CN115685686A - Exposure system and exposure device - Google Patents
Exposure system and exposure device Download PDFInfo
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- CN115685686A CN115685686A CN202110844841.0A CN202110844841A CN115685686A CN 115685686 A CN115685686 A CN 115685686A CN 202110844841 A CN202110844841 A CN 202110844841A CN 115685686 A CN115685686 A CN 115685686A
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Abstract
The invention relates to an exposure system which is used for exposing a three-dimensional structure on a workpiece, wherein the exposure system is sequentially provided with a laser for emitting a laser beam, a beam expanding lens for carrying out zooming and beam expanding on light spots of the laser beam, a diaphragm for limiting the laser beam, a vibrating lens for deflecting the direction of the laser beam and a field lens group for ensuring the laser beam to vertically emit, the vibrating lens comprises a reflecting sheet for reflecting the laser beam, the reflecting sheet can rotate to expand the emitting range of the laser beam, the emitting range of the laser beam is 3mm, 15mm, the exposure system can form the three-dimensional structure on the workpiece under the action of the diaphragm, the reflecting sheet in the vibrating lens can rotate to expand the emitting range of the laser beam, so that a plurality of units can be exposed under the condition that the workpiece and the exposure system do not move relatively, and the exposure rate and the processing efficiency of the workpiece are greatly improved.
Description
Technical Field
The present invention relates to an exposure system and an exposure apparatus.
Background
Because laser has the advantages of high brightness, good monochromaticity, strong direction and the like, the laser is widely applied to the processing fields of laser direct writing, laser packaging and the like, a laser galvanometer scanning system is commonly used, the working principle of the system is that a laser beam is amplified and collimated by a beam expander and then passes through a scanning focusing field lens, a light spot with certain power density is converged on the surface of a processed workpiece, the action of the laser and the workpiece needs certain action time, and energy needed by the processing process is further provided, so that the processing of the workpiece is realized, in order to form an exposure pattern with a three-dimensional structure on the workpiece, a gray diaphragm is generally used, and because the laser transmittances in the shape of the gray diaphragm are different, the final exposure intensity is different, and the exposure pattern with the three-dimensional structure can be formed on the workpiece. However, the size of the aperture is typically in the millimeter range, and the final exposure pattern is in the micrometer range, or even in the nanometer range. In order to expose a three-dimensional form, multiple exposures are required, only one unit can be exposed at each time, after one unit is completed, the mobile platform or the exposure system needs to be moved to the next unit for exposure, and the efficiency is low due to the slow moving speed of the mobile platform or the exposure system.
Disclosure of Invention
The invention aims to provide an exposure system which is high in exposure speed and high in workpiece processing efficiency.
In order to achieve the purpose, the invention provides the following technical scheme: an exposure system is used for exposing a three-dimensional structure on a workpiece, and is sequentially provided with a laser for emitting a laser beam, a beam expanding lens for carrying out zooming and beam expanding on light spots of the laser beam, a diaphragm for limiting the laser beam, a vibrating lens for deflecting the direction of the laser beam and a field lens group for ensuring the laser beam to vertically emit along the advancing direction of the laser beam, wherein the vibrating lens comprises a reflecting sheet for reflecting the laser beam, and the reflecting sheet can rotate to expand the emitting range of the laser beam.
Further, the exposure system further comprises a focusing lens for focusing the laser beam, wherein the focusing lens is arranged between the diaphragm and the vibrating lens or between the vibrating lens and the field lens.
Further, the field lens group comprises at least one field lens.
Further, the field lens is a telecentric field lens.
Further, the diaphragm is a gray diaphragm, the gray scales of the gray diaphragm are different at different positions, the gray scale at the center position is the lowest, and the closer to the edge of the gray diaphragm, the higher the gray scale is.
Further, the laser is an ultraviolet laser.
The invention also provides an exposure device, which comprises a frame body, an exposure system arranged on the frame body, a workpiece table used for fixing a workpiece, and a moving table driving the exposure system and the workpiece table to move relatively, wherein a laser beam emitted by the exposure system forms a three-dimensional structure on the workpiece.
Further, the exposure system is fixed on the moving table.
Further, the workpiece table is fixed on the moving table.
Further, the exposure device also comprises a controller arranged on the frame body, and the controller is electrically connected with the exposure system and the motion table.
The invention has the beneficial effects that: the exposure system of the invention can form a three-dimensional structure on the workpiece under the action of the diaphragm, and the reflecting sheet in the galvanometer can rotate to enlarge the outgoing range of the laser beam, so that the workpiece and the exposure system can expose a plurality of units without relative movement, thereby greatly improving the exposure rate and the processing efficiency of the workpiece.
The foregoing description is only an overview of the technical solutions of the present invention, and in order to make the technical solutions of the present invention more clearly understood and to implement them in accordance with the contents of the description, the following detailed description is given with reference to the preferred embodiments of the present invention and the accompanying drawings.
Drawings
FIG. 1 is a schematic diagram of an exposure system and workpiece according to one embodiment of the present invention;
FIG. 2 is a schematic diagram of another configuration of an exposure system and a workpiece according to one embodiment of the present invention;
fig. 3 is a schematic diagram of different gray scale distribution regions of the gray scale diaphragm in fig. 1.
Fig. 4 is a schematic diagram of different gray scale distribution regions of the hexagonal gray scale diaphragm in fig. 1.
Fig. 5 is a schematic diagram of different gray distribution areas of the circular gray diaphragm in fig. 1.
Fig. 6 is a schematic diagram of different gray scale distribution regions of the elliptical gray scale diaphragm in fig. 1.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the accompanying drawings, and it should be understood that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the mechanism or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In addition, the technical features involved in the different embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
Referring to fig. 1 and 2, an exposure system according to an embodiment of the present invention is configured to expose a three-dimensional structure on a workpiece 2, and the exposure system is sequentially provided with a laser 11 for emitting a laser beam, a beam expander 12 for performing variable-magnification beam expansion on a spot of the laser beam, a diaphragm 13 for limiting the laser beam, a galvanometer 14 for deflecting the laser beam, and a field lens group for ensuring that the laser beam is emitted perpendicularly, the galvanometer 14 includes a reflective sheet (not shown) for reflecting the laser beam, the reflective sheet is rotatable to expand an emitting range of the laser beam, and the emitting range of the laser beam is 3mm × 3mm to 15mm × 15mm.
The exposure system further comprises a focusing mirror 16 for focusing the laser beam, wherein the focusing mirror 16 is arranged between the diaphragm 13 and the galvanometer 14, and the focused laser beam is incident to the galvanometer 14, as shown in fig. 1; or the number of the focusing mirrors 16 is two, one focusing mirror 16 is arranged between the diaphragm 13 and the vibrating mirror 14, the other focusing mirror is arranged between the field lens group and the workpiece 2, see fig. 2, the focusing mirror 16 is arranged below the field lens group, and the focusing mirror 16 and the scene group can eliminate focal length change caused by the vibrating mirror 14, so that the laser beam can accurately image on the workpiece 2.
The laser 11 is an ultraviolet laser 11 for providing a certain single spectrum from an ultraviolet band to an infrared band or a broad spectrum with a bandwidth of less than 100nm, and the wavelength of the light source can be freely selected according to the material characteristics of the workpiece 2, thereby increasing the application range of the exposure system. The beam expander 12 is used for carrying out the zoom with the facula and expands the beam to the facula size of online adjustment outgoing laser beam, thereby the different work piece of adaptation 2 requirements to the facula size, specific facula size can set up according to actual need. The diaphragm 13 is a gray scale diaphragm 13, please refer to fig. 3-6, the gray scale diaphragm 13 is triangular, circular, elliptical, quadrilateral, polygonal, etc., and the appearance of the gray scale diaphragm is changed according to the actual requirement. The gray scale of the gray scale diaphragm 13 is different at different positions, the gray scale at the center position is the lowest, and the gray scale is higher as the gray scale is closer to the edge of the gray scale diaphragm 13, so that the laser transmittance is different at different positions of the gray scale diaphragm 13, the exposure intensity of the laser beam emitted from the exposure system on the surface of the workpiece 2 is different, a three-dimensional structure can be formed by one exposure on the workpiece 2, the traditional exposure method is not needed, in order to expose the three-dimensional structure, multiple exposures are needed, only one unit can be exposed at each time, after one unit is completed, the platform is moved to carry out the next unit exposure, and the exposure efficiency is very low.
The number of the reflection sheets in the galvanometer 14 is two, one of the reflection sheets deflects the laser beam in the X direction, the other of the reflection sheets deflects the laser beam in the Y direction, and the two reflection sheets are rotatable around the central axis, so that the emission range of the laser beam in the horizontal direction is enlarged. Under the condition that the workpiece 2 and the exposure system do not move relatively, due to the rotation of the reflector plate, a plurality of units can be exposed in the moving range of the surface of the workpiece 2, the size of one unit is 0.1mm by 0.1mm, the conventional size of one unit is 3mm by 3mm to 15mm by 15mm, and the laser beam is emitted in the range of 3mm by 3mm to 15mm, namely 30 by 30 to 150 by 150 units can be exposed on the surface of the workpiece 2. The rotation rate of the reflective plate in the galvanometer 14 is about 900 times/s, the relative movement rate of the exposure system and the workpiece 2 is about 100 times/s, and the rotation rate of the reflective plate is far greater than the activation rate of the exposure system or the workpiece 2, so that the exposure system can rapidly expose patterns on the workpiece 2.
The field lens group comprises at least one field lens 15, in the embodiment, the field lens 15 is a telecentric field lens 15, and is used for ensuring that the laser beam emitted by the galvanometer 14 is perpendicularly incident on the workpiece 2, so that the problem of vertical crosstalk when the laser beam is obliquely emitted is avoided. The number of the telecentric field lens 15 can be selected according to the actual required demagnification, and is not limited in detail here.
Referring to fig. 1, a laser 11 outputs a laser beam, the laser beam is expanded by a beam expander 12, exits to a gray diaphragm 13, is focused by a focusing lens 16, exits to a galvanometer 14 to change a direction, and is focused on a workpiece 2 by a telecentric field lens 15, wherein a moving direction of the laser beam is shown by an arrow. Or, as shown in fig. 2, the laser beam passing through the telecentric field lens 15 is focused again on the workpiece 2 by the focusing lens 16, wherein the moving direction of the laser beam is shown by an arrow.
The invention also provides an exposure device, which comprises a frame body, the exposure system, a workpiece table and a moving table, wherein the exposure system, the workpiece table and the moving table are arranged on the frame body, the workpiece table is used for fixing a workpiece, the moving table drives the exposure system and the workpiece table to move relatively, and a laser beam emitted by the exposure system forms a three-dimensional structure on the workpiece.
The workpiece can be a rigid substrate or a flexible substrate, and the substrate can be any one of glass, PET, PC and PMMA, but not limited thereto, and can be selected according to actual needs. The mold for obtaining a diffusion sheet, a light guide plate, and the like can be prepared after exposing the surface of the work to form a three-dimensional structure, which is not listed here. The exposure system is arranged on the frame body, an exit port for emitting the laser beam is positioned above the workpiece table, and the emitted laser beam vertically enters the workpiece table so as to process the workpiece positioned on the workpiece table.
The exposure system is used for performing exposure processing on the workpiece, and the pattern of the exposure on the workpiece can be any achievable pattern, and the size of the workpiece is not specifically limited herein, and the embodiment can be processed on workpieces with different sizes.
In order to complete the pattern on the workpiece, the exposure system and the workpiece surface need to move relatively in the horizontal direction, the exposure system can be fixed on a moving table to move relatively to the workpiece, or the workpiece table can be fixed on the moving table to move relatively to the exposure system, and meanwhile, the exposure system and the workpiece can move relatively in the height direction to adjust the laser beam emitted by the exposure system to image on the workpiece surface.
The exposure device also comprises a controller arranged on the frame body, and the controller is electrically connected with the exposure system and the motion platform. The controller is used for controlling the exposure system and the motion platform to complete required operations.
The working principle of the exposure device is as follows: placing a workpiece on a workpiece table; the controller controls the motion platform to move the workpiece below the laser beam emitted by the exposure system or move the exposure system to enable the laser beam to be incident on the workpiece; adjusting the height of the exposure system relative to the workpiece to meet the exposure requirement of the workpiece; the controller controls the motion platform to position the laser beam emitted by the exposure system in the initial exposure area, and controls the exposure system to scan and expose the exposure pattern according to the set process parameters until the exposure of the exposure pattern in the area is finished; and the controller controls the motion platform to position the laser beam emitted by the exposure system in the next exposure area, and repeats the exposure process until the exposure of all the exposure patterns is finished. This process reduces the number of movements of the motion stage and increases the exposure rate.
In conclusion, the exposure system of the invention can form a three-dimensional structure on the workpiece under the action of the diaphragm, and the reflecting sheet in the galvanometer can rotate to enlarge the outgoing range of the laser beam, so that the workpiece and the exposure system can expose a plurality of units under the condition of no relative movement, thereby greatly improving the exposure rate and the workpiece processing efficiency.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. An exposure system is used for exposing a three-dimensional structure on a workpiece and is characterized in that a laser for emitting a laser beam, a beam expander for carrying out zooming and beam expanding on light spots of the laser beam, a diaphragm for limiting the laser beam, a vibrating mirror for deflecting the direction of the laser beam and a field mirror group for ensuring the laser beam to vertically exit are sequentially arranged along the advancing direction of the laser beam, the vibrating mirror comprises a reflector plate for reflecting the laser beam, and the reflector plate can rotate to expand the exiting range of the laser beam.
2. The exposure system according to claim 1, further comprising a focusing lens for focusing the laser beam, the focusing lens being disposed between the diaphragm and the galvanometer, or between the galvanometer and the field lens.
3. The exposure system of claim 1, wherein the set of field lenses comprises at least one field lens.
4. The exposure system of claim 3, wherein the field lens is a telecentric field lens.
5. The exposure system of claim 1, wherein the aperture is a gray scale aperture, the gray scale of which is different at different positions, the gray scale being lowest at a central position and higher closer to an edge of the gray scale aperture.
6. The exposure system of claim 1, wherein the laser is an ultraviolet laser.
7. An exposure apparatus, comprising a frame body and the exposure system according to any one of claims 1 to 6 provided on the frame body, a workpiece stage for holding a workpiece, and a moving stage for driving the exposure system and the workpiece stage to move relative to each other, wherein a laser beam emitted from the exposure system forms a three-dimensional structure on the workpiece.
8. The exposure apparatus according to claim 7, wherein the exposure system is fixed to the moving stage.
9. The exposure apparatus according to claim 7, wherein the workpiece stage is fixed to the moving stage.
10. The exposure apparatus according to claim 7, further comprising a controller provided on the frame body, the controller being electrically connected to the exposure system and the motion stage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110844841.0A CN115685686A (en) | 2021-07-26 | 2021-07-26 | Exposure system and exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110844841.0A CN115685686A (en) | 2021-07-26 | 2021-07-26 | Exposure system and exposure device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115685686A true CN115685686A (en) | 2023-02-03 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110844841.0A Pending CN115685686A (en) | 2021-07-26 | 2021-07-26 | Exposure system and exposure device |
Country Status (1)
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|---|---|
| CN (1) | CN115685686A (en) |
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- 2021-07-26 CN CN202110844841.0A patent/CN115685686A/en active Pending
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