CN1575194A - 用来确定和控制污染的***和方法 - Google Patents
用来确定和控制污染的***和方法 Download PDFInfo
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- CN1575194A CN1575194A CNA02821076XA CN02821076A CN1575194A CN 1575194 A CN1575194 A CN 1575194A CN A02821076X A CNA02821076X A CN A02821076XA CN 02821076 A CN02821076 A CN 02821076A CN 1575194 A CN1575194 A CN 1575194A
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- BPHJCXVZYVVFBT-UHFFFAOYSA-N 4-methyltridecane Chemical compound CCCCCCCCCC(C)CCC BPHJCXVZYVVFBT-UHFFFAOYSA-N 0.000 description 1
- NCJIZIYQFWXMFZ-UHFFFAOYSA-N 5,6-dimethyl-Decane Chemical compound CCCCC(C)C(C)CCCC NCJIZIYQFWXMFZ-UHFFFAOYSA-N 0.000 description 1
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- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
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- 238000004220 aggregation Methods 0.000 description 1
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- 229910052782 aluminium Inorganic materials 0.000 description 1
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- 235000010233 benzoic acid Nutrition 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
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- 238000009954 braiding Methods 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
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- LEPQSPCWSFEZCS-UHFFFAOYSA-N hexadecane;hexane Chemical compound CCCCCC.CCCCCCCCCCCCCCCC LEPQSPCWSFEZCS-UHFFFAOYSA-N 0.000 description 1
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- 150000002431 hydrogen Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
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- ICIWUVCWSCSTAQ-UHFFFAOYSA-N iodic acid Chemical compound OI(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-N 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
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- 239000013627 low molecular weight specie Substances 0.000 description 1
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- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
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- 239000012466 permeate Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
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- 229920005594 polymer fiber Polymers 0.000 description 1
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- 238000002360 preparation method Methods 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
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- 150000003839 salts Chemical class 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
- 238000002798 spectrophotometry method Methods 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
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- 230000032258 transport Effects 0.000 description 1
- NNLPAMPVXAPWKG-UHFFFAOYSA-N trimethyl(1-methylethoxy)silane Chemical compound CC(C)O[Si](C)(C)C NNLPAMPVXAPWKG-UHFFFAOYSA-N 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- 229940094989 trimethylsilane Drugs 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
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- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
化合物(在净室中) | 典型的浓度(pppV) |
异丙醇 | 610.0 |
丙酮 | 330.0 |
乙醇 | 134.0 |
甲氧基三甲基硅烷 | 35.0 |
十六氟庚烷 | 28.0 |
2-戊酮 | 17.0 |
2-丁酮(MEK) | 9.8 |
十四氟己烷 | 8.9 |
七氟丁酸 | 5.2 |
四氢呋喃 | 3.3 |
3-丁烯-2-酮 | 2.5 |
4-甲基-2-戊酮 | 1.9 |
三甲基(1-甲基乙氧基)硅烷 | 1.7 |
n-戊烷 | 1.4 |
三甲基硅醇 | 1.4 |
论点 | λ=248nm | λ=193nm | λ=157nm | 注释 |
在氮气(<10ppbO2)中形成光沉积的倾向 | 低 | 适中 | 几乎必然 | 假定在低ppb范围有机物蒸汽浓度 |
使用活性氧在原位光致清洗光学表面的能力 | 低 | 适中 | 高 | 基于氧吸附系数和有机层吸附率 |
与碳氢化合物相互反应 | 只有芳香族,适中的吸附率 | 芳香族吸附非常强烈,其它微弱 | 几乎所有的碳氢化合物都吸附 | 相互反应确定透镜性能受损害之前可允许的污染水平 |
浓度,微克/立方米 | ||||||
N2-设备之前 | N2-设备之后 | 无油空气之前 | 无油空气之后 | 制造环境 | 准制造环境 | |
氨(如NH3) | 0.4 | <0.1 | 0.4 | <0.1 | 4.2 | 6.4 |
其它无机酸 | <0.1 | <0.1 | <0.1 | <0.1 | <0.1 | <0.1 |
亚硝酸(如NO2) | <0.1 | <0.1 | 0.8 | <0.1 | 0.8 | 1 |
硝酸(如NO2) | <0.1 | <0.1 | <0.1 | <0.1 | <0.1 | <0.1 |
C6+有机化合物(如甲苯) | -1.1 | -0.9 | -0.8 | -2.3 | -213 | -216 |
化合物 | 浓度,微克/立方米 | |
如甲苯 | 如十六烷 | |
苯(78) | 0.4 | 0.2 |
二甲氧基二甲基硅烷(59) | 2.7 | 1.2 |
3-甲基己烷(26) | 0.4 | 0.2 |
2-庚烷(47) | 0.5 | 0.2 |
三甲氧基甲基硅烷(45) | 0.4 | 0.2 |
2,5-二甲基己烷(33) | 0.3 | 0.1 |
甲苯(82) 1 | 2.9 | 1.3 |
丙酸2-羟基乙酯(59) 2 | 1.5 | 0.7 |
PGMEA(92) 3 | 2.2 | 1 |
乙基苯(59) 4 | 3.2 | 1.3 |
n-丙基苯(56) | 0.3 | 0.1 |
环己烷(84) | 9.5 | 0.2 |
二甲本(48) 5 | 15.2 | 6.1 |
苯乙烯(59) | 0.3 | 0.1 |
1,2,3-三甲基苯(72) | 1.8 | 0.7 |
1,3,5-三甲基苯(60) | 0.6 | 0.2 |
环己酮(77) 6 | 0.6 | 0.2 |
3-庚酮(47) | 0.4 | 0.2 |
未知物 | 0.5 | 0.2 |
未知物 | 0.7 | 0.3 |
2,6-二甲基辛烷(59) 7 | 0.3 | 0.1 |
(1-甲基乙基)环己烷(40) | 0.4 | 0.2 |
壬烷(59) | 0.4 | 4.1 |
2,5,6-三甲基辛烷(53) | 4.3 | 1.7 |
2,2,7,7-四甲基辛烷(53) | 1.8 | 0.7 |
2,2,6-三甲基辛烷(64) | 1.4 | 0.6 |
1-乙基-3-甲基苯(93) 8 | 3.1 | 1.2 |
2-甲基癸烷(77) | 1.2 | 0.5 |
1-乙基-2-甲基苯(77) | 0.9 | 0.4 |
苯甲醛(48) 9 | 2.8 | 1.1 |
甲基-氨基甲酸苯基酯(25) | 2.1 | 0.8 |
碳酸丙二酯(86) 10 | 3.5 | 1.4 |
2,2,4,6,6-五甲基庚烷(64) | 2.6 | 1 |
2,2-二甲基癸烷(64) 11 | 5.7 | 4 |
2,2,9-三甲基癸烷(77) 12 | 10.1 | 2.3 |
3,7-二甲基壬烷(67) 13 | 17 | 0.2 |
5,6-二甲基癸烷(50) | 1.7 | 0.7 |
2,3-二甲基癸烷(40) | 1.9 | 0.8 |
3-甲基-5-丙基壬烷(64) | 3.9 | 1.6 |
2,6,7-三甲基癸烷(47) 14 | 15 | 6 |
4-乙基-2,2,6,6-四甲基庚烷(72) 15 | 14 | 0.2 |
2,5-二甲基十一烷(59) | 1.5 | 0.2 |
4,6-二甲基十一烷(59) 16 | 12 | 4.8 |
3,5-二甲基十一烷(53) | 1.8 | 0.7 |
4-甲基十一烷(83) | 2.4 | 1 |
3-甲基-5-丙烷基壬烷(64) 17 | 5.7 | 2.3 |
5,7-二甲基十一烷(43) | 1.7 | 0.7 |
3,8-二甲基十一烷(38) | 2.5 | 1 |
2,5-二甲基十二烷(36) | 3.6 | 1.4 |
2,2,3,4,6,6-六甲基庚烷(72) | 1.5 | 0.6 |
2,6,10-三甲基十二烷(72) | 2.3 | 0.9 |
5-甲基十三烷(64) | 0.7 | 0.3 |
4-甲基十三烷(64) | 0.4 | 0.2 |
十二烷(50) | 0.5 | 0.2 |
苯甲酸(66) 18 | 9.9 | 4 |
六甲基环四硅氧烷(39) | 0.5 | 0.2 |
八甲基环四硅氧烷(54) | 0.4 | 0.2 |
2,5-二苯基-2,5-环己二烯-1,4-二酮(97) 20 | 27 | 10.1 |
总数 | 213 | 73 |
化合物 | 浓度,微克/立方米 | |
如甲苯 | 如十六烷 | |
己烷(78) | 0.4 | 0.2 |
苯(84) | 0.5 | 0.2 |
2,4-二甲基-3-戊酮(72) | 0.2 | 0.1 |
己醛(64) | 0.3 | 0.1 |
丙酸(propanoc acid)2-羟基丙酯(56) | 0.4 | 0.2 |
丙酸(propanoc acid)2-氧基乙酯(29) | 0.1 | 0.05 |
甲苯(79) 1 | 3.3 | 1.4 |
2,4-二甲基-3-戊酮(36) | 0.2 | 0.1 |
2,3-二甲基戊烷(21) | 0.4 | 0.2 |
丙酸2-羟基丙酯(57) | 0.4 | 0.2 |
丙酸2-氧基乙酯(27) | 0.1 | 0.05 |
PGMEA(59) | 0.8 | 0.3 |
乙苯(61) 4 | 7 | 4.9 |
苯乙烯(39) | 0.3 | 0.1 |
二甲苯(35) 5 | 35 | 17.5 |
1,2,4-三甲基苯(67) | 1.4 | 0.6 |
壬烷(61) | 0.7 | 0.3 |
四氢-2-甲基-2-呋喃醇(56) | 1.1 | 0.5 |
环己烷(73) 6 | 92 | 40 |
2,5,6-三甲基辛烷(50) 7 | 1.7 | 0.7 |
1-乙基-3-甲基苯(91) 8 | 2.2 | 0.9 |
3,4-二甲基癸烷(59) | 0.4 | 0.2 |
1-乙基-2-甲基苯(72) | 0.5 | 0.2 |
α-甲基苯乙烯(96) | 1.1 | 0.4 |
2,2,4,6,6-五甲基庚烷(42) | 0.8 | 0.3 |
苯甲醛(96) 9 | 0.9 | 0.4 |
2,2-二甲基癸烷(64) 11 | 1.7 | 0.7 |
2,2,9-三甲基癸烷(53) 12 | 4.2 | 1.7 |
3,7-二甲基壬烷(47) 13 | 4.7 | 1.9 |
1,3,5-三甲基苯(91) | 0.6 | 0.2 |
3,6-二甲基十一烷(38) | 1 | 0.4 |
2,6,7-三甲基癸烷(53) 14 | 4.2 | 1.7 |
2-乙基-1-己醇(47) | 1.2 | 0.5 |
3,8-二甲基十一烷(43) | 3.4 | 1.4 |
4,6-二甲基十一烷(59) 16 | 0.5 | 0.2 |
3-甲基-5-丙基壬烷(53) 17 | 0.7 | 0.3 |
5-丁基壬烷(59) | 1 | 0.4 |
十一烷(90) | 1 | 0.4 |
4-甲基十一烷(72) | 1 | 0.4 |
1-乙基-2,3-二甲基苯(38) | 0.5 | 0.2 |
1,2-二甲基-4-乙基苯(72) | 0.3 | 0.1 |
2,5-二甲基十二烷(40) | 1.1 | 0.4 |
乙酰苯(47) | 0.7 | 0.3 |
2-丁基-1-辛醇(78) | 0.4 | 0.2 |
1-乙基-2,4-二甲基苯(47) | 0.3 | 0.1 |
2,7,10-三甲基十二烷(59) | 0.8 | 0.3 |
2,7,10-二甲基十一烷(53) | 0.3 | 0.1 |
苯甲酸(41) 18 | 8.9 | 3.6 |
十二烷(87) | 0.5 | 0.2 |
苯基马来酐(23) | 0.4 | 0.2 |
三甲基-1,3-戊二醇二异丁酸酯(42) 19 | 2.9 | 1.2 |
二苯甲酮(42) | 0.1 | 0.05 |
2,5-环己二烯-1,4-二酮-2,5-二苯基(89) 20 | 12.1 | 4.8 |
总数 | 216 | 96 |
化合物 | 浓度,微克/立方米 | |
如甲苯 | 如十六烷 | |
二甲氧基二甲基硅烷 | 0.5 | 0.2 |
甲苯 | 0.3 | 0.1 |
总数 | 0.8 | 0.3 |
化合物 | 浓度,微克/立方米 | |
如甲苯 | 如十六烷 | |
二甲氧基二甲基硅烷 | 2.3 | 0.9 |
三甲氧基甲基硅烷 | 1.3 | 0.5 |
总数 | 3.6 | 1.4 |
化合物 | 浓度,微克/立方米 | |
如甲苯 | 如十六烷 | |
二甲氧基二甲基硅烷 | 0.8 | 0.3 |
三甲氧基甲基硅烷 | 0.3 | 0.1 |
总数 | 1.1 | 0.4 |
化合物 | 浓度,微克/立方米 | |
如甲苯 | 如十六烷 | |
二甲氧基二甲基硅烷 | 0.9 | 0.4 |
总数 | 0.9 | 0.4 |
Claims (50)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/961,802 | 2001-09-24 | ||
US09/961,802 US6620630B2 (en) | 2001-09-24 | 2001-09-24 | System and method for determining and controlling contamination |
Publications (2)
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CN1575194A true CN1575194A (zh) | 2005-02-02 |
CN1289171C CN1289171C (zh) | 2006-12-13 |
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CNB02821076XA Expired - Fee Related CN1289171C (zh) | 2001-09-24 | 2002-09-24 | 用来确定和控制污染的***和方法 |
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EP (1) | EP1438118A1 (zh) |
JP (2) | JP4754172B2 (zh) |
KR (2) | KR100911794B1 (zh) |
CN (1) | CN1289171C (zh) |
CA (1) | CA2461153A1 (zh) |
SG (1) | SG148843A1 (zh) |
WO (1) | WO2003026774A1 (zh) |
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CN103630617A (zh) * | 2012-08-24 | 2014-03-12 | 现代自动车株式会社 | 检测来自空气调节器的刺激性气味、再现刺激性气味和制备相应刺激性组合物的方法 |
CN106404957A (zh) * | 2016-10-18 | 2017-02-15 | 天津七二通信广播股份有限公司 | 一种挥发性有机污染物治理对比柱箱及使用方法 |
CN109444232A (zh) * | 2018-12-26 | 2019-03-08 | 苏州同阳科技发展有限公司 | 一种多通道智能化污染气体监测装置与扩散溯源方法 |
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- 2002-09-24 SG SG200504302-1A patent/SG148843A1/en unknown
- 2002-09-24 KR KR1020047004227A patent/KR100911794B1/ko not_active IP Right Cessation
- 2002-09-24 US US10/253,401 patent/US6759254B2/en not_active Expired - Lifetime
- 2002-09-24 JP JP2003530403A patent/JP4754172B2/ja not_active Expired - Fee Related
- 2002-09-24 KR KR1020097005971A patent/KR20090035048A/ko not_active Application Discontinuation
- 2002-09-24 CN CNB02821076XA patent/CN1289171C/zh not_active Expired - Fee Related
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102680649A (zh) * | 2012-05-04 | 2012-09-19 | 上海华力微电子有限公司 | 一种测试高纯管道吹扫效果的方法 |
CN102680649B (zh) * | 2012-05-04 | 2015-01-07 | 上海华力微电子有限公司 | 一种测试高纯管道吹扫效果的方法 |
CN103630617A (zh) * | 2012-08-24 | 2014-03-12 | 现代自动车株式会社 | 检测来自空气调节器的刺激性气味、再现刺激性气味和制备相应刺激性组合物的方法 |
CN106404957A (zh) * | 2016-10-18 | 2017-02-15 | 天津七二通信广播股份有限公司 | 一种挥发性有机污染物治理对比柱箱及使用方法 |
CN109444232A (zh) * | 2018-12-26 | 2019-03-08 | 苏州同阳科技发展有限公司 | 一种多通道智能化污染气体监测装置与扩散溯源方法 |
CN109444232B (zh) * | 2018-12-26 | 2024-03-12 | 苏州同阳科技发展有限公司 | 一种多通道智能化污染气体监测装置与扩散溯源方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2005504280A (ja) | 2005-02-10 |
JP2009010392A (ja) | 2009-01-15 |
CN1289171C (zh) | 2006-12-13 |
SG148843A1 (en) | 2009-01-29 |
JP4754172B2 (ja) | 2011-08-24 |
CA2461153A1 (en) | 2003-04-03 |
KR100911794B1 (ko) | 2009-08-12 |
US6759254B2 (en) | 2004-07-06 |
WO2003026774A1 (en) | 2003-04-03 |
JP5049214B2 (ja) | 2012-10-17 |
KR20090035048A (ko) | 2009-04-08 |
US6620630B2 (en) | 2003-09-16 |
US20030068834A1 (en) | 2003-04-10 |
US20030113943A1 (en) | 2003-06-19 |
EP1438118A1 (en) | 2004-07-21 |
KR20040044976A (ko) | 2004-05-31 |
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