CN1267968C - 半导体元件微细图形的形成方法 - Google Patents
半导体元件微细图形的形成方法 Download PDFInfo
- Publication number
- CN1267968C CN1267968C CNB021400164A CN02140016A CN1267968C CN 1267968 C CN1267968 C CN 1267968C CN B021400164 A CNB021400164 A CN B021400164A CN 02140016 A CN02140016 A CN 02140016A CN 1267968 C CN1267968 C CN 1267968C
- Authority
- CN
- China
- Prior art keywords
- dielectric film
- film
- semiconductor element
- insulation film
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR81791/2001 | 2001-12-20 | ||
KR10-2001-0081791A KR100449319B1 (ko) | 2001-12-20 | 2001-12-20 | 반도체 소자의 미세 패턴 형성 방법 |
KR81791/01 | 2001-12-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1438677A CN1438677A (zh) | 2003-08-27 |
CN1267968C true CN1267968C (zh) | 2006-08-02 |
Family
ID=27606983
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB021400164A Expired - Fee Related CN1267968C (zh) | 2001-12-20 | 2002-12-20 | 半导体元件微细图形的形成方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP3841345B2 (ja) |
KR (1) | KR100449319B1 (ja) |
CN (1) | CN1267968C (ja) |
TW (1) | TWI226655B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100781542B1 (ko) | 2006-06-08 | 2007-12-03 | 삼성전자주식회사 | 반도체 소자의 미세 패턴 형성 방법 |
KR100843241B1 (ko) * | 2007-03-29 | 2008-07-02 | 삼성전자주식회사 | 반도체 소자의 제조방법 |
CN102446704B (zh) * | 2010-10-14 | 2013-09-11 | 中芯国际集成电路制造(上海)有限公司 | 双重图形化方法 |
CN115241047A (zh) * | 2021-04-23 | 2022-10-25 | 长鑫存储技术有限公司 | 半导体结构的制备方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR930001301A (ko) * | 1991-06-10 | 1993-01-16 | 김광호 | 반도체 패턴 형성방법 |
KR970048979A (ko) * | 1995-12-16 | 1997-07-29 | 김주용 | 미세 패턴을 갖는 마스크 형성 방법 |
KR0159012B1 (ko) * | 1995-12-29 | 1998-12-15 | 김주용 | 2층 감광막 패턴 형성방법 |
KR100465743B1 (ko) * | 1997-06-26 | 2005-04-19 | 주식회사 하이닉스반도체 | 반도체소자제조방법 |
KR20010011143A (ko) * | 1999-07-26 | 2001-02-15 | 김영환 | 반도체소자의 미세패턴 형성방법 |
-
2001
- 2001-12-20 KR KR10-2001-0081791A patent/KR100449319B1/ko not_active IP Right Cessation
-
2002
- 2002-12-17 TW TW091136444A patent/TWI226655B/zh not_active IP Right Cessation
- 2002-12-20 JP JP2002370129A patent/JP3841345B2/ja not_active Expired - Fee Related
- 2002-12-20 CN CNB021400164A patent/CN1267968C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1438677A (zh) | 2003-08-27 |
TWI226655B (en) | 2005-01-11 |
JP3841345B2 (ja) | 2006-11-01 |
TW200411729A (en) | 2004-07-01 |
KR20030051000A (ko) | 2003-06-25 |
KR100449319B1 (ko) | 2004-09-18 |
JP2003197622A (ja) | 2003-07-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060802 Termination date: 20121220 |