CN117572564A - Vertical coupling structure of double-layer polymer optical waveguide and array optical fiber - Google Patents
Vertical coupling structure of double-layer polymer optical waveguide and array optical fiber Download PDFInfo
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- CN117572564A CN117572564A CN202311842471.2A CN202311842471A CN117572564A CN 117572564 A CN117572564 A CN 117572564A CN 202311842471 A CN202311842471 A CN 202311842471A CN 117572564 A CN117572564 A CN 117572564A
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- 229920000642 polymer Polymers 0.000 title claims abstract description 68
- 239000013307 optical fiber Substances 0.000 title claims abstract description 63
- 230000008878 coupling Effects 0.000 title claims abstract description 44
- 238000010168 coupling process Methods 0.000 title claims abstract description 44
- 238000005859 coupling reaction Methods 0.000 title claims abstract description 44
- 230000003287 optical effect Effects 0.000 title claims abstract description 43
- 239000010410 layer Substances 0.000 claims abstract description 74
- 238000005253 cladding Methods 0.000 claims abstract description 62
- 239000003292 glue Substances 0.000 claims abstract description 54
- 238000004528 spin coating Methods 0.000 claims abstract description 33
- 239000012792 core layer Substances 0.000 claims abstract description 24
- 238000002360 preparation method Methods 0.000 claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 239000000853 adhesive Substances 0.000 claims abstract description 20
- 230000001070 adhesive effect Effects 0.000 claims abstract description 20
- 238000007747 plating Methods 0.000 claims abstract description 11
- 238000005530 etching Methods 0.000 claims abstract description 10
- 238000004806 packaging method and process Methods 0.000 claims abstract description 4
- 206010034972 Photosensitivity reaction Diseases 0.000 claims abstract description 3
- 238000011161 development Methods 0.000 claims abstract description 3
- 230000036211 photosensitivity Effects 0.000 claims abstract description 3
- 239000002355 dual-layer Substances 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 238000010329 laser etching Methods 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 239000000835 fiber Substances 0.000 claims description 5
- 238000001259 photo etching Methods 0.000 claims description 5
- 238000013461 design Methods 0.000 claims description 3
- 239000003822 epoxy resin Substances 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 229920000647 polyepoxide Polymers 0.000 claims description 3
- 238000002207 thermal evaporation Methods 0.000 claims description 3
- 229920001187 thermosetting polymer Polymers 0.000 claims description 2
- 238000000034 method Methods 0.000 description 16
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- 238000010586 diagram Methods 0.000 description 10
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- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/262—Optical details of coupling light into, or out of, or between fibre ends, e.g. special fibre end shapes or associated optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/36—Mechanical coupling means
- G02B6/38—Mechanical coupling means having fibre to fibre mating means
- G02B6/3807—Dismountable connectors, i.e. comprising plugs
Abstract
The invention provides a vertical coupling structure of a double-layer polymer optical waveguide and an array optical fiber. The preparation method of the vertical coupling structure of the double-layer polymer optical waveguide and the array optical fiber comprises the following steps: s1, spin-coating and curing a polymer cladding adhesive with photosensitivity and low refractive index on a substrate; s2, spin-coating a first polymer core layer adhesive, and performing ultraviolet exposure and development by using a mask plate to obtain a series of lower rectangular waveguides; s3, spin coating and curing the polymer cladding adhesive of the middle layer; s4, etching a reflecting micro mirror on the lower layer waveguide by adopting an excimer laser, and plating a reflecting film; s5, spin coating and curing the middle thin polymer cladding glue; s6, spin coating and ultraviolet light are performed on the second polymer core layer glue to obtain a series of upper rectangular waveguides; s7, spin coating and curing the upper polymer cladding glue; s8, etching a reflecting micro mirror on the upper layer waveguide by adopting an excimer laser, and plating a reflecting film; s9, obtaining a double-layer polymer optical waveguide carved with a reflecting micro mirror; s10, aligning and packaging the optical fiber array or the array formed by assembling the lenses and the optical fibers with the reflecting micro mirror. The vertical coupling structure of the double-layer polymer optical waveguide and the array optical fiber has the advantages of relatively simple preparation, higher application flexibility and high vertical coupling efficiency.
Description
Technical Field
The invention relates to the technical field of vertical coupling of optical devices, in particular to a vertical coupling structure of a double-layer polymer optical waveguide and an array optical fiber.
Background
With the increasing demand for high-speed high-density optical interconnects, the information transmission capabilities of single-layer optical waveguides have failed to meet the increasing data demands. Therefore, in the field of optical interconnection, parallel transmission of multi-channel multi-layer optical waveguides becomes a necessary choice, which also promotes a vertically coupled optical component between the multi-layer optical waveguides and the optical fibers.
However, current technology faces some challenges. The coupling of the multilayer waveguide to the Vertical Cavity Surface Emitting Laser (VCSEL)/Photodiode (PD) is typically by a bevel mirror approach. One paper entitled Multicore Polymer Waveguides and Multistep 45 ° Mirrors for 3D Photonic Integration describes a method of vertical coupling to a PD array using hexagonally distributed multilayer single mode waveguides. However, a hexagonally distributed waveguide structure is not suitable for achieving multiple densities of parallel optical interconnects. In addition, since the size of the receiving surface of the PD is much larger than the size of the waveguide, the size of the light spot after vertical reflection is not particularly critical. However, when the size and numerical aperture of the waveguide are equal to those of the optical fiber, the light spot after being vertically reflected by the inclined mirror tends to be larger than the size of the end face of the optical fiber, so that the vertical coupling efficiency between the waveguide and the optical fiber is directly affected. The search for a method of efficiently coupling a multilayer waveguide with a vertically coupled optical waveguide device of an optical fiber is an urgent problem to be solved by those skilled in the art.
Therefore, it is necessary to provide a vertical coupling structure of a dual-layer polymer optical waveguide and an array optical fiber to solve the above technical problems.
Disclosure of Invention
The purpose of the part is to provide a vertical coupling structure of a double-layer polymer optical waveguide and an array optical fiber for parallel optical interconnection, which has higher coupling efficiency; it is another object of the present invention to provide a flexible pluggable waveguide to MT connector vertical coupling structure.
Summary aspects of embodiments of the invention some preferred embodiments are briefly described. Some simplifications or omissions may be made in this section as well as in the description summary and in the title of the application, to avoid obscuring the purpose of this section, the description summary and the title of the invention, which should not be used to limit the scope of the invention.
The present invention has been made in view of the above and/or problems occurring in the prior art.
The invention provides a vertical coupling structure of a double-layer polymer optical waveguide and an array optical fiber, which has the following specific technical scheme:
preparing a lower layer waveguide on the cleaned substrate through spin coating, photoetching, developing and the like; preparing a bevel mirror or a concave mirror by adopting excimer lithography, and plating a metal film or a dielectric high-reflection film; preparing an upper layer waveguide by spin coating, photoetching, developing and the like on the basis; then, preparing a bevel mirror or a concave mirror at the corresponding position by adopting excimer lithography, and plating a metal film or a dielectric high-reflection film; finally, the optical fibers and lenses are aligned with the prepared reflective micromirrors.
According to the inventive concept, the invention adopts the following technical scheme:
(1) Spin coating a lower polymer coating adhesive on the cleaned substrate, and carrying out ultraviolet irradiation and post-baking;
(2) Spin-coating a first polymer core layer glue, performing ultraviolet exposure by using a mask plate, and developing to obtain a series of lower rectangular waveguides;
(3) Spin-coating an intermediate layer polymer cladding adhesive, and carrying out ultraviolet irradiation and post-baking;
(4) Etching by using an excimer laser, etching a bevel mirror or a concave mirror on the lower rectangular waveguide, and plating a metal film or a dielectric high-reflection film;
(5) Spin-on intermediate thin layer polymer cladding glue
(6) Spin-coating a second polymer core layer glue, performing ultraviolet exposure by using a mask plate, and developing to obtain a series of upper polymer waveguides;
(7) Spin-coating a polymer cladding adhesive, and carrying out ultraviolet exposure and post-baking;
(8) Etching by using an excimer laser, etching a bevel mirror or a concave mirror on an upper rectangular waveguide, and plating a metal film or a dielectric high-reflection film;
(9) Obtaining a double-layer polymer optical waveguide carved with reflecting micro mirrors;
(10) The lens array is assembled and packaged with the fiber array and aligned with the beveled or concave mirror.
As a preferred embodiment of the preparation process according to the invention, there is provided: in the step (1), the substrate is a PCB, an SOI substrate or SiO 2 The cleaning process of the substrate and the PCB comprises ultrasonic cleaning of acetone, alcohol and deionized water, and ultrasonic cleaning of SOI substrate or SiO 2 The cleaning process of the substrate comprises ultrasonic cleaning of acetone, methanol, isopropanol and deionized water, then blow-drying by nitrogen, and bombarding the surface by plasma to increase the adhesion between the substrate and the cladding adhesive. The spin-coated polymer cladding glue thickness is slightly greater than the prepared core thickness.
As a preferred embodiment of the preparation process according to the invention, there is provided: in the step (2), the mask plate adopts a rectangular waveguide array and an overlay mark design, wherein the waveguide width and the length can be designed according to actual needs, the spin-coating thickness determines the waveguide height, and the width of the mask plate design and the ultraviolet exposure time determine the waveguide width; the overlay mark is in the form of a cross or a grid, and is positioned at two ends of the waveguide.
As a preferred embodiment of the preparation process according to the invention, there is provided: in the step (3), the thickness of the polymer cladding glue of the middle layer is far greater than that of the polymer core glue of the first layer.
As a preferred embodiment of the preparation process according to the invention, there is provided: in the step (4), the excimer laser etching realizes a required inclined plane mirror or concave mirror by controlling the photoetching path, mask pattern and bombardment times, and adopts magnetron sputtering or thermal evaporation equipment to prepare a metal film or a dielectric high-reflection film.
As a preferred embodiment of the preparation process according to the invention, there is provided: in the step (5), the thickness of the intermediate thin cladding layer is smaller than that in the step (3).
As a preferred embodiment of the preparation process according to the invention, there is provided: in the step (6), the thickness of the second core glue layer is identical to that of the first core glue layer, and the dimensions and positions of the rectangular waveguide and the overlay mark in the mask diagram are identical to those of the lower waveguide.
As a preferred embodiment of the preparation process according to the invention, there is provided: in the step (7), the thickness of the upper polymer cladding glue is slightly larger than that of the second core glue.
As a preferred embodiment of the preparation process according to the invention, there is provided: in the step (8), the position of the inclined mirror or the concave mirror should be kept at a certain distance from the position of the inclined mirror or the concave mirror at the lower layer.
As a preferred embodiment of the preparation process according to the invention, there is provided: in the step (9), the positions of the reflecting micromirrors are all on the double-layer waveguide, and the reflecting micromirrors on the upper and lower-layer waveguides keep a certain distance in the horizontal direction.
As a preferred embodiment of the preparation process according to the invention, there is provided: in the step (10), the number and positions of lenses in the lens array are consistent with those of the reflecting micromirrors, the optical fiber array is a standard MT connector, and the optical fiber can be a single optical fiber, so that initial experiment test is facilitated.
Compared with the related art, the vertical coupling structure of the double-layer polymer optical waveguide and the array optical fiber has the following beneficial effects:
the invention provides a vertical coupling structure of a double-layer polymer optical waveguide and an array optical fiber, which comprises the following components:
the preparation method has the main advantages that the preparation is relatively simple, the vertical coupling can be directly carried out with the bare optical fiber, the vertical coupling of the pluggable double-layer waveguide and the MT optical fiber array can also be realized, the application flexibility is relatively high, and the vertical coupling efficiency is high. The method is suitable for the industrial production requirement of large-scale optical waveguide plates, and promotes the application of the high-density optical waveguide plate interconnection technology.
Drawings
FIG. 1 is a schematic flow chart of a method for fabricating a dual-layer waveguide vertical coupling structure according to the present invention;
FIG. 2 is a schematic illustration of preparing a lower cladding layer on a substrate;
FIG. 3 is a schematic illustration of a positive reticle;
FIG. 4 is a schematic diagram of a shadow mask;
FIG. 5 is a schematic view from the left after the first core layer is prepared;
FIG. 6 is a schematic diagram of a left side view after preparing an intermediate cladding;
FIG. 7 is a schematic diagram of a front view of a reflective micromirror in the lower layer;
FIG. 8 is a schematic diagram of a rear elevation view of a reflective micromirror coated with a reflective film;
FIG. 9 is a schematic diagram of a left side view of a cross section of a reflective micromirror after a reflective film is coated on the reflective micromirror;
FIG. 10 is a schematic diagram of a front view of the preparation of an intermediate thin cladding layer;
FIG. 11 is a schematic diagram of a left side view of the preparation of an intermediate thin cladding layer;
FIG. 12 is a schematic view from the left after the second core layer is prepared;
FIG. 13 is a schematic view from the left after the upper cladding layer is prepared;
FIG. 14 is a schematic rear elevational view of a top reflecting micromirror;
FIG. 15 is a schematic rear elevational view of a top reflecting micromirror;
FIG. 16 is a schematic view from the left side of a cross section of an upper layer reflecting micromirror after the upper layer reflecting micromirror is fabricated;
FIG. 17 is a schematic diagram of a left side view of a cross section of a lower reflecting micromirror after the upper reflecting micromirror is fabricated;
FIG. 18 is a schematic top view of an overall top view after fabrication of an upper layer reflective micromirror;
FIG. 19 is an overall schematic of a dual-layer waveguide and reflective micromirror after fabrication of an upper layer reflective micromirror;
fig. 20 is a schematic diagram showing a front view of a vertical coupling structure of a double-layer waveguide, a lens and an optical fiber.
Reference numerals in the drawings: 1. a substrate; 2. a lower cladding layer; 3. light leakage area of the positive mask; 4. a positive mask waveguide region; 5. the positive mask plate is sleeved with a marking area; 6. a shadow mask shading area; 7. a shadow mask waveguide region; 8. the shadow mask is sleeved with a marking area; 9. a first core layer; 10. an intermediate cladding; 11. a lower layer reflecting micromirror; 12. the excimer laser etching direction; 13. a metal film or a reflective film; 14. an intermediate thin cladding layer; 15. a second core layer; 16. an upper cladding layer; 17. an upper layer reflecting micromirror; 18. a lens; 19. a lens package jig; 20. an optical fiber core layer; 21. and (3) an optical fiber cladding.
Detailed Description
In order that the above-recited objects, features and advantages of the present invention will become more apparent, a more particular description of the invention will be rendered by reference to specific embodiments thereof which are illustrated in the appended drawings.
In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention, but the present invention may be practiced in other ways other than those described herein, and persons skilled in the art will readily appreciate that the present invention is not limited to the specific embodiments disclosed below.
Further, reference herein to "one embodiment" or "an embodiment" means that a particular feature, structure, or characteristic can be included in at least one implementation of the invention. The appearances of the phrase "in one embodiment" in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments.
The invention provides a vertical coupling structure of a double-layer polymer optical waveguide and an array optical fiber, and the preparation method of the vertical coupling structure of the double-layer polymer optical waveguide and the array optical fiber comprises the following steps:
s1, spin-coating and curing a polymer cladding adhesive with photosensitivity and low refractive index on a substrate;
s2, spin-coating a first polymer core layer adhesive, and performing ultraviolet exposure and development by using a mask plate to obtain a series of lower rectangular waveguides;
s3, spin coating and curing the polymer cladding adhesive of the middle layer;
s4, etching a reflecting micro mirror on the lower layer waveguide by adopting an excimer laser, and plating a reflecting film;
s5, spin coating and curing the middle thin polymer cladding glue;
s6, spin coating and ultraviolet light are performed on the second polymer core layer glue to obtain a series of upper rectangular waveguides;
s7, spin coating and curing the upper polymer cladding glue;
s8, etching a reflecting micro mirror on the upper polymer waveguide by adopting an excimer laser, and plating a reflecting film;
s9, obtaining a double-layer polymer optical waveguide carved with a reflecting micro mirror;
s10, assembling the lens array and the optical fiber array and packaging the lens array and the optical fiber array at the position of the reflecting micro mirror.
The substrate is a PCB, an SOI substrate or SiO 2 The cleaning process of the substrate and the PCB comprises ultrasonic cleaning of acetone, alcohol and deionized water, and ultrasonic cleaning of SOI substrate or SiO 2 The cleaning process of the substrate comprises ultrasonic cleaning of acetone, methanol, isopropanol and deionized water, then blow-drying by nitrogen, bombarding the surface by plasma, and increasing the adhesion between the substrate and the cladding adhesive, wherein the thickness of the lower polymer cladding adhesive in the step S1 is slightly larger than that of the core layer.
The mask pattern in the mask in the S2 is a rectangular waveguide and an overlay mark, wherein the width and the length of the waveguide can be designed according to actual needs, the spin coating thickness determines the height of the waveguide, the width of the designed mask and the ultraviolet exposure time determine the width of the waveguide, the number of each group of rectangular waveguides is N, N is equal to 12 or 4 or 8 or 24 or 48, the shape of the overlay mark is in a cross or field-shaped form, and the positions of the overlay mark are located on two sides of the waveguide.
And if the mask plate in the S2 is a positive plate, the mask plate is matched with the positive cladding glue, and if the mask plate is a negative plate, the mask plate is matched with the negative cladding glue, so that the waveguide and the overlay mark structure are obtained.
In the step S3, the thickness of the cladding glue of the middle layer is far greater than that of the first core layer, if the cladding glue is negative glue, the whole sample is exposed, and if the cladding glue is positive glue, the exposure is not performed.
In the step S4, the excimer laser etching realizes the required reflecting micro-mirrors by controlling the photoetching path, mask pattern and bombardment times, and adopts magnetron sputtering or thermal evaporation equipment to prepare a metal film or a dielectric high-reflection film, wherein the reflecting micro-mirrors are not limited to inclined plane mirrors or spherical concave mirrors or non-spherical concave mirrors or free-form curved mirrors, the number of the reflecting micro-mirrors is consistent with that of the waveguides, the depth of the reflecting micro-mirrors is slightly larger than the height of a lower waveguide core layer, and the reflecting film is not limited to the metal film or the dielectric high-reflection film.
In the step S5, the thickness of the middle thin polymer cladding adhesive is smaller than that of the cladding adhesive in the step S3.
In the step S6, the mask pattern is kept consistent with the mask pattern in the step S2; the thickness and exposure time of the second core layer are the same as those in S2.
In the step S7, the thickness of the middle thin cladding glue is smaller than that of the middle cladding glue in the step S3.
In the step S8, the shape, the size and the number of the reflecting micro mirrors are kept consistent with those of the step S4, and the depth of the reflecting micro mirrors is slightly larger than the thickness of the upper waveguide core layer.
In the step S9, the positions of the reflecting micro mirrors are kept at a certain distance in the horizontal direction of the reflecting micro mirrors on the double-layer waveguide and the upper-layer waveguide and the lower-layer waveguide.
In the step S10, the number of the reflective micromirrors is N, the lens array includes N microlenses, the optical fiber array includes N optical fibers, and the N optical fibers, the N microlenses, and the N reflective micromirrors are aligned one by one.
In the step S10, the optical fiber array is plugged into an MT connector; the distance between the optical fiber, the micro lens and the reflecting micro mirror is 250 mu m; the diameter of the optical fiber is consistent with the size of the waveguide; the diameters of the micro lenses and the reflecting micro mirrors are smaller than 250 mu m; the distances from the micro lens to the end face of the optical fiber and the center of the reflecting micro mirror are the focal length of the micro lens; the micro lens array, the optical fiber array, the micro lens array and the reflecting micro mirror array are respectively fixed by using thermosetting epoxy resin adhesive.
Embodiment one:
the embodiment provides a preparation method of a vertical coupling structure of a double-layer multimode polymer waveguide and an array optical fiber under the condition that cladding glue and core glue are both negative glue. Referring to fig. 1, the method comprises the following steps:
and P1, treating the substrate 1 in advance, respectively carrying out ultrasonic cleaning by adopting acetone, alcohol and deionized water, preparing a lower cladding layer 2 on the substrate, wherein the thickness is 60 mu m, and preparing the lower cladding layer adhesive by adopting negative photoresist and adopting a spin coating method to carry out low-speed spin coating and then high-speed spin coating.
And P2, preparing a negative mask, wherein most of the negative mask is light-tight, and the rectangular waveguide and the concave part are light-tight. According to the thickness of the lower layer waveguide, selecting exposure dose to UV exposure in air environment, spin-coating negative waveguide core glue, and the prepared core size is 50 μm×50 μm.
And P3, exposing and post-baking the intermediate cladding layer.
And P4, preparing a reflecting micro-mirror by adopting an excimer laser etching method, wherein the reflecting micro-mirror is in a 45-degree inclined plane mirror shape, and the thickness of the reflecting film is 100nm.
And P5, the thickness of the middle thin cladding layer is 10-30 mu m.
And P6, spin-coating negative waveguide core glue, exposing the waveguide, and developing the rest of the waveguide without exposing, wherein the size of the upper waveguide core is 50 μm multiplied by 50 μm.
And P7, preparing an upper cladding layer, and exposing the whole sample by adopting negative glue which is the same as that of the lower cladding layer.
And P8, preparing a reflecting micro mirror by adopting an excimer laser etching method and plating a reflecting film, wherein the reflecting micro mirror is in the shape of a 45-degree inclined mirror, and the thickness of the reflecting film is 100nm.
Step P9, obtaining the double-layer polymer waveguide carved with the 45-degree inclined mirror.
And step P10, aligning and fixing the waveguide inclined mirror, the lens and the optical fiber by adopting epoxy resin glue, and packaging.
Embodiment two:
the embodiment provides a preparation method of a vertical coupling structure of a double-layer few-mode polymer waveguide and an array optical fiber under the condition that both cladding glue and core glue are positive glue, which comprises the following steps:
in this example, the lower cladding photoresist in step P1 is a positive photoresist.
For the glue property, the mask in the step P2 is selected as a positive mask, unlike the mask in the first embodiment, the waveguide and the alignment mark portion do not leak light, the unnecessary portion is exposed and developed, only the waveguide and the alignment mark portion are remained, and the waveguide core layer size is 10 μm×10 μm.
And in the step P3, the middle cladding layer is positive photoresist, and ultraviolet exposure is not needed.
In steps P4 and P8, the excimer laser etches the concave mirror and plates a metal film with a thickness of 50 μm.
And P6, selecting positive photoresist from the core layer glue, and exposing and developing all the rest parts except the waveguide and the overlay mark area.
In step P10, the lens array can be selectively selected and removed, so that the process steps are further reduced, and the process cost is reduced.
The vertical coupling structure of the double-layer polymer optical waveguide and the array optical fiber has the following beneficial effects:
the preparation is relatively simple, the vertical coupling can be directly carried out with the bare optical fiber, and the vertical coupling of the pluggable double-layer waveguide and the MT optical fiber array can also be realized, so that the application flexibility is relatively high, and the vertical coupling efficiency is high. The method is suitable for the industrial production requirement of large-scale optical waveguide plates, and promotes the application of the high-density optical waveguide plate interconnection technology.
The foregoing description is only illustrative of the present invention and is not intended to limit the scope of the invention, and all equivalent structures or equivalent processes or direct or indirect application in other related technical fields are included in the scope of the present invention.
Claims (10)
1. The vertical coupling structure of the double-layer polymer optical waveguide and the array optical fiber is characterized in that the preparation method of the vertical coupling structure of the double-layer polymer optical waveguide and the array optical fiber comprises the following steps:
s1, spin-coating and curing a polymer cladding adhesive with photosensitivity and low refractive index on a substrate;
s2, spin-coating a first polymer core layer adhesive, and performing ultraviolet exposure and development by using a mask plate to obtain a series of lower rectangular waveguides;
s3, spin coating and curing the polymer cladding adhesive of the middle layer;
s4, etching a reflecting micro mirror on the lower layer waveguide by adopting an excimer laser, and plating a reflecting film;
s5, spin coating and curing the middle thin polymer cladding glue;
s6, spin coating and ultraviolet light are performed on the second polymer core layer glue to obtain a series of upper rectangular waveguides;
s7, spin coating and curing the upper polymer cladding glue;
s8, etching a reflecting micro mirror on the upper polymer waveguide by adopting an excimer laser, and plating a reflecting film;
s9, obtaining a double-layer polymer optical waveguide carved with a reflecting micro mirror;
s10, packaging the optical fiber array or the array formed by assembling the lenses and the optical fibers at the positions of the reflecting micromirrors.
2. The vertical coupling structure of a dual-layer polymer optical waveguide and an array fiber according to claim 1, wherein the thickness of the lower polymer cladding glue in S1 is slightly greater than the thickness of the core layer.
3. The vertical coupling structure of the double-layer polymer optical waveguide and the array optical fiber according to claim 1, wherein the mask pattern in the mask in the S2 is a rectangular waveguide and an overlay mark, the width and the length of the waveguide can be designed according to practical requirements, the spin-coating thickness determines the height of the waveguide, the width of the mask design and the ultraviolet exposure time determine the width of the waveguide, the number of each group of rectangular waveguides is N, N is equal to 12 or 4 or 8 or 24 or 48, the overlay mark is in the form of a cross or a grid, and the positions are located on two sides of the waveguide.
4. The vertical coupling structure of a dual-layer polymer optical waveguide and an array optical fiber according to claim 1, wherein the mask plate in S2 is used in combination with a positive cladding glue if it is a positive plate, and is used in combination with a negative cladding glue if it is a negative plate, so as to obtain the waveguide and the overlay mark structure.
5. The vertical coupling structure of the dual-layer polymer optical waveguide and the array optical fiber according to claim 1, wherein in the step S3, the thickness of the cladding glue of the intermediate layer is far greater than that of the first core glue, the cladding glue exposes the whole sample if the cladding glue is negative glue, and the cladding glue does not expose if the cladding glue is positive glue.
6. The vertical coupling structure of the double-layer polymer optical waveguide and the array optical fiber according to claim 1, wherein in the step S4, the excimer laser etching is used for realizing the required reflecting micro-mirrors by controlling the path of photoetching, the mask pattern and the bombardment times, and the preparation of the metal film or the dielectric high-reflecting film is carried out by adopting magnetron sputtering or thermal evaporation equipment, wherein the reflecting micro-mirrors are not limited to inclined plane mirrors or spherical concave mirrors or non-spherical concave mirrors or free-form curved mirrors, the number of the reflecting micro-mirrors is kept consistent with that of the waveguide, the depth of the reflecting micro-mirrors is slightly larger than the height of the lower waveguide core layer, and the reflecting film is not limited to the metal film or the dielectric high-reflecting film.
7. The vertical coupling structure of a dual-layer polymer optical waveguide and an array fiber according to claim 1, wherein in S5, the thickness of the middle thin polymer cladding glue is smaller than that in S3.
8. The vertical coupling structure of a dual-layer polymer optical waveguide and an array optical fiber according to claim 1, wherein in S6, the reticle pattern is kept consistent with S2; the thickness and exposure time of the second core layer are the same as those in S2, and in S7, the thickness of the intermediate thin cladding glue is smaller than that of the intermediate cladding glue in S3.
9. The vertical coupling structure of a dual-layer polymer optical waveguide and an array optical fiber according to claim 1, wherein in S8, the shape, size and number of the reflecting micromirrors are consistent with S4, and the depth of the reflecting micromirrors is slightly larger than the thickness of the upper waveguide core layer.
10. The vertical coupling structure of a dual-layer polymer optical waveguide and an array optical fiber according to claim 1, wherein in the S9, the positions of the reflective micromirrors are all on the dual-layer waveguide, the reflective micromirrors on the upper and lower waveguides keep a certain distance in the horizontal direction, in the S10, the number of the reflective micromirrors is N, the lens array comprises N micro lenses, the optical fiber array comprises N optical fibers, the N micro lenses and the N reflective micromirrors are aligned one by one, and in the S10, the optical fiber array is inserted into an MT connector; the distance between the optical fiber, the micro lens and the reflecting micro mirror is 250 mu m; the diameter of the optical fiber is consistent with the size of the waveguide; the diameters of the micro lenses and the reflecting micro mirrors are smaller than 250 mu m; the distances from the micro lens to the end face of the optical fiber and the center of the reflecting micro mirror are the focal length of the micro lens; the choice of the so-called fiber array or the lens and fiber array depends on the shape of the reflecting micromirror and the vertical coupling condition; the micro lens array, the optical fiber array, the micro lens array and the reflecting micro mirror array are respectively fixed by using thermosetting epoxy resin adhesive.
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