CN115505882A - Preparation method of nitride-bonded oxide double-coating and coated cutter - Google Patents
Preparation method of nitride-bonded oxide double-coating and coated cutter Download PDFInfo
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- CN115505882A CN115505882A CN202211119159.6A CN202211119159A CN115505882A CN 115505882 A CN115505882 A CN 115505882A CN 202211119159 A CN202211119159 A CN 202211119159A CN 115505882 A CN115505882 A CN 115505882A
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- 239000011248 coating agent Substances 0.000 title claims abstract description 175
- 238000000576 coating method Methods 0.000 title claims abstract description 175
- 238000002360 preparation method Methods 0.000 title claims abstract description 9
- 150000004767 nitrides Chemical class 0.000 claims abstract description 98
- 238000010849 ion bombardment Methods 0.000 claims abstract description 31
- 238000005520 cutting process Methods 0.000 claims abstract description 26
- 238000000151 deposition Methods 0.000 claims abstract description 25
- 238000006243 chemical reaction Methods 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 13
- 238000004140 cleaning Methods 0.000 claims abstract description 10
- 239000011159 matrix material Substances 0.000 claims abstract description 9
- 238000005240 physical vapour deposition Methods 0.000 claims abstract description 8
- 238000011068 loading method Methods 0.000 claims abstract description 6
- 238000010438 heat treatment Methods 0.000 claims abstract description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 32
- 229910052757 nitrogen Inorganic materials 0.000 claims description 30
- 229910010037 TiAlN Inorganic materials 0.000 claims description 29
- 229910052760 oxygen Inorganic materials 0.000 claims description 19
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 11
- 239000001301 oxygen Substances 0.000 claims description 11
- 230000003746 surface roughness Effects 0.000 claims description 9
- 239000011261 inert gas Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 230000009977 dual effect Effects 0.000 claims description 4
- 238000005516 engineering process Methods 0.000 claims description 4
- 239000011247 coating layer Substances 0.000 claims 2
- 150000002500 ions Chemical class 0.000 description 31
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 18
- 239000010410 layer Substances 0.000 description 18
- 230000008021 deposition Effects 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 11
- 229910052786 argon Inorganic materials 0.000 description 9
- 239000000956 alloy Substances 0.000 description 7
- 229910010038 TiAl Inorganic materials 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 229910001060 Gray iron Inorganic materials 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- OLBVUFHMDRJKTK-UHFFFAOYSA-N [N].[O] Chemical compound [N].[O] OLBVUFHMDRJKTK-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001256 stainless steel alloy Inorganic materials 0.000 description 1
- 238000007514 turning Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a preparation method of a nitride-combined oxide double-coating and a coated cutter. The preparation method comprises the following steps: loading a substrate into a reaction chamber; vacuumizing and heating the reaction cavity, and carrying out ion cleaning on the matrix; depositing a nitride coating on the substrate using physical vapor deposition techniques; performing ion bombardment on the nitride coating; an oxide coating is deposited on the nitride coating using physical vapor deposition techniques. After depositing the nitride coating on the substrate, the surface of the nitride coating is treated by means of ion bombardment to increase the roughness of the surface of the nitride coating, so as to increase the bonding strength of the oxide coating deposited thereafter, thereby improving the wear resistance and the cutting life of the coated cutting tool. The invention can be widely applied to the technical field of cutters.
Description
Technical Field
The invention relates to the technical field of cutters, in particular to a preparation method of a nitride combined oxide double-coating and a coated cutter.
Background
In the cutting process, the working conditions of the coated cutting tool are harsh, the advantages of the coated cutting tool are required to be fully exerted, and the bonding strength between the coating and the substrate is an important basis except that the coating of the cutting tool has excellent properties (such as high hardness, low friction, oxidation resistance and the like). Due to the difference between the thermal expansion coefficients of the oxide and the base material (e.g. 6X 10 thermal expansion coefficient of cemented carbide) -6 /° C, and the coefficient of thermal expansion of alumina is 8.5 × 10 -6 /° c), there may be a problem of poor bonding if an oxide is directly deposited on a substrate, and thus a nitride coating is commonly used as a primer layer during deposition of the oxide coating, thereby improving bonding strength.
Although the introduction of the nitride coating solves the problem of poor bonding strength between the coating and the substrate, the bonding strength between the nitride and the oxide is also severely limited due to the introduction of a new interface at the position where the nitride and the oxide are alternated. At present, a common method for solving the problem of interface bonding between nitride and oxide is to insert a gradient oxynitride coating, but the method has a complex process, requires screening of a proper gradient layer thickness, and continuously adjusts the oxygen-nitrogen ratio in the deposition process, so that the process is complex and the control difficulty is high.
Disclosure of Invention
In order to solve at least one of the above technical problems, the present invention provides a method for preparing a nitride-bonded oxide double coating and a coated cutting tool, and adopts the following technical scheme.
The coated cutting tool provided by the invention comprises a substrate, a nitride coating and an oxide coating, wherein the nitride coating is arranged on the substrate, and the nitride coating is provided with at least one element of Ti, cr, zr, al and Si; the oxide coating is arranged on the nitride coating, and the oxide coating is provided with at least one element of Ti, cr, zr, al and Si; wherein the surface of the nitride coating is subjected to ion bombardment treatment.
In certain embodiments of the present invention, the nitride coating has a thickness of 1 to 6 μm and the oxide coating has a thickness of 1 to 3 μm.
In certain embodiments of the present invention, the nitrogen content of the nitride coating is 45 to 55at.%, and the oxygen content of the oxide coating is 55 to 65at.%.
In some embodiments of the present invention, the nitride in the nitride coating has a structure of TiAlN, where Al:15 to 35at.%, ti:15 to 35at.%, N:45 to 55at.%.
In some embodiments of the present invention, the nitride in the nitride coating has a structural formula of CrAlN, wherein Al:15 to 35at.%, cr:15 to 30at.%, N:45 to 55at.%.
In some embodiments of the present invention, the nitride in the nitride coating has a structure of TiAlCrN, wherein, ti:10 to 20at.%, al:15 to 25at.%, cr:10 to 25at.%, N:45 to 55at.%.
In some embodiments of the invention, the oxide in the oxide coating has a structural formula of CrAlO, wherein Al:15 to 30at.%, cr:10 to 25at.%, O:55 to 65at.%.
The preparation method of the nitride combined oxide double-coating provided by the invention comprises the following steps: loading a substrate into a reaction chamber; vacuumizing and heating the reaction cavity, and carrying out ion cleaning on the matrix; introducing nitrogen, and depositing a nitride coating on the substrate by utilizing a physical vapor deposition technology; vacuumizing the reaction cavity, introducing inert gas, starting an ion source, and performing ion bombardment on the nitride coating; the reaction chamber is vacuumized, oxygen is introduced, and the oxide coating is deposited on the nitride coating by utilizing the physical vapor deposition technology.
In certain embodiments of the invention, the parameters for depositing the nitride coating are: the target current density of the arc target is 0.5-2.0A/cm 2 The bias voltage is-50 to-150V, and the air pressure is 1.0 to 3.0Pa; parameters of ion bombardment: the output power of the ion source is 2-5 KW, the bias voltage is-400-800V, and the air pressure is 0.6-3.0 Pa; deposition ofParameters of the oxide coating: the target current density of the arc target is 0.5-1.5A/cm 2 The bias voltage is-100 to-200V, and the air pressure is 0.6 to 2.0Pa.
In some embodiments of the invention, the duration of the ion bombardment is 10-60 min, and the surface roughness of the nitride coating after bombardment is 50-250 nm.
The embodiment of the invention has at least the following beneficial effects: after the nitride coating is deposited on the substrate, the surface of the nitride coating is treated in an ion bombardment mode to increase the roughness of the surface of the nitride coating, so that the bonding strength of the oxide coating deposited later is increased, and the wear resistance and the cutting life of the coated cutter are improved. The invention can be widely applied to the technical field of cutters.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings.
FIG. 1 is a comparison of scanning electron micrographs of the TiAlN/CrAlO duplex coating (b) of example 1 and the TiAlN/CrAlO duplex coating (a) of comparative example 1 which has not been subjected to ion bombardment.
FIG. 2 is a graph showing the change in the roughness of the TiAlN layer after ion bombardment treatment for various times in example 1.
FIG. 3 is a graph showing the results of the TiAlN/CrAlO duplex coating in example 1 and the coating in comparative example 1.
FIG. 4 is a graph of the two-dimensional wear profile and wear rate of the TiAlN/CrAlO duplex coating of example 1 after rubbing test with the coating of comparative example 1.
FIG. 5 is a graph comparing the cutting life of coated cutters with the TiAlN/CrAlO dual coating of example 1 with conventional TiAlN coated cutters.
FIG. 6 is a schematic structural diagram of the nitride/CrAlO dual coating of the present invention.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.
In the description of the present invention, it is to be understood that if the terms "center", "middle", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "axial", "radial", "circumferential", etc., are used in an orientation or positional relationship indicated based on the drawings, it is merely for convenience of description and simplicity of description, and it is not intended to indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore, is not to be considered as limiting the present invention. Furthermore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
The invention relates to a coated cutting tool, which comprises a base body, a nitride coating and an oxide coating, wherein the nitride coating is arranged on the base body, the surface of the nitride coating is bombarded by ions, and the oxide coating is arranged on the nitride coating.
It can be understood that the surface of the coated cutter has a double-coating structure and good mechanical property, the surface of the nitride coating can enhance the binding force with the oxide coating after ion bombardment, the characteristics of the oxide coating can be fully exerted, and the coated cutter has good wear resistance, binding strength and long cutting life.
The coating cutter designed by the invention is widely applied to the machining of carbon steel, cast iron, stainless steel and titanium alloy materials, and the machining comprises turning, milling, drilling, boring and grinding.
As an embodiment, the nitride coating has a thickness of 1 to 6 μm. In some examples, the oxide coating has a thickness of 1 to 3 μm. It will be appreciated that the thickness of the nitride coating and the oxide coating may be the same or different.
In some examples, the nitride coating is set to a thickness of 1 μm or 2 μm or 6 μm, the oxide coating is set to a thickness of 1 μm or 2 μm or 3 μm, and the nitride coating and the oxide coating form a double coating having a thickness of 2 μm or 5 μm or 9 μm.
The nitride coating has at least one element of Ti, cr, zr, al, si, further the nitrogen content in the nitride coating is 45 to 55at.%.
In some examples, the nitride coating has a formula of TiAlN, where Al:15 to 35at.%, ti:15 to 35at.%, N:45 to 55at.%. In some examples, the nitride coating has a nitride structure of CrAlN, where Al:15 to 35at.%, cr:15 to 30at.%, N:45 to 55at.%. In some examples, the nitride in the nitride coating has a formula of TiAlCrN, wherein Ti:10 to 20at.%, al:15 to 25at.%, cr:10 to 25at.%, N:45 to 55at.%.
The oxide coating has at least one element of Ti, cr, zr, al, si, and further, the oxygen content in the oxide coating is 55 to 65at.%. In some examples, the oxide in the oxide coating has a formula of CrAlO, wherein Al:15 to 30at.%, cr:10 to 25at.%, O:55 to 65at.%.
The invention relates to a preparation method of a nitride combined oxide double coating, which comprises the following steps: loading a substrate into a reaction chamber; vacuumizing and heating the reaction cavity, and carrying out ion cleaning on the matrix; depositing a nitride coating on the substrate using a physical vapor deposition technique; performing ion bombardment on the nitride coating; an oxide coating is deposited on the nitride coating using physical vapor deposition techniques.
The base material of the cutter is one of high-speed steel, hard alloy, metal ceramic, ceramic and cubic boron nitride, the reaction cavity is heated to 100-300 ℃, and the surface of the base body is subjected to ion cleaning.
During the deposition of the nitride coating: nitrogen is introduced, and the target current density of an arc target for depositing the nitride coating is set to be 0.5-2.0A/cm 2 The bias voltage is-50 to-150V, the air pressure is 1.0 to 3.0Pa, and the nitride coating is deposited on the substrate.
In the process of ion bombardment on the surface of the nitride coating: vacuumizing the reaction cavity, introducing inert gas, starting an ion source, setting the output power of the ion source to be 2-5 KW, bias voltage to be-400-800V and air pressure to be 0.6-3.0 Pa, ionizing the inert gas to generate high-energy ions under the action of the ion source, and bombarding the surface of the nitride coating in situ. Furthermore, the duration of ion bombardment is set to be 10-60 min, and the surface roughness of the bombarded nitride coating is 50-250 nm.
It is understood that one of helium, neon, argon, krypton and xenon is used as the inert gas in the ion bombardment process.
During deposition of the oxide coating: closing the ion source, vacuumizing the reaction cavity, introducing oxygen, and setting the target current density of the arc target for depositing the oxide coating to be 0.5-1.5A/cm 2 The bias voltage is-100 to-200V, the air pressure is 0.6 to 2.0Pa, and an oxide coating is deposited on the nitride coating.
The ion source ionizes the inert gas to generate high-energy ions, the high-energy ions can carry out ion bombardment and etching on the surface of the nitride coating, the surface of the nitride coating is treated in situ, the surface activity of the interface of the nitride coating and the oxide coating is improved, and the interface roughness and the contact area are increased, so that the interface combination between the nitride coating and the oxide coating is enhanced, and the characteristics of the oxide coating can be fully exerted.
The present invention will be described in detail below with reference to specific examples and comparative examples, it being noted that the following description is illustrative only and is not intended to specifically limit the present invention.
Comparative example 1
The matrix is made of hard alloy, is ultrasonically cleaned and dried, is loaded into a reaction cavity of a coating furnace, is heated and vacuumized to set conditions, and is subjected to ion cleaning.
Introducing nitrogen, opening the TiAl target, and adjusting the current density of the target to be 1.0A/cm 2 The bias voltage is-100V, the air pressure is 3.0Pa, the deposition time is set to be 90min, the TiAlN layer is deposited, and the thickness of the coating is 2 mu m.
Closing the TiAl target, stopping introducing nitrogen, vacuumizing, introducing oxygen, and adjusting the current density of the target to 0.5A/cm 2 The bias voltage is-150V, the air pressure is 0.6Pa, the deposition time is set to be 45min, the CrAlO layer is deposited, and the thickness of the coating is 1 mu m.
The coated cutting tool with the conventional TiAlN/CrAlO double coating is obtained through the steps, specifically, the structural formula of the nitride in the nitride coating is TiAlN, wherein Al:35at.%, ti:15at.%, N:50at.%; the structural formula of the oxide in the oxide coating is CrAlO, wherein Al:25at.%, cr:15at.%, O:60at.%.
Example 1
The matrix is made of hard alloy, is ultrasonically cleaned and dried, is loaded into a reaction cavity of a coating furnace, is heated and vacuumized to set conditions, and is subjected to ion cleaning.
Introducing nitrogen, starting the TiAl target, and adjusting the current density of the target to be 1.0A/cm 2 The bias voltage is-100V, the air pressure is 3.0Pa, the deposition time is set to be 90min, the TiAlN layer is deposited, and the thickness of the coating is 2 mu m.
And closing the TiAl target, stopping introducing nitrogen, vacuumizing, introducing argon, starting an ion source, setting the power of the ion source to be 2kW, adjusting the bias voltage to be-500V and the air pressure to be 0.6Pa, performing ion bombardment on the TiAlN layer, setting the time duration of the ion bombardment to be 15min, and setting the surface roughness of the bombarded nitride coating to be about 50nm.
Closing the ion source, stopping introducing argon, vacuumizing, introducing oxygen, and openingStarting the CrAl target, and adjusting the current density of the target to be 0.5A/cm 2 The bias voltage is-150V, the air pressure is 0.6Pa, the deposition time is set to be 45min, the CrAlO layer is deposited, and the thickness of the coating is 1 mu m.
The coated cutting tool with the TiAlN/CrAlO double coating is obtained through the steps, specifically, the structural formula of the nitride in the nitride coating is TiAlN, wherein Al:35at.%, ti:15at.%, N:50at.%; the structural formula of the oxide in the oxide coating is CrAlO, wherein Al:25at.%, cr:15at.%, O:60at.%.
As shown in fig. 1, (a) shows that the coating in comparative example 1 has a sharp interface between TiAlN and crolo layers, and (b) shows that the interface between TiAlN and crolo in example 1 has a decreased sharpness, which is mainly related to the roughness increase and the roughness unevenness of the interface caused by ion bombardment.
As shown in fig. 2, the ion bombardment treatment can increase the surface roughness of the TiAlN coating, and the surface roughness of the TiAlN coating gradually increases as the bombardment time increases.
As shown in FIG. 3, the TiAlN/CrAlO coating in the comparative example 1 has interlayer peeling phenomenon when the loading force is about 38N, and the TiAlN/CrAlO coating in the example 1 starts peeling phenomenon when the loading force is increased to about 62N, which shows that the introduction of the ion bombardment treatment at the interface can ensure the good bonding strength between the TiAlN and the CrAlO coating and meet the requirement of the bonding force of the coating in the cutting process.
As shown in FIG. 4, the coating of comparative example 1 had a wear depth of about 1.5 μm and a wear rate of 5.0. + -. 0.4X 10 -6 mm 3 N.m, the coating in example 1 was slightly worn at a rate of only 4.8. + -. 0.9X 10 -8 mm 3 N · m, indicating that the introduction of the ion bombardment treatment at the interface can significantly improve the wear resistance of the coating.
As shown in fig. 5, the conventional TiAlN coated tool having a coating thickness of 3 μm was used as a comparative example 2, the coated tool in example 1 and the coated tool in comparative example 2 cut HT350 gray cast iron, respectively, and the cutting life of the coated tool in example 1 was 174% of that of the coated tool in comparative example 2, which demonstrates that the coating designed according to the present invention can sufficiently exert the advantages of the CrAlO coating and can perform long-life cutting.
Example 2
The matrix is made of hard alloy, is ultrasonically cleaned and dried, is loaded into a reaction cavity of a coating furnace, is heated and vacuumized to set conditions, and is subjected to ion cleaning.
Introducing nitrogen, starting the CrAl target, and adjusting the current density of the target to be 0.5A/cm 2 And the bias voltage is-50V, the air pressure is 2.0Pa, the deposition time is set to be 50min, the CrAlN layer is deposited, and the thickness of the coating is 1 mu m.
Closing the CrAl target, stopping introducing nitrogen, vacuumizing, introducing argon, starting an ion source, setting the power of the ion source to be 2kW, adjusting the bias voltage to be-400V and the air pressure to be 1.0Pa, performing ion bombardment on the CrAlN layer, setting the time length of the ion bombardment to be 45min, and setting the surface roughness of the bombarded nitride coating to be about 110nm.
Closing the ion source, stopping introducing argon, vacuumizing, introducing oxygen, starting the CrAl target, and adjusting the current density of the target to be 1.0A/cm 2 The bias voltage is-150V, the air pressure is 1.0Pa, the deposition time is set to be 30min, the CrAlO layer is deposited, and the thickness of the coating is 1 mu m.
The coated cutting tool with the CrAlN/CrAlO double coating is obtained through the steps, specifically, the structural formula of the nitride in the nitride coating is CrAlN, wherein the ratio of Al:25at.%, cr:25at.%, N:50at.%; the structural formula of the oxide in the oxide coating is CrAlO, wherein Al:15at.%, cr:20at.%, O:65at.%.
Example 3
The matrix is made of hard alloy, is ultrasonically cleaned and dried, is loaded into a reaction cavity of a coating furnace, is heated and vacuumized to set conditions, and is subjected to ion cleaning.
Introducing nitrogen, starting the TiAlCr target, and adjusting the current density of the target to be 1.5A/cm 2 The bias voltage is-150V, the air pressure is 1.0Pa, the deposition time is set to be 120min, the TiAlCrN layer is deposited, and the thickness of the coating is 4 mu m.
Closing the TiAlCr target, stopping introducing nitrogen, vacuumizing, introducing argon, starting an ion source, setting the power of the ion source to be 4kW, adjusting the bias voltage to be-650V and the air pressure to be 2.0Pa, carrying out ion bombardment on the TiAlCrN layer, setting the time duration of the ion bombardment to be 30min, and setting the surface roughness of the bombarded nitride coating to be about 90nm.
Closing the ion source, stopping introducing argon, vacuumizing, introducing oxygen, starting a CrAl target and a Si target or adopting a CrAlSi target, and adjusting the current density of the target to be 1.5A/cm 2 The bias voltage is-100V, the air pressure is 1.5Pa, the deposition time is set to be 75min, the CrAlSiO layer is deposited, and the thickness of the coating is 2 mu m.
The coated cutter with the TiAlCrN/CrAlSiO double coating is obtained through the steps, specifically, the structural formula of the nitride in the nitride coating is TiAlCrN, wherein Ti:15at.%, al:20at.%, cr:15at.%, N:50at.%; the structural formula of the oxide in the oxide coating is CrAlSiO, wherein Si:10at.%, al:20at.%, cr:15at.%, O:55at.%.
Example 4
The matrix is made of hard alloy, is ultrasonically cleaned and dried, is loaded into a reaction cavity of a coating furnace, is heated and vacuumized to set conditions, and is subjected to ion cleaning.
Introducing nitrogen, starting the TiAl target, and adjusting the current density of the target to be 2.0A/cm 2 The bias voltage is-100V, the air pressure is 1.0Pa, the deposition time is set to be 150min, the TiAlN layer is deposited, and the thickness of the coating is 6 mu m.
And closing the TiAl target, stopping introducing nitrogen, vacuumizing, introducing argon, starting an ion source, setting the power of the ion source to be 5kW, adjusting the bias voltage to be-800V and the air pressure to be 1.5Pa, performing ion bombardment on the TiAlN layer, setting the time duration of the ion bombardment to be 20min, and setting the surface roughness of the bombarded nitride coating to be about 150nm.
Closing the ion source, stopping introducing argon, vacuumizing, introducing oxygen, starting a Cr target and a Zr target or adopting a CrZr target, and adjusting the current density of the target to be 2.0A/cm 2 The bias voltage is-200V, the air pressure is 2.0Pa, the deposition time is set to be 100min, the CrZrO layer is deposited, and the thickness of the coating is 3 mu m.
The coated cutting tool with the TiAlN/CrZrO double coating is obtained through the steps, specifically, the structural formula of the nitride in the nitride coating is TiAlN, wherein Al:25at.%, ti:25at.%, N:50at.%; the structural formula of the oxide in the oxide coating is CrZrO, wherein Al:20at.%, zr:20at.%, O:60at.%.
In the description of the present specification, reference to the terms "one embodiment," "some examples," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples" or the like, if any, means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
While the embodiments of the present invention have been described in detail with reference to the drawings, the present invention is not limited to the above embodiments, and various changes can be made within the knowledge of those skilled in the art without departing from the spirit of the present invention.
In the description of the present invention, the appearances of the patent names and phrases in the specification are not necessarily the same but are different. For example, the patent names "a and B" illustrate that the claimed invention is: the technical scheme with the subject name of A and the technical scheme with the subject name of B.
Claims (10)
1. A coated cutting tool, characterized by: comprises that
A base;
a nitride coating disposed on the substrate, the nitride coating having at least one element of Ti, cr, zr, al, si;
an oxide coating disposed on the nitride coating, the oxide coating having at least one element of Ti, cr, zr, al, si;
wherein the surface of the nitride coating is subjected to ion bombardment treatment.
2. The coated cutting tool of claim 1, wherein: the nitride coating layer has a thickness of 1 to 6 μm, and the oxide coating layer has a thickness of 1 to 3 μm.
3. The coated cutting tool of claim 1, wherein: the nitrogen content in the nitride coating is 45 to 55at.%, and the oxygen content in the oxide coating is 55 to 65at.%.
4. The coated cutting tool of claim 1, wherein: the structural formula of the nitride in the nitride coating is TiAlN, wherein Al:15 to 35at.%, ti:15 to 35at.%, N:45 to 55at.%.
5. The coated cutting tool of claim 1, wherein: the structural formula of the nitride in the nitride coating is CrAlN, wherein Al:15 to 35at.%, cr:15 to 30at.%, N:45 to 55at.%.
6. The coated cutting tool of claim 1, wherein: the structural formula of the nitride in the nitride coating is TiAlCrN, wherein Ti:10 to 20at.%, al:15 to 25at.%, cr:10 to 25at.%, N:45 to 55at.%.
7. The coated cutting tool according to any one of claims 1 to 6, wherein: the structural formula of an oxide in the oxide coating is CrAlO, wherein Al:15 to 30at.%, cr:10 to 25at.%, O:55 to 65at.%.
8. A preparation method of a nitride combined oxide double coating is characterized by comprising the following steps: the preparation method comprises
Loading a substrate into a reaction chamber;
vacuumizing and heating the reaction cavity, and performing ion cleaning on the matrix;
introducing nitrogen, and depositing a nitride coating on the substrate by utilizing a physical vapor deposition technology;
vacuumizing the reaction cavity, introducing inert gas, starting an ion source, and performing ion bombardment on the nitride coating;
and vacuumizing the reaction cavity, introducing oxygen, and depositing an oxide coating on the nitride coating by utilizing a physical vapor deposition technology.
9. The method of preparing a nitride-bonded-oxide dual coating according to claim 8, characterized in that:
parameters for depositing the nitride coating: the target current density of the arc target is 0.5-2.0A/cm 2 The bias voltage is-50 to-150V, and the air pressure is 1.0 to 3.0Pa;
parameters of ion bombardment: the output power of the ion source is 2-5 KW, the bias voltage is-400-800V, and the air pressure is 0.6-3.0 Pa;
parameters for depositing the oxide coating: the target current density of the arc target is 0.5-1.5A/cm 2 The bias voltage is-100 to-200V, and the air pressure is 0.6 to 2.0Pa.
10. The method for preparing a nitride bonding oxide dual coating according to claim 8 or 9, characterized in that: the duration of ion bombardment is 10-60 min, and the surface roughness of the bombarded nitride coating is 50-250 nm.
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