CN1244714A - Shielding transparent body for electromagnetic wave - Google Patents

Shielding transparent body for electromagnetic wave Download PDF

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Publication number
CN1244714A
CN1244714A CN 99108323 CN99108323A CN1244714A CN 1244714 A CN1244714 A CN 1244714A CN 99108323 CN99108323 CN 99108323 CN 99108323 A CN99108323 A CN 99108323A CN 1244714 A CN1244714 A CN 1244714A
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China
Prior art keywords
electromagnetic wave
layer
transparent body
film
shielding transparent
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CN 99108323
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CN1123011C (en
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后藤英树
田中顺二
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Sumitomo Bakelite Co Ltd
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Sumitomo Bakelite Co Ltd
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Priority claimed from JP10225827A external-priority patent/JP2000059073A/en
Priority claimed from JP22582698A external-priority patent/JP2000059083A/en
Priority claimed from JP22583098A external-priority patent/JP2000059076A/en
Priority claimed from JP10225828A external-priority patent/JP2000059074A/en
Priority claimed from JP22583198A external-priority patent/JP2000059077A/en
Priority claimed from JP27582998A external-priority patent/JP3412081B2/en
Priority claimed from JP27626498A external-priority patent/JP2000114770A/en
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Publication of CN1244714A publication Critical patent/CN1244714A/en
Publication of CN1123011C publication Critical patent/CN1123011C/en
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Abstract

A transparent electromagnetic wave shield comprising a transparent polymer film and a conductive layer of a linear pattern shape formed on at least one side of said film, wherein the line intervals in said linear pattern are random between 20 mum and 1 mm.

Description

Shielding transparent body for electromagnetic wave
The present invention relates to a kind of surface coating material, this material is used for the surface coverage of display device, covers especially for the surface that needs is prevented the plasma display panel (PDP) that electromagnetic wave is sewed (below be abbreviated as PDP) or be provided with the window etc. in the room that needs the inner medical machine of perspective.
Because the development rapidly of electronics in the last few years, be accompanied by the development of computing machine etc., make the Electromagnetic Interference of e-machine generation misoperation become a big problem.As the means that this electromagnetic wave is prevented trouble before it happens, a kind of screen method is on one's own initiative arranged, this method adopts the way of the shell conductionization that makes e-machine, and the place blocks unwanted electric wave in the generation source.As the concrete material that electromagnetic wave is sewed that prevents, what use is metal forming, perforated metal foil, wire netting, metal fibre and the organic-inorganic fiber that has passed through electroplating processes etc., but be in the display body of representative or window etc. with PDP, transparent is indispensable condition, from the viewpoint of the permeability of light, no matter any all being not suitable for of above-mentioned substance used.
In addition, owing to oxidation is developed along with the process of time in the metal surface, even if so in above-mentioned substance, can expect the wire netting of the transparency to a certain degree, also exist in the contact of net point place high frequency and be easy to disconnection, be difficult to show for a long time the shortcoming of stable effectiveness.To this, though can consider to use the composite oxides (below be abbreviated as ITO) of the indium oxide that does not have oxidation and degradation widely used as liquid crystal electrode and tin oxide, but it is little that people censure the electromagnetic wave drip-preventing function of this material, thereby be only limited to those static and prevent function and usage.Though also attempted making electric conductivity to bring up to and electric conductivity like the metal species as possibility, for example bring up to 1 Ω/below the, but present situation is: even if the limit to glass substrate heating edge film forming, also can only be 4 Ω/, and to form on plastic sheeting technically be impossible.
In addition, also has even more important problem.Particularly now gaze at using, promptly the diagonal line of PDP target indication is under the situation of glass substrate of this big molded dimension more than 40~50 inches and Heavy Weight, also is problematic from assembling when PDP assembles.On the other hand, if lightweightly use plastic base as substrate, then from stable on heating viewpoint, just can not be that the most important substrate that improves the transparency, electric conductivity heats this means by application target, it is impossible obtaining low resistance.In addition, if attempt improves thickness and reduces resistance, then because the linear expansion coefficient between ITO film and the plastic base poor, after film forming or because of internal stress, peel off, or generation crack, want to form low-resistance ITO of metalloid, the limit is 20~40 Ω, and it is impossible achieving the goal.
The objective of the invention is to provide at an easy rate a kind of have the transparency and electromagnetic shielding effect is high, that display body is used, particularly as plasma display panel (PDP) with or medical engine house between the only electromagnetic wave shielding transparent membrane of window.
The solution of the present invention 1 is a kind ofly to constitute the shielding transparent body for electromagnetic wave of the interval random variation between 20 microns~1mm between each line in this threadlike graph shape by the transparent polymer film and at the conductive layer of its threadlike graph shape that forms on single face at least.
Desirable embodiment is so a kind of shielding transparent body for electromagnetic wave: threadlike graph is shaped as the mesh shape that straight line is lined up in length and breadth, the perhaps shape that the curve of following the Sin function (1) shown in the following formula, Tan function (2), exponential function (3), logarithmic function (4) or inverse ratio function (5) is lined up in length and breadth, the perhaps shape that these straight lines or curve assembled arrangement are got up.
y=A·sin(αx+φ) (1)
y=B·Tan(βx+φ) (2)
(A, B, α, β, φ, φ: constant) arbitrarily
y=C·exp(γx+ρ) (3)
y=D·ln(δx+ξ) (4)
(C, D, γ, δ, ρ, ξ: constant) arbitrarily
y=E/x (5)
(E: constant) arbitrarily
Even more ideal embodiment is, above-mentioned shielding transparent body for electromagnetic wave is the bed thickness of P (micron), conductive layer when being D (micron) in the live width of establishing threadlike graph, and the ratio (P/D) of P and D is 1~540, it is desirable to 2~240 scope.
The solution of the present invention 2 is: above-mentioned shielding transparent body for electromagnetic wave, be that to adopt be on the single face as required successively on the lamination after adhesive linkage, transparency conducting layer and the metal film layer at the transparent polymer film at least, only optionally etching is removed metal film layer, the way that makes metal film layer form threadlike graph makes, make the shielding transparent body for electromagnetic wave of each line interval random variation between 20 microns~1mm in this threadlike graph shape, ideal situation is that metal film layer is made of copper.
The shielding transparent body for electromagnetic wave of the solution of the present invention 3, adopt transparent macromolecule membrane be at least on the single face successively lamination mixed into infrared ray blocking-up (cut) agent and the conductive layer of the laminate film that is used for carrying out constituting behind the bond layer, conductive layer of the pigment of color correction, the way that is processed into to wire graphics shape makes, and each line interval random variation between 20 microns~1mm in this threadlike graph shape.
To be a kind of handles be processed into the threadlike graph shape by the conductive layer at the laminate film that constitutes behind lamination bond layer 1 and the conductive layer successively on the single face at least of transparent macromolecule membrane to the solution of the present invention 4, make the laminate film of the interval random variation between 20 microns~1mm between each line, paste transparent macromolecule with bond layer 2 and strengthen the shielding transparent body for electromagnetic wave that constitutes on the body, be to have the pigment that color correction concerns the near infrared ray blocking agent with to the near infrared ray blocking agent, mix going in one deck at least in the into bond layer 1 and bond layer 2, and be provided with the shielding transparent body for electromagnetic wave of ultraviolet barrier layer that one deck is used for preventing the deterioration of near infrared ray blocking agent at least.
Desirable embodiment is in the shielding transparent body for electromagnetic wave of scheme 3 or 4, also is provided with the shielding transparent body for electromagnetic wave of one deck water vapor barrier layer at least.
To be a kind of handles be processed into the threadlike graph shape by the conductive layer at the laminate film that constitutes behind lamination bond layer 1 and the conductive layer successively on the single face at least of transparent macromolecule membrane to the solution of the present invention 5, make the laminate film of the interval random variation between 20 microns~1mm between each line, paste transparent macromolecule with bond layer 2 and strengthen the shielding transparent body for electromagnetic wave that constitutes on the body, be to have the pigment that color correction concerns the near infrared ray blocking agent with to the near infrared ray blocking agent, be divided in bond layer 1 and the bond layer 2, or only be incorporated into shielding transparent body for electromagnetic wave in the bond layer 2.
In the solution of the present invention 1~5, desirable embodiment is a kind of like this shielding transparent body for electromagnetic wave: the light penetration that is laminated under wavelength 550nm by adhesive linkage is more than 50%, thickness is that the above transparent polymer of 1mm strengthens on the body, and is provided with antireflection layer and/or hard conating at least one side of laminate film or transparent polymer enhancing body.
Fig. 1 is the synoptic diagram of the figure of embodiment 2.
Fig. 2 is the synoptic diagram of the figure of embodiment 4.
Fig. 3 is the synoptic diagram of the figure of embodiment 5.
Fig. 4 is the synoptic diagram of the figure of embodiment 6.
Become in the present invention the macromolecule membrane of the base material that forms most important conductive layer, by with PETG, polybutylene terephthalate, PEN Deng polyester, polyimides, Merlon, polyacrylonitrile, polyether sulfone, polysulfones, polyethers acyl Imines, polyarylate, polynorbornene be representative thermoplastic resin, uv curing resin, The formations such as heat-curing resin take epoxy resin as representative are when it is desirable to have 550nm Light penetration be that 80% (value when afterwards, all being illustrated in 550nm) is above The transparency film or also can use these high molecular copolymers, carry out suitable choosing Select.
Total light transmittance is as much as possible high to be desirable, still, and as final products, from 50% More than be exactly this desirable part thing, even if in the situation of 2 of minimum laminations, as Substrate then conforms with the purpose requirement if having more than 80%, then can lamination because transmitance is more high Number just more many, so more preferably more than 85%, ideal is 90% More than, therefore, making the thickness attenuation also is a kind of effective means. For example, thin as macromolecule Although the thickness of film is as long as satisfy the transparency restriction that just has nothing special, from processing The property aspect it is desirable to 25~300 microns. Thickness less than 25 microns situation under, Film is too soft, when the lamination procedure of conductive layer, upholds or pleat because tension force is easy to produce Wrinkle uses improper. In addition, if surpass 300 microns, then the pliability of film reduces, Coiling in each operation is difficult to carry out thereby is inappropriate. Particularly because make many Carry out when the lamination, if thickness is big, then processability will worsen significantly, so if consider operation The property and whole thickness, then it is desirable to especially 25~100 microns.
When making the conductive layer lamination, can also arrange well-known sticking in order to improve the power of being adjacent to Connect layer. Particularly make conducting layer figure turn to thin-line-shaped when, this problem is important. For example, carry out graphically with etching procedure when, in order to bear water jet hydraulic pressure, base material And the power that is adjacent between the conductive layer is minimum also will be for about 0.3kg/cm, as not having in practical The above power that is adjacent to of the grade 1.0kg/cm of problem is necessary. If can not get such being adjacent to Power will become then that after graphical conductive layer is peeled off or produce broken string during at lithography Root by. In addition, owing to wish to have high light penetration, so the thickness of adhesive linkage, sticking Refractive index that connects the material that uses in the layer etc. also will become and be important characteristic. The kind of bonding agent Although can carry out in good time selection according to the base material that will use, as in adhesive linkage, using Resin, in synthetic resin system, have Lauxite system, melamine resin system, phenolic resins system, Epoxy resin, vinylacetate resin system, cyanoacrylate system, polyurethane series, α-chain Alkene-maleic anhydride resin system, aqueous macromolecule-isocyanate system, acrylic resin system, UV Cured resin systems etc. in addition, also have emulsion-type bonding agent, heat to melt bonding agent, synthetic rubber Be bonding agent, silicone-based bonding agent, inorganic be bonding agent etc.
As the conductive layer that forms in the said film top, can use Au, Ag, Al, Pt, The metal of Cu etc. or the alloy take them as main component, the oxide of these metals, nitrogen Compound, ITO or conducting polymer etc., so long as can patterned material, do not have the spy Other restriction. Can also make as required them carry out lamination. Here, in the situation of metal Lower, thickness it is desirable to 50 dusts~50 micron. If less than 50 dusts, then shield effectiveness is remarkable Degenerate, if surpass 50 microns then the figure processability will reduce or the light penetration reduction. As the laminating method of conductive layer, the methods such as evaporation, sputter, ion plating are arranged, have galvanoplastic, The laminating of metal forming or use simultaneously method of these methods etc. In addition, contain ITO's The film build method of oxide or nitride, although sputtering method is general method, colloidal sol-Gel method also is possible. Forming with evaporation or galvanoplastic in the situation of conductive layer, can Use photoetching process, in the situation of using coating, can form figure with print process. The thickness of conductive layer is in 1 micron the situation, and fine rule processing is easy, so to establishing at figure It is favourable improving light penetration in the meter, under conductive layer is situation more than 1 micron, and table The surface resistance value will diminish, so have the effect of improving shielding character. As film build method, can Advance according to the conductance of employed material, the thickness of conductive layer, aperture opening ratio and the shape of figure The consideration of employed properties of materials and economy aspect is added in the row design, as long as select The film build method that is suitable for obtaining the purpose thickness gets final product.
When conductive layer formed figure, its shape was very important. For example, just as PDP Screen is such, has formed latticed pixel at object that the transparent electromagnetic wave shield is set In the situation, when the latticed figure of the pixel of PDP and transparent electromagnetic wave shield the two When overlapping, More (Moire) striped will take place the visual of picture significantly reduced. So, In the present invention, as the method for eliminating this moore phenomenon, find: thin at transparent polymer Film be that the conductive layer that forms on the single face is when being processed into latticed figure, as long as between line at least Every Pi be processed into the Pi that represents with following formula (i=0,1,2 ..., n) get final product.
Pi=Pmin+(Pmax-Pmin)·αi              (A)
i=0,1,2,…,n
Pmin: the minimum of a value at line interval
Pmax: the maximum at line interval
α i: can be in the random number of 0~1 selection
As everyone knows, Moire fringe is when uniformly-spaced the line of pitch overlaps, because of the mutual respect of line phase Folded and take place. One of reason that takes place as Moire fringe can be thought because at each Sparse part and close part take place during line overlap continuously, thereby produce as close part The new grid that is observed of non-individual body. For graphics shape being designed to such an extent that make this close part Do not carry out regularly arranged, as long as make the line interval guarantee that shielding character and optical characteristics institute must Become irregular in the scope of palpus and get final product, particularly, used random number as long as be designed to picture Formula (A) shown in get final product like that. Although the minimum of a value at line interval, maximum are can root At random determine according to the mesh shape of being located at as in the electromagnetic wave generating source of object, still, In the situation of the display screen as PDP, the line interval so long as 20 microns~1mm get final product, Again desirable any be 70~500 microns, more preferably 80~200 microns. Here institute The line interval of saying is defined in the figure top and uses in the situation of 1 dimension coordinate arbitrarily, and is adjacent The distance between centers of line. The line that forms figure can be used straight line, curve or their combination structure Become.
In addition, as the method for removing moore phenomenon, find: at the transparent polymer film extremely The shape of the conductive layer that forms on few single face is so long as straight line or curve are just, in the feelings of curve Under the condition, as long as make Sin, Tan, index, logarithm, inverse proportion function are arranged in length and breadth The figure that gets up gets final product. Moore phenomenon is owing to producing because of the dividing wall that forms the PDP pixel The periodic intensity distributions of light intensity and the same intensity branch that is produced by conducting layer figure Cloth synthesizes generation. Therefore, in the pixel that consists of PDP and the shape of conducting layer figure Similarly in the situation, just be easy to take place Moire fringe. When as in the present invention, a certain During Sin, Tan, index, logarithm, inverse proportion function application design to conducting layer figure In the situation, although owing to the strong of light taken place in the coincidence of the dividing wall of PDP and electroconductive member pattern Degree distributes, but since this intensity distributions can make than with the visual degree that can not identify also So small and homogeneous is can be at the aperture opening ratio of keeping enough transparencys and electromagnetic wave screen Cover characteristic constant the time, suppress the generation of moore phenomenon. Here, because Moire fringe Depend on the shape when making PDP pixel and electromagnetic wave shielding graphs coincide, so consist of electricity The period of a function of magnetic wave shielding figure, amplitude etc. can be in the pitches of considering the PDP pixel With determine after the live width. In addition, arrange pitch, the live width of these functions, can guarantee required At random determine in the electromagnetic wave shielding characteristic of wanting and the scope of aperture opening ratio.
The figure processing of conductive layer is determining that aspect the shielding character be extremely important. Shielding character Relevant with sheet resistance and the mesh-density of conductive layer, expect the purpose shielding character, according to These design is necessary. Mesh-density is by the live width of conductive layer and the interval determination between line, The sheet resistance of conductive layer is then determined by the resistivity value of conductive materials and the thickness of conductive layer.
Here, as the condition of guaranteeing simultaneously these characteristics, we find: make by metal The live width of the film pattern that film consists of is the P micron, when the thickness of metallic film is the D micron, The ratio of P and D it is desirable in 1~540 scope, more preferably the ratio of P and D Be 2~240. In this scope, can be in the sheet resistance value that keeps fully conductive layer Simultaneously, guarantee shielding character and the transparency both. Considering the thickness of substantial conductive layer Situation under, if P/D less than 1, then can not obtain sufficient shield effectiveness, if surpass 540, Then can produce transparent significantly reduced problem.
Making as metal level in the situation about copper being laminated on the transparent macromolecule membrane, deposit In the problem that can not get being adjacent to fully power. It is believed that this be because base material, adhesive linkage and Big different cause such as the physical constant of the linear expansion coefficient of copper layer, elastic modelling quantity etc. In addition, Being difficult to design the bonding agent of guaranteeing the transparency and being adjacent to property, also is a big factor. Should Problem is especially remarkable in the situation with the method lamination copper of evaporation or sputter etc., is difficult to be filled The being adjacent to property of dividing. In the inadequate situation of the being adjacent to property between copper and the base material, just be difficult to improve Therefore productivity, exists the problem of the price rising of product.
So in order to address the above problem, we find to adopt and as adhesive linkage transparent gold are set The way that belongs to oxide just can be guaranteed the transparency and being adjacent to property, and can obtain height The shielding transparent body for electromagnetic wave of reliability. Particularly when making conducting layer figure turn to fine rule, This problem is important. For example, carry out with etching procedure graphical when, for can Bear water jet hydraulic pressure, the power that is adjacent to of base material and conductive layer is minimum also to be needed about 0.3kg/cm, Then need the power that is adjacent to more than the 1.0kg/cm as in practical no problem grade. If Less than such power that is adjacent to, then will become graphical after conductive layer peel off or break during lithography Reason. In addition owing to wish to have high light penetration, so the thickness of adhesive linkage, The refractive index of the material that uses in the adhesive linkage etc. also will become important characteristic.
As the example of transparent metal film, can enumerate In here,2O 3Or In2O 3And Sn2O 3(ITO)、In 2O 3With ZnO, In2O 3And Ga2O 3Deng conductive complex oxide thing, SiOx、TiO x, their composite oxides etc. Film build method as transparent oxide-film has The vacuum vapour deposition of sputter, evaporation, ion plating etc., the coating process that carries out with melten gel-gel method Deng, can after considering the kind that will carry out the film of film forming, thickness, productivity etc., carry out Select. If use vacuum vapour deposition, owing to can form the low conductive film of resistance value, so can Expectation improves shield effectiveness, with in the situation of coating process, owing to can expect because of superficial layer The fine concavo-convex fixed effect that produces is so be favourable for being adjacent to property of raising. Forming Before the transparent metal oxide-film, for obtain and base material between being adjacent to property, can also lead to The pre-treatment of the normal bottom coating processing of using, plasma treatment, Corona discharge Treatment etc.
Then, form the copper layer in transparent metal film top. When in transparent metal oxide-film top Behind the lamination copper, between copper layer and transparent oxidation film layer, will produce electricity and move. Although by means of this meeting Between two-layer, generate the intermediate layer that is consisted of by cuprous oxide, still, because this intermediate layer is thick Degree has the oblique structure that the composition of two compositions changes bit by bit on the direction, so being adjacent to property will Being adjacent to property when raising must surpass the intermediate layer that cuprous oxide only is set. In addition, along with oxygen Change is advanced to cupric oxide from cuprous oxide, and being adjacent to property will after the thickness as copper oxide increases Descend conversely, thus because of the electricity of copper and transparent metal oxide-film move the sort of degree that produces in The composition of interbed and thickness are the most suitable for making the power of being adjacent to become maximum. Remove raising Outside the being adjacent to property, can also improve simultaneously other important characteristic.
(1) for example, in case block turns to purpose, usually Nickel Plating Treatment or antirust coat processing are implemented in the copper surface, but, by the way of the high transparent oxidation film layer of gas barrier is set, just can prevent intrusion, can prevent the deterioration of ageing the being adjacent to property that causes because of oxidation from the gas of the water vapor of base material direction and oxygen etc.This is important to the situation that will obtain long-standing reliability.
(2) using as electric conductor under the situation of transparent metal oxide,, also giving electric conductivity the mesh openings part that forms by copper by carrying out lamination, so, also can give the effect that improves electromagnetic shielding effect.In electromagnetic wave shielding that forms by grid and ITO film, designing to such an extent that make under the different situation of the frequency dependence of shielding character, since can obtain the electromagnetic frequency that can shield wide, so can improve characteristic significantly as electromagnetic wave shield.
(3) the ITO film has the characteristic of the light of shielding near infrared light area, also can obtain giving the effect of shielding transparent body for electromagnetic wave with the near infrared ray block function.
(4) by means of carrying out refractive index poor of the overlay of lamination, can make it to have the reflection function of preventing with the ITO film.
Here, the thickness of copper layer it is desirable to 50 dusts~50 micron.This be because if less than 50 dusts then shield effectiveness significantly degenerate, if surpass 50 microns, the cause that the figure processability reduces or light penetration reduces then.As the formation method of the copper layer here, remove outside sputtering method, the vapour deposition method, can also use electrochemical plating, can select from aspects such as economy, figure processability, shielding characters.In addition, be purpose, also can implement the electroplating processes of carrying out, antirust coating processing to the copper surface as required with gold, nickel etc. in case oxidation worsens.
In the figure processing of copper, must only carry out optionally etching to the copper layer.Aspect this optical characteristics at the being adjacent to property that satisfies the copper layer, electromagnetic wave transparent shielding material, the shielding character is important.The condition of figure processing can be set according to the kind of transparent metal oxide film.For example, at SiO x, TiO xOr under the situation of their composite oxides, can use usually cupric chloride that the etching liquid as copper uses, iron chloride etc., if the high nesa coating of crystallization degree, then adopt the way of the selective etching liquid that uses ferric nitrate etc., just can be optionally etching copper layer only.
PDP utilizes xenon gaseous discharge to make it luminous.At this moment the near infrared ray that is produced is to external leakage, causes the misoperation of the sensor that widely utilizes, so the near infrared ray block function is indispensable to the front barricade of PDP.Here be necessary the near infrared light area that shields to it is desirable to 800nm~1100nm, even more ideal is the scope of 800nm~1500nm.In addition, in the visible region of 400nm~800nm, must keep sufficient light penetration.Yet the material that has function of shielding in this near infrared light area also has absorption mostly in the visible region, be that transparent material seems the problem with look although exist.The present invention finds to adopt and mixes the method that way that pigment into carries out color correction solves this band look problem.
Mix pigment into, except dyestuff, pigment, as long as have absorbefacient pigment in the visible region, the qualification that just has nothing special also can be mixed into several pigments.Though used pigment can from employed near-infrared-absorbing material, to become the intermiscibility between the resin bed of bonding agent, dissolubility in solvent is selected, but, for example as synthetic dyestuffs, oily molten based dye is arranged, the organic solvent dissolution dyestuff of the organic solvent soluble dye of metal complex type etc., or disperse dyes, basic-dyeable fibre, the acid dyes of metal complex dyes etc., reactive dye, direct dyes, sulfur dye, vat dye, azo dyes, mordant dye, composite dye, as inorganic based dye mica shape iron oxide is arranged, white lead, the red lead, chrome yellow, vermilion, ultramarine, Prussian blue, cobalt oxide, the strontium chromate, zinc chromate, titania, titan yellow, titanium is black, iron black, molybdenum system, lead monoxide, lithopone, as the organic system dyestuff, can enumerate azo dyes, phthalocyanine dye etc.
Colourlessly think by means of the tone that revise to produce is approaching more, still, can after considering visuality, texture etc., at random select according to the purposes of using the transparent electromagnetic wave shield with regard to unreasonable.In addition, in order to find the near infrared ray block function, also can mix several different near infrared ray occluding materials of wavelength region may of into blocking.
In order to give the near infrared ray block function, give the method for transparent polymer enhancing body and the method for laying overlay again the near infrared ray block function though can use, but, the former result becomes to thermotolerance that is subjected to the near infrared ray occluding material and dissolubility etc. and results from the restriction of creating conditions of base material, the latter then result becomes to increasing operation newly, and problem is being arranged in price.So, adopting the way of giving bond layer the near infrared ray block function, just can address this problem.
Because bonding agent can be selected from very many materials, be easy so satisfy the material design of the characteristic of the near infrared ray occluding material that will use.In addition, has this function owing to can make, so do not need the new overlay of lamination at indispensable bonding agent aspect the being adjacent to property that keeps base material and conductive layer.Though the incorporation of near infrared occluding material also depends on the thickness of bond layer, but in general, resin solid part for bond layer, just can realize this function with the incorporation below the 1wt%, so adopt the way that adds the near infrared ray occluding material, can not change the characteristic of bond layer greatly.
As mentioned above, under the situation of mixing near infrared ray occluding material and pigment, if exist when poor for intermiscibility, dispersiveness and the The suitable solvent of resin, it is difficult then mixing these in one deck.Therefore, under these circumstances, the side with selection degree of freedom of material that mix and resin bed can improve the function as shielding transparent body for electromagnetic wave.For this reason, the bond layer 1 that between conductive layer and film, is provided with and make conducting layer figureization after the laminate film that forms paste transparent polymer and strengthen in the bond layer 2 on the body, as long as adopting the near infrared occluding material with to the near infrared occluding material has the pigment of color correction relation to be divided into bond layer 1 and bond layer 2, perhaps only add bond layer 1 to or only add way in the bond layer 2 to, make shielding transparent body for electromagnetic wave and get final product.
As the characteristic of bond layer, though require for by the bonding strength of convered structure,, just as mixing the dissolution characteristics number of substances different with the intermiscibility between the resin, the design fits prescription is very difficult.Yet, to adopt their the separated way of going in the resin bed of adding to again, near infrared ray occluding material, the selection that is used for carrying out the pigment of color correction will become very easy.Particularly for bond layer 1, the heating process when the conductive layer lamination, graphically add man-hour, bond layer sometimes will be exposed in acid, the aqueous alkali, at this moment, it is desirable to mix the material that characteristic worsens significantly in bond layer 2.
Only in bond layer 1, do not dissolving fully under the two the situation of near infrared occluding material and color correction material, can constitute bond layer 1 and 2 yet so that appropriate resin is separately formed.In addition, depend on the used material that mixes, what have is low to dissolving resin, if think that only obtaining effect with 1 layer then exists the problem that thickness becomes very thick.In this case, adopt to be divided into 2 layers of way of mixing, then need not thicken the thickness of each layer above required thickness.
Yet near infrared occluding material and pigment after mixing have in this wise confirmed to exist the variational problem of heatproof humidity, and absorption characteristic timeliness ground changes, and exists problem sometimes aspect long-term reliability.Particularly have in the near infrared occluding material of absorption characteristic in the ultraviolet range, this tendency is remarkable, brings into play original function fully in can not be between long-term.So in the present invention, we find:, prevent the deterioration of fading of near infrared occluding material by 1 layer of way of having mixed the layer of the material with ultraviolet block function is set at least.
Here used ultraviolet occluding material, so long as have the just special restriction of nothing of material of the ultraviolet range being carried out barrier effect, that for example, can enumerate the organic system ultraviolet light absorber of salicylate system, benzophenone system, benzotriazole system, cyanoacrylate system, nickel chelate system etc. and titanium dioxide, zinc paste, iron oxide etc. inorganicly is particulate and is called light stabilizer of bulky amine system (HALS) or the like.The ultraviolet ray occluding material uses these all to have no relations separately or together.The layer that has mixed ultraviolet occluding material can be any one deck of being located on the shielding transparent body for electromagnetic wave.
In addition, confirm: the variation of the absorption characteristic of near infrared ray occluding material and pigment, have because of and the danger that promoted significantly of moisture coexistence.This is because moisture plays a part the cause of catalyzer.This problem can adopt the way of near infrared occluding material and pigment being protected with water vapor barrier layer to solve.Water vapor barrier layer can be provided with separately, also multilayer can be set.Perhaps can also make the bond layer that mixes the near infrared occluding material have this function.
As the special restriction of material nothing that is used for forming water vapor barrier layer, for example polyvinyl alcohol (PVA), ethylene-vinyl alcohol copolymer, polyacrylonitrile, Vingon etc. are arranged as organic system, transparent metal oxides such as silicon dioxide, aluminium oxide, titania, ITO are arranged as inorganic system, can carry out suitable selection according to price, productivity and needed block.Film build method can for example have coating process, vapour deposition method according to the decision of employed material, spatter manage, ion plating method or the like.
The electric conductivity of conductive layer is generally the scope of 10KHz~1000MHz as the electromagnetic frequency of object of restriction, so must be 10 3The intrinsic resistance that Ω cm is following.
In general, electromagnetic shielding effect can be represented with following formula. S ( dB ) = 10 log ( 1 / ρf ) + 1.7 t f / ρ
S (dB): electromagnetic shielding effect
ρ (Ω cm): the volume intrinsic resistance of conducting film
F (MHz): wave frequency t (cm): the thickness of conducting film
Certainly, want to strengthen shield effectiveness S and just need unrestrictedly reduce intrinsic resistance ρ, the low more electromagnetic wave that just can shield the frequency of wideer scope effectively of this resistance.Expect that the purpose shield effectiveness can suitably design the thickness of conductive layer.
Adopt the way that forms the electromagnetic wave blocking color filter in this wise, just can improve the shield effectiveness of representing with following formula significantly.
S(dB)=20×log 10(E0/E1)
E0: incident electromagnetic wave
E1: by after electromagnetic wave
As the reflection loss amount of allowing of existing wave absorber, be a reference standard to be equivalent to more than the 20dB of electric wave absorptivity more than 99%, if but adopt the present invention then 30~50dB be possible.
The transparent polymer reinforcement plate can bear external pressure, owing to wait the damage that produces will make the transparency reduce due to wound, so will hard conating be set according to hope.Hard conating, except that the UV cured resin of propylene oxide acid esters, urethane acrylate etc., comprise the thermoset resin of epoxy resin, inorganic material, specifically transparent oxide of monox, aluminium oxide, titanium dioxide, zirconia etc. etc. is desirable.In addition, as original reinforcement plate,, need the intensity that thickness produced more than the 1mm from using the high molecular aspect that concerns for weight reduction.Thickness is gained in strength bigger and bigger, but is disadvantageous from weight, transparent aspect, so if be decided to be and can bear artificial external pressure, the intensity of pressure, just can achieve the goal with the thickness more than the 1mm, is being below the 5mm in the practicality.
In addition, the transparent polymer reinforcement plate it is desirable to have the reflection function of preventing.This is in order to prevent the diffuse reflection in the display part office from PDP, to improve contrast and be provided with.Certainly, also can give hard conating and prevent reflection function, also can dividing with it comes carries out lamination.
Preferred embodiment
Embodiment 1
After on the film of the polyethylene terephthalate that urethane adhesive layer 1 is coated to 75 microns of thickness (below, be abbreviated as PET) substrate, lamination Copper Foil (12 microns of thickness) obtains the PET film with Copper Foil.This conducting layer figure is processed into the mesh shape that straight line is lined up in length and breadth with photoetching process.At this moment each line is stipulated with following formula at interval.In addition, live width at this moment is 10 microns.
Pi=100+(170-100)×αi (6)
The random number of α i:0~1 (between)
Then, single face to the thick polycarbonate substrate of 2mm is implemented the hard conating that has more than the pencil hardness 3H that prevents reflection function, with aliphatic polyester type polyurethane (Japan モ ト-Application production, trade name AD-N401) bond layer 2 figure processing base material is laminated on the back side of hard conating.In addition, use silver paste (Sumitomo Bakelite production, trade name CRM-1085) bonding conducting film and flat cable at the peripheral edge portion place, and carry out electrical ground.As the light penetration under the 550nm of transparent electromagnetic wave shield is 74%, light penetration<10% (900~1200nm) near infrared light area, the electric field shielding characteristic is (ァ De バ Application テ ス ト method) more than the 50dB in the scope of 200~1000MHz, and the result is good.In addition, when in PDP picture top shielding transparent body for electromagnetic wave being set, Moire fringe, picture visual excellent characteristic can not taken place.Pencil hardness is 3H in addition, and scratch property is good, as PDP electromagnetic wave shielding transparent panel, has obtained not only that shielding is good, and permanance is excellent characteristic very also.
Comparative example 1
In embodiment 1, make the grid network that will form all with line 10 microns formation of 160 microns live widths at interval with graphical processing.On the front of PDP shielding transparent body for electromagnetic wave is set, Moire fringe has taken place in the result, can not use for actual.
Embodiment 2~3
After on the PET film that urethane adhesive layer 1 is coated to 75 microns of thickness, Copper Foil on the lamination (thick 12 microns) obtains the PET film with Copper Foil.With photoetching process this conductive layer is graphically processed, be made into and arrange the figure that to use the curve of Sin function and Tan function representation in length and breadth.At this moment live width is 10 microns, and pitch is set according to above-mentioned formula (6) (embodiment 2) and formula (7) (embodiment 3).
Pi=100+(170-150)×αi (7)
The random number of α i:0~1 (between)
Then, single face to the thick polycarbonate substrate of 2mm is implemented the hard conating that has more than the pencil hardness 3H that prevents reflection function, with aliphatic polyester type polyurethane (Japan モ ト-Application production, trade name AD-N401) bond layer 2 figure processing base material is laminated on the back side of hard conating.In addition, use silver paste (Sumitomo Bakelite production, trade name CRM-1085) bonding conducting film and flat cable at the peripheral edge portion place, and carry out electrical ground.Pencil hardness is 3H, and scratch property is good, as PDP electromagnetic wave shielding transparent panel, has obtained not only that shielding is good, and permanance is excellent characteristic very also.
In embodiment 2, the light penetration under 550nm is 74%, and (900~1200nm), the electric field shielding characteristic is (ァ De バ Application テ ス ト method) more than the 50dB in the scope of 200~1000MHz, and the result is good at light penetration<10% of near infrared light area.
In embodiment 3, the light penetration under the 550nm is 78%, and (900~1200nm), the electric field shielding characteristic is (ァ De バ Application テ ス ト method) more than the 48dB in the scope of 200~1000MHz, and the result is good at light penetration<10% of near infrared light area.
Shielding transparent body for electromagnetic wave is set to PDP picture top, in embodiment 2 and embodiment 3, has all obtained not taking place Moire fringe, the visual excellent characteristic of picture.
Embodiment 4~6
In embodiment 1, using the curve of describing by exponential function (embodiment 4), logarithmic function (embodiment 5), inverse proportion function (embodiment 6) to constitute figure, lay equal stress on when being incorporated on the PDP picture, just be made into Moire fringe, visual good electromagnetic wave transparent shielding material do not take place.
Comparative example 2
In embodiment 1, the thickness of copper layer is 35 microns, and the live width of latticed color filter figure is 30 microns, and interval width is 300 microns.At this moment, the shield effectiveness in the scope of 200~1000MHz is 40dB, and the light penetration when 550nm is 30%.
Embodiment 7
As primer coating, with molecular weight 1540, the epoxy acrylic ester prepolymer that fusing point is 70 ℃ (clear and macromolecule production, trade name VR-60) 100 weight portions, acetate cellosolve 100 weight portions, benzoin ethyl ether 2 weight portions are applied as 1 micron thickness.Making the indium oxide film forming with sputtering method again is that transmitance is 80%, the crystalloid film of face resistance 150 Ω.Secondly, make the copper forming thin film with sputtering method, thickness is 2000 dusts, and then, carrying out electroplating processes, to obtain copper thickness be 4 microns, and sheet resistance value is 4 * 10 -3The PET film of the band Copper Foil of Ω/.Using photoetching process, is that etching liquid is graphically processed this conductive layer with the ferric nitrate, obtains the color filter figure of embodiment 1 described the sort of shape.
To be bonding agent the copper-clad surface of resulting film be bonded together to each other carries out 90 degree disbonded tests with thermosetting epoxy resin, obtained the above power that is adjacent to of 1kg/cm.In the hot and humid accelerated tests of implementing down of 80 ℃ of 90%RH, the power of being adjacent to behind the 1000h is that 900g/cm has reached no problem in fact grade.
In addition, as the light penetration under the 550nm of transparent electromagnetic wave shield is 70%, (900~1200nm), the electric field shielding characteristic is (ァ De バ Application テ ス ト method) more than the 50dB in the scope of 200~1000MHz, and the result is good at light penetration<10% of near infrared light area.
Embodiment 8
Except making SiO xOutside the transparent metal oxide film, make shielding transparent body for electromagnetic wave with embodiment 7 the samely.Being adjacent to property test has similarly to Example 7 obtained the above power that is adjacent to of 1kg/cm.
In addition, as the light penetration under the 550nm of transparent electromagnetic wave shield is 72%, (900~1200nm), the electric field shielding characteristic is (ァ De バ Application テ ス ト method) more than the 50dB in the scope of 200~1000MHz, and the result is good at light penetration<10% of near infrared light area.
Comparative example 3
In embodiment 7, the transparent metal oxide film is not set, with electroplating processes lamination copper.The damaged of a part of line in the graphical operation of back, takes place less than 200g/cm in being adjacent to property test similarly to Example 7, the power that is adjacent to, and it is very bad that yield rate becomes.
Embodiment 9
Be that the near infrared ray occluding material (produce by Japanese chemical drug (strain) having mixed indium, trade name IRG-022) and be used for carrying out color correction pigment (Japanese chemical drug production, trade name KAYASET Blue A-2R) after urethane adhesive layer 1 is coated on the PRT film of 75 microns of thickness, implemented the Copper Foil of roughened on the lamination of two sides, obtained PET film with Copper Foil.With photoetching process this conductive layer is graphically processed, obtained the color filter figure of the sort of shape of embodiment 1.
Single face to the thick polycarbonate substrate of 2mm is implemented the hard conating that has more than the pencil hardness 3H that prevents reflection function, with aliphatic polyester type polyurethane (Japan モ ト-Application production, trade name AD-N401) bond layer 2 figure processing base material is laminated on the back side of hard conating.In addition, use silver paste (Sumitomo Bakelite production, trade name CRM-1085) bonding conducting film and flat cable at the peripheral edge portion place, and carry out electrical ground.As the light penetration under the 550nm of transparent electromagnetic wave shield is 70%, light penetration<10% (900~1200nm) near infrared light area, the electric field shielding characteristic is (ァ De バ Application テ ス ト method) more than the 50dB in the scope of 200~1000MHz, and the result is good.The pencil hardness of hard conating face is 3H, and scratch property is good, as PDP electromagnetic wave shielding transparent panel, has obtained not only also excellent characteristic of the good permanance of shielding.
Embodiment 10
After on the PET film that urethane adhesive layer 1 is coated to 75 microns of thickness, Copper Foil on the lamination (thick 12 microns) obtains the PET film with Copper Foil.With photoetching process this conductive layer is graphically processed, obtained the color filter figure of embodiment 1 described the sort of shape.
Forming the hard conating that has more than the pencil hardness 3H that prevents reflection function on the single face of the thick polycarbonate substrate of 2mm, with having mixed into aluminium is (the Japanese chemical drug production of near infrared occluding material, trade name KAYASORB IRG-022) and be used to carry out pigment (the Japanese chemical drug production of color correction, trade name KAYASET Blue A-2R) aliphatic polyester type polyurethane (Japan モ ト-Application production, trade name AD-N401) bond layer 2 is laminated to figure processing base material on the back side of hard conating.In addition, use silver paste (Sumitomo Bakelite production, trade name CRM-1085) bonding conducting film and flat cable at the peripheral edge portion place, and carry out electrical ground.
As the light penetration under the 550nm of transparent electromagnetic wave shield is 74%, light penetration<10% (900~1200nm) near infrared light area, the electric field shielding characteristic is (ァ De バ Application テ ス ト method) more than the 50dB in the scope of 200~1000MHz, and the result is good.The pencil hardness of hard conating face is 3H, and scratch property is good, as PDP electromagnetic wave shielding transparent panel, has obtained not only also excellent characteristic of the good permanance of shielding.
Embodiment 11
In embodiment 9, in bond layer 1, mix indium system (Japanese chemical drug production, trade name KAYASORB IRG-002) as the near infrared occluding material, paste on the reinforcement plate after in bond layer 2, mixing the pigment that is used for the band look of this material is revised.As the transparent electromagnetic wave shield, the light penetration that can be formed on the near infrared light area of 900~1200nm is below 10%, and the light penetration when 500nm is 68%, and not with the transparent electromagnetic wave shield of look.
Comparative example 4
In embodiment 11, be used for carrying out the pigment of color correction in bond layer 2, not mixing and the laminate film that carried out figure processing pastes on the reinforcement plate.Although the light penetration at the near infrared light area of 900~1200nm is below 10%, the light penetration when 500nm is 68%, but has to result from the green of near infrared occluding material, can not be used as the transparent electromagnetic wave shield that PDP uses.
Embodiment 12
Mixed (the Japanese chemical drug production of near infrared occluding material at handle, trade name KAYASORBIRG-002) after urethane adhesive layer 1 was coated on the single face of thick 75 microns PET film, the Copper Foil (12 microns of thickness) that lamination was implemented roughened on the two sides obtained the PET film with Copper Foil.With photoetching process this conductive layer is graphically processed, obtained the color filter figure of embodiment 1 described the sort of shape.
As the UV barrier layer, be provided with on the thick polycarbonate substrate of 2mm that to have added benzotriazole be the Epocryl layer of the light stabilizer of ultraviolet light absorber and bulky amine system, the hard conating that has more than the pencil hardness 3H that prevents reflection function is set again above that.With having mixed near infrared occluding material and pigment (the Japanese chemical drug production relevant with carrying out color correction, trade name KAYASET Blue A-2R) aliphatic polyester type polyurethane (Japan モ ト-Application production, trade name AD-N401) bond layer 2 is laminated to figure processing base material on the back side of hard conating.In addition, use silver paste (Sumitomo Bakelite production, trade name CRM-1085) bonding conducting film and flat cable at the peripheral edge portion place, and carry out electrical ground.
As the light penetration under the 550nm of transparent electromagnetic wave shield is 74%, light penetration<10% (900~1200nm) near infrared light area, the electric field shielding characteristic is (ァ De バ Application テ ス ト method) more than the 50dB in the scope of 200~1000MHz, and the result is good.The pencil hardness of hard conating face is 3H, and scratch property is good, as PDP electromagnetic wave shielding transparent panel, has obtained not only also excellent characteristic of the good permanance of shielding.In addition, also carried out the heatproof humidity behind the 1000h and changed test, the deterioration of near infrared ray block function is not observed the variation that worsens the tone that is produced because of the color correction effect in 3%.
Embodiment 13
In embodiment 12, in the back side and the UV barrier layer of the face of the lamination copper of PET film and prevent to be respectively equipped with silicon dioxide film as water vapor barrier layer between the reflection horizon.After having carried out 1000 hours humid heat treatment (80 ℃ of 90%RH), the deterioration of learning the near infrared block function is not observed the variation that worsens the tone that is produced because of the color correction effect in 3%.
Comparative example 5
In embodiment 12, ground, UV restraining barrier is not set makes shielding transparent body for electromagnetic wave.After the heatproof humidity of having carried out 1000 hours changed test, the light penetration under 550nm was 70%, and (900~1200nm), the near infrared ray block function worsens significantly as can be seen at light penetration<40% of near infrared light area.After the heatproof humidity of having carried out 1000 hours changed test, the light penetration under 550nm was 70%, and (900~1200nm), the near infrared ray block function worsens significantly as can be seen at light penetration<40% of near infrared light area.
Comparative example 6
In embodiment 13, water vapor barrier layer is not set and makes shielding transparent body for electromagnetic wave.After the heatproof humidity of having carried out 1000 hours changed test, the light penetration under 550nm was 71%, and (900~1200nm), the near infrared ray block function worsens significantly as can be seen at light penetration<38% of near infrared light area.
Embodiment 14
In embodiment 1, as the formation method of conductive layer, make copper form the film of 2000 dusts with sputtering method after, carry out electroplating processes, make the thickness of copper become 4 microns.As the transparent electromagnetic wave shield, the light penetration under 550nm is 74%, and (900~1200nm), the electric field shielding characteristic greater than 45dB, is good in the scope of 200~1000MHz at light penetration<10% of near infrared light area.
Apparent from above embodiment, if adopt the present invention, then can provide the transparency good shielding transparent body for electromagnetic wave.

Claims (18)

1. shielding transparent body for electromagnetic wave is characterized in that: the conductive layer by transparent polymer film and the threadlike graph shape that forms on its single face at least constitutes, and each line in this threadlike graph shape is the random value between 20 microns~1mm at interval.
2. the described shielding transparent body for electromagnetic wave of claim 1, it is characterized in that: the threadlike graph shape is the mesh shape that straight line is lined up in length and breadth.
3. the described shielding transparent body for electromagnetic wave of claim 1 is characterized in that: the threadlike graph shape is the shape that the curve of following Sin function (1) shown in the following formula or Tan function (2) is lined up in length and breadth.
y=A·Sin(αx+φ) (1)
y=B·Tan(βx+φ) (2)
(A, B, α, β, φ, φ: constant) arbitrarily
4. the described shielding transparent body for electromagnetic wave of claim 1 is characterized in that: the threadlike graph shape is the shape that the curve of following exponential function shown in the following formula (3) or logarithmic function (4) is lined up in length and breadth.
y=C·exp(γx+ρ) (3)
y=D·ln(δx+ξ) (4)
(C, D, γ, δ, ρ, ξ: constant) arbitrarily
5. the described shielding transparent body for electromagnetic wave of claim 1 is characterized in that: the threadlike graph shape is the shape that the curve of following the inverse proportion function (5) shown in the following formula is lined up in length and breadth.
y=E/x (5)
(E: constant) arbitrarily
6. the described shielding transparent body for electromagnetic wave of claim 1 is characterized in that: the threadlike graph shape is the shape that the described straight line of claim 2~5 or curve assembled arrangement are got up.
7. any one described shielding transparent body for electromagnetic wave in the claim 1~6, it is characterized in that: the live width of threadlike graph is being decided to be P (micron), when the thickness of conductive layer was decided to be D (micron), the scope of the ratio (P/D) of P and D was 1~540.
8. the described shielding transparent body for electromagnetic wave of claim 7, it is characterized in that: the scope of the ratio (P/D) of P and D is 2~240.
9. shielding transparent body for electromagnetic wave, it is characterized in that: adopt on the single face at least of transparent polymer film, as required successively after lamination adhesive linkage, transparent metal oxide film, the metal film layer, only optionally etching is removed metal film layer, the way that makes metal film layer become the threadlike graph shape makes, and each line in this threadlike graph shape is the random value between 20 microns~1mm at interval.
10. the described shielding transparent body for electromagnetic wave of claim 9, it is characterized in that: metal film layer is made of copper.
11. shielding transparent body for electromagnetic wave, it is characterized in that: adopt the way that the conductive layer of the laminate film that has mixed the near infrared occluding material and be used for carrying out constituting on the bond layer of the pigment of color correction, the single face at least that conductive layer is laminated to the transparent polymer film successively is processed into the threadlike graph shape to make, each line in this threadlike graph shape is the random value between 20 microns~1mm at interval.
12. shielding transparent body for electromagnetic wave, it is characterized in that: being processed into the threadlike graph shape by conductive layer at the laminate film that constitutes behind lamination bond layer 1 and the conductive layer successively on the single face at least of transparent macromolecule membrane, make the laminate film of the interval random variation between 20 microns~1mm between each line, pasting transparent macromolecule with bond layer 2 strengthens on the body and constitutes, has the pigment that color correction concerns the near infrared ray blocking agent with to the near infrared ray blocking agent, be incorporated in bond layer 1 and bond layer 2 at least 1 layer, but also be provided with 1 layer of ultraviolet blocking layer that is used for preventing the deterioration of near infrared occluding material at least.
13. claim 11 or 12 described shielding transparent body for electromagnetic wave is characterized in that: also be provided with 1 layer of water vapor barrier layer at least.
14. shielding transparent body for electromagnetic wave, it is characterized in that: being processed into the threadlike graph shape by conductive layer at the laminate film that constitutes behind lamination bond layer 1 and the conductive layer successively on the single face at least of transparent macromolecule membrane, make the laminate film of the interval random variation between 20 microns~1mm between each line, pasting transparent macromolecule with bond layer 2 strengthens on the body and constitutes, has the pigment that color correction concerns the near infrared ray blocking agent with to the near infrared ray blocking agent, be divided in bond layer 1 and the bond layer 2, or only be incorporated in the bond layer 2.
15. the described shielding transparent body for electromagnetic wave of each of claim 1~14 is characterized in that: the light penetration under wavelength 550nm is more than 50%.
16. the described shielding transparent body for electromagnetic wave of each of claim 1~15 is characterized in that: the transparent polymer that laminate film is laminated to more than the thickness 1mm is strengthened on the body by adhesive linkage.
17. the described shielding transparent body for electromagnetic wave of each of claim 1~16 is characterized in that: at least one side of laminate film or transparent polymer enhancing body, be provided with and prevent the reflection horizon.
18. the described shielding transparent body for electromagnetic wave of each of claim 1~17 is characterized in that: at least one side of laminate film or transparent polymer enhancing body, be provided with hard conating.
CN 99108323 1998-08-10 1999-06-07 Shielding transparent body for electromagnetic wave Expired - Fee Related CN1123011C (en)

Applications Claiming Priority (21)

Application Number Priority Date Filing Date Title
JP22583198A JP2000059077A (en) 1998-08-10 1998-08-10 Electromagnetic wave shielding transparent substance
JP275829/1998 1998-08-10
JP225826/98 1998-08-10
JP225826/1998 1998-08-10
JP10225827A JP2000059073A (en) 1998-08-10 1998-08-10 Electromagnetic shielding transparent body
JP10225828A JP2000059074A (en) 1998-08-10 1998-08-10 Electromagnetic shielding transparent body
JP225827/1998 1998-08-10
JP225831/1998 1998-08-10
JP225828/98 1998-08-10
JP225828/1998 1998-08-10
JP225830/98 1998-08-10
JP22583098A JP2000059076A (en) 1998-08-10 1998-08-10 Electromagnetic shielding transparent body
JP225830/1998 1998-08-10
JP22582698A JP2000059083A (en) 1998-08-10 1998-08-10 Electromagnetic wave shielding transparent substance
JP225827/98 1998-08-10
JP225831/98 1998-08-10
JP275829/98 1998-08-10
JP27582998A JP3412081B2 (en) 1997-11-20 1998-09-29 Audio encoding / decoding method with adjustable bit rate, apparatus and recording medium recording the method
JP27626498A JP2000114770A (en) 1998-09-30 1998-09-30 Electromagnetic wave shielding transparent body
JP276264/98 1998-09-30
JP276264/1998 1998-09-30

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007137486A1 (en) * 2006-05-25 2007-12-06 72G International Company Limited Electromagnetic shielded film and its manufacturing method
CN104885139A (en) * 2012-12-18 2015-09-02 富士胶片株式会社 Conductive film, display device equipped with same and method for determining pattern of conductive film

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007137486A1 (en) * 2006-05-25 2007-12-06 72G International Company Limited Electromagnetic shielded film and its manufacturing method
CN104885139A (en) * 2012-12-18 2015-09-02 富士胶片株式会社 Conductive film, display device equipped with same and method for determining pattern of conductive film
CN104885139B (en) * 2012-12-18 2017-05-24 富士胶片株式会社 Conductive film, display device equipped with same and method for determining pattern of conductive film

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