CN1320007C - 含硅偶联剂的共聚物成膜树脂及其193nm光刻胶 - Google Patents
含硅偶联剂的共聚物成膜树脂及其193nm光刻胶 Download PDFInfo
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- CN1320007C CN1320007C CNB2005100402763A CN200510040276A CN1320007C CN 1320007 C CN1320007 C CN 1320007C CN B2005100402763 A CNB2005100402763 A CN B2005100402763A CN 200510040276 A CN200510040276 A CN 200510040276A CN 1320007 C CN1320007 C CN 1320007C
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- methacrylic acid
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CNB2005100402763A CN1320007C (zh) | 2005-05-24 | 2005-05-24 | 含硅偶联剂的共聚物成膜树脂及其193nm光刻胶 |
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CNB2005100402763A CN1320007C (zh) | 2005-05-24 | 2005-05-24 | 含硅偶联剂的共聚物成膜树脂及其193nm光刻胶 |
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CN1693323A CN1693323A (zh) | 2005-11-09 |
CN1320007C true CN1320007C (zh) | 2007-06-06 |
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CNB2005100402763A Expired - Fee Related CN1320007C (zh) | 2005-05-24 | 2005-05-24 | 含硅偶联剂的共聚物成膜树脂及其193nm光刻胶 |
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Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4064403B2 (ja) * | 2005-01-18 | 2008-03-19 | シャープ株式会社 | 半導体装置、表示モジュール、半導体チップ実装用フィルム基板の製造方法、及び半導体装置の製造方法 |
CN100386351C (zh) * | 2006-03-07 | 2008-05-07 | 江苏三木集团有限公司 | 塑胶漆用丙烯酸树脂 |
CN101974121A (zh) * | 2010-09-28 | 2011-02-16 | 昆山西迪光电材料有限公司 | 化学增幅型高分辨率含硅i-线紫外光刻胶及其成膜树脂 |
CN101974201B (zh) * | 2010-09-30 | 2012-10-31 | 昆山西迪光电材料有限公司 | 紫外厚膜光刻胶及其成膜树脂 |
CN103145555B (zh) * | 2013-03-07 | 2015-08-12 | 京东方科技集团股份有限公司 | 可聚合寡聚物和光刻胶组合物 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1228410A (zh) * | 1997-12-31 | 1999-09-15 | 现代电子产业株式会社 | 共聚物树脂,其制备方法及使用其制成的光致抗蚀剂 |
WO2004068243A1 (en) * | 2002-09-11 | 2004-08-12 | International Business Machines Corporation | Low silicon-outgassing resist for bilayer lithography |
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2005
- 2005-05-24 CN CNB2005100402763A patent/CN1320007C/zh not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1228410A (zh) * | 1997-12-31 | 1999-09-15 | 现代电子产业株式会社 | 共聚物树脂,其制备方法及使用其制成的光致抗蚀剂 |
WO2004068243A1 (en) * | 2002-09-11 | 2004-08-12 | International Business Machines Corporation | Low silicon-outgassing resist for bilayer lithography |
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