CN117073714A

CN117073714A - Shafting orthogonality measuring device and measuring system

Info

Publication number: CN117073714A
Application number: CN202210532314.0A
Authority: CN
Inventors: 王国名; 崔成君; 董登峰; 石俊凯; 张滋黎; 王珊; 周维虎; 郝灿; 潘映伶
Original assignee: Institute of Microelectronics of CAS
Current assignee: Institute of Microelectronics of CAS
Priority date: 2022-05-09
Filing date: 2022-05-09
Publication date: 2023-11-17

Abstract

The invention discloses a shafting orthogonality measuring device and a shafting orthogonality measuring system, relates to the technical field of photoelectric precision measurement, and aims to solve the problems that in the prior art, a positioning reference in a contact measuring method is high in processing difficulty and cannot be rechecked after assembly, and the comprehensive measuring precision of a non-contact measuring method is insufficient. The shafting orthogonality measurement device comprises: the device comprises an auto-collimation light path component, a focusing micrometer light path component, an auxiliary imaging component and a reflecting part which is detachably connected with a two-dimensional rotating shaft system device. The auxiliary imaging component is positioned on one side of the reflecting part, which is away from the two-dimensional rotating shaft system device, and the optical axis of the auxiliary imaging component is coaxial with the optical axis of the reflecting part. The auto-collimation light path component and the focusing micro-light path component are positioned on one side, deviating from the reflecting part, of the auxiliary imaging component, and the optical axis of the focusing micro-light path component and the optical axis of the auto-collimation light path component are perpendicular to the optical axis of the auxiliary imaging component. The shafting orthogonality measuring system comprises the shafting orthogonality measuring device.

Description

Shafting orthogonality measuring device and measuring system

Technical Field

The invention relates to the technical field of photoelectric precision measurement, in particular to a shafting orthogonality measuring device and a measuring system.

Background

The laser tracker is a typical quadrature axis precise measuring instrument, and the two-dimensional precise laser tracking turntable is a core angle measuring unit of the laser tracker. The orthogonality precision of the two-dimensional precise rotating shaft system directly influences the coordinate measurement precision of the instrument, so that the orthogonality precise measurement of the precise shaft system is an effective method for improving the two-dimensional laser tracking turntable, and meanwhile, the processing and adjustment difficulties of the orthogonal shaft system are reduced, and the production efficiency, the reliability and the later maintenance of the instrument are improved.

At present, the measurement method of the orthogonality of the two-dimensional rotation axis is mainly divided into contact measurement and non-contact measurement. The contact measurement needs a positioning reference with extremely high machining precision, increases the difficulty of part machining, is only suitable for an assembly stage, and is difficult to recheck after assembly is completed. The non-contact measurement needs to use various measuring instruments, the measuring steps are complex, the jumping precision of the optical axis is difficult to guarantee, and the problems of low target aiming precision and insufficient comprehensive measuring precision exist.

Disclosure of Invention

The invention aims to provide a shafting orthogonality measuring device and a shafting orthogonality measuring system, which are used for solving the problems that in the prior art, the processing difficulty of a positioning reference in a contact measuring method is high, the recheck after assembly is impossible, and the comprehensive measuring precision of a non-contact measuring method is insufficient.

In order to achieve the above object, the present invention provides the following technical solutions:

in a first aspect, the present invention provides an axis orthogonality measurement device for measuring orthogonality of a two-dimensional rotational axis device. Comprising the following steps: the device comprises an auto-collimation light path component, a focusing micrometer light path component, an auxiliary imaging component and a reflecting part which is detachably connected with a two-dimensional rotating shaft system device.

The auxiliary imaging component is positioned on one side of the reflecting part, which is away from the two-dimensional rotating shaft system device, and the optical axis of the auxiliary imaging component is coaxial with the optical axis of the reflecting part. The auto-collimation light path component and the focusing micro-light path component are positioned on one side, deviating from the reflecting part, of the auxiliary imaging component, and the optical axis of the focusing micro-light path component and the optical axis of the auto-collimation light path component are perpendicular to the optical axis of the auxiliary imaging component. The auxiliary imaging component and the auto-collimation light path component form an auto-collimation light path, and the auxiliary imaging component and the focusing micro-measurement light path component form a focusing micro-measurement light path.

The auxiliary imaging component is also used for converging the second light beam to obtain a third light beam, and emitting the third light beam to the auto-collimation light path component and the focusing micrometer light path component, and the third light beam is imaged on the auto-collimation light path component;

The reflection part is also used for emitting a fourth light beam to the auxiliary imaging component, the auxiliary imaging component is used for obtaining a fifth light beam after converging the fourth light beam, the fifth light beam is emitted to the focusing micro-optical path component, and the focusing micro-optical path component is used for imaging after sequentially carrying out refraction and convergence on the fifth light beam.

Compared with the prior art, in the shafting orthogonality measuring device provided by the invention, the auxiliary imaging component is positioned at one side of the reflecting part, which is away from the two-dimensional rotating shafting device, and the optical axis of the auxiliary imaging component is coaxial with the optical axis of the reflecting part. The auto-collimation light path component and the focusing micro-light path component are positioned on one side, deviating from the reflecting part, of the auxiliary imaging component, the optical axis of the focusing micro-light path component and the optical axis of the auto-collimation light path component are perpendicular to the optical axis of the auxiliary imaging component, and the auxiliary imaging component is positioned in the auto-collimation light path and the focusing micro-light path simultaneously. Based on the above, the propagation path of the light beam emitted by the auto-collimation light path component is coaxial with the propagation path of the light beam received by the auto-collimation light path component and the propagation path of the light beam received by the focusing micrometer light path component, so that a unified coordinate system is established according to the light path of the receiving and transmitting coaxial by utilizing the characteristic that the light propagates along a straight line, and the measurement precision is improved.

When the two-dimensional rotation axis system device is measured by the axis system orthogonality measuring device, the auto-collimation light path component emits a first light beam to the auxiliary imaging component, the first light beam becomes a second light beam after being diverged by the auxiliary imaging component, the second light beam is emitted to the reflecting part by the auxiliary imaging component, the reflecting part reflects the second light beam to the auxiliary imaging component, the second light beam becomes a third light beam after being converged by the auxiliary imaging component, the third light beam is emitted to the auto-collimation light path component by the auxiliary imaging component, and finally the third light beam is imaged on the auto-collimation light path component. The reflection part emits a fourth light beam to the auxiliary imaging component, the fourth light beam becomes a fifth light beam after being converged by the auxiliary imaging component, and after the focusing micrometer optical path component receives the fifth light beam, the fifth light beam is sequentially refracted and converged, and finally the fourth light beam is imaged on the focusing micrometer optical path component. Finally, according to the image information imaged on the auto-collimation light path component, the two-dimensional angle error of the two-dimensional rotation measuring device can be obtained, and according to the image information imaged on the focusing micrometer light path component, the two-dimensional linear displacement error can be obtained, so that the orthogonality measurement of the two-dimensional rotation axis system device is realized. Based on the above, the shafting orthogonality measuring device provided by the invention can realize simultaneous measurement of a plurality of parameters under the same instrument and the same coordinate system, thereby avoiding the processes of replacing the instrument and transforming the coordinate system when measuring a plurality of single parameters, reducing the error of the uncontrollable process, and further improving the measurement accuracy.

In addition, the shafting orthogonality measuring device provided by the invention can establish a standard orthogonality coordinate system by utilizing the characteristic that light propagates along a straight line and adjusting the auto-collimation light path component, the focusing micrometer light path component, the auxiliary imaging component and the reflecting part, and can be used as a positioning reference for measuring the deviation angle and the deviation displacement of the two-dimensional rotation shafting device, so that the positioning reference with extremely high processing precision is not needed. And can directly carry out recheck to the two-dimensional rotation shafting device that has assembled, need not to add additional mechanical inspection stick or auxiliary fixtures such as axle extension rod and carry out indirect measurement, not only avoid introducing new error, can also improve efficiency of software testing.

Therefore, the shafting orthogonality measuring device provided by the invention can solve the problems that the processing difficulty of the positioning reference in the contact type measuring method is high, the recheck after assembly is impossible, and the comprehensive measuring precision of the non-contact type measuring method is insufficient in the prior art.

In a second aspect, the present invention also provides a system for measuring the orthogonality of a two-dimensional rotating shaft system, comprising a control device and at least one shaft system orthogonality measuring device according to the first aspect.

The composite target of the shafting orthogonality measuring device is fixedly connected with the rotating shaft of the two-dimensional rotating shafting device.

The control device is electrically connected with at least one shafting orthogonality measuring device and the two-dimensional rotating shafting device respectively.

In the measuring process, the control device is used for controlling the rotation of the rotating shaft of the two-dimensional rotating shaft system device, and acquiring the deviation angle and the deviation displacement of the rotating shaft relative to the optical axis of the shaft system orthogonality measuring device when the normal line of the composite target and the rotating shaft meet the preset conditions with the optical axis of the shaft system orthogonality measuring device.

The control device is also used for determining the orthogonality of the two-dimensional rotation axis device according to the deviation angle and the deviation displacement.

Compared with the prior art, the shafting orthogonality measuring system has the advantages that the shafting orthogonality measuring device has the same advantages as those of the shafting orthogonality measuring device in the technical scheme, and the shafting orthogonality measuring system is not repeated here.

Drawings

The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the invention and do not constitute a limitation on the invention. In the drawings:

FIG. 1 is a schematic diagram of an apparatus for measuring shafting orthogonality according to an embodiment of the present invention;

FIG. 2 is a schematic view of a reflective portion according to an embodiment of the present invention;

FIG. 3 is a schematic measurement diagram of a single-station shafting orthogonality measurement system according to an embodiment of the present invention;

FIG. 4 is a schematic diagram of verticality calibration of a dual-station shafting orthogonality measurement system according to an embodiment of the present invention;

FIG. 5 is a schematic diagram of the cross calibration of the dual-station shafting orthogonality measurement system according to an embodiment of the present invention;

FIG. 6 is a schematic measurement diagram of a dual-station shafting orthogonality measurement system according to an embodiment of the present invention;

fig. 7 is a schematic structural diagram of a control device according to an embodiment of the present invention.

Reference numerals:

a 1-axis orthogonality measuring device, an 11-auto-collimation light path component,

12-focusing micrometer optical path component, 13-auxiliary imaging component,

14-reflecting portion, 111-first optical path structure,

1111-first light source, 1112-first reticle,

1113, collimator, 112, first beam splitter,

113-first imaging structures, 1131-compensation mirrors,

1132-a first charge coupled detector, 121-a second beam splitter,

122-a second imaging structure, 1221-a converging lens,

1222-a third beam splitter, 1223-a second charge coupled detector,

123-image plane movement adjustment structure, 124-second light source,

125-second reticle, 141-third reticle,

142-frosted glass, 143-a third light source,

144-a base, 2-a two-dimensional rotating shaft system device,

21-transverse axis, 22-vertical axis,

15-a first composite target, 16-a second composite target,

31-first axis orthogonality measuring device, 32-second axis orthogonality measuring device,

4-high precision cube mirrors, 5-right angle reflecting prisms,

17-third composite target, 18-fourth composite target.

Detailed Description

In order to clearly describe the technical solution of the embodiments of the present invention, in the embodiments of the present invention, the words "first", "second", etc. are used to distinguish the same item or similar items having substantially the same function and effect. For example, the first threshold and the second threshold are merely for distinguishing between different thresholds, and are not limited in order. It will be appreciated by those of skill in the art that the words "first," "second," and the like do not limit the amount and order of execution, and that the words "first," "second," and the like do not necessarily differ.

In the present invention, the words "exemplary" or "such as" are used to mean serving as an example, instance, or illustration. Any embodiment or design described herein as "exemplary" or "for example" should not be construed as preferred or advantageous over other embodiments or designs. Rather, the use of words such as "exemplary" or "such as" is intended to present related concepts in a concrete fashion.

In the present invention, "at least one" means one or more, and "a plurality" means two or more. "and/or", describes an association relationship of an association object, and indicates that there may be three relationships, for example, a and/or B, and may indicate: a alone, a and B together, and B alone, wherein a, B may be singular or plural. The character "/" generally indicates that the context-dependent object is an "or" relationship. "at least one of" or the like means any combination of these items, including any combination of single item(s) or plural items(s). For example, at least one (one) of a, b or c may represent: a, b, c, a and b, a and c, b and c, or a, b and c, wherein a, b, c can be single or multiple.

At present, the measurement method of the orthogonality of the two-dimensional rotation axis is mainly divided into two types of contact measurement and non-contact measurement.

For example, the document "influence of orthogonality on measurement accuracy of a high-accuracy two-dimensional turntable" refers to using a contact three-coordinate measuring machine to perform shafting orthogonality measurement, and in the monograph "detection and test technique of inertial navigation test equipment" it is proposed to perform orthogonality measurement by using a beat meter method, that is, using a dial indicator to perform measurement with a reference plane, and the patent "a method and device for measuring orthogonality of a rotation shafting" (201510462936.0) proposes to perform orthogonality measurement by using a dial indicator to perform measurement with a standard sphere. All three methods are contact measurements.

For another example, patent "a laser measurement method of land protection monitoring turntable shafting orthogonality" (201811508567.4) proposes a shafting orthogonality measurement method based on an autocollimator and a laser theodolite, and patent "a detection system and method of precise shafting orthogonality" proposes a shafting orthogonality measurement method based on a focusing autocollimator and a four-dimensional adjustable reticle in a television. The two methods belong to non-contact measurement methods.

However, the existing shafting orthogonality measuring method has certain defects. For the contact type measuring method, although the three-coordinate measuring machine and the dial indicator are high in measuring precision, the measuring method needs a positioning reference with extremely high machining precision, and the difficulty of part machining is increased. The method is only suitable for the assembly stage, is difficult to carry out recheck directly after machining and assembly are finished, and also needs to carry out indirect measurement through auxiliary tools such as a mechanical check rod or a shaft extension rod, and the machining error and the assembly error of the auxiliary tools also form new introduced errors, so that the measurement accuracy is influenced, the measurement efficiency is limited due to the complicated and precise assembly and adjustment requirements, and the requirement of mass production cannot be met.

For a non-contact measurement method, the orthogonality measurement method based on an autocollimator and a laser theodolite has low precision, and the measurement steps are complex by using various instruments. The method for measuring the shafting orthogonality based on the television inner focusing autocollimator and the four-dimensional adjustable reticle is feasible, but the method uses an inner focusing mode, so that the optical axis runout precision is difficult to guarantee, and meanwhile, the target aiming precision is not high, so that the method is not high in comprehensive measurement precision.

The embodiment of the invention aims to provide a shafting orthogonality measuring device and a shafting orthogonality measuring system, which are used for solving the problems that in the prior art, the machining difficulty of a contact measuring method is high, the recheck after assembly is impossible, and the comprehensive measuring precision of a non-contact measuring method is insufficient.

In a first aspect, as shown in fig. 1, an embodiment of the present invention provides an axis orthogonality measuring device 1 for measuring orthogonality of a two-dimensional rotation axis device 2. Comprising the following steps: an auto-collimation optical path component 11, a focusing micrometer optical path component 12, an auxiliary imaging component 13 and a reflecting part 14 which is detachably connected with the two-dimensional rotation axis system device 2.

The auxiliary imaging assembly 13 is located on the side of the reflecting portion 14 facing away from the two-dimensional rotation axis system 2, and the optical axis of the auxiliary imaging assembly 13 is coaxial with the optical axis of the reflecting portion 14. The auto-collimation optical path component 11 and the focusing micro-optical path component 12 are positioned on one side of the auxiliary imaging component 13, which is away from the reflecting part 14, and the optical axis of the focusing micro-optical path component 12 and the optical axis of the auto-collimation optical path component 11 are mutually perpendicular to the optical axis of the auxiliary imaging component 13. The auxiliary imaging component 13 and the auto-collimation light path component 11 form an auto-collimation light path, and the auxiliary imaging component 13 and the focusing micrometer light path component 12 form a focusing micrometer light path.

The auto-collimation optical path component 11 is used for emitting a first light beam to the auxiliary imaging component 13, the auxiliary imaging component 13 is used for carrying out collimation treatment on the first light beam to obtain a second light beam, the second light beam is emitted to the reflecting part 14, the reflecting part 14 is used for reflecting the second light beam to the auxiliary imaging component 13, the auxiliary imaging component 13 is also used for converging the second light beam to obtain a third light beam, the third light beam is emitted to the auto-collimation optical path component 11 and the focusing micrometer optical path component 12, and the third light beam is imaged on the auto-collimation optical path component 11;

the reflecting portion 14 is further configured to emit a fourth light beam to the auxiliary imaging component 13, where the auxiliary imaging component 13 is configured to converge the fourth light beam to obtain a fifth light beam, and emit the fifth light beam to the focusing micro optical path component 12, and the focusing micro optical path component 12 is configured to sequentially perform refraction and convergence on the fifth light beam, and then perform imaging.

The specific implementation method comprises the following steps: before the shafting orthogonality measuring device 1 provided by the embodiment of the invention is used for measuring the two-dimensional rotation shafting device 2, the reflecting part 14 needs to be fixedly connected with the rotation shaft of the two-dimensional rotation shafting device 2. In order to improve the accuracy of measurement, more errors are avoided in the process of measurement, the shafting orthogonality measurement device 1 needs to be adjusted according to the optical paths of the light beams emitted by the auto-collimation optical path component 11 and the image plane positions of the light beams finally imaged on the auto-collimation optical path component 11 and the focusing micrometer optical path component 12, so that the optical axis of the auxiliary imaging component 13 is coaxial with the optical axis of the reflecting part 14, the optical axis of the focusing micrometer optical path component 12 and the optical axis of the auto-collimation optical path component 11 are mutually perpendicular to the optical axis of the auxiliary imaging component 13, so that the propagation paths of the light beams emitted by the auto-collimation optical path component 11 are coaxial with the propagation paths of the light beams received by the auto-collimation optical path component 11 and the propagation paths of the light beams received by the focusing micrometer optical path component 12, and a unified coordinate system is established by utilizing the optical paths of the receiving and transmitting axes, thereby realizing high-accuracy measurement.

The auto-collimation optical path component 11 emits a first light beam to the auxiliary imaging component 13, the first light beam becomes a second light beam after being diverged by the auxiliary imaging component 13, the second light beam is emitted to the reflecting part 14 by the auxiliary imaging component 13, the reflecting part 14 reflects the second light beam to the auxiliary imaging component 13, the second light beam becomes a third light beam after being converged by the auxiliary imaging component 13, the third light beam is emitted to the auto-collimation optical path component 11 by the auxiliary imaging component 13, and finally the third light beam is imaged on the auto-collimation optical path component 11.

The reflection part 14 emits a fourth light beam to the auxiliary imaging component 13, the auxiliary imaging component 13 converges the fourth light beam to obtain a fifth light beam, the fifth light beam is emitted to the focusing micrometer optical path component 12, and the fifth light beam is imaged on the focusing micrometer optical path component 12 after being refracted and converged by the focusing micrometer optical path component 12 in sequence.

Finally, according to the image information imaged on the auto-collimation light path component 11, a two-dimensional angle error of the two-dimensional rotation measuring device can be obtained, and according to the image information imaged on the focusing micrometer light path component 12, a two-dimensional linear displacement error can be obtained, so that orthogonality measurement of the two-dimensional rotation axis system device 2 is realized.

As can be seen from the above-mentioned structure and implementation of the shafting orthogonality measurement device 1, the auxiliary imaging component 13 is located on the side of the reflecting portion 14 facing away from the two-dimensional rotation shafting device 2, and the optical axis of the auxiliary imaging component 13 is coaxial with the optical axis of the reflecting portion 14. The auto-collimation optical path component 11 and the focusing micro-optical path component 12 are positioned on one side of the auxiliary imaging component 13, which is away from the reflecting part 14, the optical axis of the focusing micro-optical path component 12 and the optical axis of the auto-collimation optical path component 11 are mutually perpendicular to the optical axis of the auxiliary imaging component 13, and the auxiliary imaging component 13 is positioned in the auto-collimation optical path and the focusing micro-optical path simultaneously. Based on this, the propagation path of the light beam emitted from the auto-collimation optical path component 11 and the propagation path of the light beam received by the focusing micrometer optical path component 12 can be made coaxial, so that a unified coordinate system is established according to the optical path of the receiving and transmitting coaxial by utilizing the characteristic that the light propagates along a straight line, so as to improve the measurement accuracy.

When the two-dimensional rotation axis system device 2 is measured by the axis system orthogonality measuring device 1, the auto-collimation optical path component 11 emits a first light beam to the auxiliary imaging component 13, the first light beam becomes a second light beam after being diverged by the auxiliary imaging component 13, the second light beam is emitted to the reflecting part 14 by the auxiliary imaging component 13, the reflecting part 14 reflects the second light beam to the auxiliary imaging component 13, the second light beam becomes a third light beam after being converged by the auxiliary imaging component 13, the third light beam is emitted to the auto-collimation optical path component 11 by the auxiliary imaging component 13, and finally the third light beam is imaged on the auto-collimation optical path component 11. The reflection part 14 emits a fourth light beam to the auxiliary imaging component 13, the fourth light beam becomes a fifth light beam after being converged by the auxiliary imaging component 13, and after the focusing micrometer optical path component 12 receives the fifth light beam, the fifth light beam is sequentially refracted and converged, and finally the image is formed on the focusing micrometer optical path component 12. Finally, according to the image information imaged on the auto-collimation light path component 11, a two-dimensional angle error of the two-dimensional rotation measuring device can be obtained, and according to the image information imaged on the focusing micrometer light path component 12, a two-dimensional linear displacement error can be obtained, so that orthogonality measurement of the two-dimensional rotation axis system device 2 is realized. Based on this, the shafting orthogonality measuring device 1 provided by the embodiment of the invention can realize simultaneous measurement of a plurality of parameters under the same instrument and the same coordinate system, thereby avoiding the processes of replacing the instrument and transforming the coordinate system when measuring a plurality of single parameters, reducing the error of the uncontrollable process, and further improving the measurement accuracy.

In addition, the shafting orthogonality measuring device 1 provided by the embodiment of the invention can establish a standard orthogonality coordinate system by utilizing the characteristic that light propagates along a straight line and adjusting the auto-collimation light path component 11, the focusing micrometer light path component 12, the auxiliary imaging component 13 and the reflecting part 14, and can be used as a positioning reference for measuring the deviation angle and the deviation displacement of the two-dimensional rotation shafting device 2, so that a positioning reference with extremely high processing precision is not needed. And can directly carry out recheck to the two-dimensional rotation shafting device 2 that has assembled, need not to add additional mechanical inspection stick or auxiliary fixtures such as axle extension pole and carry out indirect measurement, not only avoid introducing new error, can also improve efficiency of software testing.

Therefore, the shafting orthogonality measuring device 1 provided by the embodiment of the invention can solve the problems that the processing difficulty of the positioning reference in the contact measuring method in the prior art is high, the recheck after assembly is not possible, and the comprehensive measuring precision of the non-contact measuring method is insufficient.

In the above embodiments, the auxiliary imaging assembly 13 may be a telescopic objective, in particular a refractive telescopic objective. It will be appreciated that the refractive telescopic objective may be a dual glue objective, a dual split objective, a triple split objective or a tele objective. For example, when the refractive telescopic objective is a bifocal objective, the telescopic objective is composed of a positive lens and a negative lens cemented; when the refractive telescopic objective is a double-split objective, the telescopic objective consists of a positive lens and a negative lens, and an air gap is arranged between the two lenses. The embodiment of the present invention is not particularly limited thereto.

Referring to fig. 1, in one possible implementation, the auto-collimation optical path component 11 includes a first optical path structure 111, a first beam splitter 112, and a first imaging structure 113.

The first beam splitter 112 is located on the light emitting side of the first light path structure 111, and the optical axis of the first light path structure 111 is coaxial with the center line of the first beam splitter 112 in the first direction. The first imaging structure 113 is located at a side of the first beam splitter 112 away from the focusing micrometer optical path component 12, and an optical axis of the first imaging structure 113 is coaxial with a center line of the first beam splitter 112 in the second direction.

The optical axis of the first optical path structure 111 is perpendicular to the optical axis of the first imaging structure 113, and the center of the first beam splitter 112 is located at the intersection point of the optical axis of the first optical path structure 111 and the optical axis of the first imaging structure 113.

The first light path structure 111 is used for emitting a first light beam to the first beam splitter 112. The first beam splitter 112 is used for refracting the first light beam and outputting the first light beam to the auxiliary imaging component 13. The auxiliary imaging component 13 is configured to perform collimation processing on the first light beam to obtain a second light beam, and output the second light beam to the reflecting portion 14, the reflecting portion 14 is configured to reflect the second light beam, and then enter the auxiliary imaging component 13, the auxiliary imaging component 13 is further configured to perform convergence processing on the second light beam to obtain a third light beam, and output the third light beam to the first beam splitter 112, and the first beam splitter 112 is configured to converge the third light beam and output the third light beam to the first imaging structure 113 for imaging.

Specifically, the first beam splitter 112 may be a first beam splitter prism. The first light-splitting prism is located on the light-emitting side of the first light-path structure 111, and a center line of the first light-splitting prism in the first direction is coaxial with the optical axis of the first light-path structure 111. The first imaging structure 113 is located on a side of the first beam splitter prism facing away from the focusing micrometer optical path component 12, and an optical axis of the first imaging structure 113 is coaxial with a center line of the first beam splitter prism in the second direction. In the drawings, a first direction of the first light-splitting prism means a vertical direction, and a second direction of the first light-splitting prism means a horizontal direction perpendicular to the vertical direction.

In particular, the first light path structure 111 outputs the first light beam to the first beam splitter prism, and the first beam splitter prism refracts the first light beam to change the propagation direction of the first light beam and outputs the first light beam to the telescopic objective lens. The telescopic objective receives the refracted first light beam, and collimates the first light beam to obtain a parallel second light beam. The second light beam is emitted from the telescopic objective lens to the reflecting portion 14, reflected by the reflecting portion 14, and returns in the original propagation direction, enters the telescopic objective lens, and is converged by the telescopic objective lens to obtain a third light beam. The third light beam is emitted to the first beam splitter prism, and after the first beam splitter prism converges the third light beam, the third light beam is emitted to the first imaging structure 113, and finally imaging is performed on the first imaging structure 113.

As shown in fig. 1, in some embodiments, the first light path structure 111 includes a first light source 1111, a first reticle 1112, and a collimator lens 1113 arranged in this order. The optical axis of the first light source 1111, the optical axis of the first reticle 1112, and the optical axis of the collimator lens 1113 are all coaxial with the center line of the first direction of the first beam splitter 112. The first light source 1111 is configured to provide a divergent light beam to the first reticle 1112, where the divergent light beam passes through the first reticle 1112 to form a first light beam, and the first light beam exits to the collimator 1113, and the collimator 1113 is configured to collimate the first light beam and then exit the first light beam to the first beam splitter 112.

The first imaging structure 113 includes a compensation mirror 1131 and a first charge coupled detector 1132. The compensation mirror 1131 is located between the first charge coupled detector 1132 and the first beam splitter 112, and both the optical axis of the first charge coupled detector 1132 and the optical axis of the compensation mirror 1131 are coaxial with the center line of the first beam splitter 112 in the second direction. The compensation mirror 1131 is used for compensating the third light beam, and outputting the compensated third light beam to the first charge coupled detector 1132 for imaging.

In particular, the first light source 1111 illuminates the first reticle 1112, the light transmitted through the cross hair on the first reticle 1112 is a first light beam, the first light beam is emitted to the collimator 113, and the collimator 1113 collimates the first light beam and then emits the collimated first light beam to the first light splitting prism. The first beam splitter prism refracts the first light beam, changes the propagation direction of the first light beam and outputs the first light beam to the telescope objective lens. The telescopic objective receives the refracted first light beam, and collimates the first light beam to obtain a parallel second light beam. The second light beam is emitted from the telescopic objective lens to the reflecting portion 14, reflected by the reflecting portion 14, returns in the original propagation direction, enters the telescopic objective lens again, and is converged by the telescopic objective lens to obtain a third light beam. The third light beam is emitted to the first beam splitter prism, the first beam splitter prism converges the third light beam, the third light beam is emitted to the compensating mirror 1131, the third light beam compensated by the compensating mirror 1131 is emitted to the first charge coupled detector 1132, and finally the image is formed on the first charge coupled detector 1132.

It is understood that in the above embodiments, the first light source 1111 may be an artificial light source such as an LED lamp, a halogen lamp, or an incandescent lamp. The first reticle 1112 is a dark-field bright-line cross reticle, after the first light source 1111 illuminates the first reticle 1112, the light beam passing through the cross hair on the first reticle 1112 is a first light beam, and the cross hair on the first reticle 1112 is finally projected onto the first charge coupled detector 1132 along the propagation direction of the light beam, that is, the image plane on the first charge coupled detector 1132 is the image plane of the cross hair on the first reticle 1112. The charge coupled detector is capable of converting the light image into an electronic signal. In actual measurement, the first charge coupled detector 1132 can convert the imaged image plane image into charges and output the charges to other electronic devices.

As can be seen from the structure and the operation of the auto-collimation optical path assembly 11 in the foregoing embodiment, the bright light emitted by the first light source 1111 in the auto-collimation optical path assembly 11 forms a first light beam after passing through the first reticle 1112, the first light beam is refracted by the first light splitting prism, and the optical axis of the refracted first light beam is coaxial with the optical axis of the third light beam that is finally imaged on the first charge coupled detector 1132, that is, the emergent optical path coincides with the reflected optical path, so as to form the auto-collimation optical path.

As shown in fig. 1, in one possible implementation, the focusing micro-optical path assembly 12 includes a second beam splitter 121, a second imaging structure 122, and an image plane movement adjustment structure 123.

The second beam splitter 121 is fixedly connected with the first beam splitter 112 in the auto-collimation optical path component 11, and a center line of the second beam splitter 121 in the second direction is coaxial with the optical axis of the auxiliary imaging component 13.

The second imaging structure 122 is located on the light emitting side of the second beam splitter 121, and the optical axis of the second imaging structure 122 is coaxial with the center line of the second beam splitter 121 in the first direction.

The second beam splitter 121 is used for refracting the fifth light beam to the second imaging structure 122. The second imaging structure 122 is for imaging in accordance with the fifth light beam.

The image plane movement adjusting structure 123 is used for carrying the second imaging structure 122, and adjusting the distance between the second imaging structure 122 and the second beam splitter 121 when the resolution of the image imaged on the second imaging structure 122 does not meet the target parameter.

Specifically, the second beam splitter 121 may be a second beam splitter prism. The second beam splitter prism is fixedly connected with the first beam splitter prism in the auto-collimation light path component 11, and the center line of the second beam splitter prism in the second direction is coaxial with the optical axis of the telescope objective lens. And the optical axis of the second imaging structure 122 is coaxial with the center line of the second beam splitter prism in the first direction. In the drawings, a first direction of the second light-splitting prism means a vertical direction, and a second direction of the second light-splitting prism means a horizontal direction perpendicular to the vertical direction.

In particular, the second beam splitter prism refracts the fifth light beam converged by the telescopic objective lens, so as to change the propagation direction of the fifth light beam, so that the fifth light beam is emitted to the second imaging structure 122, and finally, the second imaging structure 122 is imaged. Meanwhile, the second imaging structure 122 is located on the image plane movement adjusting structure 123, and when the resolution of the image formed on the second imaging structure 122 does not conform to the target parameter, the image plane movement adjusting structure 123 may move along the direction of the optical axis of the second imaging structure 122 to change the resolution of the image plane formed on the second imaging structure 122 by changing the distance between the second imaging structure 122 and the second light splitting prism.

In practical applications, the focusing and micro-optical path component 12 adopts a design method of fixed focus and image adjustment, that is, under the condition of focal length determination, an image distance is changed by moving an image plane adjusting structure, and finally, the moving distance of the object plane is calculated by utilizing an optical imaging formula.

Under the condition of adopting the technical scheme, on one hand, the influence on the measurement precision of the auto-collimation light path component 11 when focusing is carried out on the auto-collimation Jiao Cewei light path component 12 can be avoided, the influence on the auto-collimation light path component 11 is avoided, on the other hand, the focusing distance is not changed in the focusing process, the influence on the measurement optical axis is avoided, the error in focusing measurement is reduced, and finally the measurement precision is improved.

As shown in fig. 1, in some embodiments, the second imaging structure 122 includes a converging lens 1221, a third beam splitter 1222, and a second charge coupled detector 1223 arranged in sequence.

The optical axis of the converging lens 1221, the optical axis of the third beam splitter 1222, and the optical axis of the second charge coupled detector 1223 are all coaxial with the center line of the second beam splitter 121 in the second direction.

The converging lens 1221 is configured to converge the fifth light beam refracted by the second beam splitter 121, and output the converged fifth light beam to the third beam splitter 1222, where the third beam splitter 1222 is configured to transmit the fifth light beam to the second charge coupled detector 1223 for imaging.

The image plane movement adjusting structure 123 includes an electric displacement guide rail, and a driver electrically connected to the electric displacement guide rail. The driver is configured to drive the motorized displacement rail to move when the resolution of the image imaged on the second charge coupled detector 1223 does not meet the target parameter.

The third beam splitter 1222 in the above embodiment is specifically a beam splitter, which is a coated glass. One or more thin films are coated on the surface of the optical glass, and when one beam of light is projected onto the coated glass, the beam of light is split into two or more beams by reflection and refraction.

In specific implementation, the second beam splitter prism refracts the fifth light beam converged by the telescopic objective lens, so as to change the propagation direction of the fifth light beam, so that the fifth light beam is emitted to the converging lens 1221, the converging lens 1221 converges the fifth light beam refracted by the second beam splitter prism, and emits the converged fifth light beam to the spectroscope, and the spectroscope refracts the fifth light beam to the second charge coupled detector 1223, and finally forms an image on the second charge coupled detector 1223. Meanwhile, the second charge coupled detector 1223 is further located on the electric displacement rail, and when the resolution of the image formed on the second charge coupled detector 1223 does not conform to the target parameter, a driver electrically connected to the electric displacement rail drives the electric displacement rail to move along the direction of the optical axis of the second charge coupled detector 1223, so as to change the resolution of the image plane formed on the second charge coupled detector 1223 by changing the distance between the second charge coupled detector 1223 and the second light splitting prism, thereby precisely positioning the clear image plane.

In practical application, the electric displacement guide rail is a precision displacement table, and the driver is a motor capable of sending pulse signals. At this time, the motor transmits a pulse signal to the precision displacement stage, thereby driving the movement of the precision displacement stage, and finally determining the movement distance of the precision displacement stage according to the number of times of transmission of the pulse signal. Alternatively, the moving distance of the precision displacement stage may be directly measured by a grating sensor. Based on this, the image plane movement adjusting structure 123 adopts an automatic precise image adjusting method, the image plane positioning accuracy is high, and the movement distance of the object plane can be calculated according to the optical imaging formula through the precise distance of the image plane movement under the condition of determining the focal length, so that the offset displacement of the two-dimensional rotation axis orthogonal device can be measured.

As shown in fig. 1, in some embodiments, focusing micrometer optical path assembly 12 further includes a second light source 124 and a second reticle 125. The second light source 124 and the second dividing plate 125 are fixedly connected with the image plane movement adjusting structure 123. The optical axis of the second light source 124 is coaxial with the optical axis of the second dividing plate 125 and is parallel to the center line of the second beam splitter 121 in the second direction.

During the debugging process, the second light source 124 is used for providing the divergent light beam to the second dividing plate 125, and the divergent light beam forms a sixth light beam after passing through the second dividing plate 125 and exits to the second imaging structure 122, and the second imaging structure 122 is further used for imaging according to the sixth light beam.

In practical applications, the focusing micro light path assembly 12 may be provided with a second light source 124 and a second dividing plate 125, where the optical axis of the second light source 124 is coaxial with the optical axis of the second dividing plate 125 and parallel to the center line of the second direction of the second beam splitter prism. As shown in the drawing, the optical axis of the second light source 124 and the optical axis of the second light splitting plate are parallel to the center line of the second light splitting prism in the horizontal direction.

During debugging, the second light source 124 is used for illuminating the second reticle 125, the light beam transmitted through the cross hair on the second reticle 125 is the sixth light beam, the second reticle 125 emits the sixth light beam to the spectroscope and the second charge coupled detector 1223, and the cross hair on the second reticle 125 is imaged on the second charge coupled detector 1223.

It will be appreciated that before the second light source 124 and the second reticle 125 are fixed on the image plane movement adjustment structure 123, the relative distance between the second light source 124 and the second reticle 125 and the second imaging structure 122 needs to be adjusted according to the image plane position of the cross wire on the second reticle 125 imaged on the second charge coupled detector 1223, so that the center of the image plane formed by the cross wire is located at the center of the second charge coupled detector 1223.

Through the structure and the working process of the focusing micro light path component 12 in the above embodiment, it can be known that the light paths of the fourth light beam, the second light beam and the third light beam overlap, the fifth light beam received by the focusing micro light path component 12 and the third light beam received by the auto-collimation light path component 11 are perpendicular to each other, that is, the focusing micro light path component 12 and the auto-collimation light path component 11 achieve high-precision mutual calibration of the respective light paths, and a unified measurement coordinate system can be established.

Under the condition of adopting the technical scheme, namely, the auto-collimation light path component 11 and the focusing micrometer light path component 12 are respectively provided with independent projection light sources, the two can provide a reference for the mutual standard of optical axes, and the accuracy and the efficiency of the equipment adjustment of the light paths are improved. Meanwhile, the focusing micro-optical path component 12 can project a bright cross image with high straightness, and can also provide a calibration reference for the optical axis of an optical system of other instruments.

In one possible implementation, as shown in fig. 2, the reflective portion 14 is a composite target. The composite target comprises a third reticle 141, a third light source 143 and a base 144, and the third reticle 141, the third light source 143 and the base 144 are sequentially and fixedly connected; or, the composite target includes a third reticle 141, ground glass 142, a third light source 143, and a base 144, and the third reticle 141, ground glass 142, third light source 143, and base 144 are sequentially and fixedly connected.

Illustratively, the composite target includes a third reticle 141, a third light source 143, and a base 144 fixedly connected in sequence. The third reticle 141 is a dark field cross reticle, and a reflective film layer is further plated on the surface of the reticle, so that the surface has a higher reflectivity and can be used as a measurement target of the auto-collimation optical path component 11. The third light source 143 is combined with the third reticle 141, the third light source 143 illuminates the third reticle 141, the light beam transmitted through the cross wire on the third reticle 141 is the fourth light beam, the fourth light beam becomes the fifth light beam after being converged by the telescope objective lens, and the bright cross target is transmitted to the second charge coupled detector 1223 in the focusing and micro optical path assembly 12 as the measurement target of the focusing and micro optical path assembly 12. The third light source 143 may be an artificial light source such as an LED lamp, a halogen lamp, or other gas lamp, an incandescent lamp, etc., which is not limited in particular by the embodiment of the present invention.

Further, in order to achieve a higher measurement accuracy, a ground glass 142 may be added between the third reticle 141 and the third light source 143, i.e. the composite target includes the third reticle 141, the ground glass 142, the third light source 143, and the base 144 which are fixedly connected in sequence. The frosted glass 142 can modify the light to form a uniform area light source, which is more beneficial to the projection of a dark field bright cross target.

The operation of the shafting orthogonality measuring device 1 will be described in detail with reference to fig. 1 and 2. After the composite target is fixed at one end of the rotation shaft of the two-dimensional rotation shaft system device 2, the first light source 1111 provides a first light beam to illuminate the first reticle 1112, and the cross wire on the first reticle 1112 passes through the collimating lens 1113, the first beam splitting prism, the second beam splitting prism and the telescopic objective lens, then is emitted to the composite target, is reflected to the telescopic objective lens by the composite target, passes through the telescopic objective lens, the second beam splitting prism, the first beam splitting prism and the compensating lens 1131, and is imaged on the first charge coupled detector 1132 to form an auto-collimation light path, so that the auto-collimation light path mainly has the function of measuring the two-dimensional angle error of the rotation shaft of the two-dimensional rotation shaft system device 2 connected with the composite target. After the third light source 143 on the composite target illuminates the third reticle 141, the displayed bright cross wire target passes through the telescope objective lens, the second beam splitter prism, the converging lens 1221 and the beam splitter, and finally forms an image on the second charge coupled detector 1223 to form a focusing micro-collimation light path, which is mainly used for measuring the two-dimensional linear displacement error of the rotating shaft of the two-dimensional rotating shaft system device 2 connected with the composite target.

Meanwhile, since the second charge coupled detector 1223 is located on the precise displacement stage, when the bright cross wire target on the composite target passes through the telescopic objective lens, the second beam splitter prism, the converging lens 1221 and the beam splitter and finally forms an image on the second charge coupled detector 1223, the second charge coupled detector 1223 is driven by the precise displacement stage to move along the direction of the optical axis of the second charge coupled detector 1223, so that the clear image plane is precisely positioned. And the moving distance of the precise displacement table is precisely known, and the object plane moving distance can be calculated by an optical imaging formula in cooperation with the known focal length, so that the two-dimensional linear displacement error of the rotating shaft of the two-dimensional rotating shaft system device 2 is calculated.

In a second aspect, as shown in fig. 3 to 6, an embodiment of the present invention further provides a system for measuring shafting orthogonality, which is used for measuring a two-dimensional rotation shafting device 2, and includes a control device and at least one shafting orthogonality measuring device 1 described in the foregoing embodiments.

The composite target of the shafting orthogonality measuring device 1 is fixedly connected with the rotating shaft of the two-dimensional rotating shafting device 2.

The control device is electrically connected with at least one shafting orthogonality measuring device 1 and a two-dimensional rotation shafting device 2 respectively.

In the measurement process, the control device is used for controlling the rotation of the rotating shaft of the two-dimensional rotating shaft system device 2, and acquiring the deviation angle and the deviation displacement of the rotating shaft rotating axis relative to the optical axis of the shafting orthogonality measuring device 1 when the normal line of the composite target and the rotating shaft rotating axis and the optical axis of the shafting orthogonality measuring device 1 meet preset conditions. The control device is also used for determining the orthogonality of the two-dimensional rotation axis device 2 according to the deviation angle and the deviation displacement.

Compared with the prior art, the shafting orthogonality measuring system provided by the embodiment of the invention has the same beneficial effects as the shafting orthogonality measuring device 1 in the technical scheme, and the description is omitted here.

In one possible implementation, as shown in fig. 3, when the orthogonality of the two-dimensional rotation axis device 2 is measured using a single station, the number of axis orthogonality measuring devices is one.

The first composite target 15 of the shafting orthogonality measuring device 1 is fixedly connected with a first end of a transverse shaft 21 of the two-dimensional rotation shafting device 2, and the second composite target 16 of the shafting orthogonality measuring device 1 is fixedly connected with a second end of the transverse shaft 21 of the two-dimensional rotation shafting device 2.

In the measurement process, the control device is configured to control the transverse axis 21 of the two-dimensional rotation axis system device 2 to rotate, and obtain a first offset angle and a first offset displacement of the axis of rotation of the transverse axis 21 relative to the optical axis of the shafting orthogonality measurement device 1 when the normal line of the first composite target 15 and the axis of rotation of the transverse axis 21 meet preset conditions.

The control device is further configured to control the rotation of the transverse axis 21 of the two-dimensional rotation axis system 2 after controlling the rotation of the vertical axis 22 of the two-dimensional rotation axis system 2 by 180 °, and obtain a second offset angle and a second offset displacement of the rotation axis of the transverse axis 21 with respect to the optical axis of the shafting orthogonality measurement device 1 when the normal line of the second composite target 16 and the rotation axis of the transverse axis 21 satisfy preset conditions with the optical axis of the shafting orthogonality measurement device 1.

The control device is further configured to determine orthogonality of the two-dimensional rotation axis device 2 based on the first offset angle, the second offset angle, the first offset displacement, and the second offset displacement.

In specific implementation, after the first composite target 15 and the second composite target 16 of the shafting orthogonality measurement device 1 are respectively installed at the first end and the second end of the transverse shaft 21 of the two-dimensional rotation shafting device 2, the control device controls the transverse shaft 21 of the two-dimensional rotation shafting device 2 to rotate, so that the rotation axis of the transverse shaft 21 and the normal line of the first composite target 15 keep the same as much as possible with the optical axis of the shafting orthogonality measurement device 1 in the rotation process, at this time, the control device acquires an image imaged by the first charge coupled detector 1132, that is, acquires a first deviation angle of the rotating axis of the transverse shaft 21 relative to the optical axis of the shafting orthogonality measurement device 1, and acquires a displacement of the second charge coupled detector 1223 driven by the precision displacement table, that is, acquires a first deviation displacement of the rotating axis of the transverse shaft 21 relative to the optical axis of the shafting orthogonality measurement device 1. The shafting orthogonality measuring device 1 is kept stationary, and the control device controls the vertical shaft 22 of the two-dimensional rotation shafting device 2 to rotate 180 degrees. Then, the above steps are repeated, and the second offset angle and the second offset displacement of the axis of rotation of the second end of the transverse shaft 21 with respect to the optical axis of the shafting orthogonality measuring device 1 are measured. Finally, the control device calculates the orthogonality of the two-dimensional rotation axis device 2 from the first offset angle, the second offset angle, the first offset displacement, and the second offset displacement.

It will be appreciated that the control device controls the vertical shaft 22 to rotate 180 degrees, so that the grating encoder arranged in the vertical shaft 22 can be used for self-positioning, and external positioning can be realized by matching the photoelectric auto-collimator with a polygon or a double-sided reflecting mirror, so that the rotation angle of the vertical shaft 22 is ensured to meet 180 degrees.

In one possible implementation, as shown in fig. 4 to 6, when the orthogonality of the two-dimensional rotation axis device 2 is measured using a dual station, the axis orthogonality measuring device includes a first axis orthogonality measuring device 31 and a second axis orthogonality measuring device 32.

The optical axis of the first axis orthogonality measuring device 31 is orthogonal to the optical axis of the second axis orthogonality measuring device 32.

The third composite target 17 of the first shafting orthogonality measuring device 31 is fixedly connected with one end of a transverse shaft 21 of the two-dimensional rotation shafting device 2; the fourth composite target 18 of the second axis orthogonality measuring device 32 is fixedly connected to one end of the vertical axis 22 of the two-dimensional rotation axis device 2.

In the measurement process, the control device is configured to control the transverse axis 21 of the two-dimensional rotation axis system device 2 to rotate, and obtain a third offset angle of the axis of rotation of the transverse axis 21 relative to the optical axis of the first axis system orthogonality measurement device 31 and a third offset displacement when the normal line of the third composite target 17 and the axis of rotation of the transverse axis 21 meet preset conditions.

The control device is further configured to control the rotation of the vertical shaft 22 of the two-dimensional rotation axis system device 2, and obtain a fourth offset angle of the axis of rotation of the vertical shaft 22 relative to the optical axis of the second axis system orthogonality measurement device 32 and a fourth offset displacement when the normal line of the fourth composite target 18 and the axis of rotation of the vertical shaft 22 satisfy preset conditions with the optical axis of the second axis system orthogonality measurement device 32.

The control device is further configured to determine orthogonality of the two-dimensional rotation axis device 2 based on the third offset angle, the third offset displacement, the fourth offset angle, and the fourth offset displacement.

In practice, as shown in fig. 4 and 5, before the orthogonality is measured by using two axis orthogonality measuring devices, it is necessary to establish orthogonal reference fields for the first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32, that is, it is necessary to sequentially calibrate the verticality and intersection of the first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32, then remove the calibration tool, and place the two-dimensional rotation axis device 2 in the orthogonal reference fields. Based on the above, when the orthogonality of the two shafting orthogonality measuring devices themselves is determined to meet the reference condition and then the orthogonality measurement is performed on the two-dimensional rotation shafting device 2, new errors can be avoided from being introduced, and the accuracy of measurement data can be improved.

Referring to fig. 4, the perpendicularity calibration of the first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32 is illustrated. The first shafting orthogonality measuring device 31 and the second shafting orthogonality measuring device 32 are vertically placed, and the two devices are simultaneously aligned with the high-precision cube mirror 4, and the two devices respectively realize the verticality calibration of the two light paths through the respective auto-collimation light path components 11, so that the two shafting orthogonality measuring devices respectively realize the self-collimation angle to be zero, and the verticality calibration of the first shafting orthogonality measuring device 31 and the second shafting orthogonality measuring device 32 is completed.

Fig. 5 illustrates the intersection calibration of the first axis orthogonality measurement device 31 and the second axis orthogonality measurement device 32. After the perpendicularity calibration is completed, the high-precision cube mirror 4 is removed, the right-angle reflecting prism 5 is placed in the original position of the high-precision cube mirror 4, and the right-angle reflecting prism 5 is adjusted so that the first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32 are kept perpendicular. At this time, the second light source 124 in the first shafting orthogonality measuring device 31 is controlled to illuminate the second dividing plate 125 so that the cross hair on the second dividing plate 125 is projected in the vicinity of the right angle reflecting prism 5, as indicated by a point H in the figure. The cross wire is projected and reflected by the right angle reflecting prism 5, and finally imaged on the second charge coupled detector 1223 of the second axis orthogonality measuring device 32, and the position imaged on the second charge coupled detector 1223 of the second axis orthogonality measuring device 32 is adjusted by adjusting the displacement of the second axis orthogonality measuring device 32, so that the bright line center of the cross wire is located at the image plane center. The second light source 124 of the first axis orthogonality measuring device 31 is controlled to repeatedly project a plurality of positions for a plurality of times, and the intersection degree calibration of the first axis orthogonality measuring device 31 and the second axis orthogonality measuring device 32 is realized through data fitting calculation.

After the perpendicularity calibration and the intersection degree calibration are completed, the orthogonal reference field is established. And (3) removing the calibration tool, namely the right angle reflecting prism 5, placing the two-dimensional rotating shaft system device 2 in situ, installing the third composite target 17 of the first shaft system orthogonality measuring device 31 at the first end of the transverse shaft 21 of the two-dimensional rotating shaft system device 2, and installing the fourth composite target 18 of the second shaft system orthogonality measuring device 32 at the first end of the vertical shaft 22 of the two-dimensional rotating shaft system device 2.

As shown in fig. 6, in the implementation, the control device controls the rotation of the transverse axis 21 of the two-dimensional rotation axis system device 2, so that the rotation axis of the transverse axis 21 and the normal line of the third composite target 17 are kept as consistent as possible with the optical axis of the first axis system orthogonality measurement device 31 during the rotation, at this time, the control device acquires an image imaged by the first charge coupled detector 1132 of the first axis system orthogonality measurement device 31, that is, acquires a third offset angle of the rotation axis of the transverse axis 21 relative to the optical axis of the first axis system orthogonality measurement device 31, and acquires a displacement of the second charge coupled detector 1223 under the driving of the precision displacement stage, that is, acquires a third offset displacement of the rotation axis of the transverse axis 21 relative to the optical axis of the first axis system orthogonality measurement device 31, by the second charge coupled detector 1223 of the first axis system orthogonality measurement device 31.

The control device controls the vertical shaft 22 of the two-dimensional rotating shaft system device 2 to rotate, so that the rotation axis of the vertical shaft 22 and the normal line of the fourth composite target 18 are kept consistent with the optical axis of the second axis orthogonality measuring device 32 as much as possible in the rotating process, at this time, the control device acquires an image imaged by the first charge coupled detector 1132 of the second axis orthogonality measuring device 32, that is, acquires a fourth offset angle of the rotation axis of the transverse shaft 21 relative to the optical axis of the second axis orthogonality measuring device 32, and the control device acquires a displacement of the second charge coupled detector 1223 driven by the precision displacement table through the image imaged by the second charge coupled detector 1223 of the second axis orthogonality measuring device 32, that is, acquires a fourth offset displacement of the rotation axis of the vertical shaft 22 relative to the optical axis of the second axis orthogonality measuring device 32. Finally, the control device calculates the orthogonality of the two-dimensional rotation axis device 2 from the third offset angle, the third offset displacement, the fourth offset angle, and the fourth offset displacement.

Based on the above, the measuring system provided by the embodiment of the invention can reduce the alignment error of the manual alignment target, has the characteristics of high measuring precision, less introduction error, low assembly and adjustment difficulty, high automation degree and the like, and can realize multi-parameter one-stop measurement. When the orthogonality of the two-dimensional rotation axis system device 2 is measured by adopting the double-station type, the global detection, continuous detection and dynamic detection of the two-dimensional axis system error can be realized.

Fig. 7 shows a schematic hardware configuration of the control device described in the above embodiment. As shown in fig. 7, the control device 400 includes a processor 410 and a communication interface 430.

As shown in fig. 7, the processor 410 may be a central processing unit (Central Processing Unit, CPU), a general purpose processor, a digital signal processor (Digital Signal Processor, DSP), an Application-specific integrated circuit (ASIC), a field programmable gate array (Field Programmable Gate Array, FPGA) or other programmable logic device, a transistor logic device, a hardware component, or any combination thereof. Which may implement or perform the various exemplary logic blocks, modules and circuits described in connection with this disclosure. The processor 410 may also be a combination that implements computing functionality, such as a combination comprising one or more microprocessors, a combination of a DSP and a microprocessor, or the like. The communication interface 430 may be one or more. The communication interface 430 may use any transceiver-like device for communicating with other devices or communication networks.

As shown in fig. 7, the control device 400 may further include a communication line 440. The communication line may include a pathway to communicate information between the aforementioned components.

Optionally, as shown in fig. 7, the control device 400 may further include a memory 420. Memory 420 is used to store computer-executable instructions for performing aspects of the present invention and is controlled by processor 410 for execution. The processor 410 is configured to execute computer-executable instructions stored in the memory 420, thereby implementing the measurement of orthogonality of the two-dimensional rotation axis device by the system for measuring axis orthogonality provided by the embodiment of the present invention.

As shown in fig. 7, the memory 420 may be a read-only memory (ROM) or other type of static storage device that can store static information and instructions, a random access memory (random access memory, RAM) or other type of dynamic storage device that can store information and instructions, or an electrically erasable programmable read-only memory (electrically erasable programmable read-only memory, EEPROM), a compact disc (compact disc read-only memory, CD-ROM) or other optical disk storage, optical disk storage (including compact disc, laser disc, optical disc, digital versatile disc, blu-ray disc, etc.), magnetic disk storage media or other magnetic storage devices, or any other medium that can be used to carry or store desired program code in the form of instructions or data structures and that can be accessed by a computer, but is not limited thereto. The memory 420 may be stand alone and be coupled to the processor 410 via a communication line 440. Memory 420 may also be integrated with processor 410.

Alternatively, the computer-executable instructions in the embodiments of the present invention may be referred to as application program codes, which are not particularly limited in the embodiments of the present invention.

In a particular implementation, as one embodiment, as shown in FIG. 7, processor 410 may include one or more CPUs, such as CPU0 and CPU1 in FIG. 7.

In a specific implementation, as an embodiment, as shown in fig. 7, the control device 400 may include a plurality of processors, such as the processor 410 and the processor 450 in fig. 7. Each of these processors may be a single-core processor or a multi-core processor.

The embodiment of the invention also provides a computer readable storage medium. The computer readable storage medium has stored therein instructions which, when executed, implement the functions performed by the control device 400 in the above-described embodiments.

The embodiment of the present invention further provides a chip, where the chip is applied to the shafting orthogonality measurement system, and the chip includes at least one processor 410 and a communication interface 430, where the communication interface 430 is coupled to the at least one processor 410, and the processor is configured to execute instructions to implement the functions performed by the control device 400 in the foregoing embodiment.

In the above embodiments, it may be implemented in whole or in part by software, hardware, firmware, or any combination thereof. When implemented in software, may be implemented in whole or in part in the form of a computer program product. The computer program product includes one or more computer programs or instructions. When the computer program or instructions are loaded and executed on a computer, the processes or functions described in the embodiments of the present invention are performed in whole or in part. The computer may be a general purpose computer, a special purpose computer, a computer network, a terminal, a user equipment, or other programmable apparatus. The computer program or instructions may be stored in a computer readable storage medium or transmitted from one computer readable storage medium to another computer readable storage medium, for example, the computer program or instructions may be transmitted from one website site, computer, server, or data center to another website site, computer, server, or data center by wired or wireless means. The computer readable storage medium may be any available medium that can be accessed by a computer or a data storage device such as a server, data center, etc. that integrates one or more available media. The usable medium may be a magnetic medium, e.g., floppy disk, hard disk, tape; optical media, such as digital video discs (digital video disc, DVD); but also semiconductor media such as solid state disks (solid state drive, SSD).

Although the invention is described herein in connection with various embodiments, other variations to the disclosed embodiments can be understood and effected by those skilled in the art in practicing the claimed invention, from a study of the drawings, the disclosure, and the appended claims. In the claims, the word "comprising" does not exclude other elements or steps, and the "a" or "an" does not exclude a plurality. A single processor or other unit may fulfill the functions of several items recited in the claims. The mere fact that certain measures are recited in mutually different dependent claims does not indicate that a combination of these measures cannot be used to advantage.

Although the invention has been described in connection with specific features and embodiments thereof, it will be apparent that various modifications and combinations can be made without departing from the spirit and scope of the invention. Accordingly, the specification and drawings are merely exemplary illustrations of the present invention as defined in the appended claims and are considered to cover any and all modifications, variations, combinations, or equivalents that fall within the scope of the invention. It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention also include such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.

Claims

1. An axis orthogonality measurement device for measuring orthogonality of a two-dimensional rotation axis device, comprising: the device comprises an auto-collimation light path component, a focusing micrometer light path component, an auxiliary imaging component and a reflecting part which is detachably connected with the two-dimensional rotating shaft system device;

the auxiliary imaging component is positioned at one side of the reflecting part, which is away from the two-dimensional rotating shaft system device, and the optical axis of the auxiliary imaging component is coaxial with the optical axis of the reflecting part; the auto-collimation optical path component and the focusing micro-optical path component are positioned on one side of the auxiliary imaging component, which is away from the reflecting part, and the optical axis of the focusing micro-optical path component and the optical axis of the auto-collimation optical path component are mutually perpendicular to the optical axis of the auxiliary imaging component; the auxiliary imaging component and the auto-collimation light path component form an auto-collimation light path, and the auxiliary imaging component and the focusing micro-measurement light path component form a focusing micro-measurement light path;

the auxiliary imaging component is used for converging the second light beam to obtain a third light beam, and emitting the third light beam to the auto-collimation light path component, wherein the third light beam is imaged on the auto-collimation light path component;

The reflection part is also used for emitting a fourth light beam to the auxiliary imaging component, the auxiliary imaging component is used for obtaining a fifth light beam after converging the fourth light beam, the fifth light beam is emitted to the focusing and micro-optical path component, and the focusing and micro-optical path component is used for imaging after sequentially refracting and converging the fifth light beam.

2. The shafting orthogonality measurement device of claim 1, wherein the auto-collimation optical path assembly comprises a first optical path structure, a first beam splitter, and a first imaging structure, wherein:

the first beam splitter is positioned on the light emitting side of the first light path structure, and the optical axis of the first light path structure is coaxial with the central line of the first beam splitter in the first direction; the first imaging structure is positioned at one side of the first beam splitter, which is away from the focusing and micro-optical path component, and the optical axis of the first imaging structure is aligned with the optical axis of the first imaging structure

The center line of the first beam splitter in the second direction is coaxial;

the optical axis of the first optical path structure is perpendicular to the optical axis of the first imaging structure, and the center of the first beam splitter is positioned at the intersection point of the optical axis of the first optical path structure and the optical axis of the first imaging structure;

The first light path structure is used for emitting the first light beam to the first beam splitter; the first beam splitter is used for carrying out refraction treatment on the first light beam and emitting the first light beam to the auxiliary imaging component; the auxiliary imaging assembly is used for carrying out collimation treatment on the first light beam to obtain a second light beam, emitting the second light beam to the reflecting part, wherein the reflecting part is used for reflecting the second light beam and then entering the auxiliary imaging assembly, the auxiliary imaging assembly is also used for carrying out convergence treatment on the second light beam to obtain a third light beam, emitting the third light beam to the first beam splitter, and the first beam splitter is used for converging the third light beam and then emitting the third light beam to the first imaging structure to carry out imaging.

3. The shafting orthogonality measurement device according to claim 2, wherein the first optical path structure includes a first light source, a first reticle, and a collimator lens arranged in this order; wherein:

the optical axis of the first light source, the optical axis of the first dividing plate and the optical axis of the collimating mirror are coaxial with the central line of the first beam splitter in the first direction;

The first light source is used for providing a divergent light beam for the first reticle, the divergent light beam forms the first light beam after passing through the first reticle and is emitted to the collimating mirror, and the collimating mirror is used for collimating the first light beam and then emitting the first light beam to the first beam splitter;

the first imaging structure includes a compensation mirror and a first charge coupled detector, wherein:

the compensating mirror is positioned between the first charge coupled detector and the first beam splitter, and the optical axis of the first charge coupled detector and the optical axis of the compensating mirror are coaxial with the center line of the first beam splitter in the second direction;

the compensating mirror is used for compensating the third light beam and emitting the compensated third light beam to the first charge coupled detector for imaging.

4. The shafting orthogonality measurement device according to claim 1, wherein the focusing micrometer optical path assembly comprises a second beam splitter, a second imaging structure, and an image plane movement adjustment structure, wherein:

the second beam splitter is fixedly connected with the first beam splitter in the auto-collimation light path component, and the center line of the second beam splitter in the second direction is coaxial with the optical axis of the auxiliary imaging component;

The second imaging structure is positioned on the light emitting side of the second beam splitter, and the optical axis of the second imaging structure is coaxial with the central line of the second beam splitter in the first direction;

the second beam splitter is used for refracting the fifth light beam to the second imaging structure; the second imaging structure is used for imaging according to the fifth light beam;

the image plane movement adjusting structure is used for bearing the second imaging structure, and when the definition of an image imaged on the second imaging structure does not accord with a target parameter, the distance between the second imaging structure and the second beam splitter is adjusted.

5. The shafting orthogonality measurement device according to claim 4, wherein the second imaging structure comprises a converging lens, a third beam splitter, and a second charge coupled detector arranged in this order, wherein:

the optical axis of the converging lens, the optical axis of the third beam splitter and the optical axis of the second charge coupled detector are coaxial with the center line of the second beam splitter in the second direction;

the converging lens is used for converging the fifth light beam after being refracted by the second beam splitter, and outputting the converged fifth light beam to the third beam splitter, and the third beam splitter is used for transmitting the fifth light beam to the second charge coupled detector for imaging;

The image surface movement adjusting structure comprises an electric displacement guide rail and a driver electrically connected with the electric displacement guide rail;

the driver is used for driving the electric displacement guide rail to move when the definition of an image imaged on the second charge coupled detector does not accord with the target parameter.

6. The shafting orthogonality measurement device according to claim 4, wherein the focusing micrometer optical path assembly further comprises a second light source and a second reticle; the second light source and the second reticle are fixedly connected with the image plane movement adjusting structure;

the optical axis of the second light source is coaxial with the optical axis of the second reticle and is parallel to the center line of the second beam splitter in the second direction;

in the debugging process, the second light source is used for providing a divergent light beam for the second division plate, and after passing through the second division plate, the divergent light beam forms a sixth light beam and is emitted to the second imaging structure, and the second imaging structure is also used for imaging according to the sixth light beam.

7. The shafting orthogonality measurement device according to claim 1, wherein the reflecting portion is a composite target, wherein:

The composite target comprises a third reticle, a third light source and a base, wherein the third reticle, the third light source and the base are sequentially and fixedly connected;

or, the composite target comprises a third reticle, ground glass, a third light source and a base, wherein the third reticle, the ground glass, the third light source and the base are sequentially and fixedly connected.

8. An axis orthogonality measurement system for measuring orthogonality of a two-dimensional rotating axis device, comprising a control device and at least one axis orthogonality measurement device according to any one of claims 1 to 7; wherein:

the composite target of the shafting orthogonality measuring device is fixedly connected with the rotating shaft of the two-dimensional rotating shafting device;

the control device is respectively and electrically connected with the at least one shafting orthogonality measuring device and the two-dimensional rotation shafting device;

in the measuring process, the control device is used for controlling the rotation of the rotating shaft of the two-dimensional rotating shaft system device, and acquiring the deviation angle and the deviation displacement of the rotating shaft relative to the optical axis of the shaft system orthogonality measuring device when the normal line of the composite target and the rotating shaft meet the preset conditions with the optical axis of the shaft system orthogonality measuring device;

9. The shafting orthogonality measurement system according to claim 8, wherein when the orthogonality of the two-dimensional rotation shafting means is measured using a single station, the number of shafting orthogonality measurement means is one, wherein:

the first composite target of the shafting orthogonality measuring device is fixedly connected with the first end of the transverse shaft of the two-dimensional rotation shafting device, and the second composite target of the shafting orthogonality measuring device is fixedly connected with the second end of the transverse shaft of the two-dimensional rotation shafting device;

in the measurement process, the control device is used for controlling the transverse axis of the two-dimensional rotation shafting device to rotate, and acquiring a first deviation angle and a first deviation displacement of the axis of the transverse axis rotation relative to the optical axis of the shafting orthogonality measurement device when the normal line of the first composite target, the axis of the transverse axis rotation and the optical axis of the shafting orthogonality measurement device meet the preset condition;

the control device is further used for controlling the transverse axis of the two-dimensional rotation shafting device to rotate after controlling the vertical axis of the two-dimensional rotation shafting device to rotate 180 degrees, and acquiring a second deviation angle and a second deviation displacement of the axis of the transverse axis rotation relative to the optical axis of the shafting orthogonality measuring device when the normal line of the second composite target and the axis of the transverse axis rotation meet the preset condition with the optical axis of the shafting orthogonality measuring device;

The control device is further configured to determine orthogonality of the two-dimensional rotation axis device according to the first offset angle, the second offset angle, the first offset displacement, and the second offset displacement.

10. The system of claim 8, wherein when the orthogonality of the two-dimensional rotating shaft system is measured using a dual station, the shaft system orthogonality measurement device comprises a first shaft system orthogonality measurement device and a second shaft system orthogonality measurement device, wherein:

the optical axis of the first shafting orthogonality measuring device is orthogonal to the optical axis of the second shafting orthogonality measuring device;

the third composite target of the first shafting orthogonality measuring device is fixedly connected with one end of a transverse shaft of the two-dimensional rotating shafting device; the fourth composite target of the second axis orthogonality measuring device is fixedly connected with one end of a vertical axis of the two-dimensional rotating axis system device;

in the measurement process, the control device is used for controlling the transverse axis of the two-dimensional rotation shafting device to rotate, and acquiring a third deviation angle and a third deviation displacement of the axis of the transverse axis rotation relative to the optical axis of the first shafting orthogonality measurement device when the normal line of the third composite target and the axis of the transverse axis rotation meet the preset condition with the optical axis of the first shafting orthogonality measurement device;

The control device is further used for controlling the vertical shaft of the two-dimensional rotating shaft system device to rotate, and acquiring a fourth deviation angle and a fourth deviation displacement of the axis of the vertical shaft rotating relative to the optical axis of the second shaft system orthogonality measuring device when the normal line of the fourth composite target and the axis of the vertical shaft rotating meet the preset condition with the optical axis of the second shaft system orthogonality measuring device;

the control device is further configured to determine orthogonality of the two-dimensional rotation axis device according to the third offset angle, the fourth offset displacement, and the fourth offset displacement.