CN116872090B - Dressing disk and device for polishing wafer - Google Patents
Dressing disk and device for polishing wafer Download PDFInfo
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- CN116872090B CN116872090B CN202311149912.0A CN202311149912A CN116872090B CN 116872090 B CN116872090 B CN 116872090B CN 202311149912 A CN202311149912 A CN 202311149912A CN 116872090 B CN116872090 B CN 116872090B
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- 238000005498 polishing Methods 0.000 title claims abstract description 38
- 230000007246 mechanism Effects 0.000 claims abstract description 43
- 244000208734 Pisonia aculeata Species 0.000 claims abstract description 39
- 238000009966 trimming Methods 0.000 claims abstract description 39
- 230000008602 contraction Effects 0.000 claims abstract description 5
- 230000003750 conditioning effect Effects 0.000 claims description 20
- 238000007789 sealing Methods 0.000 claims description 17
- 238000009423 ventilation Methods 0.000 claims description 12
- 238000013461 design Methods 0.000 claims description 3
- 238000005406 washing Methods 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 3
- 230000001680 brushing effect Effects 0.000 description 12
- 238000012423 maintenance Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 6
- 230000009471 action Effects 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000005381 potential energy Methods 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 239000002313 adhesive film Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 201000004384 Alopecia Diseases 0.000 description 1
- 210000004712 air sac Anatomy 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 208000024963 hair loss Diseases 0.000 description 1
- 230000003676 hair loss Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The application discloses a trimming disc and a device for polishing a wafer, which comprises the following components: the device comprises a tray body, grinding sheets, brushes, an air bag and a pull-back mechanism; wherein, the abrasive disc is arranged at the edge of the lower end of the disc body, the lower end of the disc body is provided with a groove, the brush and the air bag are arranged in the groove, and the air bag is arranged between the disc body and the brush, so that when the air bag bulges, the air bag pushes the brush outwards of the groove, and the brush hair of the brush is at least partially exposed below the abrasive disc; the first end of the pull-back mechanism is connected to the disk body, the second end of the pull-back mechanism is connected to the brush, and the second end of the pull-back mechanism is used for applying acting force to the brush, wherein the acting force moves towards the contraction direction of the air bag. The application solves the problems that in the related art, the brush and the abrasive disc of the trimming disc can only trim and maintain the surface of the polishing pad at the same time, so that the trimming and maintaining efficiency is poor, and the consumption of the brush as consumable material is relatively fast.
Description
Technical Field
The application relates to the technical field of semiconductor production, in particular to a trimming disc and a device for polishing a wafer.
Background
In the wafer process, the wafer polishing needs to be carried out in a plurality of processes, the polishing pad and the polishing liquid are matched to grind and polish the wafer in the polishing process, and the fragments polished by the wafer and the polishing liquid slurry on the surface of the polishing pad can be slowly filled into the polishing pad, so that the surface of the polishing pad is hard and shiny to form a glaze surface and become smooth, and the polishing efficiency is greatly reduced. Thus, maintenance of the dressing of the polishing pad surface is an essential step in the polishing process that would otherwise affect the quality of the wafer polishing. The polishing pad surface is usually polished by using an abrasive disc of a polishing disc, and then brushed by a brush after polishing.
Due to the limitation of working space, in some polishing devices in the prior art, the trimming disc and the brush are integrated together, and the brush is mounted on the trimming disc by adopting a structure which is used for mounting the brush on the trimming disc through a spring, but the structure can enable the brush and the grinding disc of the trimming disc to only perform trimming maintenance on the surface of the polishing pad at the same time, so that the trimming maintenance efficiency is poor, and the consumption of the brush as a consumable is relatively fast.
Disclosure of Invention
The application mainly aims to provide a trimming disc, which solves the problems that in the related art, a hairbrush and an abrasive disc of the trimming disc can only trim and maintain the surface of a polishing pad at the same time, so that the trimming and maintaining efficiency is poor, and the hairbrush as a consumable consumes relatively quickly.
In order to achieve the above object, the present application provides a conditioning disk comprising: the device comprises a tray body, grinding sheets, brushes, an air bag and a pull-back mechanism; wherein,
the abrasive disc is arranged at the edge of the lower end of the disc body, a groove is formed in the lower end of the disc body, the hairbrush and the air bag are arranged in the groove, and the air bag is arranged between the disc body and the hairbrush, so that when the air bag bulges, the air bag pushes the hairbrush out of the groove, and bristles of the hairbrush are at least partially exposed below the abrasive disc;
the first end of the pull-back mechanism is connected to the disc body, the second end of the pull-back mechanism is connected to the hairbrush, and the second end of the pull-back mechanism is used for applying acting force to the hairbrush, wherein the acting force moves towards the shrinkage direction of the air bag.
Further, a protrusion is arranged in the groove and is attached to the middle of the air bag so as to support the middle of the air bag to bulge towards the direction of the brush.
Further, as the bristles are consumed, the air pressure is compensated for by the air bag to compensate for the variation in height of the brush and the variation in stiffness of the bristles.
Further, the air bag compensates the air pressureAccording to the following formula:
，
wherein k is 1 The rigidity of the brush is the brush bristle rigidity of the brush, C is the designed brushing rigidity of the brush bristle, V is the volume of the air bag when the value of C is satisfied, h is the height of the air bag when the value of C is satisfied,is the variation of the bristle height.
Further, the groove is formed in the middle of the disc body, and the abrasive disc is arranged along the circumferential direction of the groove.
Further, the hairbrush comprises a mounting plate, a brush body and bristles, wherein the mounting plate is arranged in the groove, and a sealing strip is arranged between the edge of the mounting plate and the groove;
the brush body is detachably arranged on the mounting plate, and the brush hair is arranged on the brush body;
the second end of the pull-back mechanism is connected to the mounting plate, and the air bag is located between the mounting plate and the groove.
Further, the pull-back mechanism comprises a guide rod, a jacking and an elastic piece;
the lower extreme of guide bar with the mounting panel is connected, the upper end of guide bar slides and passes the disk body and with the jacking is connected, the elastic component is located the jacking with between the disk body.
Further, the elastic piece is arranged as a spring, the spring is sleeved at the upper end of the guide rod, the upper end of the spring abuts against the jacking, and the lower end of the spring abuts against the disc body.
Further, the trimming disc further comprises a fixing ring, wherein the fixing ring is arranged in the groove and pressed on the edge of the air bag, and the fixing ring is fixedly connected with the disc body.
Further, the trimming disc further comprises a rotating shaft, and the rotating shaft is connected with the disc body;
an air passage is arranged in the rotating shaft, a first vent hole is formed in one side of the rotating shaft, and a second vent hole is formed in the tray body;
the air flue is used for communicating an external air source, the second ventilation hole is communicated with the middle part of the air bag, the first end of the first ventilation hole is communicated with the air flue, and the second end of the first ventilation hole is communicated with the second ventilation hole through an air duct.
Further, an opening at one end of the second ventilation hole, which is far away from the air duct, is positioned on the protrusion.
Further, the tray comprises a sealing cover, wherein the sealing cover is packaged on the tray body, and the elastic piece and the jacking are positioned in the sealing cover.
According to another aspect of the present application, there is provided an apparatus for wafer polishing, comprising the conditioning disk described above.
In the embodiment of the application, the disc body, the abrasive disc, the hairbrush, the air bag and the pull-back mechanism are arranged; wherein, the abrasive disc is arranged at the edge of the lower end of the disc body, the lower end of the disc body is provided with a groove, the brush and the air bag are arranged in the groove, and the air bag is arranged between the disc body and the brush, so that when the air bag bulges, the air bag pushes the brush outwards of the groove, and the brush hair of the brush is at least partially exposed below the abrasive disc; the first end of the back-pulling mechanism is connected to the disc body, the second end of the back-pulling mechanism is connected to the brush, the second end of the back-pulling mechanism is used for applying acting force moving towards the shrinkage direction of the air bag to the brush, the position of the brush in the groove (namely, the axial position of the brush relative to the abrasive disc) is adjusted by utilizing the bulge and shrinkage of the air bag, when the brush is needed to be used, the bulge of the air bag can be controlled to enable the brush hair of the brush to be exposed below the abrasive disc, when the abrasive disc is only needed to be used, the shrinkage of the air bag is controlled, the brush is retracted into the groove under the action of the back-pulling mechanism, and the brush hair of the brush is retracted to the upper side of the abrasive disc, so that the position of the brush relative to the abrasive disc can be adjusted according to a trimming procedure, the trimming maintenance efficiency is improved, the trimming flexibility is improved, the technical effect of the brush hair loss of the brush can be reduced, the brush and the abrasive disc of the related art can only perform trimming maintenance on the surface of a polishing pad at the same time, and the problem that the trimming maintenance efficiency is poor and the consumption of the brush as consumable material is relatively fast is solved.
Drawings
The accompanying drawings, which are included to provide a further understanding of the application, are incorporated in and constitute a part of this specification. The drawings and their description are illustrative of the application and are not to be construed as unduly limiting the application. In the drawings:
FIG. 1 is a schematic view of a conditioning disk according to the present application;
FIG. 2 is a first cross-sectional view of a conditioning disk provided by the present application;
FIG. 3 is a schematic view of a trim disk concealing seal cover according to the present application;
FIG. 4 is a second cross-sectional view of a conditioning disk provided by the present application;
fig. 5 is a schematic structural view of an apparatus for polishing a wafer according to the present application.
The novel brush comprises a plate body 1, a grinding plate 2, a brush 3, a mounting plate 31, a brush 32, a brush 33, a sealing strip 34, an air bag 4, a pull-back mechanism 5, a guide rod 51, a jacking 52, an elastic piece 53, a fixing ring 6, a rotating shaft 7, an air channel 71, a first vent hole 72, an air duct 73, a rotary joint 8, a rotating wheel 9, a sealing cover 10, a groove 11, a protrusion 12 and a second vent hole 13.
Detailed Description
In order that those skilled in the art will better understand the present application, a technical solution in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in which it is apparent that the described embodiments are only some embodiments of the present application, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the present application without making any inventive effort, shall fall within the scope of the present application.
It should be noted that the terms "first," "second," and the like in the description and the claims of the present application and the above figures are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged where appropriate in order to describe the embodiments of the application herein.
In the present application, the azimuth or positional relationship indicated by the terms "upper", "lower", "inner", and the like are based on the azimuth or positional relationship shown in the drawings. These terms are only used to better describe the present application and its embodiments and are not intended to limit the scope of the indicated devices, elements or components to the particular orientations or to configure and operate in the particular orientations.
Also, some of the terms described above may be used to indicate other meanings in addition to orientation or positional relationships, for example, the term "upper" may also be used to indicate some sort of attachment or connection in some cases. The specific meaning of these terms in the present application will be understood by those of ordinary skill in the art according to the specific circumstances.
Furthermore, the terms "disposed," "configured," "connected," "secured," and the like are to be construed broadly. For example, "connected" may be in a fixed connection, a removable connection, or a unitary construction; may be a mechanical connection, or an electrical connection; may be directly connected, or indirectly connected through intervening media, or may be in internal communication between two devices, elements, or components. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art according to the specific circumstances.
In addition, the term "plurality" shall mean two as well as more than two.
It should be noted that, without conflict, the embodiments of the present application and features of the embodiments may be combined with each other. The application will be described in detail below with reference to the drawings in connection with embodiments.
Due to the limitation of working space, in some polishing devices in the prior art, the trimming disc and the brush are integrated together, and the brush is mounted on the trimming disc by adopting a structure which is used for mounting the brush on the trimming disc through a spring, but the structure can enable the brush and the grinding disc of the trimming disc to only perform trimming maintenance on the surface of the polishing pad at the same time, so that the trimming maintenance efficiency is poor, and the consumption of the brush as a consumable is relatively fast.
In order to solve the above technical problems, as shown in fig. 1 to 4, an embodiment of the present application provides a trimming disc, including: the device comprises a disc body 1, a grinding disc 2, a hairbrush 3, an air bag 4 and a pull-back mechanism 5; wherein,
the abrasive disc 2 is arranged at the edge of the lower end of the disc body 1, the lower end of the disc body 1 is provided with a groove 11, the hairbrush 3 and the air bag 4 are arranged in the groove 11, and the air bag 4 is arranged between the disc body 1 and the hairbrush 3, so that when the air bag 4 is raised, the air bag 4 pushes the hairbrush 3 outwards of the groove 11, and the bristles 33 of the hairbrush 3 are at least partially exposed below the abrasive disc 2;
the first end of the pull-back mechanism 5 is connected to the disk 1, the second end is connected to the brush 3, and the second end of the pull-back mechanism 5 is used for applying a force to the brush 3, which moves towards the contraction direction of the air bag 4.
In the present embodiment, the disc 1 serves as a mounting base for the abrasive sheet 2, the brush 3, the air bag 4, and the pullback mechanism 5, and the disc 1 may be substantially provided in a disc-type structure, enabling the polishing pad to be better dressed in a rotating manner. The lower extreme of disk body 1 has seted up recess 11, and recess 11 can be seted up at the middle part of disk body 1, and recess 11 can be roughly circular recess 11, and abrasive disc 2 then arranges the edge at the lower extreme of disk body 1, and it stands out in the lower terminal surface of disk body 1, can repair the polishing pad at the rotatory in-process of disk body 1. In one embodiment, the plurality of abrasive sheets 2 are provided in plurality, and the plurality of abrasive sheets 2 are arranged at the lower end of the disc body 1 and are arranged around the circumference of the grooves 11. In another embodiment, the grinding plate 2 includes a base ring, the lower surface of which is formed with a plurality of protruding structures along the circumferential direction thereof. The foundation ring is directly mounted on the disk body 1 during mounting, and the polishing pad can be trimmed by utilizing the protruding structure on the foundation ring during rotation of the disk body 1.
In this embodiment, the groove 11 may be arranged coaxially with the disk 1, thereby facilitating the positioning of the brush 3 within the groove 11 during rotation of the disk 1. To achieve an adjustment of the position of the brush 3 in the recess 11, in this embodiment also a balloon 4 is arranged in the recess 11, and in the axial direction the balloon 4 is located between the recess 11 and the brush 3. In one embodiment, as shown in fig. 2 and 4, the air bag 4 is an elastic adhesive film, and the outer ring of the air bag 4 is fixedly connected with the inner wall of the groove 11, specifically, may be fixedly connected with the inner wall of the groove 11 through a fixing ring 6. The inner ring of the air bag 4 corresponds to the brush 3, and when the air enters the groove 11 and contacts with the inner ring of the air bag 4, the inner ring of the air bag 4 bulges under the action of the air, so that the brush 3 is pushed to move, and the specific movement amount of the brush 3 is determined by the bulge degree of the air bag 4. In another embodiment, the air bag 4 is a bag body (not shown in the figure) with a hollow cavity, the upper surface of the air bag 4 is fixedly connected with the groove 11, the lower surface of the air bag 4 is connected with the brush 3, and the hollow cavity of the air bag 4 can be filled with air, so that the lower surface of the air bag 4 bulges to push the brush 3 to move, and the specific movement amount of the brush 3 is still determined by the bulge degree of the air bag 4.
In order to enable the air bag 4 to stably control the brush 3 to retract after the air bag is contracted, a pull-back mechanism 5 is further arranged on the disc body 1 in the embodiment, a first end of the pull-back mechanism 5 is connected to the disc body 1, a second end of the pull-back mechanism 5 is connected to the brush 3, and the second end of the pull-back mechanism 5 is used for applying a force to the brush 3, wherein the force moves towards the contraction direction of the air bag 4. In one embodiment, the pull-back mechanism 5 may comprise a member having elasticity, and when the brush 3 is pushed out, the second end of the pull-back mechanism 5 is pulled, so that the elastic member on the pull-back mechanism 5 is stretched to obtain elastic potential energy; when the air bag 4 is contracted, the elastic component pulls the brush 3 to retract under the action of elastic potential energy. In another embodiment, the pull-back mechanism 5 may comprise a traction rope, the first end of which is wound on the reel and the second end of which is connected to the brush 3, so as to pull the brush 3 to retract by active rotation of the reel.
The present embodiment uses the bulge and shrinkage of the air bag 4 to adjust the position of the brush 3 in the groove 11 (i.e. the axial position of the brush 3 relative to the abrasive disc 2), when the brush 3 is needed to be used, the air bag 4 can be controlled to bulge so that the bristles 33 of the brush 3 are exposed below the abrasive disc 2, when only the abrasive disc 2 is needed to be used, the air bag 4 is controlled to shrink, the brush 3 is retracted into the groove 11 under the action of the pullback mechanism 5, the bristles 33 of the brush 3 are retracted above the abrasive disc 2, at this time, the bristles 33 of the abrasive disc 2 are not contacted with the polishing pad in the use process, the consumption of the bristles 33 of the brush 3 is reduced, thereby realizing the technical effects that the position of the brush 3 relative to the abrasive disc 2 can be adjusted according to the trimming procedure, the trimming maintenance efficiency is improved, and the consumption of the bristles 33 of the brush 3 can be reduced, and further solving the problems that in the related art, the surface of the brush 3 and the abrasive disc 2 can be simultaneously trimmed and maintained on the polishing pad surface, resulting in poorer trimming maintenance efficiency and faster consumption of the brush 3 as consumable material.
Further, since the conditioning disk is used for conditioning the polishing pad of the wafer polishing machine, and the gap on the wafer polishing machine allowing the conditioning disk to horizontally pass through is smaller, the vertical volume of the conditioning disk is required to be smaller. Since the present embodiment controls the extension of the brush 3 by supplying air to the air bag 4, the volume of the conditioning disk in the vertical direction can be made smaller, and thus can be better applied to the polishing apparatus having smaller conditioning gaps, compared to the manner of controlling the extension of the brush 3 by linear motion members such as cylinders, which are vertically arranged, because they need to satisfy a certain stroke, and therefore have a longer vertical length.
In order to make the air bag 4 uniformly stressed by the brush 3 when pushing the brush 3, the air bag 4 may be disposed at the middle of the groove 11 while corresponding to the middle of the brush 3, and the air bag 4 may push out the brush 3 by applying a force to the middle of the brush 3. When the air bag 4 is an elastic adhesive film, in order to enable the middle portion of the air bag 4 to deform rapidly and accurately towards the direction of the brush 3, a protrusion 12 is arranged in the groove 11 in the embodiment, and the protrusion 12 is attached to the middle portion of the air bag 4 so as to support the middle portion of the air bag 4 to bulge towards the direction of the brush 3.
Specifically, in the present embodiment, as shown in fig. 2 and 4, the protrusion 12 protrudes from the upper surface of the groove 11, and the protrusion 12 corresponds to the middle portion of the air bag 4, specifically, corresponds to a portion of the air bag 4 that is not fixed to the groove 11. When the outer ring of the air bag 4 is fixed with the groove 11, the middle part of the air bag 4 is completely attached to the surface of the bulge 12 (as shown in fig. 4), so that the middle part of the air bag 4 protrudes downwards relative to the outer ring of the air bag 4. At this time, when the air is introduced into the middle of the air bag 4, the middle of the air bag 4 can be rapidly and accurately raised toward the brush 3 (as shown in fig. 2), thereby rapidly and accurately pushing out the brush 3. To improve the fit between the projection 12 and the bladder 4, the edges of the projection 12 are rounded. On this basis, in order to make the middle part of the air bag 4 expand more rapidly, the air bag 4 is in a tightening state when attached to the protrusion 12 and has a certain amount of deformation, especially the connection part between the middle part of the air bag 4 and the edge of the air bag 4 is in a stretching state, and at this time, the middle part of the air bag 4 can expand more rapidly towards the direction of the brush 3 when inflated.
Since the application pushes the brush 3 to move by the bulge of the air bag 4, the expansion and contraction amount of the brush 3 is determined by the bulge amount of the air bag 4, and the expansion amount of the brush 3 out of the groove 11 can be controlled by controlling the inflation amount or air pressure of the air bag 4. Thus, when the abrasion of the brush bristles 33 of the brush 3 becomes short, the amount of inflation or air pressure can be increased to increase the protrusion amount of the brush 3, thereby compensating for the abrasion length of the brush 3.
On this basis, since the brush 3 brushes the polishing pad, the brushing stiffness of the brush 3 is related to the stiffness of the air bag 4, the brushing stiffness is too high, which leads to the consumption of the bristles 33 to be too high, the replacement period of the brush 3 is quickened, and the brushing stiffness is too low, which reduces the brushing efficiency, therefore, the brushing stiffness is usually selected to be an empirically selected range interval value (which can be a preset value) as the initial design stiffness, and the bristles 33 of the brush 3 are shortened along with the loss of the brush 3 in use, and meanwhile, the stiffness of the brush 3 is also improved, and the stiffness of the air bag 4 can be regulated by controlling the pressure of the air bag 4 to ensure that the brushing stiffness is always consistent with the initial design stiffness. In other words, when the brushing stiffness of the brush 3 is at a preset value, the pressure of the air bladder 4 is also at a preset value. When the brushing rigidity of the brush 3 needs to be compensated, the air pressure change of the air bag 4 can be controlled to compensate.
In the present embodiment, as the bristles 33 are consumed, the air pressure is compensated for by the air bag 4 to compensate for the variation in height of the bristles 33 and the variation in rigidity of the bristles 33. Specifically, when the length of the bristles 33 is reduced and the stiffness k of the bristles 33 is increased due to the consumption of the bristles 33 1 To ensure that the designed brushing stiffness of the bristles 33 is maintained at a preset value C, the extension of the brush 3 (compensation of the worn length of the brush 3) can be increased by the compensation air pressure father of the air cell 4 and the designed brushing stiffness can be ensured, and the compensation air pressure father of the air cell 4 can be determined according to the following formula:
，
wherein k is 1 The stiffness of the bristles 33 of the brush 3 is calculated by C, V is the designed brushing stiffness of the bristles 33, V is the initial volume of the air bag 4 when the brush 3 is not consumed and meets the value C, h is the initial height of the air bag 4 when the brush 3 is not consumed and meets the value C, and h is the variation of the height of the bristles 33.
In one embodiment of the brush 3, as shown in fig. 2, it includes a mounting plate 31, a brush body 32 and bristles 33, the mounting plate 31 is disposed in the groove 11, and a sealing strip 34 is disposed between the edge of the mounting plate 31 and the groove 11;
the brush body 32 is detachably arranged on the mounting plate 31, and the brush hair 33 is arranged on the brush body 32;
the second end of the pullback mechanism 5 is attached to the mounting plate 31 with the air bag 4 between the mounting plate 31 and the recess 11.
Specifically, the mounting plate 31 is a hard plate structure, the outline of which is approximately matched with the outline of the groove 11, the second end of the pull-back mechanism 5 can pull the mounting plate 31 to move inwards after being connected with the mounting plate 31, and the middle part of the air bag 4 can push the mounting plate 31 to move outwards when being raised after being contacted with the mounting plate 31. The brush body 32 is fixed on the lower surface (i.e., the surface far away from the air bag 4) of the mounting plate 31, and the brush body 32 and the mounting plate 31 can be fixed by screws or adhesion. Bristles 33 are fixed to the lower surface (i.e., the side remote from the mounting plate 31) of the brush body 32. The bristles 33 may be implanted and fixed within the brush body 32.
In order to prevent external liquid from corroding the air bag 4 through the gap between the edge of the mounting plate 31 and the groove 11, a sealing strip 34 is provided at the edge of the mounting plate 31 in this embodiment, the sealing strip 34 being abutted against the annular side of the groove 11. In one embodiment, the annular seal groove is formed on the annular side of the mounting plate 31, and the sealing strip 34 is sleeved in the annular seal groove.
In the present application, the function of the pullback mechanism 5 is to pull the brush 3 to retract when the air bag 4 is contracted. To ensure that the pull-back mechanism 5 is able to receive the brush 3 back into the recess 11, the second end of the pull-back mechanism 5 applies a force to the brush 3 that moves towards the first end that is greater than the sum of the weight of the brush 3 and the friction between the brush 3 and the recess 11.
In one embodiment, as shown in fig. 2, the pullback mechanism 5 includes a guide rod 51, a jacking 52, and an elastic member 53; the lower end of the guide rod 51 is connected with the mounting plate 31, the upper end of the guide rod 51 slides through the tray body 1 and is connected with the jacking 52, and the elastic piece 53 is arranged between the jacking 52 and the tray body 1.
In particular, it should be noted that the pullback mechanism 5 may be provided in a plurality and uniformly arranged around the center of the tray body 1. The guide rod 51 in the pullback mechanism 5 may be a polished rod structure, and the disc body 1 is provided with a through hole for the guide rod 51 to slide through, and the through hole is communicated into the groove 11. The lower end of the guide rod 51 is fixedly connected with the mounting plate 31, and the upper end of the guide rod passes through the through hole and is fixed with the jacking 52. The diameter of the jacking 52 is larger than that of the guide rod 51, so that the elastic member 53 can be installed between the jacking 52 and the tray body 1. The guide rod 51 and the jacking 52 are movable with the mounting plate 31, that is, with the brush 3. When the brush 3 is pushed out by the air bag 4, the jacking 52 moves toward the direction of the tray 1 and compresses the elastic member 53 to obtain elastic potential energy, and when the air bag 4 is contracted, the brush 3 can be pulled back into the groove 11 by using the elastic potential energy.
The elastic member 53 may be a spring plate or a spring, in order to improve the stability of the structure and facilitate installation, in this embodiment, the elastic member 53 is a spring, the spring is sleeved on the upper end of the guide rod 51, the upper end of the spring abuts against the jacking 52, and the lower end of the spring abuts against the tray body 1.
In order to fix the outer ring of the air bag 4, in this embodiment, the trimming disc further includes a fixing ring 6, where the fixing ring 6 is disposed in the groove 11 and pressed on the edge of the air bag 4, and the fixing ring 6 is fixedly connected with the disc body 1.
In order to realize the rotation of the tray body 1 and supply air to the groove 11 in the tray body 1, as shown in fig. 2 to 4, the trimming tray in the embodiment further comprises a rotating shaft 7, wherein the rotating shaft 7 is arranged on the tray body 1 through a aligning ball bearing and is coaxial with the tray body 1;
the middle part of the rotating shaft 7 is provided with an air passage 71, one side of the rotating shaft 7 is provided with a first vent hole 72, and the disc body 1 is provided with a second vent hole 13;
the air passage 71 is adapted to communicate with an external air source (e.g., with an external air supply device), the second vent hole 13 is in communication with the middle portion of the air bag 4, the first end of the first vent hole 72 is in communication with the air passage 71, and the second end thereof is in communication with the second vent hole 13 via the air duct 73.
In this embodiment, the rotating shaft 7 can drive the disc body 1 to rotate, and the external air source enters the air passage 71 of the rotating shaft 7, sequentially passes through the first air vent 72, the air duct 73 and the second air vent 13, then enters the groove 11 and pushes the middle part of the air bag 4 to bulge. The air duct 73 may be a hose structure, and is externally connected to the tray body 1, and two ends of the air duct 73 may be respectively sleeved and fixed on the first ventilation hole 72 and the second ventilation hole 13.
In order to allow the gas introduced through the second vent hole 13 to act rapidly on the middle portion of the airbag 4, the opening of the second vent hole 13 at the end remote from the gas-guide tube 73 in the present embodiment is located on the boss 12.
Optionally, in order to facilitate air supply during the rotation of the rotating shaft 7, as shown in fig. 1 and 2, the trimming disc in this embodiment further includes a rotary joint 8, where the rotary joint 8 is disposed on the air channel 71 of the rotating shaft 7, and the rotary joint 8 is used to communicate the air channel 71 with an external air source. The trimming disc in the embodiment further comprises a rotating wheel 9, wherein the rotating wheel 9 is sleeved and fixed on the rotating shaft 7 and is used for driving the rotating shaft 7 to rotate.
When air is supplied, the rotating wheel 9 can be driven to rotate so as to drive the rotating shaft 7 to rotate, and then the disc body 1 is driven to rotate. Due to the arrangement of the rotary joint 8, the external air source can still stably enter the air passage 71 of the rotary shaft 7 and thus enter the groove 11 when the rotary shaft 7 rotates. The driving mode of the rotating wheel 9 may be belt driving, gear driving or gas driving, and the present embodiment is not limited thereto.
In order to avoid that external liquid erodes the aligning ball bearing, the rotating shaft 7 or the air bag from eroding the groove 11 through the gap between the guide rod 51 and the disc body 1, the trimming disc in the embodiment further comprises a sealing cover 10, wherein the sealing cover 10 is sealed on the disc body 1, and the elastic piece 53 and the jacking 52 are positioned in the sealing cover 10.
According to another aspect of the present application, there is provided an apparatus for wafer polishing, as shown in fig. 5, comprising the conditioning disk described above.
The above description is only of the preferred embodiments of the present application and is not intended to limit the present application, but various modifications and variations can be made to the present application by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application should be included in the protection scope of the present application.
Claims (11)
1. A conditioning disk, comprising: the device comprises a disc body (1), a grinding disc (2), a hairbrush (3), an air bag (4) and a pull-back mechanism (5); wherein,
the abrasive disc (2) is arranged at the edge of the lower end of the disc body (1), a groove (11) is formed in the lower end of the disc body (1), the brush (3) and the air bag (4) are arranged in the groove (11), and the air bag (4) is arranged between the disc body (1) and the brush (3), so that when the air bag (4) bulges, the air bag (4) pushes the brush (3) to the outside of the groove (11), and bristles (33) of the brush (3) are at least partially exposed below the abrasive disc (2);
the first end of the pull-back mechanism (5) is connected to the disc body (1), the second end of the pull-back mechanism (5) is connected to the brush (3), and the second end of the pull-back mechanism (5) is used for applying acting force to the brush (3) which moves towards the contraction direction of the air bag (4);
compensating for the variation in height of the brush (3) and the variation in rigidity of the bristles (33) by compensating for air pressure to the air bag (4) as the bristles (33) are consumed;
the air bag (4) compensates air pressureAccording to the following formula:
,
wherein k is 1 For the rigidity of the bristles (33) of the brush (3), C is the design brush of the bristles (33)The washing stiffness, V is the volume of the air bag (4) when the C value is met, h is the height of the air bag (4) when the C value is met, and the average h is the variation of the height of the bristles (33).
2. The trimming disc according to claim 1, wherein the recess (11) is internally provided with a protrusion (12), and the protrusion (12) is attached to the middle part of the air bag (4) so as to support the middle part of the air bag (4) to bulge towards the brush (3).
3. A conditioning disc according to claim 1, characterized in that the grooves (11) are provided in the middle of the disc body (1), and the abrasive sheets (2) are arranged in the circumferential direction of the grooves (11).
4. The trimming disc according to claim 1, wherein the brush (3) comprises a mounting plate (31), a brush body (32) and bristles (33), the mounting plate (31) is arranged in the groove (11), and a sealing strip (34) is arranged between the edge of the mounting plate (31) and the groove (11);
the brush body (32) is detachably arranged on the mounting plate (31), and the brush hair (33) is arranged on the brush body (32);
the second end of the pull-back mechanism (5) is connected to the mounting plate (31), and the air bag (4) is located between the mounting plate (31) and the groove (11).
5. The conditioning disk according to claim 4, wherein the pullback mechanism (5) includes a guide rod (51), a jacking (52), and an elastic member (53);
the lower end of the guide rod (51) is connected with the mounting plate (31), the upper end of the guide rod (51) penetrates through the tray body (1) in a sliding mode and is connected with the jacking (52), and the elastic piece (53) is arranged between the jacking (52) and the tray body (1).
6. The trimming disc according to claim 5, wherein the elastic member (53) is provided as a spring, the spring is sleeved on the upper end of the guide rod (51), the upper end of the spring abuts against the jacking (52), and the lower end of the spring abuts against the disc body (1).
7. The trimming disc according to anyone of claims 1 to 6, further comprising a fixing ring (6), wherein the fixing ring (6) is arranged in the groove (11) and is pressed on the edge of the air bag (4), and the fixing ring (6) is fixedly connected with the disc body (1).
8. A conditioning disk according to claim 2, characterized in that the conditioning disk further comprises a spindle (7), the spindle (7) being connected to the disk body (1);
an air passage (71) is arranged in the rotating shaft (7), a first vent hole (72) is formed in one side of the rotating shaft (7), and a second vent hole (13) is formed in the disc body (1);
the air passage (71) is used for communicating an external air source, the second ventilation hole (13) is communicated with the middle part of the air bag (4), the first end of the first ventilation hole (72) is communicated with the air passage (71), and the second end of the first ventilation hole is communicated with the second ventilation hole (13) through the air duct (73).
9. A conditioning disk according to claim 8, characterized in that an opening in the end of the second ventilation hole (13) remote from the air duct (73) is located on the boss (12).
10. The conditioning disk according to claim 5 or 6, further comprising a sealing cover (10), the sealing cover (10) being encapsulated on the disk body (1), the elastic member (53) and the jacking (52) being located in the sealing cover (10).
11. An apparatus for wafer polishing comprising a conditioning disk according to any of claims 1 to 10.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202311149912.0A CN116872090B (en) | 2023-09-07 | 2023-09-07 | Dressing disk and device for polishing wafer |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311149912.0A CN116872090B (en) | 2023-09-07 | 2023-09-07 | Dressing disk and device for polishing wafer |
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| CN116872090A CN116872090A (en) | 2023-10-13 |
| CN116872090B true CN116872090B (en) | 2023-11-14 |
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| CN202311149912.0A Active CN116872090B (en) | 2023-09-07 | 2023-09-07 | Dressing disk and device for polishing wafer |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007167962A (en) * | 2005-12-19 | 2007-07-05 | Ebara Corp | Dresser, polisher and dressing method |
| TW201609318A (en) * | 2014-09-11 | 2016-03-16 | China Grinding Wheel Corp | Polishing pad dresser with brushing element |
| CN108098590A (en) * | 2017-12-21 | 2018-06-01 | 东莞华晶粉末冶金有限公司 | The trimmer and its dressing method of a kind of grinding and polishing pad |
| CN109483403A (en) * | 2018-12-25 | 2019-03-19 | 上海致领半导体科技发展有限公司 | A kind of polishing pad brush with grooming function |
| CN210588808U (en) * | 2019-06-28 | 2020-05-22 | 华海清科股份有限公司 | Trimming head |
| CN210650167U (en) * | 2019-09-29 | 2020-06-02 | 深圳赛贝尔自动化设备有限公司 | Upper polishing disc mechanism |
| CN112077743A (en) * | 2020-09-24 | 2020-12-15 | 上海新昇半导体科技有限公司 | Polishing pad dresser, polishing apparatus and method |
| CN215588840U (en) * | 2021-07-20 | 2022-01-21 | 上海汉虹精密机械有限公司 | Automatically cleaning polishing skin trimmer |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018063242A1 (en) * | 2016-09-29 | 2018-04-05 | Intel Corporation | Chemical-mechanical planarization (cmp) pad conditioner brush-and-abrasive hybrid for multi-step, preparation- and restoration-conditioning process of cmp pad |
-
2023
- 2023-09-07 CN CN202311149912.0A patent/CN116872090B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007167962A (en) * | 2005-12-19 | 2007-07-05 | Ebara Corp | Dresser, polisher and dressing method |
| TW201609318A (en) * | 2014-09-11 | 2016-03-16 | China Grinding Wheel Corp | Polishing pad dresser with brushing element |
| CN108098590A (en) * | 2017-12-21 | 2018-06-01 | 东莞华晶粉末冶金有限公司 | The trimmer and its dressing method of a kind of grinding and polishing pad |
| CN109483403A (en) * | 2018-12-25 | 2019-03-19 | 上海致领半导体科技发展有限公司 | A kind of polishing pad brush with grooming function |
| CN210588808U (en) * | 2019-06-28 | 2020-05-22 | 华海清科股份有限公司 | Trimming head |
| CN210650167U (en) * | 2019-09-29 | 2020-06-02 | 深圳赛贝尔自动化设备有限公司 | Upper polishing disc mechanism |
| CN112077743A (en) * | 2020-09-24 | 2020-12-15 | 上海新昇半导体科技有限公司 | Polishing pad dresser, polishing apparatus and method |
| CN215588840U (en) * | 2021-07-20 | 2022-01-21 | 上海汉虹精密机械有限公司 | Automatically cleaning polishing skin trimmer |
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| CN116872090A (en) | 2023-10-13 |
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