CN117572553A - Optical filter for ultraviolet pretreatment test of photovoltaic module and preparation method thereof - Google Patents
Optical filter for ultraviolet pretreatment test of photovoltaic module and preparation method thereof Download PDFInfo
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- CN117572553A CN117572553A CN202311573720.2A CN202311573720A CN117572553A CN 117572553 A CN117572553 A CN 117572553A CN 202311573720 A CN202311573720 A CN 202311573720A CN 117572553 A CN117572553 A CN 117572553A
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- 238000012360 testing method Methods 0.000 title claims abstract description 42
- 230000003287 optical effect Effects 0.000 title claims abstract description 19
- 238000002360 preparation method Methods 0.000 title claims description 7
- 239000000463 material Substances 0.000 claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 11
- 238000002834 transmittance Methods 0.000 claims description 10
- 229910052736 halogen Inorganic materials 0.000 claims description 9
- 150000002367 halogens Chemical class 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 claims description 4
- 230000032683 aging Effects 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 230000003595 spectral effect Effects 0.000 description 6
- 238000000576 coating method Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 210000003850 cellular structure Anatomy 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000012216 screening Methods 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000010485 coping Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/283—Interference filters designed for the ultraviolet
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
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- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
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Abstract
The application relates to an optical filter for ultraviolet pretreatment test of a photovoltaic module, which relates to the technical field of optical filters, and comprises a substrate and a film layer arranged on the surface of the substrate, wherein the film layer is formed by alternately stacking materials with high refractive index and materials with low refractive index, and the film system structure is (HL) 7 Wherein H is a high refractive index material; l is a low refractive index material and 7 is the number of times high refractive index and low refractive index materials are alternately stacked together. The optical filter can filter specific ultraviolet wave bands, and meets the requirements of ultraviolet pretreatment tests of specific photovoltaic modules.
Description
Technical Field
The application relates to the technical field of optical filters, in particular to an optical filter for ultraviolet pretreatment test of a photovoltaic module and a preparation method thereof.
Background
Ultraviolet rays are the general term for radiation with the wavelength of 10-400nm in electromagnetic spectrum, and can be divided into long-wave ultraviolet rays, medium-wave ultraviolet rays and short-wave ultraviolet rays according to the difference of the wavelengths of the ultraviolet rays, wherein the wavelength of the long-wave ultraviolet rays is 320-400nm, the wavelength of the medium-wave ultraviolet rays is UVB, the wavelength of the medium-wave ultraviolet rays is 280-320nm, the wavelength of the short-wave ultraviolet rays is UVC, and the wavelength of the short-wave ultraviolet rays is 200-280nm.
In the ultraviolet pretreatment test of the photovoltaic module, the metal halogen lamp is a commonly used ultraviolet pretreatment test light source of the photovoltaic module, and is suitable for stress screening due to the ultra-high ultraviolet intensity; however, the problem of light source duty ratio is always a technical problem, if the test conditions of the four types of photovoltaic cell components, namely 280-385nm, are defined as total ultraviolet, c-si, CIGS, cdTe, a-si, require that the duty ratio of UVB in the total ultraviolet is 3-10%, the test conditions of the cell components except for the four types require that the proportion of UVB in the total ultraviolet is more than or equal to 1/3, and as UVB to UVA are continuous spectrums, if duty ratio mismatch can cause the problem of stress screening distortion, the current common practice in the industry is that UVB and UVA are respectively subjected to two experiments, namely the UVB and UVA light sources respectively irradiate a sample once, and the accumulated values respectively reach the standard requirements, so that the light sources need to be switched in the test process, and the test energy consumption and the test period are prolonged.
Disclosure of Invention
In order to enable the occupation ratio of 280-320nm to 280-385nm to meet the test requirement of the photovoltaic module, the application provides an optical filter for the ultraviolet pretreatment test of the photovoltaic module and a preparation method thereof.
In a first aspect, the present application provides a filter for an ultraviolet pretreatment test of a photovoltaic module, which adopts the following technical scheme:
ultraviolet pretreatment test for photovoltaic moduleThe experimental optical filter comprises a substrate and a film layer arranged on the surface of the substrate, wherein the film layer is formed by alternately stacking materials with high refractive index and low refractive index, and has a film system structure (HL) 7 Wherein H is a high refractive index material; l is a low refractive index material and 7 is the number of times high refractive index and low refractive index materials are alternately stacked together.
Optionally, the high refractive index material is HFO 2 The low refractive index material is SiO 2 The raw materials and thickness distribution of the film layer are as follows:
the thickness error of the whole film layer is in the range of 1 nm.
By adopting the technical scheme, the initial thickness of the thickness distribution of the film layer is thinner, and the film layers are stacked together and alternately for 4 times in the middle and are all of the thickness HFO 2 =56.58 nm, thickness SiO 2 =77.05 nm, while a film layer made with a thicker final thickness helps to ensure spectral accuracy and transmittance.
Optionally, the thickness of the substrate is 2mm, and the substrate adopts high borate.
Through adopting above-mentioned technical scheme, substrate thickness can influence the shortwave light transmissivity, and this application adopts 2 mm's high borate substrate can absorb nearly 100% UVC, makes the UVC occupation ratio accord with the basic condition of photovoltaic module ultraviolet ray pretreatment test.
Optionally, a metal halogen lamp is used as a light source for a solar ultraviolet rapid aging test, and the average transmittance T of the optical filter at the wave band of 250-280nm is less than 0.1 percent (the coating film is high in transmittance and the substrate is absorbed); the mean transmittance t=92% over the wavelength band 280-385nm allows a deviation of ±3%.
By adopting the technical scheme, the metal halogen lamp is used as a solar ultraviolet rapid aging test light source, and the metal halogen lamp has low relative light energy loss and is more suitable for being used as a test light source because the ultraviolet energy of the metal halogen lamp accounts for about half of the full spectrum.
Alternatively, UV band 280-385nm is defined as 100% and UV band 280-320nm is 33.5%.
By adopting the technical scheme, the ultraviolet band 280-320nm (namely the medium-wave ultraviolet rays) accounts for 33.5 percent (namely not less than 1/3 and infinitely close to 1/3) of the ultraviolet band 280-400nm (namely the medium-wave ultraviolet rays and the long-wave ultraviolet rays), so that UVB deficiency can be prevented, UVB superscalar can be prevented, and the proportion of UVB to total ultraviolet required by test conditions of battery components except the c-si, CIGS, cdTe, a-si type can be met.
In a second aspect, the present application provides a method for preparing an optical filter for an ultraviolet pretreatment test of a photovoltaic module, which adopts the following technical scheme:
the preparation method of the optical filter for the ultraviolet pretreatment test of the photovoltaic module comprises the following steps:
heating high refractive index material and low refractive index material, plating on the surface of substrate by vacuum sputtering, controlling error of film thickness less than 1%, and vacuum degree of 3×10 -3 Pa。
By adopting the technical scheme, the filtering can be carried out on different ultraviolet wave bands by combining the coating process, the material selection and thickness adjustment of the substrate and the film layer, and different test samples can be dealt with in proportion serialization; according to the relative spectral intensity distribution of the metal halogen lamp light source, a matched filter is designed, so that the ultraviolet light passing through the filter is close to the standard value regulated by the international electrotechnical commission standard.
In summary, the present application includes at least one of the following beneficial technical effects:
1. the optical filter can filter different ultraviolet wave bands, and meets the requirements of coping with different test samples;
2. according to the relative spectral intensity distribution of the metal halogen lamp light source, a matched filter is designed, so that the ultraviolet light passing through the filter is close to the standard value regulated by the international electrotechnical commission standard;
the spectral filter with the filtering characteristic is used, the ultraviolet band 280-385nm is defined as 100%, and the ultraviolet band 280-320nm accounts for 33.5%.
Drawings
FIG. 1 is a graph of UV spectrum design for a UVB 33.5% ratio using a metal halide lamp as the test light source.
Detailed Description
The present application is described in further detail below with reference to examples.
Example 1
The optical filter for the ultraviolet pretreatment test of the photovoltaic module comprises a substrate and a film layer arranged on the surface of the substrate, wherein the film layer is formed by alternately stacking materials with high refractive index and materials with low refractive index, and the film system structure is (HL) 7 Wherein H is a high refractive index material; l is a low refractive index material, and 7 is the number of times that high refractive index and low refractive index materials are alternately stacked together;
the thickness of the substrate is 2mm, and the substrate is high borate;
the high refractive index material is HFO 2 The low refractive index material is SiO 2 The raw materials and thickness distribution of the film layer are as follows:
the thickness error of the whole film layer is in the range of 1 nm.
The preparation method of the optical filter for the ultraviolet pretreatment test of the photovoltaic module comprises the following steps:
heating high refractive index material and low refractive index material, plating on the surface of substrate by vacuum sputtering, controlling error of film thickness less than 1%, and vacuum degree of 3×10 -3 Pa, and obtaining the optical filter.
Performance test
1. The metal halogen lamp is used as a light source for the solar ultraviolet rapid aging test, and average transmittance measured in the wave bands of 250-280nm, 280-320nm and 320-385nm are tested for multiple times respectively.
The filter test results of example 1 are shown in FIG. 1.
The first graph shows that the average transmittance T of the filter at the wave band of 250-280nm is less than 0.1 percent (the coating film is high in transmittance and the substrate absorbs); the mean transmittance t=92% over the wavelength band 280-385nm allows a deviation of ±3%.
Calibration test: the spectral irradiance distribution of the ultraviolet test box is measured by an optical fiber spectrometer, the spectral irradiance data is derived, and the UVB (280-320 nm) ultraviolet integral irradiance and the (UVA+UVB) (280-385 nm) total integral irradiance are calculated by the formula: f=e UVB /E UVA +E UVB X 100% and the proportion of UVB irradiance to (uva+uvb) irradiance was calculated.
Calibration results: the proportion of UVB (280-320 nm) ultraviolet integrated irradiance to (UVA+UVB) (280-385 nm) total integrated irradiance is: 33.5%.
2. Application of optical filter to ultraviolet pretreatment test of photovoltaic module
The test results are shown in Table 1.
TABLE 1 comparison of filter characteristics and parameters defined by International electrotechnical Commission standards
As can be seen by combining example 1 and Table 1, the ultraviolet band 280-320nm (i.e., mid-wave ultraviolet) accounts for 33.5% of the ultraviolet band 280-385nm (i.e., mid-wave ultraviolet and long-wave ultraviolet) (i.e., not less than 1/3 and infinitely close to 1/3), which can prevent UVB deficiency and UVB superscalar, and can meet the ratio of UVB to total ultraviolet required by the test conditions of the battery pack except for the c-si, CIGS, cdTe, a-si category.
The foregoing are all preferred embodiments of the present application, and are not intended to limit the scope of the present application in any way, therefore: all equivalent changes in structure, shape and principle of this application should be covered in the protection scope of this application.
Claims (6)
1. The utility model provides a photovoltaic module ultraviolet ray pretreatment is light filter for test which characterized in that: comprises a substrate and a film layer arranged on the surface of the substrate, wherein the film layer is formed by alternately stacking materials with high refractive index and low refractive index, and has a film system structure (HL) 7 Wherein H is a high refractive index material; l is a low refractive index material and 7 is the number of times high refractive index and low refractive index materials are alternately stacked together.
2. The filter for ultraviolet pretreatment test of a photovoltaic module according to claim 1, wherein: the high refractive index material is HFO 2 The low refractive index material is SiO 2 The raw materials and thickness distribution of the film layer are as follows:
The thickness error of the whole film layer is in the range of 1 nm.
3. The filter for ultraviolet pretreatment test of a photovoltaic module according to claim 1, wherein: the thickness of the substrate is 2mm, and the substrate adopts high borate.
4. The filter for ultraviolet pretreatment test of a photovoltaic module according to claim 1, wherein: the metal halogen lamp is adopted as a light source for a solar ultraviolet rapid aging test, and the average transmittance T of the optical filter in the wave band of 250-280nm is less than 0.1%; the mean transmittance t=92% over the wavelength band 280-385nm allows a deviation of ±3%.
5. The filter for ultraviolet pretreatment test of a photovoltaic module according to claim 1, wherein: ultraviolet band 280-385nm is defined as 100%, and ultraviolet band 280-320nm accounts for 33.5%.
6. The preparation method of the optical filter for the ultraviolet pretreatment test of the photovoltaic module is characterized by comprising the following steps of:
heating a high refractive index material and a low refractive index materialThen plating on the surface of the substrate by vacuum sputtering, wherein the control error of the thickness of the film is less than 1%, and the vacuum degree is 3 multiplied by 10 -3 Pa。
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| Application Number | Priority Date | Filing Date | Title |
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| CN202311573720.2A CN117572553B (en) | 2023-11-23 | 2023-11-23 | Optical filter for ultraviolet pretreatment test of photovoltaic module and preparation method thereof |
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| CN202311573720.2A CN117572553B (en) | 2023-11-23 | 2023-11-23 | Optical filter for ultraviolet pretreatment test of photovoltaic module and preparation method thereof |
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| CN117572553A true CN117572553A (en) | 2024-02-20 |
| CN117572553B CN117572553B (en) | 2024-06-28 |
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| CN114846363A (en) * | 2019-12-30 | 2022-08-02 | 3M创新有限公司 | UV-C radiation protective film and method for producing same |
| CN116299820A (en) * | 2022-12-28 | 2023-06-23 | 苏州五方光电材料有限公司 | Preparation process and analysis method of optical filter for reducing spectral shift under specific angle |
-
2023
- 2023-11-23 CN CN202311573720.2A patent/CN117572553B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003161831A (en) * | 2001-11-29 | 2003-06-06 | Daishinku Corp | Ray cut filter |
| CN103513313A (en) * | 2013-09-27 | 2014-01-15 | 华侨大学 | Ultraviolet fluorescence light filter used for skin damage detection and manufacturing method thereof |
| CN105589123A (en) * | 2016-03-03 | 2016-05-18 | 舜宇光学(中山)有限公司 | Infrared and ultraviolet cutoff filtering film structure for large curvature lens surface and manufacture method thereof |
| CN114846363A (en) * | 2019-12-30 | 2022-08-02 | 3M创新有限公司 | UV-C radiation protective film and method for producing same |
| CN113050272A (en) * | 2021-03-03 | 2021-06-29 | 中国科学院上海光学精密机械研究所 | Deep ultraviolet filter and design method thereof |
| CN113802093A (en) * | 2021-09-22 | 2021-12-17 | 武汉正源高理光学有限公司 | Preparation method of high-transmittance deep ultraviolet filter |
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Effective date of registration: 20240527 Address after: Room 467, Area A, Building 2, No. 88 Deli West Road, Nanxiang Town, Jiading District, Shanghai, 2018 Applicant after: Shanghai Borui Scientific Instrument Co.,Ltd. Country or region after: China Applicant after: TIANJIN INSTITUTE OF METROLOGICAL SUPERVISION AND TESTING Address before: Room 467, Area A, Building 2, No. 88 Deli West Road, Nanxiang Town, Jiading District, Shanghai, 2018 Applicant before: Shanghai Borui Scientific Instrument Co.,Ltd. Country or region before: China |
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