CN1474666A - Power adjustment of adjustable lens - Google Patents

Abstract

A method and instrument to irradiate a light adjustable lens, for example, inside a human eye (30), with an appropriate amount of radiation in an appropriate intensity pattern by first measuring aberrations in the optical system containing the lens; aligning a source (12) of the modifying radiation so as to impinge the radiation onto the lens in a pattern that will null the aberrations. The quantity of the impinging radiation is controlled by controlling the intensity and duration of the irradiation. The pattern is controlled and monitored while the lens is irradiated.

Description

Power adjustment of adjustable lens

Technical field

(post-manufacture) changed after the present invention generally related to the manufacturing of Optical devices characteristic, and in particular, related to the irradiation that light can be revised lens.

Background technology

The cataract surgery program is included in otch in the anterior lens capsule, removing cataractous crystalline lens, and intraocular lens (IOL) is implanted this position.Usually, there are two kinds of intraocular lenss.One type of natural lens of changing eyes is changed cataractous crystalline lens usually.Another kind of type is used for existing lenticular replenishing, and act as permanent correcting lens.Such lens (being called phakic IOL) are implanted in anterior chamber or the back room, with the ametropia of correction ocular.On principle, the focal power (coming from the focus of light on retina of infinity) of every kind of IOL that normal eye is required can accurate Calculation.Patient implants power of lens and is based on that preoperative eye-length and cornea sphere variable curvature choose, so that can see under the situation of additional corrective measure (for example glasses or contact lens) not.Unfortunately, because error in measuring and/or variable lens position and wound healing, carry out only about half of postoperative among the patient of this operation and under not rectification situation, can not enjoy best vision (people: Acta Opthalmol Scand 75:162-165 (1997) such as Brandser; People such as Oshika: J Cataract Refract Surg 24:509-514 (1998)).Because the focal power of this IOL just generally can not be revised once implanting the back at them, therefore, patient generally must seek help from and use extra correcting lens, as glasses or contact lens.The lens of implanting are seldom changed more inappropriate one of lens strength.

A solution of the problems referred to above is that light can be revised lens, and this is a kind of optics that its refracting characteristic can change after making and inserting human eye.This lens are described in detail in International Application PCT/US99/41650, and this application is that its disclosure is incorporated herein by reference in submission on October 13rd, 1999 and open on July 20th, 2000.Light can be revised lens and have the refraction modulation group compound that is arranged in the polymeric matrix (matrix).Lens implant in the glasses one to around and taken place refractive index stable after, optical aberration that measurement is pre-existing in or the aberration that causes by surgical operation.In order to correct these optical aberrations (for example, spherical aberration, astigmatism, prism etc.), corresponding irradiation dose is applied to light and can revises on the lens, and these lens are by changing its shape, its refractive index or the two changes its optical characteristics.Be exposed to the one or many irradiation and after revising its refracting power on the selectivity union space, shine whole lens at the lens each several part, thus the lens that are fixed (lock in) to revise.

Irradiation source or coherent source with sufficient intensity of the on-the-spot refracting characteristic of revising the prosthetic lens of implanting revised, as laser instrument, its can focus on the retina high strength of any and potentially retina be caused permanent damage by generation; Or high-power incoherent light source, it must be attenuated with 1/1000 magnitude, to avoid the infringement to glasses.So, exist for example demand of the radiation source of field change prosthetic lens after lens are implanted in the eyes.

Also need to change lens more accurately, so that more accurate compensate for residual aberration, and need guarantee that fixedly irradiation will shine lens after patient's iris, do not open fully at this place's iris.

Summary of the invention

The invention provides a kind of method and apparatus, so that can revise lens with the light of the intensity mode irradiation human eye inboard that limits on suitable amount of radiation and the space.Also can be used in other purposes irradiates light with the embodiment of structure similar described here and can revise lens material.For example, the present invention can be used as aberration conjugator (conjugator) in correcting the optical system of other types (for example: microscope, telescope, camera lens, intravital, customized prosthetic lens and customized contact lens etc.).Implant the back and can revise the vision that lens are corrected patient by accurate irradiates light, patient after surgery needn't wearing spectacles.Certainly, the old patient of forfeiture adaptive capacity can expect to wear the correcting spectacle lens that certain is used for myopia.According to embodiments of the invention, implant and wait for the required time in order to reflect stable (1 to 4 week) afterwards, before irradiation, in the irradiation process and the aberration of after irradiation, measuring eyes.Irradiation source is accurately aimed at sight line (LOS) axle of eyes, accurately controls the intensity and the persistent period of irradiation, and the pattern of control and monitoring exposure rate.Provide a kind of method and apparatus easy to use and friendly concerning the doctor at this to patient.

May need various forms of rectifications, as spherical aberration, astigmatism and higher order aberratons (for example, coma, trefoil, three rank spherical aberrations etc.).The vision that irradiation dose that needs are different and pattern are corrected patient.Thereby, can revise in the method and apparatus of lens coming the light in the illuminating optical system with the lens correction radiation, the invention provides a kind of improvement, it comprises: measure the aberration (comprising aberration that is pre-existing in and the aberration that is caused by surgical operation and wound healing) of the optical system (for example eyes) that comprises lens and aim at the improvement radiation source, strike on the lens so that will shine with the intensity mode that limits on the space, the intensity mode that limits on this space will make aberration eliminate.The size of shining has just been controlled in intensity and the control of persistent period to irradiation.At lens irradiated control and detecting pattern simultaneously.

Specific embodiment of the present invention provides and has been used for the energy source that irradiates light can be revised prosthetic lens.Being used to revise light, can to revise the useful irradiation source of lens be pulse UV laser instrument and arc light; And continuous wave (CW) UV source, as arc discharge lamp, CW laser instrument or CW LED.In one embodiment of the invention, provide ultraviolet (UV) light source of the expansion that is used to shine lens, for example UV light emitting diode (LED).The output characteristics of UV LED makes that this light source is attractive to this purposes, and this is because they can not be focused into a luminous point, and can be controlled in total intensity output.These features all provide less potential risk to eye structure.

According to another embodiment of the present invention, produce to revise light, and project to light with the pattern of aberration for compensation and can revise on the lens, that for example to be phase place opposite with measured aberration is the sort of for this pattern.In the particular form of this embodiment, UV Vcsel (VCSEL) array is used for producing the UV intensity mode, and it is projected to light can revise on the surface of lens.This structure provides following advantage, that is: optical system less, light, produce aspect the different exposure rate patterns more general and simpler than other UV grating (patterning) systems; Optical efficiency is higher than other system, produces less heat; And the working life of irradiation source is longer.

According to another embodiment of the present invention, the pattern of revising light is to utilize to have the apodizing light filter that predetermined strength distributes and realize, in an embodiment again, and can usage space photomodulator (SLM) or digital mirror device (DMD).This device has been used in the LASIX technology, and revising primary lens, to provide in the pattern of revising light be unique but they are used in the refraction modulation group compound that can revise lens for light.Under any circumstance, be used to correct the optical aberration that records and the required optical mode that produces can utilize shake face sensor feedback and obtaining of the ripple that for example comes from the Shack-Hartmann pick off.This pick off that together uses with deformable mirror (DM) has been widely used in the aberration of proofreading and correct astronomical telescope, and it uses in the present invention is unique.

In case light can be revised lens and be corrected to desired level, the optical characteristics of lens is by coming photofixation (photolock) with the whole lens of the rayed of suitable wavelength, so that mean deviation intactly photopolymerization light can be revised remaining refraction modulation component in the lens, that is, remove the refractive driving force of change effectively.

In addition, can revise other particular aspects in the fixedly irradiation of prosthetic lens at light and shine lenticular ability after being iris, not open fully at this place's iris patient.According to another embodiment of the present invention, angle (gonio) lens are used to overcome this problem.The initial exploitation of angle lens observes with very large angle before or after iris.It also is used to observe each several part amphiblestroid otherwise that can be blocked by eye structure.Its is unique with the refraction correction that can revise lens with fixed light in the present invention.

Feature of the present invention and technological merit have been summarized above very widely, so that can understand detailed description subsequently better.Above and the theme that below other features and advantages of the present invention of describing constituted claim of the present invention.It will be understood by those skilled in the art that disclosed notion and specific embodiment can be easily as revising or designing the structure that other are used to realize the identical purpose of the present invention, those skilled in the art will be appreciated that also this equivalent construction does not deviate from marrow of the present invention and the scope as describing in the appended claims.When the reference accompanying drawing is considered, be considered to the novel feature of characteristic of the present invention, no matter be its structure or its method of operating, together will from describe below, be able to better understanding with other purpose and advantage.Yet, should to be expressly understood that each accompanying drawing is to provide in order illustrating with purpose of description, and to be not intended to definition as boundary of the present invention.

Description of drawings

Fig. 1 is the sketch map of lens of the present invention, and these lens are illuminated in the center, and whole subsequently lens are illuminated, thereby is fixed into the focal power of finishing;

Fig. 2 is the sketch map of an example of not being with the irradiation system of internal alignment element;

Fig. 3 is the sketch map for an example of the irradiation system of surgery microscope configuration;

Fig. 4 is the sketch map for an example of the irradiation system of slit lamp configuration;

Fig. 5 is the sketch map of an example that is used for can revising at light by mask the optical texture of imaging on the lens;

Fig. 6 is the sketch map of the embodiment of Shack-Hartmann wavefront sensor;

Fig. 7 a and 7b are respectively the shake side view and the vertical views of face sensor of Shack-Hartmann ripple;

Fig. 8 illustrates the spectrum output of UV light emitting diode; And

Fig. 9 a and 9b illustrate the machinery of UV light emitting diode and describe and irradiation mode;

Figure 10 a and 10b are used to correct the example that light can be revised the irradiation distribution curve of power of lens;

Figure 11 is the sketch map of available Vcsel in the present invention;

Figure 12 is available angle lens in the present invention;

Figure 13 is available nomogram in the present invention, and it has " carnival hat " shape strength distribution curve;

Figure 14 is another nomogram used in this invention; And

Figure 15 is another nomogram used in this invention, and it has " carnival hat " shape strength distribution curve.

The specific embodiment

Usually, light can be revised lens and comprises first polymeric matrix and the refraction modulation group compound that wherein is provided with.First polymeric matrix forms optical element framework, and generally is the reason that causes its plurality of material properties.Refraction modulation group compound can be individualized compound or each combination of compounds, and it can stimulate and brings out polymerization, preferably photopolymerization.As used in this, term " polymerization " refers to a kind of reaction, wherein reflects at least a reacting in each component of modulation group compound and at least a in formation and similar components or different component covalency or the physical bond.The characteristic (identity) of first polymeric matrix and refraction modulation group compound depends on the final use of optical element.Yet as general rule, first polymeric matrix and refraction modulation group compound are chosen to make that the component that constitutes refraction modulation group compound can be at the first polymeric matrix internal diffusion.In other words, it is right with bigger refraction modulation group compound set of dispense that the first loose polymeric matrix is tending towards, and first polymeric matrix is tending towards right with less refraction modulation group compound set of dispense closely.

When being exposed to the suitable energy (for example heat or light), refraction modulation group compound generally forms second polymeric matrix in the exposure area of optical element.The existence of second polymeric matrix has changed the material behavior of this part of optical element, thereby modulates its refracting power.After exposure, the refraction modulation group compound in the unexposed area is moved in the exposed areas through behind the certain hour, causes expansion reaction or distortion.Refraction modulation group compound moves to that amount in the exposure area is relevant with the time also can accurately be controlled.If allow the long enough time, refraction modulation group compound will be balanced once more, and spread all over once more in the optical element (that is first polymeric matrix that, comprises the exposure area).When this zone is exposed to energy source once more, has moved to the refraction modulation group compound polymerization in this zone (if allow the isostatic once more words of refraction modulation group compound, it may be less), and further increased the formation of second polymeric matrix.This process (exposure is spread with permission at interval with reasonable time subsequently) can repeat, till the exposure area of optical element reaches Ideal Characteristics (for example, focal power, refractive index or shape).At this moment, whole optics component exposure is in energy source, so that come " fixing " to become required lens peculiarity by the remaining refraction modulation group of polymerization compound, wherein remaining composition is the compositions that was in before said composition is moved to the exposure area outside the exposure area.In other words, because the refraction modulation group compound that can freely spread no longer exists, optical element subsequently is exposed to energy source can not further change its focal power.Top Fig. 1 that takes from International Application PCT/US99/41650 illustrates refraction modulation (lens strength modulation thus), and is fixing subsequently.

The irradiation system of exemplary embodiment comprises some major parts: 1) irradiation source; 2) intensity of beam former; 3) beam conducting system; 4) alignment methods; 5) demarcate element; 6) diagnostic element; And 7) retaining element.To describe each in detail below.

Irradiation source

Irradiation source must with the photonasty compatibility of illuminated material.In this example, photopolymer/photoinitiator system is responsive to the UV irradiation of wavelength between 325nm and 380nm, so irradiation source is the UV source.The UV source can be laser instrument, light emitting diode or the spectrographic lamp of the various UV of having.Irradiation source can be continuous wave (CW) or pulse.Irradiation source is the CW mercury-arc lamp in this example, and it is equipped with interferometric filter, is the light beam (the full extreme value of overall with (FWFM)) at center to produce with 365nm ± 10nm.Other methods that are applicable to native system are described under the title of " being used to shine the method for amendable implantable lens " more comprehensively.

The intensity of beam former

The characteristic of intensity of beam former depends on the type of used irradiation, as electron beam, microwave, radio frequency, sound or light.Because irradiation source is an arc light, therefore in this example, will uses optical lens and become mark (apodizing) optical filter.This method can provide customizable pattern of irradiation, thereby can revise the change in refraction that produces customization in the lens at light.(Apodized) pattern that becomes mark can utilize Several Methods to produce, and takes various forms.For example, required transmission pattern can be imaging on the film or utilize pattern to generate the static mask pattern of machine photochemical etching to the substrate, perhaps utilize chemical vapor deposition (CVD) to be applied to chromium on the suitable substrate.Such static pattern or successive or rank (half tone) structure.In addition, required pattern can be dynamic, as by suitable spatial light modulator (SLM; For example liquid crystal display (LCD) or digital mirror device (DMD)) the sort of, the rotation that produces or the pattern of translation; Or any other method, with the strength distribution curve or the time of integration of dynamic change exposure irradiation.Some laser instrument itself are apodize, and can not need further intensity modulated, can revise power of lens or astigmatism to be used for proofreading and correct light.As describing in one embodiment, use the film mask.Film is placed between two microscope slides, to produce and the similar 3-D strength distribution curve of traditional optical lantern in the UV optical projection system.Critical piece is UV light source, light collection optics, image field lens, apodizing optical filter and projection optical device.The method that is used for producing the irradiation distribution curve is in that " method that is used to produce the radiation intensity distribution curve " is described under the title more comprehensively.

The another kind of potential irradiation source that is used to produce that limit on the space, variable intensity pattern is UV Vcsel (VCSEL).Static mask or dynamic photomodulator (for example LCD or DMD) are opposite with using, and the VCSEL array only needs laser array, lens matrix and projection optical device.Thereby advantage is that cost is low and simple.Controlled VCSEL laser instrument 2-D array replaces mask or SLM, and light source and relevant light collection optics thereof, so that irradiates light can be revised lens or thin film.Use UV Vcsel (VCSEL) to constitute one embodiment of the present of invention, and under UV-VCSEL pattern generator title, describe more comprehensively.

The beam conducting system

The beam conducting system depends on the beam type of being conducted.In this example, the UV bundle is conducted, thereby uses the optics of UV transmissive.Example shown in Fig. 2,3 and 5 is called the critical illumination system jointly.In these examples, collecting lens is with output imaging on the apodizing optical filter of integrator (for example photoconduction).Interferometric filter is placed in the optical system, light is filtered into required wavelength.Field lens is used for being redirected the main beam of optics system, so that from the light loss minimum of integrator.Object lens are imaged onto light with apodizing optical filter (intensity pattern) and can revise on the lens.The illumination of another kind of form is called as the Kohler illumination, is imaged onto object lens at this irradiation source (delivery outlet of photoconduction), and does not have field lens.Can use the light structures of any type.In another embodiment of optical projection system, can from optical arrangement, remove collecting lens, and suitable dispersing element (for example holographic dispersing element) is placed near the apodizing optical filter, so that the uniform field that incides on the mask (for example intensity of beam distribution curve of flat-top) to be provided.Then, utilize above-mentioned optical projection system, projection optical device is imaged onto light with the apodizing optical filter and can revises on the lens.

Alignment methods

There is not the example of the irradiation system of internal alignment element in Fig. 2, to be shown on the eyes that are used in rabbit 10.Be transmitted into integrator (filling in this case, the optical fiber 14 of waveguide form) from the light of arc light 12 outputs by spherical mirror 16 for hollow liquid.The output of integrator produces (that is the strength distribution curve of flat-top) uniformly.The flat-top output of photoconduction focuses on the photomask generator that comprises in the pipe 18, to produce required irradiation pattern.In this diagram, the head of rabbit is fixed on the platform 20 with support 22.Optics lens barrel 18 is connected on the support arm 24 by means of fine setting anchor clamps 26, and support arm 24 stretches out from support 22, and is fixed on the support 22 by coarse adjustment anchor clamps 28.Required illumination/mask pattern depends on that light can revise the interaction of change in refraction required in the lens and material and irradiation.This relation will be the mathematical description that we are called nomogram.

Alignment methods comprises that irradiation pattern can revise accurate setting on the lens at light.In this case, light can be revised lens for implanting the prosthetic lens in the glasses.Two only attitudes of human patient or other objects are to lie on the desk, shown in the rabbit 10 of recumbency among Fig. 3 and be sitting on the chair, shown in patient among Fig. 4 30.With reference to Fig. 3, the UV light from luminous source optical fiber 14 that guides by photomask generator tube 18 redirect to beam splitter 34 by reflecting mirror 32, and arrives the eyes of rabbit from beam splitter.Beam splitter 34 makes that can revise lens to the light that rabbit is implanted observes, and can undergo surgery by the surgery microscope 36 with beam splitter 34 vertical alignments.

With reference to Fig. 4, if patient is sitting on the chair, his or her head is placed on the head rest 38, and this head rest 38 supports chin and forehead.The UV light from luminous source optical fiber 14 by 18 guidings of photomask generator tube is turned to by beam splitter 40, and arrives patient's eyes from this.Beam splitter 40 works together with ophthalmology slit lamp 42, and the latter has the observation optics (not shown) of himself, and irradiation source is aimed at patient.

Slit lamp can be in the multiple structure any, comprises hand-held, portable and desktop installing type.All all can be used to a certain extent.If patient lies on the desk, with Fig. 3 Chinese and foreign department microscope 36 similar structures are suitable configurations.

In case head steady is fixed, but be used for the mask/intensity pattern and the light of projection can be revised lens alignment with the optical axis aligned together of irradiation source and the video camera or the stereomicroscope of focal plane such as grade.Inside or the external light source that can revise reflection from lens from cornea or light can be used as the angular alignment ancillary method, so that irradiation source and light can be revised lens alignment.But reflection can be can be detected with video camera stereomicroscope or other pick offs.

For any move of compensation of patient eyes in the irradiation treatment process, the fixed light of the laser point form of light source in 700～800nm scope is provided, watch attentively with patients.Aberration before this will guarantee to treat or be transmitted to light and can revise light quantity (dose) on the lens along patient's the optical axis or sight line axle (LOS).

Demarcate element

Demarcating element is the power of monitoring illumination beam and/or the pick off of strength distribution curve.Beam splitter is used to provide the sample of measuring beam.For simple aberration,, can fix strength distribution curve with given mask/pattern generator, and not need to measure total power or time of exposure such as focal power or astigmatism.In order to customize strength distribution curve, need the strength distribution curve or the time of exposure of monitoring projection.For UV irradiation, the UV ccd video camera can be used for monitoring intensity.

Being used in the pipe 18 is imaged onto light with mask and can revises the light optics structure that the example of the optics on the lens is Fig. 5 among Fig. 2 to 4.From light source 46, for example the UV light 44 of the optical waveguide of liquid filling is by the guiding of Silicon stone optics, the latter is made of PLCX-25.4-38.6-UV lens 48, and this lens 48 are separated 1mm with PLCX-25.4-30.9-UV lens 50, and PLCX-25.4-30.9-UV lens 50 in this example with combination PLCX-25.4-46.4-UV battery of lens 52 spaced apart 215mm.UV light 44 passes mask 54, passes light path gradiumCPX-25-60 lens 58 then after variable spaces 56, crosses variable spaces 62 and arrives light and can revise lens 60.

Diagnostic element

The aberration that diagnostic element described here is used for measuring before the irradiation, process and/or light afterwards can be revised lens.A lot of apparatuses can be used for measuring the aberration in the eyes.The same apparatus that is used for determining patient's prescription of spectacles can be used for measuring light and can revise the focal power or the astigmatism deviation of lens.There is the multiple apparatus that is used for measuring focal power or the astigmatism and the higher order aberrations of eyes.Three kinds of prevailing wavefront sensors that use are with the Schemer dish now, and Shack Hartmann wavefront sensor and Talbot interferometer are basic.Wavefront sensor will be discussed under the title of " wavefront sensor can made the application in the lens of revising focal power in the back " below more comprehensively can revise application in the lens at light.Diagnostic element can be isolated apparatus, and perhaps it can be built in the irradiation system.Under diagnostic element was built in situation in the illuminator, diagnosis can more easily be carried out between the light period.

In the particular implementation process: a) Shack Hartmann wavefront sensor is used for measuring the aberration of eyes; B) reference light can be revised lens the nomogram of irradiation response is determined the required strength distribution curve of aberration that house of correction measures then; C) required strength distribution curve is reflected on the mask generator able to programme (such as digital mirror device); D) calibrating camera is used for close loop maneuver, comes the correcting digital reflector apparatus, so that aberration in the compensation projection optics or the inhomogeneities in the light source; E) light can be revised the illuminated official hour section of lens; And f) behind special time, measures the aberration in the eyes once more, to guarantee to have carried out correct rectification.If necessary, repeat this process, in rectification is in acceptable dioptric boundary.

Utilize the exemplary embodiment of Shack-Hartmann wavefront sensor in Fig. 6, to schematically show.For other details of wavefront sensor shown in the side view and vertical view of Fig. 7 a or 8b.This provides some sizes of this exemplary embodiment to figure, as from shown in the side view and vertical view of Shack-Hartmann wavefront sensor.

In the view of Fig. 6, for the convenience that illustrates, CCD imaging path is painted on a side of system.In fact, ccd video camera 64 is installed to the top of system.The laser beam 66 of the wavelength 780nm of collimation focuses on the retina.Ccd video camera 64 or red fixation light 68 provide the LOS aligned ability of Shack-Hartmann wavefront sensor 70 with patient for the doctor.Image can be focused on by moving forward and backward pick off with respect to eyes, and this guarantees the outgoing pupil place imaging of wavefront sensor in patient's eyes.Laser 66 is from the retina reflection, and the wave surface of leaving comprises the information relevant with the aberration of eyes.The principle of utilizing the Shack-Hartmann wavefront sensor to measure the aberration of human eye is clearly put down in writing in the literature, therefore, only provides concise and to the point description at this.Lenslet (Lenslet) array 72 will be divided into a plurality of sub-apertures from the wave surface of retina reflection, and measure the inclination of wave surface with respect to ideal no aberration wave surface then.Then, measured gradient is used to rebuild the wave surface of zonal abberation, and it is suitable for one group of Zernike multinomial thus, and these polynomial each rank indicate specific optical aberration, and the aberration size of its corresponding coefficient representative in dioptric deviation.Then, can analyze in these components the seriousness of each, and be corrected by technology of the present invention.

Retaining element

In case proofreaied and correct aberration, just applied fixing irradiation.Fixedly irradiation can maybe cannot apply with identical irradiation system.In incomplete open those situations of iris, may can revise lens at irradiates light after the iris.According to another embodiment of the present invention, the angle lens are used for this purpose, as what will describe more comprehensively down at title " fixed light can be revised the measurement lens of lens ".

Other details of various embodiment will be provided below.

Be used to shine the method for amendable implantable lens

Be used for the illumination optical element, for example can to revise a kind of form of the energy of lens are UV radiation in 320nm～400nm scope to light.For example, helium cadmium (HeCd) laser instrument of 325nm work or for 334 and hydrargyrum (Hg) arc light of the radiation spectral line spectral filtering at 365nm place use in the present invention.These UV sources, be included in solid-state YAG laser instrument, the argon ion laser of working in 350～360nm scope, the deuterium discharge lamp of the excitation of treble frequency laser diode of 355nm work and the broadband xenon that works together with any narrow-band spectrum wave filter: mercury lamp can be revised the light source that material and lens carry out UV irradiation test with the light of opposing.

Exist with these light sources in each relevant potential safety problem, when the coherent source that uses such as laser instrument, have following possibility, that is, light source can focus on the retina any locate, and generation can cause the intensity of permanent injury.Can not focus on angle on the tiny dots (tight point) from it, wide range incoherent light source for example arc light is attractive, and still, these light sources have enough output irradiations really, to such an extent as to it is 1/1000 so big that they must decay, and is used for irradiates light and can revises lens.Thereby inappropriate use, machinery or the electric fault of lamp can cause being applied to high strength on the eye structure and causing damage thereupon.

Safer light source will be to focus on power the sort of of a bit going up and only having the prosthetic lens material that is enough to expose/shine.Though its wideer aspect, can use to produce 0.1 to 100mW/cm ²Irradiation, according to the embodiment of the invention, 350 in the 380nm wave-length coverage, total UV power is that 0.6 to 0.8 microwatt (mW) just is enough to produce required power variation.Consider optics and cornea transmission loss, the total power demand in UV source is approximately 2.5 to 3.5mW in this embodiment.For the 6.0mm diameter lens, power source will be 9.75 to 12.25mW/cm ²Intensity under shine.

According to the present invention, UV LED can be the suitable energy source that irradiates light can be revised lens that is used for.For example, can use the UV LED that can buy on the market, it has with 370nm is the output that 1mW is arrived at 0.75 of center, and full duration half spectral bandwidth is ± 10nm simultaneously.Commercially available UVLED is an extended source, and it can focus on the enough little size, in the optical filter that is coupled to liquid filling.Spectrum output as shown in Figure 8.To mechanical encapsulation and being described in shown in Fig. 9 a and the 9b from the irradiation distribution curve of UV LED.Optics and the electrical characteristic of the UV LED that obtains from seller (Sander electrical equipment company) description provide in table 1.

Table 1

Absolute maximum rating (Ta=25 ℃)

	Symbol	Unit	HR370A	?HR370B
					The DC forward current	IF	?MA	15	?15
The pulse forward current	IFP	?MA	30	?30
					Backward voltage	VR	?V	5	?5
Power dissipation	PD	?MW	45	?45
					Operating temperature	Topt	?℃	-30....+80	?-30....+80
Storing temperature	Tstg	?℃	-40....+100	?-40....+100

1) the pulse width maximum is 10 milliseconds, peak load rate 1/10HR370A photoelectric characteristic (Ta=25 ℃)

	Symbol	Unit	Condition	Min	The typical case	Max
							The DC forward voltage	VF	V	?IF＝10mA	-	?3.9	-
The DC reverse current	IR	MA	?VR＝5V	-	?-
							Luminous power output	PO	MW	?IF＝10mA	-	?1000	-
Peak wavelength	Λ	Nm	?IF＝10mA	-	?370	-
							Spectral half width	Δλ	Nm	?IF＝10mA	-	?12	-

HR370B photoelectric characteristic (Ta=25 ℃)

	Symbol	Unit	Condition	Min	The typical case	Max
							The DC forward voltage	VF	V	?IF＝10mA	-	?3.9	-
The DC reverse current	IR	MA	?VR＝5V	-	?-
							Luminous power output	PO	MW	?IF＝10mA	-	?750	-
Peak wavelength	Λ	Nm	?IF＝10mA	-	?370	-
							Spectral half width	Δλ	Nm	?IF＝10mA	-	?12	-

In one embodiment, 2 to 10 UV LED are coupled in the 5mm diameter optical fiber.In another embodiment, 4 to 8 UV LED are coupled in the 5mm diameter optical fiber.UV LED can add or reduce on demand, produces safety and enough power levels in the lens can revise at the light of implanting eyes.

In specific example, light can be revised in the lens implant patient eyes, and makes that the refraction of eyes can post processing, with immobilization.Utilize the refractive technique and/or the wavefront sensor of standard that patient's eyes is carried out the aberration analysis.Utilizing the knowledge of the aberration that eyes record and previous nomogram of deriving to calculate utilizes UV LED can revise lens to proofread and correct patient's required irradiation distribution curve and the dosage of vision as Light source correction light.

UV LED is suitable safe light source, to be used for irradiation system, is used for revising the optical characteristics that the interior light of patient can be revised lens.It has limited brightness and limited size.The radiation of maximum possible will keep below American National Standards Institute (ANSI) guide, and the full-size that light can be revised the luminous point on the lens will be the image of optical fiber output.

Be used to produce the method for rayed strength distribution curve

Depend on that light can revise the prescription of lens, the light that is exposed to appropriate frequency will cause refraction modulation component to be diffused in the irradiated part, produce corresponding change (Fig. 1) in the index of refraction in lens.The main variation that light can be revised power of lens is owing to expansion or contraction in the involved area cause.Though because the thermal power system of sealing, the refractive index that can revise lens as light is proportional to the amounts of particles of unit volume, and some localized variation of refractive index also may take place.For example, if lens shine with distribution curve as shown in figure 14, molecule in irradiation area is polymerization so, and irradiation and non-irradiated zone between produce the difference of chemical potential, irradiation and non-irradiated zone between set up diffusion gradient effectively.In order to set up the heat power balance once more, unexposed area reflects the modulation component interiorly and spreads towards producing the expansible center of localization, and lens strength increases.If lens patterned illumination as shown in figure 15, so, molecule will spread out from the core of lens, produces effectively in the focal power in the lens centre and reduces.Owing to the boundary condition of rims of the lens, across the thickness offset and the nonlinear response of possible lens material to shining of lens, expanding unnecessary is the linear function of irradiation.To each patient, irradiation distribution curve, amplitude and open-assembly time must customize, to produce correct amount of change in IOL.This comprises IOL power variation, astigmatism, spherical aberration and other scramblings.This is called the customization irradiation.

According to the embodiment of the invention, spatial light modulator can be used to the compositions that comprises refraction modulation group compound to produce the exposure rate distribution curve of customization, wherein shines the modulation group compound and is dispersed in, and for example forms lens in the polymeric matrix of IOL.Spatial light modulator can be known in those skilled in the art any.In one embodiment, spatial light modulator is liquid crystal display or Digital Light Processor.

For example, the electromagnetic radiation in spectrographic UV, visible, near-infrared part can utilize and commercial video/computer projection system in similar optical projection system project on the lens easily.Yet these projectors utilize liquid crystal display or Digital Light Processor, replace the thin film that uses in the projector.Liquid crystal display can be with transmission or reflective-mode work.Because their rotation polarisation of light planes must include polarising light and analyzer in optical system.

The rectangular mirror that the Digital Light Processor string is small constitutes, and generally is that a side is 17 microns.They do not modulate beam intensity, but modulated beam of light drops on the time on the screen.Tiny mirror is with speed inclination ± 10 degree of 60kHz.Be open position if reflecting mirror activates, the light that strikes so on the reflecting mirror is reflected on the projecting lens.If reflecting mirror is not in open position, luminous reflectance is to optical beam dump, and can not make it arrive screen.For each frame in the 60kHz frame, each reflecting mirror or open or close, thus to activate be binary to reflecting mirror.For uniform irradiation to Digital Light Processor, be applied to energy intensity distribution curve on the lens and be proportional to the number of times that each reflecting mirror activates, and be not proportional to the intensity of light beam.

The method of utilizing constant incident intensity and space to change time of exposure has some advantages: a) it has avoided the exposure levels under the generation intensity threshold level (producing the minimum irradiation level of any effect); B) it has avoided the material usefulness of necessary compensation relative intensity level; And c) it makes and more is easy to generate nomogram (describing the curve of IOL with respect to light intensity, distribution curve and duration response).

In another embodiment, photographic plate or film are used for traditional projection type system, so that irradiation pattern is projected on the IOL.As example, Figure 10 b illustrates from the 365nm light of finsen lamp in that (Figure 10 a) throw the beam distribution curve of optical fiber after exporting, and it has by the apodizing mask $1-\frac{r^2}{{\mathrm{<figure-callout\; id="2"\; label="r\; max"\; filenames="A0181875000302.png,A0181875000303.png"\; state="\{\{state\}\}">r</figure-callout>}}_{\max }^{}}$ The light intensity distributions curve.According to this embodiment, this strength distribution curve is used for the irradiation that light can be revised lens, and produces ideal power variation in lens.That each different strength distribution curve needs is new, mask is placed in the optical projection system separately.

By utilizing liquid crystal display or Digital Light Processor to produce the exposure rate distribution curve of customization, can eliminate the time and the cost of the photograph mask of making customization.The exposure rate distribution curve of every kind of customization can produce on computer screen, and is delivered to then in liquid crystal display or the Digital Light Processor projector.Changeable pattern on the computer screen can produce with the formula of representing the three-dimensional intensity distribution curve chart.The parameter of formula can be utilized patient's dioptric or nomogram change by user or doctor.The doctor also can be adjusted pattern/formula based on the experience of self.In one embodiment, can utilize patient's dioptric to add that the wave surface analytical system calculates the shape of exposure rate distribution curve, to be used to customize the irradiation of IOL.

As example, the process among this embodiment generally includes in the pro-phacocyst and to form an otch, removing cataractous crystalline lens, and implants light in this position and can revise lens.At wound healing and after reflecting stabilisation subsequently, the aberration of eyes or measure by traditional refractive technique (defocusing and astigmatism), or by ripple shake surface analysis (defocus, astigmatism, coma, spherical aberration and other higher order aberratons) and/or corneal topography (for higher order aberratons).After the postoperative healing of surgery and refraction were stable, the knowledge of aberration and the spatial distribution in eyes thereof made that patient's vision can be corrected the nomogram of the response of the light in specific wavelength, strength distribution curve and cycle by representing light can revise lens.After the type of aberration, size and spatial distribution were determined in eyes, this information was sent in the computer program, and this information works together with the nomogram in the cycle of the rectification strength distribution curve of exporting light and light.Then, the information of required strength distribution curve is sent to Digital Light Processor, and to control each reflecting mirror, the latter finally determines the output of Digital Light Processor/optical projection system, and graphic pattern projection can be revised on the lens to light.In case it is illuminated that light can be revised lens, refraction modulation component just takes place to spread to the exposure area, eyes are tortuous once more.Further revise light if desired and can revise lens, then reuse the process of nomogram and Digital Light Processor pattern generator.In case required aberration is corrected, then whole lens are illuminated, so that the photofixation lens stop light can revise further diffusion and the change in refraction of generation therefrom in the lens effectively.

In another embodiment, Digital Light Processor is used to light can revise the purpose of the UV irradiation generation irradiation pattern/mask of lens.Commercial Digital Light Processor projector (sell as infocus company, can buy the sort of), optics and light source can be removed, and replace UV light source and lens combination.Can change optics and light source, with irradiation test I L.For MatLab (be used to solve mathematical problem and produce the business computer program of curve image) or other curve programs produce scripts, to observe the two-dimentional intensity projection of three-dimensional intensity distribution curve and these distribution curves.Then, computer can be connected in the improved business projector, and can shine test I L with the distribution curve that calculates.Planar disks and lens can be revised lens material by light and make, and with various patterns, strength grade and time of exposure irradiation, to produce one or more irradiation nomograms.Typical intensity pattern can be similar to ( $1-\frac{r^2}{r_{\max }^2}$ ) or Gauss distribution (wherein, r is the radius that IOL goes up optic zone).The scope of typical strength grade from 2 to 10mW/cm ², and the scope of typical exposure times from 10 to 60 seconds.Patient's refraction data can together use with nomogram, proofreaies and correct focal power and astigmatism in the IOL.For higher order aberratons, as spherical aberration and coma, need wavefront sensor, although consume the more time, can use the refractive technique of standard to measure spherical aberration.

The example of nomogram

This fixing irradiation be exemplified as carnival hat shape strength distribution curve (Figure 13).The marked feature of such distribution curve is that the intensity of average magnitude is applied on the lens.As another example, photofixation intensity (I) distribution curve can be and equation $I=I_0(1-\frac{r^2}{r_{\max }^2}),$ As shown in figure 14, I wherein ₀Be the peak strength of light beam, r is the radius across lens, and r _MaxIt is the radius that resembles bundle on the lens.This distribution curve can be used for the UV absorbing additives and is arranged on light and can revises in the lens to protect amphiblestroid situation.Because light can be revised lens and have transformable thickness across its diameter, therefore, the UV absorbing material adds light to can revise the rear portion that can prevent fixing irradiation arrival lens in the lens.This situation can cause reflecting the modulation component can revise lens can be revised in front portion diffusion from the rear portion of lens to light from light.This behavior has the effect of leveling rear surface, changes power of lens effectively.By inciting somebody to action $I=I_0(1-\frac{r^2}{r_{\max }^2})$ Distribution curve is applied to light with enough intensity and can revises on the lens, penetrates light fully and can revise the middle thick of lens and thin edge, can realize photofixation.

Its simplest form of treatment nomogram is represented xy figure, and this figure changes with respect to the refractive power that exposure dose is drawn.For satisfying the Response Table that these demands form is nomogram.For simple power correction, nomogram only is the curve on the xy figure.As the example of treatment nomogram, 24 light can revise lens (nominal focal power for+20D) by 1% light trigger (can revise the further details of lens component with reference to PCT/US99/41650) on the refraction modulation component of 30% the end capped polydimethylsiloxane of methacrylate (methacrylate endcappeddimethylsiloxane) on 70% cross-linked silicone substrate, the weight on the weight and the weight about light.First group of 8 lens with the optical projection system shown in Fig. 5 and beam intensity curve shown in Figure 15 with 10mW/cm ²Each irradiation 30 seconds, second can revise lens utilization and first group of 8 identical optical projection system, strength distribution curve and strength condition irradiation with the 3rd group of 8 light, and second group with two 30 seconds exposure irradiation of 5 seconds at interval, and the 3rd group with three 30 seconds exposure irradiation of 5 seconds at interval.Shone back 24 hours, light can be revised lens combination and reach thermodynamic equilibrium, and this can revise the power of lens vary stable according to light and confirm.These result of experiment are shown in Table 1.

Table 1

Intensity (mW/cm 2)	Irradiation time (second)	Intensity pattern	Shine back 24 hours Δ D (diopter)
				10	?1×30	Figure 15	-0.66±0.02
10	?2×30	Figure 15	-1.82±0.08
				10	?3×30	Figure 15	-2.65±0.13
5	?2×30	Figure 14	+1.04±0.15

The example that changes as positive light coke, 8 light can be revised lens (the component manufacturing identical with said lens of nominal focal power+20D).These 8 light can be revised lens utilization 2 spaced apart 5 seconds dosage of 30 seconds and intensity pattern shown in Figure 14 is exposed to 5mW/cm ², the structure of these experiments and after 24 hours final power variation list in the table 1.

The UV-VCSEL pattern generator

VCSEL can be unit piece laser instrument, one-dimensional array or two-dimensional array.Each laser component is almost foursquare laser beam from end face with narrow cone-shaped beam emission.To the major part research of these devices be the to communicate by letter near infrared light of purposes.In order to scan and survey image, some visible light arrays have been developed.The duty factor that is used for two-dimensional array is generally less owing to guide required space.Lens arra can be placed on the top of VCSEL array, to obtain the duty factor greater than 90%.These laser instrument have very high modulating frequency.If the intensity of control laser instrument is difficulty too, then the energy in the exposure can be controlled by pulsewidth modulation or other modulator approaches.Intensity or average energy by in each laser instrument of control on the space can produce effective beam intensity curve.Then, this pattern/distribution curve is imaged onto light and can revises on lens or the thin film, to produce required refractive pattern.Advantage is directly and instantaneous or Instantaneous Control irradiation pattern and strengthen the two combination of pattern almost.

Because identical beam distribution curvilinear motion can realize with the demonstration or the projection optical device of polytype possible space photomodulator and standard, therefore when the observation of irradiation system and wavefront sensor and some types and video capability combined, the derivant of the UV-VCSEL of this embodiment had been prior aspect simplicity that encapsulates and the size.

VCSEL is used in (other wavelength) imaging and scanning purposes, but not being used for irradiates light can revise lens or thin film.This UV-VCSEL array is described in the 30th page of the photomiss in March calendar year 2001 Spectra to some extent, is hereby incorporated by.

With reference to Figure 11, in VCSEL, the light vertical transmission, rather than laterally pass through structure.By this orientation, the laser instrument chamber can be grown with the coupling Wavelength of Laser.By this capacitor, the gain bandwidth of device can only be supported single vertical pattern.In this specific VCSEL, oxide skin(coating) directly on the laser instrument chamber and under growth, thereby the gain and the sensing (index) of this device that leads are provided.

Fixed light can be revised the angle lens of lens

According to embodiments of the invention, the angle lens are used for fixing light by the part of being blocked by iris that irradiates light can be revised lens can revise lens.The advantage of this embodiment is that it can be easily send irradiation with bigger angle, to reach the part of blocking in the lens at facies posterior iridis.

The angle lens are generally a glass, and it at one end has the radius of the radius of curvature of precision-matched eyes.Gel or viscoelastic material are as index coupling fluid, to eliminate or greatly to reduce the focal power of cornea.Allow the direct observation retina at other end lens.There is (faceted) reflecting mirror of facet on a side of this piece glass, to polish, this feasible each side that can observe eyes, or on the iris or under the iris.Independent lens are placed on the facet, are used for laser focusing is arrived the eyes inboard, or the focusing of auxiliary other optical instruments.Because the zone of eyes is missed between facet and facet are formed into together place, the angle lens rotate so that complete coverage to be provided.Same missing appears in this purposes of angle lens.Thereby the angle lens must rotate, so that the complete coverage of iris fixedly irradiation afterwards to be provided.

Angle lens and 1 to 4 facet together provide.In this embodiment, select 4-mirror angle lens, this is because it provides best light coverage, and needs minimum irradiation to obtain complete coverage.Figure 12 illustrates the angle lens of 4-reflecting mirror, and each reflecting mirror is in 62 °.Four 62 ° of reflecting mirrors provide 360 ° of visual fields, and only scioptics rotate a little thus, obtain anterior chamber's projected angle of 360 °.This angle lens can obtain from Opt electronic device S.A. medical treatment branch, model is 04GFA, perhaps are Thorpe 4 mirror angle laser lens, and model is OT4Mga.Can use other four mirror configuration, as Ritch Trabeculopasty laser lens, model is ORTA, and single reflecting mirror or two mirror lenses.Be exemplified as Magic View angle laser lens, model is OmVGL and simple reflector angle laser lens, and model is OSNGA, and the two has single 62 ° of reflecting mirrors; And the angle laser lens of two reflecting mirrors, model is 02MA, it has two 62 ° of relative reflecting mirrors.The angle lens make under the iris in the uniform light arrival eyes of irradiation source, and arrival light can be revised the edge of lens, realizes the whole fixing of lens.

General introduction

Though the present invention and advantage thereof are described in detail, be understood that under marrow of the present invention that does not deviate from the appended claims qualification and scope prerequisite and can make various variations, replacement and modification it.In addition, the scope that is intended to and does not lie in the application is limited in the specific embodiment of process, machine, manufacturing, material composition, device, method and/or step described in the description.Can from the application's disclosure, understand easily as those skilled in the art, can utilize according to the present invention and various processes, machine, manufacturing, material composition, device, method or the step of carrying out basic identical function or realizing basic identical result's present existence or exploitation later on described here.So appended claims comprises this process, machine, manufacturing, material composition, device, method or step in its scope.

Claims (32)

1. revise light in the optical system with lens correction irradiation and can revise in the method for refractive index of lens a kind of, described method improvement part comprises:

Measurement comprises at least one optical aberration in the system of lens;

Aim at the light source of revising irradiation, incide on the lens so that will shine with pattern corresponding to aberration correction; And

Control incident irradiation dose, thus aberration correction.

2. the method for claim 1, wherein incident irradiation dose was controlled by the intensity and the persistent period of control irradiation.

3. the method for claim 1, wherein control and monitor incident irradiation pattern simultaneously in that lens are irradiated.

4. the method for claim 1 comprises the step of the whole lens of irradiation with fixing refractive index through revising.

5. the method for claim 1, wherein optical system comprises that the light that is implanted in the eyes can revise lens, as prosthetic lens.

6. the method for claim 1, wherein optical system comprises that light can revise lens, as the prosthetic lens that will implant the external customization in the eyes (phakic or aphakic).

7. the method for claim 1, wherein optical system comprises that light can revise lens, as the contact lens of customization, be used for eye system (for example, eyes) and purposes in.

8. the method for claim 1, wherein, optical system (for example, microscope, telescope, camera lens, Vision Builder for Automated Inspection, video surveillance devices, satellite imagery system etc.) have at least one light and can revise refracting element, this element can be used for the aberration that exists in the elimination system, to improve image quality.

9. the method for claim 1, wherein incident irradiation is the ultraviolet light that obtains from irradiation source.

10. method as claimed in claim 7, wherein, ultraviolet source comprises a plurality of light emitting diodes, their output is directed into the receiving terminal of light guide, and light guide is directed to ultraviolet light on the lens.

11. method as claimed in claim 10, wherein, light guide is an optical fiber.

12. method as claimed in claim 9, wherein, ultraviolet source comprises the output of the ultraviolet laser device of pulse.

13. the method for claim 1, wherein ultraviolet light is from the ultraviolet laser device of pulse.

14. method as claimed in claim 9, wherein, ultraviolet source produces the continuous wave ultraviolet light.

15. method as claimed in claim 14, wherein, the continuous wave ultraviolet light obtains from arc light.

16. method as claimed in claim 14, wherein, the continuous wave ultraviolet light obtains from the deuterium discharge lamp.

17. method as claimed in claim 14, wherein, the continuous wave ultraviolet light obtains from continuous-wave laser.

18. method as claimed in claim 14, wherein, the continuous wave ultraviolet light obtains from the continuous wave light emitting diode.

19. the method for claim 1, wherein the pattern phase place corresponding to aberration is opposite with measured aberration.

20. method as claimed in claim 17, wherein, ultraviolet Vcsel array is used to produce described pattern, and this graphic pattern projection can be revised on the lens surface to light.

21. method as claimed in claim 17, wherein, this pattern is by obtaining by change mark (apodizing) the wave filter projection ultraviolet light with predetermined strength distribution curve.

22. method as claimed in claim 17, wherein, this pattern is by obtaining by spatial light modulator projection ultraviolet light.

23. method as claimed in claim 17, wherein, this pattern is by obtaining from the Digital Light Processor light reflection ultraviolet.

24. method as claimed in claim 17, wherein, this pattern is obtained by the light feedback.

25. method as claimed in claim 22, wherein, the light feedback obtains from the Shack-Hartmann pick off.

26. method as claimed in claim 23, wherein, the light feedback obtains from the Shack-Hartmann pick off.

27. method as claimed in claim 9, wherein, ultraviolet wavelength arrives in the 380nm scope 350, and with 9.75 to 12.25mW/cm ²Intensity apply.

28. method as claimed in claim 4, wherein, light can be revised the refractive index of the correction of lens and be fixed by (patterned) irradiation of composition.

29. method as claimed in claim 24, wherein, the irradiation of composition does not have carnival hat shape strength distribution curve.

30. method as claimed in claim 24, wherein, the strength distribution curve of the irradiation of composition does not increase along with radius and reduces.

31. method as claimed in claim 27, wherein, radius (r) is according to equation: $1-\left(\frac{r^2}{r_{\max }^2}\right)$ Increase.

32. method as claimed in claim 24, wherein, optical system comprises that light can revise lens, and as the prosthetic lens of implanting in the eyes, iris does not open fully in eyes, and not the irradiation of composition by the projection of angle lens.

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