CN116382032A - High-stability black nano dispersion liquid suitable for LCD photoresist - Google Patents
High-stability black nano dispersion liquid suitable for LCD photoresist Download PDFInfo
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- CN116382032A CN116382032A CN202310073671.XA CN202310073671A CN116382032A CN 116382032 A CN116382032 A CN 116382032A CN 202310073671 A CN202310073671 A CN 202310073671A CN 116382032 A CN116382032 A CN 116382032A
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- carbon black
- lcd
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- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 34
- 239000006185 dispersion Substances 0.000 title claims abstract description 21
- 239000007788 liquid Substances 0.000 title abstract description 10
- 239000006229 carbon black Substances 0.000 claims abstract description 109
- 239000000049 pigment Substances 0.000 claims abstract description 43
- 150000001721 carbon Chemical class 0.000 claims abstract description 41
- 238000005406 washing Methods 0.000 claims abstract description 35
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 28
- 238000001035 drying Methods 0.000 claims abstract description 23
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 claims abstract description 21
- QOMNJPSRBRDQSU-UHFFFAOYSA-N 5-aminobenzimidazol-2-one Chemical compound C1=C(N)C=CC2=NC(=O)N=C21 QOMNJPSRBRDQSU-UHFFFAOYSA-N 0.000 claims abstract description 21
- 239000004925 Acrylic resin Substances 0.000 claims abstract description 19
- 229920000178 Acrylic resin Polymers 0.000 claims abstract description 19
- 239000002270 dispersing agent Substances 0.000 claims abstract description 18
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 14
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 9
- 239000002904 solvent Substances 0.000 claims abstract description 7
- 239000000203 mixture Substances 0.000 claims description 26
- 238000000498 ball milling Methods 0.000 claims description 17
- 238000002791 soaking Methods 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 239000008367 deionised water Substances 0.000 claims description 13
- 229910021641 deionized water Inorganic materials 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 13
- 238000002156 mixing Methods 0.000 claims description 13
- UYAAVKFHBMJOJZ-UHFFFAOYSA-N diimidazo[1,3-b:1',3'-e]pyrazine-5,10-dione Chemical compound O=C1C2=CN=CN2C(=O)C2=CN=CN12 UYAAVKFHBMJOJZ-UHFFFAOYSA-N 0.000 claims description 8
- 229940116423 propylene glycol diacetate Drugs 0.000 claims description 8
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 4
- -1 urethane compound Chemical class 0.000 claims description 4
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 claims description 3
- 241000872198 Serjania polyphylla Species 0.000 claims description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 2
- ZAKAONRTRWRIJT-UHFFFAOYSA-N ethyl 3-ethoxy-3-iminopropanoate Chemical compound CCOC(=N)CC(=O)OCC ZAKAONRTRWRIJT-UHFFFAOYSA-N 0.000 claims description 2
- 229920000768 polyamine Polymers 0.000 claims description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000009210 therapy by ultrasound Methods 0.000 abstract description 18
- 239000002245 particle Substances 0.000 abstract description 13
- 230000002776 aggregation Effects 0.000 abstract description 3
- 238000004220 aggregation Methods 0.000 abstract description 2
- 238000005119 centrifugation Methods 0.000 abstract description 2
- 238000002360 preparation method Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 8
- 239000011159 matrix material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000011162 core material Substances 0.000 description 2
- 239000011258 core-shell material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 1
- KAESVJOAVNADME-UHFFFAOYSA-N 1H-pyrrole Natural products C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 238000003921 particle size analysis Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- FKRCODPIKNYEAC-UHFFFAOYSA-N propionic acid ethyl ester Natural products CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N pyridine Substances C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Abstract
The invention relates to a high-stability black nano dispersion liquid suitable for LCD photoresist, belonging to the technical field of LCD photoresist. The nano-dispersion liquid of the invention comprises modified carbon black pigment, acrylic resin, dispersing agent and solvent. The carbon black is cleaned, soaked in sulfuric acid solution or nitric acid solution, then mixed with 5-aminobenzimidazolone and 2-undecylimidazole in a ball mill, then added into ultrasonic absolute ethyl alcohol, and subjected to ultrasonic treatment, centrifugation, washing and drying to obtain the modified carbon black pigment, wherein the modified carbon black pigment can effectively prevent particle aggregation of the carbon black pigment, and the modified carbon black pigment can interact with acrylic resin to improve the stability of dispersion liquid.
Description
Technical Field
The invention belongs to the technical field of LCD photoresists, and relates to a high-stability black nano dispersion liquid suitable for LCD photoresists.
Background
In the display field, TFT-LCD (thin film transistor liquid crystal display) is the mainstream of the market, and Color Filter (CF) is one of the most important main materials of LCD (liquid crystal display), so that the liquid crystal display realizes colorization, and it directly determines the quality of color image of the display. The color photoresist and the black photoresist are core materials for preparing the color filter, account for about 27% of the cost of the color filter, and the color paste is an important material for preparing the photoresist and is one of 35 key technologies published by the current science and technology department.
The color paste has the main function of coloring the black matrix photoresist and simultaneously affecting the resistance, the light shielding property, the morphology and other performances of the black matrix. The main components of the color paste used for the black matrix photoresist comprise carbon black, a solvent, a dispersing agent and the like, wherein the carbon black is black conductive particles, the carbon black particles are processed into nano-sized particles through grinding, dispersing and other processes, the particle size of the carbon black particles is less than 100nm, and extremely high requirements are imposed on dispersion stability, so that the dispersing agent is added into the color paste, the carbon black particles are difficult to agglomerate, and a certain amount of dispersing resin is added into the color paste in order to improve the stability of the black matrix photoresist. However, the stability of the black paste in the prior art is still further improved.
Disclosure of Invention
The invention aims to provide a high-stability black nano dispersion liquid suitable for LCD photoresist, and belongs to the technical field of LCD photoresist. The nano-dispersion liquid of the invention comprises modified carbon black pigment, acrylic resin, dispersing agent and solvent. The carbon black is cleaned, soaked in sulfuric acid solution or nitric acid solution, then mixed with 5-aminobenzimidazolone and 2-undecylimidazole in a ball mill, then added into ultrasonic absolute ethyl alcohol, and subjected to ultrasonic treatment, centrifugation, washing and drying to obtain the modified carbon black pigment, wherein the modified carbon black pigment can effectively prevent particle aggregation of the carbon black pigment, can form interaction with acrylic resin, and improves the stability of dispersion liquid.
The aim of the invention can be achieved by the following technical scheme:
a high stability black nanodispersion suitable for use in LCD photoresists, the nanodispersion comprising 9-17 parts by weight of an acrylic resin, 15-25 parts by weight of a modified carbon black pigment, 10-20 parts by weight of a dispersant, and 94-125 parts by weight of a solvent.
As a preferred technical scheme of the invention, the preparation method of the modified carbon black pigment comprises the following steps:
(1) Washing carbon black with deionized water, adding the carbon black into sulfuric acid solution or nitric acid solution for soaking, washing and drying to obtain pretreated carbon black;
(2) Ball-milling and mixing the pretreated carbon black, 5-aminobenzimidazolone and 2-undecylimidazole in a ball mill to obtain a mixture;
(3) Adding the mixture into absolute ethyl alcohol which is being sonicated, centrifuging, washing and drying to obtain the modified carbon black pigment.
As a preferable technical scheme of the invention, the temperature of the deionized water in the step (1) is 50-65 ℃.
As a preferable technical scheme of the invention, the concentration of the sulfuric acid solution or the nitric acid solution in the step (1) is 1-4mol/L.
As a preferable technical scheme of the invention, the soaking time in the step (1) is 30-60min.
As a preferable technical scheme of the invention, the mass ratio of the pretreated carbon black, the 5-aminobenzimidazolone and the 2-undecylimidazole in the step (2) is 100:8-15:12-25.
As a preferable technical scheme of the invention, the rotating speed of the ball milling in the step (2) is 500-800rpm, the ball-material ratio is 2-3:1, and the ball milling time is 1-2h.
As a preferable technical scheme of the invention, the adding speed of the mixture in the step (3) is controlled to be 0.1-0.3g/s, the ultrasonic time is 2-3h, and the ultrasonic frequency is 100-150KHz.
In a preferred embodiment of the present invention, the dispersant is at least one of a polyamine compound, a urethane compound, and an acrylic compound.
As a preferable technical scheme of the invention, the solvent is at least one of propylene glycol methyl ether acetate, propylene glycol diacetate, 3-ethoxy-3-imine ethyl propionate, cyclopentanone, cyclohexanone, diethylene glycol methyl ethyl ether and diethylene glycol dibutyl ether.
The invention has the beneficial effects that:
(1) The method comprises the steps of washing carbon black with hot water, soaking the carbon black in sulfuric acid solution or nitric acid solution, carrying active groups such as hydroxyl, carboxyl and the like on the surface of the carbon black after soaking treatment, and enhancing the interaction between the subsequent carbon black and 5-aminobenzimidazolone and 2-undecylimidazole;
(2) According to the invention, 5-aminobenzimidazolone and 2-undecylimidazole are selected for carrying out surface modification on carbon black, firstly, the pretreated carbon black, the 5-aminobenzimidazolone and the 2-undecylimidazole are subjected to ball milling mixing, the particle size of the carbon black, the 5-aminobenzimidazolone and the 2-undecylimidazole is reduced by ball milling mixing, and meanwhile, the three are distributed more uniformly; then adding the mixture into ultrasonic absolute ethyl alcohol at a controlled speed, performing ultrasonic dispersion, promoting pyrrole N atoms and pyridine N atoms in 5-aminobenzimidazolone and 2-undecylimidazole to interact with carbon black, and wrapping the carbon black to form a core-shell structure taking carbon black as a core and 5-aminobenzimidazolone and 2-undecylimidazole as shells, so that the agglomeration phenomenon of carbon black particles can be obviously reduced;
(3) In a core-shell structure formed by the modified carbon black pigment, the amino group in the 5-aminobenzimidazolone and the acrylic resin have stronger hydrogen bond acting force, and meanwhile, the linear structure of the long-chain alkyl group in the 2-undecylimidazole and the acrylic resin interact through an intertwining mechanism, so that the dispersibility of the carbon black in the acrylic resin is further enhanced, and the system stability of the nano dispersion liquid is enhanced.
Detailed Description
In order to further describe the technical means and effects adopted by the present invention for achieving the intended purpose, the following detailed description is given below with reference to the embodiments, structures, features and effects according to the present invention.
Example 1
A high stability black nanodispersion suitable for use in LCD photoresists, the nanodispersion comprising 9 parts by weight of acrylic resin, 18 parts by weight of modified carbon black pigment, 12 parts by weight of dispersant BYK161 and 119 parts by weight propylene glycol methyl ether acetate.
The preparation method of the modified carbon black pigment comprises the following steps:
(1) Washing carbon black N330 with deionized water at 52 ℃, adding the washed carbon black N330 into sulfuric acid solution with the concentration of 2mol/L, soaking for 50min, washing and drying to obtain pretreated carbon black;
(2) Ball-milling and mixing the pretreated carbon black, 5-aminobenzimidazolone and 2-undecylimidazole in a ball mill at 600rpm for 1.2 hours according to the mass ratio of 100:9:19, wherein the ball-material ratio is 2:1, so as to obtain a mixture;
(3) Adding the mixture into anhydrous ethanol under ultrasonic treatment at a speed of 0.15g/s, performing ultrasonic treatment at 120KHz for 2 hours, centrifuging, washing, and drying to obtain the modified carbon black pigment.
Example 2
A high stability black nanodispersion suitable for use in LCD photoresists, the nanodispersion comprising 11 parts by weight acrylic resin, 15 parts by weight modified carbon black pigment, 15 parts by weight dispersant BYK9076 and 108 parts by weight diethylene glycol dibutyl ether.
The preparation method of the modified carbon black pigment comprises the following steps:
(1) Washing carbon black N330 with deionized water at 58 ℃, adding the washed carbon black N330 into a nitric acid solution with the concentration of 1.5mol/L, soaking for 50min, washing and drying to obtain pretreated carbon black;
(2) Ball-milling and mixing the pretreated carbon black, 5-aminobenzimidazolone and 2-undecylimidazole in a ball mill at 680rpm for 2 hours according to the mass ratio of 100:11:16, wherein the ball-material ratio is 2:1, so as to obtain a mixture;
(3) Adding the mixture into anhydrous ethanol under ultrasonic treatment at a speed of 0.2g/s, performing ultrasonic treatment at 100KHz for 3 hours, centrifuging, washing, and drying to obtain the modified carbon black pigment.
Example 3
A high stability black nanodispersion suitable for use in LCD photoresists, the nanodispersion comprising 14 parts by weight acrylic resin, 20 parts by weight modified carbon black pigment, 11 parts by weight dispersant BYK2000 and 99 parts by weight ethyl 3-ethoxy-3-iminopropionate.
The preparation method of the modified carbon black pigment comprises the following steps:
(1) Washing carbon black N330 with deionized water at 60 ℃, adding the carbon black N330 into nitric acid solution with the concentration of 3mol/L, soaking for 60min, washing and drying to obtain pretreated carbon black;
(2) Ball-milling and mixing the pretreated carbon black, 5-aminobenzimidazolone and 2-undecylimidazole in a ball mill at 750rpm for 2 hours according to a mass ratio of 100:15:21, wherein the ball-material ratio is 3:1, so as to obtain a mixture;
(3) The mixture is added into absolute ethanol which is being sonicated at a speed of 0.3g/s, after being sonicated for 2.5 hours at 150KHz, the mixture is centrifuged, washed and dried, thus obtaining the modified carbon black pigment.
Example 4
A high stability black nanodispersion suitable for use in LCD photoresists, the nanodispersion comprising 15 parts by weight acrylic resin, 22 parts by weight modified carbon black pigment, 17 parts by weight dispersant Efka PX4330 and 95 parts by weight cyclopentanone.
The preparation method of the modified carbon black pigment comprises the following steps:
(1) Washing carbon black N330 with deionized water at 50 ℃, adding the carbon black N330 into sulfuric acid solution with the concentration of 4mol/L, soaking for 55min, washing and drying to obtain pretreated carbon black;
(2) Ball-milling and mixing the pretreated carbon black, 5-aminobenzimidazolone and 2-undecylimidazole in a ball mill at 800rpm for 1.5 hours according to the mass ratio of 100:10:19, wherein the ball-material ratio is 3:1, so as to obtain a mixture;
(3) Adding the mixture into anhydrous ethanol under ultrasonic treatment at a speed of 0.1g/s, performing ultrasonic treatment at 150KHz for 3 hours, centrifuging, washing, and drying to obtain the modified carbon black pigment.
Example 5
A high stability black nanodispersion suitable for use in LCD photoresists, the nanodispersion comprising 17 parts by weight acrylic resin, 18 parts by weight modified carbon black pigment, 11 parts by weight dispersant Efka PX4330 and 110 parts by weight propylene glycol diacetate.
The preparation method of the modified carbon black pigment comprises the following steps:
(1) Washing carbon black N330 with deionized water at 65 ℃, adding the carbon black N330 into sulfuric acid solution with the concentration of 2mol/L, soaking for 30min, washing and drying to obtain pretreated carbon black;
(2) Ball-milling and mixing the pretreated carbon black, 5-aminobenzimidazolone and 2-undecylimidazole in a ball mill at 700rpm for 2 hours according to the mass ratio of 100:13:25, wherein the ball-material ratio is 2:1, so as to obtain a mixture;
(3) Adding the mixture into anhydrous ethanol under ultrasonic treatment at a speed of 0.2g/s, performing ultrasonic treatment at 150KHz for 2 hours, centrifuging, washing, and drying to obtain the modified carbon black pigment.
Comparative example 1
A high stability black nanodispersion suitable for use in LCD photoresists, the nanodispersion comprising 17 parts by weight acrylic resin, 18 parts by weight carbon black, 11 parts by weight dispersant Efka PX4330 and 110 parts by weight propylene glycol diacetate.
Comparative example 2
A high stability black nanodispersion suitable for use in LCD photoresists, the nanodispersion comprising 17 parts by weight acrylic resin, 18 parts by weight modified carbon black pigment, 11 parts by weight dispersant Efka PX4330 and 110 parts by weight propylene glycol diacetate.
The preparation method of the modified carbon black pigment comprises the following steps:
(1) Washing carbon black N330 with deionized water at 65 ℃, adding the carbon black N330 into sulfuric acid solution with the concentration of 2mol/L, soaking for 30min, washing and drying to obtain pretreated carbon black;
(2) Ball-milling and mixing the pretreated carbon black and 5-aminobenzimidazolone in a ball mill at 700rpm for 2 hours according to a mass ratio of 100:38, wherein the ball-material ratio is 2:1, so as to obtain a mixture;
(3) Adding the mixture into anhydrous ethanol under ultrasonic treatment at a speed of 0.2g/s, performing ultrasonic treatment at 150KHz for 2 hours, centrifuging, washing, and drying to obtain the modified carbon black pigment.
Comparative example 3
A high stability black nanodispersion suitable for use in LCD photoresists, the nanodispersion comprising 17 parts by weight acrylic resin, 18 parts by weight modified carbon black pigment, 11 parts by weight dispersant Efka PX4330 and 110 parts by weight propylene glycol diacetate.
The preparation method of the modified carbon black pigment comprises the following steps:
(1) Washing carbon black N330 with deionized water at 65 ℃, adding the carbon black N330 into sulfuric acid solution with the concentration of 2mol/L, soaking for 30min, washing and drying to obtain pretreated carbon black;
(2) Ball-milling and mixing the pretreated carbon black and 2-undecylimidazole in a ball mill at 700rpm for 2 hours according to a mass ratio of 100:38, wherein the ball-material ratio is 2:1, so as to obtain a mixture;
(3) Adding the mixture into anhydrous ethanol under ultrasonic treatment at a speed of 0.2g/s, performing ultrasonic treatment at 150KHz for 2 hours, centrifuging, washing, and drying to obtain the modified carbon black pigment.
Comparative example 4
A high stability black nanodispersion suitable for use in LCD photoresists, the nanodispersion comprising 17 parts by weight acrylic resin, 18 parts by weight modified carbon black pigment, 11 parts by weight dispersant Efka PX4330 and 110 parts by weight propylene glycol diacetate.
The preparation method of the modified carbon black pigment comprises the following steps:
(1) Washing carbon black N330 with deionized water at 65 ℃, adding the carbon black N330 into sulfuric acid solution with the concentration of 2mol/L, soaking for 30min, washing and drying to obtain pretreated carbon black;
(2) Ball-milling and mixing the pretreated carbon black, 5-aminobenzimidazolone and 2-undecylimidazole in a ball mill at 700rpm for 2 hours according to the mass ratio of 100:7:31, wherein the ball-material ratio is 2:1, so as to obtain a mixture;
(3) Adding the mixture into anhydrous ethanol under ultrasonic treatment at a speed of 0.2g/s, performing ultrasonic treatment at 150KHz for 2 hours, centrifuging, washing, and drying to obtain the modified carbon black pigment.
Comparative example 5
A high stability black nanodispersion suitable for use in LCD photoresists, the nanodispersion comprising 17 parts by weight acrylic resin, 18 parts by weight modified carbon black pigment, 11 parts by weight dispersant Efka PX4330 and 110 parts by weight propylene glycol diacetate.
The preparation method of the modified carbon black pigment comprises the following steps:
(1) Washing carbon black N330 with deionized water at 65 ℃, adding the carbon black N330 into sulfuric acid solution with the concentration of 2mol/L, soaking for 30min, washing and drying to obtain pretreated carbon black;
(2) Ball-milling and mixing the pretreated carbon black, 5-aminobenzimidazolone and 2-undecylimidazole in a ball mill at 700rpm for 2 hours according to the mass ratio of 100:25:13, wherein the ball-material ratio is 2:1, so as to obtain a mixture;
(3) Adding the mixture into anhydrous ethanol under ultrasonic treatment at a speed of 0.2g/s, performing ultrasonic treatment at 150KHz for 2 hours, centrifuging, washing, and drying to obtain the modified carbon black pigment.
Performance testing
The average particle size of the nanodispersions of examples 1-5 and comparative examples 1-5 were tested according to the national standard GB/T29022-2021 particle size analysis dynamic light Scattering method.
The initial viscosities of the nanodispersions of examples 1 to 5 and comparative examples 1 to 5 were tested according to the national standard GB/T5561-2012 method for measuring viscosity and flow properties of surfactants by means of a rotational viscometer and the viscosities of the nanodispersions after one week at room temperature.
The test results are shown in Table 1.
TABLE 1 particle size and viscosity of nanodispersions
As can be seen from the test results in Table 1, the nano-dispersions of comparative examples 1 to 5 are each larger in particle size than those of examples 1 to 5 and are each larger in viscosity than those of examples 1 to 5.
The present invention is not limited to the above embodiments, but is capable of modification and variation in detail, and other modifications and variations can be made by those skilled in the art without departing from the scope of the present invention.
Claims (10)
1. A high stability black nano-dispersion suitable for LCD photoresists, characterized in that the nano-dispersion comprises 9-17 parts by weight of acrylic resin, 15-25 parts by weight of modified carbon black pigment, 10-20 parts by weight of dispersant and 94-125 parts by weight of solvent.
2. The high stability black nanodispersion for LCD photoresists of claim 1 wherein the process for preparing the modified carbon black pigment comprises the steps of:
(1) Washing carbon black with deionized water, adding the carbon black into sulfuric acid solution or nitric acid solution for soaking, washing and drying to obtain pretreated carbon black;
(2) Ball-milling and mixing the pretreated carbon black, 5-aminobenzimidazolone and 2-undecylimidazole in a ball mill to obtain a mixture;
(3) Adding the mixture into absolute ethyl alcohol which is being sonicated, centrifuging, washing and drying to obtain the modified carbon black pigment.
3. A high stability black nano-dispersion for LCD photoresists according to claim 2, wherein said deionized water in step (1) has a temperature of 50-65 ℃.
4. A high stability black nano-dispersion for LCD photoresists according to claim 2, wherein the concentration of said sulfuric acid solution or nitric acid solution in step (1) is 1-4mol/L.
5. A high stability black nano-dispersion for LCD photoresists according to claim 2, wherein said soaking time of step (1) is 30-60min.
6. A high stability black nanodispersion for LCD photoresist according to claim 2, wherein the mass ratio of the pretreated carbon black, 5-aminobenzimidazolone, 2-undecylimidazole in step (2) is 100:8-15:12-25.
7. The high stability black nano-dispersion for LCD photoresists according to claim 2, wherein the ball milling in step (2) has a rotational speed of 500-800rpm, a ball-to-material ratio of 2-3:1, and a ball milling time of 1-2h.
8. A high stability black nano-dispersion for LCD photoresists according to claim 2, wherein the addition rate of said mixture in step (3) is controlled to be 0.1-0.3g/s, said ultrasonic time is 2-3h, and said ultrasonic frequency is 100-150KHz.
9. The black nano-dispersion of claim 1, wherein the dispersing agent is at least one of polyamine compound, urethane compound, and acrylic compound.
10. The high stability black nano-dispersion for LCD photoresists of claim 1, wherein said solvent is at least one of propylene glycol methyl ether acetate, propylene glycol diacetate, ethyl 3-ethoxy-3-iminopropionate, cyclopentanone, cyclohexanone, diethylene glycol methyl ether, diethylene glycol dibutyl ether.
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