substrate 1 reliably by a pair of conveyer belt 71a, 71b.The tilt angle theta that is positioned at the stationary brush 13a of upstream side is 45 °<θ<90 °, is preferably about 60 °.
In addition, be positioned at another the stationary brush 13b in the downstream of board carrying direction S, be configured to almost vertically, extend in the Z direction in other words with respect to the surperficial 1t of circuit substrate 1.This be because the downward thrust by bringing towards the Z direction by the stationary brush 13a that is positioned at upstream side, with the downward thrust of bringing by rotating brush 12 towards the Z direction, thereby the carrying propulsive force to substrate transferring direction S of a pair of conveyer belt 71a, 71b can be sent to circuit substrate 1 fully, even so when circuit substrate 1 abuts to the stationary brush 13b that is positioned at the downstream, the also danger that does not stop in the front of stationary brush 13b (upstream side of board carrying direction S).Otherwise, if the fixed part 13b in downstream is tilted to board carrying direction S, then can produce gas accumulation, may become the reason that reduces cleaning performance.But, can make its inclination as required.
As the further action effect that each stationary brush 13a, 13b are set, because each stationary brush 13a, 13b contact with the circuit substrate 1 that is handled upside down, therefore by form at least any one party among each stationary brush 13a, 13b by conductive material, can will put aside in the static of circuit substrate 1 by stationary brush 13a and/or 13b and remove to equipment side (base plate cleaning device 10 sides).As the brush that forms by conductive material, known have a material that for example contains the powder of copper in brush, more specifically is commodity or the toray (East レ of the thunderon by name (サ Application ダ one ロ Application) (registered trade mark) that can use Japanese silkworm wool dyeing Co., Ltd.) commodity of the モ ノ エ イ ト by name of Co., Ltd. etc.By circuit substrate 1 is removed static, can get rid of the foreign matter that the influence by static causes and be attached to the surperficial 1t of circuit substrate 1, thereby can improve cleaning performance.
And then, in the 1st execution mode,, be provided with from the upside of the attraction mouth 14a of conduit shown in Figure 1 14 and begin to extend the effect plate (effector plate) 16 that contacts with the peripheral part 12b of rotating brush 12 as option (option).This effect plate 16 has two functions.A function is: by contact, stroke the foreign matter that falls to lodging in rotating brush 12 self, the effect of the brush effect of performance raising rotating brush 12 with the peripheral part 12b of rotating brush 12 in the rotation.Stroking the foreign matter that falls by effect plate 16 can be attracted effectively by the attraction mouth 14a at the conduit 14 of the downside configuration of effect plate 16.
The other function of effect plate 16 is: the tops that negative pressure air stream can not move in the shell 11 disperse, and the peripheral part 12b of rotating brush 12 guides the negative pressure air in negative pressure feeding source 60 swimmingly from the direction of the active position conductive pipe 14 that contacts with circuit substrate 1.Thus, can prevent that the top that the foreign matter that is flown out from the surperficial 1t of circuit substrate 1 by rotating brush 12 is involved in the shell 11 from being circulated once more, as shown by arrow B, can be attracted to effectively in the conduit 14.In the example of Fig. 1, effect plate 16 is installed together with shell 11 and conduit 14, but any one party that is installed to shell 11 or conduit 14 all can.
The base plate cleaning device 10 that relates to according to the 1st execution mode, owing to the gap g between the surperficial 1t that stops up shell 11 and circuit substrate 1 with the simple structure that a pair of stationary brush 13a, 13b are installed, so base plate cleaning device 10 also can be easily mounted in existing processing unit (plant) or the Handling device.And, but because each stationary brush 13a, 13b are constituted the whole width of the surperficial 1t of contact circuit substrate 1, so can tackle the circuit substrate (for example circuit substrate 1a, 1b) of various width dimensions on an equal basis.
Below, describe with reference to the base plate cleaning device 20 of accompanying drawing the 2nd execution mode that the present invention relates to.In the 2nd execution mode, wish to improve conduit and rotating brush, thereby realize further improving the effect that attracts foreign matter.Also shown in Fig. 5 A, conduit 54 of the prior art is arranged with two or morely at the length direction of shell 51, be set to vertically extend from shell 51.As mentioned above, this is because more from the leakage of the negative pressure air of the gap g between the lower end of circuit substrate 1 and shell 51 (with reference to Fig. 5 B), thereby consider to be provided with a plurality of attractions mouths, so that can in the whole Width of circuit substrate 1, near rotating brush 52, attract.But the configuration of this a plurality of conduits 54 can make the negative pressure air flow point loose, and has the tendency that weakens attraction on the contrary.And conduit 54 directly is arranged at the result on the shell 51, has the tendency of accumulating the foreign matter that swims easily in the installation corner portions located (coupling part) etc. of shell 51 and conduit 54.
Fig. 2 represents to be equipped with the substrate transfer apparatus 70 of the base plate cleaning device 20 that the 2nd execution mode relates to, and is the vertical view of observing the base plate cleaning device 20 that strides across a pair of board carrying guide rail 2a, 2b configuration from the top.As shown in Figure 2, the conduit 14 that the 2nd execution mode relates to forms funnel-form, and it will attract the position to concentrate on a near position of central authorities of the Y direction of shell 11.Flexible pipe 56 is connected in conduit 14, and then is connected in negative pressure feeding source 60.By conduit 14 is formed funnel-form from shell 11, smooth and easy thereby the negative pressure air rheology gets, the described corner portion that accumulates foreign matter easily becomes a position, and foreign matter concentrates on a described position and reclaims easily.
Among the Fig. 1 that in described the 1st execution mode, illustrates, represent the side section of the conduit 14 that the 2nd execution mode relates to.Among Fig. 1, the attraction mouth 14a of the conduit 14 of the 2nd execution mode, the A/F of Z direction of a side that is connected in shell 11 is narrower, draws the gas that flows into thus in, thereby produces the effect that the attraction speed of negative pressure air is improved this degree.The test of carrying out according to the real desire inventors, under base plate cleaning device of the prior art 50 situation relatively shown in Fig. 5 A, the flow velocity 0.42m/ second of the gas during with respect to the negative pressure air attraction of the conduit 54 of the state that uses identical hair-dryer prior art down, when the conduit 14 that the 2nd execution mode shown in Figure 1 relates to is 1.57m/ second, thereby increased substantially flow velocity as can be known, thereby increased substantially the attraction when attracting foreign matter.
The conduit 14 that the 2nd execution mode relates to is used in combination more effective with the base plate cleaning device that disposes each stationary brush 13a, 13b 10 that illustrates in described the 1st execution mode as shown in Figure 1.That is, in the prior art, owing to do not have stationary brush 13a, 13b, the leakage of negative pressure air is many, and therefore consideration is provided with conduit 54 in many places, thereby attracts foreign matters in a plurality of positions near rotating brush 52 as far as possible.To this, in the base plate cleaning device 20 of the 2nd execution mode,, suppress negative pressure air and leak by disposing the stationary brush 13 shown in described the 1st execution mode, even its structure will attract a mouthful 14a to be made as a position, also can be easily the whole width of circuit substrate 1 be applied attraction.
Below, Fig. 3 represents the rotating brush 22 that uses in the base plate cleaning device 20 that the 2nd execution mode relates to.Fig. 3 is a side view of base plate cleaning device 20 being observed upstream side from the downstream of the board carrying direction S of circuit substrate 1, and coloured part is represented the brush part of rotating brush 22.As shown in Figure 3, the rotating brush 22 that uses in the 2nd execution mode is divided into left and right sides two parts at the axial approximate center position 22c of axle 22a, and establishes the contrary volume of the hand of spiral of two-part brush.The described hand of spiral constitutes: when rotating brush 22 rotates by the driving of motor 53, the direction of advance of spiral respectively from about towards middle position 22c, at middle position 22c in conjunction with (connection).Near the middle position 22c of rotating brush 22, the attraction mouth 14a of conduit 14 is set.
When the rotating brush 22 that constitutes as described above moves, the foreign matter of surperficial 1t that is attached to circuit substrate 1 when the surperficial 1t of circuit substrate 1 flies out, produces near towards the axial middle position 22c of rotating brush 22 vector at foreign matter by the peripheral part 22b of this rotating brush 22.At this moment, because the attraction mouth 14a of funnelform conduit 14 is positioned near the middle position 22c, therefore near the foreign matter middle position 22c by the rotation of rotating brush 22 can attract effectively through conduit 14.This attraction effect ratio use illustrated hand of spiral in described the 1st execution mode is that the rotating brush 12 of a direction is bigger.
Then, with reference to accompanying drawing, the base plate cleaning device 30 of the 3rd execution mode that the present invention relates to is described.In the prior art, during the narrow circuit substrate 1b of cleaning width, as mentioned above, the board carrying guide rail 2a by a side carries out width and transfers narrow moving, and brings the problem that produces the gap below base plate cleaning device.In the 3rd execution mode, the technology that intention is addressed this problem is as object.
Fig. 4 A is a side view of the substrate transfer apparatus 70 that the base plate cleaning device 30 that the 3rd execution mode relates to is installed being observed upstream side from the downstream of the board carrying direction S of circuit substrate 1.Circuit substrate 1a width shown in Fig. 4 A is wide, and the two ends of the Width of circuit substrate 1a are by opposed a pair of board carrying guide rail 2a, 2b clamping, thereby quilt is along the direction carrying perpendicular to paper.The circuit substrate 1a wide to this width, circuit substrate 1a by base plate cleaning device 30 below the time, cover by circuit substrate 1a at whole width owing to be positioned at the open portion of the below of base plate cleaning device 30, therefore can not produce the problem that negative pressure air leaks.
To this, shown in Fig. 4 B, if narrow circuit substrate (for example, having the circuit substrate of half width dimensions of the wide circuit substrate 1a of the width) 1b of width is as object, then the board carrying guide rail 2a of a side carries out width to the board carrying guide rail 2b of opposite side such as Y direction and transfers narrow moving.Therefore, circuit substrate 1b can only cover the part of the open portion of the below that is positioned at base plate cleaning device 30.In the 3rd execution mode, tackle this situation, be provided as the remainder (the not part that covers by circuit substrate 1b) of below of obducent shutter (shutter panel) the 31 covered substrate cleaning devices 30 of described open portion, thereby reduce the leakage of negative pressure air significantly.Be fixed in width as shutter 31, one ends that block parts one example and transfer narrow board carrying guide rail 2a, the other end is fixed in as in the curled portion 32 of an example of incorporating section and be wound.Curled portion 32 for example applies crimp force and keeps shutter 31 as the coiled-type tape measure.
The wide circuit substrate 1a of width shown in Fig. 4 A is during as object, and shutter 31 almost all is accommodated in the curled portion 32.Then, when switching to the narrow circuit substrate 1b of width shown in Fig. 4 B, along with board carrying guide rail 2a is mobile like that shown in arrow Y, the shutter 31 that one end is fixed in board carrying guide rail 2a is drawn out gradually, shown in Fig. 4 B, with the open portion of the below of curtain shape covered substrate cleaning device 30.
Otherwise, switch to the state shown in Fig. 4 A from the state shown in Fig. 4 B, promptly when the narrow circuit substrate 1b of width switches to the wide circuit substrate 1a of width, board carrying guide rail 2a moves to the direction opposite with arrow Y, accompany therewith, shutter 31 is wound by the crimp force of the inside of curled portion 32.Shutter 31 for example is the canvas (canvas cloth) that suppresses aeration, maybe can be the metallic alloy as the coiled-type tape measure.Under any situation, above-mentioned coiled structure generally all is known.
The base plate cleaning device 30 that the 3rd execution mode relates to for example can be used in combination by the base plate cleaning device that relates to described the 2nd execution mode and obtain better effect.Promptly, because the gap that when the narrow circuit substrate 1b of carrying width, below device, produces broad, therefore if make near an only position opening the middle position 22c of rotating shaft 22 of conduit 14, then when being positioned at described gap, attract the effect of foreign matter to weaken at this open end (attracting a mouthful 14a).If the shutter 31 that uses the 3rd execution mode to relate to, even can not leak at the position negative pressure air that does not have circuit substrate 1 yet, shown in the 2nd execution mode, even near the middle position 22c of rotating brush 22, only make the conduit 14 of the form of a position opening, also can apply sufficient sucking action to the circuit substrate 1 of various width dimensions.And, draw in by the aperture area that will become the attraction mouth 14a of the conduit 14 of a position only, thereby improve the flow velocity of negative pressure air, and then can obtain to improve effect such as attraction.
In addition, in the example shown in Fig. 4 A and Fig. 4 B, rotating brush 22 becomes the hand of spiral shown in the 2nd execution mode as described in central authorities separately and the form of mutually reciprocal volume, but be not limited thereto in the 3rd execution mode, also can use the hand of spiral of the 1st execution mode explanation as described is the rotating brush 12 of a direction.And, in the example shown in Fig. 4 A and Fig. 4 B, fixedly the curled portion 32 of the other end of shutter 31 is disposed at base plate cleaning device 30 sides, but also curled portion 32 can be disposed at board carrying guide rail 2 sides, and an end of shutter 31 is fixed to base plate cleaning device 30 1 sides.A pair of board carrying guide rail 2a, 2b are and carry out width mutually and transfer under the situation of narrow mobile form, dispose shutter 31 on the two respectively.
More than, the base plate cleaning device of each execution mode that the present invention relates to is narrated, but the content shown in each execution mode can distinguish separately and use, maybe can be by these combination in any are used.By making up the effect that can obtain the attraction foreign matter better than the situation of independent utilization, this also has embodiment in above-mentioned illustration.
And then the present invention also comprises the substrate transfer apparatus 70 (with reference to Fig. 2) that possesses base plate cleaning device 10,20 or 30.This substrate transfer apparatus 70, by opposed a pair of board carrying guide rail 2a, 2b sandwich circuit substrate 1 from Width, and the both ends of circuit substrate 1 are loaded into each conveyer belt 71a, the 71b that is positioned at each board carrying guide rail 2a, the 2b that are U word shape cross section, the motor 72 that is connected in each conveyer belt 71a, 71b is driven, circuit substrate 1 is carried to board carrying direction S.Base plate cleaning device 10,20 or 30, across direction (Y direction) perpendicular to the board carrying direction S of this circuit substrate 1, the board carrying guide rail 2a of one side is installed as and can carries out width to the board carrying guide rail 2b of opposite side and transfer narrow moving, and removes the foreign matter of the surperficial 1t that is attached to the circuit substrate 1 that is handled upside down with this.
Base plate cleaning device that the present invention relates to and substrate transfer apparatus can be at carrying circuit substrates and at the surface printing cohesive material, or the manufacturing field of carrying out the circuit substrate that parts install is extensive use of.
The present invention is with reference to accompanying drawing and in conjunction with preferred embodiment having carried out sufficient record, and is all apparent in view to various distortion of these people that are skilled in technique or correction.Be construed as: described distortion or only revise otherwise the scope of the present invention that exceeds based on technical scheme just is contained in wherein.
Claims (8)
1. base plate cleaning device comprises:
The shell of case shape, this shell and surperficial opposed one side open circuit substrate, described circuit substrate is handled upside down by the mutual opposed a pair of board carrying guide rail clamping of substrate transfer apparatus and to the board carrying direction, and this shell extends to the Width of the described circuit substrate vertical with described carrying direction;
Rotating brush, it is arranged in the described shell, and the axle that can extend with the described Width that is configured at described circuit substrate is that the center is rotated;
Motor, its rotation drives described rotating brush;
Conduit, it is connected with described shell is interior, can attract the air in the described shell; With
Stationary brush, it is disposed at the upstream side and the downstream of the described board carrying direction of described shell respectively with respect to described rotating brush, and the whole width that can stride across the described surface of described circuit substrate contacts,
Under the described surperficial state of contact of any one and described circuit substrate of the described stationary brush that is disposed at described upstream side and described downstream, by attract the air in the described shell by described conduit, make described rotating brush rotation by described motor simultaneously, thereby can remove foreign matter in the described surface attachment of the described circuit substrate that is handled upside down to described board carrying direction.
2. base plate cleaning device according to claim 1, wherein,
Be disposed at the described stationary brush of described upstream side, tilt according to the mode of end towards the downstream of described board carrying direction of described stationary brush.
3. base plate cleaning device according to claim 1, wherein,
Described stationary brush is formed by electric conducting material, removes the static of described circuit substrate by described stationary brush.
4. base plate cleaning device according to claim 1, wherein,
Described rotating brush is formed by near two rifle brushes combination, mutually reciprocal volume the central authorities of described Width,
Described conduit is formed, the funnel-form that is connected near position of the open end of the side central authorities of the described shell of the described Width of described circuit substrate and the shell.
5. base plate cleaning device according to claim 1, wherein,
Also comprise covering, it is according to the width dimensions of described circuit substrate, cover by described a pair of board carrying guide rail carry out width transfer narrow move produced, described shell described by the gap of open face.
6. base plate cleaning device according to claim 5, wherein,
Described covering one end is fixed in the incorporating section that any one party side in described base plate cleaning device and described board carrying guide rail is installed, and this covering is made of the parts that block that can be accommodated in described incorporating section,
The described other end that blocks parts is installed on any the opposing party's side in described base plate cleaning device and the described board carrying guide rail.
7. base plate cleaning device according to claim 1, wherein,
Also comprise the effect plate, the one end is installed on described shell or described conduit, can contact with the peripheral part of described rotating brush as the free-ended other end,
Described effect plate strokes the described foreign matter that falls to being attached to described rotating brush, and forms the described foreign matter that will be flown out by described rotating brush to described catheter guidance.
8. substrate transfer apparatus comprises:
A pair of board carrying guide rail, it is opposed mutually, can be from the Width of sandwich circuit substrate;
A pair of conveyer belt, it lays respectively in the described a pair of board carrying guide rail, can carry described circuit substrate to the board carrying direction along described a pair of board carrying guide rail; With
The described base plate cleaning device of claim 1, it can remove the foreign matter in the surface attachment of the described circuit substrate that is handled upside down to described board carrying direction.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005208167 | 2005-07-19 | ||
JP2005208167A JP4680704B2 (en) | 2005-07-19 | 2005-07-19 | Substrate cleaning device and substrate transfer device |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1901780A true CN1901780A (en) | 2007-01-24 |
CN100571487C CN100571487C (en) | 2009-12-16 |
Family
ID=37657464
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200610105669.2A Active CN100571487C (en) | 2005-07-19 | 2006-07-17 | Base plate cleaning device and substrate transfer apparatus |
Country Status (3)
Country | Link |
---|---|
US (1) | US8042221B2 (en) |
JP (1) | JP4680704B2 (en) |
CN (1) | CN100571487C (en) |
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-
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Also Published As
Publication number | Publication date |
---|---|
JP4680704B2 (en) | 2011-05-11 |
JP2007027457A (en) | 2007-02-01 |
CN100571487C (en) | 2009-12-16 |
US8042221B2 (en) | 2011-10-25 |
US20070017088A1 (en) | 2007-01-25 |
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