CN1298881C - Reaction plasma spraying reaction chamber apparatus - Google Patents
Reaction plasma spraying reaction chamber apparatus Download PDFInfo
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- CN1298881C CN1298881C CNB200410072552XA CN200410072552A CN1298881C CN 1298881 C CN1298881 C CN 1298881C CN B200410072552X A CNB200410072552X A CN B200410072552XA CN 200410072552 A CN200410072552 A CN 200410072552A CN 1298881 C CN1298881 C CN 1298881C
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- reaction chamber
- plasma spraying
- inlet pipe
- reaction
- water inlet
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Abstract
The present invention relates to a reactive plasma spraying reaction chamber. The structure of the reactive plasma spraying reaction chamber comprises a plasma spraying gun and a reaction chamber, wherein the reaction chamber is connected with the plasma spraying gun through screws; the reaction chamber is composed of an inner sleeve, an outer sleeve, a water inlet pipe, a water outlet pipe, an air inlet pipe and a powder feeding hole; the inner sleeve and the outer sleeve are welded to form the main body structure of the reaction chamber, the cooling part of the reaction chamber is composed of the space between the inner sleeve and the outer sleeve, the water inlet pipe and the water outlet pipe; the water inlet pipe and the water outlet pipe are welded on the outer sleeve of the reaction chamber, and a certain heat is carried away by means of the fast flow of cooling water to cool the reaction chamber; the air inlet pipe is connected with the inner sleeve of the reaction chamber and welded with the inner sleeve and the outer sleeve of the reaction chamber. The reactive plasma spraying reaction chamber solves the problem that a ceramic coating with a high melting point is difficult to prepare by ordinary plasma spraying; the reactive plasma spraying reaction chamber is mainly used for the process for preparing nanocrystalline ceramic coatings and powder from nanometer metal powder by underpower plasma spraying equipment.
Description
Technical field
The present invention relates to a kind of reaction plasma spraying reaction chamber apparatus.
Background technology
Plasma gun commonly used at present has multiple model, as LP-50B type, BT-G3 type, no matter be which kind of type, the principle of spraying is consistent: by plasma gun generation plasma arc, the fusing dusty spray sprays to the metal works surface, and powder is in melted state in flame stream, be out of shape at metal base surface, become flat structure by ball-like structure, clocklike stack the formation coating from level to level, this spraying is difficult to prepare dystectic ceramic coating.
Summary of the invention
The object of the present invention is to provide a kind of reaction plasma spraying reaction chamber apparatus, it is the improvement of article on plasma spray gun, by add a reaction chamber on common plasma gun basis, feeds reactant gases and form a kind of atmosphere in reaction chamber; With plasma gun spraying elemental metals powder, the metal-powder of high-speed flight is melted, and with reactant gases thermopositive reaction takes place spontaneously in reaction chamber, a large amount of reaction heat can make the temperature of reactant rise rapidly, fierce reaction and high flight velocity can make reaction product be atomized into small droplets by intensive, bigger thermograde can make the drop chilling forming core that is atomized in the flame stream, form nanocrystalline pottery, be sprayed onto and form nanocrystalline coating on the metallic matrix, spray to and make manocrystalline powders in the water.The present invention can prepare nanocrystalline ceramics coating and ceramic powder that thickness reaches 500 microns by adding reaction chamber simple in structure.
Reaction plasma spraying reaction chamber apparatus of the present invention comprises that plasma gun and reaction chamber constitute; Reaction chamber is made up of supply gas structure and reaction chamber powder feeding structure of reaction chamber cooling structure, reaction chamber, and reaction chamber and plasma gun link together.
Said reaction chamber cooling structure is made of interior cover, overcoat, water inlet pipe, rising pipe, interior cover and overcoat weld together, the space of interior cover and outer inner room and the cooling structure of water inlet pipe and rising pipe anabolic reaction chamber, rising pipe and water inlet pipe are welded in the outer of reaction chamber and put.
The structure of supplying gas of said reaction chamber is the interior cover of inlet pipe ligation chamber, welds together with the interior cover and the overcoat of reaction chamber.
The powder feeding structure of said reaction chamber is that the position that puts in reaction chamber near plasma gun is provided with powder feeding hole.
Said reaction chamber and plasma gun are by being threaded togather.
The present invention is summarized as follows: it comprises the formation design of being connected of reaction chamber and plasma gun and reaction chamber.Reaction chamber and plasma gun (as the BT-G3 type) are by being threaded togather.Described reaction chamber is made of interior cover, overcoat, water inlet pipe, rising pipe, inlet pipe and powder feeding hole.Interior cover and outer tube weld together the agent structure that constitutes reaction chamber, the space between interior cover and outer tube and the cooling segment of water inlet pipe and rising pipe anabolic reaction chamber, rising pipe and water inlet pipe are welded in the outer of reaction chamber and put, and take away certain heat by flowing fast of water coolant, the cooling reaction chamber.The interior cover of inlet pipe ligation chamber welds together with the interior cover and the overcoat of reaction chamber.
The present invention adds a reaction chamber on common plasma gun basis, common plasma spray can prepare nanocrystalline ceramics coating and nanocrystalline ceramics powder after robbing and adding this device.The present invention has realized using lower powered plasma spraying equipment, adopts the micron order metal-powder, prepares dystectic nanocrystalline ceramics coating, has solved a difficult problem for preparing the brilliant ceramic coating of high melting point nm with plasma spraying method.The present invention has opened up new way for the preparation of nano material, has also fundamentally solved with nano-powder material to prepare the nanocrystalline difficult problem of growing up that nano material runs into.
Description of drawings
Fig. 1. the structure iron that reaction chamber and BT-G3 type plasma are assembled together.
Fig. 2. the side-view of reaction and plasma spray gun reaction chamber.
Fig. 3. the cross-sectional view of reaction and plasma spray gun reaction chamber.
Fig. 4. the A-A cross-sectional view of reaction and plasma spray gun reaction chamber.
Embodiment
Below in conjunction with accompanying drawing the present invention is described in detail:
As shown in the figure, Fig. 1 is that reaction chamber and BT-G3 type plasma gun connect the all-in-one-piece synoptic diagram, and reaction chamber A and BT-G3 type plasma gun B are by being threaded togather.By BT-G3 type plasma gun generation plasma arc, metal-powder (as titanium valve) is sent in the plasma flame flow, enter reaction chamber after metal-powder is melted in flame stream.
Fig. 2 is the side-view of reaction and plasma spray gun reaction chamber, and Fig. 3 is the cross-sectional view of reaction and plasma spray gun reaction chamber.Fig. 4 is the A-A cross-sectional view of reaction and plasma spray gun reaction chamber.Reaction chamber is made of interior cover 1, overcoat 2, water inlet pipe 3, rising pipe 4, inlet pipe 5, powder feeding hole 6 etc.Wherein, interior cover and outer tube weld together the agent structure that constitutes reaction chamber, the space between interior cover and outer tube and the cooling segment of water inlet pipe and rising pipe anabolic reaction chamber, rising pipe and water inlet pipe are welded in the outer of reaction chamber and put, take away certain heat by flowing fast of water coolant, the cooling reaction chamber.Inlet pipe 5 is passed in the interior cover of reaction chamber, welds together with the interior cover and the overcoat of reaction chamber; Reaction gas is delivered in the reaction chamber by inlet pipe 5, and forms the spirrillum airflow flowing in reaction chamber.Metal-powder enters plasma flame flow by powder feeding hole 6.Molten metal powder in flame stream atomizes under the dual function of ion gas and spirrillum reactant gases, reacts the formation nanocrystalline ceramics with reaction gas in the reaction chamber.
The advantage of reaction and plasma spray gun: on the basis of existing spray gun, add reaction chamber simple in structure, can prepare nanocrystalline ceramics coating and ceramic powder that thickness reaches 600 microns.
Application positively effect of the present invention is seen applicant's application on the same day, and name is called: the method for the method of reaction plasma spraying nano crystal titanium nitride coating and reaction plasma spraying nano crystal titanium nitride powder.
Claims (2)
1, a kind of reaction plasma spraying reaction chamber apparatus is characterized in that it comprises plasma gun and reaction chamber; Reaction chamber is made up of supply gas structure and reaction chamber powder feeding structure of reaction chamber cooling structure, reaction chamber, and reaction chamber and plasma gun link together;
Said reaction chamber cooling structure is made of interior cover, overcoat, water inlet pipe, rising pipe, interior cover and overcoat weld together, the space of interior cover and outer inner room and the cooling structure of water inlet pipe and rising pipe anabolic reaction chamber, rising pipe and water inlet pipe are welded in the outer of reaction chamber and put;
The structure of supplying gas of said reaction chamber is the interior cover of inlet pipe ligation chamber, welds together with the interior cover and the overcoat of reaction chamber;
The powder feeding structure of said reaction chamber is that the position that puts in reaction chamber near plasma gun is provided with powder feeding hole.
2,, it is characterized in that said reaction chamber and plasma gun are by being threaded togather according to the said reaction plasma spraying reaction chamber apparatus of claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB200410072552XA CN1298881C (en) | 2004-10-28 | 2004-10-28 | Reaction plasma spraying reaction chamber apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CNB200410072552XA CN1298881C (en) | 2004-10-28 | 2004-10-28 | Reaction plasma spraying reaction chamber apparatus |
Publications (2)
Publication Number | Publication Date |
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CN1603451A CN1603451A (en) | 2005-04-06 |
CN1298881C true CN1298881C (en) | 2007-02-07 |
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CNB200410072552XA Expired - Fee Related CN1298881C (en) | 2004-10-28 | 2004-10-28 | Reaction plasma spraying reaction chamber apparatus |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4696855A (en) * | 1986-04-28 | 1987-09-29 | United Technologies Corporation | Multiple port plasma spray apparatus and method for providing sprayed abradable coatings |
CN1041506A (en) * | 1988-09-30 | 1990-04-18 | 珀金-埃尔默公司 | The plasma gun extension that is used for coating slots |
CN1058359A (en) * | 1990-05-18 | 1992-02-05 | 帕金-埃尔默有限公司 | Plasma spray injection device with external powder feeder |
US5217747A (en) * | 1990-02-26 | 1993-06-08 | Noranda Inc. | Reactive spray forming process |
US5637242A (en) * | 1994-08-04 | 1997-06-10 | Electro-Plasma, Inc. | High velocity, high pressure plasma gun |
JP2000264791A (en) * | 1999-03-17 | 2000-09-26 | Nippon Pillar Packing Co Ltd | METHOD FOR GROWING SINGLE CRYSTAL SiC |
-
2004
- 2004-10-28 CN CNB200410072552XA patent/CN1298881C/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4696855A (en) * | 1986-04-28 | 1987-09-29 | United Technologies Corporation | Multiple port plasma spray apparatus and method for providing sprayed abradable coatings |
CN1041506A (en) * | 1988-09-30 | 1990-04-18 | 珀金-埃尔默公司 | The plasma gun extension that is used for coating slots |
US5217747A (en) * | 1990-02-26 | 1993-06-08 | Noranda Inc. | Reactive spray forming process |
CN1058359A (en) * | 1990-05-18 | 1992-02-05 | 帕金-埃尔默有限公司 | Plasma spray injection device with external powder feeder |
US5637242A (en) * | 1994-08-04 | 1997-06-10 | Electro-Plasma, Inc. | High velocity, high pressure plasma gun |
JP2000264791A (en) * | 1999-03-17 | 2000-09-26 | Nippon Pillar Packing Co Ltd | METHOD FOR GROWING SINGLE CRYSTAL SiC |
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CN1603451A (en) | 2005-04-06 |
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Granted publication date: 20070207 Termination date: 20091130 |