CN1667359A - Self-calibrating method and apparatus for ultra precise workbench - Google Patents

Abstract

The invention discloses an automatic calibration method and apparatus applied to three-dimensional ultra-sophisticated bench. The method is to set an automatic calibration model containing error message of grid glass sheets and calibrated bench through the medium of chromed grid glass sheets, and processes measured data of grid pip in different testing position to eliminate effects of position error of grid glass sheet grid pip. The invention also discloses an automatic calibration apparatus, comprising chromed grid glass sheets with grid pulser matrix, a positioning devise with optical components and XY plane position sensor, an image-gathering card and a computer storing related program.

Description

Ultra precise workbench self-calibrating method and device

Technical field

The present invention relates to a kind of ultra precise workbench, particularly integrated circuit processing and testing equipment belong to ultraprecise processing and fields of measurement with the self-calibrating method and the device thereof of ultra precise workbench.

Background technology

Ultra precise workbench has a wide range of applications in integrated circuit processing and testing equipment, and is bringing into play important role.For example, core component as litho machine, ultraprecise work stage (mask platform of litho machine and silicon chip platform) is carrying silicon chip or mask moves according to speed of setting and direction, by mask platform and the high-precision location of silicon chip platform with realize the accurate transfer of mask images feature to the silicon chip synchronously, so the motion of ultra precise workbench and bearing accuracy are the keys of realization litho machine resolution and alignment precision.And in the integrated circuit checkout equipment, as the bearing table of this checkout equipment, the motion of ultra precise workbench and bearing accuracy have determined the final precision of this checkout equipment equally to a great extent.Along with integrated circuit processing and the manufacturing of testing equipment and the lasting raising of accuracy of detection, high requirement has been proposed for the motion and the bearing accuracy of ultra precise workbench.Technology path figure (RoadMap) according to international semiconductor association (ITRS) issue in 2004, semiconducter process is in the 90nm technology node at present, to reach 65nm in 2007, and continue to reduce on this basis, its relevant processing and testing equipment with the motion of ultra precise workbench and bearing accuracy all at nanometer even Subnano-class.

The ultra precise workbench that uses in current main-stream integrated circuit processing and the testing equipment all with laser interferometer or capacitive transducer as feedback element, the ultraprecise location of realizing worktable by real-time detection and feedback to operating position.But owing to manufacturing process, debug the reason with the distortion of caused by factors ultra precise workbench such as non-barycenter driving and feedback element (as the flatness of the catoptron of laser interferometer and debug etc.), make the position (x of the detected worktable of feedback element _m, y _m) with the physical location (x of worktable _a, y _a) between have certain error D _x(x _a, y _a) and D _y(x _a, y _a), as shown in Figure 1.This will reduce the location and the kinematic accuracy of ultra precise workbench to a great extent, and then influences the processing and the accuracy of detection of integrated circuit processing and testing equipment.Therefore, adopt rational scaling method that the above-mentioned error of worktable is separated and compensate and become the main means that improve ultra precise workbench motion and bearing accuracy.

Traditional worktable scaling method is that (this standard metering worktable is transmitted by the metrological service of national appointment with the standard metering worktable, and the precision of its gauge point should be higher than the expectation precision of being demarcated object) as benchmark, after on placing this standard metering worktable by the staking-out work platform, the position of the gauge point of measurement standard gage work platform in stage coordinates system, the difference between this measured value and the reference value relatively, thereby draw by the motion of staking-out work platform and positioning error, and adopt reasonable method to simulate the mapping function (calibration function) of this working table movement and positioning error, at last this function is used for working table movement and compensates and improve by the motion of staking-out work platform and bearing accuracy.

Yet, as previously mentioned, the motion and the bearing accuracy of the ultra precise workbench that integrated circuit processing and testing equipment use are nanometer scale, be limited to current manufacturing and stoichiometric level, we can't obtain the required standard metering worktable of conventional table scaling method, and traditional worktable scaling method can't use.In order to solve described problem, the numerous scholars' that self-calibrating method has caused attention, and become and improve one of the most effective means of ultra precise workbench motion and bearing accuracy.This method adopts to place by the gauge point precision on the staking-out work platform and is lower than by the aided measurement device of demarcation object as media, the influence of relatively eliminating this aided measurement device gauge point positional precision by measurement data between the aided measurement device different measuring view, and then obtain the calibration function of ultra precise workbench, realize the demarcation of ultra precise workbench.

Existing ultra precise workbench self-calibrating method, described as U.S. Pat 4583298 (applying date is on March 7th, 1984), use the SYMMETRY THEORY and the group theory that demarcating certainly of ultra precise workbench carried out strict mathematical derivation, provided and to have accessed complete three pacing itemss from calibration information, and adopt as shown in Figure 2 initial pose 100 on this basis, be rotated counterclockwise 90 degree poses 200 and be rotated counterclockwise 180 degree poses 500, proposed a kind of be applicable to the beamwriter lithography machine from calibration algorithm.But this algorithm uses higher order polynomial that the ultra precise workbench calibration function is carried out match, and the adjustment error of aided measurement device is obtained simultaneously, makes that the unknown number number is too much in the algorithm, calculates quite time-consuming.In addition, exist under the situation of random meausrement error, this algorithm is unsettled, and the worktable calibration function that draws is a local optimum, rather than global optimum.

As shown in Figure 3, on the basis of U.S. Pat 4583298, the initial pose 100 that U.S. Pat 5798947 (applying date is on March 3rd, 1997) adopts, be rotated counterclockwise the translation poses 300 of 90 degree poses 200 and grid distances in measured zone 400, proposed to can be used for ultraprecise two dimension gage work platform and photo-etching machine work-piece platform from the fourier algorithm of demarcating, and provided realize this algorithm from caliberating device and program.This algorithm uses Fourier transform to being similar to by the error of staking-out work platform and aided measurement device, this has improved the computing velocity of this algorithm to a great extent, and has realized the accurate demarcation of ultra precise workbench under the situation that does not have the random measurement noise.Yet this algorithm uses least square method to separate wherein adjustment error, and this is normal distribution measuring noise, and the sampling interval of algorithm is only when enough big effective.In addition, the device that is proposed only is directed to the ultraprecise two-dimentional work bench based on electron beam pattern generator, and extensibility is relatively poor, and the demarcation of carrying out the close worktable of 3 D super precision is very difficult, and this has limited its application to a great extent.

Summary of the invention

The objective of the invention is to overcome the deficiency of existing ultra precise workbench from calibration algorithm and device, proposes a kind ofly effectively can extend to the self-calibrating method of the close worktable of 3 D super precision and cheaply, easily the ultra precise workbench of expanding is from caliberating device.

Technical scheme of the present invention is as follows:

The ultra precise workbench self-calibrating method, it is characterized in that: precision is lower than is located by the staking-out work platform and the chromium plating grid glass plate with grid tag matrix of kinematic accuracy is placed on by on the staking-out work platform, measure the initial pose of described chromium plating grid glass plate then respectively, be rotated counterclockwise 90 degree poses and be the position data of each grid point under the pose of a grid tag distance of benchmark translation with initial pose, after described position data sent into computing machine, by being stored in calculating by the systematic error of staking-out work platform from the calibration algorithm program in the computing machine, concrete steps are as follows:

1) average and variance that each measures the position data that repeatedly measures under the pose are promptly calculated in raw measurement data pre-service;

2) measure the pose data formatting,, will be rotated counterclockwise the position data that the pretreated position data of each grid point under the measurement pose of 90 degree and a grid tag distance of translation converts corresponding grid point place under the initial pose to promptly according to the rigid motion equation;

3) set up from peg model,, set up from the spotting function with the variance sum of each grid point of this moment promptly according to the position data at initial each grid point place of pose after the data formatting, and according to following formula as constraint condition, set up from peg model:

$\underset{k=1}{\overset{K}{\mathrm{\Σ}}}\underset{j=1}{\overset{N^2}{\mathrm{\Σ}}}\left(\mathrm{\δ}{P}_j^k\right)=0,$ $\underset{k=1}{\overset{K}{\mathrm{\Σ}}}\underset{j=1}{\overset{N^2}{\mathrm{\Σ}}}{\left(\widehat{P_j^k}\right)}^T\left(\mathrm{\δ}{P}_j^k\right)=0,$ $\underset{k=1}{\overset{K}{\mathrm{\Σ}}}\underset{j=1}{\overset{N^2}{\mathrm{\Σ}}}{\left(\widehat{P_j^k}\right)}^T\left(\begin{array}{cc}0& -1\\ 1& 0\end{array}\right)\left(\mathrm{\δ}{P}_j^k\right)=0,$

Wherein, δ P _j ^kExpression is by the systematic error of staking-out work platform,

For each measures the measured value of each grid point position under the pose, K is for measuring the pose number, and N is the size of grid tag matrix on the chromium plating grid glass plate, and upper right mark T represents the transposition that this is vectorial;

4) systematic error is found the solution, promptly according to aforementioned from peg model, adopt the parsing or the direct solution of optimization problem to solve the work system error, realize by the demarcation of staking-out work platform.

Ultra precise workbench of the present invention is from caliberating device, comprise the aided measurement device that places by on the staking-out work platform, place the locating device of described aided measurement device top, be used for image acquisition and pretreated image pick-up card and storage ultra precise workbench computing machine from the calibration algorithm relative program, it is characterized in that: described aided measurement device is a chromium plating grid glass plate with grid tag matrix, and described locating device comprises that being used for the optical module that the grid on the described chromium plating grid glass plate is amplified and each the grid tag point that is used for after amplifying carries out pinpoint XY plane positioning sensor.

From improvement of caliberating device, described locating device comprises that also one is arranged on the capacitive transducer that described aided measurement device top is used for the detection of Z direction, is used to realize the demarcation certainly of the close worktable of 3 D super precision as ultra precise workbench of the present invention.

In caliberating device, described XY plane positioning sensor can be selected ccd image sensor, position sensitive device or the laser interferometer of TWAIN interface for use at ultra precise workbench of the present invention.

The present invention compares existing technology and has following advantage:

First, the present invention is based on rigid motion equation and nonlinear optimization method ultra precise workbench and aided measurement device systematic error are carried out modeling in continuous domain, directly nonlinear equation is found the solution, avoided the discrete domain modeling and, improved the stated accuracy of ultra precise workbench the approximate caused modeling error of systematic error linearization.

The second, ultra precise workbench of the present invention uses CCD etc. as XY plane positioning sensor from caliberating device, and can be by increasing Z to detecting sensor, this device is expanded to three-dimensional from caliberating device, uses flexibly, and is with low cost.

The 3rd, ultra precise workbench of the present invention is simple to operate from caliberating device, and environmental suitability is strong, applicable to other such as fields such as fiber alignment, optical element manufacturings.

Description of drawings

Fig. 1 has described two-dimentional work bench warping function D _x(x _a, y _a) and D _y(x _a, y _a), measured value (x _m, y _m) and worktable actual value (x _a, y _a) between relation.

Fig. 2 shown relate in the U.S. Pat 4583298 measure poses from employed three of calibration algorithm.

Fig. 3 has shown employed three the measurement poses of ultraprecise two dimension gage work platform that U.S. Pat 5798947 proposes.

Fig. 4 is the synoptic diagram of aided measurement device of the present invention.

Fig. 5 has shown that three of aided measurement device of the present invention are measured pose.

Fig. 6 is that ultra precise workbench of the present invention constitutes synoptic diagram from the system of caliberating device.

Fig. 7 is the process flow diagram of ultra precise workbench self-calibrating method of the present invention.

Fig. 8 is the process flow diagram of subroutine of demarcating certainly of the present invention.

Embodiment

Specify the present invention below in conjunction with accompanying drawing.

As shown in Figure 6, ultra precise workbench of the present invention is from caliberating device, comprise place by the aided measurement device on the staking-out work platform 23, place described aided measurement device 3 tops locating device, be used for image acquisition and pretreated image pick-up card and storage ultra precise workbench computing machine 8 from the calibration algorithm relative program.Aided measurement device 3 adopts the chromium plating grid glass plate with grid tag matrix, it simple in structure, processing technology is strong, and is and easy to adjust between the different measuring pose, has splendid operability.

Locating device comprises that being used for the optical module 6 that the grid on the described chromium plating grid glass plate is amplified and each the grid tag point that is used for after amplifying carries out pinpoint XY plane positioning sensor 7.Choosing of XY plane positioning sensor can be adopted the alignment sensor of different accuracy level, such as ccd image sensor, position sensitive device (PSD) or the laser interferometer of TWAIN interface according to the difference of being demarcated the object precision.

Demarcation for two-dimensional ultraprecise worktable, only need XY plane positioning sensor, and the close worktable of 3 D super precision is being carried out timing signal, locating device should comprise that also is arranged on the capacitive transducer 5 that described aided measurement device top is used for the detection of Z direction, thus the detection of realization X, Y, three directions of Z.

In addition, of the present inventionly comprise also that from caliberating device base station 1, Holder Fasteners 4 and corresponding signal line are used for support and the connection from the caliberating device each several part, wherein XY plane positioning sensor 7 links to each other with computing machine 8 by signal wire and image pick-up card, is also inputed in the computing machine 8 by signal wire respectively by the XY coordinate figure of staking-out work platform 2.When being provided with capacitive transducer 5 in the locating device, capacitive transducer 5 also is connected with computing machine 8 by signal wire, detects data thereby transmit.

Described ultra precise workbench self-calibrating method is to be fixed on by the chromium plating grid glass plate with lower accuracy grid tag matrix on the staking-out work platform as media, the measurement data of each grid tag point under the different measuring pose according to this grid glass plate, foundation include aided measurement device and by staking-out work platform control information from peg model, by to this from peg model find the solution and the different measuring pose under the processing of grid tag point measurement data, eliminate of the influence of aided measurement device grid tag point site error to the worktable error, draw by the distortion of staking-out work platform, and then realize the demarcation of ultra precise workbench.

The aided measurement device that ultra precise workbench self-calibrating method of the present invention uses adopts the extraordinary preferably chromium plating glass of stability as material, and the grid size of grid glass plate, grid point number and concrete size need be determined according to combined factors such as the stroke of being demarcated object and structures.Fig. 4 has shown that the groove that has anyhow each 11 symmetry forms the chromium plating grid glass plate of the grid tag matrix with 100 grid tag points.Three of using of the present invention measure poses and are respectively the initial measurement pose, are to be rotated counterclockwise the measurement poses of 90 degree and to be with reference to the measurement pose of pose along a grid distance of X-axis forward translation, as shown in Figure 5 with the initial measurement pose with reference to pose with the initial measurement pose.

Ultra precise workbench of the present invention is as follows from the theoretical foundation of calibration algorithm:

Supposing that aided measurement device is the grid tag dot matrix of N * N, is two-dimensional ultraprecise worktable if quilt is demarcated object, and k of aided measurement device measured j grid point positional value of pose and be $P_j^k={(x_j^k,y_j^k)}^T,$ K=1 wherein ..., 3, j=1 ..., N ², x _j ^k, y _j ^kBe respectively the x of measured value, y coordinate, T are represented the transposition of vector.Equally, be the close worktable of 3 D super precision if quilt is demarcated object, k of aided measurement device measured j grid point positional value of pose and is $P_j^k={(x_j^k,y_j^k,z_i^k)}^T,$ K=1 wherein ..., 3, j=1 ..., N ², x _j ^k, y _j ^k, z _i ^kBe respectively the x of measured value, y, z coordinate, T represent the transposition of vector.

Three measurement poses with described aided measurement device are expressed as in view of the above:

$P_j^k=R_{{\mathrm{\θ}}_k}{P}_j^1-T^k,(j=2,\·\·\·,N^2,k=\mathrm{2,3})$

Wherein, R _{θ k}Be k the rotation matrix of measuring pose, demarcate certainly for two-dimensional ultraprecise worktable, $R_{{\mathrm{\θ}}_k}=\left(\begin{array}{cc}\cos {\mathrm{\θ}}_k& -\sin {\mathrm{\θ}}_k\\ \sin {\mathrm{\θ}}_k& \cos {\mathrm{\θ}}_k\end{array}\right),$ And demarcate certainly for the close worktable of 3 D super precision, $R_{{\mathrm{\θ}}_k}=\left(\begin{array}{ccc}\cos {\mathrm{\θ}}_k& -\sin {\mathrm{\θ}}_k& 0\\ \sin {\mathrm{\θ}}_k& \cos {\mathrm{\θ}}_k& 0\\ 0& 0& 1\end{array}\right),$ θ _kBe k the anglec of rotation of measuring pose, T ^kBe k the translation vector of measuring pose.

By following formula as can be known, measure pose all with its initial pose P for the 2nd, 3 of aided measurement device the _j ¹As benchmark, if with this formula set up ultra precise workbench from peg model, then its initial pose will occupy very big weight in model, also be the measuring accuracy that the final stated accuracy of worktable will more depend on each grid tag point position data of initial pose.

In order to reduce ultra precise workbench from the degree of dependence of calibration algorithm to initial pose, make other measurement poses of aided measurement device in peg model, occupy identical weight, the present invention carries out reverse rotation with the 2nd, 3 measurements of aided measurement device pose makes it corresponding with each grid point of initial measurement pose with translation, thereby set up aided measurement device respectively measure the pose weight identical from peg model, be shown below:

$P_j^k=R_{{-\mathrm{\θ}}_k}(P_j^k-T^k)---\left(1\right)$

, from calibration principle the difference table between each pose measurement data of the caused aided measurement device of the systematic error of worktable is shown according to ultra precise workbench:

$E=\frac{1}{N^2}\underset{j=1}{\overset{N^2}{\mathrm{\Σ}}}D\left(j\right)---\left(2\right)$

Wherein, D (j) is the variance that j grid point of aided measurement device respectively measured the pose data, that is:

$D\left(j\right)=\frac{1}{K-1}\underset{k=1}{\overset{K}{\mathrm{\Σ}}}{[R_{{-\mathrm{\θ}}_k}(P_j^k-T^k)-\mathrm{\μ}\left(j\right)]}^{\·2}---\left(3\right)$

In the following formula, subscript 2 these vectorial inner products of expression, K is for measuring the pose number, and μ (j) is the average that j grid point of aided measurement device respectively measured the pose data, that is:

$\mathrm{\μ}\left(j\right)=\frac{1}{K}\underset{k=1}{\overset{K}{\mathrm{\Σ}}}{R}_{{-\mathrm{\θ}}_k}(P_j^k-T^k)---\left(4\right)$

Formula (2) has characterized the systematic error delta P by worktable _j ^k, aided measurement device anglec of rotation error delta θ _kWith translation error δ T ^kThe difference of caused different measuring pose.So the measured value of known each being measured measured value, the aided measurement device anglec of rotation and the translation of each grid point position under the pose is expressed as respectively:

With Then demarcate back each grid positions P of aided measurement device _j ^k, aided measurement device anglec of rotation θ _kWith translation T ^kCan be expressed as:

$P_j^k=\widehat{P_j^k}+\mathrm{\δ}{P}_j^k$

${\mathrm{\θ}}_k=\widehat{{\mathrm{\θ}}_k}+\mathrm{\δ}{\mathrm{\θ}}_k$

$T^k=\widehat{T^k}+\mathrm{\δ}{T}^k$

With above three formula substitutions (2), (3) and (4) formula, can get:

$E({\mathrm{\δP}}_j^k,{\mathrm{\δ\θ}}_k,{\mathrm{\δT}}^k)=\frac{1}{N^2}\underset{j=1}{\overset{N^2}{\mathrm{\Σ}}}{D}^{\′}\left(j\right)---\left(5\right)$

$D^{\′}\left(j\right)=\frac{1}{K-1}\underset{j=1}{\overset{N^2}{\mathrm{\Σ}}}{[R_{-(\widehat{{\mathrm{\θ}}_k}+\mathrm{\δ}{\mathrm{\θ}}_k)}(\widehat{P_j^k}+\mathrm{\δ}{P}_j^k-\widehat{T^k}-\mathrm{\δ}{T}^k)-{\mathrm{\μ}}^{\′}\left(j\right)]}^{\·2}---\left(6\right)$

${\mathrm{\μ}}^{\′}\left(j\right)=\frac{1}{K}\underset{k=1}{\overset{K}{\mathrm{\Σ}}}{R}_{-(\widehat{{\mathrm{\θ}}_k}+{\mathrm{\δ\θ}}_k)}(\widehat{P_j^k}+\mathrm{\δ}{P}_j^k-\widehat{T^k}-\mathrm{\δ}{T}^k)---\left(7\right)$

Simultaneously, for work system error delta P in the assurance formula (4) _j ^kValidity, δ P _j ^kMust satisfy following constraint condition:

$\underset{k=1}{\overset{K}{\mathrm{\Σ}}}\underset{j=1}{\overset{N^2}{\mathrm{\Σ}}}\left(\mathrm{\δ}{P}_j^k\right)=0---\left(8a\right)$

$\underset{k=1}{\overset{K}{\mathrm{\Σ}}}\underset{j=1}{\overset{N^2}{\mathrm{\Σ}}}{\left(\widehat{P_j^k}\right)}^T\left(\mathrm{\δ}{P}_j^k\right)=0---\left(8b\right)$

$\underset{k=1}{\overset{K}{\mathrm{\Σ}}}\underset{j=1}{\overset{N^2}{\mathrm{\Σ}}}{\left(\widehat{P_j^k}\right)}^T\left(\begin{array}{cc}0& -1\\ 1& 0\end{array}\right)\left(\mathrm{\δ}{P}_j^k\right)=0---\left(8c\right)$

Wherein, K is for measuring the pose number, and N is the size of grid tag matrix on the chromium plating grid glass plate, and upper right mark T represents the transposition that this is vectorial.

Therefore, described ultra precise workbench from calibration algorithm with ultra precise workbench from demarcating as being objective function with formula (5), be the nonlinear optimization problem of constraint with formula (8a), (8b) and (8c), be the systematic error of this ultra precise workbench by the above various optimum solution of obtaining.

As shown in Figure 7, the flow process of ultra precise workbench self-calibrating method of the present invention is as follows:

(1) according to the stroke and the structure of being demarcated object, determine the reasonable installing position and the installation method of described chromium plating grid glass plate, be fixed in by on the staking-out work platform correct position, and with the centre mark point of this grid glass plate as true origin, being Y-axis by coordinate axis as the measurement pose identification point 50 among Fig. 5, cross true origin and the coordinate axis vertical with Y-axis is X-axis, to meet right-hand rule simultaneously perpendicular to X, the coordinate axis of Y-axis is set up coordinate system for the Z axle.Overlap respectively with by the axis of movement of staking-out work platform by the mark axis of adjusting described chromium plating grid glass plate, this is described ultra precise workbench from the initial measurement pose of demarcating (measuring pose 100).

(2) under this measures pose, repeat to move made the grid glass plate by the staking-out work platform each gauge point successively by described locating device, measure and note each gauge point by the coordinate figure P in the staking-out work platform coordinate system _j ¹, j=1 ..., N ²Include chromium plating grid glass plate in this coordinate figure and by the systematic error of staking-out work platform.

(3) be with reference to pose to measure pose 100, chromium plating grid glass plate is rotated counterclockwise 90 degree around the Z axle, the Y-axis of adjusting coordinate system simultaneously and stage coordinates system-directions X overlaps, and the X-axis of coordinate system overlaps with the Y-axis that stage coordinates is, and this is described measurement pose 200.

(4) under this measures pose, repeat to move made chromium plating grid glass plate by the staking-out work platform each gauge point successively by described locating device, measure and note each gauge point by the coordinate figure P in the staking-out work platform coordinate system _j ², j=1 ..., N ²

(5) be with reference to pose to measure pose 100, along grid distance of X-axis positive dirction translation, this is described measurement pose 300 with chromium plating grid glass plate.

(6) adopt and step (2), (4) same method, repeat to move made chromium plating grid glass plate by the staking-out work platform each gauge point successively by described locating device, measure and note each gauge point by the coordinate figure P in the staking-out work platform coordinate system _j ³, j=1 ..., N ²

(7) utilize the coordinate figure data P that respectively measures all gauge points of aided measurement device under the pose that writes down in step (2), (4), (6) _j ^k(j=1 ..., N ², k=1 ..., 3), solve by the systematic error of staking-out work platform by the subroutine of demarcating certainly, thereby finish by the demarcation certainly of staking-out work platform according to flow process establishment shown in Figure 8.

As shown in Figure 8, demarcate subroutine certainly and carry out following steps:

(1) raw data pre-service.Promptly calculate average and the variance of measuring pose 100,200 and 300 times each grid tag point position measurements.

(2) measure the pose data formatting.To measure pose 200 and 300 pretreated position datas according to formula (1) and convert the position data of measuring 100 times corresponding grid points of pose place to;

(3) set up from peg model, promptly,, set up from the spotting function with the variance sum of each grid point at this moment according to formula (5)-Shi (7) according to the position data at initial each grid point place of pose after the data formatting, and with formula (8) as constraint condition, set up from peg model.

(4) systematic error is found the solution, promptly according to aforementioned from peg model, adopt the parsing or the direct solution of optimization problem to solve the work system error, realize by the demarcation of staking-out work platform.

Claims (5)

1. ultra precise workbench self-calibrating method, it is characterized in that: precision is lower than is located by the staking-out work platform and the chromium plating grid glass plate with grid tag matrix of kinematic accuracy is placed on by on the staking-out work platform, measure the initial pose of described chromium plating grid glass plate then respectively, be rotated counterclockwise 90 degree poses and be the position data of each grid point under the pose of a grid tag distance of benchmark translation with initial pose, after described position data sent into computing machine, by being stored in calculating by the systematic error of staking-out work platform from the calibration algorithm program in the computing machine, concrete steps are as follows:

1) average and variance that each measures the position data that repeatedly measures under the pose are promptly calculated in raw measurement data pre-service;

2) measure the pose data formatting,, will be rotated counterclockwise the position data that the pretreated position data of each grid point under the measurement pose of 90 degree and a grid tag distance of translation converts corresponding grid point place under the initial pose to promptly according to the rigid motion equation;

3) set up from peg model,, set up from the spotting function with the variance sum of each grid point of this moment promptly according to the position data at initial each grid point place of pose after the data formatting, and according to following formula as constraint condition, set up from peg model: $\underset{k=1}{\overset{K}{\mathrm{\Σ}}}\underset{j=1}{\overset{N^2}{\mathrm{\Σ}}}\left({\mathrm{\δP}}_j^k\right)=0,\underset{k=1}{\overset{K}{\mathrm{\Σ}}}\underset{j=1}{\overset{N^2}{\mathrm{\Σ}}}{\left(\widehat{P_j^k}\right)}^T\left({\mathrm{\δP}}_j^k\right)=0,\underset{k=1}{\overset{K}{\mathrm{\Σ}}}\underset{j=1}{\overset{N^2}{\mathrm{\Σ}}}{\left(\widehat{P_j^k}\right)}^T\left(\begin{array}{cc}0& -1\\ 1& 0\end{array}\right)\left({\mathrm{\δP}}_j^k\right)=0,$

Wherein, δ P _j ^kExpression is by the systematic error of staking-out work platform,

For each measures the measured value of each grid point position under the pose, K is for measuring the pose number, and N is the size of grid tag matrix on the chromium plating grid glass plate, and upper right mark T represents the transposition that this is vectorial;

4) systematic error is found the solution, promptly according to aforementioned from peg model, adopt the parsing or the direct solution of optimization problem to solve the work system error, realize by the demarcation of staking-out work platform.

2. ultra precise workbench is from caliberating device, comprise the aided measurement device that places by on the staking-out work platform, place the locating device of described aided measurement device top, be used for image acquisition and pretreated image pick-up card and storage ultra precise workbench computing machine from the calibration algorithm relative program, it is characterized in that: described aided measurement device is a chromium plating grid glass plate with grid tag matrix, and described locating device comprises that being used for the optical module that the grid on the described chromium plating grid glass plate is amplified and each the grid tag point that is used for after amplifying carries out pinpoint XY plane positioning sensor.

3. ultra precise workbench according to claim 2 is from caliberating device, it is characterized in that: described locating device comprises that also one is arranged on the capacitive transducer that described aided measurement device top is used for the detection of Z direction, is used to realize the demarcation certainly of the close worktable of 3 D super precision.

4. ultra precise workbench according to claim 2 is characterized in that from caliberating device: described XY plane positioning sensor is the ccd image sensor of TWAIN interface.

5. ultra precise workbench according to claim 2 is characterized in that from caliberating device: described XY plane positioning sensor is position sensitive device or laser interferometer.

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