CN118129955A - Stress detection system and stress detection method based on modulatable weak value amplification technology - Google Patents
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Abstract
The invention relates to a stress detection system based on a modulatable weak value amplification technology, which comprises an optical modulation module, an optical information acquisition unit and a stress processor which are sequentially arranged in an optical path system; the light modulation module modulates the initial incident light with a wide spectrum into detection incident light, the average wavelength offset of the detection incident light is in a linear working interval R i of an average wavelength offset delta lambda-time delay tau change curve, the stress delta S of a sample to be detected is obtained according to the average wavelength offset delta lambda C of the detection incident light for measuring the stress of a coupling sample, the high-precision and high-sensitivity detection of the birefringent stress is realized, and particularly the ultra-high-sensitivity detection within a certain stress range is realized. The detection system has the advantages of high precision, high sensitivity and the like, and has important application value in the aspect of micro-stress detection in the field of wafer manufacturing.
Description
Technical Field
The invention relates to the technical field of quantum optical application, in particular to a stress detection system and a stress detection method based on a modulatable weak value amplification technology.
Background
The optical glass is a glass having high homogeneity, and is an important component of an optical component. The processing and forming quality of the optical glass has an important influence on the quality of glass optical components, and particularly, the residual stress in the processing technology of the optical glass has an important influence on the performance stability and service life of the glass optical components, and uneven stress distribution can reduce the optical uniformity of the glass optical components, lead to stress birefringence and increase the light path deviation and damage risk. Therefore, the stress state of the optical glass in the forming process is analyzed, and positive influence can be brought to the processing control and the later use of the glass optical components.
In ultra-precise machining of a micro-scale structure, residual stress becomes a key factor affecting product quality, so that high-precision and high-sensitivity measurement of residual stress is a key means for improving product machining quality and product performance. The existing stress detection method mainly comprises two main types of nondestructive detection and destructive detection, wherein the nondestructive detection comprises an X-ray diffraction method, an ultrasonic method, a Raman spectrum method, a digital photoelastic method, a magneto-optical modulation method and the like. The method has different problems when being applied to the stress detection of the optical glass: the X-ray diffraction method is influenced by the grain size, the anisotropy and the depth direction stress gradient, and the measurement accuracy is only in the order of MPa; the detection precision of the ultrasonic method is far lower than that of the photoelastic method; raman spectroscopy is only suitable for optical glass with raman activity, and has limited application range; the digital photoelastic method has higher requirement on uniformity of light intensity distribution of the illumination light source; the measurement accuracy of the magneto-optical modulation method is generally poor, and the stability of the system is poor.
Therefore, the existing method for nondestructively detecting the residual stress of the optical glass has the problems of low detection precision, low sensitivity, high detection condition and the like, and cannot meet the actual measurement requirement. Therefore, there is a need to establish an efficient high-precision and sensitive stress detection system to meet the ever-increasing demands of stress detection.
Disclosure of Invention
Accordingly, an object of the present invention is to provide a stress detection system based on a tunable weak value amplification technique, which can detect stress of glass with high accuracy, high sensitivity, and simplicity.
The technical scheme adopted by the invention is as follows.
A stress detection system based on a modulatable weak value amplification technique, comprising:
A light modulation module for modulating the initial incident light with a wide spectrum into the detected incident light with an average wavelength shift of the detected incident light being equal to the average wavelength shift -Within the linear working interval R i of the time delay τ variation; the incident light is detected to be coupled with stress information of a sample to be detected and then is used as sample light;
The optical information acquisition unit is used for acquiring and analyzing the spectrum information of the initial incident light, the detection incident light and the sample light;
A stress processor for calculating the stress of the sample to be measured according to the initial incident light, the detected incident light, the spectrum information of the sample light, the sample information, and the slope K i of the linear working interval R i:
wherein: Δs represents the stress of the sample to be measured, c represents the light velocity in vacuum, λ 0 represents the average wavelength of the initial incident light, σ represents the spectral width of the initial incident light, d represents the thickness of the sample to be measured, G represents the stress optical constant of the sample to be measured, im (Aw) represents the imaginary part of the weak value Aw, Representing weak values in weak measurement theory, |ψ i > represents a pre-selected state of the system, |ψ f > represents a post-selected state of the system,/>Representing observables of the system, |h > represents the eigenstate of horizontally polarized light, |v > represents the eigenstate of vertically polarized light, |θ represents the scaling factor relative to the slope K i of the linear working interval R i, θ=1 when the slope is K 1, θ=c (K i/K1) when the slope is K i, C being a constant.
Further, the light modulation module includes:
the polarization pre-selection unit is used for adjusting the initial incident light into pre-polarized light, wherein an included angle between the polarization direction and the horizontal positive direction is (+/4) rad, and an included angle between the fast axis direction and the horizontal positive direction is (+/4+epsilon) rad, wherein epsilon is a system pre-selection angle;
A variable phase compensation unit that adjusts the pre-polarized light to a detected incident light having an average wavelength shift at an average wavelength shift -Within the linear working interval R i of the time delay τ variation;
A polarization post-selection unit for performing post-polarization adjustment on the detected incident light or sample light, wherein the included angle between the polarization direction and the horizontal positive direction is
Further, the light modulation module further includes:
And a filtering unit which shapes the spectrum distribution of the initial incident light with a wide spectrum into a standard Gaussian distribution, and adjusts the initial incident light into Gaussian light and inputs the Gaussian light into the polarization pre-selecting unit.
Compared with the prior art, the stress detection system of the invention obtains the average wavelength offset by adjusting the variable phase compensation unitA change curve of the time delay tau, and a linear working interval R and a slope K which are linearly changed in the change curve; simultaneously, the variable phase compensation sheet is adjusted to enable the sample to be measured to be placed in a linear working area for stress measurement, and the average wavelength offset/> is measuredThe stress delta S of the sample to be detected can be obtained, the high-precision and high-sensitivity detection of the birefringent stress can be realized, and particularly the ultra-high-sensitivity detection in a certain stress range can be realized. The detection system has the advantages of high precision, high sensitivity and the like, and has important application value in the aspect of micro-stress detection in the field of wafer manufacturing; and secondly, the stress detection system has a simple structure and high stability, and realizes the real-time detection of the internal stress in the glass processing and forming process.
Meanwhile, the invention further provides a stress detection method based on the stress detection system based on the modulatable weak value amplification technology.
The stress detection method based on the adjustable weak value amplification technology is characterized by comprising the following steps of:
modulating the initial incident light of a broad spectrum into detected incident light having an average wavelength shift of the average wavelength shift -Within the linear working interval R i of the time delay τ variation; the incident light is detected to be coupled with stress information of a sample to be detected and then is used as sample light;
Collecting and analyzing spectrum information of initial incident light, detected incident light and sample light;
Calculating the stress of the sample to be measured according to the initial incident light, the spectrum information of the detected incident light and the sample light, the sample information and the slope K i of the linear working interval R i:
wherein: Δs represents the stress of the sample to be measured, c represents the light velocity in vacuum, λ 0 represents the average wavelength of the initial incident light, σ represents the spectral width of the initial incident light, d represents the thickness of the sample to be measured, G represents the stress optical constant of the sample to be measured, im (Aw) represents the imaginary part of the weak value Aw, Representing weak values in weak measurement theory, |ψ i > represents a pre-selected state of the system, |ψ f > represents a post-selected state of the system,/>Representing observables of the system, |h > represents the eigenstate of horizontally polarized light, |v > represents the eigenstate of vertically polarized light, |θ represents the scaling factor relative to the slope K i of the linear working interval R i, θ=1 when the slope is K 1, θ=c (K i/K1) when the slope is K i, C being a constant.
Further, the detection incident light is determined to be at an average wavelength offset by-Within the linear working interval R i of the time delay τ variation curve:
Phase compensation adjustment is performed on pre-polarized light, when the average wavelength shift of the detected incident light is measured When a symmetrical double peak of the spectrum is observed, judging that the incident light is detected in a first linear working interval R 1;
continuing to perform phase compensation adjustment on the pre-polarized light in one direction, and detecting the average wavelength offset of the incident light when the 2 nd measurement is performed When the incident light is detected in the second linear working area R 2; at this time, the spectrum is observed to have double peaks, the two peaks are unequal, and a first peak difference exists;
continuing to perform phase compensation adjustment on the pre-polarized light in one direction, and detecting the average wavelength offset of the incident light when the 3 rd measurement is performed When the incident light is detected in the third linear working region R 3; at this time, the spectrum is observed to have double peaks, the two peaks are unequal, and a second peak difference exists, wherein the second peak difference is larger than the first peak difference;
And so on, based on the measured average wavelength shift of the detected incident light Judging the linear working interval R i of the spectrum according to the appearance sequence and the shape and peak value difference of the observed spectrum double peaks;
The unidirectional phase compensation adjustment is that the compensation phase is selected to be increased or the compensation phase is selected to be decreased when the adjustment is continuously carried out.
Further, the average wavelength offsetThe time delay τ profile and the linear working interval R i are obtained by:
SA1 performs pre-polarization and post-polarization adjustment on initial incident light, wherein the pre-polarization adjustment parameters meet the condition that an included angle between a polarization direction and a horizontal positive direction is (+/4) rad, and an included angle between a fast axis direction and the horizontal positive direction is (+/-) (pi/4+epsilon) rad, wherein epsilon is a system pre-selection angle; the rear polarization adjustment parameter satisfies that the included angle between the polarization direction and the horizontal positive direction is
SA2 performs continuous phase compensation adjustment on pre-polarized light, and records average wavelength offset of post-polarized light during adjustmentVariation curve of time delay tau, average wavelength offset/>, obtained by variation curveEach linear operating interval R i, each linear operating interval width Δτ i, and the slope K i of each linear operating interval, where i represents the ith linear operating interval, which vary linearly with time delay τ.
Compared with the prior art, the stress detection method has the advantages that the stress detection method is the same as the stress detection system, and the stress detection system is not described in detail herein.
For a better understanding and implementation, the present invention is described in detail below with reference to the drawings.
Drawings
FIG. 1 is a schematic diagram of a unit structure of an embodiment of a stress detection system;
FIG. 2 is a graph of the variation of the wavelength offset Δλ i over time delay τ i based on a tunable weak value amplification technique;
FIG. 3 is a partial enlarged view of the first linear working region R 1 of FIG. 2;
Fig. 4 shows the spectral double peak corresponding to the linear operation region shown in fig. 2.
Detailed Description
The technical scheme of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention.
The terminology used in the embodiments of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of embodiments of the application. As used in this application and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should also be understood that unless otherwise indicated, "a plurality" means two or more; "and/or" means and includes any or all possible combinations of one or more of the associated listed items; "first," "second," "third," etc. are used merely for distinguishing between and not for describing a particular sequential or chronological order, and are not to be construed as indicating or implying a relative importance.
In order to solve the problems of low detection precision, low sensitivity, high detection condition and the like in the existing method for nondestructively detecting the residual stress of the optical glass, the invention provides a stress detection system based on a modulating weak value amplification technology, which is suitable for detecting the stress of a transparent sample.
The structure of the stress detection system of the present invention and the stress detection method thereof will be described in detail below.
Referring to fig. 1, the stress detection system of the present invention includes a light emitting unit 10, a light modulating module 20, a sample coupling unit 30, a light information collecting unit 40, and a stress processor 50 electrically and/or communicatively connected to the light modulating module 20 and the light information collecting unit 40. At the time of detection, the light emitting unit 10 emits a light beam modulated by the light modulation module 20 such that the average wavelength shift is at the average wavelength shiftThe incident light is detected in the linear working region R i of the time delay τ variation curve, and the incident light is optically coupled to the stress information of the sample to be tested and then is sample light, and the sample light is received by the light information acquisition unit 40 and then is converted into spectrum data to be transmitted to the stress processor 50 for analysis.
Specifically, the light emitting unit 10 is a broad spectrum light source, such as a Light Emitting Diode (LED) with a certain bandwidth, a near infrared super-radiation light emitting diode (SLD), a C & L segment high power white light source, and the like.
The light modulation module 20 includes a polarization pre-selection unit 22, a variable phase compensation unit 23, and a post-polarization selection unit 24. The filtering unit 21 shapes the light beam emitted by the light emitting unit 10 into standard Gaussian distribution, and modulates the standard Gaussian distribution into elliptical polarized light through the polarization pre-selection unit 22; the stress processor 50 adjusts the variable phase compensation unit 23 to enable the elliptical polarized light to enter the sample coupling unit 30 for coupling with the sample after the elliptical polarized light is subjected to phase compensation by the variable phase compensation unit 23; sample light coupled with the sample pressure information enters the polarization back selection unit 24 to be modulated, and is received by the light information acquisition unit 40 to be converted into spectrum data to be transmitted to the stress processor 50 for analysis.
The polarization pre-selection unit 22 includes a polarization state selector 221 and a polarization state selector 222 sequentially disposed on an optical path. The polarization state selector 221 is formed by combining a birefringent crystal and a half-wave plate, wherein the birefringent crystal is a high extinction polarizing prism such as a polarizing beam splitter, a roson prism, a Wollaston prism, a gram laser prism, and the like; the half wave plate is a zero-order half wave plate. Or the polarization state selector 221 is a separate thin film polarizer or wire grid polarizer. The direction of the polarized light outputted by the polarization selector 221 is perpendicular to the direction of the polarized light outputted by the post-polarization selection unit 24, specifically, the included angle between the polarized direction of the polarization selector 221 and the horizontal positive direction is ± (pi/4) rad, and the included angle between the polarized direction of the post-polarization selection unit 24 and the horizontal positive direction is ± (pi/4)The polarization state selector 222 is a 1/4 wave plate or a phase compensator with a compensation phase of ± (pi/2) rad. The angle between the fast axis direction of the polarization state selector 222 and the polarization direction of the polarization state selector 221 is ε, which is a system pre-selection angle; the angle between the fast axis direction of the polarization selector 222 and the horizontal positive direction is set to be ± (pi/4+epsilon) rad, and the angle/>, between the polarized light outputted from the polarization post-selection unit 24 and the horizontal positive direction
The variable phase compensation unit 23 is a phase compensator. The phase compensator is provided with a driving motor which is electrically and/or communicatively connected with the stress processor 50, and the stress processor 50 controls the driving motor to adjust the phase compensator to carry out compensation phase adjustment, so that the adjustment of the working area for detecting the incident light is realized, and the incident light detection of the stress detection system is always in a linear working area with high sensitivity. The phase compensator is a Soxhlet-Barbie compensator or a liquid crystal variable phase retarder. In this embodiment, the phase compensator is an optical element capable of continuously adjusting the time delay, and the adjustment of the compensation phase is performed by adjusting a micrometer of the phase compensator, and the micrometer is equipped with a driving motor, and the driving motor completes the corresponding adjustment operation according to the instruction sent by the processor. The micrometer of the phase compensator is continuously adjusted, the reading X exp of the micrometer with one complete wavelength is recorded and adjusted, the distance displayed by the micrometer corresponds to the calibration distance X cal and is equal to one complete wave delay on the wavelength of the test light source, namely, one 2 pi period, and the following relation exists between the reading X exp of the micrometer and the calibration distance X cal:
Xexp＝N*Xcal
where N represents the desired amount of wavelength retardation.
The light modulation module 20 further includes a filtering unit 21, where the filtering unit 21 is a gaussian filter, and is configured to shape the spectrum distribution of the broad spectrum light source into a standard gaussian distribution, i.e. shape the broad spectrum light source into gaussian light. The average wavelength of the Gaussian light is lambda 0, and the spectrum width of the Gaussian light is sigma.
The post-polarization selection unit 24 is formed by combining a birefringent crystal and a half-wave plate, wherein the birefringent crystal is a high extinction polarizing prism such as a polarizing beam splitter, a roson prism, a Wollaston prism, a gram laser prism, and the like; the half wave plate is a zero-order half wave plate. Or the post-polarization selection unit 24 is a separate thin film polarizer or wire grid polarizer.
The sample coupling unit 30 is a two-dimensional slide stage. The two-dimensional slide rail objective table can move along the X axis and along the Y axis, and can adjust the sample to be measured to move on the XOY plane which is perpendicular to the light path. And fixing the sample to be detected on an objective table of the two-dimensional slide rail objective table, and detecting the two-dimensional distribution of the internal stress of the sample to be detected.
The optical information collecting unit 40 is an optical information collecting unit or a wavelength meter.
The stress processor 50 receives the spectrum data collected by the optical information collecting unit 40, analyzes the spectrum data, and sends a phase adjusting signal to the variable phase compensating unit 23 until the spectrum data received by the stress processor 50 is in a linear working area with high measurement sensitivity, and the stress processor 50 analyzes the stress distribution of the sample to be measured according to the adjusted spectrum data.
Referring to fig. 2, the stress detection method of the present invention includes the following steps:
S10, modulating the initial incident light with a wide spectrum into detection incident light, wherein the average wavelength offset of the detection incident light is equal to the average wavelength offset -Within the linear working interval R i of the time delay τ variation; the detection incident light is coupled with stress information of a sample to be detected and then is sample light.
The method comprises the following substeps:
S11, pre-polarization adjustment is carried out on initial incident light to obtain pre-polarized light, the pre-polarization adjustment parameters meet the condition that an included angle between a polarization direction and a horizontal positive direction is (+/4) rad, and an included angle between a fast axis direction and the horizontal positive direction is (+/4+epsilon) rad, wherein epsilon is a system pre-selection angle.
In specific implementation, the light-emitting unit 10 is started, and the polarization direction of the polarization state selector 221 of the polarization pre-selection unit 22 is adjusted to form an included angle of ± (pi/4) rad with the horizontal positive direction; the fast axis direction of the polarization state selector 222 of the polarization pre-selection unit 22 is adjusted so that its angle with the polarization direction of the polarization state selector 221 is epsilon and its angle with the horizontal positive direction is ± (pi/4+epsilon) rad, where epsilon is the system pre-selection angle. The system pre-selection angle epsilon is a settable value, which is set as small as possible in case a clear spectral line is observed on the light information collecting unit 40.
Further, the initial incident light is adjusted to Gaussian light by the filtering unit 21, and polarized by the polarization pre-selecting unit 22.
S12, carrying out continuous phase compensation adjustment on the pre-polarized light to obtain detection incident light, wherein the average wavelength offset of the detection incident light is equal to the average wavelength offset-Within the linear working interval R i of the time delay τ variation.
In particular, the spectrum of the phase-compensated detected incident light collected by the light information collection unit 40 is determined to be within a desired linear operating region R i, the linear operating region R i being an average wavelength offset-A linear working interval R i of the time delay τ variation curve:
The unidirectional adjustment variable phase compensation unit 23, when the optical information acquisition unit 40 measures the average wavelength shift amount of the detected incident light When a symmetrical double peak of the spectrum is observed, judging that the spectrum of the detected incident light is in a first linear working interval R 1;
Continuing to unidirectionally adjust the variable phase compensation unit 23, when the optical information acquisition unit 40 measures the average wavelength offset of the detected incident light for the 2 nd time When the spectrum of the detected incident light is in the second linear working area R 2; at this time, the spectrum is observed to have double peaks, the two peaks are unequal, and a first peak difference exists;
Continuing to unidirectionally adjust the variable phase compensation unit 23, when the optical information acquisition unit 40 measures the average wavelength offset of the detected incident light for the 3 rd time When the spectrum of the incident light is detected in the third linear working region R 3; at this time, the spectrum is observed to have double peaks, the two peaks are unequal, and a second peak difference exists, wherein the second peak difference is larger than the first peak difference;
And so on, based on the measured average wavelength shift of the detected incident light The order of appearance and the shape of the observed spectrum doublet, peak difference determine what linear working interval R i the spectrum is in.
The unidirectional adjustment variable phase compensation unit 23 selects either to increase the compensation phase or to decrease the compensation phase for continuous adjustment.
It should be noted that: when the mechanical stress of the sample is measured, the sample to be measured is put into the back of the sample to be measured for adjusting the linear working area; when the low-level residual stress of the sample is measured, the sample to be measured is not required to be put in, and the adjustment of the linear working area is directly carried out.
The average wavelength shiftThe time delay τ profile is obtained in the following way.
SA1 performs pre-polarization and post-polarization adjustment on initial incident light, wherein the pre-polarization adjustment parameters meet the condition that an included angle between a polarization direction and a horizontal positive direction is (+/4) rad, and an included angle between a fast axis direction and the horizontal positive direction is (+/-) (pi/4+epsilon) rad, wherein epsilon is a system pre-selection angle; the rear polarization adjustment parameter satisfies that the included angle between the polarization direction and the horizontal positive direction is
In specific implementation, the light-emitting unit is started, and the polarization direction of the polarization state selector 221 of the polarization pre-selection unit 22 is adjusted to form an included angle of + - (pi/4) rad with the horizontal positive direction; the fast axis direction of the polarization state selector 222 of the polarization pre-selection unit 22 is adjusted to have an included angle of ± (pi/4+epsilon) rad with the horizontal positive direction, wherein epsilon is the system pre-selection angle; the polarization direction of the polarization post-selection unit 24 is adjusted to form an included angle with the horizontal positive direction
SA2 performs continuous phase compensation adjustment on pre-polarized light, and records average wavelength offset of post-polarized light during adjustmentVariation curve of time delay tau, average wavelength offset/>, obtained by variation curveEach linear operating interval R i, each linear operating interval width Δτ i, and the slope K i of each linear operating interval, where i represents the ith linear operating interval, which vary linearly with time delay τ.
Referring to FIG. 3, the average wavelength offsetThe slope of each linear working section is not identical, the slope K 1 of the first linear working section R 1 is the largest, the slope K 2 of the second linear working section R 2 is the smallest, and so on. The slope K i of the linear working interval reflects the sensitivity of the stress detection system, and the larger the slope is, the higher the sensitivity is.
The adjustment may be continuous in the direction in which the time delay τ decreases or in the direction in which the time delay τ increases, but the continuous adjustment in the direction in which the time delay τ increases may cause a decrease in measurement sensitivity.
S13, carrying out rear polarization adjustment on sample light, wherein the sample light is light for detecting stress information of an incident light coupling sample to be detected, and the rear polarization adjustment parameters meet the condition that an included angle between a polarization direction and a horizontal positive direction is formed
S20, collecting and analyzing spectrum information of initial incident light, detected incident light and sample light;
S30, calculating the stress of the sample to be measured according to the initial incident light, the detected incident light, the spectrum information of the sample light, the sample information and the slope K i of the linear working interval R i:
wherein: Δs represents the stress of the sample to be measured, c represents the light velocity in vacuum, λ 0 represents the average wavelength of the initial incident light, σ represents the spectral width of the initial incident light, d represents the thickness of the sample to be measured, G represents the stress optical constant of the sample to be measured, im (Aw) represents the imaginary part of the weak value Aw, Representing weak values in weak measurement theory, |ψ i > represents a pre-selected state of the system, |ψ f > represents a post-selected state of the system,/>Representing observables of the system, |h > represents the eigenstate of horizontally polarized light, |v > represents the eigenstate of vertically polarized light, |θ represents the scaling factor relative to the slope K i of the linear working interval R i, θ=1 when the slope is K 1, θ=c (K i/K1) when the slope is K i, C being a constant.
When the initial incident light is modulated to Gaussian light, λ 0 represents the average wavelength of the Gaussian light and σ represents the spectral width of the Gaussian light.
The following will explain the concept and the theoretical basis of the invention in detail.
In the stress detection system of the present invention, light emitted by the light emitting unit 10 is shaped into gaussian light by the light filtering unit 21, then modulated into linearly polarized light with an included angle (pi/4) with the horizontal positive direction by the polarization state selector 221, and then modulated into elliptical polarized light with small ellipticity by the polarization state selector 222, and since the included angle epsilon between the fast axis direction of the polarization state selector 222 and the polarization direction of the polarization state selector 221 is set, the system pre-selection state |ψ i > is:
Where H > represents the eigenstate of horizontally polarized light, V > represents the eigenstate of vertically polarized light, and ε represents the system pre-selection angle.
Taking the system pre-selected state |ψ i > as the system initial state of the light quantum and taking the incident spectrum with Gaussian distribution as a probe, the standard pre-selected state |ψ > of elliptical polarized light with the system pre-selected state |ψ i > of the incident light distribution is as follows:
Wherein,
Wherein: the |w > represents a pre-selected state of the probe, w represents a frequency of the Gaussian light, w 0 represents a center frequency of the Gaussian light, and σ represents a spectral width of the Gaussian light.
After the elliptical polarized light is coupled with the sample to be measured through the sample coupling unit 30, weak interaction is generated between the system and the probe, time delay tau is generated between the polarized components |H > and |V >, and the combined wave function of the system and the probe, which introduces 2 times of the time delay tau, is changed into |ψ' >:
After passing through the post-polarization selection unit 24, the post-system selection state is in a linear polarization state and is almost orthogonal to the pre-system selection state, and then the post-system selection state is:
the corresponding weak value a w is:
Amplifying the physical quantity to be measured, wherein the smaller the system pre-selection angle epsilon is, the larger the amplification factor is, and the evolved joint wave function is projected onto the post-selection state of the system, so that the post-selection state |phi f > of the probe after passing through the post-polarization selection unit 24 is as follows:
The probability P f of the corresponding post-polarization selection is:
And the frequency offset aw is:
Where w c represents the average frequency, the wavelength offset Δλ corresponding to the time delay τ and the system pre-selection angle ε satisfies:
Where λ 0 represents the average wavelength of gaussian light.
Since the introduced time delay τ is very small, the approximate solution of the wavelength offset Δλ is taken, and the wavelength offset Δλ satisfies:
after the optical quantum system is selected by the post-polarization selection unit 24, the time delay τ to be measured realizes linear weak value amplification of one-time pure imaginary number, which is represented by that the detected wavelength offset Δλ is amplified, so that the measurement accuracy of the stress detection system is higher under the condition that the measurement resolution of the detector is the same.
The stress detection system of the invention obtains the average wavelength offset by adjusting the variable phase compensation unitA change curve of the time delay tau, and a linear working interval R and a slope K which are linearly changed in the change curve; simultaneously, the variable phase compensation sheet is adjusted to enable the sample to be measured to be placed in a linear working area for stress measurement, and the average wavelength offset/> is measuredThe stress delta S of the sample to be detected can be obtained, the high-precision and high-sensitivity detection of the birefringent stress can be realized, and particularly the ultra-high-sensitivity detection in a certain stress range can be realized. The detection system has the advantages of high precision, high sensitivity and the like, and has important application value in the aspect of micro-stress detection in the field of wafer manufacturing; and secondly, the stress detection system has a simple structure and high stability, and realizes the real-time detection of the internal stress in the glass processing and forming process.
The foregoing examples illustrate only a few embodiments of the invention, which are described in detail and are not to be construed as limiting the scope of the invention. It should be noted that modifications and improvements can be made by those skilled in the art without departing from the spirit of the invention, and the invention is intended to encompass such modifications and improvements.
Claims (10)
1. A system for stress detection based on a modulatable weak value amplification technique, comprising:
A light modulation module for modulating the initial incident light with a wide spectrum into the detected incident light with an average wavelength shift of the detected incident light being equal to the average wavelength shift -Within the linear working interval R i of the time delay τ variation; the incident light is detected to be coupled with stress information of a sample to be detected and then is used as sample light;
The optical information acquisition unit is used for acquiring and analyzing the spectrum information of the initial incident light, the detection incident light and the sample light;
A stress processor for calculating the stress of the sample to be measured according to the initial incident light, the detected incident light, the spectrum information of the sample light, the sample information, and the slope K i of the linear working interval R i:
wherein: Δs represents the stress of the sample to be measured, c represents the light velocity in vacuum, λ 0 represents the average wavelength of the initial incident light, σ represents the spectral width of the initial incident light, d represents the thickness of the sample to be measured, G represents the stress optical constant of the sample to be measured, im (Aw) represents the imaginary part of the weak value Aw, Representing weak values in weak measurement theory, |ψ i > represents a pre-selected state of the system, |ψ f > represents a post-selected state of the system,/>Representing observables of the system, |h > represents the eigenstate of horizontally polarized light, |v > represents the eigenstate of vertically polarized light, |θ represents the scaling factor relative to the slope K i of the linear working interval R i, θ=1 when the slope is K 1, θ=c (K i/K1) when the slope is K i, C being a constant.
2. The stress detection system of claim 1, wherein the light modulation module comprises:
the polarization pre-selection unit is used for adjusting the initial incident light into pre-polarized light, wherein an included angle between the polarization direction and the horizontal positive direction is (+/4) rad, and an included angle between the fast axis direction and the horizontal positive direction is (+/4+epsilon) rad, wherein epsilon is a system pre-selection angle;
A variable phase compensation unit that adjusts the pre-polarized light to a detected incident light having an average wavelength shift at an average wavelength shift -Within the linear working interval R i of the time delay τ variation;
A polarization post-selection unit for performing post-polarization adjustment on the detected incident light or sample light, wherein the included angle between the polarization direction and the horizontal positive direction is
3. The stress detection system of claim 2, wherein the light modulation module further comprises:
And a filtering unit which shapes the spectrum distribution of the initial incident light with a wide spectrum into a standard Gaussian distribution, and enables the initial incident light to be modulated into Gaussian light and then input into the polarization pre-selecting unit.
4. The stress detection method based on the adjustable weak value amplification technology is characterized by comprising the following steps of:
modulating the initial incident light of a broad spectrum into detected incident light having an average wavelength shift of the average wavelength shift -Within the linear working interval R i of the time delay τ variation; the incident light is detected to be coupled with stress information of a sample to be detected and then is used as sample light;
Collecting and analyzing spectrum information of initial incident light, detected incident light and sample light;
Calculating the stress of the sample to be measured according to the initial incident light, the spectrum information of the detected incident light and the sample light, the sample information and the slope K i of the linear working interval R i:
wherein: Δs represents the stress of the sample to be measured, c represents the light velocity in vacuum, λ 0 represents the average wavelength of the initial incident light, σ represents the spectral width of the initial incident light, d represents the thickness of the sample to be measured, G represents the stress optical constant of the sample to be measured, im (Aw) represents the imaginary part of the weak value Aw, Representing weak values in weak measurement theory, |ψ i > represents a pre-selected state of the system, |ψ f > represents a post-selected state of the system,/>Representing observables of the system, |h > represents the eigenstate of horizontally polarized light, |v > represents the eigenstate of vertically polarized light, |θ represents the scaling factor relative to the slope K i of the linear working interval R i, θ=1 when the slope is K 1, θ=c (K i/K1) when the slope is K i, C being a constant.
5. The method of claim 4, wherein modulating the initial incident light comprises:
Pre-polarizing the initial incident light to obtain pre-polarized light, wherein the pre-polarizing adjustment parameters meet the condition that the included angle between the polarizing direction and the horizontal positive direction is (+/4) rad, and the included angle between the fast axis direction and the horizontal positive direction is (+/-) (pi/4+epsilon) rad, wherein epsilon is a system pre-selection angle;
Performing continuous phase compensation adjustment on the pre-polarized light to obtain detected incident light, wherein the average wavelength offset of the detected incident light is equal to the average wavelength offset -Within the linear working interval R i of the time delay τ variation;
Carrying out rear polarization adjustment on sample light, wherein the sample light is light for detecting stress information of an incident light coupling sample to be detected, and the rear polarization adjustment parameter meets the condition that an included angle between a polarization direction and a horizontal positive direction is formed
6. The method of claim 5, further comprising the step of, prior to pre-polarizing the initial incident light:
The spectral distribution of the broad-spectrum initial incident light is shaped into a standard gaussian distribution, and the initial incident light is adjusted to the gaussian light.
7. The method of any one of claims 4-6, wherein the determination of the average wavelength shift of the detected incident light is performed by-Within the linear working interval R i of the time delay τ variation curve:
Phase compensation adjustment is performed on pre-polarized light, when the average wavelength shift of the detected incident light is measured When a symmetrical double peak of the spectrum is observed, judging that the incident light is detected in a first linear working interval R 1;
continuing to perform phase compensation adjustment on the pre-polarized light in one direction, and detecting the average wavelength offset of the incident light when the 2 nd measurement is performed When the incident light is detected in the second linear working area R 2; at this time, the spectrum is observed to have double peaks, the two peaks are unequal, and a first peak difference exists;
continuing to perform phase compensation adjustment on the pre-polarized light in one direction, and detecting the average wavelength offset of the incident light when the 3 rd measurement is performed When the incident light is detected in the third linear working region R 3; at this time, the spectrum is observed to have double peaks, the two peaks are unequal, and a second peak difference exists, wherein the second peak difference is larger than the first peak difference;
And so on, based on the measured average wavelength shift of the detected incident light Judging the linear working interval R i of the spectrum according to the appearance sequence and the shape and peak value difference of the observed spectrum double peaks;
The unidirectional phase compensation adjustment is that the compensation phase is selected to be increased or the compensation phase is selected to be decreased when the adjustment is continuously carried out.
8. The method of claim 4, wherein the average wavelength shiftThe time delay τ profile and the linear working interval R i are obtained by:
SA1 performs pre-polarization and post-polarization adjustment on initial incident light, wherein the pre-polarization adjustment parameters meet the condition that an included angle between a polarization direction and a horizontal positive direction is (+/4) rad, and an included angle between a fast axis direction and the horizontal positive direction is (+/-) (pi/4+epsilon) rad, wherein epsilon is a system pre-selection angle; the rear polarization adjustment parameter satisfies that the included angle between the polarization direction and the horizontal positive direction is
SA2 performs continuous phase compensation adjustment on pre-polarized light, and records average wavelength offset of post-polarized light during adjustmentVariation curve of time delay tau, average wavelength offset/>, obtained by variation curveEach linear operating interval R i, each linear operating interval width Δτ i, and the slope K i of each linear operating interval, where i represents the ith linear operating interval, which vary linearly with time delay τ.
9. The method according to claim 7, wherein when measuring the mechanical stress of the sample to be measured, the adjustment of the linear working area for detecting the incident light is performed by being placed behind the sample to be measured.
10. The method according to claim 7, wherein the stress measurement is performed while applying the external force F to the sample to be measured when measuring the mechanical stress of the sample to be measured.
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