CN1862296A - Micro-integrated narrow-band filter array and preparing method thereof - Google Patents
Micro-integrated narrow-band filter array and preparing method thereof Download PDFInfo
- Publication number
- CN1862296A CN1862296A CN 200610027388 CN200610027388A CN1862296A CN 1862296 A CN1862296 A CN 1862296A CN 200610027388 CN200610027388 CN 200610027388 CN 200610027388 A CN200610027388 A CN 200610027388A CN 1862296 A CN1862296 A CN 1862296A
- Authority
- CN
- China
- Prior art keywords
- passage
- filter
- narrow
- coated
- micro
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 19
- 229910052751 metal Inorganic materials 0.000 claims abstract description 25
- 239000002184 metal Substances 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 238000002360 preparation method Methods 0.000 claims abstract description 13
- 230000003287 optical effect Effects 0.000 claims description 30
- 238000013461 design Methods 0.000 claims description 9
- 238000001259 photo etching Methods 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 claims description 3
- 230000007797 corrosion Effects 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000005253 cladding Methods 0.000 claims description 2
- 238000007747 plating Methods 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 238000001914 filtration Methods 0.000 abstract description 5
- 239000010408 film Substances 0.000 description 34
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 238000001228 spectrum Methods 0.000 description 7
- 229910002625 H-Nb2O5 Inorganic materials 0.000 description 6
- 238000003491 array Methods 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 230000003595 spectral effect Effects 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 238000005389 semiconductor device fabrication Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000035800 maturation Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Images
Landscapes
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Optical Filters (AREA)
Abstract
The present invention discloses a micro type integrated narrow-band filter array and its preparation method. Said filter array includes the following several portions: a substrate, on one side surface of said substrate several channel micro type narrow-band light-filtering film layers are firmly combined, on its another side surface a common section subpeak film layer is coated. It is characterized by that between every two channel micro type narrow-band light-filtering film layers a space layer is set, in the space layer interior a light-proof metal layer capable of preventing light crosstalk is set. Besides, said invention also provides the concrete steps of its preparation method.
Description
Technical field
The present invention relates to optical thin film and optical filter, specifically be meant a kind of multi-channel miniature integrated narrow-band filter array that is used for focal plane device.
Background technology
Along with the development of focus planardetector, for the miniaturization and the modularization of instrument provides the foundation.In order to access more information, just need hyperchannel to survey.The method that obtains the hyperchannel detection is a lot, grating beam splitting, optical filter beam split, prismatic decomposition etc. are arranged, and the combination of multi-channel filter array and detector array can be simplified optical system greatly, reduces the volume and weight of instrument.So the research of micro-integrated narrow-band filter array is significant to the development of spacer remote sensing technology.Optical film technique has had the development of advancing by leaps and bounds in recent years, maturation from technology such as the means of plated film such as electron gun, ion gun, magnetron sputterings, to enriching constantly of monitoring means, the reliability and stability of plated film have very big development, control accuracy also improves a lot, can access very desirable optical filter, the condition of development micro-integrated narrow-band filter array is ripe.Filter arrays and detector array are combined into an assembly, as hyperchannel focus planardetector array, can significantly reduce the volume and weight of optical system, the instrument that the space is used has very important significance.Simultaneously, because detector and optical filter become an assembly, can make the detection system modularization, miniaturization improves the dirigibility of satellite system and the service efficiency of useful load.
The implementation of integrated optical filter mainly contains following several at present:
1. glue together integrated
After the narrow band pass filter of each passage prepared with the method for optical coating PVD respectively, after the size that cuts into requirement, the narrow band pass filter that these is had different spectrum channels on public supporting spring is glued together, this mode does not have specific (special) requirements to being coated with of narrow band pass filter, but the difficulty of combination is bigger, and being difficult to precise combination is one.The optical filter size limits to some extent, is difficult to do very for a short time, is unfavorable for miniaturization and integrated.And interchannel string is bigger to the optical transfer function influence around bigger.
2. tunable optical filter
This relatively simple for structure, how to carry out the design of narrow band pass filter with the structure of F-P interferometer type, by modes such as electricity, sound, heat the thickness or the refractive index of resonant cavity layer in the structure are controlled, thereby reached the effect that wavelength is selected.This filter sheet structure can be done very for a short time, but control corresponding mechanism more complicated, and tunable scope is very narrow, generally has only about 30nm, and this mode can not be obtained the spectral information of different wave length simultaneously.
3. integrated narrow-band filter
This optical filter is based on the F-P principle of interference, on diverse location, obtain the thickness of different resonator cavity retes by semiconductor etching process, reach the logical centre wavelength of band of control narrow band pass filter, thereby realize that different transmission peak wavelength narrow band pass filters are integrated on the same substrate.The channel wavelength scope of this optical filter is very little, only is fit to the preparation of very little spectral range optical filter, and form factor difference and transmitance are low.The waveform that can not be applicable to wide spectral range requires the use of the high filter arrays of high permeability.
4, gradual filter array
A kind of micro-integrated narrow-band filter of quick detection different-waveband simultaneously.It adopts the shield mode, utilizes vacuum coating to be made.Only see through the spectrum of shortwave wavelength at an end of substrate, the other end only sees through the spectrum of long wave wavelength; Only see through the spectrum of a kind of specific wavelength in two sections wavelength coverages in the centre of substrate, spectral resolution reaches 0.2 μ m, and the optical wavelength that is seen through corresponding with it through the position from substrate one end to other end linear change.Its shortcoming is that spectrum is continuous, can not obtain the spectrum of appointment at assigned address, and the spectrum property of single passage and transmitance are because linear gradient and variation.
5. miniature integrated filtering chip arrays
A kind of optical filter integration mode that application prospect is arranged most, it is the mask partition method that adopts the subregion of semiconductor device fabrication process and basic PVD method be combined into to be coated with, the optical filter that will have different spectral characteristics can be integrated on the same substrate, and can accomplish micron dimension as required.See " Zhang Fengshan is permitted buyun for Cheng Shiping, Yan Yixun, Zhu Cuiyuan, infrared and millimeter wave journal " 13,401 (1994); Cheng Shiping, Zhang Fengshan, Yan Yixun, infrared and millimeter wave journal " 13,110 (1994) ".Because this integrated approach processing step complexity, passage of every increase, the yield rate of optical filter will drop by half, and the optical filter of each passage is very small, is difficult in the preparation process single channel optical filter is measured, thereby make screening.Also there is cross-talk between present in addition each passage of this integration mode.
Summary of the invention
Based on the variety of problems that above-mentioned existing various integrated filtering chip arrays exist, the objective of the invention is to propose a kind of prevent cross-talk and micro-integrated narrow-band filter array of saving cost and preparation method thereof between each optical filter passage.
Micro-integrated narrow-band filter array of the present invention, comprise substrate 1, be equipped with a plurality of Channel Micro narrow-band-filter retes 2 with the substrate strong bonded in the one side of substrate, another side at substrate has been coated with public section secondary peak rete 3, it is characterized in that: have one between each Channel Micro narrow-band-filter rete at interval, be built-in with the lighttight metal level 4 that prevents optical crosstalk at interval, this metal level extends to the side of filter membranous layer in the interval, be that each passage filter membranous layer side all has metal level to coat, thoroughly solved the light string between each passage.
The preparation method of micro-integrated narrow-band filter array of the present invention utilizes the mask partition method of semiconductor device fabrication process and basic PVD method be combined into, and its concrete preparation method's step is as follows:
A. at first on substrate, utilize photoetching and coating process to be prepared as follow-up each passage and be coated with photoetching alignment mark 5 and the hyperchannel diaphragm 7 that film is a usefulness, port number requires to decide according to focus planardetector, this diaphragm is exactly the lighttight metal level that prevents optical crosstalk between each filter membranous layer of micro-integrated narrow-band filter, is the plated film window of single channel filter membranous layer between two metal wires;
B. utilize the cold plating mask of photoetching process, only stay first passage as the plated film window, and the measurement plated film window 6 of leaving correspondence on hyperchannel diaphragm next door, design according to first passage master film system, to the plated film window of first passage and measure the plated film window and carry out vacuum master film system simultaneously and be coated with, main film is after being coated with, and the single channel film system of measuring the formation of plated film window is measured, and sees whether it adheres to specification;
C. as adhering to specification, peel off passage outer mask and media coating by the method for chemical corrosion again, repeat the B step, obtain second passage narrow band pass filter.So repeated multiple times can obtain access desired and count array;
D. again by photoetching process at the cold metal cladding of interchannel, each passage rete side is coated with metal level;
E. at last be coated with public section secondary peak rete, finish the preparation of micro-integrated narrow-band filter array in the back side of substrate vacuum.
The advantage of micro-integrated narrow-band filter array of the present invention is:
1, interchannel has lighttight metal level to isolate and each passage rete side has metal level to coat, the string that can effectively eliminate interchannel light around, improve the transport function of optical system;
2, adopt metal mask, having solved photoresist effectively can not resistant to elevated temperatures problem, and distortion that mechanical mask brought and edge effect, has solved the problem that channel pattern becomes more meticulous;
3, adopt metal mask, effectively raise the consistance of substrate temperature, improved the homogeneity of plated film greatly;
4, mask adopts photoetching technique to make, and has improved the alignment precision of passage greatly;
5, the bandwidth of multi-channel filter and transmitance can both be well controlled, and wave band can be provided with as required;
6, be to be coated on the face with multichannel main film, public section secondary peak film system is coated on the another side of substrate, and the design that greatly reduces optical filter is coated with difficulty;
7, measure being provided with of plated film window and reduced cost, improved measuring accuracy, yield rate and efficient.
Figure of description
Fig. 1 is the cross-sectional view of seven channel filters.
Fig. 2 is the string metal diaphragm against sunshine of seven channel filters.
Seven seven channel filters and the corresponding measurement window of Fig. 3 on sheet, being coated with.
Fig. 4 is the measured curve of public section secondary peak film system of seven channel filters.
Fig. 5 (a) is the measured curve of first passage 412nm;
Fig. 5 (b) is the measured curve of second channel 443nm;
Fig. 5 (c) is the measured curve of third channel 470nm;
Fig. 5 (d) is the measured curve of four-way 490nm;
Fig. 5 (e) is the measured curve of five-way road 520nm;
Fig. 5 (f) is the measured curve of the 6th passage 550nm;
Fig. 5 (g) is the measured curve of the 7th passage 565nm.
Embodiment
Be example with visible light seven Channel Micro integrated filtering chip arrays below, in conjunction with the accompanying drawings the specific embodiment of the present invention elaborated.Table 1 is centre wavelength and the bandwidth and the transmitance designing requirement of seven channel filters, and from 400nm to 1100nm, the cut-off region transmitance is less than 1% by scope for secondary peak.Owing on a slice substrate, be coated with the narrow band pass filter of seven passages, difficulty is very big, the design of film system is with 600nm public section secondary peak film system of secondary peak employing to 1100nm, the scope of cutting secondary peak film system of each passage is reduced to 400-600nm greatly like this, reduces for the design of main peak film system and the difficulty that is coated with greatly.Film of the present invention is to design with regular film system, also can be the non-regular thin film design, generally adopts the non-regular thin film design, and thicknesses of layers can reduce, and improves the yield rate of plated film and the firmness of rete.
The non-regular thin film of seven passages is as follows:
First passage 412nm film system:
1.033L.879H.824L.824H.875L 2.211H 1.001L.99H.897L.97H 1.013L 1.07H 1.089L 1.846H1.215L.936H.773L.977H 1.121L 1.183H 1.219L 1.272H 1.296L 1.303H 1.257L 1.248H 1.275L1.67H 1.549L 1.22H 1.238L 1.316H 1.373L 1.506H 1.359L 1.495H 1.451L 1.51H 2.415Lλ＝412nm H-Nb
2O
5，L-SiO
2。
Second channel 443nm film system:
1L.964H.991L.976H 4.018L 1.004H 1.007L 1H.999L.989H 1.001L.999H 3.986L 1.011H1.01L 1.016H 1.006L 1.005H 1.001L.972H 3.977L 1.013H 1.027L 1.059H 1.05L 1.966H 1.087L1.435H 1.356L 1.44H 1.13L 1.299H 1.195L 1.487H 1.321L 1.454H 1.192L 1.492H 1.337L 1.312H1.114L 1.547H.562Lλ＝443nm H-Nb
2O
5，L-SiO
2。
Third channel 470nm film system:
.999L.974H.741L.396H.841L2.802H.834L.763H.88L.958H.862L.37H.679L.985H 1.032L1.003H 1.047L 1.016H 1.849L 1.101H 1.082L 1.028H 1.055L 1.139H 1.517L 1.303H 1.157L 1.131H1.158L 1.206H 1.271L 1.57H 1.173L 1.19H 1.059Lλ＝470nm H-Nb2O5，L-SiO
2。
Four-way 490nm film system:
1.052L 2.004H 2.057L 1.097H 1.393L 1.093H 1.27L 1.005H 1.523L 1.025H 1.303L 1.226H1.012L.979H 1.019L.98H 1.457L 1.107H.95L 1.909H.99L.871H1.004L.99H.969L.757H.809L.68H.915L.905H.938L.644H.496L 1.057H.843L 1.067H2.726L.22H.598L
λ＝490nm H-Nb2O5，L-SiO
2。
Five-way road 520nm film system:
1.24L 2.533H 1.296L 1.266H.958L 1.568H 1.365L.755H 1.451L 1.094H 1.012L 1.073H.99L1.031H 1.587L.735H.511L2.159H.964L 1.019H 1.175L1.219H.95L.954H.923L.888H.84L.683H.668L.727H.857L.885H.913L.911H.926L.931H.927L2.48H.732L.628H 1.962Lλ＝520nm H-Nb2O5，L-SiO
2。
The 6th passage 550nm film system:
2.112L.699H.664L.641H.749L.791H.831L.877H.842L.75H.81L.743H.802L.79H.815L.766H.824L.773H.874L 1.268H 3.1L.126H.748L.861H.958L 1.299H 1.002L.732H 1.676L 1.295H1.277L 1.15H.971L 1.237H 1.04L 1.288H 1.833L 2.482H 1.371L.799H 1.246L 1.269H 1.394L1.377H.775L 1.344H 1.146L 1.663H λ＝550nm H-Nb2O5，L-SiO
2。
The 7th passage 565nm film system:
918L 1.006H 1.067L.826H.671L 2.294H.995L.988H.99L.992H 1.006L 1.014H.978L.961H1.012L 2.101H.987L.848H.924L 1.041H.977L.946H.943L.997H 1.03L 2.174H.82L.507H.95L1.205H2.27L.591H.775L.794H.839L.792H.822L.642H.575L.499H.761L.813H.825L.761H.742L.625H.651L.635H.29L λ＝565nm H-Nb2O5，L-SiO
2。
Public section secondary peak film system:
1.214L 1.103H.989L 1.071H.891L 1.1H.795L 1.213H.493L 1.205H.83L 1.074H.859L1.034H.93L.972H 1.006L.921H 1.067L.976H 1.284L 1.406H 1.267L.968H 1.111L.978H 1.137L1.144H 1.377L 1.369H 1.93L 1.319H 1.384L 1.397H 1.478L 1.442H 1.494L 1.454H 1.465L 1.416H1.357L 1.14H.566L λ＝700nm，H-Nb2O5.L-SiO
2
Substrate adopts transparent quartz or K9 material in using wave band.
The lighttight metal that prevents optical crosstalk of indication can be a metal black chromium among the present invention, also can be other metal material, as long as can shading and corrosion-resistant.
The metal mask of indication is composited by three-layered metal film in the present embodiment, and ground floor is a metallic aluminium, and thickness is 0.5 micron, and the second layer is a metallic copper, and thickness is 1.0 microns, and the 3rd layer also is metal level aluminium, 0.5 micron of thickness.
On a big substrate, prepare the optical filter of six seven passages, the solid line among the performance measured curve of seven channel filters such as Fig. 5 (a-g) simultaneously by above-mentioned preparation process.As seen the inventive method has reached its intended purposes.
Table 1
| Channel number | Centre wavelength (nm) | Bandwidth (nm) | Transmitance (%) |
| 1 | 412 | 20 | 75 |
| 2 | 443 | 20 | 75 |
| 3 | 470 | 50 | 75 |
| 4 | 490 | 20 | 75 |
| 5 | 520 | 20 | 75 |
| 6 | 550 | 50 | 75 |
| 7 | 565 | 20 | 75 |
Claims (2)
1. a micro-integrated narrow-band filter array comprises substrate (1), is coated with a plurality of Channel Micro narrow-band-filter retes (2) with the substrate strong bonded in the one side of substrate, has been coated with public section secondary peak rete (3) at the another side of substrate, it is characterized in that:
Have one between each Channel Micro narrow-band-filter rete at interval, be built-in with the lighttight metal level (4) that prevents optical crosstalk at interval, this metal level extends to the side of filter membranous layer in the interval, and promptly each passage filter membranous layer side all has metal level to coat.
2. the preparation method of a micro-integrated narrow-band filter array is characterized in that concrete preparation process is as follows:
A. at first on substrate, utilize photoetching and coating process to be prepared as follow-up each passage and be coated with photoetching alignment mark that film is a usefulness (5) and hyperchannel diaphragm (7), port number requires to decide according to focus planardetector, this diaphragm is exactly the lighttight metal level that prevents optical crosstalk between each filter membranous layer of micro-integrated narrow-band filter, is the plated film window of single channel filter membranous layer between two metal wires;
B. utilize the cold plating mask of photoetching process, only stay first passage as the plated film window, and the measurement plated film window (6) of leaving correspondence on hyperchannel diaphragm next door, design according to first passage master film system, to the plated film window of first passage and measure the plated film window and carry out vacuum master film system simultaneously and be coated with, main film is after being coated with, and the single channel film system of measuring the formation of plated film window is measured, and sees whether it adheres to specification;
C. as adhering to specification, peel off passage outer mask and media coating by the method for chemical corrosion again, repeat the B step, obtain second passage narrow band pass filter.So repeated multiple times can obtain access desired and count array;
D. again by photoetching process at the cold metal cladding of interchannel, each passage rete side is coated with metal level;
E. at last be coated with public section secondary peak rete, finish the preparation of micro-integrated narrow-band filter array in the back side of substrate vacuum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200610027388XA CN100385268C (en) | 2006-06-08 | 2006-06-08 | Micro-integrated narrow-band filter array and preparing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200610027388XA CN100385268C (en) | 2006-06-08 | 2006-06-08 | Micro-integrated narrow-band filter array and preparing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1862296A true CN1862296A (en) | 2006-11-15 |
| CN100385268C CN100385268C (en) | 2008-04-30 |
Family
ID=37389763
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200610027388XA Expired - Fee Related CN100385268C (en) | 2006-06-08 | 2006-06-08 | Micro-integrated narrow-band filter array and preparing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100385268C (en) |
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102117842A (en) * | 2009-12-30 | 2011-07-06 | 上海欧菲尔光电技术有限公司 | Infrared focal plane detector packaging window and manufacturing method thereof |
| CN101694453B (en) * | 2009-09-29 | 2011-07-20 | 深圳市蓝韵实业有限公司 | Anti-crosstalk biochemistry analyzer detector device |
| CN103091759A (en) * | 2013-02-05 | 2013-05-08 | 李金宗 | Narrow-band interference filter |
| CN103105143A (en) * | 2013-01-29 | 2013-05-15 | 哈尔滨工业大学 | Differential motion confocal microscopic measurement device based on fluorescence excitation of surface to be detected |
| CN103116200A (en) * | 2013-02-05 | 2013-05-22 | 李金宗 | Adaptor system achieved based on narrow band interference filter and active marker |
| CN103154784A (en) * | 2010-07-01 | 2013-06-12 | 新港公司 | Optical demultiplexing system |
| CN104035177A (en) * | 2014-06-12 | 2014-09-10 | 中国科学院上海技术物理研究所 | Narrow-slit spliced assembly of multi-waveband filters applied at low temperature |
| CN104090320A (en) * | 2014-06-12 | 2014-10-08 | 中国科学院上海技术物理研究所 | Secondary spectrum elimination integrated optical filter for hyper-spectral imaging system |
| CN105334696A (en) * | 2015-12-15 | 2016-02-17 | 苏州晶鼎鑫光电科技有限公司 | Nanometer mask method for manufacturing integrated multi-channel optical filter |
| CN105467751A (en) * | 2015-12-15 | 2016-04-06 | 苏州晶鼎鑫光电科技有限公司 | Nano-mask manufacturing method for multi-channel filter |
| CN105954833A (en) * | 2016-06-24 | 2016-09-21 | 上海晶鼎光电科技有限公司 | Light splitting chip and preparation method thereof |
| CN107561665A (en) * | 2017-09-26 | 2018-01-09 | 中国科学院长春光学精密机械与物理研究所 | Integrated form optical filter splicing apparatus and method |
| CN107907935A (en) * | 2017-12-26 | 2018-04-13 | 苏州晶鼎鑫光电科技有限公司 | The optically isolated structure and its manufacture method of a kind of multichannel integrated optical filter |
| CN108007568A (en) * | 2017-12-19 | 2018-05-08 | 湖南宏动光电有限公司 | A kind of light spectrum image-forming type micro optical filter and preparation method thereof |
| CN108072924A (en) * | 2018-01-30 | 2018-05-25 | 苏州晶鼎鑫光电科技有限公司 | Diffuse isolation structure and its manufacturing method of multichannel integrated optical filter |
| CN108193171A (en) * | 2018-01-30 | 2018-06-22 | 苏州晶鼎鑫光电科技有限公司 | The manufacturing method of the optically isolated structure of multichannel integrated optical filter |
| CN108983329A (en) * | 2018-07-11 | 2018-12-11 | 无锡奥夫特光学技术有限公司 | Prepare the process of infrared optical window |
| CN109613561A (en) * | 2019-02-18 | 2019-04-12 | 合肥独领智能科技有限公司 | A kind of laser imaging system based on range of triangle |
| CN111337129A (en) * | 2020-03-17 | 2020-06-26 | 江苏芯欣光电科技有限公司 | Spectrum chip, chip packaging structure and manufacturing method |
| CN117991431A (en) * | 2024-04-03 | 2024-05-07 | 南京九川科学技术有限公司 | Filter device, imaging system and preparation method of filter device |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3124718B2 (en) * | 1995-03-31 | 2001-01-15 | キヤノン株式会社 | Method and apparatus for manufacturing color filter and method for reducing color unevenness in filter element row of color filter |
| CN2511984Y (en) * | 2001-12-29 | 2002-09-18 | 中国科学院上海技术物理研究所 | Long-wave length infrared wide-band filter |
| US7172842B2 (en) * | 2004-05-12 | 2007-02-06 | Chunghwa Picture Tubes, Ltd. | Color filter array plate and method of fabricating the same |
| US7349045B2 (en) * | 2004-11-24 | 2008-03-25 | Chunghwa Picture Tubes, Ltd. | Displacement-designed color filter structure and method of forming the same |
-
2006
- 2006-06-08 CN CNB200610027388XA patent/CN100385268C/en not_active Expired - Fee Related
Cited By (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101694453B (en) * | 2009-09-29 | 2011-07-20 | 深圳市蓝韵实业有限公司 | Anti-crosstalk biochemistry analyzer detector device |
| CN102117842A (en) * | 2009-12-30 | 2011-07-06 | 上海欧菲尔光电技术有限公司 | Infrared focal plane detector packaging window and manufacturing method thereof |
| CN107063454B (en) * | 2010-07-01 | 2019-04-09 | 新港公司 | Optical demultiplexing system |
| CN107543609A (en) * | 2010-07-01 | 2018-01-05 | 新港公司 | Optical demultiplexing system |
| CN103154784A (en) * | 2010-07-01 | 2013-06-12 | 新港公司 | Optical demultiplexing system |
| CN107063454A (en) * | 2010-07-01 | 2017-08-18 | 新港公司 | Optical demultiplexing system |
| CN103154784B (en) * | 2010-07-01 | 2016-11-16 | 新港公司 | Optical demultiplexing system |
| US9435958B2 (en) | 2010-07-01 | 2016-09-06 | Newport Corporation | Optical demultiplexing system |
| US9040914B2 (en) | 2010-07-01 | 2015-05-26 | Newport Corporation | Optical demultiplexing system |
| CN103105143B (en) * | 2013-01-29 | 2015-07-29 | 哈尔滨工业大学 | Based on the differential confocal micro-measurement apparatus of measured surface fluorescence excitation |
| CN103105143A (en) * | 2013-01-29 | 2013-05-15 | 哈尔滨工业大学 | Differential motion confocal microscopic measurement device based on fluorescence excitation of surface to be detected |
| CN103116200B (en) * | 2013-02-05 | 2013-10-02 | 哈尔滨工业大学 | Adaptor system achieved based on narrow band interference filter and active marker |
| CN103091759B (en) * | 2013-02-05 | 2013-09-11 | 哈尔滨工业大学 | Narrow-band interference filter |
| CN103116200A (en) * | 2013-02-05 | 2013-05-22 | 李金宗 | Adaptor system achieved based on narrow band interference filter and active marker |
| CN103091759A (en) * | 2013-02-05 | 2013-05-08 | 李金宗 | Narrow-band interference filter |
| CN104090320A (en) * | 2014-06-12 | 2014-10-08 | 中国科学院上海技术物理研究所 | Secondary spectrum elimination integrated optical filter for hyper-spectral imaging system |
| CN104035177A (en) * | 2014-06-12 | 2014-09-10 | 中国科学院上海技术物理研究所 | Narrow-slit spliced assembly of multi-waveband filters applied at low temperature |
| CN105334696A (en) * | 2015-12-15 | 2016-02-17 | 苏州晶鼎鑫光电科技有限公司 | Nanometer mask method for manufacturing integrated multi-channel optical filter |
| CN105467751A (en) * | 2015-12-15 | 2016-04-06 | 苏州晶鼎鑫光电科技有限公司 | Nano-mask manufacturing method for multi-channel filter |
| CN105954833A (en) * | 2016-06-24 | 2016-09-21 | 上海晶鼎光电科技有限公司 | Light splitting chip and preparation method thereof |
| CN107561665B (en) * | 2017-09-26 | 2018-07-20 | 中国科学院长春光学精密机械与物理研究所 | Integrated form optical filter splicing apparatus and method |
| CN107561665A (en) * | 2017-09-26 | 2018-01-09 | 中国科学院长春光学精密机械与物理研究所 | Integrated form optical filter splicing apparatus and method |
| CN108007568A (en) * | 2017-12-19 | 2018-05-08 | 湖南宏动光电有限公司 | A kind of light spectrum image-forming type micro optical filter and preparation method thereof |
| CN107907935A (en) * | 2017-12-26 | 2018-04-13 | 苏州晶鼎鑫光电科技有限公司 | The optically isolated structure and its manufacture method of a kind of multichannel integrated optical filter |
| CN108072924A (en) * | 2018-01-30 | 2018-05-25 | 苏州晶鼎鑫光电科技有限公司 | Diffuse isolation structure and its manufacturing method of multichannel integrated optical filter |
| CN108193171A (en) * | 2018-01-30 | 2018-06-22 | 苏州晶鼎鑫光电科技有限公司 | The manufacturing method of the optically isolated structure of multichannel integrated optical filter |
| CN108193171B (en) * | 2018-01-30 | 2019-11-19 | 苏州晶鼎鑫光电科技有限公司 | The manufacturing method of multichannel integrated optical filter optical isolation structure |
| CN108983329A (en) * | 2018-07-11 | 2018-12-11 | 无锡奥夫特光学技术有限公司 | Prepare the process of infrared optical window |
| CN109613561A (en) * | 2019-02-18 | 2019-04-12 | 合肥独领智能科技有限公司 | A kind of laser imaging system based on range of triangle |
| CN111337129A (en) * | 2020-03-17 | 2020-06-26 | 江苏芯欣光电科技有限公司 | Spectrum chip, chip packaging structure and manufacturing method |
| CN117991431A (en) * | 2024-04-03 | 2024-05-07 | 南京九川科学技术有限公司 | Filter device, imaging system and preparation method of filter device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100385268C (en) | 2008-04-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1862296A (en) | Micro-integrated narrow-band filter array and preparing method thereof | |
| JP7086239B2 (en) | Variable optical filter and wavelength-selective sensor based on it | |
| CN1306288C (en) | Light-filtering sheet array with heat resonant cavity layer | |
| US20140133862A1 (en) | Receiver optical module installing optical demultiplexer and method to produce optical demultiplexer | |
| KR20200024097A (en) | Optical filter, optical filter system, spectrometer and method of fabrication thereof | |
| EP1336873A1 (en) | Optical element having wavelength selectivity | |
| CN112888982A (en) | Multi-channel short-distance imaging device | |
| CN101403805A (en) | Production method of optical spectrum phase step type integration color filter | |
| US7315420B2 (en) | CWDM filter with four channels | |
| WO2019153225A1 (en) | Wavelength division multiplexing/demultiplexing optical fiber coupling module and optical apparatus thereof | |
| CN100371742C (en) | CWDM light filter with four channels | |
| CN103245999B (en) | A kind of broad spectrum out-of-band rejection optical filter | |
| TWI534490B (en) | Light transmitting device and light transceiver module | |
| EP1304585A1 (en) | Optical element having wavelength selectivity | |
| JP2015087526A (en) | Infrared bandpass filter | |
| JP4320304B2 (en) | Wavelength multiplexing optical coupler and method of manufacturing the same | |
| US20080107874A1 (en) | Optical element including dielectric multilayer film and manufacturing method thereof | |
| EP1318417A3 (en) | Optical filters | |
| US7580188B2 (en) | CWDM filter | |
| CN117452539A (en) | Preparation method of integrated cylindrical lens filter array | |
| JPH11190809A (en) | Multiplexer demultiplexer | |
| JP4329989B2 (en) | Design method of optical multilayer filter | |
| CN100340076C (en) | High-density wavelength division multiplexer | |
| CN118259388A (en) | Optical film structure, preparation method thereof and optical device | |
| CN113777674A (en) | Photonic crystal structure capable of realizing optical frequency comb |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20080430 |