CN1441091A - Laser seed crystal centering method for top seed crystal process of growing crystal - Google Patents

Laser seed crystal centering method for top seed crystal process of growing crystal Download PDF

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Publication number
CN1441091A
CN1441091A CN 02104315 CN02104315A CN1441091A CN 1441091 A CN1441091 A CN 1441091A CN 02104315 CN02104315 CN 02104315 CN 02104315 A CN02104315 A CN 02104315A CN 1441091 A CN1441091 A CN 1441091A
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China
Prior art keywords
seed crystal
crystal
seed
speculum
growing
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CN 02104315
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Chinese (zh)
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CN1308501C (en
Inventor
吴喜泉
吴少凡
李敢生
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Fujian Castech Crystals Inc
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Fujian Institute of Research on the Structure of Matter of CAS
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Priority to CNB021043159A priority Critical patent/CN1308501C/en
Publication of CN1441091A publication Critical patent/CN1441091A/en
Application granted granted Critical
Publication of CN1308501C publication Critical patent/CN1308501C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

Laser beam with high orientation and high brightness is used in enlarging and correcting the deviation of seed crystal. One laser beam is made to irritate the head of seed crystal, and the position of reflected spot on reference wall is observed via the reflector. The seed crystal rod is turned and regulated to as to make the position of the reflected spot unchanged and to center the seed crystal.

Description

The laser alignment method of seed crystal during with the top-seeded solution growth growing crystal
The laser alignment method of seed crystal during with the top-seeded solution growth growing crystal belongs to crystalline material preparation, particularly the seed crystal treatment process in the crystal growth.
The laser alignment method of seed crystal during with the top-seeded solution growth growing crystal, the growth of many functional crystals industrialization day by day.Increase the crystalline size, can reduce its production cost, enlarge its range of application.But most crystalline anisotropy is obvious, if seed crystal depart from crystallographic axes to, then crystal the growth one segment length after, just asymmetric growth can occur, on one side toward foreign minister's (being referred to as " long pin "), the other side takes in, develop into situation about pulling gradually, influence the crystalline size.If seed crystal centering is better, will reduce the probability of asymmetric growth.
For example in the growth of large size yttrium vanadate crystal, axially bigger if seed crystal departs from c, then after one section of the crystal growth, crystal may have grown into the shape of " peaked cap ", makes the crystalline availability reduce greatly.In crystal growths such as YCOB, GdCOB, BBO, LBO, there is similar situation equally.These examples have all illustrated the importance of seed crystal centering.
Traditional seed crystal centering method is to utilize a paper that is decorated with the circle of the similar size of seed crystal head, by visual inspection and manual regulation, guarantees that seed crystal head when rotating is at circle inside-paint arc, reaches the purpose of centering seed crystal.The limitation of this way is the direct viewing that only relies on naked eyes, even experienced operator also have the error of 1-2 degree, may reach the 4-5 degree in the ordinary course of things, especially when the length of seed crystal is short.
The laser alignment method of seed crystal during with the top-seeded solution growth growing crystal, its purpose is to use character such as laser direction is good, brightness height, and departing from of seed crystal direction amplified, corrects, and departs from thereby reach to proofread and correct, and improves the precision of seed crystal centering.
The present invention requires to place the direction of growth of the seed crystal (1) on the seed crystal stalk (2) that cleavage surface is preferably arranged, and for the crystal that does not have direction of growth cleavage surface, requires seed crystal (1) head is polished, and makes it can reflect He-Ne laser (4) preferably.Specifically, exactly He-Ne light (4) is shone seed crystal (1) head by speculum (3), through the light of head reflection again through speculum (3) reflection, its hot spot (5) a certain position that falls on the wall.
If when rotating seed crystal, flare will remain in certain scope.We judge the precision of seed crystal (1) centering according to the size of this scope and seed crystal (1) distance from wall (5).Theoretically, if guarantee the seed crystal flare 5 meters to go up the picture radius with reference to wall (5) be 10 centimetres circular arc, the direction that seed crystal (1) then is described departs from and is controlled in 15 minutes.
The laser alignment method of seed crystal during with the top-seeded solution growth growing crystal, the synoptic diagram of the laser alignment method of seed crystal when accompanying drawing is the top-seeded solution growth crystal growth, wherein: (1) is seed crystal; (2) be seed rod; (3) be speculum; (4) be the He-Ne laser beam; (5) be with reference to wall.
The laser alignment method of seed crystal during with the top-seeded solution growth growing crystal, this invention can be applied to the seed crystal centering of most crystal growths.
Be example with centering a axle yttrium vanadate crystal seed crystal now, laser seed crystal centering comprises following step:
1. earlier seed crystal (1) head is artificially broken out a cleavage surface, in the seed rod (2) of packing into then, and seed rod (2) and single crystal growing furnace connected;
2. speculum (3) is placed on the correct position of seed rod (2) bottom, makes it can reflect He-Ne light (4) at a distance;
3. He-Ne light (4) is shone on seed crystal (1) head by speculum (3), reflex on the wall through speculum (3), the correct position of hot spot can be realized by rotating speculum (3);
4. rotate also and adjust seed rod (2) every now and then, make with reference to the picture of the hot spot on the wall (5) arc not exceed desired scope, seed crystal (1) has finished with regard to centering like this;

Claims (2)

1. the laser alignment method of seed crystal during with the top-seeded solution growth growing crystal, it is characterized in that: this method is taked following steps:
1) earlier seed crystal (1) head is artificially broken out a cleavage surface, in the seed rod (2) of packing into then, and seed rod (2) and single crystal growing furnace connected;
2) speculum (3) is placed on the correct position of seed rod (2) bottom, makes it can reflect He-Ne light (4) at a distance;
3) He-Ne light (4) is shone on seed crystal (1) head by speculum (3), reflex on the wall through speculum (3), the correct position of hot spot is realized by rotating speculum (3);
4) rotation is also adjusted seed rod (2) every now and then, makes with reference to the picture of the hot spot on the wall (5) arc not exceed desired scope.
2. the laser alignment method of seed crystal during with the top-seeded solution growth growing crystal as claimed in claim 1, it is characterized in that: described seed crystal (1) then requires the head of seed crystal (1) is polished if do not grow cleavage surface.
CNB021043159A 2002-02-25 2002-02-25 Laser seed crystal centering method for top seed crystal process of growing crystal Expired - Fee Related CN1308501C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB021043159A CN1308501C (en) 2002-02-25 2002-02-25 Laser seed crystal centering method for top seed crystal process of growing crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB021043159A CN1308501C (en) 2002-02-25 2002-02-25 Laser seed crystal centering method for top seed crystal process of growing crystal

Publications (2)

Publication Number Publication Date
CN1441091A true CN1441091A (en) 2003-09-10
CN1308501C CN1308501C (en) 2007-04-04

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103882529A (en) * 2012-12-21 2014-06-25 有研光电新材料有限责任公司 Adjustment method and device for aligning seed crystals in crystal growing furnace with crucible
CN108203841A (en) * 2016-12-20 2018-06-26 有研半导体材料有限公司 A kind of method for improving shouldering success rate in zone-melted silicon single crystal growth course
CN109023512A (en) * 2018-08-29 2018-12-18 上海新昇半导体科技有限公司 Long crystal furnace check system and long crystal furnace method of calibration
CN111893562A (en) * 2020-08-14 2020-11-06 内蒙古中环领先半导体材料有限公司 Single crystal furnace pulling head calibration device and calibration method
CN112160023A (en) * 2020-10-09 2021-01-01 西安奕斯伟硅片技术有限公司 Method and system for centering seed crystal rotating rod and crucible rotating base
CN115574796A (en) * 2022-11-18 2023-01-06 浙江晶盛机电股份有限公司 Centering calibration device and centering calibration method
CN115574744A (en) * 2022-11-18 2023-01-06 浙江晶盛机电股份有限公司 Centering calibration device and centering calibration method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2625310B2 (en) * 1991-01-08 1997-07-02 シマテク,インコーポレイテッド Method and apparatus for manufacturing silicon wafer
US5133829A (en) * 1991-01-08 1992-07-28 Sematech, Inc. Single wafer regrowth of silicon
JPH11268990A (en) * 1998-03-20 1999-10-05 Denso Corp Production of single crystal and production device
JP3700490B2 (en) * 1999-09-09 2005-09-28 三菱住友シリコン株式会社 Seed crystal holding device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103882529A (en) * 2012-12-21 2014-06-25 有研光电新材料有限责任公司 Adjustment method and device for aligning seed crystals in crystal growing furnace with crucible
CN108203841A (en) * 2016-12-20 2018-06-26 有研半导体材料有限公司 A kind of method for improving shouldering success rate in zone-melted silicon single crystal growth course
CN108203841B (en) * 2016-12-20 2020-07-10 有研半导体材料有限公司 Method for improving shouldering success rate in growth process of zone-melting silicon single crystal
CN109023512A (en) * 2018-08-29 2018-12-18 上海新昇半导体科技有限公司 Long crystal furnace check system and long crystal furnace method of calibration
CN109023512B (en) * 2018-08-29 2020-07-17 上海新昇半导体科技有限公司 Crystal growth furnace calibration system and crystal growth furnace calibration method
CN111893562A (en) * 2020-08-14 2020-11-06 内蒙古中环领先半导体材料有限公司 Single crystal furnace pulling head calibration device and calibration method
CN111893562B (en) * 2020-08-14 2023-06-09 内蒙古中环领先半导体材料有限公司 Calibration device and calibration method for single crystal furnace pull head
CN112160023A (en) * 2020-10-09 2021-01-01 西安奕斯伟硅片技术有限公司 Method and system for centering seed crystal rotating rod and crucible rotating base
CN115574796A (en) * 2022-11-18 2023-01-06 浙江晶盛机电股份有限公司 Centering calibration device and centering calibration method
CN115574744A (en) * 2022-11-18 2023-01-06 浙江晶盛机电股份有限公司 Centering calibration device and centering calibration method
CN115574744B (en) * 2022-11-18 2023-03-10 浙江晶盛机电股份有限公司 Centering calibration device and centering calibration method

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Owner name: FUJIAN FUJING SCIENCE CO., LTD.

Free format text: FORMER OWNER: FUJIAN INST. OF MATTER STRUCTURE, CHINESE ACADEMY OF SCIENCES

Effective date: 20081010

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Effective date of registration: 20081010

Address after: Fuzhou City, Fujian Province, Yangqiao Road No. 155

Patentee after: Fujian Castech Crystals, Inc.

Address before: Xihe River, Fuzhou, Fujian

Patentee before: Fujian Institute of Research on the Structure of Matter, Chinese Academy of Scie

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20070404

Termination date: 20160225