CN115831821A - Substrate cleaning and drying device - Google Patents
Substrate cleaning and drying device Download PDFInfo
- Publication number
- CN115831821A CN115831821A CN202211589698.6A CN202211589698A CN115831821A CN 115831821 A CN115831821 A CN 115831821A CN 202211589698 A CN202211589698 A CN 202211589698A CN 115831821 A CN115831821 A CN 115831821A
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- plate
- cover plate
- substrate
- water retaining
- runner
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Abstract
The invention discloses a substrate cleaning and drying device, which comprises an upper cover plate, a lower cover plate, a water retaining cover, a water spray pipe, a runner plate, a fixed structure and a rotary lifting platform, wherein an avoidance port is formed in the middle of the upper cover plate; the lower cover plate is arranged below the upper cover plate and is fixedly connected with the upper cover plate through a support rod, and a drain hole is formed in the lower cover plate; the water retaining cover is arranged between the upper cover plate and the lower cover plate and is in sealing connection with the lower cover plate; the water spraying pipe extends into the water retaining cover to clean the substrate; the runner plate is used for placing a substrate; the fixing structure is arranged on the runner plate and used for fixing the substrate on the runner plate; the rotary lifting platform is used for driving the runner plate to lift, so that the runner plate is lowered into the water retaining cover from the avoiding opening, the runner plate rotates in the water retaining cover, the substrate is cleaned and dried, the substrate is dried in and out, the phenomenon that the cleaned water flows out of the water retaining cover to influence the operation of other devices is avoided, and the substrate cleaning and drying device can be mounted in the substrate grinding machine and matched with the grinding device for use.
Description
Technical Field
The invention relates to the technical field of chip processing equipment, in particular to a substrate cleaning and drying device.
Background
Semiconductor silicon wafers are the basic raw material for manufacturing semiconductor devices. The high-purity semiconductor is prepared into a wafer through the procedures of crystal pulling, slicing and the like, the wafer is subjected to a series of semiconductor manufacturing processes to form a tiny circuit structure, and then the wafer is thinned, cut, packaged and tested to form a chip which is widely applied to various electronic equipment, wherein the thinning of a substrate is an important part.
After the chip is mounted on the substrate, after routing and packaging are completed, in order to improve the performance of the chip, heat dissipation and other requirements, the plastic packaging material on the surface of the chip needs to be thinned, and what is needed to complete the process is a substrate grinding machine which can grind the plastic packaging on the surface of the chip.
Disclosure of Invention
The invention aims to provide a substrate cleaning and drying device, which solves the problem that a ground substrate is inconvenient to clean in the prior art.
The purpose of the invention can be realized by the following technical scheme:
a substrate cleaning and drying apparatus comprises
The middle part of the upper cover plate is provided with an avoidance port;
the lower cover plate is arranged below the upper cover plate and is fixedly connected with the upper cover plate through a support rod, and a drain hole is formed in the lower cover plate;
the water retaining cover is arranged between the upper cover plate and the lower cover plate and is in sealing connection with the lower cover plate;
the water spraying pipe extends into the water retaining cover to clean the substrate;
a flow channel plate for placing a substrate;
the fixing structure is arranged on the runner plate and used for fixing the substrate on the runner plate;
and the rotary lifting platform is used for driving the runner plate to lift, so that the runner plate descends into the water retaining cover from the avoiding opening and rotates in the water retaining cover.
This application can be used to wash and spin-dry the base plate, makes the base plate dry and advances to do out, avoids abluent rivers to go out the operation that water retaining cover influences other devices outward, makes the mountable of base plate washing drying device use with grinder matching in the base plate grinder.
As a further scheme of the invention: the upper surface of the lower cover plate is step-shaped and is provided with a raised positioning part positioned in the middle; the water retaining cover is generally cylindrical, and the bottom wall of the water retaining cover is provided with a butt joint hole matched with the positioning part.
As a further scheme of the invention: the top end of the water retaining cover is arranged on the water retaining ring which is turned inwards.
As a further scheme of the invention: the bottom surface of the water retaining ring is an inwards concave cambered surface.
As a further scheme of the invention: and an air blowing pipe is further arranged on one side of the water spraying pipe and extends into the water retaining cover to blow air to the substrate.
As a further scheme of the invention: the rotary lifting platform comprises a first lifting cylinder, a rotary motor, a synchronizing wheel, a connecting plate, a spline shaft, a spline nut and a bearing seat, the bearing seat is fixedly connected in a shaft hole of the lower cover plate in a sealing mode, the spline shaft penetrates through the spline nut and is fixedly connected to the bottom of the runner plate, the other end of the spline shaft is rotatably connected to the connecting plate through a bearing, the synchronizing wheel is in clearance fit with the spline shaft and is fixedly connected with an inner shaft sleeve of the bearing seat through a butt joint sleeve, the rotary motor is fixedly connected to the bottom of the lower cover plate and drives the synchronizing wheel through a belt, and the synchronizing wheel indirectly drives the spline shaft to rotate through the bearing seat; the first lifting cylinder is fixedly arranged at the bottom of the lower cover plate and drives the connecting plate and the spline shaft to synchronously move up and down.
As a further scheme of the invention: the bearing seat comprises an inner shaft sleeve, an outer shaft sleeve and a first bearing arranged between the inner shaft sleeve and the outer shaft sleeve, wherein a first step is arranged on the top end face of the inner shaft sleeve, a second step is arranged on the top end face of the outer shaft sleeve, a third step is arranged on the second step and is lower than the first step, an inner cover is arranged on the inner shaft sleeve and is sleeved on the peripheral wall of the first step, the outer edge of the inner cover is above the second step, and the third step extends into a blocking groove formed in the bottom of the inner cover; the outer shaft sleeve is provided with an outer cover, the outer cover is tightly and fixedly connected to the spline shaft, and the outer edge of the outer cover is provided with a folded edge part which is folded downwards and is annularly arranged on the outer side of the second step.
As a further scheme of the invention: the fixing structure comprises a buckle hinged to the bottom of the runner plate and a stop piece arranged at the bottom of the upper cover plate and used for opening the buckle, and a return spring used for enabling the buckle to be closed is arranged between the buckle and the runner plate.
As a further scheme of the invention: and a bearing is sleeved on the stop part.
As a further scheme of the invention: the runner plate is provided with a blanking runner, and the upper cover plate is provided with a butt joint runner which is in butt joint with the blanking runner.
The invention has the beneficial effects that:
1. the application provides a base plate washs drying device can fix the base plate on the runner plate, washs and spin-dries the base plate in moving to the manger plate cover through rotatory elevating platform drive runner plate, makes the base plate dry and advances to do out, avoids abluent rivers to go out the operation that influences other devices outside the manger plate cover, makes the mountable of base plate washing drying device use with grinder matching in the base plate grinder.
2. This application makes the synchronizing wheel pass through butt joint cover and spline nut rigid coupling through with clearance fit between synchronizing wheel and the integral key shaft, drives the spline nut through the synchronizing wheel and rotates and then make spline nut drive the integral key shaft and rotate, avoids mutual interference between the rotation of integral key shaft and the lift.
3. The stop parts are arranged on the periphery of the avoiding opening at the bottom of the upper cover plate, the buckle is hinged to the bottom of the flow channel plate, the reset spring is arranged between the flow channel plate and the buckle, so that the opening and closing amplitude of the flow channel plate can be automatically adjusted according to the lifting height in the lifting process of the flow channel plate, and the base plate is automatically clamped on the flow channel plate.
Drawings
The invention will be further described with reference to the accompanying drawings.
FIG. 1 is a schematic structural view of the present invention as a whole;
FIG. 2 is a cross-sectional view of the overall structure of the present invention;
FIG. 3 is an enlarged view at A in FIG. 2;
FIG. 4 is a schematic structural view of the present invention with the water shield removed;
fig. 5 is a schematic view of the fixing structure of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-4, the present invention is a substrate cleaning and drying apparatus, including an upper cover plate 1, a lower cover plate 2, a water shield 3, a water spraying pipe 4, a runner plate 5, a fixing structure 6 and a rotary elevating platform 7.
An avoiding opening 11 is arranged in the middle of the upper cover plate 1. The lower cover plate 2 is arranged below the upper cover plate 1 and is fixedly connected with the upper cover plate 1 through a support rod 12. The upper surface of the lower cover plate 2 is step-shaped, and is provided with a raised positioning part 21 positioned in the middle, and the positioning part 21 is provided with a drain hole 22.
The water blocking cover 3 is arranged between the upper cover plate 1 and the lower cover plate 2, the water blocking cover 3 is substantially cylindrical, a butt joint hole matched with the positioning part 21 is formed in the bottom wall of the water blocking cover 3, when the water blocking cover 3 is installed, the butt joint hole is sleeved on the positioning part 21, and the water blocking cover 3 and the lower cover plate 2 are quickly aligned and then fixedly connected through bolts. The bottom wall of the water retaining cover 3 after being fixedly connected is attached to the lower cover plate 2, and a sealing ring is arranged between the bottom wall of the water retaining cover 3 and the lower cover plate 2, so that the water retaining cover 3 is hermetically connected with the lower cover plate 2, and water in the water retaining cover 3 is prevented from flowing out from the space between the water retaining cover 3 and the lower cover plate 2. Further, the inner bottom surface of the water deflector 3 is higher than the upper surface of the positioning portion 21, so that the water deflector 3 flows toward the positioning portion 21 and is discharged from the water discharge hole 22.
An interval is arranged between the top end surface of the water retaining cover 3 and the upper cover plate 1, and the top end of the water retaining cover 3 is provided with an inward-turned water retaining ring 31, so that water is prevented from flying out from the edge of the water retaining cover 3 when the base plate is dried subsequently. Further, the bottom surface of the water retaining ring 31 is an inward concave arc surface, and water splashed onto the water retaining ring 31 can fall into the water retaining cover 3 along the arc surface.
One end of the water spraying pipe 4 extends into the water retaining cover 3 along the interval between the top end of the water retaining cover 3 and the upper cover plate 1, and the other end of the water spraying pipe 4 is provided with a water connector (not shown) which is convenient to be connected with an external water source. Further, one side of the water spray pipe 4 is provided with an air blow pipe 8, one end of the air blow pipe 8 extends into the water retaining cover 3 to blow air to the substrate, and the other end of the air blow pipe 8 is provided with an air connector (not shown) which is convenient to connect with an external air source.
A fixing structure 6 is provided on the flow channel plate 5 for fixing the substrate to the flow channel plate 5. The rotary elevating platform 7 drives the flow passage plate 5 to ascend and descend, so that the flow passage plate 5 descends into the water blocking cover 3 from the avoiding opening 11, and the flow passage plate 5 rotates in the water blocking cover 3.
Referring to fig. 2 and 5, in the present embodiment, the fixing structure 6 includes a buckle 62 hinged to the bottom of the flow channel plate 5 and a stop member 61 disposed at the bottom of the upper cover plate 1 for opening the buckle 62, and a return spring 63 for closing the buckle 62 is disposed between the buckle 62 and the flow channel plate 5. Specifically, the main body of the buckle 62 is in a zigzag shape, the buckle 62 is hinged to the spring fixing seat 51 at the bottom of the runner plate 5 through the connecting shaft 52, the main body of the return spring 63 is sleeved on the connecting shaft 52, and two free ends of the return spring 63 are fixed on the buckle 62 and the spring fixing seat 51 respectively.
Furthermore, the stop part 61 is sleeved with a bearing, and when the buckle 62 is opened and closed, the bearing is lifted along the outer circumferential surface of the bearing to drive the bearing to roll, so that the abrasion caused by relative movement between the stop part 61 and the buckle 62 is reduced.
Referring to fig. 2-3, the rotary lifting platform 7 includes a first lifting cylinder 71, a rotary motor 72, a synchronizing wheel 73, a connecting plate 74, a spline shaft 75, a spline nut 76, and a bearing seat 77, where the bearing seat 77 includes an inner shaft sleeve 771, an outer shaft sleeve 772, and a first bearing 773 disposed between the inner shaft sleeve 771 and the outer shaft sleeve 772 for enabling the inner shaft sleeve 771 and the outer shaft sleeve 772 to rotate relatively, two first bearings 773 are disposed at an upper-lower interval, and a bearing spacer 774 is disposed between the two first bearings 773 for keeping a fixed interval between the two first bearings 773. The outer shaft sleeve 772 is fixedly connected in a shaft hole in the middle of the lower cover plate 2 in a sealing mode, the inner shaft sleeve 771 is fixedly sleeved on the spline nut 76, the spline shaft 75 penetrates through the spline nut 76 to be arranged on the inner shaft sleeve 771, one end of the spline shaft 75 extends out of the top end of the inner shaft sleeve 771 and is fixedly connected to the bottom of the runner plate 5, the other end of the spline shaft 75 extends out of the bottom end of the inner shaft sleeve 771 and is rotatably connected to the connecting plate 74 through a bearing, the synchronizing wheel 73 is in clearance fit with the spline shaft 75 and is fixedly connected with the inner shaft sleeve 771 through the butting sleeve 78, the synchronizing wheel 73 is fixedly sleeved at the bottom of the butting sleeve 78, the abutting sleeve 78 is sleeved at the top of the inner shaft sleeve 771, the rotating motor 72 is fixedly connected to the bottom of the lower cover plate 2, a driving wheel 721 is arranged on the rotating motor 72, the driving wheel 721 is connected with the synchronizing wheel 73 through a belt (not shown) and is connected with the synchronizing wheel 73, the rotating motor 72 drives the synchronizing wheel 73 through the belt, the synchronizing wheel 73 is driven by the belt, the synchronizing wheel 73 through the synchronizing wheel 78, the inner shaft sleeve 771 drives the spline shaft nut 76 to drive the spline shaft nut 75 to drive the runner plate 5 to rotate, and finally, and the runner plate 5 rotates through the rotating motor 72. The first lifting cylinder 71 is fixedly connected to the bottom of the lower cover plate 2, a cylinder rod of the first lifting cylinder 71 is connected with the connecting plate 74, the first lifting cylinder 71 drives the spline shaft 75 to move up and down synchronously through the driving connecting plate 74, and then drives the runner plate 5 to move up and down.
The top ends of the inner shaft sleeve 771 and the outer shaft sleeve 772 extend into the water blocking cover 3, a first step 775 is arranged on the top end face of the inner shaft sleeve 771, a second step 776 is arranged on the top end face of the outer shaft sleeve 772, a third step 777 is arranged on the second step 776, the third step 777 is lower than the first step 775, and the third step 777 is located above the first bearing 773 to stop the first bearing 773. Be equipped with inner cup 79 on the interior axle sleeve 771, inner cup 79 cover is established and is followed interior axle sleeve 771 synchronous revolution on the perisporium of first step 775, and inner cup 79 outward flange extends to second step 776 top, and third step 777 extends to the retaining groove that the inner cup 79 bottom was seted up in, prevents that external rivers from flowing into the clearance between interior axle sleeve 771 and the outer axle sleeve 772. Be equipped with the enclosing cover 80 on the outer axle sleeve 772, enclosing cover 80 cup joints on the integral key shaft 75, makes the enclosing cover 80 follow the relative outer axle sleeve 772 rotation of integral key shaft 75, and the outward flange of enclosing cover 80 extends to the outer edge of inner axle sleeve 771, and the outward flange of enclosing cover 80 has the hem portion 801 that turns over downwards, and hem portion 801 encircles and establishes and cover second step 77 in the second step 776 outside, further prevents to intake between inner axle sleeve 771 and the outer axle sleeve 772.
In this embodiment, the runner plate 5 is initially located above the avoiding opening 11 (see fig. 1), and at this time, the clip 62 is in an open state against the stopper 61, and the return spring 63 is in a compressed state (see fig. 5). After the carrying manipulator carries the ground substrate to the runner plate 5, the first lifting cylinder 71 drives the runner plate 5 to descend, so that the runner plate 5 carries the material substrate to a preset position in the water blocking cover 3. In the initial stage of descending the flow channel plate 5, the latch 62 moves downward against the bearing sleeved on the stop member 61, so that the return spring 63 gradually returns to drive the latch 62 to gradually close until the latch 62 is separated from the stop member 61, and the latch 62 is completely closed to fasten the substrate on the flow channel plate 5 (as shown in fig. 2). After the runner plate 5 descends to the preset position, the water spraying pipe 4 sprays water to clean the substrate on the runner plate 5, and at the moment, the rotating motor 72 can drive the runner plate 5 to rotate in the water blocking cover 3 to adjust the cleaning angle of the substrate. After the cleaning is finished, the rotating motor 72 accelerates the driving runner plate 5 to rotate, and the air blowing pipe 8 blows air to the substrate, so that the product is dried quickly.
Referring to fig. 4, two side plates 51 are disposed on two side edges of the upper surface of the runner plate 5, so that a blanking runner 52 located between the two side plates 51 is formed above the runner plate 5, a butt runner 9 butted with the blanking runner 52 is disposed on the upper cover plate 1, and after the substrate is dried, the first lifting cylinder 71 lifts the runner plate 5 above the avoidance opening 11 again, so that the blanking runner 52 is butted with the butt runner 9, and the substrate can flow to the next process along the butt runner 9.
While one embodiment of the present invention has been described in detail, the description is only a preferred embodiment of the present invention and should not be taken as limiting the scope of the invention. All equivalent changes and modifications made within the scope of the present invention shall fall within the scope of the present invention.
Claims (10)
1. A substrate cleaning and drying device is characterized by comprising
The middle part of the upper cover plate is provided with an avoidance port;
the lower cover plate is arranged below the upper cover plate and is fixedly connected with the upper cover plate through a support rod, and a drain hole is formed in the lower cover plate;
the water retaining cover is arranged between the upper cover plate and the lower cover plate and is in sealing connection with the lower cover plate;
the water spraying pipe extends into the water retaining cover to clean the substrate;
a flow passage plate for placing a substrate;
the fixing structure is arranged on the runner plate and used for fixing the substrate on the runner plate;
and the rotary lifting platform is used for driving the runner plate to lift, so that the runner plate descends into the water retaining cover from the avoiding opening and rotates in the water retaining cover.
2. The substrate cleaning and drying apparatus according to claim 1, wherein the upper surface of the lower cover plate is stepped and has a positioning portion located at the middle and protruding; the water retaining cover is generally cylindrical, and the bottom wall of the water retaining cover is provided with a butt joint hole matched with the positioning part.
3. The apparatus according to claim 1, wherein the water retaining cover is formed with an inwardly-turned water retaining ring at a top end thereof.
4. The apparatus of claim 3, wherein the bottom surface of the water retaining ring is a concave arc surface.
5. The apparatus of claim 1, wherein a blowing pipe is further disposed at one side of the water spraying pipe, and the blowing pipe extends into the water blocking cover for blowing air to the substrate.
6. The substrate cleaning and drying device according to claim 1, wherein the rotary lifting table comprises a first lifting cylinder, a rotary motor, a synchronizing wheel, a connecting plate, a spline shaft, a spline nut and a bearing seat, the bearing seat is fixedly connected in a shaft hole of the lower cover plate in a sealing manner, the spline shaft penetrates through the bearing seat through the spline nut, one end of the spline shaft is fixedly connected to the bottom of the runner plate, the other end of the spline shaft is rotatably connected to the connecting plate through a bearing, the synchronizing wheel is in clearance fit with the spline shaft and is fixedly connected with an inner shaft sleeve of the bearing seat through a butt sleeve, the rotary motor is fixedly connected to the bottom of the lower cover plate and drives the synchronizing wheel through a belt, and the synchronizing wheel indirectly drives the spline shaft to rotate through the bearing seat; the first lifting cylinder is fixedly arranged at the bottom of the lower cover plate and drives the connecting plate and the spline shaft to synchronously move up and down.
7. The substrate cleaning and drying device according to claim 6, wherein the bearing seat comprises an inner shaft sleeve, an outer shaft sleeve and a first bearing arranged between the inner shaft sleeve and the outer shaft sleeve, a first step is arranged on the top end surface of the inner shaft sleeve, a second step is arranged on the top end surface of the outer shaft sleeve, a third step is arranged on the second step, the third step is lower than the first step, an inner cover is arranged on the inner shaft sleeve, the inner cover is sleeved on the peripheral wall of the first step, the outer edge of the inner cover is above the second step, and the third step extends into a blocking groove formed in the bottom of the inner cover; the outer shaft sleeve is provided with an outer cover, the outer cover is tightly and fixedly connected to the spline shaft, and the outer edge of the outer cover is provided with a folded edge part which is folded downwards and is annularly arranged on the outer side of the second step.
8. The substrate washing and drying device according to claim 1, wherein the fixing structure comprises a latch hinged to a bottom of the flow channel plate and a stopper provided at a bottom of the upper cover plate to open the latch, and a return spring for closing the latch is provided between the latch and the flow channel plate.
9. The substrate cleaning and drying apparatus according to claim 8, wherein a bearing is fitted over the stopper.
10. The apparatus of claim 1, wherein the runner plate is provided with a feeding runner, and the upper cover plate is provided with a butt runner for butt-jointing with the feeding runner.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211589698.6A CN115831821B (en) | 2022-12-12 | 2022-12-12 | Substrate cleaning and drying device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211589698.6A CN115831821B (en) | 2022-12-12 | 2022-12-12 | Substrate cleaning and drying device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115831821A true CN115831821A (en) | 2023-03-21 |
| CN115831821B CN115831821B (en) | 2023-06-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211589698.6A Active CN115831821B (en) | 2022-12-12 | 2022-12-12 | Substrate cleaning and drying device |
Country Status (1)
| Country | Link |
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| CN (1) | CN115831821B (en) |
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| Publication number | Publication date |
|---|---|
| CN115831821B (en) | 2023-06-06 |
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Address after: 201600 Building 1, No. 76, Jinma Road, Jiuting Town, Songjiang District, Shanghai Applicant after: Shanghai Shiyu Precision Equipment Co.,Ltd. Address before: 201600 Room 101, building 3, no.1589, Lianfu Road, Jiuting Town, Songjiang District, Shanghai Applicant before: SHANGHAI SHIYU PRECISION MACHINERY Co.,Ltd. |
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