CN1855562A - 氮化镓基化合物半导体器件 - Google Patents
氮化镓基化合物半导体器件 Download PDFInfo
- Publication number
- CN1855562A CN1855562A CNA2005101246211A CN200510124621A CN1855562A CN 1855562 A CN1855562 A CN 1855562A CN A2005101246211 A CNA2005101246211 A CN A2005101246211A CN 200510124621 A CN200510124621 A CN 200510124621A CN 1855562 A CN1855562 A CN 1855562A
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- Prior art keywords
- compound semiconductor
- based compound
- substrate
- gan
- plane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 46
- 150000001875 compounds Chemical class 0.000 title claims abstract description 43
- 239000000758 substrate Substances 0.000 claims abstract description 51
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims abstract description 48
- 229910002601 GaN Inorganic materials 0.000 claims abstract description 44
- 239000012535 impurity Substances 0.000 claims description 5
- 239000010409 thin film Substances 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000012876 topography Methods 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000001788 irregular Effects 0.000 description 3
- 238000005204 segregation Methods 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
- H01L29/2003—Nitride compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
- H01L29/045—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/16—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
- H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0206—Substrates, e.g. growth, shape, material, removal or bonding
- H01S5/0207—Substrates having a special shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0206—Substrates, e.g. growth, shape, material, removal or bonding
- H01S5/0211—Substrates made of ternary or quaternary compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Ceramic Engineering (AREA)
- Biophysics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Electromagnetism (AREA)
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
- Light Receiving Elements (AREA)
Abstract
Description
Claims (10)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR33197/05 | 2005-04-21 | ||
KR1020050033197A KR100707187B1 (ko) | 2005-04-21 | 2005-04-21 | 질화갈륨계 화합물 반도체 소자 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1855562A true CN1855562A (zh) | 2006-11-01 |
CN100539212C CN100539212C (zh) | 2009-09-09 |
Family
ID=37185927
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005101246211A Expired - Fee Related CN100539212C (zh) | 2005-04-21 | 2005-11-14 | 氮化镓基化合物半导体器件 |
Country Status (4)
Country | Link |
---|---|
US (2) | US20060237709A1 (zh) |
JP (1) | JP2006303417A (zh) |
KR (1) | KR100707187B1 (zh) |
CN (1) | CN100539212C (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102549778A (zh) * | 2009-08-27 | 2012-07-04 | 首尔Opto仪器股份有限公司 | 倾斜基底上的高质量非极性/半极性半导体器件及其制造方法 |
CN101425484B (zh) * | 2007-10-29 | 2012-07-25 | 日立电线株式会社 | 氮化物半导体自支撑衬底及使用该衬底的器件 |
CN103560191A (zh) * | 2008-08-04 | 2014-02-05 | 住友电气工业株式会社 | GaN基半导体光器件、GaN基半导体光器件的制作方法、外延晶片及GaN基半导体膜的生长方法 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7521777B2 (en) * | 2005-03-31 | 2009-04-21 | Showa Denko K.K. | Gallium nitride-based compound semiconductor multilayer structure and production method thereof |
JP2009501843A (ja) * | 2005-07-13 | 2009-01-22 | ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア | 半極性窒化物薄膜の欠陥低減のための横方向成長方法 |
EP1984545A4 (en) * | 2006-02-17 | 2013-05-15 | Univ California | PROCESS FOR THE PRODUCTION OF N-TYPE SEMIPOLAR OPTOELECTRONIC DEVICES (AL, IN, GA, B) |
JP2008285364A (ja) * | 2007-05-17 | 2008-11-27 | Sumitomo Electric Ind Ltd | GaN基板、それを用いたエピタキシャル基板及び半導体発光素子 |
US20090039356A1 (en) * | 2007-08-08 | 2009-02-12 | The Regents Of The University Of California | Planar nonpolar m-plane group iii-nitride films grown on miscut substrates |
JP5344676B2 (ja) * | 2008-08-29 | 2013-11-20 | 学校法人金沢工業大学 | 発光素子用基板および発光素子 |
JP2010135733A (ja) * | 2008-11-07 | 2010-06-17 | Panasonic Corp | 窒化物半導体レーザ装置及びその製造方法 |
JP5167081B2 (ja) * | 2008-11-13 | 2013-03-21 | パナソニック株式会社 | 窒化物半導体デバイス |
JP5375392B2 (ja) * | 2009-07-15 | 2013-12-25 | 住友電気工業株式会社 | 窒化ガリウム系半導体光素子、及び窒化ガリウム系半導体光素子を作製する方法 |
WO2016022527A1 (en) * | 2014-08-05 | 2016-02-11 | Massachusetts Institute Of Technology | Engineered band gaps |
JP2017034189A (ja) * | 2015-08-05 | 2017-02-09 | 富士通株式会社 | 光電変換素子 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6072197A (en) * | 1996-02-23 | 2000-06-06 | Fujitsu Limited | Semiconductor light emitting device with an active layer made of semiconductor having uniaxial anisotropy |
US6809010B1 (en) * | 1996-02-29 | 2004-10-26 | Kyocera Corporation | Sapphire single crystal, semiconductor laser diode using the same for substrate, and method for manufacturing the same |
JP3147821B2 (ja) | 1997-06-13 | 2001-03-19 | 日本電気株式会社 | 窒化物系化合物半導体およびその結晶成長方法および窒化ガリウム系発光素子 |
JP3668031B2 (ja) * | 1999-01-29 | 2005-07-06 | 三洋電機株式会社 | 窒化物系半導体発光素子の製造方法 |
JP3929008B2 (ja) * | 2000-01-14 | 2007-06-13 | シャープ株式会社 | 窒化物系化合物半導体発光素子およびその製造方法 |
JP4416297B2 (ja) * | 2000-09-08 | 2010-02-17 | シャープ株式会社 | 窒化物半導体発光素子、ならびにそれを使用した発光装置および光ピックアップ装置 |
JP2002094189A (ja) * | 2000-09-14 | 2002-03-29 | Sharp Corp | 窒化物半導体レーザ素子およびそれを用いた光学装置 |
JP4334129B2 (ja) * | 2000-11-07 | 2009-09-30 | シャープ株式会社 | 窒化物半導体発光素子とそれを含む光学装置 |
US6734530B2 (en) * | 2001-06-06 | 2004-05-11 | Matsushita Electric Industries Co., Ltd. | GaN-based compound semiconductor EPI-wafer and semiconductor element using the same |
JP2004104089A (ja) * | 2002-05-30 | 2004-04-02 | Sharp Corp | 高純度アンモニアを使用した窒化物半導体の製造方法 |
JP2004111514A (ja) * | 2002-09-17 | 2004-04-08 | Sanyo Electric Co Ltd | 窒化物系半導体発光素子およびその製造方法 |
JP4397695B2 (ja) * | 2003-01-20 | 2010-01-13 | パナソニック株式会社 | Iii族窒化物基板の製造方法 |
JP2004224600A (ja) | 2003-01-20 | 2004-08-12 | Matsushita Electric Ind Co Ltd | Iii族窒化物基板の製造方法および半導体装置 |
JP2004273661A (ja) * | 2003-03-07 | 2004-09-30 | Sumitomo Chem Co Ltd | 窒化ガリウム単結晶基板の製造方法 |
US7462882B2 (en) * | 2003-04-24 | 2008-12-09 | Sharp Kabushiki Kaisha | Nitride semiconductor light-emitting device, method of fabricating it, and semiconductor optical apparatus |
KR20050033197A (ko) * | 2003-10-06 | 2005-04-12 | 엘지전자 주식회사 | 플라즈마 디스플레이 패널의 구동방법 |
JP2005285869A (ja) | 2004-03-26 | 2005-10-13 | Kyocera Corp | エピタキシャル基板及びそれを用いた半導体装置 |
-
2005
- 2005-04-21 KR KR1020050033197A patent/KR100707187B1/ko not_active IP Right Cessation
- 2005-11-01 JP JP2005318336A patent/JP2006303417A/ja active Pending
- 2005-11-14 CN CNB2005101246211A patent/CN100539212C/zh not_active Expired - Fee Related
- 2005-11-23 US US11/285,169 patent/US20060237709A1/en not_active Abandoned
-
2009
- 2009-11-02 US US12/610,638 patent/US20100109017A1/en not_active Abandoned
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101425484B (zh) * | 2007-10-29 | 2012-07-25 | 日立电线株式会社 | 氮化物半导体自支撑衬底及使用该衬底的器件 |
CN103560191A (zh) * | 2008-08-04 | 2014-02-05 | 住友电气工业株式会社 | GaN基半导体光器件、GaN基半导体光器件的制作方法、外延晶片及GaN基半导体膜的生长方法 |
CN102549778A (zh) * | 2009-08-27 | 2012-07-04 | 首尔Opto仪器股份有限公司 | 倾斜基底上的高质量非极性/半极性半导体器件及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR100707187B1 (ko) | 2007-04-13 |
US20060237709A1 (en) | 2006-10-26 |
CN100539212C (zh) | 2009-09-09 |
JP2006303417A (ja) | 2006-11-02 |
KR20060110700A (ko) | 2006-10-25 |
US20100109017A1 (en) | 2010-05-06 |
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