CN1216285C - 灰调掩模缺陷检查方法及装置和光掩模缺陷检查方法及装置 - Google Patents
灰调掩模缺陷检查方法及装置和光掩模缺陷检查方法及装置 Download PDFInfo
- Publication number
- CN1216285C CN1216285C CN021082472A CN02108247A CN1216285C CN 1216285 C CN1216285 C CN 1216285C CN 021082472 A CN021082472 A CN 021082472A CN 02108247 A CN02108247 A CN 02108247A CN 1216285 C CN1216285 C CN 1216285C
- Authority
- CN
- China
- Prior art keywords
- defective
- transmissivity
- mask
- tone portion
- threshold value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000007547 defect Effects 0.000 title claims abstract description 57
- 238000000034 method Methods 0.000 title claims abstract description 39
- 230000003287 optical effect Effects 0.000 title claims description 9
- 238000002834 transmittance Methods 0.000 claims abstract description 37
- 230000002950 deficient Effects 0.000 claims description 118
- 230000005540 biological transmission Effects 0.000 claims description 25
- 238000007689 inspection Methods 0.000 claims description 24
- 238000001514 detection method Methods 0.000 claims description 14
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 2
- 238000012550 audit Methods 0.000 description 11
- 230000035945 sensitivity Effects 0.000 description 10
- 239000010408 film Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 239000000284 extract Substances 0.000 description 7
- 238000000605 extraction Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 210000000162 simple eye Anatomy 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001845 chromium compounds Chemical group 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
Claims (9)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001244071A JP2002174604A (ja) | 2000-09-29 | 2001-08-10 | グレートーンマスクの欠陥検査方法及び欠陥検査装置、並びにフォトマスクの欠陥検査方法及び欠陥検査装置 |
JP244071/2001 | 2001-08-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1401993A CN1401993A (zh) | 2003-03-12 |
CN1216285C true CN1216285C (zh) | 2005-08-24 |
Family
ID=19074063
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN021082472A Expired - Lifetime CN1216285C (zh) | 2001-08-10 | 2002-03-28 | 灰调掩模缺陷检查方法及装置和光掩模缺陷检查方法及装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US6894774B2 (zh) |
CN (1) | CN1216285C (zh) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100583950B1 (ko) * | 2003-07-08 | 2006-05-26 | 삼성전자주식회사 | 결함인식기준을 설정하기 위한 기준패턴을 갖는 기준마스크, 그 제조 방법, 그것을 사용하여 결함인식기준을 설정하는 방법 및 그것을 사용하여 결함을 검사하는 방법 |
JP2005077955A (ja) * | 2003-09-02 | 2005-03-24 | Sanyo Electric Co Ltd | エッチング方法およびそれを用いた回路装置の製造方法 |
WO2006088041A1 (ja) * | 2005-02-18 | 2006-08-24 | Hoya Corporation | 透光性物品の検査方法 |
US8137870B2 (en) * | 2005-06-14 | 2012-03-20 | Samsung Electronics Co., Ltd. | Method of manufacturing photomask |
KR100604940B1 (ko) * | 2005-06-14 | 2006-07-28 | 삼성전자주식회사 | 포토 마스크의 측정 장치, 이를 이용한 포토 마스크의 cd측정방법, cd를 이용하여 포토 마스크를 보정하는장치와 방법 및 포토 마스크의 제조방법 |
JP2010517093A (ja) * | 2007-01-29 | 2010-05-20 | トッパン、フォウタマスクス、インク | フォトマスク内の欠陥を処理するための方法およびシステム |
JP5064116B2 (ja) * | 2007-05-30 | 2012-10-31 | Hoya株式会社 | フォトマスクの検査方法、フォトマスクの製造方法及び電子部品の製造方法 |
JP2009020312A (ja) * | 2007-07-12 | 2009-01-29 | Hoya Corp | グレートーンマスクの欠陥修正方法、グレートーンマスクの製造方法及びグレートーンマスク、並びにパターン転写方法 |
JP5869347B2 (ja) * | 2011-02-03 | 2016-02-24 | Hoya株式会社 | 透過率測定装置、及び透過率測定方法 |
JP6298354B2 (ja) * | 2014-05-14 | 2018-03-20 | Hoya株式会社 | フォトマスクの製造方法及びフォトマスク基板 |
CN110416103B (zh) * | 2018-04-28 | 2021-09-28 | 上海微电子装备(集团)股份有限公司 | 一种残胶标准片及其制备方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5963725A (ja) * | 1982-10-05 | 1984-04-11 | Toshiba Corp | パタ−ン検査装置 |
US4902899A (en) | 1987-06-01 | 1990-02-20 | International Business Machines Corporation | Lithographic process having improved image quality |
JP2701264B2 (ja) | 1987-08-24 | 1998-01-21 | オムロン株式会社 | 数値設定器 |
JP3053097B2 (ja) | 1988-10-12 | 2000-06-19 | 株式会社日立製作所 | ホトマスクの欠陥検出方法及び装置 |
JPH09145629A (ja) | 1995-11-21 | 1997-06-06 | Sharp Corp | マスク検査装置 |
JPH09292347A (ja) | 1996-04-25 | 1997-11-11 | Nikon Corp | 異物検査装置 |
JPH1195410A (ja) | 1997-09-19 | 1999-04-09 | Oki Electric Ind Co Ltd | フォトマスクの欠陥検査方法および欠陥検査装置 |
US6674522B2 (en) * | 2001-05-04 | 2004-01-06 | Kla-Tencor Technologies Corporation | Efficient phase defect detection system and method |
-
2002
- 2002-03-28 CN CN021082472A patent/CN1216285C/zh not_active Expired - Lifetime
- 2002-03-28 US US10/107,819 patent/US6894774B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US6894774B2 (en) | 2005-05-17 |
CN1401993A (zh) | 2003-03-12 |
US20030030796A1 (en) | 2003-02-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1721987A (zh) | 波纹缺陷检查方法及装置、以及光掩模的制造方法 | |
CN101046625A (zh) | 图案缺陷检查方法、光掩模制造方法和显示装置基板制造方法 | |
CN1702429A (zh) | 波纹缺陷检查掩模、波纹缺陷检查装置及方法、以及光掩模的制造方法 | |
US8379964B2 (en) | Detecting semiconductor substrate anomalies | |
CN1216285C (zh) | 灰调掩模缺陷检查方法及装置和光掩模缺陷检查方法及装置 | |
US7764368B2 (en) | Method and apparatus for inspecting defects on mask | |
CN1786698A (zh) | 不均缺陷检查装置和方法及光掩模的制造方法 | |
CN1715890A (zh) | 发光设备、自动光学检测***以及检测pcb图案的方法 | |
CN1261819C (zh) | 灰色调掩模的缺陷检查方法和图形决定方法 | |
CN1797191A (zh) | 检测光掩模数据库图案缺陷的方法 | |
TWI387844B (zh) | 灰階遮罩的缺陷檢查方法及缺陷檢查裝置、光罩的缺陷檢查方法、灰階遮罩的製造方法以及圖案轉印方法 | |
JP2012242268A (ja) | 検査装置及び検査方法 | |
JP4949928B2 (ja) | パターン欠陥検査方法、パターン欠陥検査装置、フォトマスク製品の製造方法、及び表示デバイス用基板の製造方法 | |
CN1261818C (zh) | 灰色调掩模的缺陷校正方法 | |
CN1324400C (zh) | 相移掩模、及使用它的图形形成方法和电子器件制造方法 | |
JP2007255959A (ja) | 検査装置及び検査方法とその検査装置及び検査方法を用いたパターン基板の製造方法 | |
JP2002174604A (ja) | グレートーンマスクの欠陥検査方法及び欠陥検査装置、並びにフォトマスクの欠陥検査方法及び欠陥検査装置 | |
US8094926B2 (en) | Ultrafine pattern discrimination using transmitted/reflected workpiece images for use in lithography inspection system | |
CN1218171C (zh) | 灰调掩模的缺陷检查方法及缺陷检查装置 | |
JP2014020961A (ja) | 異物検出方法および異物検査装置 | |
JP2007147376A (ja) | 検査装置 | |
JP5104438B2 (ja) | 周期性パターンのムラ検査装置および方法 | |
KR100503274B1 (ko) | 그레이톤 마스크의 결함 검사 방법 및 결함 검사 장치 | |
JP4064144B2 (ja) | グレートーンマスクの欠陥検査方法及び欠陥検査装置、並びにフォトマスクの欠陥検査方法及び欠陥検査装置 | |
JP2004151622A (ja) | マスク欠陥検査装置及びマスク欠陥検査方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: HOYA CO., LTD. Free format text: FORMER OWNER: HOYA CORP. Effective date: 20040430 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20040430 Address after: Tokyo, Japan Applicant after: HOYA Corporation Address before: Tokyo, Japan Applicant before: Hoya Corp. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee | ||
CP02 | Change in the address of a patent holder |
Address after: Japan Tokyo 160-8347 Shinjuku Shinjuku six chome 10 No. 1 Patentee after: HOYA Corporation Address before: Tokyo, Japan Patentee before: HOYA Corporation |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20050824 |