CN1300874A - 一种人工器官表面改性技术 - Google Patents
一种人工器官表面改性技术 Download PDFInfo
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- CN1300874A CN1300874A CN99117468A CN99117468A CN1300874A CN 1300874 A CN1300874 A CN 1300874A CN 99117468 A CN99117468 A CN 99117468A CN 99117468 A CN99117468 A CN 99117468A CN 1300874 A CN1300874 A CN 1300874A
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- titanium
- tantalum
- niobium
- artificial organs
- film
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- 210000000056 organ Anatomy 0.000 title claims abstract description 114
- 238000000034 method Methods 0.000 title claims abstract description 46
- 230000008569 process Effects 0.000 title claims abstract description 9
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 71
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 66
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 67
- 239000010936 titanium Substances 0.000 claims description 64
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 63
- 239000010955 niobium Substances 0.000 claims description 63
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 63
- 229910052719 titanium Inorganic materials 0.000 claims description 63
- 239000001257 hydrogen Substances 0.000 claims description 47
- 229910052739 hydrogen Inorganic materials 0.000 claims description 47
- 239000001301 oxygen Substances 0.000 claims description 42
- 229910052760 oxygen Inorganic materials 0.000 claims description 42
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 40
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 36
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium(II) oxide Chemical compound [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 35
- 238000005516 engineering process Methods 0.000 claims description 27
- 238000010438 heat treatment Methods 0.000 claims description 27
- 150000002500 ions Chemical class 0.000 claims description 26
- 238000004544 sputter deposition Methods 0.000 claims description 26
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 claims description 25
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 24
- 238000007654 immersion Methods 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 18
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 18
- 239000000956 alloy Substances 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- RJSRQTFBFAJJIL-UHFFFAOYSA-N niobium titanium Chemical compound [Ti].[Nb] RJSRQTFBFAJJIL-UHFFFAOYSA-N 0.000 claims description 17
- VSSLEOGOUUKTNN-UHFFFAOYSA-N tantalum titanium Chemical compound [Ti].[Ta] VSSLEOGOUUKTNN-UHFFFAOYSA-N 0.000 claims description 17
- 229910045601 alloy Inorganic materials 0.000 claims description 16
- 238000007254 oxidation reaction Methods 0.000 claims description 16
- 230000003647 oxidation Effects 0.000 claims description 14
- 229910001257 Nb alloy Inorganic materials 0.000 claims description 12
- 229910052786 argon Inorganic materials 0.000 claims description 12
- 238000000137 annealing Methods 0.000 claims description 11
- 238000005468 ion implantation Methods 0.000 claims description 11
- 238000012986 modification Methods 0.000 claims description 10
- 230000004048 modification Effects 0.000 claims description 10
- BFRGSJVXBIWTCF-UHFFFAOYSA-N niobium monoxide Chemical compound [Nb]=O BFRGSJVXBIWTCF-UHFFFAOYSA-N 0.000 claims description 10
- 239000004408 titanium dioxide Substances 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 9
- 150000002431 hydrogen Chemical class 0.000 claims description 8
- 239000000919 ceramic Substances 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 7
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 7
- RAHKDDYJTIRXMG-UHFFFAOYSA-M [O-2].[O-2].[O-2].[O-2].[OH-].O.O.[Ti+4].[Ta+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[OH-].O.O.[Ti+4].[Ta+5] RAHKDDYJTIRXMG-UHFFFAOYSA-M 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 238000005984 hydrogenation reaction Methods 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 125000004429 atom Chemical group 0.000 claims description 5
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 5
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 5
- 238000002513 implantation Methods 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- 229910052724 xenon Inorganic materials 0.000 claims description 4
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 3
- 238000007599 discharging Methods 0.000 claims description 3
- 229910001362 Ta alloys Inorganic materials 0.000 claims description 2
- 238000005477 sputtering target Methods 0.000 claims description 2
- 238000010301 surface-oxidation reaction Methods 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 230000002929 anti-fatigue Effects 0.000 abstract description 2
- 229910003077 Ti−O Inorganic materials 0.000 abstract 1
- 239000003146 anticoagulant agent Substances 0.000 abstract 1
- 229940127219 anticoagulant drug Drugs 0.000 abstract 1
- 239000002344 surface layer Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 84
- 239000008280 blood Substances 0.000 description 14
- 210000004369 blood Anatomy 0.000 description 14
- 210000003709 heart valve Anatomy 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- 238000011160 research Methods 0.000 description 7
- -1 oxonium ion Chemical class 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910010272 inorganic material Inorganic materials 0.000 description 5
- 239000011147 inorganic material Substances 0.000 description 5
- 229910001275 Niobium-titanium Inorganic materials 0.000 description 4
- 210000000748 cardiovascular system Anatomy 0.000 description 4
- 238000010849 ion bombardment Methods 0.000 description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- 239000007888 film coating Substances 0.000 description 3
- 238000009501 film coating Methods 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- GWPLDXSQJODASE-UHFFFAOYSA-N oxotantalum Chemical compound [Ta]=O GWPLDXSQJODASE-UHFFFAOYSA-N 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000002407 reforming Methods 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910001069 Ti alloy Inorganic materials 0.000 description 2
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000010406 cathode material Substances 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000002526 effect on cardiovascular system Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 210000005240 left ventricle Anatomy 0.000 description 2
- SYHGEUNFJIGTRX-UHFFFAOYSA-N methylenedioxypyrovalerone Chemical compound C=1C=C2OCOC2=CC=1C(=O)C(CCC)N1CCCC1 SYHGEUNFJIGTRX-UHFFFAOYSA-N 0.000 description 2
- 229910001460 tantalum ion Inorganic materials 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 235000005288 Annona lutescens Nutrition 0.000 description 1
- 244000030795 Annona lutescens Species 0.000 description 1
- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical compound [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 description 1
- 241000720974 Protium Species 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000010100 anticoagulation Effects 0.000 description 1
- 239000012620 biological material Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- WTKKCYNZRWIVKL-UHFFFAOYSA-N tantalum Chemical compound [Ta+5] WTKKCYNZRWIVKL-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L27/00—Materials for grafts or prostheses or for coating grafts or prostheses
- A61L27/28—Materials for coating prostheses
- A61L27/30—Inorganic materials
- A61L27/306—Other specific inorganic materials not covered by A61L27/303 - A61L27/32
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L33/00—Antithrombogenic treatment of surgical articles, e.g. sutures, catheters, prostheses, or of articles for the manipulation or conditioning of blood; Materials for such treatment
- A61L33/02—Use of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Epidemiology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Animal Behavior & Ethology (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Dermatology (AREA)
- Transplantation (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Medicinal Chemistry (AREA)
- Hematology (AREA)
- Surgery (AREA)
- Materials For Medical Uses (AREA)
- Prostheses (AREA)
Abstract
Description
实施例 | 氢气压力(帕) | 加热温度(℃) | 施加电压(千伏) | 氢等离子体密度(厘米-3) | 工作电流(安) | 工作时间(小时) |
一 | 0.001 | 100 | -0.2 | 108 | 0.1 | 2 |
二 | 0.1 | 300 | -0.8 | 5×109 | 1 | 1 |
三 | 1 | 400 | -2 | 5×1011 | 7 | 0.5 |
四 | 10 | 600 | -3 | 1012 | 10 | 0.2 |
实施例 | 氢气压力(帕) | 脉冲电压(千伏) | 脉冲宽度(μs) | 脉冲频率(赫兹) | 氢等离体密度(厘米-3) | 氢离子注入剂量(原子/厘米2) |
一 | 0.001 | -1 | 20 | 5000 | 108 | 1015 |
二 | 0.01 | -20 | 300 | 10 | 5×109 | 8×1016 |
三 | 0.1 | -70 | 100 | 100 | 5×1011 | 4×1017 |
四 | 1 | -100 | 500 | 500 | 1012 | 5×1018 |
实施例 | 氢气压力帕 | 脉冲电压(千伏)及工作时间(小时) | 脉冲电压(千伏)及工作时间(小时) | 脉冲电压(千伏)及工作时间(小时) | 脉冲宽度μs | 脉冲频率赫兹 | 氢等离子体密度厘米-3 | 氢离子注入剂量原子/厘米2 |
一 | 0.001 | -90千伏1.5小时 | -55千伏1小时 | -20千伏0.4小时 | 80 | 10 | 108 | 1015 |
二 | 0.05 | -80千伏0.6小时 | -50千伏0.4小时 | -15千伏0.3小时 | 20 | 5000 | 5×109 | 8×1017 |
三 | 0.5 | -85千伏0.5小时 | -40千伏0.3小时 | -10千伏0.2小时 | 300 | 250 | 5×1011 | 5×1016 |
四 | 1 | -70千伏1.2小时 | -30千伏0.4小时 | -5千伏0.1小时 | 500 | 400 | 1012 | 5×1018 |
实施例 | 靶材成分中钽或铌的原子含量 | 溅射电压伏 | 溅射电流安 | 加热温度度 | 溅射时间小时 | 溅射压力帕 | 样品台偏压伏 |
一 | 0.1% | -300 | 0.05 | 100 | 1.5 | 0.05 | -200 |
二 | 5% | -600 | 1 | 300 | 0.8 | 1 | -300 |
三 | 15% | -1000 | 5 | 500 | 0.2 | 5 | -600 |
实施例 | 氧气压力帕 | 氧等离子体密度厘米-3 | 加热温度度 | 脉冲负电压伏 | 时间小时 | 重复频率赫兹 | 脉冲宽度μs |
一 | 0.01 | 108 | 200 | -0.2 | 2 | 10 | 500 |
二 | 1 | 109 | 400 | -1 | 0.5 | 500 | 100 |
三 | 10 | 1012 | 600 | -3 | 0.05 | 5000 | 20 |
实施例 | 靶材中五氧化二钽或五氧化二铌分子含量 | 加热温度度 | 射频功率W | 气体压力帕 | 射频电压伏 | 溅射时间小时 | 样品台偏压伏 |
一 | 0.1% | 200 | 200 | 5 | 400 | 2 | 0 |
二 | 2.5% | 400 | 800 | 0.5 | 800 | 1 | -300 |
三 | 8% | 600 | 2500 | 0.01 | 2500 | 0.5 | -500 |
实施例 | 合金阴极成分钽或铌原子含量 | 金属等离子体密度(厘米-3) | 氧等离子体密度(厘米-3) | 氧气压力(帕) | 脉冲频率(赫兹) | 脉冲宽度(μs) | 脉冲电压(千伏) |
一 | 0.1% | 108 | 108 | 103 | 500 | 20 | -0.1 |
二 | 1% | 1010 | 2×1010 | 5×103 | 100 | 200 | -2 |
三 | 5% | 3×1010 | 1011 | 10-1 | 500 | 80 | -10 |
四 | 10% | 6×1011 | 1012 | 100 | 20 | 500 | -100 |
实施例 | 钽或铌等离子体密度(厘米-3) | 钽或铌离子注入剂量(厘米-2) | 脉冲频率(赫兹) | 脉冲宽度(μs) | 脉冲电压(千伏) |
108 | 1015 | 20 | 20 | ||
5×109 | 1012 | 500 | 100 | -50 | |
1012 | 5×1018 | 5000 | 500 | -100 |
Claims (8)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB991174682A CN1158403C (zh) | 1999-12-23 | 1999-12-23 | 一种人工器官表面改性方法 |
CNB2005100627061A CN100385034C (zh) | 1999-12-23 | 2000-12-25 | 用等离子体浸没离子注入方法在材料表面形成TiO2-x薄膜的方法及其应用 |
AU24995/01A AU2499501A (en) | 1999-12-23 | 2000-12-25 | Method for forming a TIO2-x film on a material surface by using plasma immersion ion implantation and the use thereof |
CNB00817704XA CN100491582C (zh) | 1999-12-23 | 2000-12-25 | 用等离子体浸没离子注入方法在材料表面形成TiO2-x薄膜的方法及其应用 |
US10/168,500 US20030175444A1 (en) | 1999-12-23 | 2000-12-25 | Method for forming a tioss(2-x) film on a material surface by using plasma immersion ion implantation and the use thereof |
PCT/CN2000/000728 WO2001048262A1 (fr) | 1999-12-23 | 2000-12-25 | Procede d'obtention d'un film tio2-x sur la surface d'un materiau faisant appel a un procede d'implantation non ionique par immersion plasma (iiip) et ses applications |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB991174682A CN1158403C (zh) | 1999-12-23 | 1999-12-23 | 一种人工器官表面改性方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 03154172 Division CN1274870C (zh) | 1999-12-23 | 1999-12-23 | 用溅射技术进行人工器官表面处理的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1300874A true CN1300874A (zh) | 2001-06-27 |
CN1158403C CN1158403C (zh) | 2004-07-21 |
Family
ID=5280091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB991174682A Expired - Fee Related CN1158403C (zh) | 1999-12-23 | 1999-12-23 | 一种人工器官表面改性方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20030175444A1 (zh) |
CN (1) | CN1158403C (zh) |
AU (1) | AU2499501A (zh) |
WO (1) | WO2001048262A1 (zh) |
Cited By (6)
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CN102181842A (zh) * | 2011-04-14 | 2011-09-14 | 中国科学院上海硅酸盐研究所 | 一种对钛金属表面进行改性的方法 |
CN103614699A (zh) * | 2013-12-16 | 2014-03-05 | 中国科学院上海硅酸盐研究所 | 注入钽离子对聚醚醚酮表面进行改性的方法及改性的聚醚醚酮材料 |
CN104220630A (zh) * | 2012-02-23 | 2014-12-17 | 特来德斯通技术公司 | 耐腐蚀且导电的金属表面 |
CN106521445A (zh) * | 2016-12-09 | 2017-03-22 | 嘉兴市纳川真空科技有限公司 | 一种提高钛镍基形状记忆合金阻尼性能的氢注入工艺 |
CN112522674A (zh) * | 2021-02-18 | 2021-03-19 | 中南大学湘雅医院 | 一种钛合金表面复合涂层及其制备方法 |
CN114395754A (zh) * | 2022-03-25 | 2022-04-26 | 中南大学湘雅医院 | 一种磁控溅射涂层材料及其应用 |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8470019B1 (en) * | 2001-11-30 | 2013-06-25 | Advanced Cardiovascular Systems, Inc. | TiNxOy modified surface for an implantable device and a method of producing the same |
BRPI0418880A (pt) * | 2004-07-06 | 2007-12-11 | Synthes Gmbh | revestimento colorido de geração de interferência para implantes e instrumentos cirúrgicos |
CN100404724C (zh) * | 2004-12-20 | 2008-07-23 | 北京师范大学 | 人体植入金属材料表面离子注入处理方法 |
CN101128224A (zh) * | 2005-01-13 | 2008-02-20 | 港大科桥有限公司 | 经表面处理的形状记忆材料及其制造方法 |
US20080087866A1 (en) * | 2006-10-13 | 2008-04-17 | H.C. Stark Inc. | Titanium oxide-based sputtering target for transparent conductive film, method for producing such film and composition for use therein |
WO2008056323A1 (en) * | 2006-11-10 | 2008-05-15 | Sandvik Intellectual Property Ab | Surgical implant composite materials and kits and methods of manufacture |
US9123509B2 (en) | 2007-06-29 | 2015-09-01 | Varian Semiconductor Equipment Associates, Inc. | Techniques for plasma processing a substrate |
US20090004836A1 (en) * | 2007-06-29 | 2009-01-01 | Varian Semiconductor Equipment Associates, Inc. | Plasma doping with enhanced charge neutralization |
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- 2000-12-25 WO PCT/CN2000/000728 patent/WO2001048262A1/zh active Application Filing
- 2000-12-25 US US10/168,500 patent/US20030175444A1/en not_active Abandoned
- 2000-12-25 AU AU24995/01A patent/AU2499501A/en not_active Abandoned
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CN102181842A (zh) * | 2011-04-14 | 2011-09-14 | 中国科学院上海硅酸盐研究所 | 一种对钛金属表面进行改性的方法 |
CN104220630A (zh) * | 2012-02-23 | 2014-12-17 | 特来德斯通技术公司 | 耐腐蚀且导电的金属表面 |
CN104220630B (zh) * | 2012-02-23 | 2017-03-08 | 特来德斯通技术公司 | 耐腐蚀且导电的金属表面 |
CN103614699A (zh) * | 2013-12-16 | 2014-03-05 | 中国科学院上海硅酸盐研究所 | 注入钽离子对聚醚醚酮表面进行改性的方法及改性的聚醚醚酮材料 |
CN103614699B (zh) * | 2013-12-16 | 2015-11-18 | 中国科学院上海硅酸盐研究所 | 注入钽离子对聚醚醚酮表面进行改性的方法及改性的聚醚醚酮材料 |
CN106521445A (zh) * | 2016-12-09 | 2017-03-22 | 嘉兴市纳川真空科技有限公司 | 一种提高钛镍基形状记忆合金阻尼性能的氢注入工艺 |
CN106521445B (zh) * | 2016-12-09 | 2019-05-10 | 嘉兴市纳川真空科技有限公司 | 一种提高钛镍基形状记忆合金阻尼性能的氢注入工艺 |
CN112522674A (zh) * | 2021-02-18 | 2021-03-19 | 中南大学湘雅医院 | 一种钛合金表面复合涂层及其制备方法 |
CN114395754A (zh) * | 2022-03-25 | 2022-04-26 | 中南大学湘雅医院 | 一种磁控溅射涂层材料及其应用 |
CN114395754B (zh) * | 2022-03-25 | 2022-07-19 | 中南大学湘雅医院 | 一种磁控溅射涂层材料及其应用 |
Also Published As
Publication number | Publication date |
---|---|
WO2001048262A8 (fr) | 2002-03-14 |
WO2001048262A1 (fr) | 2001-07-05 |
AU2499501A (en) | 2001-07-09 |
CN1158403C (zh) | 2004-07-21 |
US20030175444A1 (en) | 2003-09-18 |
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