CN116282865A - Online removing system and method for high-energy radiation defects of optical element - Google Patents
Online removing system and method for high-energy radiation defects of optical element Download PDFInfo
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- CN116282865A CN116282865A CN202211489561.3A CN202211489561A CN116282865A CN 116282865 A CN116282865 A CN 116282865A CN 202211489561 A CN202211489561 A CN 202211489561A CN 116282865 A CN116282865 A CN 116282865A
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- 230000003287 optical effect Effects 0.000 title claims abstract description 110
- 230000007547 defect Effects 0.000 title claims abstract description 37
- 230000005855 radiation Effects 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims abstract description 11
- 238000004093 laser heating Methods 0.000 claims abstract description 63
- 238000010438 heat treatment Methods 0.000 claims abstract description 55
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 52
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 26
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 26
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 21
- 230000000750 progressive effect Effects 0.000 claims abstract description 13
- 238000000137 annealing Methods 0.000 claims description 20
- 239000010453 quartz Substances 0.000 claims description 6
- 238000012544 monitoring process Methods 0.000 claims description 3
- 239000005350 fused silica glass Substances 0.000 abstract description 12
- 230000004927 fusion Effects 0.000 abstract description 7
- 238000002474 experimental method Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
- C03B25/02—Annealing glass products in a discontinuous way
Abstract
The invention provides an on-line removing system and method for high-energy radiation defects of an optical element, wherein the on-line removing system comprises a control observation module and a carbon dioxide laser heating device, and the carbon dioxide laser heating device comprises a laser heating component, an indicating laser and a thermal infrared imager; the invention carries out progressive scanning heating on the fused quartz optical element by laser at a long distance, and removes high-energy radiation defects on the surface and inside of the optical element by utilizing the high temperature of laser heating, namely, the invention can remove electronic state defects only by short on-line heat treatment on the optical element, recover the performance of the optical element, and does not need to detach, install and assemble optical components, thereby being a non-contact energy beam heating mode, not polluting the surface of the optical element and improving the effective utilization rate of a laser fusion device and a magnetic restraint device which are provided with the fused quartz optical element.
Description
Technical Field
The invention belongs to the technical field of optical element repair, and particularly relates to an optical element high-energy radiation defect online removing system and method.
Background
Radiation resistant optical glasses, typified by fused silica glass, are widely used in the field of high-energy radiation such as laser fusion and magneto-restrictive fusion, in which optical components are subjected to instantaneous or sustained high-energy rays and particle radiation. High-energy rays and particle radiation can damage the covalent bond structure of the solid, and electron state defects are generated on the surface and inside of the glass material, and experiments prove that the defects generated by the radiation are gradually accumulated, so that the optical and mechanical properties of the optical element can be reduced, and the laser damage threshold is lowered. The minor defects generated by radiation can cause catastrophic damage to the system during operation when strong laser is loaded, so that the elements are invalid, and the safety and stability of the system operation are seriously threatened.
Electronic state defects generated by high-energy radiation are removed mainly by off-line annealing furnace heating annealing at present, and experiments prove that most of radiation defects can be removed only at the temperature of more than 500 ℃ for a fused quartz element. Annealing by annealing furnace has the following problems:
(1) These fused silica components are all fixed in the optical path system and are large in size, e.g., the silica window of the laser condensing device and the silica shielding assembly are about half a meter in size, and annealing in an annealing furnace requires removal of the optical assembly, but the large-sized optical assembly is difficult to disassemble and reassemble.
(2) The laser condensing device optical piece needs a high-cleanliness environment, and the offline annealing furnace annealing can influence the cleanliness of the element, so that secondary pollution of the element is caused, and the optical performance of the element is influenced.
(3) In the running large devices such as laser fusion and magnetic confinement fusion, taking off the optical component and off-line annealing inevitably affects the normal running of the system for a long time, and the effective utilization rate of the device is reduced.
Disclosure of Invention
In order to solve the problems, the invention provides the system and the method for removing the high-energy radiation defects of the optical element on line, which can realize the on-line high-temperature annealing of the optical element, avoid the secondary pollution without disassembling the element, and have definite engineering significance.
An optical element high-energy radiation defect online removing system comprises a control observation module and a carbon dioxide laser heating device, wherein the carbon dioxide laser heating device comprises a laser heating component, an indication laser and a thermal infrared imager, and heating laser emitted by the laser heating component and indication laser emitted by the indication laser share a light path;
the indicating laser is used for emitting indicating laser under the control of the control observation module, and the indicating laser is used for adjusting the relative position between the laser heating component and the optical element to be annealed so that the laser heating component is aligned to the center of the optical element, wherein the optical element is a quartz window element at the forefront end or a quartz shielding element at the extreme tail end in a laser light path to be annealed;
the laser heating component is used for emitting heating laser under the control of the control observation module and heating the optical element;
the thermal infrared imager is used for monitoring the temperature of the optical element in real time and feeding the temperature back to the control and observation module;
the control observation module is used for adjusting the power of heating laser emitted by the laser heating assembly according to the temperature, so that the temperature of a heating area on the optical element is the temperature required by annealing treatment.
Further, the laser heating component comprises a scanning galvanometer, a beam expander, a dichroic mirror and a carbon dioxide laser;
the carbon dioxide laser is used for emitting heating laser under the control of the control observation module, the heating laser is incident to the beam expander for beam expansion after passing through the dichroic mirror, the heating laser after beam expansion is incident to the scanning vibration mirror, the scanning vibration mirror adopts the heating laser after beam expansion for progressive scanning of the optical element, wherein the progressive scanning path and the progressive scanning speed of the scanning vibration mirror are adjusted by the control observation module according to the temperature fed back by the thermal infrared imager.
Further, the indication laser emitted by the indication laser is reflected to the beam expander through the dichroic mirror to expand the beam, the expanded indication laser is incident to the scanning galvanometer, and the scanning galvanometer aligns the expanded indication laser to the center of the optical element, so that alignment between the laser heating assembly and the optical element is realized.
Further, the laser heating component, the indicating laser and the thermal infrared imager are integrated and packaged in the shell.
Further, the temperature required for the annealing treatment is 500-800 ℃.
An on-line removal method for high-energy radiation defects of an optical element is characterized by comprising the following steps:
s1: placing a carbon dioxide laser heating device in a set neighborhood range of an optical element to be annealed;
s2: the indicating light laser is turned on by controlling the observation module, so that the indicating laser is incident to the center of the optical element, and the alignment between the laser heating assembly and the optical element is realized;
s3: the infrared thermal imager is opened through the control observation module, the temperature of the optical element is monitored in real time through the infrared thermal imager, and then the temperature is fed back to the control observation module;
s4: opening a laser heating assembly by controlling the observation module so that heating laser heats the optical element;
s5: adjusting the power of heating laser emitted by the laser heating component according to the temperature, so that the temperature of a heating area on the optical element is the temperature required by annealing treatment;
s6: after the heating is completed, the carbon dioxide laser heating device is moved away.
The beneficial effects are that:
1. the invention provides an on-line removing system for high-energy radiation defects of an optical element, which is characterized in that a laser is used for remotely carrying out progressive scanning heating on a fused quartz optical element, and the high-energy radiation defects on the surface and in the interior of the optical element are removed by utilizing the high temperature of the laser heating, namely, the invention can remove electronic state defects only by short on-line heat treatment of the optical element, recover the performance of the optical element, and does not need to detach, install and assemble optical components, thereby being a non-contact energy beam heating mode, avoiding pollution to the surface of the optical element and improving the effective utilization rate of a laser fusion device and a magnetic restraint device which are provided with the fused quartz optical element.
2. The invention provides an on-line removing system for high-energy radiation defects of an optical element, which integrates and encapsulates a laser heating component, an indicating laser and a thermal infrared imager in a shell, has the advantages of high integration level, small volume and convenience in moving and placing on site, and can effectively realize on-line high-temperature annealing of the optical element.
3. The invention provides an on-line removing system for high-energy radiation defects of an optical element, wherein the laser heating temperature is 500-800 ℃ far lower than the softening point 1350 ℃ of a fused quartz element, and the surface morphology and mechanical properties of the element are not affected.
4. The invention provides an on-line removing method for high-energy radiation defects of an optical element, which is characterized in that a laser is used for remotely carrying out progressive scanning heating on a fused quartz optical element, and the high-energy radiation defects on the surface and in the interior of the optical element are removed by utilizing the high temperature of the laser heating, namely, the invention can remove electronic state defects only by short on-line heat treatment of the optical element, recover the performance of the optical element, and does not need to detach, install and assemble optical components, thereby being a non-contact energy beam heating mode, avoiding pollution to the surface of the optical element and improving the effective utilization rate of a laser fusion device and a magnetic restraint device which are provided with the fused quartz optical element.
Drawings
FIG. 1 is a schematic diagram of an on-line system for removing high-energy radiation defects of an optical element according to the present invention;
fig. 2 is a flowchart of a method for online removing high-energy radiation defects of an optical element according to the present invention.
Detailed Description
In order to enable those skilled in the art to better understand the present application, the following description will make clear and complete descriptions of the technical solutions in the embodiments of the present application with reference to the accompanying drawings in the embodiments of the present application.
As shown in fig. 1, the system for removing the high-energy radiation defect of the optical element provided by the invention comprises a control observation module and a carbon dioxide laser heating device, wherein the carbon dioxide laser heating device comprises a laser heating component, an indicating laser and a thermal infrared imager, and heating laser emitted by the laser heating component and indicating laser emitted by the indicating laser share a light path; the laser heating component comprises a scanning galvanometer, a beam expander, a dichroic mirror and a carbon dioxide laser.
The indicating laser is used for emitting indicating laser under the control of the control observation module, and the indicating laser is used for adjusting the relative position between the laser heating component and the optical element to be annealed so that the laser heating component is aligned to the center of the optical element, wherein the optical element is a quartz window element at the forefront end or a quartz shielding element at the extreme tail end in a laser light path to be annealed. Specifically, the indication laser emitted by the indication laser is reflected to the beam expander through the dichroic mirror to expand the beam, the expanded indication laser is incident to the scanning galvanometer, and the scanning galvanometer aligns the expanded indication laser with the center of the optical element, so that the alignment between the laser heating assembly and the optical element is realized.
The thermal infrared imager is used for monitoring the temperature of the optical element in real time and feeding the temperature back to the control and observation module. It should be noted that, because the thermal infrared imager has a larger field of view, and the thermal infrared imager, the indicating laser and the laser heating assembly are integrated and packaged in the same housing, after alignment between the laser heating assembly and the optical element is completed, the whole optical element also falls into the field of view of the thermal infrared imager.
The laser heating component is used for emitting heating laser under the control of the control observation module and heating the optical element; specifically, the carbon dioxide laser is used for emitting heating laser under the control of the control observation module, the heating laser is incident to the beam expander for beam expansion after passing through the dichroic mirror, the heating laser after beam expansion is incident to the scanning vibration mirror, the scanning vibration mirror adopts the heating laser after beam expansion for progressive scanning of the optical element, wherein the progressive scanning path and the progressive scanning speed of the scanning vibration mirror are adjusted by the control observation module according to the temperature fed back by the thermal infrared imager.
The control observation module is used for adjusting the power of heating laser emitted by the laser heating assembly according to the temperature, so that the temperature of a heating area on the optical element is the temperature required by annealing treatment.
Therefore, the invention uses a set of carbon dioxide laser heating device to scan and heat the fused quartz optical element line by long distance by laser based on the characteristic of strong absorption of the fused quartz material to the carbon dioxide laser wavelength (10.6 μm), and the high-energy radiation defects on the surface and inside of the optical element are removed by using the high temperature of laser heating; the carbon dioxide laser heating device mainly comprises a laser heating component, an indicating laser (with the wavelength of 660 nm) and an infrared thermal imager, wherein the laser heating component consists of a carbon dioxide laser, a dichroic mirror, a beam expander and a scanning galvanometer, and is high in integration level, small in size, convenient to move and place on site and capable of realizing on-line high-temperature annealing of an optical element; the control observation system consists of a computer, a display and matched software, and is connected with the laser heating assembly, the thermal infrared imager and the indication laser through control lines, so that remote control operation can be realized.
Further, based on the on-line removal system of the high-energy radiation defect of the optical element, as shown in fig. 2, the invention also provides an on-line removal method of the high-energy radiation defect of the optical element, which comprises the following steps:
s1: placing a carbon dioxide laser heating device in a set neighborhood range of an optical element to be annealed;
s2: the indicating light laser is turned on by controlling the observation module, so that the indicating laser is incident to the center of the optical element, and the alignment between the laser heating assembly and the optical element is realized;
s3: the infrared thermal imager is opened through the control observation module, the temperature of the optical element is monitored in real time through the infrared thermal imager, and then the temperature is fed back to the control observation module;
s4: opening a laser heating assembly by controlling the observation module so that heating laser heats the optical element; specifically, the control observation module sends out a scanning instruction, the carbon dioxide laser is turned on, heating laser enters the scanning galvanometer after passing through the beam expansion, the scanning galvanometer controls the progressive scanning path and scanning speed of the heating laser after the beam expansion, and the optical element is scanned and heated;
s5: adjusting the power of heating laser emitted by the laser heating component according to the temperature, so that the temperature of a heating area on the optical element is the temperature required by annealing treatment; that is, after the temperature of the current scanning heating area of the optical element is monitored in real time by the thermal infrared imager and fed back to the observation control module, an operator controls the power of heating laser emitted by the carbon dioxide laser and the scanning speed of the scanning galvanometer according to the temperature, so that the heating area just reaches the temperature of 500-800 ℃ required by removing the radiation defect, and the operation lasts for a period of time.
S6: after the heating is completed, the carbon dioxide laser heating device is moved away.
Therefore, the method for removing the high-energy radiation defects of the optical element on line provided by the invention can remove the electronic state defects only by short on-line heat treatment of the optical element, and has the advantages of recovering the performance of the optical element and high efficiency.
Of course, the present invention is capable of other various embodiments and its several details are capable of modification and variation in light of the present invention by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (6)
1. The system is characterized by comprising a control observation module and a carbon dioxide laser heating device, wherein the carbon dioxide laser heating device comprises a laser heating component, an indicating laser and a thermal infrared imager, and heating laser emitted by the laser heating component and indicating laser emitted by the indicating laser share a light path;
the indicating laser is used for emitting indicating laser under the control of the control observation module, and the indicating laser is used for adjusting the relative position between the laser heating component and the optical element to be annealed so that the laser heating component is aligned to the center of the optical element, wherein the optical element is a quartz window element at the forefront end or a quartz shielding element at the extreme tail end in a laser light path to be annealed;
the laser heating component is used for emitting heating laser under the control of the control observation module and heating the optical element;
the thermal infrared imager is used for monitoring the temperature of the optical element in real time and feeding the temperature back to the control and observation module;
the control observation module is used for adjusting the power of heating laser emitted by the laser heating assembly according to the temperature, so that the temperature of a heating area on the optical element is the temperature required by annealing treatment.
2. The optical element high-energy radiation defect online removing system according to claim 1, wherein the laser heating component comprises a scanning galvanometer, a beam expander, a dichroic mirror and a carbon dioxide laser;
the carbon dioxide laser is used for emitting heating laser under the control of the control observation module, the heating laser is incident to the beam expander for beam expansion after passing through the dichroic mirror, the heating laser after beam expansion is incident to the scanning vibration mirror, the scanning vibration mirror adopts the heating laser after beam expansion for progressive scanning of the optical element, wherein the progressive scanning path and the progressive scanning speed of the scanning vibration mirror are adjusted by the control observation module according to the temperature fed back by the thermal infrared imager.
3. The system for online removal of high-energy radiation defects of optical elements according to claim 2, wherein the indication laser emitted by the indication laser is reflected to the beam expander for beam expansion through the dichroic mirror, the indication laser after beam expansion is incident to the scanning galvanometer again, and the indication laser after beam expansion is aligned to the center of the optical element through the scanning galvanometer, so that alignment between the laser heating assembly and the optical element is realized.
4. An optical element high-energy radiation defect online removing system as in claim 1 or 2, wherein the laser heating component, the indicating laser and the thermal infrared imager are integrated and packaged in the housing.
5. An in-line removal system for high energy radiation defects of an optical element as claimed in any one of claims 1 to 3, wherein the annealing treatment is carried out at a temperature of 500 ℃ to 800 ℃.
6. An optical element high-energy radiation defect online removing method based on the optical element high-energy radiation defect online removing system as claimed in claim 1, comprising the steps of:
s1: placing a carbon dioxide laser heating device in a set neighborhood range of an optical element to be annealed;
s2: the indicating light laser is turned on by controlling the observation module, so that the indicating laser is incident to the center of the optical element, and the alignment between the laser heating assembly and the optical element is realized;
s3: the infrared thermal imager is opened through the control observation module, the temperature of the optical element is monitored in real time through the infrared thermal imager, and then the temperature is fed back to the control observation module;
s4: opening a laser heating assembly by controlling the observation module so that heating laser heats the optical element;
s5: adjusting the power of heating laser emitted by the laser heating component according to the temperature, so that the temperature of a heating area on the optical element is the temperature required by annealing treatment;
s6: after the heating is completed, the carbon dioxide laser heating device is moved away.
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| CN202211489561.3A CN116282865A (en) | 2022-11-25 | 2022-11-25 | Online removing system and method for high-energy radiation defects of optical element |
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| CN202211489561.3A CN116282865A (en) | 2022-11-25 | 2022-11-25 | Online removing system and method for high-energy radiation defects of optical element |
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