CN1450346A - Article heat treatment device and device having holden - Google Patents
Article heat treatment device and device having holden Download PDFInfo
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- CN1450346A CN1450346A CN02127867A CN02127867A CN1450346A CN 1450346 A CN1450346 A CN 1450346A CN 02127867 A CN02127867 A CN 02127867A CN 02127867 A CN02127867 A CN 02127867A CN 1450346 A CN1450346 A CN 1450346A
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- microscler
- switch plate
- article
- switch
- annealing device
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B29/00—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins
- C03B29/02—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a discontinuous way
- C03B29/025—Glass sheets
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B27/00—Tempering or quenching glass products
- C03B27/04—Tempering or quenching glass products using gas
- C03B27/044—Tempering or quenching glass products using gas for flat or bent glass sheets being in a horizontal position
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- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Tunnel Furnaces (AREA)
- Heat Treatment Of Articles (AREA)
- Furnace Housings, Linings, Walls, And Ceilings (AREA)
- Furnace Details (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
This invention is to develop a heat treatment device for arranging a work in a heat treatment chamber at an efficient pitch, and efficiently heat-treating a large quantity of works. This article heat treatment device 1 has a heat treatment tank 2, and has an article heat treatment chamber 11 inside. An opening-closing part 25 is arranged on the front side of the article heat treatment chamber 11 for carrying in or carrying out an article. The opening-closing part 25 constitutes a surface by vertically laminating a plurality of long size opening-closing pieces 26. The long size opening-closing pieces 26 form a hollow cylindrical shape, and are lacking in opposed two surfaces. When rotating the long size opening/closing pieces 26, the opening-closing part 25 opens.
Description
Technical field
The present invention relates to the article annealing device.Article annealing device of the present invention is applicable to and various materials of various electric, electronic installations, its part etc. are placed the temperature of regulation or carries out the test of its thermotolerance or low temperature resistance etc. or carry out the purposes of desirable heat treated.Article annealing device of the present invention can be applicable to for example glass substrate of LCD (Liquid Crystal Display LCD) and the aging test of thermal treatment or semiconductor article.
In addition, the invention still further relates to that inside has article storing portion and has the device that is used for moving into or taking out of to the incorporating section switch portion of article as the article annealing device.
Background technology
The electronic installation of LCD or integrated circuit component etc. is widely used in electric product.
And these electronic installations have the operation of heat-treating in manufacturing process and The test procedure.For example LCD will be carried out the thermal treatment of glass substrate in manufacturing process.In integrated circuit component, be known as the test of aging test in addition, in this aging test process, heat-treat.
The thermal treatment of above-mentioned glass substrate or the aging test of integrated circuit all need these members are moved in the article annealing device and carry out.As the article annealing device, open in 2000-169169 number disclosed content for known with the spy at Japanese kokai publication hei 6-317514 number.
In these article annealing devices, portion is provided with the thermal chamber that is covered by thermal insulation material within it.In the article annealing device, also be provided with and be used for the switch portion that workpiece is put in the taking-up of heat treated chamber.Be provided with the mounting frame of mounting article in article annealing device inside.
Here known, the structure with door that above-below direction moves is arranged in the switch portion of the article annealing device of prior art and have structure with the door of hinge swing.In being arranged at the article mounting frame of article annealing device inside, have fixed and structure lift.
That is, a kind of switch portion that adopts in the article annealing device of prior art is provided with guide in the one side of article handling device, and door moves up and down along this guide.For example aforementioned spy opens and promptly adopts this structure in 2000-169169 number.
Another kind of formation is that at a distolateral hinge that is provided with of door, door is a spot wobble, switch with this hinge.
In the article annealing device, to run out of for preventing the internal heat air, the door of switch portion designs as far as possible for a short time.
That is, the operating efficiency when putting into article as paying attention in device, taking out, preferably the door of switch portion is to be equivalent to the such big structure of thermal chamber size.But, the Men Yueda of switch portion, inter-process gas or spill or outer gas cut is gone into, the air themperature of inner sustain regulation is difficult more.
Therefore, in this article annealing device, the door of switch portion will design for a short time as far as possible.
In the former spy opens flat 6-317514 number disclosed formation, lift article mounting frame is set in thermal chamber inside, lifting mounting frame side makes the mounting frame move to the height of switch portion, with suitable spacing mounting workpiece on the mounting frame.
In the latter's spy opens 2000-169169 number disclosed formation, with small-sized door along a plurality of arrangements of short transverse, from each to being arranged at mounting workpiece on the inner article mounting frame.
But, increased and the influence of maximizing by requirement such as LCD in recent years, the workpiece of heat-treating increases to big workpiece on existing basis.Therefore, the former constitutes the formation that crane is set in thermal chamber inside like that in this way, and crane needs sizable structure, and is restricted in the design, can not bring into play sufficient performance.
On the one hand, as adopting constituting of the fixed mounting frame of the latter and small-sized and a plurality of,, the shortcoming that can not dispose workpiece with effective spacing in process chamber is arranged because there is the interference width each other in the switch door.
That is, open disclosed formation in 2000-169169 number,, have lower limit aspect cylinder height or the stroke naturally, just difficulty relatively of peristome is set with desirable spacing though have door by the cylinder lifting the latter's spy.
In addition, adopt if replace the switch portion of lift baffle-type door situation too, Men Shimen self thickness of opening baffle-type has become the interference size, the spacing of the workpiece in the thermal chamber becomes too wide.The door that promptly uses in this device is because built-in thermal insulation material and thickening.In addition, be used to make the hinge mounting parts width of a swing also to broaden, be difficult to dwindle the spacing of configuration workpiece.
The present invention promptly is the problems referred to above that are conceived to prior art, and its purpose is to develop effectively spacing and disposes workpiece, the efficient annealing device of a large amount of workpiece of thermal treatment in thermal chamber.And provide the scheme of device with the incorporating section that can solve above-mentioned same problem.
Summary of the invention
In order to solve above-mentioned problem, the article annealing device of first invention has thermal chamber in inside, and has a switch portion that is used for moving into or taking out of article to this thermal chamber, it is characterized in that, aforementioned switches portion, it is the structure of the stacked formation face of a plurality of microscler switch plates, each microscler switch plate is when the surface has the curved surface that roughly is circular-arc, axle that can length direction rotates for the center, and it is notch geometry that microscler switch plate disturbs the position mutually with the rotational trajectory that the aforementioned curved surface of adjacent microscler switch plate is described.
In article annealing device of the present invention, switch portion has adopted by the stacked structure that constitutes face of a plurality of microscler switch plates.
Microscler switch plate is when the surface has the curved surface that roughly is circular-arc, and axle that can length direction rotates for the center.In addition, microscler switch plate is a notch geometry with the position that rotational trajectory that the aforementioned curved surface of adjacent microscler switch plate is described disturbs mutually.Therefore, each microscler switch plate can rotate with adjacent microscler switch plate interference-free.
As previously mentioned, owing to jagged part on microscler switch plate, when microscler switch plate rotated to predetermined angular, this barbed portion was communicated with inside and outside thermal chamber.That is, the switch portion that is used for moving into or take out of article in the heat treated chamber in opened condition.
On the other hand, be short of under the situation of the anglec of rotation that partly is positioned at exterior side or inner face side when the surface is non-, switch portion is closed condition.
The article annealing device of second invention has thermal chamber in inside, and has switch portion from article to this thermal chamber that move into or take out of; It is characterized in that aforementioned switches portion is by the stacked structure that constitutes face of a plurality of microscler switch plates, each microscler switch plate surface has the convex face, and axle that simultaneously can length direction rotates for the center; The rotational trajectory of the rotational trajectory of microscler switch plate and adjacent microscler switch plate repeats; And, microscler switch plate and the position shortcoming that the rotational trajectory that the aforementioned convex face of adjacent microscler switch plate is described disturbs mutually, when making microscler switch plate rotation special angle, aforementioned convex face can be invaded in the rotational trajectory of adjacent microscler switch plate.
In article annealing device of the present invention, also be to adopt switch portion by the stacked structure that constitutes face of a plurality of microscler switch plates.
Microscler switch plate surface has the convex face, can longitudinal axis be the center rotation simultaneously.In addition in the present invention, also be microscler switch plate at the position of disturbing mutually with rotational trajectory that the convex face of adjacent microscler switch plate is described be notch geometry.Therefore, each microscler switch plate can rotate with adjacent microscler switch plate interference-free.
In addition, also be in the present invention when microscler switch plate rotates to predetermined angular, barbed portion is communicated with inside and outside the thermal chamber, and the switch portion that is used for moving into or take out of article in the heat treated chamber is in opened condition.
In article annealing device of the present invention, microscler switch plate rotates to the special angle switch portion in opened condition the time, and the convex face is invaded in the rotational trajectory of adjacent microscler switch plate.Therefore, from having eliminated the thickness loss of switch block in fact, can make the bigger scope ground switch of switch portion.
The article annealing device of the 3rd invention, has thermal chamber in inside, and has a switch portion that is used for moving into or taking out of article to this thermal chamber, it is characterized in that, aforementioned switches portion is by the stacked structure that constitutes face of a plurality of microscler switch plates, each microscler switch plate has a pair of containment wall in the face of configuration, can be the center rotation with the axle of length direction with adjacent microscler switch plate interference-free simultaneously.
In article annealing device of the present invention, its switch portion also is to adopt by the stacked structure that constitutes face of a plurality of microscler switch plates.
In article annealing device of the present invention, microscler switch plate has a pair of containment wall in the face of configuration.Microscler switch plate can be the center rotation with the axle of length direction with adjacent microscler switch plate interference-free.
In article annealing device of the present invention, because microscler switch plate has a pair of containment wall in the face of configuration, when being in the situation that this containment wall is positioned at the anglec of rotation of exterior side and inner face side, switch portion becomes closed condition.
On the other hand, when containment wall slightly is the almost parallel state to the line that links exterior side and inner face side, is used for the heat treated chamber and moves into or take out of the switch portion of article and become open mode.
The 4th invention is in the first～three invention in each article annealing device of putting down in writing, it is characterized in that, microscler switch hole is a hollow cylindrical, two shortcomings facing, when two during of the aforementioned shortcoming that makes microscler switch plate, be communicated with inside and outside the thermal chambers by these two towards the inward-outward direction of thermal chamber; When the barrel surface that makes microscler switch plate during towards the inward-outward direction of thermal chamber, the inside and outside crested of thermal chamber.
Here, so-called hollow cylindrical is meant the meaning of the general cylindrical shape shape that has blank part in inside, and the interior void shape may not all be a column.
In article annealing device of the present invention, microscler switch plate is a hollow circle tube, two shortcomings facing, and therefore, two of microscler switch plate can be communicated with.Therefore, when two during towards the incorporating section inward-outward direction of the aforementioned shortcoming that makes microscler switch plate, by being communicated with inside and outside these two thermal chambers, switch portion becomes open mode.
On the other hand, when the barrel surface that makes microscler switch plate during towards the inward-outward direction of incorporating section, the inside and outside crested of thermal chamber, switch portion becomes closed condition.
The 5th invention is in each article annealing device of putting down in writing in the first～three invention, to it is characterized in that establish article mounting frame in thermal chamber inside, this article mounting frame has multilayer, and its height is corresponding to the position of microscler switch plate.
In article annealing device of the present invention, at the inner article mounting frame that is provided with of thermal chamber with multilayer.And the height of article mounting rack-layer is corresponding to the position of microscler switch plate.Therefore, if microscler switch plate is rotated to the open position switch portion when opening, the layer place of frame is positioned at the height at the position that is opening.Therefore, the workpiece of heat treated chamber moves into easily.
The 6th invention is in each article annealing device of putting down in writing in the first～three invention, it is characterized in that, part for microscler switch plate, during the state of the inside and outside crested by microscler switch plate thermal chamber, on position, the rubber-like containment member is set near adjacent microscler switch plate.
In article annealing device of the present invention, be the part of microscler switch plate, at position the rubber-like containment member is set near adjacent microscler switch plate.Therefore, when microscler switch plate was in closed condition, containment member was positioned at microscler switch plate each other, can improve the mutual impermeability of microscler switch plate.When microscler switch plate is rotated, though the situation that exists containment member and microscler switch plate to disturb mutually is because containment member of the present invention has elasticity, when microscler switch plate is rotated, support last containment member as microscler switch plate, containment member is the elastic force disengagement of self reliably.Obstacle when therefore, containment member can not become the rotation of microscler switch plate.
The 7th invention is about having the device of incorporating section, and this incorporating section has with above-mentioned respectively invents roughly the same action effect.This device is inner to have the incorporating section of taking in article, and has the switch portion that is used for moving into or taking out of to this incorporating section article; It is characterized in that aforementioned switches portion constitutes planar structure by a plurality of microscler switch plates are stacked, two shortcomings that each microscler switch plate is hollow cylindrical, face, and also the axle that each microscler switch plate can length direction rotates for the center; When two during towards the inward-outward direction of incorporating section, of the aforementioned shortcoming that makes microscler switch plate by the inside and outside connection of these two incorporating sections; When the barrel surface that makes microscler switch plate during towards the inward-outward direction of incorporating section, the inside and outside crested of incorporating section.
In the device with incorporating section of the present invention, the same with aforementioned first, second invention, switch portion has adopted by the stacked structure that constitutes face of a plurality of microscler switch plates.
In device of the present invention, microscler switch plate is a hollow cylindrical, two shortcomings facing.Therefore, when two during towards the incorporating section inward-outward direction of the aforementioned shortcoming of microscler switch plate, by the inside and outside connection of these two incorporating sections, switch portion becomes open mode.
On the other hand, when the barrel surface of microscler switch plate during towards the inward-outward direction of incorporating section, the inside and outside crested in incorporating section, switch portion becomes closed condition.
Description of drawings
Fig. 1 is the article annealing device stereographic map of the embodiment of the invention.
Fig. 2 is the article annealing device front elevation of Fig. 1.
Fig. 3 is the article annealing device top plan view of Fig. 1.
Fig. 4 is the article annealing device side view of Fig. 1.
Fig. 5 is the amplification stereogram of the article annealing device switch portion of Fig. 1, expression switch portion closing state.
Fig. 6 is the amplification stereogram of the article annealing device switch portion of Fig. 1, the state that the expression switch portion is opened.
Fig. 7 (a) is the sectional view of article annealing device switch portion of Fig. 1 of switch portion closed condition; (b) be the sectional view of article annealing device switch portion of Fig. 1 of switch portion open mode; (c) be the key diagram of the end face of the microscler switch plate of expression.
Fig. 8 is the local amplification front elevation of the article annealing device drive part of Fig. 1.
Fig. 9 is the local enlarged side view of the article annealing device drive part of Fig. 1.
Figure 10 represents the article annealing device of second embodiment of the invention; (a) be the sectional view of the article annealing device switch portion of switch portion closed condition; (b) be the sectional view of the article annealing device switch portion of switch portion open mode; (c) be the key diagram of the microscler switch plate end face of expression.
Figure 11 is the containment member stereographic map that adopts in the article annealing device shown in Figure 10.
Figure 12 is the amplification stereogram of the switch portion that adopts in the third embodiment of the invention article annealing device; Expression switch portion closing state.
Figure 13 (a) is the sectional view of article annealing device switch portion of Figure 12 of switch portion closed condition; (b) be the sectional view of article annealing device switch portion of Figure 12 of switch portion open mode; (c) be the key diagram of the microscler switch plate end face of expression.
Figure 14 is the amplification stereogram of the switch portion that adopts in the article annealing device of third embodiment of the invention; Expression switch portion closing state.
Figure 15 (a) is the sectional view of article annealing device switch portion of Figure 14 of switch portion closed condition; (b) be the sectional view of article annealing device switch portion of Figure 14 of switch portion open mode; (c) be the key diagram of the end face of the microscler switch plate of expression.
Embodiment
Bottom further specifies embodiments of the invention.
Fig. 1 is the stereographic map of the article annealing device of the embodiment of the invention.Fig. 2 is the article annealing device front elevation of Fig. 1.Fig. 3 is the top plan view of the article annealing device of Fig. 1.Fig. 4 is the side view of the article annealing device of Fig. 1.Fig. 5 is the amplification stereogram of switch portion of the article annealing device of Fig. 1, is depicted as the switch portion closing state.Fig. 6 is the switch portion amplification stereogram of the article annealing device of Fig. 1, is depicted as the state that switch portion is opened.Fig. 7 (a) is the sectional view of switch portion of article annealing device of Fig. 1 of switch portion closed condition; Fig. 7 (b) is the sectional view of switch portion of article annealing device of Fig. 1 of switch portion open mode; Fig. 7 (c) is the key diagram of the end face of the microscler switch plate of expression.Fig. 8 is the local amplification front elevation of the article annealing device drive part of Fig. 1.Fig. 9 is the local enlarged side view of the article annealing device drive part of Fig. 1.
In the drawings, the 1st, the article annealing device of the embodiment of the invention.Article annealing device 1 of the present invention, outer shape is a cube, its inside is provided with heat treatment groove 2.Heat treatment groove 2 is the spaces that fenced up by adiabatic wall equally with known heat treatment groove.Particularly, heat treatment groove 2 is by 5 spaces that adiabatic wall surrounds except that the front.Be that heat treatment groove 2 has top wall 5, underside wall 6, back face wall 7 and left and right side 8,9, wherein any one all is to be made by thermal insulation material.
In the face side of heat treatment groove 2, be provided with the lower face wall of aspect ratio 10 (Fig. 4).Face wall 10, it is low to compare with the overall height of heat treatment groove 2, and promptly the face side major part of heat treatment groove 2 does not have wall.
The inside of heat treatment groove 2 is split into article thermal chamber 11 substantially and supplies with circulation portions 12 with gas.Promptly disposing filtrator 13, leaving the 80cm left and right sides height and position of underside wall 6 again in heat treatment groove 2 inside, bottom surface member 15 (Fig. 4) is being set at heat treatment groove 2 inner inboard position wall-forming shapes.In face side (open side) two side portions nearby of article thermal chamber 11, the upright aspiration column 4 of establishing.And on bottom surface member 15, establish not shown opening.
The space that 15 of underside wall 6 and bottom surface members and filtrator 13 and back face wall are 7 is supplied with circulation portions 12 as gas and is played a role.
In addition, top wall 5, filtrator 13, left and right side 8,9 and the bottom surface member 15 by heat treatment groove 2 constitutes article thermal chamber 11.
Supply with circulation portions 12 at aforementioned gas and be provided with electric heater 16 and fan 17, inner air is warmed up to the temperature of hope, make this air circulation in article thermal chamber 11, send into high temperature air by fan 17 by electric heater 16.The article thermal chamber is kept high temperature air.
On the other hand, in the inside of article thermal chamber 11, be provided with article mounting frame 20.Article mounting frame 20 has 40 layers of rack-layer 22 altogether.Each rack-layer 22 is made of 3 band-like plates 21 that become cantilever support respectively.
It is 1 group that the rack-layer 22 of article thermal chamber 11 is configured to per 5 layers.That is, 22,5 layers of assortment at certain intervals of rack-layer are being provided with the interval wideer than aforementioned interval with next 5 interlayers.More more specifically say, 5 layers the rack-layer 22 from top to the, with certain interval assortment, wideer than aforementioned interval from the 5th layer to the 6th layer interval.Next, from the 6th layer to the 10th layer with to aforementioned the 5th layer of same arranged spaced.Equally, the interval from the 10th layer to 11th layer is wideer than interval in front again, from the interval of 15 layers of 11th layers to the again with identical to the 5th layer interval.
Each group height of the rack-layer 22 of article thermal chamber 11, highly consistent with each of the microscler switch plate 26 of switch portion 25 described later.
Face side at article thermal chamber 11 does not have adiabatic wall, but is provided for moving into or taking out of to article thermal chamber 11 switch portion 25 of article.Promptly as previously mentioned, the face wall 10 of heat treatment groove 2 is lower with the overall height of heat treatment groove, and the face side of article thermal chamber 11 does not have adiabatic wall.But switch portion 25 is set in the face side of article thermal chamber 11.
In the switch portion 25 that the face side of article thermal chamber 11 is provided with, be distinctive formation in the present embodiment, be described in detail as follows.
In the article annealing device 1 of present embodiment, switch portion 25 is the gather into folds structures of formation face of a plurality of microscler switch plate 26 longitudinal layers as shown in Figure 1.
And, microscler switch plate 26, two shortcomings facing.
That is, microscler switch plate 26 (is clear and definite its characteristic, makes the thick of wall ratio reality) as shown in Figure 7, has peripheral part, is provided with end- face wall 30,31 at the two ends of length direction.
The peripheral part of microscler switch plate 26 has the outside wall portions of being cut apart by notch part 32,33 27,28.The shape of outside wall portions 27,28 is columnar parts, is the fan-shaped arc surface that has.The shape of outer wall 27,28 can be described as the face of convex laterally.
At the peripheral part of microscler switch plate 26, be provided with foregoing angle θ and be the notch part 32,33 (Fig. 7) about 80 °～90 °.The mutual alignment of two notch parts 32,33 becomes rotational symmetry.Any one all strides across length direction region-wide of microscler switch plate 26 two notch parts 32,33.
Thereby, the transversal section trim line of microscler switch plate 26, any position is the shape of the part shortcoming of Cheng Yuan all.That is, the transversal section trim line of microscler switch plate 26, circular-arc outside wall portions 27,28 is in axisymmetric position, circular-arc outside wall portions 27,28 mutual partition shortcomings.In other words, microscler switch plate 26 is, in the face of circular-arc a pair of containment wall (outside wall portions 27,28 of convex) is made in configuration.
As sight being transferred to microscler switch plate 26 inside, image pattern 7 portion like that within it is installed with thermal insulation material 35.As be described more specifically, microscler switch plate 26 is fan-shaped, as to have convex arc surface outside wall portions 27,28 as previously mentioned.End face in outside wall portions 27,28 is provided with back veneer member 36 each other.In other words, the inner face side recess of outside wall portions 27,28 is by 36 fillings of back veneer member.And thermal insulation material 35 in filling in the space that is surrounded by outside wall portions 27,28 and back veneer member 36.
Aforementioned back veneer member 36 is banded and roughly is tabular.In addition, the thickness of back veneer member 36 is identical with outside wall portions 27,28, for about 1mm.
The end- face wall 30,31 of microscler switch plate 26 is as Fig. 7 (c) counterweight shape that is shown as.Be end- face wall 30,31, its side face engages with the end face of outside wall portions 27,28, has the convex arc surface 40 with outside wall portions 27,28 same curvature.And scrape out concavity arc surface 41 at the position of the notch part 32,33 that is equivalent to outside wall portions 27,28.
The curvature of the ratio of curvature outside wall portions 27,28 of concavity arc surface 41 is slightly larger.Its reason is to be used to guarantee upward gap of microscler switch plate 26 mutual actions.
For the same reason, the length of concavity arc surface 41 is also longer slightly than the length L of the imaginary circular arc 42 of the notch part 32,33 of outside wall portions 27,28.
But both difference is small, and the angle [alpha] of general concavity arc surface 41 equals the angle θ of aforementioned notch part 32,33.
In addition, at the center of the end- face wall 30,31 of microscler switch plate 26 axle 43 is set.
In the article annealing device 1 of present embodiment, switch portion 25 has 8 above-mentioned microscler switch plates 26, with it any one all horizontal arrangement, become at the stacked structure of short transverse.Here, the interval of microscler switch plate 26 (distance between centers) is all short than the diameter of microscler switch plate 26.Promptly in the article annealing device 1 of present embodiment, some is overlapping each other for adjacent microscler switch plate 26, the circular arc of peripheral part.
The axle base of adjacent microscler switch plate 26, be notch part 32,33 at the microscler switch plate 26 that makes a side during towards inward-outward direction, the distance that the concavity arc surface 41 of the end- face wall 30,31 of the opposing party's microscler switch plate 26 and the convex arc surface 40 of an aforementioned side's end- face wall 30,31 roughly match.And actually, be the gap of guaranteeing to move, at the notch part 32,33 that makes the microscler switch plate 26 of a side during towards inward-outward direction, the concavity arc surface 41 of the end- face wall 30,31 of the microscler switch plate 26 of the opposing party, and 40 gaps that are provided with several millimeter of convex arc surface of an above-mentioned side's end- face wall 30,31.
This axle base in addition also is the notch part 32,33 that makes each microscler switch plate 26 when being positioned at above-below direction, the distance that the openend of the notch part 32,33 of adjacent microscler switch plate 26 roughly joins mutually.
The axle 43 at any 1 two ends of above-mentioned 8 microscler switch plates 26 is all rotatably mounted by bearing 45.
Shown in Fig. 1,8,9, be provided with crank 46 on 43 at the axle that is positioned at article annealing device 1 right side.On the crank separately of each microscler switch plate 26, cylinder 47 is installed.Thereby in the article annealing device 1 of present embodiment, by making cylinder 47 flexible, can make microscler switch plate 26 is the center rotation with the axle 43 of length direction.
Bottom illustrates the effect of the article annealing device 1 of present embodiment.
In the article thermal chamber 11 of the article annealing device 1 of present embodiment, under configuration workpiece and the situation, close above-mentioned switch portion 25 to heat treatment of workpieces.
Particularly promptly be, make cylinder 47 stretch, make each microscler switch plate 26 rotation, shown in Fig. 7 (a), roughly become the upright position to stop in whole outside wall portions 27,28 of each microscler switch plate 26.In other words, make the direction of the barrel surface (outside wall portions 27,28) of microscler switch plate 26 towards the inward-outward direction of facing article thermal chamber 11.
Its result, notch part 32,33 is positioned at above-below direction, and this notch part 32,33 is covered by adjacent microscler switch plate 26.Therefore, in the face side of article annealing device, as Fig. 1,5 and Fig. 7 (a), a circular-arc side's of each microscler switch plate 26 outside wall portions 27 wall-forming shapes arranged side by side.
It is each microscler switch plate 26, such as described above, when the notch part 32,33 that makes each microscler switch plate 26 is positioned at above-below direction, because the openend of the notch part 32,33 of adjacent microscler switch plate 26 roughly connects the ground assortment mutually, make the outside wall portions 27 of microscler switch plate 26,28 one-tenth approximate vertical positions, next column ground is arranged side by side on circular-arc side's outside wall portions 27 of each microscler switch plate 26 of face side of article annealing device 1.
Therefore, the inside and outside crested of the outside wall portions 27 article thermal chambers 11 by a side.
In the present embodiment, because the section configuration of microscler switch plate 26 is a symmetric figure, the opposing party's outside wall portions 28 wall-forming shape also arranged side by side in article thermal chamber 11.Therefore, by this side's outside wall portions 28 also can cover article thermal chamber 11 inside and outside.In addition, in the article annealing device 1 of present embodiment,, make inside and outside thermal insulation by the thermal insulation material 35 that is installed on outside wall portions 27,28 by the inside and outside crested of inside and outside outside wall portions 27,28 article thermal chambers 11.Besides, in the present embodiment, at the microscler switch plate 26 inner air layers that form, also can be adiabatic by this air layer.In the present embodiment promptly, in microscler switch plate 26 inside, be provided with air layer each other at back veneer member 36.Therefore, the microscler switch plate 26 that adopts in the present embodiment, its heat-insulating property is higher.
In addition, in the article thermal chamber 11 of the article annealing device 1 of present embodiment, insert under the situation of workpiece, open the microscler switch plate 26 of position of the rack-layer 22 of the hope height that is equivalent to article mounting frame 20.
Specifically, telescopic cylinder 47 makes 26 rotations of specific microscler switch plate.As press Fig. 7 (b), make the microscler switch plate 26b that counts the second layer from the top change 90 °.
In the article annealing device 1 of present embodiment, since microscler switch plate 26 each other in the heart interval, diameter than microscler switch plate 26 is short, as make microscler switch plate 26b change 90 °, roughly be in the cylinder track that circular-arc convex outside wall portions 27,28 enters adjacent microscler switch plate 26a, 26c.But in the article annealing device 1 of present embodiment, in switch portion 25 closed conditions, as previously mentioned, notch part 32,33 is positioned at above-below direction.Thereby switch portion 25 will be opened from closed condition, and when making microscler switch plate 26b change 90 °, any notch part 32,33 of adjacent microscler switch plate 26a, 26c all can be towards the microscler switch plate 26b side opening that will rotate.As illustrating in order to precedent, when making second microscler switch plate 26b change 90 °, the side's of first microscler switch plate 26a notch part 33 is downward, and the side's of the 3rd microscler switch plate 26c notch part 32 upwards.
The diameter of microscler switch plate 26 is all equally big or small, because the axle base that microscler switch plate 26 is mutual, be the notch part 32,33 that makes each microscler switch plate 26 when being positioned at the above-below direction position, the distance that the openend of the notch part 32,33 of adjacent microscler switch plate 26 roughly joins each other, as making microscler switch plate 26b rotation, outside wall portions 27,28 promptly enters in the notch part 32,33 of adjacent microscler switch plate 26a, 26c.
In the present embodiment promptly, microscler switch plate 26 has promptly been dug up with the position that rotational trajectory disturbs mutually having notch part 32,33 with position that rotational trajectory that the curved surface of the outside wall portions 27,28 of adjacent microscler switch plate 26 is described disturbs mutually.In the present embodiment, the rotational trajectory overlaid of the rotational trajectory of microscler switch plate 26 and adjacent microscler switch plate 26, outside wall portions 27,28 bulgings are the notch part 32,33 that the part of convex has entered adjacent microscler switch plate 26.
In the article annealing device 1 of present embodiment, dispose too for the end- face wall 30,31 that is located at the end.That is, the end-face wall 30 of microscler switch plate 26,31 one-tenth counterweight shapes become concavity arc surface 41 in the part of the notch part 32,33 that is equivalent to outside wall portions 27,28, are cut out.
Thereby, in the article annealing device 1 of present embodiment, disturbing the position to be provided with concavity arc surface 41 mutually with rotational trajectory for the end- face wall 30,31 that is located at the end, cut out with the position that rotational trajectory disturbs mutually.
Thereby, in the article annealing device 1 of present embodiment,, can not cause conflict at adjacent microscler switch plate 26a, 26c even make microscler switch plate 26b rotation yet.
As making microscler switch plate 26b change 90 °, outside wall portions 27,28 is stopped in the position that roughly is flat-hand position.In other words, the barrel surface of microscler switch plate 26b (outside wall portions 27,28) becomes in the face of above-below direction.Its result, notch part 32,33 is positioned at face side and article thermal chamber 11 sides, 11 inside and outside connections of article thermal chamber.That is, notch part 32,33 is positioned at face side, 11 inside and outside connections of article thermal chamber.
In the article annealing device 1 of present embodiment, be disposed at the article mounting frame 20 in the article thermal chamber 11, rack-layer 22 per 5 layers be assembly row, each group is in the height that is equivalent to microscler switch plate 26.Therefore, use conveying device not shown in the figures that workpiece is inserted notch part 32,33, as move horizontally workpiece, workpiece promptly is positioned on the desirable rack-layer 22.
Therefore, the article annealing device 1 of present embodiment, accommodating and taking out of article is easily.
In the article annealing device of present embodiment, microscler switch plate 26 is made the rotary-type of relative rotation axi symmetric shape, from lateral shaft under the situation of seeing rotary body, the rotational trajectory of the rotational trajectory by making microscler switch plate 26 up and down and other microscler switch plates 26 up and down overlapping can realize being fixed in the efficient activity of substrate spacing of layer of the mounting frame of article thermal chamber 11 inside. optimization.
Have, microscler switch plate 26 rotational trajectories are overlapping up and down owing to make, and avoided interference, establish the spill cutouts at the rotational trajectory lap, can realize that microscler switch plate 26 mutual spacings dwindle again.
Promptly in microscler switch plate 26 switch portion 25 of rotation when opening, the thick wall part of microscler switch plate 26 (arcuate section that is formed by outside wall portions 27,28 and back veneer member 36) is accommodated in the inside of adjacent microscler switch plate 26 with fitting like a glove.Therefore, from having eliminated the thickness loss of switching member in fact, can make the roughly gamut switch of switch portion 25.
In addition, these microscler switch plate 26 rotary bodies all are to be made of the thin plate sheet metal material about thickness t 1.0mm.The supporting of microscler switch plate 26 is also very simple simultaneously.
And, because microscler switch plate 26 becomes symmetric shape fully because and 26 of the neighbouring microscler switch plates that connects do not have special size restrictions, so can constitute the gate arbitrarily of any number of plies.
In the embodiment of above explanation, make the notch part 32,33 of each microscler switch plate 26 be positioned at above-below direction in opposite directions the time, the openend of the notch part 32,33 of adjacent microscler switch plate 26 roughly connects the ground assortment each other, has guaranteed the thermal insulation of article thermal chamber 11.So, owing in this way can not guarantee under the situation of abundant thermal insulation, or because of the dimensional accuracy relation on making, also have to sometimes to be designed to than the openend of the notch part 32,33 of microscler switch plate 26 big gap each other.
In this case, recommend the such formation of Figure 10.In embodiment shown below, the constituent part identical with the constituent part of previous embodiment gives same-sign and saves repeat specification.
Figure 10 represents other the article annealing device of second embodiment of the present invention, (a) is the article annealing device switch portion sectional view of switch portion closed condition; (b) be the article annealing device switch portion sectional view of switch portion open mode; (c) be the key diagram of the end face of the microscler switch plate of expression.Figure 11 is the stereographic map of the containment member that adopts in the article annealing device shown in Figure 10.
In the switch portion 60 that is adopted in the present embodiment, in microscler switch plate 26 inside, the openend of the notch part 32 of side is provided with containment member 61 at an upper portion thereof.Containment member 61 is the materials with flexible softness as rubber.
The shape of containment member 61 is band shape shown in Figure 11.Containment member 61 is installed on the openend of the notch part 32 of upper side by cementing agent not shown in the figures, riveted joint or screw thread etc., its half expose from this microscler switch plate, enter adjacent microscler switch plate 26 inside.
In the switch portion that is adopted, in microscler switch plate 26 inside, containment member 61 is positioned at the seam portion of adjacent microscler switch plate 26 in the present embodiment, has stopped up microscler switch plate 26 gap each other.Therefore, the microscler switch plate 26 that is adopted in the present embodiment can improve the impermeability of article thermal chamber 11.
In the embodiment shown in fig. 10, though containment member 61 is located at the inner face side of microscler switch plate 26, also can be located at the outer peripheral face side and becomes openend.
In the above-described embodiment, shown microscler switch plate 26 with 2 notch parts 32,33.Promptly in the above-described configuration, be essential structure with the cylindrical shape, 2 notch parts 32,33 are set, make microscler switch plate 26 run through in diametric(al).
In addition, the end- face wall 30,31 of microscler switch plate 26 is made counterweight shape.
Above-mentioned formation only being provided with notch part 32,33 with position that rotational trajectory that the curved surface of the outside wall portions 27,28 of adjacent microscler switch plate 26 is described disturbs mutually, only makes the position of disturbing mutually with rotational trajectory become to cut out shape.
In addition, in the above-described embodiments, the end- face wall 30,31 that is located at the end is made counterweight shape,, also only becoming to cut out shape with position that rotational trajectory disturbs mutually with regard to end- face wall 30,31.
But rotational trajectory is necessary not consistent with the shape that cuts out the position, and it is enough so long as disturb the position to become the shortcoming shape mutually with rotational trajectory.
Such as also adopting Figure 12, as shown in Figure 13 microscler switch plate 63.
That is, Figure 12 is the switch portion amplification stereogram that is adopted in the article annealing device of third embodiment of the invention, expression be the closed condition of switch portion.Figure 13 (a) is the sectional view of switch portion of article annealing device of Figure 12 of switch portion closed condition; (b) be the sectional view of switch portion of Figure 12 article annealing device of switch portion open mode; (c) be the key diagram of the microscler switch plate end face of expression.
Being the microscler switch plate 63 shown in Figure 12,13, only is that single face has the planar convex surface of circular arc.For the formation of present embodiment, microscler switch plate, can be described as the position that the rotational trajectory described with the curved surface of adjacent microscler switch plate disturbs mutually is notch geometry.
The microscler switch plate 26 that is adopted in the aforementioned embodiment, arbitrary outside wall portions 27,28 all is an arc surface, but may not be arc surface entirely.Outside wall portions also can be the structure with arc surface and planar portions such shown in Figure 14,15.
That is, Figure 14 is the switch portion amplification stereogram that third embodiment of the invention article annealing device is adopted, and has represented the closed condition of switch portion.Figure 15 (a) is the sectional view of switch portion of article annealing device of Figure 14 of switch portion closed condition; (b) be the sectional view of switch portion of article annealing device of Figure 14 of switch portion open mode; (c) be the end face key diagram of the microscler switch plate of expression.
In the switch portion amplification stereogram shown in Figure 14,15, outside wall portions 66,67 has planar portions 69 at central part.As more specifically explanation, outside wall portions 66 is made of the face of convex circular arc face 68, planar portions 69 and circular arc face 70.
The shape of microscler switch plate, can be shown in Figure 14,15 have planar section like that, but from the viewpoint of the slyness of guaranteeing impermeability and rotation, at the nearby part of notch part 32,33 arc surface preferably.
As the microscler switch plate of main composition of the present invention,, also can be widely used in inside and have article storing portion, and have device from the switch portion of article to the incorporating section that move into or take out of though be that purpose is developed to be used for the article annealing device.
As described above, article annealing device of the present invention has adopted the stacked structure that constitutes face of a plurality of microscler switch plates in the switch portion.
In article annealing device of the present invention,, can make microscler switch plate switch one by one by making microscler switch plate rotation.
Therefore article annealing device of the present invention has effectively that spacing disposes workpiece in thermal chamber, efficiently the effect of a large amount of workpiece of thermal treatment.
Claims (7)
1. article annealing device, this article annealing device has thermal chamber in inside, and has the switch portion that is used for moving into or taking out of to this thermal chamber article; It is characterized in that, aforementioned switches portion is the structure of the stacked formation face of a plurality of microscler switch plates, each microscler switch plate is when the surface has the curved surface that roughly is circular-arc, axle that can length direction rotates for the center, and, microscler switch plate, disturbing the position mutually with rotational trajectory that the aforementioned curved surface of adjacent microscler switch plate is described is notch geometry.
2. article annealing device, this article annealing device has thermal chamber in inside, and has the switch portion that is used for moving into or taking out of to this thermal chamber article; It is characterized in that aforementioned switches portion is by the stacked structure that constitutes face of a plurality of microscler switch plates, each microscler switch plate is when the surface has the face of convex, and axle that can length direction rotates for the center; The rotational trajectory of the rotational trajectory of microscler switch plate and the microscler switch plate of adjacency repeats; And microscler switch plate disturbs the position shortcoming mutually with the rotational trajectory that the aforementioned convex face of the microscler switch plate of adjacency is described; When making microscler switch plate go to specific angle, in the rotational trajectory of the microscler switch plate of aforementioned convex face intrusion adjacency.
3. article annealing device, this article annealing device has thermal chamber in inside, and has the switch portion that is used for moving into or taking out of to this thermal chamber article; It is characterized in that aforementioned switches portion is by the stacked structure that constitutes face of a plurality of microscler switch plates, each microscler switch plate has a pair of containment wall in the face of configuration, simultaneously can be irrelevant with adjacent microscler switch plate be the center rotation with the axle of length direction with disturbing.
4. as each described article annealing device in the claim 1～3, it is characterized in that, microscler switch plate is a hollow cylindrical, two shortcomings facing, when two of the aforementioned shortcoming that makes microscler switch plate is communicated with thermal chambers during towards the inward-outward direction of thermal chamber by these two inside and outside, when the barrel surface that makes microscler switch plate during towards the inward-outward direction of thermal chamber, the inside and outside crested of thermal chamber.
5. as each described article annealing device in the claim 1～3, it is characterized in that be provided with article mounting frame in thermal chamber inside, this article mounting frame has multilayer, its height is corresponding to the position of microscler switch plate.
6. as each described article annealing device in the claim 1～3, it is characterized in that, part for microscler switch plate, when the sealing member is located at by the state of crested inside and outside the microscler switch plate thermal chamber, with the approaching position of adjacent microscler switch plate on the rubber-like containment member is set.
7. the device with incorporating section has the incorporating section of taking in article in inside, and has the switch portion that is used for moving into or taking out of to this incorporating section article; It is characterized in that, aforementioned switches portion constitutes planar structure by a plurality of microscler switch plates are stacked, each microscler switch plate becomes hollow cylindrical, in the face of two shortcomings, and, each microscler switch plate can length direction axle be the center rotation, when two during towards the incorporating section inward-outward direction, inside and outside these two connection incorporating sections of the aforementioned shortcoming that makes microscler switch plate; When the barrel surface that makes microscler switch plate during towards the inward-outward direction of incorporating section, the inside and outside crested in incorporating section.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP097221/2002 | 2002-03-29 | ||
| JP2002097221A JP2003294373A (en) | 2002-03-29 | 2002-03-29 | Article heat treatment device and device having housing part |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1450346A true CN1450346A (en) | 2003-10-22 |
| CN1237335C CN1237335C (en) | 2006-01-18 |
Family
ID=28786211
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB021278679A Expired - Fee Related CN1237335C (en) | 2002-03-29 | 2002-08-13 | Article heat treatment device and device having holden |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2003294373A (en) |
| KR (1) | KR20030078596A (en) |
| CN (1) | CN1237335C (en) |
| TW (1) | TW593177B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103438710A (en) * | 2009-03-18 | 2013-12-11 | 光洋热***株式会社 | Substrate processing system |
-
2002
- 2002-03-29 JP JP2002097221A patent/JP2003294373A/en active Pending
- 2002-07-26 KR KR1020020044079A patent/KR20030078596A/en not_active Application Discontinuation
- 2002-07-31 TW TW091117167A patent/TW593177B/en not_active IP Right Cessation
- 2002-08-13 CN CNB021278679A patent/CN1237335C/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103438710A (en) * | 2009-03-18 | 2013-12-11 | 光洋热***株式会社 | Substrate processing system |
| CN103438710B (en) * | 2009-03-18 | 2015-06-24 | 光洋热***株式会社 | Substrate processing system |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20030078596A (en) | 2003-10-08 |
| CN1237335C (en) | 2006-01-18 |
| TW593177B (en) | 2004-06-21 |
| JP2003294373A (en) | 2003-10-15 |
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