CN1217477A - Mfg. method for optical film overlapped chip and optical film overlapped intermediate thereof - Google Patents
Mfg. method for optical film overlapped chip and optical film overlapped intermediate thereof Download PDFInfo
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- CN1217477A CN1217477A CN98122463A CN98122463A CN1217477A CN 1217477 A CN1217477 A CN 1217477A CN 98122463 A CN98122463 A CN 98122463A CN 98122463 A CN98122463 A CN 98122463A CN 1217477 A CN1217477 A CN 1217477A
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- blooming
- optical film
- film overlapped
- phase retardation
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133504—Diffusing, scattering, diffracting elements
- G02F1/133507—Films for enhancing the luminance
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Abstract
The present invention provides a manufacturing method for stacked optical film and intermediate body of stacked optical film thereof to make an optical film laminate intermediate body to be used in common to improve the work efficiency. A first optical film intermediate body in a parallelogram shape is cut out of a belt like first optical film. The belt like optical film laminate intermediate body is formed by sticking the first optical film intermediate body on the belt like second optical film, and then this is cut in conforming with the shape of the first optical film intermediate body, thus obtaining the cut sheet type optical film laminate intermediate body. After proceeding multiple-surface examination on the cut sheet type optical film laminate intermediate body, proceed multiple-surface trimming to obtain the laminated optical film chip. In addition, the distance of the cutting lines of the first optical film intermediate body at this time is made equal to the width of a belt like second optical film.
Description
The present invention relates to the manufacture method and the optical film overlapped intermediate of optical film overlapped chip.
The blooming that with polarizing coating and phase retardation film is representative is important as the optical element that constitutes liquid crystal indicator.And, the optical axis direction of the blooming in the liquid crystal indicator, be that the slow axis direction of the absorption axes direction of polarizing coating or phase retardation film is a kind ofly can produce the key factor of significant impact to the display performance as the liquid crystal indicator of target.
In liquid crystal indicator, (super twisted nematic: STN Super TN) in type liquid crystal indicator etc., polarizing coating and phase retardation film are bonding use mostly at STN.In the case, polarizing coating and phase retardation film normally are loaded in the liquid crystal indicator as the optical film overlapped chip that is bonded together in advance.In addition, even in order to obtain to see the liquid crystal indicator that picture also can be seen easily from vergence direction, having a kind of two kinds of phase retardation films to be overlapped the device of packing into, but in the case, is to pack in the liquid crystal indicator as the optical film overlapped chip that two kinds of phase retardation films are bonded together in advance.
Manufacture method as this optical film overlapped chip, generally be to adopt such manufacture method, promptly guarantee on one side to be suitable for shape and optical axis direction as the liquid crystal indicator of target, on one side cutting out the blooming chip respectively on promptly banded polarizing coating of the blooming of band shape or the banded phase retardation film is polarizing coating chip or phase retardation film chip, they is bonded together makes optical film overlapped chip.
Each operation according to the manufacture method of Figure 10 and Figure 11 explanation optical film overlapped chip relevant with prior art.In addition, illustrative here optical film overlapped chip is with polarizing coating and the bonding chip that forms of phase retardation film.
First operation: the cutting of polarizing coating chip (step S21, S22, S23)
From the former feed roller 111 of polarizing coating the polarizing coating 110 of band shape is sent (step S21).With bevel (with respect to inclined light shaft ground width in accordance with regulations) it is cut off, cut out the polarizing coating intermediate 112 (step S22) of parallelogram continuously.Polarizing coating intermediate 112 is cut into the size (cut into the shape of chip) roughly the same with optical film overlapped chip 30, cut out a plurality of polarizing coating chips 113 (step S23).
Here, in step S23, polarizing coating chip 113 is cut into and is suitable for the shape that final product is a liquid crystal indicator, is generally square (square or rectangular).At this moment can cut simultaneously to such an extent that make the direction of optical axis (absorption axes) of polarizing coating chip 113 and the direction consistent (cutting out optical axis) of the desirable optical axis of the liquid crystal indicator that becomes final product (absorption axes).
Second operation: the cutting of phase retardation film chip (step S24, S25, S26)
From the former feed roller 121 of phase retardation film the phase retardation film 120 of band shape is sent (step S24).With bevel it is cut off, cut out the phase retardation film intermediate 122 (step S25) of parallelogram continuously.Phase retardation film intermediate 122 is cut into the size roughly the same with optical film overlapped chip 30, cut out a plurality of phase retardation film chips 123 (step S26).
Here, in step S26, phase retardation film chip 123 is cut into the shape that is suitable for as the liquid crystal indicator of final product, is generally square.At this moment can cut simultaneously (becoming axle to cut) must make the direction of optical axis (slow axis) of phase retardation film chip 123 consistent with the direction of the desirable optical axis of the liquid crystal indicator that becomes final product (slow axis).
As mentioned above, the cutting action (second operation) of cutting action of polarizing coating chip (first operation) and phase retardation film chip makes it to be suitable for respectively in the liquid crystal indicator as target all to be undertaken by identical method the desirable direction except the absorption axes direction of the optical film overlapped chip that obtained of change and slow axis direction.In addition, two-step can carry out simultaneously.
The 3rd operation: the monolithic of polarizing coating phase retardation film chip bonding (step S27)
One group one group Di polarizing coating chip 113 and phase retardation film chip 123 are bonded together with bonding agent etc., form optical film overlapped chip 30.At this moment form the optic axis of polarizing coating chip 113 and phase retardation film chip 123 respectively, be cut into the shape that is suitable for as the liquid crystal indicator of final product.If so polarizing coating chip 113 and phase retardation film chip 123 are bonded together (desirable) that slow axis (θ) becomes regulation with respect to the mutual angle of absorption axes (being the angle that slow axis constitutes with respect to absorption axes) in optical film overlapped chip 30 angle (θ each other then according to its profile
0).
The 4th operation: the fine setting of monolithic membrane (step S28)
Adjust the profile of optical film overlapped chip 30 one by one, optical film overlapped chip 30 is finely tuned (cutting off along desirable profile), so that be processed into last shape.
The 5th operation: the inspection of monolithic membrane (step S29)
Check optical film overlapped chip 30 one by one.
The 6th operation: packing (step S30)
Optical film overlapped chip 30 is confirmed on one side again,, packed simultaneously Yi Bian select.
There is following problem when, adopting above-mentioned existing method.
Two blooming chips that constitute optical film overlapped chip are bonding from carrying out after separately banded blooming cuts out one by one respectively, so that make the direction of shape and optical axis be suitable for liquid crystal indicator as target.Therefore, even the mutual angle (θ of its size of optical film overlapped chip that is obtained and desired (desirable)
0) identical, but because the absorption axes of polarizing coating is different with respect to the angle of this datum line formation with respect to the datum line of this optical film overlapped chip (making for example line of the direction uniform system on long limit of its bearing of trend and this chip) angle that constitutes and the slow axis of phase retardation film, so can not be used for optical film overlapped chip towards other liquid crystal indicator.Therefore, must be to each liquid crystal indicator manufacturing optical film overlapped chip separately.
In addition, owing to need bonding one by one optical film overlapped chip, so be easy to generate operating mistake when bonding, foreign matter is also easily attached on the bonding agent in addition.
Phase retardation film is extremely thin in addition, if bend, only this just is enough to cause the defective of display frame, thereby has lost commodity value.It is noted that when therefore, handling phase retardation film that the possibility that produces substandard products is big.
The present invention finishes in order to address the above problem, and its purpose is to make the desirable mutual angle (θ that constitutes towards two optical axises
0) the optical film overlapped intermediate of identical liquid crystal indicator is general, and a kind of manufacture method that can improve the optical film overlapped chip of work efficiency is provided simultaneously.
The manufacture method of first kind of optical film overlapped chip of the present invention be a kind of from optical axis and its parallel longitudinal or vertical band shape first blooming and second blooming of optical axis and its parallel longitudinal or vertical band shape, make the mutual angle (θ that the optical axis that makes second blooming equals to stipulate with respect to the mutual angle (θ) of the optical axis of first blooming
0) the method with first blooming and the second optical film overlapped square optical film overlapped chip that forms,
(1) cuts out with respect to it from first blooming of band shape and vertically constitute with angle θ or (θ-90 °) angle same (φ), the first blooming intermediate of the section shape of the parallelogram that the distance between parallel both sides, these both sides roughly equates with the width of second blooming of band shape arranged
The first blooming intermediate of the section shape that (2) will obtain overlaps on the second banded blooming, the above-mentioned both sides of first blooming that make the section shape are along two edges of banded second blooming, acquisition is by the first blooming intermediate of section shape and the optical film overlapped intermediate of the second optical film overlapped band shape that forms of band shape
(3) shape of the first blooming intermediate of the section shape of the optical film overlapped intermediate of the band shape that will obtain after overlapping is cut off, and obtains the optical film overlapped intermediate with first blooming and the second optical film overlapped parallelogram that forms,
(4) the optical film overlapped intermediate from the parallelogram that obtains cuts out optical film overlapped chip.
In said structure, the optical axis of second blooming is the mutual angle (θ of regulation with respect to the mutual angle (θ) as the optical axis of first blooming in the optical film overlapped chip of target
0), but the mutual angle θ of this mutual angle θ and regulation here
0All the optical axis with first blooming is a benchmark, is the angle of the optical axis formation of second blooming with respect to it, is the angle that rotates in a counter-clockwise direction when the face of first blooming, one side is seen to just representing.In addition, in this manual, in less than+180 ° scope, showing more than 0 °.
In said structure, at first cut out the first blooming intermediate of section shape from first blooming of band shape, it is overlapped on the second banded blooming.
The first blooming intermediate of section shape is that first blooming from band shape cuts out, it is with respect to vertical formation and above-mentioned angle (θ) or (θ-90 °) angle (φ) about equally of first blooming of band shape, parallel both sides are arranged, distance between these both sides roughly equates parallelogram with the width of second blooming of band shape.
Here, angle (φ) when cutting out the first blooming intermediate of section shape is vertically to be benchmark with first blooming, cutting out the angle that line constitutes relatively with it, is the angle that rotates in a counter-clockwise direction when the face of a side opposite with overlapping second blooming, one side is seen to just representing.In addition, in this manual, in less than+90 ° scope, showing more than-90 °.
Calculate such angle (φ) respectively with above-mentioned mutual angle (θ),
1. under the situation of second blooming of the band shape of first blooming of the band shape of using optical axis and its parallel longitudinal and optical axis and its parallel longitudinal, angle (φ) is equated with angle θ;
2. under the situation of second blooming of the vertical vertical band shape of first blooming that uses optical axis and the band shape of its parallel longitudinal and optical axis and its, angle (φ) is equated with angle (θ-90 °);
3. use optical axis with its vertically under the situation of second blooming of the vertical vertical band shape of first blooming and the optical axis of vertical band shape and its, angle (φ) is equated with angle θ;
4. under the situation of second blooming of the band shape of first blooming that uses the vertical vertical band shape of optical axis and its and optical axis and its parallel longitudinal, angle (φ) is equated with angle (θ-90 °).
The first blooming intermediate of the section shape of Huo Deing has two groups of parallel both sides like this, and is the parallelogram with the adjacent both sides of intersecting formation angle φ.
Secondly, the first blooming intermediate of the section shape of acquisition is superimposed on second blooming of band shape.
This is overlapping to be performed such, and promptly uses the parallel both sides that cut out this film intermediate that line forms when first blooming of band shape cuts out the first blooming intermediate of section shape to carry out overlapping along the two edges of second blooming of band shape.
So, because the first blooming intermediate of section shape is superimposed on second blooming of band shape, so the angle that the optical axis of second blooming of the band shape in the optical film overlapped intermediate of the band shape that is obtained constitutes with respect to the optical axis of the first blooming intermediate of section shape, to be the mutual angle that constitutes of these two optical axises identical with respect to the mutual angle (θ) of the optical axis of first blooming with optical axis as second blooming in the optical film overlapped chip of target, can make it and (desirable) of regulation mutual angle (θ
0) be identical angle.
Secondly, the optical film overlapped intermediate quilt of the band shape that is obtained cuts off along the shape of the first blooming intermediate of the section shape that constitutes it.So the shape parallelogram of the first blooming intermediate of section shape is the shape parallelogram of the optical film overlapped intermediate that obtains.
The optical film overlapped intermediate of the parallelogram that obtains optical film overlappedly is made of first blooming and second, the optical axis of second blooming is the angle identical with above-mentioned mutual angle θ with respect to the mutual angle of axle earlier of first blooming, and this is and the mutual angle θ that stipulates
0Identical angle.
In addition, this optical film overlapped intermediate parallelogram has two groups of parallel both sides, and wherein one group of parallel both sides is parallel or vertical with the optical axis of first blooming.
Simultaneously, another parallel both sides of group of the optical film overlapped intermediate of this parallelogram are parallel or vertical with the optical axis of second blooming of the optical film overlapped intermediate of formation.
In addition, this optical film overlapped intermediate has the adjacent both sides of intersecting formation angle φ.
Secondly, cut out optical film overlapped chip from the optical film overlapped intermediate that obtains as target.
First blooming and second blooming overlap each other in optical film overlapped intermediate of the present invention, so that the optical axis of second blooming is the mutual angle (θ of regulation with respect to the mutual angle (θ) of the optical axis of first blooming
0), so optical film overlapped chip that cuts out from so optical film overlapped intermediate, its first blooming and second blooming are overlapping like this, and promptly the optical axis of second blooming is the mutual angle (θ of regulation with respect to the mutual angle (θ) of the optical axis of first blooming
0).
Owing to as above constitute, thus can from existing operation, deduct from the first blooming intermediate cut out the first blooming chip operation, cut out the operation of the second blooming intermediate and the operation that cuts out the second blooming chip from the second blooming intermediate from second blooming of band shape.
In addition, can reduce fine setting number of times and bonding number of times, simultaneously, be stained with the situation of foreign matters such as smear metal so can reduce the bonding agent of bonding first blooming and the second blooming chip to ooze out because first blooming and second blooming are overlapping with the state of first blooming of section shape and banded second blooming.Its result, the incidence of substandard products descends, and inspection work is easy.
In addition, can be with the optical film overlapped intermediate of the optical film overlapped intermediate of band shape and section shape as in-process storage.In addition, owing to these reasons, though the direction of size and datum line is different, can cut out the common various optical film overlapped chip of mutual angle (θ), so can take care of the optical film overlapped intermediate of band shape and the optical film overlapped intermediate of section shape in universalization ground.
Therefore, can reduce production process, simultaneously owing to improving work efficiency, so can improve throughput rate.In addition, yield can be improved, the kind of the intermediate (the optical film overlapped intermediate of banded optical film overlapped intermediate, section shape) of answering the stock can be reduced simultaneously.
The manufacture method of second kind of optical film overlapped chip of the present invention is characterised in that: in the structure of first kind of manufacture method formerly, and the mutual angle (θ of regulation
0) be+40 °～+ 140 °, and optical axis and its parallel longitudinal of the first banded blooming, optical axis and its parallel longitudinal of the second banded blooming.
Owing to constitute like this, so except the effect that structure had of first kind of manufacture method of front, even at the mutual angle (θ of regulation
0) be under+40 °～+ 140 ° the situation, the first blooming intermediate parallelogram of the section shape that cuts out from first blooming of band shape, the angle φ that is made of its adjacent both sides has the adjacent both sides of intersecting with angle θ, the first blooming intermediate of this section shape is not elongated, therefore uses easily.
In addition, too, also all intersect with angle θ on adjacent both sides in the optical film overlapped intermediate that obtains, and this optical film overlapped intermediate is not elongated, therefore uses easily.
The manufacture method of the third optical film overlapped chip of the present invention is characterised in that: in the structure of first kind of manufacture method formerly, optical axis and its parallel longitudinal of the first banded blooming, the optical axis of the second banded blooming is vertically vertical with it, and the mutual angle (θ of regulation
0) be 0 °～+ 50 ° or+more than 130 ° to less than+180 °.
Owing to as above constitute, so except first kind of effect that manufacture method had, even the mutual angle (θ that is stipulating
0) be 0 °～+ 50 ° or+more than 130 ° to less than under+180 ° the situation, the first blooming intermediate of the section shape that cuts out from first blooming of band shape also is the parallelogram with the adjacent both sides of intersecting with angle (θ-90 °), so the first blooming intermediate of this section shape is not elongated, therefore use easily.
In addition, have the adjacent both sides of intersecting with angle (θ-90 °) equally in the optical film overlapped intermediate that obtains, this optical film overlapped intermediate is not elongated, therefore uses easily.
The manufacture method of the 4th kind of optical film overlapped chip of the present invention is characterised in that: except first kind of manufacture method, first blooming is a polarizing coating, and second blooming is a phase retardation film.
Owing to as above constitute, so except first kind of effect that manufacture method had, making first blooming is the higher polarizing coating of general rigidity, making second blooming is the lower phase retardation film of general rigidity, even, needn't use the phase retardation film of section shape so rigidity is low not to be allowed under the situation of tractable phase retardation film using.Therefore, can improve work efficiency, can boost productivity.
Optical film overlapped intermediate of the present invention is characterised in that: the first optical film overlapped intermediate is the overlapping so optical film overlapped intermediate that forms of first blooming and second blooming, and promptly the optical axis of second blooming is with respect to the angle (θ of mutual angle (θ) for stipulating of the optical axis of first blooming
0), it is the parallelogram with the both sides parallel or vertical with the optical axis of first blooming and other both sides parallel or vertical with the optical axis of second blooming.
Owing to as above constitute, so the optical film overlapped intermediate that is obtained is the parallelogram with the adjacent both sides of intersecting with angle θ or (θ-90 °), can easily differentiate the mutual angle (θ) of the optical axis of second blooming with respect to the optical axis of first blooming.Therefore, can improve work efficiency, can boost productivity.
Optical film overlapped intermediate of the present invention is characterised in that: the second optical film overlapped intermediate except the structure of the first previous optical film overlapped intermediate, the mutual angle (θ of regulation
0) be+40 °～+ 140 °, it has both sides parallel with the optical axis of first blooming and the both sides parallel with the optical axis of second blooming.
Owing to as above constitute, so even the mutual angle (θ that is stipulating
0) be under+40 °～+ 140 ° the situation, it is the parallelogram that φ has the adjacent both sides of intersecting with angle θ that the optical film overlapped intermediate that is obtained also is the angle that its adjacent both sides constitute, this optical film overlapped intermediate is not elongated, uses easily.Therefore, can improve work efficiency, can boost productivity.
Optical film overlapped intermediate of the present invention is characterised in that: the 3rd optical film overlapped intermediate except the structure of the first previous optical film overlapped intermediate, the mutual angle (θ of regulation
0) be 0 °～+ 50 ° or+more than 130 ° to less than+180 °, it has both sides parallel with the optical axis of first blooming and the both sides vertical with the optical axis of second blooming.
Owing to as above constitute, so even the mutual angle (θ that is stipulating
0) be 0 °～+ 50 ° or+more than 130 ° to less than under+180 ° the situation, the optical film overlapped intermediate that is obtained also is the parallelogram with the adjacent both sides of intersecting with angle (θ-90 °), so this optical film overlapped intermediate is not elongated, use easily.Therefore, can improve work efficiency, can boost productivity.
In addition, it is banded that above-mentioned first～the 3rd optical film overlapped intermediate of the present invention can be, and also can be the section shape.
Fig. 1 is the simple process flow diagram of manufacture method of the optical film overlapped chip of the expression first embodiment of the present invention.
Fig. 2 is the key diagram of general configuration of the blooming of the explanation manufacture method that is applicable to optical film overlapped chip shown in Figure 1, this figure (a) is the end view drawing of polarizing coating, this figure (b) is the end view drawing of phase retardation film, and this figure (c) is the end view drawing of optical film overlapped chip.
Fig. 3 is the diagrammatic illustration figure of blooming manufacturing process of the manufacture method of expression optical film overlapped chip shown in Figure 1.
Fig. 4 is the key diagram of a part of blooming manufacturing process of the manufacture method of explanation optical film overlapped chip shown in Figure 1, this figure (a) is banded polarizing coating, this figure (b) is a section shape polarizing coating intermediate, this figure (c) is banded optical film overlapped intermediate, and this figure (d) is the overlapping intermediate of section shape.
Fig. 5 is the key diagram of the method for designing of the section shape polarizing coating intermediate in the manufacture method of explanation optical film overlapped chip shown in Figure 1, this figure (a) is the key diagram of the choice criteria of expression phase retardation film, the key diagram of the cut-out angle when this figure (b) is an expression direction of using its slow axis with respect to the phase retardation film (being generally longitudinal extension product) of its parallel longitudinal, this figure (c) are the key diagrams of the direction of its slow axis of the expression use cut-out angle during with respect to its vertical vertical phase retardation film (being generally the horizontal expansion product).
The key diagram of the figure that cuts out of the optical film overlapped chip when Fig. 6 is an explanation direction of using its slow axis with respect to the phase retardation film (being generally the longitudinal extension product) of its parallel longitudinal, this figure (a) is the figure that the manufacture method of employing optical film overlapped chip shown in Figure 1 cuts out, and this figure (b) is the figure that the manufacture method of employing prior art cuts out.
The key diagram of the figure that cuts out of the optical film overlapped chip when Fig. 7 is an explanation direction of using its slow axis with respect to its vertical vertical phase retardation film (being generally the horizontal expansion product), this figure (a) is the figure that the manufacture method of employing optical film overlapped chip shown in Figure 1 cuts out, and this figure (b) is the figure that the manufacture method of employing prior art cuts out.
Fig. 8 is a synoptic diagram of roughly representing the adhering device that uses for the manufacturing system of the optical film overlapped chip of the manufacture method that adopts optical film overlapped chip shown in Figure 1, and this figure (a) is a planimetric map, and this figure (b) is a front elevation.
Fig. 9 is the key diagram of the figure of the many-side fine setting carried out in the blooming manufacturing process of manufacture method of expression optical film overlapped chip shown in Figure 1.
Figure 10 is an optical film overlapped manufacturing method of chip process flow diagram of representing prior art briefly.
Figure 11 is the key diagram of blooming manufacturing process of representing the optical film overlapped manufacturing method of chip of prior art shown in Figure 10 briefly.
With Fig. 1 to Fig. 9 one of the manufacture method of optical film overlapped chip of the present invention and the embodiment of optical film overlapped intermediate example is described as follows.
In the present embodiment, use polarizing coating, use phase retardation film as second blooming as first blooming.But not limit by this, first blooming also can be a phase retardation film, and second blooming also can be a polarizing coating, and perhaps first blooming is a phase retardation film, and second blooming also is a phase retardation film.In addition, be the linear polarization film as the polarizing coating of object here.
Shown in Fig. 2 (a), the basic structure of the banded polarizing coating that uses in the present embodiment (the first banded blooming) 10 is as follows.Polarizing coating 10 for example is to constitute like this: being sandwiched in the serial films of two celluloses by the sub-polarizing coating 10a as PVA (polyvinyl alcohol (PVA)) formation of etc.ing of polarization layer is between TAC (triacetyl cellulose) film 10b, the 10e.And, on the outer surface of the TAC film 10b of polarizing coating 10 1 sides of band shape, be provided with adhesive linkage 10c, bonding in the above off-type film 10d.In addition, bonding diaphragm 10f on the outer surface of the TAC of another side film 10e.In addition, sub-polarizing coating 10a covers for the light beyond the light that will vibrate in a certain direction, and for example can utilizing, iodine, dichroic dye etc. carry out painted.
And; the thickness of sub-polarizing coating 10a is generally about 15～30 microns; the thickness of two TAC film 10b, 10e is respectively about 40～200 microns usually; the thickness of adhesive linkage 10c is generally about 15～35 microns; the thickness of off-type film 10d is generally about 30～100 microns, and the thickness of diaphragm 10f is generally about 30～100 microns.
In addition, shown in Fig. 2 (b), the basic structure of the phase retardation film that uses in the present embodiment (banded second blooming) 20 is as follows.Phase retardation film 20 for example is made of the phase retardation film 20a that constitutes as the polycarbonate of phase separation layer, polyethers sodium salicylate (Port リ ェ-テ Le サ Le ホ Application) etc.And bonding diaphragm 20b on the side external surface of phase retardation film 20, on the opposite side outside surface, be provided with the adhesive linkage 20c bonding simultaneously, bonding off-type film 20d on it with liquid crystal indicator.
And the thickness of phase retardation film 20a is generally about 30～100 microns, and the thickness of diaphragm 20b is generally about 30～100 microns, and the thickness of adhesive linkage 20c is generally about 15～35 microns, and the thickness of off-type film 20d is generally about the 30-100 micron.
Shown in Fig. 2 (c), the basic structure of the optical film overlapped chip 30 of present embodiment is that off-type film 10d is peeled off from polarizing coating 10, and diaphragm 20b is peeled off from phase retardation film 20, by adhesive linkage 10c polarizing coating 10 and phase retardation film 20 is bonded together to form.
Above-mentioned polarizing coating 10 and phase retardation film 20 are normally supplied with as the blooming cylinder (raw material) (former feed roller 11 of polarizing coating and the former feed roller 21 of phase retardation film) of the cylinder shape that is rolled into 1.0 meters wide or 0.7 meter wide.And under most situations, their optical axis, be that the slow axis of the absorption axes of polarizing coating 10 and phase retardation film 20 extends along the bearing of trend of employed raw material, along with the difference of extension method, with respect to its parallel longitudinal or vertical.That is, be under the situation of the longitudinal extension product that extend longitudinally at raw material, its optical axis form usually with the parallel longitudinal of raw material.In addition, raw material be along with the situation of vertical vertically extending horizontal expansion product under, it is vertical vertical that its optical axis forms with raw material usually.
Secondly, utilize Fig. 1 and Fig. 3 to Fig. 7, each operation of manufacture method of the optical film overlapped chip of present embodiment is described.
First operation: the bevel cutting (step S1, S2) of polarizing coating
Shown in Fig. 4 (a), send banded polarizing coating 10 (step S1) from the former feed roller of polarizing coating with certain feed length (advancing distance) L, utilize cutter sweeps such as cutting machine, the angled φ of fore-and-aft tilt with respect to the polarizing coating of band shape cuts off it, cuts out the polarizing coating intermediate 12 (step S2) of the conduct first blooming intermediate of section shape continuously.In addition, be described further below the method for designing of feed length L and cut-out angle φ.
Second operation: bonding (step S3, the S4) of polarizing coating that size is certain and phase retardation film cylinder
In this operation, send banded phase retardation film 20 (step S3) from the former feed roller 21 of phase retardation film, carry out simultaneously polarizing coating intermediate 12 is bonded in above it, and cut off the operation of (step S4) along the profile of polarizing coating intermediate 12.
In this operation, at first on one side diaphragm 20b is peeled off from the former feed roller 21 of phase retardation film, phase retardation film 20a is exposed, Yi Bian send banded phase retardation film 20 (step S3).Shown in Fig. 4 (b), change the direction in length and breadth of polarizing coating intermediate 12 simultaneously, meanwhile on one side off-type film 10d is peeled off, adhesive linkage 10c is exposed, on one side this polarizing coating intermediate 12 is supplied on the banded phase retardation film 20.
In addition, in the present embodiment because this polarizing coating intermediate 12 has adhesive linkage 10c, thus can directly supply to carry out on the banded phase retardation film 20 bonding.
Then, shown in Fig. 4 (c), its adhesive linkage of polarizing coating intermediate 12 usefulness 10c one of section shape is stressed to be stacked on the banded phase retardation film 20, by pressurizeing, polarizing coating intermediate 12 is bonded on the banded phase retardation film 20, forms banded optical film overlapped intermediate 31.
In addition, the optical film overlapped intermediate 31 of band shape is rolled into cylinder again, under the form of this cylinder shape, can packs, take care of, transportation etc. this intermediate 31.At this moment, can make banded phase retardation film one side become the outside when being rolled into cylinder, also can be rolled onto the inboard, but preferably make banded phase retardation film one side be rolled into the outside.
Secondly, shown in Fig. 4 (d), optical film overlapped intermediate 31 that should band shape along the shape of the polarizing coating intermediate 12 of bonding section shape cuts off, thereby cuts out the section optical film overlapped intermediate 32 of shape (step S4).
Here, in step S2, the width that length (feed length L) preferred design that the polarizing coating 10 of band shape is sent from the former feed roller 11 of polarizing coating becomes to make wire spacing L ' and the former feed roller 21 of phase retardation film after the cut-out about equally.By such cut-out, change direction in length and breadth and be placed on the banded phase retardation film 20, make the limit that when cutting off, forms on the polarizing coating intermediate 12 unanimous on the whole with two edges of banded phase retardation film 20.In other words, can with the as one man bonding polarizing coating intermediate 12 of width of the phase retardation film 20 of band shape.In addition, if it is bonding that tight ground, interval between the adjacent polarizing coating intermediate 12 is carried out, a side surface that then can form banded phase retardation film 20 is polarized the optical film overlapped intermediate 31 of film intermediate 12 complete covered band shapes.In addition, even from the operation necessity, exist very little interval also no problem being bonded between the banded polarizing coating intermediate 1212 of living mutually on the poor film 20.
In addition, set to cut off the angle (cutting off angle φ) of banded polarizing coating 10 simultaneously, make the slow axis of phase retardation film 20 become the mutual angle (θ of regulation with respect to the mutual angle (θ) of the absorption axes of polarizing coating 10
0).
The 3rd operation: the many-side inspection (step S5) of product
Before cutting into one by one optical film overlapped chip 30, the optical film overlapped intermediate 32 of the shape of will cutting into slices carries out product examination.In addition, in step S5, carried out after the product examination, can be directly the optical film overlapped intermediate 32 of section shape have been wired up.
The 4th operation: many-sided fine setting (step S6)
Utilize will the cut into slices optical film overlapped intermediate 32 of shape of shearing devices such as pressure cutting machine to cut into one by one optical film overlapped chip 30.At this moment, according to as the datum line direction of the optical film overlapped chip of target, its long side direction for example, determine the cutting direction of optical film overlapped chip 30.That is,, cut out the absorption axes of polarizing coating 10 and the slow axis of phase retardation film 20 respectively according to the datum line of this optical film overlapped chip.
The 5th operation: packing (step S7)
Reaffirm the optical film overlapped chip 30 that cuts off one by one on one side,, pack simultaneously Yi Bian select.
Here, be example with the vertical consistency of the direction of the absorption axes of the polarizing coating polarizing coating banded with it, utilize Fig. 5 to Fig. 7 illustrate the shape of the overlapping intermediate 32 of section shape the decision design method, be the decision design method of the shape of polarizing coating intermediate 12.
In above-mentioned steps S2, the shape of the polarizing coating intermediate 12 of section shape is by the feed length L of the former feed roller 11 of polarizing coating and the parallelogram that cuts off angle φ decision.Their decision order is as follows.
1. more than 0 ° in less than+180 ° scope, to calculating desirable mutual angle θ as the optical film overlapped chip of target
0((between these the) angle that forms by the slow axis of the absorption axes of polarizing coating 10 and phase retardation film 20).
2. according to following table 1, utilize the mutual angle (θ that in 1., tries to achieve
0) value, determine the direction of the slow axis of banded phase retardation film 20.Table 1
| Mutual angle (the θ of regulation 0) | The direction of the slow axis of the phase retardation film of the band shape of using |
| ???0°≤θ 0≤+50° ???+130°≤θ 0≤+180° | With respect to vertically in vertical direction |
| ???+40°≤θ 0≤+140° | With respect to vertically being parallel direction |
As shown in Table 1, the mutual angle (θ of regulation
0) more than+40 ° to below+50 °, or more than+130 ° to the situation below+140 °, the direction of the slow axis of the phase retardation film of employed band shape can also can be parallel direction with respect to vertical orthogonal thereto direction.
3. according to following table 2, from the mutual angle θ that 1., calculates
0Effective width W with the former feed roller 21 of employed phase retardation film
SL, calculate the cut-out angle φ and the feed length L of the former feed roller 11 of suitable polarizing coating.
Table 2
In addition, as mentioned above, cut off angle φ and be with first blooming of band shape vertically be benchmark with respect to it angle, be the angle that when the face of a side opposite with a bonding side on second blooming (banded phase retardation film) of band shape is seen, rotates in a counter-clockwise direction to just representing, the absorption axes of polarizing coating 10 is made as θ with respect to the angle as target of the datum line of optical film overlapped chip
PL, the slow axis of phase retardation film 20 is made as θ with respect to the angle as target of this datum line
SL, then
| The direction of the slow axis of banded phase retardation film | Cut off angle (φ) | The feed length (L) of banded polarizing coating |
| With vertical orthogonal thereto direction | ????θ 0-90° | ????W SL/sin(θ 0-90°) |
| With vertically be parallel direction | ????θ 0 | ????W SL/sin(θ 0) |
A. at the direction of the slow axis of the phase retardation film of employed band shape and its parallel longitudinal, θ
PL＞θ
SLSituation under, the vergence direction during cut-out is right shoulder height,
B. at the direction of the slow axis of the phase retardation film of employed band shape and its parallel longitudinal, θ
PL＜θ
SLSituation under, the vergence direction during cut-out is that right shoulder is low,
C. at vertical vertical, the θ of the direction of the slow axis of the phase retardation film of employed band shape and its
PL＞θ
SLSituation under, the vergence direction during cut-out is that right shoulder is low,
D. at vertical vertical, the θ of the direction of the slow axis of the phase retardation film of employed band shape and its
PL＜θ
SLSituation under, the vergence direction during cut-out is right shoulder height.
In addition, θ
PL, θ
SLIn as the optical film overlapped chip of target when polarizing coating side (the first blooming side) is observed with counter-clockwise sense of rotation for just representing.
Shown in Fig. 5 (b), for example at θ
PL＜θ
SL,+45 °≤θ
0Under≤+ 135 ° the situation, the cut-out angle φ of the former feed roller 11 of direction, polarizing coating of the slow axis of the phase retardation film 20 that consideration is banded and the setting of feed length L.1. calculate mutual angle (θ
0).2. because+45 °≤θ
0≤+135 °, so as known from Table 1, banded phase retardation film 20 uses the direction of slow axis and the phase retardation film (being generally the longitudinal extension product) of its parallel longitudinal.3. as shown in Table 2, cutting off angle (φ) is θ
0, feed length (L) is W
SL/ sin (θ
0).
One of cut-out figure when in addition, Fig. 6 (a) shows at this moment many-sided fine setting example.In addition, Fig. 6 (b) be with existing method manufacturing this chip during with a kind of optical film overlapped chip cut out one of figure example.
In addition, consider the θ shown in Fig. 5 (c)
PL＞θ
SL,+130 °≤θ
0≤+180 ° situation.1. calculate mutual angle (θ
0).2. because+135 °≤θ
0≤+180 °, so as known from Table 1, banded phase retardation film 20 uses slow axis with respect to its vertical vertical phase retardation film (being generally the horizontal expansion product).3. as shown in Table 2, cutting off angle (φ) is (θ
0-90 °), feed length (L) is W
SL/ sin (θ
0-90 °).
One of cut-out figure when in addition, Fig. 7 (a) shows at this moment many-sided fine setting example.In addition, Fig. 7 (b) be with existing method manufacturing this chip during with a kind of optical film overlapped chip cut out one of figure example.
If adopt above preferred method for designing, then can make the line that cuts off banded polarizing coating 10 and the length between the line (L ') equal the width (W of banded phase retardation film 20
SL).That is, can set the length (feed length L) of sending banded polarizing coating 10 from the former feed roller 11 of polarizing coating, so that make distance between the both sides of polarizing coating intermediate 12 of the section shape that is obtained (L ') equal the width (W of banded phase retardation film 20
SL).
Distance between the both sides of the polarizing coating intermediate 12 of the section shape that is obtained in addition, (L ') there is no need strictly the width (W with the phase retardation film 20 of band shape
SL) equate, get final product in the scope that is substantially equal in the practicality on the phase retardation film that can be bonded in band shape.
In addition, in preferred method for designing, better method for designing is to select the method for designing of the phase retardation film 20 of employed band shape from following table 3.
Table 3
| Mutual angle (the θ of regulation 0) | The direction of the slow axis of the phase retardation film of the band shape of using |
| ????0°≤θ 0≤+45° ????+130°≤θ 0≤+180° | With respect to vertically in vertical direction |
| ????+45°≤θ 0≤+135° | With respect to vertically being parallel direction |
As known from Table 3, even in better method for designing, at the mutual angle (θ of regulation
0) be+45 ° or+130 ° situation under, the direction of the slow axis of the phase retardation film of employed band shape also can be parallel direction with respect to vertically being vertical direction.
If adopt this better method for designing, then according to the computing method in the table 2, the absolute value of cut-out angle φ when cutting off banded polarizing coating 10 often is more than 45 °, so the shape of the polarizing coating intermediate 12 of the section shape that cuts out is can become two kinds of angles of adjacent both sides formation all at more than 45 °, the easy parallelogram that uses and can improve the yield of the optical film overlapped chip that is obtained.
Here, explanation roughly is for the adhering device 1 of the manufacturing system use of the optical film overlapped chip of the manufacture method of the optical film overlapped chip that has adopted present embodiment.
As shown in Figure 8, above-mentioned adhering device 1 has: diaphragm reel 2a, auxiliary cylinder 2b, last bonding cylinder 2c, following bonding cylinder 2d, film carrier cylinder 2e and film carrier 2f.
At first, the axle by on the axial region that is located at cylinder is installed to the former feed roller 21 of phase retardation film on the not shown bracing or strutting arrangement of the top that is arranged on the bonding adhesive portion of carrying out polarizing coating intermediate 12 and banded phase retardation film 20.Send banded phase retardation film 20 from the former feed roller 21 of the phase retardation film that installs adhesive portion direction downwards.Then, banded phase retardation film 20 on being placed on the bonding cylinder 2c before, by auxiliary cylinder 2b, utilize diaphragm reel 2a to reel and peel off diaphragm 20b, phase retardation film 20a is exposed.
On the other hand, the polarizing coating intermediate 12 that utilizes the section shape that not shown polarizing coating shearing device cuts off by bevel is changed direction in length and breadth with respect to the bonding direction of adhering device 1, is placed in simultaneously on the film carrier 2f.Here, film carrier 2f frame is being arranged on the bonding cylinder 2d under the adhesive portion and is being arranged on the film of the rotation on the film carrier cylinder 2e of upstream position of bonding direction.And the polarizing coating intermediate 12 that is placed in the section shape on the film carrier 2f utilizes the rotation of bonding cylinder 2d and film carrier cylinder 2e and is sent to film carrier 2f and is arranged between adhesive portion a pair of bonding cylinder 2c, the 2d up and down.It is before arriving between bonding cylinder 2c, 2d, and off-type film 10d is operated personnel and peels off from the polarizing coating intermediate 12 of section shape, and adhesive linkage 10c is exposed.
A pair of bonding cylinder 2c, 2d be set at adhering device 1 adhesive portion about, exposed up adhesive linkage 10c polarizing coating intermediate 12 and below exposed phase retardation film 20a banded phase retardation film 20 superimposed supplying between these two bonding cylinder 2c, the 2d.Then, by extruding, polarizing coating intermediate 12 is bonded on the former feed roller 21 of phase retardation film, forms banded optical film overlapped intermediate 31 with two bonding cylinder 2c, 2d.Then, utilize not shown shearing devices such as cutting machine, the shape of the polarizing coating intermediate 12 of the section shape of optical film overlapped intermediate 31 above being bonded in it of this band shape is cut off, thereby cut out the optical film overlapped intermediate 32 of section shape.
In addition, in above-mentioned adhering device 1, though by operating personnel by manual operation, while carry out changing operation that the direction of polarizing coating intermediate 12 places and the operation of peeling off off-type film 10d from polarizing coating intermediate 12, also can be with these operating machine.
As mentioned above, if adopt the manufacture method of the optical film overlapped chip of present embodiment, then cut out the polarizing coating intermediate 12 of section shape, make mutual angle (θ) the mutual angle (θ for stipulate of the slow axis of banded phase retardation film 20 with respect to the polarization axle of the polarizing coating intermediate 12 of this section shape from the polarizing coating 10 of band shape
0), the polarizing coating intermediate 12 of shape of so will cutting into slices overlaps on the banded phase retardation film 20, form banded optical film overlapped intermediate 31, secondly, optical film overlapped intermediate 31 that just should band shape cuts off along the shape of the polarizing coating intermediate 12 of section shape, cut out the optical film overlapped intermediate 32 of section shape, cut out optical film overlapped chip 30 from the optical film overlapped intermediate 32 of this section shape again as target.
Therefore, can reduce existing operation, promptly deduct from polarizing coating intermediate 112 cut out polarizing coating chip 113 operation, cut out the operation of phase retardation film intermediate 122 and the operation that cuts out phase retardation film chip 123 from phase retardation film intermediate 122 from the former feed roller 121 of phase retardation film.
In addition, in the present embodiment, the polarizing coating 10 of rigidity is bonded together phase retardation film 20 with having preferably with the form of band shape, can form the optical film overlapped intermediate 32 of the optical film overlapped intermediate 31 of band shape and the shape of cutting into slices.Therefore phase retardation film 20 is owing to being bonded on the polarizing coating 10 like this, so can prevent its bending.That is the phase retardation film 20 that should be noted that when, not needing processing in manufacturing process is handled as reluctant phase retardation film chip.Under the situation of phase retardation film 20 that bend easily, can bring into play the effect of present embodiment using extremely thin especially like this as second blooming.
If explain this point, if adopt present embodiment so, promptly because banded phase retardation film 20 before on the polarizing coating intermediate 12 that is bonded in the section shape, is to handle under axial region has the state of the former feed roller 21 of phase retardation film of axle, so can not bend.And, in adhering device 1, directly be bonded on the polarizing coating intermediate 12 from the former feed roller 21 of phase retardation film, can prevent the bending of phase retardation film in the operation afterwards, so the processing of phase retardation film has become easily.Therefore, reduced the defect rate of optical film overlapped chip 30.
In addition, be to cut out respectively to carry out behind the various film chips bondingly in the past, but in the present embodiment, in last fine setting operation, cut out behind the bonding blooming, so the dimensional accuracy of optical film overlapped chip 30 is good.
In addition, in the present embodiment, the polarizing coating intermediate 12 of section shape is bonded on the banded polarizing coating 20, and the slow axis that makes banded phase retardation film 20 is with respect to the mutual angle (θ) of the polarization axle of the polarizing coating 10 mutual angle (θ for regulation
0), form banded optical film overlapped intermediate 31.
In addition, in the present embodiment, the optical film overlapped intermediate 32 that forms the section shape is as the intermediate that cuts out optical film overlapped chip 30.
Once just can cut out a plurality of optical film overlapped chips 30 in the fine setting operation from the optical film overlapped intermediate 32 of this shape of cutting into slices.
In addition, when bonding polarizing coating chip and phase retardation film chip, bonding agent oozed out between two films sometimes in the past, and this bonding agent that oozes out is stained with the foreign matters such as smear metal of film sometimes.Different therewith, in the present embodiment, owing to after the phase retardation film 20 of band shape being bonded on the polarizing coating intermediate 12 of section shape, cut out optical film overlapped chip 30, so can reduce the situation that the bonding agent that oozes out is stained with foreign matters such as smear metal.Its result is because the engaging-in minimizing of foreign matter so the incidence of substandard products descends, can also easily be carried out the product examination operation.
In addition, in the present embodiment, the optical film overlapped intermediate 32 of banded optical film overlapped intermediate 31 or section shape is compared with the optical film overlapped chip as target, though the former area is big, it directly can be taken care of as semi-manufacture.
In addition, in the present embodiment, because initial just one side forms last axle in many-side fine setting operation, optical film overlapped intermediate 32 from the section shape cuts out and obtains optical film overlapped chip 30 on one side, so the slow axis of phase retardation film 20 is identical with respect to the mutual angle (θ) of the polarization axle of polarizing coating 10, under the situation of the different multiple optical film overlapped chip 30 of the direction of manufacturing dimension or datum line, also can according to guarantee separately size and the fine setting figure of the direction of datum line, cut out optical film overlapped chip 30 from the optical film overlapped intermediate 32 of general section shape.Therefore, can make mutual angle (θ) universalization of the optical film overlapped intermediate 32 of banded optical film overlapped intermediate 31 and section shape.
In addition, in the present embodiment, in general the polarizing coating 10 of rigidity is bonded together the extremely thin phase retardation film that bends easily 20 with having preferably with the form of band shape, can form the optical film overlapped intermediate 32 of banded optical film overlapped intermediate 31 and section shape, so can prevent phase retardation film 20 bendings.Therefore, in manufacturing process,, do not need directly to handle more unmanageable phase retardation film 20, so the defect rate of optical film overlapped chip 30 is low as reluctant section shape or chip.
In addition, in the present embodiment, polarizing coating intermediate 12 can design make the wire spacing L ' that cuts off this polarizing coating and banded phase retardation film 20 width about equally.And, can form banded optical film overlapped intermediate 31 like this, that is, make the slow axis of the polarization axle of polarizing coating intermediate 12 and banded phase retardation film 20 be the mutual angle (θ) of regulation and the polarizing coating intermediate 12 of the shape of will cut into slices is bonded on the phase retardation film 20 of band shape.In addition, can also with the phase retardation film 20 of the band shape of the polarizing coating intermediate 12 of bonding parallelogram along polarizing coating intermediate 12 shape be cut into parallelogram, thereby cut out the optical film overlapped intermediate 32 of section shape.
In the present embodiment, can cut out polarizing coating intermediate 12 lavishly continuously from former feed roller 11 nothings of polarizing coating by these operations.And, on one side can guarantee mutual angle θ,, form banded optical film overlapped intermediate 31 Yi Bian polarizing coating intermediate 12 and the former feed roller 21 of phase retardation film are bonded together.In addition, do not cover the former feed roller 21 of phase retardation film lavishly owing to can have, so can there not be the optical film overlapped intermediate 32 that cuts out the section shape lavishly from the optical film overlapped intermediate 31 of band shape with polarizing coating intermediate 12.
In addition, in the present embodiment, the shape of the optical film overlapped intermediate 32 of the polarizing coating intermediate 12 of section shape and section shape can identify its surface configuration and back side shape.
Therefore, in each manufacture process, can reduce surface and the back side mistaken and carry out mistake bonding and cut-out.For example, if cut out at the raw material that from width is 1.0 meters under the situation of polarizing coating intermediate 12 of parallelogram, just can easily identify at (or more than 91 °) below 89 ° if cut off angle φ.
In addition, if adopt the decision design method of the polarizing coating intermediate 12 of present embodiment, then owing to cut off the absolute value of angle φ | φ | can be less than 40 °, so polarizing coating intermediate 12 is not elongated.Therefore, all the operability of manufacturing process can not be subjected to big infringement.In addition,, can not change the feed length L of the former feed roller 11 of polarizing coating yet, not need to change the cylinder width of the former feed roller 21 of phase retardation film even the cylinder wide variety of the former feed roller 21 of phase retardation film.In addition,, also must carry out the design of phase retardation film intermediate 122 for phase retardation film if adopt existing method, if but adopt present embodiment, then can oversimplify.
As above detailed description,, then can improve throughput rate significantly if adopt the manufacture method of the optical film overlapped chip of present embodiment.That is, can reduce process number, overlapping in the middle of physical efficiency become the big bonding product of area, in addition, utilize the shape of overlapping intermediate, can improve the yield of operability and face significantly.In addition, can improve rodability and handlability.Also,, can improve yield simultaneously so can carry out the checked operation of product effectively owing in bonding process, can reduce sneaking into of bonding foreign matter.In addition, owing to can make the banded optical film overlapped intermediate 31 of cylinder shape and the mutual angle (θ of the regulation of the optical film overlapped intermediate 32 of section shape
0) universalization, so can also improve throughput rate.In addition, can reduce tank farm stock.
As shown in table 4, under the situation of the manufacture method (embodiment) that adopts optical film overlapped chip of the present invention, and under the situation that adopts existing method (comparative example), be θ as the optical axis angle of target
PL, θ
SL(that is, the optical axis angle as target with respect to the datum line of the absorption axes of polarizing coating is θ
PL, be θ with respect to the optical axis angle as target of the datum line of the slow axis of phase retardation film
SL), the mutual angle of regulation is θ
0, when size shown in the optical film overlapped chip in the table 4 of the size of product, in this embodiment, comparative example, tried to achieve acquisition number, face and obtained number, the face rate that is improved.It is the results are shown in table 4.
In this embodiment and comparative example, used width (W
PL) be the polarizing coating of 1000 millimeters band shape, and the width (W of slow axis direction and parallel longitudinal
SL) be phase retardation film 20 or the slow axis direction and vertical vertical width (W of 700 millimeters band shape
SL) be the phase retardation film 20 of 1000 millimeters band shape.In an embodiment,, the polarizing coating intermediate with the section shape do not cover banded phase retardation film lavishly, so designed the width that the wire spacing L ' that cuts off polarizing coating is substantially equal to banded phase retardation film for having.
In addition, in table 4, what is called among the embodiment obtains the number of the optical film overlapped chip that the optical film overlapped intermediate from a slice section shape that number is meant that the method for the present invention with above-mentioned design obtains obtains, and the what is called in the comparative example obtains the number that number is meant the optical film overlapped chip that uses polarizing coating identical with above-mentioned the optical film overlapped intermediate of shape " a slice cut into slices " area of corresponding embodiment and phase retardation film acquisition in existing method.The face pick-up rate of polarizing coating is meant the summation of optical film overlapped area of chip of acquisition to the ratio (%) of the usable floor area of the polarizing coating of band shape, and the face pick-up rate of phase retardation film is meant that the summation of optical film overlapped area of chip of acquisition is to the ratio (%) of the usable floor area of the phase retardation film of band shape.In addition, the face rate of being improved of polarizing coating is meant the numerical value (%) after the face pick-up rate of the polarizing coating from embodiment deducts the face pick-up rate of the polarizing coating in the comparative example, and the face rate of being improved of phase retardation film is meant the numerical value (%) after the face pick-up rate of the phase retardation film from embodiment deducts the face pick-up rate of the phase retardation film in the comparative example.
Table 4
PL: polarizing coating SL: phase retardation film
| Mutual angle | Product size | Optical axis angle | Embodiment | Comparative example | The area rate that is improved | The slow axis direction of banded SL (with respect to vertically) | ||||||
| θ 0(°) | たて×ょこ(mm) | θ PL | θ SL | Peek | Face is got rate PL | Face is got rate SL | Peek | Face is got rate PL | Face is got rate SL | ?????PL | ?SL | |
| ????55 | ?66.2×46.8 | ?72 | 127 | ?357 | ?84.4 | ?84.4 | ?35 | ?74.3 | ?82.3 | ????10.1 | ?2.1 | Parallel |
| ????50 | ?83.8×87.6 | ?80 | 130 | ?178 | ?81.7 | ?81.7 | ?6 | ?73.9 | ?68.5 | ????7.8 | ?13.2 | Parallel |
| ????48 | ?55.8×18.0 | ?7 | 55 | ?1134 | ?92.0 | ?92.0 | ?120 | ?78.4 | ?84.7 | ????13.6 | ?7.3 | Parallel |
| ????42.5 | ?64.1×42.0 | ?102.5 | 145 | ?268 | ?82.6 | ?82.6 | ?40 | ?71.2 | ?78.2 | ????11.4 | ?4.4 | Vertically |
| ????42 | ?89.0×43.0 | ?8 | 50 | ?204 | ?82.9 | ?82.9 | ?30 | ?75.9 | ?83.6 | ????7.0 | ?-0.7 | Vertically |
| ????40 | ?39.0×25.7 | ?7 | 47 | ?814 | ?88.8 | ?88.8 | ?134 | ?82.6 | ?88.0 | ????6.2 | ?2.8 | Vertically |
| ????40 | ?80.8×30.3 | ?10 | 50 | ?319 | ?85.8 | ?85.8 | ?45 | ?76.6 | ?78.0 | ????9.2 | ?7.8 | Vertically |
| ????177.5 | ?236.8×178.8 | ?117.5 | 115 | ?17 | ?75.0 | ?66.7 | ?1 | ?74.4 | ?66.8 | ????0.6 | ?-0.1 | Vertically |
| ????150 | ?235.5×177.7 | ?105 | 75 | ?30 | ?81.5 | ?81.5 | ?1 | ?70.6 | ?68.3 | ????10.9 | ?13.2 | Vertically |
| ????135 | ?127.0×96.5 | ?90 | 45 | ?87 | ?82.0 | ?82.0 | ?9 | ?64.1 | ?68.6 | ????17.9 | ?13.4 | Parallel |
| ????135 | ?154.6×117.0 | ?170 | 125 | ?57 | ?77.8 | ?78.2 | ?4 | ?71.6 | ?73.5 | ????6.2 | ?4.7 | Parallel |
| ????135 | ?37.0×31.2 | ?25 | 70 | ?648 | ?89.0 | ?89.0 | ?132 | ?62.0 | ?84.1 | ????27.0 | ?4.9 | Parallel |
| ????135 | ?31.6×22.6 | ?105 | 60 | ?1683 | ?92.4 | ?92.4 | ?156 | ?79.4 | ?59.3 | ????13.0 | ?33.1 | Parallel |
| ????135 | ?66.5×28.0 | ?105 | 80 | ?1210 | ?85.9 | ?85.9 | ?60 | ?81.0 | ?65.3 | ????4.9 | ?20.6 | Parallel |
| Simple average | ????10.4 | ?9.04 | ||||||||||
As known from Table 4, the manufacture method of optical film overlapped chip of the present invention is in manufacture process, owing to passed through the overlapping intermediate 32 of section shape,, for phase retardation film, improved about 9% for polarizing coating so that the simple average value of area pick-up rate has improved is about 10%.
In addition, use width (W has been shown among Fig. 9
PL) be the polarizing coating of 1000 millimeters band shape, and slow axis direction and vertical vertical width (W
SL) be the phase retardation film 20 of 1000 millimeters band shape, adopt the manufacture method of optical film overlapped chip of the present invention, to mutual angle (θ
0) be 40 ° of (θ
PLAnd θ
SLThe optical film overlapped intermediate 32 of section shape respectively as shown in Figure 9) has carried out the figure after many-sided fine setting.As the product size of the optical film overlapped chip of target respectively as shown in Figure 9.Here, in many-sided fine setting figure+" optical axis direction of polarizing coating " in the optical film overlapped chip of character (symbol+) expression reach " optical axis direction of phase retardation film ".In addition, face obtains the number that number is the optical film overlapped chip that cuts out of the optical film overlapped intermediate 32 from a slice section shape, the face of per unit area obtains the number that number is the optical film overlapped chip that cuts out of the optical film overlapped intermediate 32 from the section shape of each square metre, and face obtains the ratio (%) of summation of optical film overlapped area of chip of per unit usable floor area that efficient is the optical film overlapped intermediate 32 of section shape.
As shown in Figure 9, if the mutual angle θ of optical axis
0(being example with 40 ° here) is identical, even the shape of then optical film overlapped chip 30 reaches the angle (θ that constitutes with reference axis
SL, θ
PL) difference, but owing in many-side fine setting operation, form last axle, so can cut out chip from the overlapping intermediate 32 of same section shape.Like this, can make the half-finished mutual angle θ of banded overlapping intermediate 31 and the overlapping intermediate 32 of section shape
0Universalization (using identical mutual angle).
In addition, in above-mentioned example, though the outer peripheral portion of many-sided fine setting figure is useless, the many-side that cuts out the optical film overlapped chip 30 littler than desirable shape by composite design is finely tuned figure, more can improve the face pick-up rate.
Claims (9)
- The manufacture method of optical film overlapped intermediate be a kind of from optical axis and its parallel longitudinal or vertical band shape first blooming and second blooming of optical axis and its parallel longitudinal or vertical band shape, make the mutual angle (θ that the optical axis that makes second blooming equals to stipulate with respect to the mutual angle (θ) of the optical axis of first blooming 0) the method with first blooming and the second optical film overlapped optical film overlapped intermediate of parallelogram that forms, it is characterized in that:(1) cuts out with respect to it from first blooming of band shape and vertically constitute with angle θ or (θ-90 °) angle same (φ), the first blooming intermediate of the section shape of the parallelogram that the distance between parallel both sides, these both sides roughly equates with the width of second blooming of band shape arrangedThe first blooming intermediate of the section shape that (2) will obtain overlaps on the second banded blooming, and the above-mentioned both sides of first blooming that make the section shape are along two imbricates of banded second blooming, acquisition is by the first blooming intermediate of section shape and the optical film overlapped intermediate of the second optical film overlapped band shape that forms of band shape(3) shape of the first blooming intermediate of the section shape of the optical film overlapped intermediate of the band shape that will obtain after overlapping is cut off.
- 2. manufacture method according to claim 1 is characterized in that: the mutual angle (θ of regulation 0) be more than+40 ° to below+140 °, and optical axis and its parallel longitudinal of the first banded blooming, optical axis and its parallel longitudinal of second blooming of band shape.
- 3. manufacture method according to claim 1 is characterized in that: the mutual angle (θ of regulation 0) be more than 0 ° to below+50 °, or+more than 130 ° to less than+180 °, and optical axis and its parallel longitudinal of the first banded blooming, the optical axis of second blooming of band shape is vertically vertical with it.
- 4. manufacture method according to claim 1 is characterized in that: first blooming is a polarizing coating, and second blooming is a phase retardation film.
- 5. the manufacture method of an optical film overlapped chip is characterized in that: the optical film overlapped intermediate that any described method from adopt claim 1 to 4 obtains cuts out optical film overlapped chip.
- 6. the optical film overlapped intermediate of a band shape is characterized in that: first blooming and the second blooming overlaid, and the optical axis of second blooming is with respect to the mutual angle (θ) of the optical axis of the first blooming mutual angle (θ for regulation 0), have section shape first optical film overlapped on second blooming of band shape of the parallelogram on both sides parallel or vertical and other both sides parallel or vertical with the optical axis of second blooming with the optical axis of first blooming.
- 7. the optical film overlapped intermediate of band shape according to claim 6 is characterized in that: the mutual angle (θ of regulation 0) be more than+40 ° to below+140 °, first blooming of section shape is the parallelogram with the both sides parallel with its optical axis and other both sides parallel with the optical axis of second blooming.
- 8. the optical film overlapped intermediate of band shape according to claim 6 is characterized in that: the mutual angle (θ of regulation 0) be more than 0 ° to below+50 °, or+more than 130 ° to less than+180 °, first blooming of section shape is the parallelogram with the both sides parallel with its optical axis and other both sides vertical with the optical axis of second blooming.
- 9. the optical film overlapped intermediate of the shape of cutting into slices is characterized in that: it is to obtain from the optical film overlapped intermediate that adopts the band shape that obtains according to any described method the claim 6 to 8.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP315716/97 | 1997-11-17 | ||
| JP31571697 | 1997-11-17 | ||
| JP315716/1997 | 1997-11-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1217477A true CN1217477A (en) | 1999-05-26 |
| CN1113270C CN1113270C (en) | 2003-07-02 |
Family
ID=18068686
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN98122463A Expired - Lifetime CN1113270C (en) | 1997-11-17 | 1998-11-16 | Mfg. method for optical film overlapped chip and optical film overlapped intermediate thereof |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR19990045396A (en) |
| CN (1) | CN1113270C (en) |
| TW (1) | TW520452B (en) |
Cited By (8)
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| CN101809486B (en) * | 2007-12-27 | 2011-11-30 | 日东电工株式会社 | Manufacturing system and manufacturing method for optical display device |
| CN101823645B (en) * | 2008-04-16 | 2012-07-04 | 日东电工株式会社 | System for manufacturing optical display device |
| CN101743493B (en) * | 2008-02-15 | 2012-07-04 | 日东电工株式会社 | Method for manufacturing optical film laminate |
| CN101639548B (en) * | 2008-07-30 | 2012-08-29 | 日东电工株式会社 | Method of producing optical film laminates |
| CN103403586A (en) * | 2011-11-11 | 2013-11-20 | 住友化学株式会社 | Optical film chip cutting device and method for cutting optical film chip |
| CN107390302A (en) * | 2016-05-17 | 2017-11-24 | 日东电工株式会社 | The manufacture method of the optical film sheet of optical laminate and the use optical laminate |
| CN110228217A (en) * | 2019-06-28 | 2019-09-13 | 宁波维真显示科技股份有限公司 | The preparation facilities and method of parity array formula 3D film |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW463060B (en) * | 1999-12-21 | 2001-11-11 | Sumitomo Chemical Co | Manufacturing method for laminate of optical film |
| US8366858B2 (en) | 2007-12-27 | 2013-02-05 | Nitto Denko Corporation | Manufacturing system and manufacturing method for optical display device |
| JP4657378B1 (en) | 2010-08-05 | 2011-03-23 | 日東電工株式会社 | Roll roll and optical display device manufacturing system and method |
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|---|---|---|---|---|
| JP3151051B2 (en) * | 1992-05-07 | 2001-04-03 | 藤森工業株式会社 | Manufacturing method of optical laminated sheet |
| JP3534804B2 (en) * | 1994-01-12 | 2004-06-07 | 藤森工業株式会社 | Manufacturing method of optical sheet |
| JPH07301792A (en) * | 1994-05-02 | 1995-11-14 | Nitto Denko Corp | Optical film and liquid crystal display device |
| JP3681343B2 (en) * | 2001-06-07 | 2005-08-10 | 日東電工株式会社 | LAMINATED OPTICAL FILM, ITS MANUFACTURING METHOD, AND LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME |
-
1998
- 1998-11-13 TW TW087118823A patent/TW520452B/en not_active IP Right Cessation
- 1998-11-16 KR KR1019980049646A patent/KR19990045396A/en not_active Application Discontinuation
- 1998-11-16 CN CN98122463A patent/CN1113270C/en not_active Expired - Lifetime
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| CN101743493B (en) * | 2008-02-15 | 2012-07-04 | 日东电工株式会社 | Method for manufacturing optical film laminate |
| US8480832B2 (en) | 2008-02-15 | 2013-07-09 | Nitto Denko Corporation | Method of producing optical film laminate |
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| CN101823645B (en) * | 2008-04-16 | 2012-07-04 | 日东电工株式会社 | System for manufacturing optical display device |
| CN101639548B (en) * | 2008-07-30 | 2012-08-29 | 日东电工株式会社 | Method of producing optical film laminates |
| CN103403586A (en) * | 2011-11-11 | 2013-11-20 | 住友化学株式会社 | Optical film chip cutting device and method for cutting optical film chip |
| CN103403586B (en) * | 2011-11-11 | 2015-04-22 | 住友化学株式会社 | Optical film chip cutting device and method for cutting optical film chip |
| CN107390302A (en) * | 2016-05-17 | 2017-11-24 | 日东电工株式会社 | The manufacture method of the optical film sheet of optical laminate and the use optical laminate |
| CN110228217A (en) * | 2019-06-28 | 2019-09-13 | 宁波维真显示科技股份有限公司 | The preparation facilities and method of parity array formula 3D film |
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Also Published As
| Publication number | Publication date |
|---|---|
| KR19990045396A (en) | 1999-06-25 |
| TW520452B (en) | 2003-02-11 |
| CN1113270C (en) | 2003-07-02 |
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