CN1828423A - Exposure mask plate fixing method - Google Patents

Exposure mask plate fixing method Download PDF

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Publication number
CN1828423A
CN1828423A CN 200510029208 CN200510029208A CN1828423A CN 1828423 A CN1828423 A CN 1828423A CN 200510029208 CN200510029208 CN 200510029208 CN 200510029208 A CN200510029208 A CN 200510029208A CN 1828423 A CN1828423 A CN 1828423A
Authority
CN
China
Prior art keywords
exposure mask
mask plate
pipe
glass plate
board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN 200510029208
Other languages
Chinese (zh)
Inventor
孙明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHANGHAI HAI JING ELECTRON CO Ltd
Original Assignee
SHANGHAI HAI JING ELECTRON CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHANGHAI HAI JING ELECTRON CO Ltd filed Critical SHANGHAI HAI JING ELECTRON CO Ltd
Priority to CN 200510029208 priority Critical patent/CN1828423A/en
Publication of CN1828423A publication Critical patent/CN1828423A/en
Pending legal-status Critical Current

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  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

The related method comprises: 1. putting the exposure mask on glass board bottom to stick tightly with the board by adhesive tape; 2. setting a small opening on board edge; 3. arranging a pipe in the hole, sealed connecting the pipe and the board; 4. connecting another end of the pipe to an evacuating device; 5. starting the evacuating device to form a vacuum area between the board and mask. This invention can avoid effect to product quality led by distortion of exposured picture.

Description

A kind of fixing means of exposure mask plate
Technical field
The present invention relates to the technical field that a kind of liquid crystal display device is produced, relate in particular to a kind of fixing means of exposure mask plate.
Background technology
In the liquid crystal display device production run, an exposure process is arranged, it is to overlay on the ito glass that is coated with full photoresists with an exposure mask plate of being made by the film, by UV-irradiation, makes the part photoresists be subjected to light.For fixing of exposure mask plate, the general adhesive tape 1 that adopts carries out the mode that exposure mask plate 2 sticks on the glass plate 3 in the prior art, as shown in Figure 1.The problem that this method exists is: because exposure mask plate own wt or when its working time long and heating, it is sagging that exposure mask plate can be out of shape, and as shown in Figure 2, causes the figure deformation of coming out that exposes, and finally influences the quality of product.
Summary of the invention
The present invention provides and a kind ofly avoids exposure mask plate distortion sagging, improves the fixing means of a kind of exposure mask plate of product percent of pass.
Technical scheme of the present invention is such: a kind of fixing means of exposure mask plate is characterized in that this method step is:
First: exposure mask plate is placed in the glass plate bottom, and exposure mask plate fits tightly by adhesive tape and glass plate all around;
Second: make a call to an aperture in the edge of glass plate;
The the 3rd: adorn a pipe at the aperture place, and pipe and glass plate are tightly connected;
The 4th: the other end with pipe is connected with vacuum extractor again;
The the 5th: start vacuum extractor, form a vacuum area between glass plate and the exposure mask plate.
Beneficial effect of the present invention: adopt pipe one end and glass plate to be tightly connected, the other end links to each other with vacuum extractor, in process of production, remain the state of vacuumizing, be to be a vacuum area between glass plate and the exposure mask plate, even because exposure mask plate is pasted uneven or the heating distortion, exposure mask plate can be not sagging yet, effectively avoid the exposure figure distortion and cause influence product quality.
Description of drawings
Fig. 1 is the prior art constructions synoptic diagram;
Fig. 2 is the synoptic diagram of the exposure figure distortion of prior art;
Fig. 3 is a structural representation of the present invention.
Embodiment
The present invention is further illustrated below in conjunction with accompanying drawing and embodiment.
Shown in Figure 3: a kind of fixing means of exposure mask plate is characterized in that this method step is: first: exposure mask plate 2 is placed in glass plate 3 bottoms, and exposure mask plate 2 fits tightly by adhesive tape all around 1 and glass plate 3; Second: make a call to an aperture in the edge of glass plate 3; The the 3rd: adorn a pipe 4 at the aperture place, and pipe 4 and glass plate 3 are tightly connected; The 4th: the other end with pipe is connected with vacuum extractor again; The the 5th: start vacuum extractor, form a vacuum area between glass plate 3 and the exposure mask plate 2.
Make a call to an aperture in the edge of glass plate 3, in aperture, adorn a pipe 4, and the junction of pipe and glass plate is sealed in order to avoid gas leakage.The other end of pipe links to each other with vacuum extractor.In process of production, remain the state of vacuumizing.Like this, owing to be a vacuum area between glass plate and the exposure mask plate,, can avoid the exposure figure distortion and cause influence product quality even because exposure mask plate is pasted uneven or the heating distortion, and mask plate can be not sagging yet.

Claims (1)

1. the fixing means of an exposure mask plate is characterized in that, this method step is:
First: exposure mask plate (2), exposure mask plate (2) are placed in glass plate (3) bottom
Fit tightly by adhesive tape (1) all around and glass plate (3);
Second: make a call to an aperture in the edge of glass plate (3);
The the 3rd: adorn a pipe (4) at the aperture place, and pipe (4) and glass plate (3) are tightly connected;
The 4th: the other end with pipe is connected with vacuum extractor again;
The the 5th: start vacuum extractor, form a vacuum area between glass plate (3) and the exposure mask plate (2).
CN 200510029208 2005-08-30 2005-08-30 Exposure mask plate fixing method Pending CN1828423A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200510029208 CN1828423A (en) 2005-08-30 2005-08-30 Exposure mask plate fixing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200510029208 CN1828423A (en) 2005-08-30 2005-08-30 Exposure mask plate fixing method

Publications (1)

Publication Number Publication Date
CN1828423A true CN1828423A (en) 2006-09-06

Family

ID=36946876

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200510029208 Pending CN1828423A (en) 2005-08-30 2005-08-30 Exposure mask plate fixing method

Country Status (1)

Country Link
CN (1) CN1828423A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101681092B (en) * 2007-05-09 2012-07-25 株式会社尼康 Photomask substrate, photomask substrate forming member, photomask substrate manufacturing method, photomask, and exposure method using photomask
CN103268057A (en) * 2013-04-28 2013-08-28 京东方科技集团股份有限公司 Masking system, masking method, exposure system and exposure method
CN107908080A (en) * 2017-12-21 2018-04-13 昆山乐邦印刷器材设备有限公司 The vacuum exposure device of exposure machine

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101681092B (en) * 2007-05-09 2012-07-25 株式会社尼康 Photomask substrate, photomask substrate forming member, photomask substrate manufacturing method, photomask, and exposure method using photomask
CN103268057A (en) * 2013-04-28 2013-08-28 京东方科技集团股份有限公司 Masking system, masking method, exposure system and exposure method
CN103268057B (en) * 2013-04-28 2014-12-17 京东方科技集团股份有限公司 Masking system, masking method, exposure system and exposure method
CN107908080A (en) * 2017-12-21 2018-04-13 昆山乐邦印刷器材设备有限公司 The vacuum exposure device of exposure machine

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WD01 Invention patent application deemed withdrawn after publication